JP2013237006A - Liquid control device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid control device capable of accurately monitoring a vaporization process of liquid while maintaining responsiveness in temperature control.SOLUTION: A liquid control device 10 controls spreading and vaporization of a chemical. The liquid control device 10 includes a body 31 having an upper surface 31c supplied with the chemical, a mesh having a minute structure for promoting spreading of the chemical, and a heater 80 for heating the upper surface 31c from inside of the body 31. In the spreading direction of the upper surface 31c, the liquid control device 10 includes: a first temperature sensor 83 for detecting temperature of a first part inside the body 31 between the supplied position and the heater 80; a second temperature sensor 84 for detecting temperature of a second part inside the body 31 on the opposite side of the first part sandwiching the supplied position between the first/second parts; and a controller 70 controlling a heat generation amount of the heater 80 based on the temperature of the first part and executing a predetermined monitoring processing based on the temperature of the second part.

Description

  The present invention relates to a liquid control apparatus that controls the spread and vaporization of a liquid in contact with a surface.

  In this type of liquid control device, there is one in which fine irregularities are formed on the heat storage plate by arranging a mesh on the upper surface of the heat storage plate (see, for example, Patent Document 1). According to the device described in Patent Document 1, since the liquid supplied between the upper surface of the heat storage plate and the mesh spreads due to the interfacial tension, the liquid can be supplied to a large area of the mesh. Then, the heat storage plate is heated by the heater 80, whereby the liquid on the upper surface of the heat storage plate can be vaporized.

  In the device described in Patent Document 1, the temperature of the heat storage plate is detected by a thermocouple, and the temperature of the heat storage plate is feedback-controlled using the detected temperature. Moreover, the temperature change resulting from the vaporization of the liquid is detected by a thermocouple, and it is confirmed that the process is normal.

Japanese Patent No. 4673449

  By the way, in the thing of patent document 1, since the temperature of the heater vicinity is detected with the thermocouple, the detected temperature is easy to fluctuate with the change of the emitted-heat amount of a heater. For this reason, there is a possibility that it cannot be accurately determined whether or not the process is normal based on the temperature change detected by the thermocouple.

  Here, in order to suppress fluctuations in the detected temperature due to changes in the amount of heat generated by the heater, it is also conceivable to arrange a thermocouple so as to detect the temperature of the portion of the heat storage plate away from the heater. However, in that case, since the responsiveness between the change in the amount of heat generated by the heater and the detected temperature is lowered, the responsiveness when the temperature of the heat storage plate is controlled to the target temperature is lowered.

  The present invention has been made in view of such circumstances, and a main object thereof is to provide a liquid control apparatus capable of accurately monitoring a liquid vaporization process while maintaining responsiveness in temperature control. It is in.

  The present invention employs the following means in order to solve the above problems.

  The first means is a liquid control device that controls the spread and vaporization of the liquid, and promotes the spread of the liquid supplied to the supply surface and a main body having the supply surface to which the liquid is supplied. And a heater that heats the supplied surface from the inside of the main body at a position away from the supplied position on the supplied surface to which the liquid is supplied in the spreading direction of the supplied surface. A first temperature sensor for detecting a temperature of the first portion inside the main body between the supplied position and the heater in the spreading direction of the supplied surface; and the covered surface in the spreading direction of the supplied surface. Based on the second temperature sensor for detecting the temperature of the second part inside the main body on the opposite side of the first part across the supply position, and the temperature of the first part detected by the first temperature sensor. Before A control unit for controlling the heat value of the heater based on the temperature of the second portion to be detected by the second temperature sensor, characterized in that it comprises a monitoring unit for executing a predetermined monitoring processing.

  According to the above configuration, the promotion unit has a fine structure that promotes the spread of the liquid supplied to the supply surface. For this reason, the liquid supplied to the surface to be supplied spreads along the surface to be supplied due to the interfacial tension in the fine structure. And the liquid which spread | diffused along the to-be-supplied surface from the to-be-supplied position where a liquid is supplied in a to-be-supplied surface is heated from the inside of a main body with a heater. Thereby, the liquid can be vaporized in a wide area on the surface to be supplied.

  Here, the temperature of the first portion inside the main body is detected between the supplied position and the heater in the spreading direction of the supplied surface by the first temperature sensor. Since the first portion is closer to the heater than the supply position in the direction in which the supply surface expands, the change in the amount of heat generated by the heater is reflected quickly. The controller controls the amount of heat generated by the heater based on the temperature of the first portion detected by the first temperature sensor. For this reason, the responsiveness at the time of controlling the temperature of a main body with a heater can be maintained.

  Further, the second temperature sensor detects the temperature of the second part inside the main body on the side opposite to the first part across the supply position in the spreading direction of the supply surface. The second part is a position farther from the heater than the supply position in the direction of the spread of the supply surface. For this reason, the temperature of the second portion is not easily affected by a change in the amount of heat generated by the heater, and accurately reflects the vaporization state of the liquid. Then, a predetermined monitoring process is executed by the monitoring unit based on the temperature of the second portion detected by the second temperature sensor. Therefore, the liquid vaporization process can be accurately monitored. As the predetermined monitoring process, a process of displaying the temperature of the second part on a monitor (display unit), a process of detecting or notifying an abnormality based on the temperature of the second part, and the like can be employed.

  In the second means, the first portion and the second portion are portions near the supplied surface inside the main body in a direction perpendicular to the supplied surface.

  According to the above configuration, the first temperature sensor detects the temperature of the first portion near the supplied surface inside the main body (the first portion close to the supplied surface inside the main body) in the direction perpendicular to the supplied surface. Is done. For this reason, it is possible to accurately detect the temperature of the supplied surface in contact with the liquid, and consequently to accurately control the temperature of the supplied surface. In addition, the second temperature sensor detects the temperature of the second portion close to the supply surface inside the main body (the second portion close to the supply surface inside the main body) in the direction perpendicular to the supply surface. For this reason, the temperature change resulting from the vaporization of the liquid on the surface to be supplied can be detected accurately, and the vaporization state of the liquid on the surface to be supplied can be monitored accurately. Note that the temperature change caused by the vaporization of the liquid on the surface to be supplied includes a temperature decrease due to the heat of vaporization of the liquid, a temperature increase after the liquid is vaporized due to heating of the heater, and the like.

  In the third means, a display unit for displaying an image is provided, and the monitoring unit causes the display unit to display a temperature transition of the second part detected by the second temperature sensor as the monitoring process.

  According to the said structure, transition of the temperature of the 2nd part detected by the 2nd temperature sensor is displayed on a display part. Therefore, the user can determine whether or not the liquid vaporization process is normal by observing the transition of the temperature of the second portion displayed on the display unit.

  In the fourth means, the monitoring unit detects an abnormality based on the temperature of the second portion detected by the second temperature sensor as the monitoring process.

  As described above, the temperature of the second portion accurately reflects the vaporized state of the liquid. In this regard, according to the above-described configuration, the abnormality is detected based on the temperature of the second portion detected by the second temperature sensor, so that the abnormality of the liquid vaporization process can be appropriately detected.

  In the fifth means, the monitoring unit is configured such that the temperature of the second portion detected by the second temperature sensor exceeds a determination temperature range in a state where the heating value of the heater is controlled by the control unit. When it falls, it detects that abnormality has arisen in the heating by the said heater.

  In a state where the heating value of the heater is controlled by the control unit, the liquid supplied to the supply surface is heated and vaporized by the heater. For this reason, the temperature of the second portion increases due to the heat of the heater after decreasing due to vaporization of the liquid. However, when there is an abnormality in heating by the heater, for example, when the heater is turned off, the liquid supplied to the supply surface is not heated by the heater, and the temperature of the second portion is normal. It will be lower than.

  In this regard, according to the above configuration, in the state where the heat generation amount of the heater is controlled by the control unit, when the temperature of the second portion detected by the second temperature sensor falls below the determination temperature range, the heater It is detected that an abnormality has occurred in the heating due to. Therefore, it can be detected that the heating by the heater is not properly performed. In the above case, the monitoring unit may detect that the liquid has been supplied to the supply surface. In other words, even when there is an abnormality in the heating by the heater, the chemical solution is volatilized and the temperature of the second portion is lowered when the chemical solution is supplied to the supply surface.

  In the sixth means, the monitoring unit detects the vaporization of the liquid based on the temperature of the second portion detected by the second temperature sensor as the monitoring process.

  As described above, the temperature of the second portion accurately reflects the vaporized state of the liquid. In this regard, according to the above configuration, since the vaporization of the liquid is detected based on the temperature of the second portion detected by the second temperature sensor, it is possible to accurately detect that the liquid has evaporated on the supply surface. it can.

  In the seventh means, the monitoring unit detects the second part detected by the second temperature sensor in a state where the temperature of the second part detected by the second temperature sensor is maintained at a predetermined temperature. The liquid supply and vaporization are detected when the temperature rises to the predetermined temperature and is maintained after the temperature decreases.

  The first part is easily affected by changes in the amount of heat generated by the heater, whereas the second part is not easily affected by changes in the amount of heat generated by the heater. For this reason, when the heating value of the heater is increased to compensate for the temperature drop of the first part accompanying the supply of the liquid, the temperature of the first part tends to overshoot the predetermined temperature, whereas the second part Is less likely to overshoot the predetermined temperature.

  In this regard, according to the above configuration, after the temperature of the second portion detected by the second temperature sensor is lowered in the state where the temperature of the second portion detected by the second temperature sensor is maintained at the predetermined temperature. When the temperature is raised to the predetermined temperature and maintained, the supply and vaporization of the liquid are detected. Therefore, it is possible to accurately detect that the liquid is supplied to the supply position and that the supplied liquid is vaporized.

  In an eighth means, the monitoring unit is configured such that the temperature of the first portion detected by the first temperature sensor exceeds a determination temperature range in a state where the heating value of the heater is controlled by the control unit. When it falls, it detects that abnormality has arisen in the heating by the said heater.

  When an abnormality occurs in the heating by the heater, the liquid supplied to the supply surface is not heated by the heater, and the temperature of the first portion is lower than that in the normal state.

  In this regard, according to the above configuration, in the state where the heat generation amount of the heater is controlled by the control unit, when the temperature of the first portion detected by the first temperature sensor falls below the determination temperature range, the heater It is detected that an abnormality has occurred in the heating due to. Therefore, it can be detected that the heating by the heater is not properly performed. In the above case, the monitoring unit may detect that the liquid has been supplied to the supply surface.

  In the ninth means, the promoting portion is a mesh body knitted in a mesh shape and provided so as to contact the surface to be supplied, and the guide member that contacts the mesh body with the mesh body sandwiched between the main body and the body. Is provided.

  According to the said structure, the mesh body knitted by mesh shape and provided so that the said to-be-supplied surface may be touched is employ | adopted as a promotion part. For this reason, a plurality of interfaces are formed between the surface to be supplied and the mesh body, and the liquid supplied to the surface to be supplied spreads along the surface to be supplied due to the interface tension at the plurality of interfaces.

  Here, since the guide member that contacts the mesh body with the mesh body sandwiched between the main body and the guide body is provided, a plurality of interfaces are also formed between the mesh body and the guide member. Therefore, the liquid can be spread by the interfacial tension between the mesh body and the guide member. For this reason, in the part provided with the guide member, the spread of the liquid can be promoted more than the other parts. As a result, by adjusting the arrangement of the guide member, the liquid in contact with the supply surface can be preferentially spread in a desired direction.

  In the tenth means, the guide member is knitted in a mesh shape.

  According to the above configuration, since the guide member is knitted in a mesh shape, the evaporation of liquid through the guide member is promoted as compared with the case where the guide member is formed in a plate shape or a film shape. Can be made. For this reason, evaporation of the liquid can be promoted while preferentially spreading the liquid in contact with the surface to be supplied in a desired direction.

  In the eleventh means, a liquid channel for circulating the liquid is provided inside the main body, and the liquid channel opens at the supply surface to form the supply port of the liquid, The supply position is a position where the liquid is supplied to the supply surface through the supply port, and the mesh body and the guide member are a portion corresponding to the first portion of the supply surface, the supply target A portion corresponding to the second portion of the surface and the supply port are covered.

  According to the above configuration, the liquid channel for circulating the liquid is provided inside the main body, and the opening at the supply surface of the liquid channel forms the liquid supply port. For this reason, the liquid can be supplied to the supplied surface by effectively using the space inside the main body. A position where the liquid is supplied to the supply surface through the supply port can be adopted as the supply position.

  Furthermore, the portion corresponding to the first portion of the supplied surface, the portion corresponding to the second portion of the supplied surface, and the supply port are covered with the mesh body and the guide member. For this reason, the liquid supplied from the supply port can be preferentially spread in the direction of the first portion and the direction of the second portion in the spreading direction of the supply surface. Therefore, the amount of heat generated by the heater can be controlled based on the temperature of the first portion while sufficiently supplying the liquid to the portion corresponding to the first portion of the supplied surface. As a result, the vaporization state of the liquid can be controlled while the liquid is stably supplied. Further, it is possible to execute a predetermined monitoring process based on the temperature of the second portion while sufficiently supplying the liquid to the portion corresponding to the second portion of the supplied surface. As a result, the liquid vaporization process can be monitored while the liquid is stably supplied.

  In the twelfth means, the supply surface is provided with a groove for suppressing the spread of the liquid to the opposite side of the supply position across the second portion in the spreading direction of the supply surface. .

  The liquid supplied to the supply surface of the main body spreads due to the interfacial tension in the fine structure of the promoting portion. On the other hand, when a groove is formed on the surface to be supplied, an interface is not formed on the surface to be supplied at the groove, and the spread of the liquid is suppressed.

  For this reason, according to the said structure, the groove | channel provided in the to-be-supplied surface suppresses the spreading of the liquid to the opposite side to a to-be-supplied position on both sides of a 2nd part in the spreading direction of a to-be-supplied surface. Then, by suppressing the spread of the liquid to the opposite side of the supply position across the second portion, the supply of the liquid to the portion corresponding to the second portion of the supply surface can be promoted. As a result, the liquid vaporization process can be monitored in a state where the liquid is supplied more stably.

  In the thirteenth means, a first gas flow path and a second gas flow path for allowing a gas to flow are provided inside the main body, and the first gas flow path is opened at the supply surface and the gas The second gas flow path is opened at the supplied surface to form the gas discharge port, and the introduction port and the discharge port are provided with the heater interposed therebetween. Yes.

  According to the said structure, the 1st gas flow path and 2nd gas flow path which distribute | circulate gas are provided in the inside of a main body, and the opening in the to-be-supplied surface of a 1st gas flow path and a 2nd gas flow path is provided. The gas inlet and outlet are formed respectively. For this reason, gas can be discharged | emitted from the space around a to-be-supplied surface while using the space inside a main body effectively and introducing gas into the space around a to-be-supplied surface. At this time, the liquid in contact with the supply surface is promoted to spread in the gas flow direction. And since the introduction port and discharge port of gas are provided on both sides of a heater, the spread of the liquid to the direction which passes a heater can be promoted. As a result, heating of the liquid by the heater can be promoted.

  In the fourteenth means, the main body is arranged so that the supply surface is on the upper side, and the second gas flow path is formed with a recess that is recessed downward than the second gas flow path. .

  According to the said structure, the main body is arrange | positioned so that a to-be-supplied surface may become an upper side, and the recessed part dented below rather than a 2nd gas flow path is formed in the 2nd gas flow path. For this reason, the liquid that has flowed into the second gas flow path accumulates in the concave portion formed in the second gas flow path, and does not easily flow beyond the concave portion. Therefore, it is possible to prevent the liquid from being discharged through the second gas flow path without being vaporized. Furthermore, the liquid accumulated in the recess can be vaporized by the heat of the heater.

  The fifteenth means includes a third temperature sensor that detects a temperature of a third portion in the vicinity of the concave portion inside the main body, and the monitoring unit is configured to detect the third portion detected by the third temperature sensor. When the temperature drops beyond the determination temperature range, it is detected that the liquid has flowed into the second gas flow path.

  When the liquid is accumulated in the recess, the temperature in the vicinity of the recess is lowered by the liquid in the recess being vaporized.

  In this regard, according to the above configuration, the temperature of the third portion in the vicinity of the concave portion inside the main body is detected by the third temperature sensor. And when the temperature of the 3rd part detected by the 3rd temperature sensor falls exceeding the judgment temperature width by the monitoring part, it is detected that the liquid flowed into the 2nd gas channel. Therefore, it is possible to appropriately detect that the liquid has flowed into the second gas flow path, and it is possible to perform measures such as stopping the supply of the liquid.

  In the sixteenth means, the main body is arranged so that the supplied surface is on the upper side, and a collecting groove is provided between the supplied position and the discharge port in the spreading direction of the supplied surface. It has been.

  According to the above configuration, since the liquid collecting groove is provided between the supply position and the discharge port in the spreading direction of the supply surface, the liquid supplied to the supply position is in front of the discharge port. It becomes easy to flow into the collecting groove. Therefore, it can suppress that a liquid flows in into a 2nd gas flow path through a discharge port.

  In the seventeenth means, the height of the opening surface of the discharge port is higher than the height of the opening surface of the liquid collecting groove.

  According to the above configuration, since the height of the opening surface of the discharge port is higher than the height of the opening surface of the liquid collection groove, the liquid on the supply surface flows preferentially into the liquid collection groove rather than the discharge port. To do. Therefore, it is possible to further suppress the liquid from flowing into the second gas flow path through the discharge port.

  The eighteenth means includes a third temperature sensor that detects the temperature of the third portion below the liquid collecting groove inside the main body, and the monitoring unit detects the third temperature detected by the third temperature sensor. When the temperature of the portion falls below the determination temperature range, it is detected that the liquid has flowed into the liquid collecting groove.

  According to the above configuration, similarly to the fifteenth means, it is possible to appropriately detect that the liquid has flowed into the liquid collecting groove, and it is possible to perform measures such as stopping the supply of the liquid.

The figure which shows a liquid control apparatus. The figure which shows a liquid control apparatus. The perspective view which shows a liquid vaporizer. The perspective view which shows the main body of a liquid vaporizer. The disassembled perspective view of a liquid vaporizer. The enlarged plan view of a mesh. The upper surface of a main body and the expanded sectional view of a mesh. The upper surface of a main body and the expanded sectional view of a mesh. The expanded sectional view of the upper surface of a main body, a mesh, and a mesh band. The expanded upper surface figure of the upper surface of a main body, a mesh, and a shielding member. The graph which shows the relationship between the pump operation | movement of 1 time, and the temperature of a 1st part and a 2nd part. The graph which shows the relationship between continuous pump operation | movement and the temperature of a 1st part and a 2nd part. The graph which shows the relationship between periodic pump operation | movement and the temperature of a 1st part and a 2nd part. The perspective view which shows the modification of the main body of a liquid vaporizer. The perspective view which shows the other modification of the main body of a liquid vaporizer. The perspective view which shows the other modification of the main body of a liquid vaporizer. The perspective view which shows the modification of the 2nd gas flow path periphery.

  Hereinafter, an embodiment will be described with reference to the drawings. The present embodiment is embodied as a liquid control device that expands and vaporizes a liquid and discharges it while mixing with an inert gas.

  1A is a plan view showing the liquid control device 10, and FIG. 1B is a cross-sectional view taken along line 1B-1B of FIG. As shown in the figure, the liquid control device 10 includes a first housing 11, a second housing 20, a liquid vaporizer 30, a valve device 60, a heater 80, temperature sensors 83 and 84, a controller 70, a monitor 71, and the like. Yes.

  The first housing 11 is formed in a hollow rectangular parallelepiped shape, and a columnar space S having an oval bottom surface is formed therein. The columnar space S is opened on the side surface 11 a of the first housing 11 by an oval opening 12. An insertion hole 13 for inserting the valve device 60 is formed in the lower surface 11 b of the first housing 11. A mounting hole 15 for attaching the glass plate 14 is formed on the upper surface 11 c of the first housing 11.

  A liquid vaporizer 30 is inserted into the columnar space S from the opening 12. A valve device 60 is inserted into the insertion hole 13. A space between the first housing 11 and the valve device 60 is sealed with a seal member. A glass plate 14 is attached to the attachment hole 15 by a fastening member. A space between the first housing 11 and the glass plate 14 is sealed with a seal member. The user can observe the inside of the first housing 11 from above via the glass plate 14.

  Fig.2 (a) is a side view of the 2nd housing 20 seen from the 2A-2A line | wire of FIG. Referring also to FIG. 2A, the second housing 20 is formed in a rectangular parallelepiped shape and is attached to the side surface 11 a of the first housing 11. The first housing 11 and the second housing 20 are sealed with a seal member. In the second housing 20, the surface facing the side surface 11a of the first housing 11 is a side surface 20b. The second housing 20 is formed with a first gas channel 21, a second gas channel 22, a chemical channel 23, a heater insertion hole 24, and temperature sensor insertion holes 25a and 25b.

  In the second housing 20, the first gas channel 21 penetrates from the side surface 20b to the upper surface 20a. The second gas flow path 22 penetrates from the side surface 20b to the side surface 20c opposite to the side surface 20b. The first gas channel 21 and the second gas channel 22 are provided at positions near both ends in the longitudinal direction of the upper surface 20a. The chemical liquid channel 23 (liquid channel) penetrates from the side surface 20b to the side surface 20c at the approximate center of the side surface 20b and the side surface 20c. The heater insertion hole 24 penetrates from the side surface 20b to the side surface 20c between the second gas channel 22 and the chemical channel 23. The temperature sensor insertion hole 25 a penetrates from the side surface 20 b to the side surface 20 c between the chemical liquid flow path 23 and the heater insertion hole 24. The temperature sensor insertion hole 25 b penetrates from the side surface 20 b to the side surface 20 c between the chemical liquid channel 23 and the first gas channel 21.

  A first block 26, a second block 27, and a chemical liquid block 28 are attached to the second housing 20 by fastening members or the like.

  The first block 26 is attached to the upper surface 20 a of the second housing 20. The first block 26 is provided with a first block flow path 26a penetrating from the lower surface to the upper surface. One end of the first block channel 26 a is connected to the first gas channel 21. A first gas pipe 26b is connected to the other end of the first block channel 26a. And gas is introduced into the 1st block 26 from the 1st gas piping 26b.

  The second block 27 is attached to the side surface 20 c of the second housing 20. The second block 27 is provided with a second block channel 27a penetrating from the side surface to the upper surface. One end of the second block channel 27 a is connected to the second gas channel 22. A second gas pipe 27b is connected to the other end of the second block channel 27a. And gas is discharged | emitted from the 2nd block 27 to the 2nd gas piping 27b.

  The chemical liquid block 28 is attached to the side surface 20 c of the second housing 20. The chemical liquid block 28 is provided with a chemical liquid block flow path 28a penetrating from the side surface to the lower surface. One end of the chemical liquid block flow path 28 a is connected to the chemical liquid flow path 23. A chemical liquid pipe 28b is connected to the other end of the chemical liquid block channel 28a. And a chemical | medical solution is introduce | transduced into the chemical | medical solution block 28 from the chemical | medical solution piping 28b by the drive of a pump (not shown). The pump discharges a predetermined amount of chemical liquid by one drive, and the drive is controlled by the controller 70.

  2B and 2C are a cross-sectional view taken along line 2B-2B and a cross-sectional view taken along line 2c-2c in FIG. 1, respectively. Referring to FIGS. 2B and 2C together, the liquid vaporizer 30 includes a main body 31.

  The main body 31 is formed in a bottom oval column shape corresponding to the columnar space S, and is formed slightly smaller than the columnar space S. As described above, the liquid vaporizer 30 is inserted into the columnar space S of the first housing 11 from the opening 12. The liquid vaporizer 30 is attached to the side surface 20 b of the second housing 20 using a fastening member in the through hole B formed in the main body 31. Thereby, an oval cylindrical gap is formed between the inner peripheral surface of the first housing 11 and the main body 31. In the main body 31, a surface facing the side surface 20b of the second housing 20 is a side surface 31b.

  The main body 31 is formed with a first gas flow path 33, a second gas flow path 34, a chemical liquid flow path 35, a heater insertion hole 36, temperature sensor insertion holes 37 a and 37 b, and a recess 38.

  The first gas flow path 33 penetrates from the side surface to the upper surface of the main body 31. One end of the first gas flow path 33 is connected to the first gas flow path 21. The other end of the first gas flow path 33 is opened at the approximate center of the upper surface 31c of the main body 31 in the direction from the second housing 20 to the first housing 11 (short direction of the upper surface 31c of the main body 31).

  The second gas channel 34 penetrates from the side surface to the upper surface of the main body 31. One end of the second gas channel 34 is connected to the second gas channel 22. The other end of the second gas flow path 34 opens at the approximate center of the upper surface 31 c of the main body 31 in the short direction of the upper surface 31 c of the main body 31. The first gas flow path 33 and the second gas flow path 34 are respectively provided at positions near both ends in the longitudinal direction of the upper surface 31c. The first gas channel 33 and the second gas channel 34 are arranged in parallel to each other.

  The chemical liquid channel 35 (liquid channel) passes through the main body 31 from the side surface 31b to the upper surface 31c. One end of the chemical liquid flow path 35 is connected to the chemical liquid flow path 23. The other end of the chemical liquid channel 35 is open at the approximate center of the upper surface 31 c of the main body 31 in the short direction of the upper surface 31 c of the main body 31.

  The heater insertion hole 36 is connected to the heater insertion hole 24 and extends from the side surface 31b to the vicinity of the opposite side surface 31d. The heater 80 is inserted into the heater insertion holes 24 and 36, and the upper surface 31c is heated by the heater 80.

  The temperature sensor insertion hole 37 a is connected to the temperature sensor insertion hole 25 a and extends to the approximate center of the main body 31 in the short direction of the upper surface 31 c of the main body 31. The temperature sensor insertion hole 37a is formed in the main body 31 in the vicinity of the upper surface 31c (near the upper surface 31c inside the main body 31 in a direction perpendicular to the upper surface 31c). The first temperature sensor 83 is inserted into the temperature sensor insertion holes 25a and 37a, and the temperature near the upper surface 31c (first portion) is detected by the first temperature sensor 83. The first temperature sensor 83 is constituted by a resistance temperature detector using platinum or the like.

  The temperature sensor insertion hole 37 b is connected to the temperature sensor insertion hole 25 b and extends to the approximate center of the main body 31 in the short direction of the upper surface 31 c of the main body 31. The temperature sensor insertion hole 37b is formed in the main body 31 in the vicinity of the upper surface 31c (near the upper surface 31c inside the main body 31 in a direction perpendicular to the upper surface 31c). The second temperature sensor 84 is inserted into the temperature sensor insertion holes 25b and 37b, and the temperature in the vicinity of the upper surface 31c (second portion) is detected by the second temperature sensor 84. That is, the second temperature sensor 84 detects the temperature of the second portion inside the main body 31 on the opposite side of the first portion across the chemical liquid flow channel 35 (supply port 35a) in the spreading direction of the upper surface 31c. . The second temperature sensor 84 is constituted by a resistance temperature detector using platinum or the like.

  The heater 80 and the temperature sensors 83 and 84 are connected to the controller 70 (see FIG. 1). The controller 70 includes a CPU, a storage device, an input / output circuit, and the like. Temperatures detected by the temperature sensors 83 and 84 are input to the controller 70. The controller 70 (control unit) controls the amount of heat generated by the heater 80 based on the temperature of the first portion detected by the first temperature sensor 83. The controller 70 (monitoring unit) executes a predetermined monitoring process based on the temperature of the first part and the temperature of the second part detected by the first temperature sensor 83 and the second temperature sensor 84, respectively. .

  The monitor 70 is connected to the controller 70. The monitor 71 (display unit) displays an image based on the output from the controller 70. As the monitoring process, the controller 70 causes the monitor 71 to display the transition of the temperature of the first part and the temperature of the second part detected by the first temperature sensor 83 and the second temperature sensor 84, respectively. Specifically, the change in the temperature of the first part and the temperature of the second part with respect to time is displayed on the monitor 71 as a graph.

  In the main body 31, a recess 38 is formed at a position facing the insertion hole 13 of the first housing 11. A valve device 60 is inserted into the insertion hole 13 and the recess 38, and the valve device 60 is attached to the main body 31 by a fastening member or the like. A space between the main body 31 and the valve device 60 is sealed with a seal member. The recess 38 communicates with the chemical liquid flow path 35. A valve seat 39 is provided at a communication portion between the chemical liquid flow path 35 and the recess 38. A working gas flow path 40 is formed in the main body 31. The working gas flow path 40 extends from the side surface 11d of the first housing 11 to the approximate center of the first housing 11 in the longitudinal direction of the upper surface 11c of the first housing 11, bends in the short direction of the upper surface 11c, and communicates with the insertion hole 13. doing. The controller 70 controls the introduction and discharge of the working gas to and from the working gas channel 40.

  The valve device 60 includes a main body 61, a piston 62, a diaphragm valve body 63, a spring 64, a spring retainer 65, and the like.

  The main body 61 is formed in a cylindrical shape, and a piston 62 is accommodated therein. The main body 61 and the piston 62 have the same center axis.

  The piston 62 is supported by the main body 61 so as to be slidable in the central axis direction. Sealing members are sealed between the main body 61 and the first housing 11, between the main body 61 and the main body 31 of the liquid vaporizer 30, and between the main body 61 and the piston 62.

  A valve body 63 a of the diaphragm valve body 63 is attached to the tip of the piston 62. The outer edge of the diaphragm 63 b of the diaphragm valve body 63 is sandwiched between the main body 31 and the main body 61 of the liquid vaporizer 30.

  One end of the spring 64 contacts the piston 62, and the other end is supported by a spring retainer 65. The piston 62 is urged toward the valve seat 39 by a spring 64. Thereby, in a natural state, the valve body 63a of the diaphragm valve body 63 is pressed against the valve seat 39, and the chemical liquid flow path 35 is blocked.

  A working gas channel 66 is formed in the main body 61. One end of the working gas channel 66 is connected to the working gas channel 40 of the first housing 11. The other end of the working gas flow channel 66 communicates with the pressurizing chamber 67 on the opposite side of the spring 64 in the main body 61 with the flange portion 62 a of the piston 62 interposed therebetween. Then, the working gas is introduced through the working gas flow paths 40 and 66, whereby the piston 62 is moved in a direction away from the valve seat 39. Thereby, the chemical liquid flow path 35 is communicated, and the chemical liquid is supplied to the upper surface 31 c of the main body 31 of the liquid vaporizer 30.

  Next, the configuration of the liquid vaporizer 30 will be described in detail. FIG. 3 is a perspective view showing the liquid vaporizer 30, and FIG. 4 is a perspective view showing a main body 31 of the liquid vaporizer 30. As shown in the figure, the liquid vaporizer 30 includes a main body 31, a mesh 47, a first shielding member 50, a mesh band 52, mesh pressers 55 a and 55 b, and a fixing member 56. The main body 31 is formed of a stainless steel material or an aluminum material when the chemical liquid is relatively high in corrosion resistance and the wettability of the chemical liquid is relatively high, for example, when the chemical liquid is a hydrophobic treatment liquid.

  The first gas flow path 33 is opened on the upper surface 31c of the main body 31, and a gas inlet 33a is formed. On the upper surface 31c of the main body 31, the second gas flow path 34 is opened, and a gas discharge port 34a is formed. On the upper surface 31c (surface to be supplied) of the main body 31, the chemical liquid flow path 35 is opened, and a chemical liquid supply port 35a is formed. That is, the position where the chemical liquid is supplied to the upper surface 31c through the supply port 35a is the supply position where the chemical liquid is supplied on the upper surface 31c.

  The introduction port 33a and the discharge port 34a are provided across the supply port 35a, the temperature sensor insertion holes 37a and 37b (temperature sensors 83 and 84), and the heater insertion hole 36 (heater 80). That is, the supply port 35a, the temperature sensor insertion holes 37a and 37b, and the heater insertion hole 36 are provided between the introduction port 33a and the discharge port 34a in the spreading direction of the upper surface 31c. The supply port 35a is provided slightly closer to the introduction port 33a between the introduction port 33a and the discharge port 34a, more specifically, between the introduction port 33a and the discharge port 34a.

  The supply port 35a is provided between the introduction port 33a and the temperature sensor insertion hole 37a and the heater insertion hole 36 in the spreading direction of the upper surface 31c. That is, the supply port 35a is provided closer to the introduction port 33a than the temperature sensor insertion hole 37a and the heater insertion hole 36. On the other hand, the supply port 35a is provided closer to the discharge port 34a than the temperature sensor insertion hole 37b.

  The temperature sensor insertion hole 37a and the heater insertion hole 36 are provided between the supply port 35a and the discharge port 34a in the spreading direction of the upper surface 31c. That is, the temperature sensor insertion hole 37a and the heater insertion hole 36 are provided closer to the discharge port 34a than the supply port 35a. Specifically, the temperature sensor insertion hole 37a is provided closer to the supply port 35a than the heater insertion hole 36 in the spreading direction of the upper surface 31c. On the other hand, the temperature sensor insertion hole 37b is provided closer to the introduction port 33a than the supply port 35a.

  The discharge port 34a is formed larger than the introduction port 33a. Specifically, in the upper surface 31c, the discharge port 34a extends longer than the introduction port 33a in a direction perpendicular to the direction from the introduction port 33a to the discharge port 34a (short direction of the upper surface 31c).

  On the upper surface 31c of the main body 31, a liquid collecting groove 34b communicating (connected) with the discharge port 34a is formed. In the short direction of the upper surface 31c, the liquid collection groove 34b (second groove) extends from both ends of the discharge port 34a. The liquid collection groove 34b is provided over the entire length in the short direction of the upper surface 31c. That is, the liquid collection groove 34b extends in a direction substantially perpendicular to the direction from the supply port 35a (introduction port 33a) to the discharge port 34a on the upper surface 31c. The liquid collection groove 34b extends in the direction from the discharge port 34a to the introduction port 33a (longitudinal direction of the upper surface 31c), and then extends in a direction substantially perpendicular to the direction from the supply port 35a to the discharge port 34a. An extension 34c extending to the outer edge is provided. In the direction from the introduction port 33a to the discharge port 34a, the width of the liquid collecting groove 34b is slightly narrower than the width of the discharge port 34a. The depth of the liquid collection groove 34b is a depth at which the liquid flowing in the direction from the supply port 35a to the discharge port 34a can be collected along the liquid collection groove 34b to the discharge port 34a, for example, 0.5 to 1.. It is set to 5 mm, preferably 1.0 mm. The width of the liquid collecting groove 34b is set to, for example, 1.0 to 2.0 mm, and is preferably set to 1.5 mm.

  The second gas flow path 34 is formed with a recess 34 d that is recessed below the second gas flow path 34. The recess 34d is formed below the discharge port 34a in the second gas flow path 34.

  A temperature sensor insertion hole 37 c is formed in the main body 31. The temperature sensor insertion hole 37 c is connected to a temperature sensor insertion hole (not shown) formed in the first housing 11 and extends to the vicinity of the recess 34 d in the short direction of the upper surface 31 c of the main body 31. The temperature sensor insertion hole 37c is formed in the main body 31 in the vicinity of the lower surface 31e (near the lower surface 31e inside the main body 31 in the direction perpendicular to the upper surface 31c). The third temperature sensor 85 is inserted into the temperature sensor insertion hole 37c, and the temperature in the vicinity of the recess 34d (third portion) is detected by the third temperature sensor 85. The third temperature sensor 85 is constituted by a resistance temperature detector using platinum or the like. Note that the temperature below the recess 34 d (third portion) may be detected by the third temperature sensor 85.

  In the upper surface 31c of the main body 31, suppression of suppressing the spread of the chemical solution from the supply port 35a to the side opposite to the heater insertion hole 36 (heater 80) and to the side opposite to the temperature sensor insertion hole 37a (first temperature sensor 83). A groove 41 (first groove) is formed. Further, the suppression groove 41 suppresses the spread of the chemical solution to the side opposite to the supply port 35a (supplied position) across the second portion in the spreading direction of the upper surface 31c. The suppression groove 41 includes an arc portion 41a and a straight portion 41c.

  The arc portion 41a is formed as a semicircular arc and surrounds the supply port 35a except for the heater insertion hole 36 side and the temperature sensor insertion hole 37a side. That is, the circular arc portion 41a surrounds the half of the supply port 35a on the introduction port 33a side (half of the side opposite to the discharge port 34a).

  The suppression groove 41 has the same positional relationship as the introduction port 33a with respect to the discharge port 34a, the supply port 35a, the temperature sensor insertion holes 37a and 37b (temperature sensors 83 and 84), and the heater insertion hole 36 (heater 80). ing. That is, the supply port 35a, the temperature sensor insertion holes 37a and 37b, and the heater insertion hole 36 are provided between the suppression groove 41 and the discharge port 34a in the spreading direction of the upper surface 31c. The supply port 35a is provided between the suppression groove 41 and the temperature sensor insertion hole 37a and the heater insertion hole 36 in the spreading direction of the upper surface 31c.

  The straight line portion 41c extends from the end of the arc portion 41a to the outside of the upper surface 31c in the short direction of the upper surface 31c. The length of the straight portion 41c is shorter than the radius of the arc portion 41a. The straight line portion 41c extends to the end portion in the longitudinal direction of the upper surface 31c. The width and depth of the suppression groove 41 are set similarly to the width and depth of the liquid collection groove 34b.

  In the upper surface 31c, a concave portion 42 is provided on the side of the central portion of the arc portion 41a (groove), specifically on the side opposite to the supply port 35a. The recess 42 is formed in a substantially circular shape and communicates with the arc portion 41 a of the suppression groove 41. The main body 31 (liquid vaporizer 30) is arranged such that the supply surface provided with the supply port 35a is the upper surface 31c. The introduction port 33 a is provided at the approximate center of the recess 42, that is, at a position shifted from the suppression groove 41. The introduction port 33a, the supply port 35a, and the discharge port 34a are arranged on the same straight line.

  On the lower surface 31 e of the main body 31, engagement grooves 45 for engaging the mesh pressers 55 a and 55 b and the fixing member 56 are formed at both ends in the longitudinal direction. The engagement groove 45 has a predetermined width and depth and is formed so as to extend along the short side direction of the lower surface 31e.

  The mesh pressers 55a and 55b are formed in a bar shape having an “L” cross section. The fixing member 56 is formed in a bar shape having a “T” cross section. The lengths of the mesh pressers 55a and 55b and the fixing member 56 are equal to the length of the lower surface 31e in the short direction.

  The width and depth of the engagement groove 45 are set so that the first mesh presser 55a, the second mesh presser 55b, and the fixing member 56 are fixed in order. The fixing member 56 may be configured as a fastening member that fastens the second mesh presser 55b to the main body 31.

  Concave portions 44 are respectively formed on the curved surface 31f of the main body 31 so as to extend linearly in the short direction of the upper surface 31c.

  A mesh 47 (net-like body) knitted in a mesh shape is provided on the outer periphery of the main body 31 so as to contact the upper surface 31c and the curved surface 31f. Therefore, the recessed part 42, the inlet 33a, the suppression groove 41, the discharge port 34a, and the liquid collection groove 34b are provided in the part which contact | connects the mesh 47 in the upper surface 31c.

  The mesh 47 is formed in a rectangular shape and has a size that can cover the upper surface 31c and the curved surface 31f. Specifically, the length in the short direction of the upper surface 31c matches the length in the short direction of the mesh 47, and the length in the longitudinal direction of the upper surface 31c and the length of the outer periphery of the curved surface 31f are combined. The length of the mesh 47 in the longitudinal direction is long.

  A mesh 47 is wound around the upper surface 31c and the two curved surfaces 31f. For this reason, the introduction port 33 a, the supply port 35 a, the suppression groove 41, the liquid collection groove 34 b, and the discharge port 34 a are covered with the mesh 47. Furthermore, the mesh 47 covers a portion corresponding to the first portion of the upper surface 31c and a portion corresponding to the second portion of the upper surface 31c.

  The mesh 47 has a mesh roughness that allows the chemical solution to easily form a film at the opening of the mesh 47, for example, 300 mesh having a numerical aperture of 300 per inch. Specifically, in the mesh 47, the wire diameter is 0.03 mm, and the distance between the lines (distance between the lines) is 0.054 mm. The roughness of the mesh 47 is desirably set appropriately according to the wettability of the chemical liquid with respect to the mesh 47, the wettability of the chemical liquid with respect to the main body 31, the viscosity of the chemical liquid, and the like. The roughness of the mesh 47 may be set according to the result of testing the spread state of the chemical solution. Here, the width of the suppression groove 41 and the liquid collection groove 34 b is 16 times or more the distance between the lines of the mesh 47, and the depth of the suppression groove 41 and the liquid collection groove 34 b is 16 times the wire diameter of the mesh 47. That's it. The mesh 47 is made of a material having relatively high corrosion resistance to the chemical solution and relatively high wettability of the chemical solution, for example, a stainless material when the chemical solution is a hydrophobizing treatment liquid.

  A first shielding member 50 is provided at a position corresponding to the supply port 35a so as to cover the supply port 35a. Specifically, the first shielding member 50 (shielding member, guiding member) covers only the supply port 35 a and the vicinity thereof, and is surrounded by the arc portion 41 a of the suppression groove 41. The first shielding member 50 is provided outside the mesh 47 and is in contact with the mesh 47. That is, the first shielding member 50 is in contact with the mesh 47 on the side opposite to the main body 31 side, and the mesh 47 is sandwiched between the upper surface 31 c of the main body 31 and the first shielding member 50.

  For this reason, the first shielding member 50 is not in contact with the upper surface 31 c of the main body 31, and a flow path for the chemical solution is secured between the upper surface 31 c and the first shielding member 50 by the mesh 47. The first shielding member 50 is also made of a material that has a relatively high corrosion resistance to the chemical solution and a relatively high wettability of the chemical solution.

  At the position of the recess 42, a gap is formed below the mesh 47. That is, no interface is formed between the main body 31 and the mesh 47 at the position of the recess 42. Further, the concave portion 42 is connected to the arc portion 41 a of the suppression groove 41, and a gap is formed below the mesh 47 at the connection portion with the arc portion 41 a.

  A mesh band 52 knitted in a mesh shape is provided on the outer periphery of the main body 31 (mesh 47) so as to extend along the direction from the introduction port 33a to the discharge port 34a (longitudinal direction of the upper surface 31c).

  The mesh band 52 (guidance member) covers the introduction port 33a, the supply port 35a (first shielding member 50), and the discharge port 34a. Further, the mesh band 52 covers a portion corresponding to the first portion of the upper surface 31c and a portion corresponding to the second portion of the upper surface 31c. That is, the mesh band 52 includes, in order from the introduction port 33a, the temperature sensor insertion hole 37b (second temperature sensor 84), the supply port 35a, the temperature sensor insertion hole 37a (first temperature sensor 83), and the heater insertion hole 24 (heater 80). ), Extending toward the discharge port 34a.

  The mesh band 52 is provided outside the mesh 47 and the first shielding member 50 and is in contact with the mesh 47 and the first shielding member 50. That is, the mesh band 52 is in contact with the mesh 47 on the side opposite to the main body 31, and the upper surface 31 c of the main body 31 and the mesh band 52 sandwich the mesh 47. Further, the first shielding member 50 is sandwiched between the mesh 47 and the mesh band 52.

  The mesh band 52 is formed in a rectangular shape (band shape), and has a size that can cover the introduction port 33a and the first shielding member 50 (supply port 35a). In detail, the diameter of the 1st shielding member 50 and the length of the transversal direction of the mesh band 52 are substantially equal. The length of the mesh band 52 in the longitudinal direction is longer than the total length of the upper surface 31c and the outer circumference of the curved surface 31f.

  A mesh band 52 is wound around the upper surface 31c and the two curved surfaces 31f. The roughness of the mesh band 52 is such that the chemical solution can easily form a film at the opening of the mesh band 52, for example, 300 mesh having a numerical aperture of 300 per inch. The mesh band 52 is also formed of a material that has a relatively high corrosion resistance to the chemical solution and a relatively high wettability of the chemical solution.

  Both ends of the mesh 47 and the mesh band 52 in the longitudinal direction are fixed by mesh pressers 55a and 55b and a fixing member 56, respectively. Specifically, in the engagement groove 45, the ends of the mesh 47 and the mesh band 52 are pressed by the first mesh presser 55a, and the first mesh presser 55a is pressed by the second mesh presser 55b.

  The ends of the mesh 47 and the mesh band 52 are guided outward from between the first mesh presser 55a and the second mesh presser 55b. That is, the ends of the mesh 47 and the mesh band 52 are sandwiched between the first mesh presser 55a and the second mesh presser 55b.

  The fixing member 56 is engaged with the engaging groove 45 in a state where the second mesh pressing member 55 b is pressed by the fixing member 56. Thereby, the mesh pressers 55a and 55b and the fixing member 56 are fixed in a state of being engaged with the engagement groove 45. In addition, although illustration is abbreviate | omitted, when the fixing member 56 is comprised with the screw, the 2nd mesh presser 55b is fastened by the main body 31 with the screw.

  Here, the mesh 47 and the mesh band 52 are fixed while being pulled in the longitudinal direction thereof. Therefore, the mesh 47 is in close contact with the upper surface 31 c and the curved surface 31 f of the main body 31, and the mesh band 52 is in close contact with the mesh 47. The first shielding member 50 is in close contact with the mesh 47 and the mesh band 52.

  Next, a procedure for assembling the liquid vaporizer 30 will be described. FIG. 5 is an exploded perspective view of the liquid vaporizer 30. As shown in the figure, the first shielding member 50 includes a disk-shaped disk portion 50a and a needle-shaped pin 50b. A through hole 50c is formed at the center of the disc portion 50a. In the pin 50b, one end is a pointed end pointed like a needle, and the other end is a head having a larger diameter than other portions. The diameter of the head of the pin 50b is larger than the diameter of the through hole 50c, and the diameter of the portion other than the head of the pin 50b is smaller than the diameter of the through hole 50c. The diameter of the tip of the pin 50b is smaller than the distance between the lines of the mesh 47 of 0.054 mm.

  First, the mesh 47 is wound around the outer periphery of the main body 31 by aligning the longitudinal direction of the upper surface 31 c of the main body 31 with the longitudinal direction of the mesh 47. At this time, the mesh 47 covers the entire upper surface 31c and the curved surface 31f, and is further in a state where both ends are left behind. Further, the mesh 47 is in a state of being in contact with the upper surface 31c except for the portions where the concave portion 42, the suppression groove 41, the supply port 35a, the discharge port 34a, the liquid collection groove 34b, and the extension portion 34c are provided.

  Next, the disc part 50a of the 1st shielding member 50 is arrange | positioned so that the supply port 35a may be covered from the outer side of the mesh 47. FIG. At this time, the position of the center of the supply port 35a is aligned with the position of the center of the disc part 50a (through hole 50c). Then, the pin 50b is inserted into the through hole 50c of the disc portion 50a from the tip, and the pin 47b is inserted into the supply port 35a through the mesh 47. At this time, since the diameter of the tip of the pin 50b is smaller than the distance between lines of the mesh 47, the tip can be inserted between the wire of the mesh 47 and the wire. And the head of the pin 50b is applied to the disc part 50a, and insertion of the pin 50b is completed.

  Subsequently, the mesh band 52 is wound around the outer periphery of the main body 31 by aligning the longitudinal direction of the upper surface 31 c of the main body 31 with the longitudinal direction of the mesh band 52. Specifically, the mesh band 52 is wound so as to overlap the introduction port 33a, the supply port 35a (first shielding member 50), and the discharge port 34a. At this time, the mesh band 52 covers the upper surface 31c and the curved surface 31f and is in a state where both ends are left behind.

  Subsequently, as shown in FIGS. 2B, 2C, and 3, both ends of the mesh 47 and the mesh band 52 are temporarily fixed by the first mesh presser 55a in the engagement groove 45, respectively. In this state, or in a state where the first mesh presser 55a is pressed by the second mesh presser 55b, the mesh 47 and the mesh band 52 are each pulled in the longitudinal direction. As a result, the ridges of the mesh 47 and the mesh band 52 are stretched, and a tension is generated in the mesh 47 and the mesh band 52. Then, the mesh pressers 55a and 55b are fixed by the fixing member 56, and the assembly of the liquid vaporizer 30 is completed.

  The liquid vaporizer 30 thus assembled is attached to the side surface 20b of the second housing 20 using a fastening member in the through hole B formed in the main body 31, as described above. An oval cylindrical gap is formed between the inner peripheral surface of the first housing 11 and the main body 31.

  In the state in which the mesh 47 and the mesh band 52 are wound and fixed around the outer periphery of the main body 31, a gap is generated between the mesh 47 and the mesh band 52 and the concave portion 44 of the curved surface 31f. Therefore, the insertion member 57 is inserted between the inner peripheral surface of the first housing 11 and the mesh 47 and the mesh band 52 from the axial direction of the main body 31 (short direction of the upper surface 31c) so as to engage with the recess 44. Has been.

  The insertion member 57 is formed in a round bar shape, and the radius of the cross section thereof is substantially equal to the radius of curvature of the recess 44. The distal end portion of the insertion member 57 is slightly thinner than the other portions, and the mesh 47 and the mesh band 52 are inserted from the distal end portion against the recess 44. Thereby, the clearance gap between the recessed part 44 and the mesh 47 and the mesh band 52 is shrunk, and the tension | tensile_strength which generate | occur | produces in the mesh 47 and the mesh band 52 can be increased. As a result, the mesh 47 and the mesh band 52 are in a state of being in close contact with the main body 31.

  Next, the principle of spreading the chemical solution in contact with the upper surface 31c of the main body 31 with the mesh 47, the mesh band 52, and the first shielding member 50 will be described. FIG. 6 is an enlarged plan view of the mesh 47. The mesh 47 is formed by knitting (weaving) the vertical wire rods 48a, 48b, 48c, 48d and the horizontal wire rods 49a, 49b, 49c, 49d to each other.

  The mesh 47 is formed with a mesh space surrounded by vertical and horizontal wires in plan view. The mesh space is a rectangular parallelepiped (square in plan view), and is formed at equal intervals in the vertical and horizontal directions of the mesh 47. For example, the mesh space T1 is a fine space (0.054 mm × 0.054 mm × mesh 47 thickness) surrounded by two vertical wires 48b and 48c and two horizontal wires 49b and 49c.

  Since the mesh space T1 is a fine space, a relatively large intermolecular force acts between the wires 48b, 48c, 49b, 49c and the chemical solution. As a result, the chemical solution is sucked into the mesh space T1, and a film of the chemical solution is formed so as to close the mesh space T1 (capillary phenomenon). In this state, the chemical liquid is sucked into each mesh space, and the action of the chemical liquid trying to spread along the surface of the mesh 47 is relatively small.

  FIG. 7 is an enlarged cross-sectional view of the upper surface 31 c of the main body 31 and the mesh 47. As shown in the figure, between the upper surface 31c of the main body 31 and the mesh 47, a distribution space T2 surrounded by the upper surface 31c, the vertical wire, and the horizontal wire is formed in a side view. The distribution space T2 is a space in which a gap between the upper surface 31c and the vertical wire and the horizontal wire is connected, and extends along the upper surface 31c.

  At portions where the vertical wires 48a, 48b, 48c, 48d are in contact with the upper surface 31c (intersections between the wires), the horizontal wires 49a, 49b, 49c, 49d are separated from the upper surface 31c. On the other hand, in the portions where the horizontal wires 49a, 49b, 49c, 49d are in contact with the upper surface 31c (intersections between the wires), the vertical wires 48a, 48b, 48c, 48d are separated from the upper surface 31c. For this reason, the distribution space T2 is not blocked by the vertical wire and the horizontal wire, and is continuous along the upper surface 31c.

  A large number of fine interfaces are formed between the upper surface 31c and the vertical and horizontal wires. Therefore, the chemical solution supplied to the upper surface 31c spreads along the upper surface 31c through the circulation space T2 due to the interfacial tension at many fine interfaces (capillary phenomenon). That is, the mesh 47 (promotion part) forms a fine structure that promotes the spread of the chemical solution supplied to the upper surface 31c. Furthermore, since the chemical has wettability with respect to the upper surface 31c, the vertical wire, and the horizontal wire, the spread of the chemical along the upper surface 31c is promoted.

  FIG. 8 is an enlarged cross-sectional view of the upper surface 31 c of the main body 31 and the mesh 47. Here, a part of the horizontal wire 49b is separated from the upper surface 31c, and the gap G is generated. Even in such a state, the chemical liquid is spread by the interfacial tension in the circulation space T2. That is, the upper surface 31c and the vertical wire and the horizontal wire may be partially separated.

  FIG. 9 is an enlarged cross-sectional view of the upper surface 31 c of the main body 31, the mesh 47, and the mesh band 52. As shown in the figure, in addition to the distribution space T2, between the mesh 47 and the mesh band 52, a vertical wire and a horizontal wire of the mesh 47 and a vertical wire and a horizontal wire of the mesh band 52 in a side view. A distribution space T3 surrounded by is formed. The distribution space T3 is a space in which gaps between the vertical wire and horizontal wire of the mesh 47 and the vertical wire and horizontal wire of the mesh band 52 are connected, and extends substantially parallel to the upper surface 31c.

  In the portion where the vertical wire members 53 a, 53 b, 53 c, 53 d of the mesh band 52 are in contact with the horizontal wire member of the mesh 47 (intersection portion between the wire members), the horizontal wire member of the mesh band 52 is separated from the horizontal wire member of the mesh 47. On the other hand, in the portion where the horizontal wire of the mesh band 52 is in contact with the vertical wire of the mesh 47 (intersection of the wires), the vertical wires 53a, 53b, 53c, 53d of the mesh band 52 are separated from the vertical wire of the mesh 47. For this reason, the distribution space T3 is not blocked by the vertical wire and the horizontal wire, and is continuous substantially parallel to the upper surface 31c.

  A large number of fine interfaces are formed between the vertical and horizontal wires of the mesh 47 and the vertical and horizontal wires of the mesh band 52. That is, the mesh band 52 (promotion part) forms a fine structure that promotes the spread of the chemical solution supplied to the upper surface 31c. Therefore, the chemical solution supplied to the upper surface 31c spreads along the upper surface 31c through the circulation space T2 and spreads substantially parallel to the upper surface 31c through the circulation space T3 (capillary phenomenon) due to the interfacial tension at many fine interfaces. ). Furthermore, since the chemical has wettability with respect to the upper surface 31c, the vertical and horizontal wires of the mesh 47, and the vertical and horizontal wires of the mesh band 52, the spread of the chemical is promoted. In the drawing, the position of the vertical wire rod of the mesh 47 and the vertical wire rod of the mesh band 52, and the position of the horizontal wire rod of the mesh 47 and the horizontal wire rod of the mesh band 52 are shown to coincide with each other. These may be shifted from each other.

  FIG. 10 is an enlarged cross-sectional view of the upper surface 31 c of the main body 31, the mesh 47, and the first shielding member 50. As shown in the figure, in addition to the distribution space T2, the disc portion 50a of the first shielding member 50 and the mesh 47 are surrounded by the disc portion 50a, vertical wires, and horizontal wires in a side view. A distribution space T4 is formed. The distribution space T4 is formed in the same manner as the distribution space T2, and is a space in which a gap between the lower surface of the disc portion 50a and the vertical wire and the horizontal wire is connected, along the lower surface of the disc portion 50a. Spreading.

  Therefore, the chemical solution supplied to the upper surface 31c spreads along the upper surface 31c through the circulation space T2 and spreads along the lower surface of the disk portion 50a through the circulation space T4 due to the interfacial tension at many fine interfaces. (Capillary phenomenon). Furthermore, since the chemical solution has wettability with respect to the upper surface 31c, the lower surface of the disk portion 50a, the vertical wire material, and the horizontal wire material, the spread of the chemical solution is promoted.

  Next, the operation of the liquid control apparatus 10 will be described with reference to FIGS. Here, a case where a chemical liquid (for example, a hydrophobization treatment liquid) that is spread and vaporized by the liquid vaporizer 30 is mixed with an inert gas (for example, nitrogen) and supplied to the next apparatus will be described as an example.

  When the inert gas is introduced from the first gas pipe 26 b, the inert gas is blown out from the inlet 33 a of the main body 31 through the first gas passages 21 and 33 through the recess 42. Here, since the introduction port 33 a is connected to the suppression groove 41 through the recess 42, a part of the inert gas blown out from the introduction port 33 a flows along the suppression groove 41 covered with the mesh 47. It will be. As a result, the inert gas is introduced into the columnar space S in the first housing 11.

  Then, the inert gas flows through the gap formed between the inner peripheral surface of the first housing 11 and the main body 31 of the liquid vaporizer 30 and flows into the discharge port 34a. The inert gas that has flowed into the discharge port 34 a is discharged from the second gas pipe 27 b through the second gas flow paths 34 and 22. The second gas pipe 27b is connected to the next device, and the inert gas discharged from the second gas pipe 27b is supplied to the next device.

  When the chemical solution is supplied from the chemical solution pipe 28b by driving the pump, the chemical solution is supplied from the supply port 35a of the main body 31 to the upper surface 31c through the chemical solution flow paths 23 and 35. At this time, since the chemical liquid supplied from the supply port 35a hits the first shielding member 50 covering the supply port 35a, the chemical liquid is prevented from being ejected through the mesh 47 or the mesh band 52. In addition, since the pin 50b of the first shielding member 50 is inserted into the supply port 35a, even if chemical pressure acts on the first shielding member 50, the first shielding member 50 is prevented from being displaced from the supply port 35a. Is done. Further, the pin 50b can be used for positioning the first shielding member 50 with respect to the supply port 35a.

  As shown in FIG. 10, between the upper surface 31c of the main body 31 and the disc part 50a of the first shielding member 50, the supplied chemical liquid is passed through the circulation space T2 due to the interfacial tension at many fine interfaces. While extending along 31c, it extends along the lower surface of the disc part 50a through the distribution space T4. Therefore, in this portion, the chemical solution spreads faster than the portion where only the mesh 47 is provided on the upper surface 31c.

  The chemical liquid flows under the disk portion 50a of the first shielding member 50 and further spreads to the surroundings. In the portion where only the mesh 47 is provided with respect to the upper surface 31c, as shown in FIG. 7, the chemical solution spreads along the upper surface 31c through the circulation space T2 due to the interfacial tension at many fine interfaces. On the other hand, in the portion where the mesh 47 and the mesh band 52 are provided with respect to the upper surface 31c, as shown in FIG. 9, the chemical solution is distributed along the upper surface 31c through the circulation space T2 due to the interfacial tension at many fine interfaces. And spread substantially parallel to the upper surface 31c through the distribution space T3. Therefore, the chemical liquid that has circulated under the disc portion 50 a of the first shielding member 50 spreads preferentially along the mesh band 52.

  Further, a part of the chemical solution that spreads around the first shielding member 50 along the upper surface 31c reaches the suppression groove 41 of the upper surface 31c. In the portion where the suppression groove 41 is formed, since no interface is formed between the upper surface 31c and the mesh 47, the spread of the chemical solution is suppressed. Furthermore, since the inert gas is blown out from the mesh at the portion of the mesh 47 that covers the suppression groove 41, particularly the portion that covers the recess 42, the chemical solution is effectively suppressed from spreading beyond the suppression groove 41.

  In particular, in a portion where the suppression groove 41 and the mesh band 52 overlap, there is a possibility that the chemical solution spreads beyond the suppression groove 41 by being transmitted through the mesh band 52. In this respect, since the recess 42 is connected to a portion where the suppression groove 41 and the mesh band 52 overlap, the width of the suppression groove 41 is substantially widened. For this reason, it can suppress effectively that a chemical | medical solution spreads across the mesh band 52 and exceeds the suppression groove | channel 41. FIG.

  Here, the arc portion 41a of the suppression groove 41 surrounds the supply port 35a except for the heater insertion hole 36 (heater 80) side and the temperature sensor insertion hole 37a (first temperature sensor 83) side. The spread of the chemical solution in directions other than 80 and the first temperature sensor 83 side is suppressed. As a result, the amount of the chemical liquid flowing to the heater 80 side and the first temperature sensor 83 side increases, and the spread of the chemical liquid to the heater 80 side and the first temperature sensor 83 side is promoted. The linear portion 41c of the suppression groove 41 also promotes the spread of the chemical liquid toward the heater 80 side and the first temperature sensor 83 side. Further, the suppression groove 41 suppresses the spread of the chemical solution to the side opposite to the supply port 35a (supplied position) across the second portion in the spreading direction of the upper surface 31c. And supply of the chemical | medical solution to the part corresponding to a 2nd part among the upper surfaces 31c can be accelerated | stimulated by suppressing the spreading of the chemical | medical solution to the opposite side to the supply port 35a across the 2nd part.

  A heater 80 is inserted into the heater insertion hole 36, and the upper surface 31 c of the main body 31 is heated by the heater 80. Here, since the spreading of the chemical liquid toward the heater 80 is promoted by the mesh band 52 and the suppression groove 41, the efficiency of heating the chemical liquid by the heater 80 can be improved. Further, since the mesh band 52 is formed by knitting in a mesh shape, the evaporation of the chemical solution through the mesh band 52 is promoted as compared with the case where the mesh band 52 is formed in a plate shape or a film shape. The Therefore, the mesh band 52 can promote the spread of the chemical solution toward the heater 80 while maintaining good evaporation of the chemical solution.

  Here, the relationship between the operation of the pump (right axis) and the temperatures of the first and second parts (left axis) will be described with reference to FIGS. 11 to 13, the controller 70 is based on the temperature of the first part detected by the first temperature sensor 83 so as to maintain the temperature of the first part detected by the first temperature sensor 83 at 75 ° C. Thus, the amount of heat generated by the heater 80 is feedback controlled. As feedback control, PID control, PD control, or the like can be employed.

  FIG. 11 is a graph showing the relationship between one pump operation and the temperatures of the first part and the second part. As shown in the figure, when the chemical solution is discharged once by the pump, the temperature of the first portion and the temperature of the second portion are lowered. And since the temperature of the 1st part fell, the calorific value of heater 80 is increased by controller 70. At this time, since the first portion is close to the heater 80, the temperature of the first portion is highly responsive to changes in the amount of heat generated by the heater 80, but tends to fluctuate due to changes in the amount of heat generated by the heater 80. As a result, the temperature of the first portion converges to 75 ° C. after repeating overshoot and undershoot. On the other hand, since the second portion is far from the heater 80, the temperature of the second portion is slightly less responsive to changes in the amount of heat generated by the heater 80, but hardly changes even if the amount of heat generated by the heater 80 changes. As a result, the temperature of the second portion rises to 75 ° C. and converges without causing overshoot and undershoot.

  FIG. 12 is a graph showing the relationship between the continuous pump operation and the temperatures of the first part and the second part. As shown in the figure, even when the discharge operation of the chemical solution is continuously performed by the pump a plurality of times, the transition of the temperature of the first part and the temperature of the second part has the same tendency as in FIG. However, in this case, since the discharge amount and vaporization amount of the chemical liquid are increasing, the temperature decrease range and the increase range are larger than those in FIG.

  FIG. 13 is a graph showing the relationship between the continuous pump operation that is repeated periodically and the temperatures of the first part and the second part. As shown in the figure, even when the chemical liquid is continuously discharged by the pump, the transition of the temperature of the first part and the temperature of the second part has the same tendency as in FIG. . That is, in this case, the temperature transition of FIG. 12 is periodically repeated. By such a discharge operation of the pump, the chemical liquid can be continuously supplied to the liquid vaporizer 30. Then, the chemical vapor supplied to the upper surface 31c can be spread and vaporized by the liquid vaporizer 30.

  Paying attention to the tendency of the temperature transition shown in FIGS. 11 to 13, the controller 70 executes the following monitoring process.

  The controller 70 detects an abnormality based on the temperature of the second portion detected by the second temperature sensor 84. Specifically, the controller 70 controls the heating by the heater 80 when the temperature of the second portion detected by the second temperature sensor 84 falls below the determination temperature range in a state where the heat generation amount of the heater 80 is controlled. Detect that an abnormality has occurred. If there is an abnormality in the heating by the heater 80, for example, when the power source of the heater 80 is turned off, or when the wiring for supplying power to the heater 80 is disconnected, the power is supplied to the upper surface 31c. The chemical solution is not heated by the heater 80, and the temperature of the second portion is lower than that in the normal state. Therefore, it can be detected that the heating by the heater 80 is not properly performed. Further, in the above case, the controller 70 detects that the chemical liquid has been supplied to the upper surface 31c. That is, even when an abnormality occurs in the heating by the heater 80, if the inert gas is circulated along the upper surface 31c in a state where the chemical solution is supplied to the upper surface 31c, the chemical solution is volatilized and second. The temperature of a part will fall.

  Further, the controller 70 detects the vaporization of the chemical solution based on the temperature of the second portion detected by the second temperature sensor 84. Specifically, the controller 70 detects the temperature of the second part detected by the second temperature sensor 84 in a state where the temperature of the second part detected by the second temperature sensor 84 is maintained at 75 ° C. (predetermined temperature). When the temperature is lowered and maintained up to 75 ° C., the supply and vaporization of the chemical solution are detected. The first portion is easily affected by the change in the amount of heat generated by the heater 80, whereas the second portion is not easily affected by the change in the amount of heat generated by the heater 80. For this reason, when the calorific value of the heater 80 is increased to compensate for the temperature drop of the first part due to the supply of the chemical solution, the temperature of the first part tends to overshoot 75 ° C., whereas the second part The temperature of is less likely to overshoot at 75 ° C. Therefore, it is possible to accurately detect that the chemical solution is supplied from the supply port 35a to the upper surface 31c and that the supplied chemical solution is vaporized.

  In addition, the controller 70 controls heating by the heater 80 when the temperature of the first portion detected by the first temperature sensor 83 falls below the determination temperature range in a state where the heat generation amount of the heater 80 is controlled. Detect that an abnormality has occurred. When an abnormality occurs in the heating by the heater 80, the chemical solution supplied to the upper surface 31c is not heated by the heater 80, and the temperature of the first portion is lower than normal. Therefore, it can be detected that the heating by the heater 80 is not properly performed. Further, in the above case, the controller 70 detects that the chemical liquid has been supplied to the upper surface 31c.

  Returning to FIGS. 1 to 3, the inert gas blown out from the mesh 47 in the concave portion 42 and the suppression groove 41 flows over the second temperature sensor 84, the supply port 35 a, the first temperature sensor 83, and the heater 80 in this order. It passes through and is discharged from the discharge port 34a. For this reason, the spread of the chemical solution from the supply port 35a to the heater 80 side and the first temperature sensor 83 side is also promoted by the inert gas. The vapor generated by the evaporation of the chemical liquid is pushed by the inert gas and guided toward the discharge port 34a. Here, the suppression groove 41 is provided over the entire length in the short direction of the main body 31 on the side opposite to the discharge port 34a with respect to the supply port 35a. For this reason, the vapor of the chemical solution can be effectively guided toward the discharge port 34a by the inert gas blown from the mesh 47 of the mesh 47 in the concave portion 42 and the suppression groove 41.

  A liquid collection groove 34b extending in a direction substantially perpendicular to the direction from the supply port 35a to the discharge port 34a is connected to the discharge port 34a. For this reason, the chemical solution or the vapor of the chemical solution spreading away from the direction from the supply port 35a to the discharge port 34a is guided to the discharge port 34a by the liquid collection groove 34b.

  Here, at the outer edge of the upper surface 31 c, the chemical solution has interfacial tension along the boundary between the main body 31 and the second housing 20, specifically, along the boundary between the upper surface 31 c of the main body 31 and the side surface 20 b of the second housing 20. It becomes easier to spread. In this respect, the chemical solution spreading along the outer edge of the upper surface 31c extends in the direction from the discharge port 34a to the supply port 35a, and then is substantially perpendicular to the direction from the supply port 35a to the discharge port 34a. It will flow into the extension 34c extending to the outer edge. For this reason, the chemical | medical solution which spreads along the outer edge of the upper surface 31c can be efficiently guide | induced to the discharge port 34a by the liquid collection groove | channel 34b.

  The chemical liquid that has flowed into the second gas flow path 34 through the discharge port 34a accumulates in the recess 34d provided below the discharge port 34a in the second gas flow path 22, and is less likely to flow further than the recess 34d. Then, the chemical liquid accumulated in the recess 34 d is vaporized by the heat of the heater 80. At this time, the temperature in the vicinity of the recess 34d is lowered by the heat of vaporization of the chemical in the recess 34d.

  Therefore, the controller 70 detects that the chemical liquid has flowed into the second gas flow path 34 when the temperature of the third portion detected by the third temperature sensor 85 has dropped below the determination temperature range. And the controller 70 stops the discharge operation of the chemical solution by the pump. Thereafter, after the temperature of the third portion detected by the third temperature sensor 85 rises and converges to a certain temperature, the controller 70 resumes the chemical solution discharge operation by the pump.

  The embodiment described above has the following advantages.

  The mesh 47 has a fine structure that promotes the spread of the chemical solution supplied to the upper surface 31c. For this reason, the chemical | medical solution supplied to the upper surface 31c spreads along the upper surface 31c by interfacial tension in a fine structure. And the chemical | medical solution which spread along the upper surface 31c from the supply port 35a to which a chemical | medical solution is supplied in the upper surface 31c is heated from the inside of the main body 31 with the heater 80. FIG. Thereby, a chemical | medical solution can be vaporized by a large area in the upper surface 31c.

  Here, the first temperature sensor 83 detects the temperature of the first portion inside the main body 31 between the supply port 35a and the heater 80 in the spreading direction of the upper surface 31c. Since the first portion is located closer to the heater 80 than the supply port 35a in the spreading direction of the upper surface 31c, the change in the amount of heat generated by the heater 80 is quickly reflected. Then, the controller 70 controls the amount of heat generated by the heater 80 based on the temperature of the first portion detected by the first temperature sensor 83. For this reason, the responsiveness at the time of controlling the temperature of the main body 31 by the heater 80 can be maintained.

  Further, the second temperature sensor 84 detects the temperature of the second portion inside the main body 31 on the opposite side of the first portion across the supply port 35a in the spreading direction of the upper surface 31c. The second portion is a position farther from the heater 80 than the supply port 35a in the spreading direction of the upper surface 31c. For this reason, the temperature of the second portion is not easily affected by the change in the amount of heat generated by the heater 80, and accurately reflects the vaporization state of the chemical solution. Then, a predetermined monitoring process is executed by the controller 70 based on the temperature of the second portion detected by the second temperature sensor 84. Therefore, the chemical vaporization process can be accurately monitored.

  The first part and the second part are set to a part near the upper surface 31 c inside the main body 31 in a direction perpendicular to the upper surface 31 c, that is, a part near the upper surface 31 c inside the main body 31. For this reason, the temperature of the upper surface 31c in contact with the chemical solution can be accurately detected based on the detected temperature in the first portion, and as a result, the temperature of the upper surface 31c can be accurately controlled. Further, it is possible to accurately detect a temperature change caused by the vaporization of the chemical liquid on the upper surface 31c based on the detected temperature in the second portion, and thus to accurately monitor the vaporization state of the chemical liquid on the upper surface 31c. it can.

  The transition of the temperature of the second portion detected by the second temperature sensor 84 is displayed on the monitor 71. For this reason, the user can determine whether or not the chemical liquid vaporization process is normal by observing the transition of the temperature of the second portion displayed on the monitor 71.

  -The temperature of the second part accurately reflects the vaporization state of the chemical. In this respect, since an abnormality is detected based on the temperature of the second portion detected by the second temperature sensor 84, an abnormality in the chemical vaporization process can be appropriately detected.

  In the state in which the amount of heat generated by the heater 80 is controlled by the controller 70, if the temperature of the second portion detected by the second temperature sensor 84 falls below the determination temperature range, the heating by the heater 80 is abnormal. It is detected that it has occurred. Therefore, it can be detected that the heating by the heater 80 is not properly performed. Further, in the above case, the controller 70 can detect that the chemical liquid has been supplied to the upper surface 31c.

  -Since the vaporization of the chemical liquid is detected based on the temperature of the second portion detected by the second temperature sensor 84, it is possible to accurately detect the vaporization of the chemical liquid on the upper surface 31c.

  In the state where the temperature of the second part detected by the second temperature sensor 84 is maintained at 75 ° C., the temperature of the second part detected by the second temperature sensor 84 rises to 75 ° C. When maintained, supply of chemicals and vaporization are detected. Therefore, it is possible to accurately detect that the chemical liquid is supplied from the supply port 35a and that the supplied chemical liquid is vaporized.

  In the state in which the amount of heat generated by the heater 80 is controlled by the controller 70, if the temperature of the first portion detected by the first temperature sensor 83 falls below the determination temperature range, the heating by the heater 80 is abnormal. It is detected that it has occurred. Therefore, it can be detected that the heating by the heater 80 is not properly performed. Further, in the above case, the controller 70 can detect that the chemical liquid has been supplied to the upper surface 31c.

  Since a mesh band 52 that is in contact with the mesh 47 with the mesh 47 interposed between the main body 31 and the mesh 47 is provided, a plurality of interfaces are also formed between the mesh 47 and the mesh band 52. Therefore, the chemical solution can be spread between the mesh 47 and the mesh band 52 by the interfacial tension. For this reason, in the part in which the mesh band 52 is provided, the spread of the chemical solution can be promoted more than in other parts. As a result, by adjusting the arrangement of the mesh band 52, the chemical solution in contact with the upper surface 31c can be preferentially spread in a desired direction.

  -Since the mesh band 52 is knitted in a mesh shape, the evaporation of the chemical solution through the mesh band 52 is promoted as compared with the case where the mesh band 52 is formed in a plate shape or a film shape. Can do. For this reason, it is possible to promote the evaporation of the chemical solution while preferentially spreading the chemical solution in contact with the upper surface 31c in a desired direction.

  In the main body 31, a chemical liquid flow path 35 for circulating a chemical liquid is provided, and an opening at the upper surface 31 c of the chemical liquid flow path 35 forms a chemical liquid supply port 35 a. For this reason, a chemical | medical solution can be supplied to the upper surface 31c, using the space inside the main body 31 effectively. And the position where a chemical | medical solution is supplied to the upper surface 31c through the supply port 35a can be employ | adopted as the said supply port 35a.

  Further, the mesh 47 and the mesh band 52 cover the portion of the upper surface 31c corresponding to the first portion, the portion of the upper surface 31c corresponding to the second portion, and the supply port 35a. For this reason, the chemical solution supplied from the supply port 35a can be preferentially spread in the direction of the first portion and the direction of the second portion in the spreading direction of the upper surface 31c. Therefore, the amount of heat generated by the heater 80 can be controlled based on the temperature of the first portion while sufficiently supplying the chemical solution to the portion corresponding to the first portion of the upper surface 31c. As a result, the vaporization state of the chemical solution can be controlled in a state where the chemical solution is stably supplied. Moreover, a predetermined monitoring process can be executed based on the temperature of the second portion while sufficiently supplying the chemical solution to the portion corresponding to the second portion of the upper surface 31c. As a result, the chemical vaporization process can be monitored in a state where the chemical is stably supplied.

  The spread of the chemical solution to the side opposite to the supply port 35a across the second portion in the spreading direction of the upper surface 31c is suppressed by the suppression groove 41 provided on the upper surface 31c. And supply of the chemical | medical solution to the part corresponding to a 2nd part among the upper surfaces 31c can be accelerated | stimulated by suppressing the spreading of the chemical | medical solution to the opposite side to the supply port 35a across the 2nd part. As a result, the chemical vaporization process can be monitored while the chemical is supplied more stably.

  The first gas flow path 33 and the second gas flow path 34 for circulating gas are provided inside the main body 31, and the openings at the upper surfaces 31c of the first gas flow path 33 and the second gas flow path 34 are A gas inlet 33a and an outlet 34a are formed respectively. For this reason, it is possible to effectively use the space inside the main body 31 to introduce the gas into the space around the upper surface 31c and to discharge the gas from the space around the upper surface 31c. At this time, spreading of the chemical in contact with the upper surface 31c in the gas flow direction is promoted. Since the gas inlet 33a and the outlet 34a are provided with the heater 80 in between, the spread of the chemical in the direction passing through the heater 80 can be promoted. As a result, the heating of the chemical solution by the heater 80 can be promoted.

  The main body 31 is arranged so that the upper surface 31c is on the upper side, and the second gas channel 34 is formed with a recess 34d that is recessed below the second gas channel 34. For this reason, the chemical liquid that has flowed into the second gas flow path 34 accumulates in the recess 34 d formed in the second gas flow path 34. Therefore, the chemical liquid can be prevented from being discharged through the second gas flow path 34 without being vaporized. Furthermore, the chemical liquid accumulated in the recess 34 d can be vaporized by the heat of the heater 80.

  The temperature of the third portion in the vicinity of the recess 34 d inside the main body 31 is detected by the third temperature sensor. Then, the controller 70 detects that the chemical liquid has flowed into the second gas flow path 34 when the temperature of the third portion detected by the third temperature sensor has dropped beyond the determination temperature range. Therefore, it is possible to appropriately detect that the chemical liquid has flowed into the second gas flow path 34, and it is possible to perform measures such as stopping the supply of the chemical liquid.

  In addition, the said embodiment can also be deform | transformed and implemented as follows. About the same member as the said embodiment, description is abbreviate | omitted by attaching | subjecting the same code | symbol.

  FIG. 14 is a perspective view showing a modification of the main body 31 of the liquid vaporizer 30. As shown in the figure, it is also possible to adopt a configuration in which the introduction port 33a is in direct communication with the circular arc portion 141a of the suppression groove 141. Even with such a configuration, since the inert gas is introduced into the suppression groove 141 from the inside of the main body 31 through the introduction port 33a, the inert gas can be circulated in the flow path formed by the suppression groove 141 and the mesh 47. it can. And it can suppress that a chemical | medical solution spreads over the suppression groove | channel 141 by the inert gas which distribute | circulates the inside of the suppression groove | channel 141, and blows off from the mesh | network of the mesh 47. FIG. As shown in the figure, the temperature sensor insertion holes 37a and 37b (temperature sensors 83 and 84) can be arranged at the approximate center of the main body 31 in the vertical direction.

  FIG. 15 is a perspective view showing another modification of the main body 31 of the liquid vaporizer 30. As shown in the figure, a restraining groove 241 that connects the recess 42 and the discharge port 34a can be employed on the upper surface 31c of the main body 31. According to such a configuration, not only the chemical liquid flowing into the liquid collecting groove 34b described above but also the chemical liquid flowing into the suppression groove 241 can be guided to the discharge port 34a. Further, the suppression groove 241 surrounds the entire circumference of the supply port 35a. For this reason, it can suppress that a chemical | medical solution overflows from the upper surface 31c.

  Further, as shown in the figure, the chemical liquid channel 35 and the supply port 35a can be omitted, and the chemical liquid can be supplied to the supply position 235a from above. In this case, a chemical liquid flow path for distributing the chemical liquid up to the supply position 235a is provided. In addition, as shown to the figure, the temperature sensor insertion hole 37a (1st temperature sensor 83) can also be arrange | positioned near the lower surface 31e of the main body 31 in the up-down direction.

  FIG. 16 is a perspective view showing another modification of the main body 31 of the liquid vaporizer 30. As shown in the figure, the main body 131 is formed with an introduction port 33a and a discharge port 34a on a diagonal line of the upper surface 31c. A suppression groove 341 parallel to the liquid collection groove 34 b is provided on the upper surface 31 c, and the introduction port 33 a communicates with the suppression groove 341. Even with such a configuration, the inert gas introduced into the suppression groove 341 flows along the suppression groove 341. Here, temperature sensor insertion holes 337 a and 337 b extending from the lower side to the upper side (in the thickness direction of the main body 131) are provided on the main body 131. Then, the first temperature sensor 83 and the second temperature sensor 84 are inserted into the temperature sensor insertion holes 337a and 337b, respectively, and the temperature near the upper surface 31c is detected.

  Also with the above configuration, the inert gas blown out from the mesh 47 in the portion of the suppression groove 341 is the temperature sensor insertion hole 337b (second temperature sensor 84), the supply port 35a, and the temperature sensor insertion hole 337a (first temperature sensor 83). ), Sequentially passing over the heater insertion hole 36 (heater 80) and discharged from the discharge port 34a. Accordingly, the spread of the chemical solution from the supply port 35a to the heater 80 side and the temperature sensor 83 side and the circulation of the chemical solution vapor can be promoted by the inert gas.

  FIG. 17 is a perspective view showing a modified example around the second gas flow path 34. As shown in the figure, a liquid collecting groove 34e may be provided between the supply port 35a (supplied position) and the discharge port 34a in the spreading direction of the upper surface 31c. The liquid collecting groove 34e extends in a direction perpendicular to the direction from the supply port 35a toward the discharge port 34a in the spreading direction of the upper surface 31c. The height of the opening surface of the discharge port 34a is higher than the height of the opening surface of the liquid collecting groove 34e. For this reason, a chemical | medical solution will flow into the liquid collection groove | channel 34e, and it can suppress that a chemical | medical solution flows into the discharge port 34a. As shown in the figure, the second gas flow path 34 can be provided at a position near the upper surface 31 c inside the main body 31.

  In the main body 31, a temperature sensor insertion hole 437c (third temperature sensor 485) is provided below the liquid collection groove 34e. The temperature sensor insertion hole 437c (third temperature sensor 485) extends in the short direction of the upper surface 31c. The third temperature sensor 485 detects the temperature of the third portion near the bottom of the liquid collecting groove 34e. According to such a configuration, when the temperature of the third portion detected by the third temperature sensor decreases beyond the determination temperature range, the controller 70 appropriately detects that the chemical liquid has flowed into the liquid collection groove 34e. Therefore, it is possible to perform a treatment such as stopping the supply of the chemical solution.

  When the temperature of the first part (second part) detected by the first temperature sensor 83 (second temperature sensor 84) does not increase for a period longer than the predetermined period, an abnormality has occurred in heating by the heater 80. You may detect that.

  The controller 70 can also digitally display the temperature of the first part and the temperature of the second part on the monitor 71.

  A temperature fuse may be provided in the liquid vaporizer 30, and when the temperature of the liquid vaporizer 30 becomes higher than a predetermined temperature, the heating of the heater 80 may be stopped by the temperature fuse.

  A liquid sensor that detects liquid may be attached to the recess 34 d of the second gas flow path 34. And the chemical | medical solution collected in the recessed part 34d can also be detected with a liquid sensor.

  -The 1st shielding member 50 can also be provided in the outer side of the mesh band 52. FIG. Moreover, the 1st shielding member 50 should just cover the supply port 35a, and can change the shape arbitrarily.

  The knitting method (weaving method) of the mesh 47 and the mesh band 52 is not limited to plain weaving, and other weaving methods such as twill weaving can also be adopted. Further, the roughness of the mesh 47 and the mesh band 52 should be appropriately set in the range of about 100 to 500 mesh according to the wettability of the chemical solution with respect to them, the wettability of the chemical solution with respect to the main body 31, the viscosity of the chemical solution, and the like. Is desirable.

  In each of the above embodiments, the mesh band 52 is knitted in a mesh shape, but these can be formed in a film shape. In this case, since the band formed in a film shape functions as the first shielding member 50, the first shielding member 50 may be omitted. Also, the first shielding member 50 may be omitted when the supply pressure of the chemical liquid is low and the possibility that the chemical liquid is ejected through the mesh 47 or the mesh band 52 is low. On the contrary, the mesh band 52 may not be provided in the portion where the first shielding member 50 is provided. That is, the mesh band 52 can be provided only in a portion where the first shielding member 50 is not provided. Note that the mesh band 52 may be formed in a plate shape.

  -The shape of the main body 31 is not limited to an oval columnar shape on the bottom surface, and other shapes such as a rectangular parallelepiped shape can also be adopted. Further, the upper surface 31c (surface to be supplied) of the main body 31 is not limited to a flat surface, and a curved surface may be employed.

  The suppression grooves 41, 141, 241, and 341 can be omitted.

  A structure in which fine irregularities are formed on the upper surface 31c can be adopted as a fine structure that promotes the spread of the chemical solution supplied to the upper surface 31c. In this case, the fine concavo-convex structure on the upper surface 31c constitutes the promoting portion, so that the mesh 47 can be omitted.

  -The chemical solution is not limited to the hydrophobizing treatment solution (HMDS), and other chemical solutions such as a thinner solvent and a silane coupling agent may be employed. In that case, it is desirable to change the material of the mesh 47 and the mesh band 52 according to the wettability with a chemical | medical solution. As these materials, for example, metals or resins other than stainless steel can be used. Further, the liquid vaporizer 30 is not limited to the liquid control device 10 and can be applied to other devices such as a chemical solution applicator and a film forming device.

  DESCRIPTION OF SYMBOLS 10 ... Liquid control apparatus, 21 ... 1st gas flow path, 22 ... 2nd gas flow path, 23 ... Chemical liquid flow path (liquid flow path), 30 ... Liquid vaporizer, 31 ... Main body, 33 ... 1st gas flow path 33a ... inlet, 34 ... second gas channel, 34a ... discharge port, 34d ... recess, 34e ... liquid collecting groove, 35 ... chemical channel (liquid channel), 35a ... supply port, 41 ... inhibiting groove ( Groove), 47 ... mesh (promotion part, mesh body), 52 ... mesh band (promotion part, mesh body, guide member), 70 ... controller (control part, monitoring part), 71 ... monitor (display part), 80 ... Heater, 83 ... first temperature sensor, 84 ... second temperature sensor, 85 ... third temperature sensor, 131 ... main body, 141 ... suppression groove (groove), 235a ... supplied position, 241 ... suppression groove (groove), 341 ... suppression groove (groove), 485 ... third temperature sensor.

Claims (18)

A liquid control device for controlling the spread and vaporization of liquid,
A main body having a supply surface to which the liquid is supplied;
An accelerating portion having a microstructure that promotes the spread of the liquid supplied to the surface to be supplied;
A heater for heating the supplied surface from the inside of the main body at a position away from the supplied position on the supplied surface to which the liquid is supplied in the spreading direction of the supplied surface;
A first temperature sensor for detecting a temperature of a first part inside the main body between the supplied position and the heater in the spreading direction of the supplied surface;
A second temperature sensor for detecting the temperature of the second part inside the main body on the opposite side of the first part across the supply position in the spreading direction of the supply surface;
A controller that controls the amount of heat generated by the heater based on the temperature of the first portion detected by the first temperature sensor;
A monitoring unit that executes a predetermined monitoring process based on the temperature of the second portion detected by the second temperature sensor;
A liquid control apparatus comprising:   2. The liquid control device according to claim 1, wherein the first portion and the second portion are portions closer to the supplied surface inside the main body in a direction perpendicular to the supplied surface. A display unit for displaying images;
The liquid control device according to claim 1, wherein the monitoring unit displays a transition of the temperature of the second portion detected by the second temperature sensor on the display unit as the monitoring process.   The liquid control apparatus according to claim 1, wherein the monitoring unit detects an abnormality based on a temperature of the second portion detected by the second temperature sensor as the monitoring process.   In the state where the heating value of the heater is controlled by the control unit, the monitoring unit, when the temperature of the second portion detected by the second temperature sensor falls below a determination temperature range, The liquid control apparatus according to claim 4, wherein an abnormality in heating by the heater is detected.   The liquid control according to claim 1, wherein the monitoring unit detects vaporization of the liquid based on a temperature of the second portion detected by the second temperature sensor as the monitoring process. apparatus.   After the temperature of the second part detected by the second temperature sensor is lowered in a state where the temperature of the second part detected by the second temperature sensor is maintained at a predetermined temperature, the monitoring unit The liquid control apparatus according to claim 6, wherein the liquid supply and the vaporization are detected when the liquid temperature is maintained up to the predetermined temperature.   In the state where the heating value of the heater is controlled by the control unit, the monitoring unit, when the temperature of the first portion detected by the first temperature sensor has dropped beyond a determination temperature range, The liquid control apparatus according to any one of claims 1 to 7, which detects that an abnormality has occurred in heating by a heater. The promoting portion is a mesh body knitted in a mesh shape and provided so as to contact the surface to be supplied.
The liquid control device according to claim 1, further comprising a guide member that contacts the mesh body with the mesh body sandwiched between the main body.   The liquid control device according to claim 9, wherein the guide member is knitted in a mesh shape. Inside the main body, a liquid flow path for circulating the liquid is provided,
The liquid flow path opens at the supply surface to form the liquid supply port,
The supplied position is a position where the liquid is supplied to the supplied surface through the supply port;
The mesh and the guide member cover a portion corresponding to the first portion of the supplied surface, a portion corresponding to the second portion of the supplied surface, and the supply port. Or the liquid control apparatus of 10.   The groove of the said to-be-supplied surface is provided with the groove | channel which suppresses the spreading | diffusion of the said liquid to the opposite side to the said to-be-supplied position on both sides of the said 2nd part in the spreading direction of the said to-be-supplied surface. The liquid control apparatus according to any one of the above. Inside the main body, a first gas channel and a second gas channel for circulating gas are provided,
The first gas channel is opened at the supply surface to form the gas inlet,
The second gas flow path opens at the supply surface to form the gas discharge port,
The liquid control apparatus according to claim 1, wherein the introduction port and the discharge port are provided with the heater interposed therebetween. The main body is arranged so that the supplied surface is on the upper side,
The liquid control device according to claim 13, wherein the second gas flow path is formed with a recess that is recessed downward than the second gas flow path. A third temperature sensor for detecting a temperature of a third portion in the vicinity of the recess in the body;
The said monitoring part detects that the said liquid flowed into the said 2nd gas flow path, when the temperature of the said 3rd part detected by the said 3rd temperature sensor falls exceeding the determination temperature range. 14. The liquid control device according to 14. The main body is arranged so that the supplied surface is on the upper side,
The liquid control device according to claim 13, wherein a liquid collecting groove is provided between the supply position and the discharge port in a direction in which the supply surface expands.   The liquid control device according to claim 16, wherein the height of the opening surface of the discharge port is higher than the height of the opening surface of the liquid collecting groove. A third temperature sensor for detecting a temperature of a third portion below the liquid collecting groove inside the main body;
The said monitoring part detects that the said liquid flowed into the said liquid collection groove | channel, when the temperature of the said 3rd part detected by the said 3rd temperature sensor falls exceeding the determination temperature range. 18. The liquid control device according to 17.

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