JPH07155584A - Raw gas feeder - Google Patents
Raw gas feederInfo
- Publication number
- JPH07155584A JPH07155584A JP12221991A JP12221991A JPH07155584A JP H07155584 A JPH07155584 A JP H07155584A JP 12221991 A JP12221991 A JP 12221991A JP 12221991 A JP12221991 A JP 12221991A JP H07155584 A JPH07155584 A JP H07155584A
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- evaporation tank
- tank
- liquid raw
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、光ファイバ等の製造装
置における反応装置、例えばバーナーに原料ガスを供給
する原料ガス供給装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a raw material gas supply device for supplying a raw material gas to a reactor, for example, a burner in an optical fiber manufacturing apparatus.
【０００２】[0002]
【従来の技術】従来、このような原料ガス供給装置とし
ては、例えば、図２に示すような構造のものが、特公昭
６０−３１７７７号公報、特公昭６３−２０７７２号公
報等により公知である。すなわち、従来の原料ガス供給
装置は、図２に示すように、液体原料供給用配管１から
導入される液体原料２を収容する蒸発槽３と、該蒸発槽
３の周囲に配置され、蒸発槽３内の液体原料２を加熱す
るヒータ４とを備えて成り、蒸発槽３内の液体原料を気
化させ、気化した原料ガスとキャリアガス供給用配管５
から導入されるキャリアガス６との混合気を混合気送出
用配管７及び流量制御装置８を介してバーナ（光ファイ
バ製造装置の反応装置）９に供給するものである。該バ
ーナ９に供給される混合気中の原料ガス成分は、バーナ
９の炎９ａで酸化されて粒状の生成酸化物となり、この
酸化物が炎９ａの力により棒状の素材（例えば、石英の
ロッド）１０に送られる。このようにして、一般にスー
トと呼ばれている焼結可能なガラスすすが石英ロッド１
０の表面に堆積して光ファイバー用のプリフォーム（母
材）１１が製造される。なお、前記混合気送出用配管７
の周囲には、該配管７を蒸発槽３よりも高い温度に維持
して混合気中の原料ガスが凝縮するのを防止するため
に、ヒータ１２，１３が配置されている。2. Description of the Related Art Conventionally, as such a raw material gas supply device, for example, a structure as shown in FIG. 2 is known from Japanese Patent Publication No. 60-31777 and Japanese Patent Publication No. 63-20772. . That is, as shown in FIG. 2, the conventional raw material gas supply apparatus includes an evaporation tank 3 for containing a liquid raw material 2 introduced from a liquid raw material supply pipe 1, and an evaporation tank 3 arranged around the evaporation tank 3. And a heater 4 for heating the liquid raw material 2 in the vaporization chamber 3, vaporize the liquid raw material in the evaporation tank 3, and vaporize the raw material gas and the carrier gas supply pipe 5.
The gas mixture with the carrier gas 6 introduced from the above is supplied to the burner (reactor of the optical fiber manufacturing apparatus) 9 through the gas mixture delivery pipe 7 and the flow rate control device 8. The raw material gas component in the air-fuel mixture supplied to the burner 9 is oxidized by the flame 9a of the burner 9 to form a granular oxide, and this oxide is a rod-shaped material (for example, a quartz rod) due to the force of the flame 9a. ) Sent to 10. In this way, the sinterable glass soot generally called soot is the quartz rod 1.
Preform (base material) 11 for optical fiber is manufactured by depositing on the surface of No. 0. In addition, the air-fuel mixture delivery pipe 7
Heaters 12 and 13 are arranged around the circumference of in order to maintain the pipe 7 at a temperature higher than that of the evaporation tank 3 and prevent the raw material gas in the air-fuel mixture from condensing.
【０００３】[0003]
【発明が解決しようとする課題】一般に、前記光ファイ
バー用の母材１１を製造する際に、前記蒸発槽３内で気
化されてバーナ９に供給される原料ガス又はこれとキャ
リアガスとの混合気の量を増やすことにより、母材１１
の時間当りの製造量を多くして母材の製造効率の向上を
図ることが望まれている。原料ガス又は混合気の供給量
を増やすためには、蒸発槽３内の液体原料２の蒸発面積
を大きくする必要がある。Generally, when manufacturing the base material 11 for the optical fiber, the raw material gas which is vaporized in the evaporation tank 3 and is supplied to the burner 9 or a mixture gas of the raw material gas and the carrier gas is generally used. By increasing the amount of
It is desired to increase the production amount per hour to improve the production efficiency of the base material. In order to increase the supply amount of the raw material gas or the air-fuel mixture, it is necessary to increase the evaporation area of the liquid raw material 2 in the evaporation tank 3.
【０００４】ところが、上記従来の原料ガス供給装置で
は、液体原料２が蒸発槽３の底部に単に収容されている
だけであるので、原料ガスの蒸発量を多くするために蒸
発槽３内の液体原料２の蒸発面積を大きくすると、蒸発
槽３の横方向の寸法が大きくなって蒸発槽３自体が大型
化し、その結果原料ガス供給装置全体が大型化してしま
うという問題点がある。However, in the above-mentioned conventional raw material gas supply device, since the liquid raw material 2 is simply contained in the bottom portion of the evaporation tank 3, the liquid in the evaporation tank 3 is increased in order to increase the evaporation amount of the raw material gas. When the evaporation area of the raw material 2 is increased, the lateral dimension of the evaporation tank 3 is increased and the evaporation tank 3 itself is increased in size, and as a result, the entire source gas supply device is increased in size.
【０００５】また、上記特公昭６３−２０７７２号公報
に開示された原料ガス供給装置のように、前記蒸発槽３
を複数設けることにより原料ガスの蒸発量を多くするこ
とが可能である。しかしながら、この場合には、各蒸発
槽３と前記バーナ９とを接続する配管構造が複雑になる
と共に、これらの配管構造及び複数の蒸発槽を含む原料
ガス供給装置全体が大型化してしまうという問題点があ
る。Further, as in the raw material gas supply device disclosed in Japanese Patent Publication No. 63-20772, the evaporation tank 3 is used.
It is possible to increase the amount of evaporation of the raw material gas by providing a plurality of. However, in this case, the piping structure connecting each evaporation tank 3 and the burner 9 becomes complicated, and the entire raw material gas supply device including these piping structures and a plurality of evaporation tanks becomes large in size. There is a point.
【０００６】本発明は、このような従来の問題点に着目
して為されたもので、蒸発槽自体及び装置全体を大型化
することなく、液体原料の蒸発面積を大きくして原料ガ
ス又はこれとキャリアガスとの混合気の供給量を大幅に
増やすことができ、その結果光ファイバー用母材等の製
造効率の大幅な向上を図った原料ガス供給装置を提供す
ることを目的としている。The present invention has been made by paying attention to such conventional problems, and it is possible to increase the evaporation area of the liquid raw material by increasing the evaporation area of the liquid raw material without increasing the size of the evaporation tank itself and the entire apparatus. It is an object of the present invention to provide a raw material gas supply device capable of significantly increasing the supply amount of a gas mixture of a carrier gas and a carrier gas, and as a result, greatly improving the production efficiency of a base material for optical fibers and the like.
【０００７】[0007]
【課題を解決するための手段】上記課題を達成するため
に、本発明は、液体原料を収容する蒸発槽と、該蒸発槽
内の液体原料を加熱するヒータとを備え、蒸発槽内の液
体原料を気化させ、気化した原料ガスを送出する原料ガ
ス供給装置において、前記蒸発槽内に、複数の皿状容器
が上下方向に間隔をおいて配置されており、前記複数の
皿状容器のうちの最上部の容器は、蒸発槽内に供給され
る液体原料を受ける位置に配置されていると共に、最下
部の容器は、蒸発槽の底面から所定の間隔をおいた位置
に配置されているものである。In order to achieve the above object, the present invention comprises an evaporation tank for containing a liquid raw material and a heater for heating the liquid raw material in the evaporation tank. In a raw material gas supply device for vaporizing a raw material and delivering the vaporized raw material gas, a plurality of dish-shaped containers are arranged at intervals in the vertical direction in the evaporation tank, and among the plurality of dish-shaped containers, The uppermost container is placed at a position for receiving the liquid raw material supplied into the evaporation tank, and the lowermost container is arranged at a predetermined distance from the bottom surface of the evaporation tank. Is.
【０００８】[0008]
【作用】そして、上記原料ガス供給装置では、蒸発槽内
に供給される液体原料が複数の皿状容器のうちの最上部
の容器に溜り、該最上部の容器から溢れた液体原料が順
次下方の容器に溜り、最下部の容器から溢れた液体原料
が蒸発槽の底部に溜る。このように、液体原料は、蒸発
槽の底部及び複数の皿状容器内に溜るので、蒸発槽内の
液体原料をヒータにより加熱する際に、複数の皿状容器
内に溜った液体原料の分だけ蒸発面積が大きくなる。In the above-mentioned raw material gas supply device, the liquid raw material supplied into the evaporation tank is accumulated in the uppermost container of the plurality of dish-shaped containers, and the liquid raw material overflowing from the uppermost container is sequentially lowered. The liquid raw material that collects in the container and overflows from the bottom container collects in the bottom of the evaporation tank. In this way, since the liquid raw material accumulates in the bottom of the evaporation tank and in the plurality of dish-shaped containers, when the liquid raw material in the evaporation tank is heated by the heater, the amount of the liquid raw material accumulated in the plurality of dish-shaped containers is Only the evaporation area becomes large.
【０００９】[0009]
【実施例】以下、図面に基いて本発明の一実施例を説明
する。なお、一実施例の説明において、上記従来例と同
様の部位には同一の符号を付して重複した説明を省略す
る。An embodiment of the present invention will be described below with reference to the drawings. In the description of one embodiment, the same parts as those in the above-mentioned conventional example are designated by the same reference numerals, and the duplicated description will be omitted.
【００１０】図１に示すように、一実施例に係る原料ガ
ス供給装置の蒸発槽３内には、複数（例えば、４つ）の
皿状容器３１，３２，３３，３４が上下方向に間隔をお
いて配置されていると共に、これらの皿状容器３１，３
２，３３，３４を支持する支柱３５が配置されている。
該支柱３５には、皿状容器３１，３２，３３，３４が間
隔をおいて固定されている。As shown in FIG. 1, a plurality of (for example, four) dish-shaped containers 31, 32, 33, 34 are vertically spaced in the evaporation tank 3 of the raw material gas supply apparatus according to one embodiment. These dish-shaped containers 31, 3 are arranged at
Posts 35 that support 2, 33, and 34 are arranged.
Dish-shaped containers 31, 32, 33, 34 are fixed to the support column 35 at intervals.
【００１１】前記複数の皿状容器のうちの最上部の容器
３１は、蒸発槽３内に供給される液体原料（例えば、四
塩化ケイ素）２を受ける位置に配置されていると共に、
最下部の容器３４は、蒸発槽３の底面３ａから所定の間
隔をおいた位置に配置されている。ここで、底面３ａか
ら所定の間隔をおいた位置とは、蒸発槽３の底部に溜る
液体原料２の液面の上限位置から離れた位置である。そ
して、各皿状容器３１，３２，３３，３４の下端面全体
には、該各容器から溢れた液体原料を毛管現象と表面張
力により保持して蒸発面積を増やすために、金網３６が
固定されている。The uppermost container 31 of the plurality of dish-shaped containers is arranged at a position for receiving the liquid raw material (for example, silicon tetrachloride) 2 supplied into the evaporation tank 3, and
The lowermost container 34 is arranged at a position spaced from the bottom surface 3 a of the evaporation tank 3 by a predetermined distance. Here, the position spaced from the bottom surface 3a by a predetermined distance is a position apart from the upper limit position of the liquid surface of the liquid raw material 2 accumulated at the bottom of the evaporation tank 3. A wire mesh 36 is fixed to the entire lower end surface of each dish-shaped container 31, 32, 33, 34 in order to increase the evaporation area by holding the liquid raw material overflowing from each container by capillarity and surface tension. ing.
【００１２】また、蒸発槽３の底部には、該底部に溜る
液体原料２の液面を管理するための液面センサ４０が配
置されている。この液面センサ４０は、フロート４１
と、該フロート４１に装着された不図示の上限及び下限
スイッチとから構成されている。下限スイッチは、蒸発
槽３の底部に溜る液体原料２の液面が上限位置に達した
ときに作動するもので、下限スイッチは、その液面が下
限位置に達したときに作動するものである。A liquid level sensor 40 for controlling the liquid level of the liquid raw material 2 accumulated at the bottom of the evaporation tank 3 is arranged. The liquid level sensor 40 includes a float 41.
And an upper and lower limit switch (not shown) mounted on the float 41. The lower limit switch is operated when the liquid level of the liquid raw material 2 accumulated at the bottom of the evaporation tank 3 reaches the upper limit position, and the lower limit switch is operated when the liquid level reaches the lower limit position. .
【００１３】次に、上記構成を有する一実施例に係る原
料ガス供給装置の作動を説明する。Next, the operation of the raw material gas supply device according to the embodiment having the above structure will be described.
【００１４】蒸発槽３内には、前記液体原料供給用配管
１から液体原料２が導入されると共に、前記キャリアガ
ス供給用配管５からキャリアガス（例えば、水素ガス）
６が導入される。Into the evaporation tank 3, the liquid raw material 2 is introduced from the liquid raw material supply pipe 1 and the carrier gas (for example, hydrogen gas) is supplied from the carrier gas supply pipe 5.
6 is introduced.
【００１５】蒸発槽３内に供給される液体原料２は、ま
ず４つの皿状容器３１〜３４のうちの最上部の容器３１
内に溜り、該最上部の容器３１から溢れた液体原料は、
順次下方の容器３２，３３及び３４に溜り、最下部の容
器３４から溢れた液体原料は蒸発槽３の底部に溜る。ま
た、各容器３１〜３４から溢れた液体原料は、各容器３
１〜３４の下端面に固定された金網３６に毛管現象と表
面張力により保持される。The liquid raw material 2 supplied to the evaporation tank 3 is firstly the uppermost container 31 of the four dish-shaped containers 31 to 34.
The liquid raw material accumulated inside and overflowing from the uppermost container 31 is
The liquid raw material which is successively accumulated in the lower containers 32, 33 and 34 and overflows from the lowermost container 34 is accumulated at the bottom of the evaporation tank 3. In addition, the liquid raw material overflowing from each container 31 to 34 is
The wire netting 36 fixed to the lower end surfaces of 1-34 is held by capillarity and surface tension.
【００１６】このように、蒸発槽３内に供給される液体
原料２は、蒸発槽３の底部、４つの皿状容器３１〜３４
内、及び４つの金網３６に溜るので、蒸発槽３内の液体
原料２を前記ヒータ４により加熱する際に、４つの皿状
容器３１〜３４内及び４つの金網３６に溜った液体原料
２の分だけ蒸発面積が大きくなる。これによって、液体
原料２の蒸発量、すなわち原料ガスとキャリアガスとの
混合気の供給量が大幅に増え、その結果前記光ファイバ
ー用母材１１等の製造効率の大幅な向上が図られる。In this way, the liquid raw material 2 supplied into the evaporation tank 3 is the bottom of the evaporation tank 3 and the four dish-shaped containers 31 to 34.
Since the liquid raw material 2 collects in the inside and four wire nets 36, when the liquid raw material 2 in the evaporation tank 3 is heated by the heater 4, The evaporation area increases by that amount. As a result, the evaporation amount of the liquid raw material 2, that is, the supply amount of the mixed gas of the raw material gas and the carrier gas is significantly increased, and as a result, the manufacturing efficiency of the optical fiber preform 11 and the like is significantly improved.
【００１７】なお、上記一実施例の原料ガス供給装置
は、気化された原料ガスとキャリアガスとの混合気を送
出するように構成されているが、本発明の原料ガス供給
装置はこれに限定されるものではなく、液体原料の種類
によってはキャリアガスを用いずに原料ガスのみを送出
するものであってもよい。The raw material gas supply device of the above embodiment is configured to deliver a mixture of vaporized raw material gas and carrier gas, but the raw material gas supply device of the present invention is not limited to this. However, depending on the type of liquid raw material, only the raw material gas may be delivered without using the carrier gas.
【００１８】[0018]
【発明の効果】以上詳述したように、本発明によれば、
液体原料を収容する蒸発槽と、該蒸発槽内の液体原料を
加熱するヒータとを備え、蒸発槽内の液体原料を気化さ
せ、気化した原料ガスを送出する原料ガス供給装置にお
いて、前記蒸発槽内に、複数の皿状容器が上下方向に間
隔をおいて配置されており、前記複数の皿状容器のうち
の最上部の容器は、蒸発槽内に供給される液体原料を受
ける位置に配置されていると共に、最下部の容器は、蒸
発槽の底面から所定の間隔をおいた位置に配置されてい
る構成により、液体原料は、蒸発槽の底部及び複数の皿
状容器内に溜るので、蒸発槽内の液体原料をヒータによ
り加熱する際に、複数の皿状容器内に溜った液体原料の
分だけ蒸発面積が大きくなる。従って、蒸発槽の横方向
の寸法を大きくすることなく、すなわち蒸発槽自体及び
装置全体を大型化することなく、液体原料の蒸発面積を
大きくして原料ガス又はこれとキャリアガスとの混合気
の供給量を大幅に増やすことができ、その結果光ファイ
バー用母材等の製造効率の大幅な向上を図ることができ
る。As described in detail above, according to the present invention,
In a raw material gas supply device, comprising: an evaporation tank for containing a liquid raw material; and a heater for heating the liquid raw material in the evaporation tank, the liquid raw material in the evaporation tank is vaporized, and the vaporized raw material gas is delivered. Inside, a plurality of dish-shaped containers are arranged at intervals in the vertical direction, and the uppermost container of the plurality of dish-shaped containers is arranged at a position for receiving the liquid raw material supplied to the evaporation tank. With the configuration, the bottom container is arranged at a position spaced from the bottom surface of the evaporation tank by a predetermined distance, so that the liquid raw material accumulates in the bottom portion of the evaporation tank and the plurality of dish-shaped containers. When the liquid raw material in the evaporation tank is heated by the heater, the evaporation area increases by the amount of the liquid raw material accumulated in the plurality of dish-shaped containers. Therefore, without increasing the lateral dimension of the evaporation tank, that is, without increasing the size of the evaporation tank itself and the entire apparatus, the evaporation area of the liquid raw material is increased and the raw material gas or a mixture of the raw material gas and the carrier gas is increased. The supply amount can be significantly increased, and as a result, the manufacturing efficiency of the optical fiber preform and the like can be significantly improved.
【図１】図１は本発明の一実施例に係る原料ガス供給装
置を示す概略構成図である。FIG. 1 is a schematic configuration diagram showing a raw material gas supply device according to an embodiment of the present invention.
【図２】図２は従来の原料ガス供給装置を示す概略構成
図である。FIG. 2 is a schematic configuration diagram showing a conventional raw material gas supply device.
３ 蒸発槽 ３ａ 底面 ４ ヒータ ３１〜３４ 皿状容器 ３１ 最上部の容器 ３４ 最下部の容器 3 evaporation tank 3a bottom 4 heaters 31-34 dish-shaped container 31 top container 34 bottom container
Claims (1)
内の液体原料を加熱するヒータとを備え、蒸発槽内の液
体原料を気化させ、気化した原料ガスを送出する原料ガ
ス供給装置において、前記蒸発槽内に、複数の皿状容器
が上下方向に間隔をおいて配置されており、前記複数の
皿状容器のうちの最上部の容器は、蒸発槽内に供給され
る液体原料を受ける位置に配置されていると共に、最下
部の容器は、蒸発槽の底面から所定の間隔をおいた位置
に配置されていることを特徴とする原料ガス供給装置。1. A raw material gas supply device comprising an evaporation tank for containing a liquid raw material and a heater for heating the liquid raw material in the evaporation tank, vaporizing the liquid raw material in the evaporation tank, and delivering the vaporized raw material gas. In the evaporation tank, a plurality of dish-shaped containers are arranged at intervals in the vertical direction, and the uppermost container of the plurality of dish-shaped containers is a liquid raw material supplied into the evaporation tank. The raw material gas supply device is characterized in that it is arranged at a position for receiving the gas, and the lowermost container is arranged at a position spaced from the bottom surface of the evaporation tank by a predetermined distance.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12221991A JPH07155584A (en) | 1991-04-24 | 1991-04-24 | Raw gas feeder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12221991A JPH07155584A (en) | 1991-04-24 | 1991-04-24 | Raw gas feeder |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07155584A true JPH07155584A (en) | 1995-06-20 |
Family
ID=14830499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12221991A Pending JPH07155584A (en) | 1991-04-24 | 1991-04-24 | Raw gas feeder |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07155584A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012098730A1 (en) * | 2011-01-19 | 2012-07-26 | シーケーディ株式会社 | Liquid vaporizer |
| JP2013078754A (en) * | 2012-02-27 | 2013-05-02 | Ckd Corp | Liquid control apparatus |
| JP2013237006A (en) * | 2012-05-15 | 2013-11-28 | Ckd Corp | Liquid control device |
| JP2014018693A (en) * | 2012-07-12 | 2014-02-03 | Ckd Corp | Liquid control device, and mesh body assembly applied thereto |
| US9010736B2 (en) | 2011-09-30 | 2015-04-21 | Cdk Corporation | Liquid control apparatus |
| US9031391B2 (en) | 2011-09-30 | 2015-05-12 | Ckd Corporation | Woven mesh form liquid control apparatus |
| US9266130B2 (en) | 2012-02-01 | 2016-02-23 | Ckd Corporation | Liquid control apparatus |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61179192A (en) * | 1985-02-05 | 1986-08-11 | 三菱重工業株式会社 | Distillation of dry cleaner |
| JPS6419188A (en) * | 1987-07-15 | 1989-01-23 | Ushio Electric Inc | Pressure reducing method for container housing low-temperature solid |
-
1991
- 1991-04-24 JP JP12221991A patent/JPH07155584A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61179192A (en) * | 1985-02-05 | 1986-08-11 | 三菱重工業株式会社 | Distillation of dry cleaner |
| JPS6419188A (en) * | 1987-07-15 | 1989-01-23 | Ushio Electric Inc | Pressure reducing method for container housing low-temperature solid |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012098730A1 (en) * | 2011-01-19 | 2012-07-26 | シーケーディ株式会社 | Liquid vaporizer |
| US9127359B2 (en) | 2011-01-19 | 2015-09-08 | Ckd Corporation | Liquid vaporizer |
| JP5810101B2 (en) * | 2011-01-19 | 2015-11-11 | Ckd株式会社 | Liquid vaporizer |
| US9010736B2 (en) | 2011-09-30 | 2015-04-21 | Cdk Corporation | Liquid control apparatus |
| US9031391B2 (en) | 2011-09-30 | 2015-05-12 | Ckd Corporation | Woven mesh form liquid control apparatus |
| US9266130B2 (en) | 2012-02-01 | 2016-02-23 | Ckd Corporation | Liquid control apparatus |
| JP2013078754A (en) * | 2012-02-27 | 2013-05-02 | Ckd Corp | Liquid control apparatus |
| JP2013237006A (en) * | 2012-05-15 | 2013-11-28 | Ckd Corp | Liquid control device |
| JP2014018693A (en) * | 2012-07-12 | 2014-02-03 | Ckd Corp | Liquid control device, and mesh body assembly applied thereto |
| US9022366B2 (en) | 2012-07-12 | 2015-05-05 | Ckd Corporation | Liquid control device and mesh-like body assembly applied thereto |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4212663A (en) | Reactants delivery system for optical waveguide manufacturing | |
| US5707415A (en) | Method of vaporizing reactants in a packed-bed, column, film evaporator | |
| US4220460A (en) | Vapor delivery system and method | |
| US8137469B2 (en) | Method and apparatus for making fused silica | |
| JPH07204401A (en) | Method and evaporator for providing reactant steam to place of its use | |
| JPH07155584A (en) | Raw gas feeder | |
| US7730747B2 (en) | Method for vaporizing a liquid reactant in manufacturing a glass preform | |
| CN108754428B (en) | Evaporation crucible and evaporation device | |
| JPH0781965A (en) | Gas producer, method for producing optical waveguide and optical fiber preform and device therefor | |
| JP4438226B2 (en) | Porous glass base material manufacturing apparatus and manufacturing method | |
| US4915717A (en) | Method of fabricating optical fiber preforms | |
| KR102014913B1 (en) | Vapor deposition system for optical fiber preform | |
| JP2003340265A (en) | Method and apparatus for vaporizing liquid raw material, and apparatus for producing glass base material | |
| JP2003212562A (en) | Feeder of gaseous raw material for porous glass preform | |
| KR20030005387A (en) | Method of making a titania-doped fused silica preform | |
| KR100990792B1 (en) | Feeding device of porous glass preform material gas | |
| JPS63134531A (en) | Device for synthesizing glass fine particle | |
| KR20180130129A (en) | Distribution-tube of evaporation source and deposition equipment with it | |
| KR100507623B1 (en) | Burner for making fine particles for deposition of silica particles | |
| JP3186446B2 (en) | Method for producing silica glass | |
| JP2001322825A (en) | Method and device for manufacturing optical fiber preform | |
| KR20100034235A (en) | Canister for a semiconductor manufacturing process | |
| JPH07100614B2 (en) | Method for producing porous quartz glass base material | |
| JP3818567B2 (en) | Method for producing synthetic quartz glass ingot | |
| JP5953767B2 (en) | Method for producing glass particulate deposit and method for producing glass base material |