KR101882126B1 - 전류 센서 - Google Patents
전류 센서 Download PDFInfo
- Publication number
- KR101882126B1 KR101882126B1 KR1020167036165A KR20167036165A KR101882126B1 KR 101882126 B1 KR101882126 B1 KR 101882126B1 KR 1020167036165 A KR1020167036165 A KR 1020167036165A KR 20167036165 A KR20167036165 A KR 20167036165A KR 101882126 B1 KR101882126 B1 KR 101882126B1
- Authority
- KR
- South Korea
- Prior art keywords
- current sensor
- sensor
- current
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
- G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
- G01R15/20—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices
- G01R15/207—Constructional details independent of the type of device used
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
- G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
- G01R15/20—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
- G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
- G01R15/20—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices
- G01R15/202—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices using Hall-effect devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R15/00—Details of measuring arrangements of the types provided for in groups G01R17/00 - G01R29/00, G01R33/00 - G01R33/26 or G01R35/00
- G01R15/14—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks
- G01R15/20—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices
- G01R15/205—Adaptations providing voltage or current isolation, e.g. for high-voltage or high-current networks using galvano-magnetic devices, e.g. Hall-effect devices, i.e. measuring a magnetic field via the interaction between a current and a magnetic field, e.g. magneto resistive or Hall effect devices using magneto-resistance devices, e.g. field plates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Instrument Details And Bridges, And Automatic Balancing Devices (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2014-132862 | 2014-06-27 | ||
JP2014132862 | 2014-06-27 | ||
PCT/JP2015/003230 WO2015198609A1 (ja) | 2014-06-27 | 2015-06-26 | 電流センサ |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20170008864A KR20170008864A (ko) | 2017-01-24 |
KR101882126B1 true KR101882126B1 (ko) | 2018-07-25 |
Family
ID=54937714
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020167036165A KR101882126B1 (ko) | 2014-06-27 | 2015-06-26 | 전류 센서 |
Country Status (6)
Country | Link |
---|---|
US (1) | US10101368B2 (ko) |
EP (1) | EP3163312B1 (ko) |
JP (1) | JP6321800B2 (ko) |
KR (1) | KR101882126B1 (ko) |
CN (1) | CN106461705B (ko) |
WO (1) | WO2015198609A1 (ko) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2017134022A (ja) * | 2016-01-29 | 2017-08-03 | 旭化成エレクトロニクス株式会社 | 電流センサ及び製造方法 |
JP6650045B2 (ja) | 2016-09-14 | 2020-02-19 | 旭化成エレクトロニクス株式会社 | 電流センサ |
US10698005B2 (en) | 2017-04-20 | 2020-06-30 | Asahi Kasei Microdevices Corporation | Magnetic detection device, current detection device, method for manufacturing magnetic detection device, and method for manufacturing current detection device |
DE102018201425A1 (de) * | 2018-01-30 | 2019-08-01 | Osram Gmbh | Konversionsbaugruppe mit anschlussrahmen |
US10755994B2 (en) * | 2018-10-29 | 2020-08-25 | Advanced Semiconductor Engineering, Inc. | Semiconductor package structure and semiconductor substrate |
FR3090120B1 (fr) | 2018-12-12 | 2021-12-10 | Melexis Tech | Capteur de courant à conducteur de courant intégré |
JP2020095029A (ja) * | 2018-12-12 | 2020-06-18 | メレキシス テクノロジーズ エス エーMelexis Technologies SA | 電流センサ |
CN112114180B (zh) * | 2019-06-20 | 2024-04-26 | 株式会社电装 | 电力转换装置 |
JP7420640B2 (ja) * | 2019-07-10 | 2024-01-23 | 旭化成エレクトロニクス株式会社 | 電流センサおよび電流センサの製造方法 |
WO2021039264A1 (ja) * | 2019-08-26 | 2021-03-04 | 株式会社村田製作所 | 電流センサ |
US20230094395A1 (en) * | 2021-09-29 | 2023-03-30 | Asahi Kasei Microdevices Corporation | Magnetic sensor |
CN113866475A (zh) * | 2021-09-30 | 2021-12-31 | 意瑞半导体(上海)有限公司 | 电流传感器的引线框架及电流传感器 |
WO2023167096A1 (ja) * | 2022-03-03 | 2023-09-07 | 旭化成エレクトロニクス株式会社 | 電流センサ、及び電流検出方法 |
JP7328430B1 (ja) * | 2022-10-04 | 2023-08-16 | 旭化成エレクトロニクス株式会社 | 電流センサ |
JP7329115B1 (ja) * | 2022-10-04 | 2023-08-17 | 旭化成エレクトロニクス株式会社 | 電流センサ |
JP7329118B1 (ja) * | 2022-10-24 | 2023-08-17 | 旭化成エレクトロニクス株式会社 | 電流センサ |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH670004A5 (ko) * | 1986-02-10 | 1989-04-28 | Landis & Gyr Ag | |
JP2001165963A (ja) * | 1999-12-09 | 2001-06-22 | Sanken Electric Co Ltd | ホール素子を備えた電流検出装置 |
JP4164615B2 (ja) * | 1999-12-20 | 2008-10-15 | サンケン電気株式会社 | ホ−ル素子を備えた電流検出装置 |
EP1267173A3 (en) * | 2001-06-15 | 2005-03-23 | Sanken Electric Co., Ltd. | Hall-effect current detector |
JP2003172750A (ja) * | 2001-09-26 | 2003-06-20 | Sanken Electric Co Ltd | 電流検出装置 |
US20060219436A1 (en) * | 2003-08-26 | 2006-10-05 | Taylor William P | Current sensor |
US7709754B2 (en) * | 2003-08-26 | 2010-05-04 | Allegro Microsystems, Inc. | Current sensor |
JP2007073803A (ja) * | 2005-09-08 | 2007-03-22 | Toshiba Corp | 半導体装置及びその製造方法 |
JP4833111B2 (ja) * | 2006-09-20 | 2011-12-07 | 株式会社東海理化電機製作所 | 電流検出器 |
US9222992B2 (en) * | 2008-12-18 | 2015-12-29 | Infineon Technologies Ag | Magnetic field current sensors |
US8400139B2 (en) * | 2010-03-26 | 2013-03-19 | Infineon Technologies Ag | Sensor package having a sensor chip |
JP2012229950A (ja) * | 2011-04-25 | 2012-11-22 | Asahi Kasei Electronics Co Ltd | 電流センサおよび電流センサの製造方法 |
JP5695196B2 (ja) * | 2011-07-13 | 2015-04-01 | 旭化成エレクトロニクス株式会社 | 電流センサ用基板及び電流センサ |
EP2733496B1 (en) * | 2011-07-13 | 2016-09-07 | Asahi Kasei Microdevices Corporation | Current sensor substrate and current sensor |
US8907437B2 (en) * | 2011-07-22 | 2014-12-09 | Allegro Microsystems, Llc | Reinforced isolation for current sensor with magnetic field transducer |
JP6017182B2 (ja) * | 2012-05-23 | 2016-10-26 | 旭化成エレクトロニクス株式会社 | 電流センサ |
-
2015
- 2015-06-26 JP JP2016529088A patent/JP6321800B2/ja active Active
- 2015-06-26 EP EP15811265.6A patent/EP3163312B1/en active Active
- 2015-06-26 WO PCT/JP2015/003230 patent/WO2015198609A1/ja active Application Filing
- 2015-06-26 KR KR1020167036165A patent/KR101882126B1/ko active IP Right Grant
- 2015-06-26 CN CN201580025877.9A patent/CN106461705B/zh active Active
- 2015-06-26 US US15/321,327 patent/US10101368B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP3163312A1 (en) | 2017-05-03 |
JP6321800B2 (ja) | 2018-05-09 |
CN106461705A (zh) | 2017-02-22 |
EP3163312A4 (en) | 2017-07-26 |
JPWO2015198609A1 (ja) | 2017-04-20 |
US10101368B2 (en) | 2018-10-16 |
EP3163312B1 (en) | 2019-05-22 |
WO2015198609A1 (ja) | 2015-12-30 |
US20170160313A1 (en) | 2017-06-08 |
KR20170008864A (ko) | 2017-01-24 |
CN106461705B (zh) | 2019-04-30 |
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant |