KR101853828B1 - 열전물질, 열전물질의 열전 효율 향상 방법 및 열전물질을 포함하는 지지체 - Google Patents
열전물질, 열전물질의 열전 효율 향상 방법 및 열전물질을 포함하는 지지체 Download PDFInfo
- Publication number
- KR101853828B1 KR101853828B1 KR1020110051461A KR20110051461A KR101853828B1 KR 101853828 B1 KR101853828 B1 KR 101853828B1 KR 1020110051461 A KR1020110051461 A KR 1020110051461A KR 20110051461 A KR20110051461 A KR 20110051461A KR 101853828 B1 KR101853828 B1 KR 101853828B1
- Authority
- KR
- South Korea
- Prior art keywords
- thermoelectric material
- thermoelectric
- heat treatment
- bismuth telluride
- nanowire
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 70
- 239000000463 material Substances 0.000 title claims abstract description 56
- 230000008569 process Effects 0.000 title claims description 27
- 238000000137 annealing Methods 0.000 title description 6
- 238000010438 heat treatment Methods 0.000 claims abstract description 83
- 239000002070 nanowire Substances 0.000 claims abstract description 82
- 229910052797 bismuth Inorganic materials 0.000 claims abstract description 40
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims abstract description 39
- 239000011261 inert gas Substances 0.000 claims abstract description 10
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 6
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 6
- PDYNJNLVKADULO-UHFFFAOYSA-N tellanylidenebismuth Chemical compound [Bi]=[Te] PDYNJNLVKADULO-UHFFFAOYSA-N 0.000 claims description 24
- 239000000203 mixture Substances 0.000 claims description 21
- 239000000843 powder Substances 0.000 claims description 19
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 17
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 15
- 239000000126 substance Substances 0.000 claims description 15
- 229910052714 tellurium Inorganic materials 0.000 claims description 15
- 229910002909 Bi-Te Inorganic materials 0.000 claims description 10
- 230000006872 improvement Effects 0.000 claims description 10
- 239000013078 crystal Substances 0.000 claims description 9
- 230000002194 synthesizing effect Effects 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 5
- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 4
- 238000002360 preparation method Methods 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 229910052704 radon Inorganic materials 0.000 claims description 3
- 229910052724 xenon Inorganic materials 0.000 claims description 3
- 229910052734 helium Inorganic materials 0.000 claims description 2
- 229910052743 krypton Inorganic materials 0.000 claims description 2
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000002105 nanoparticle Substances 0.000 claims description 2
- 229910052754 neon Inorganic materials 0.000 claims description 2
- 238000007747 plating Methods 0.000 claims description 2
- SYUHGPGVQRZVTB-UHFFFAOYSA-N radon atom Chemical compound [Rn] SYUHGPGVQRZVTB-UHFFFAOYSA-N 0.000 claims description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 2
- 230000002708 enhancing effect Effects 0.000 claims 1
- 239000001307 helium Substances 0.000 claims 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims 1
- XSOKHXFFCGXDJZ-UHFFFAOYSA-N telluride(2-) Chemical compound [Te-2] XSOKHXFFCGXDJZ-UHFFFAOYSA-N 0.000 abstract description 30
- 238000009834 vaporization Methods 0.000 abstract description 12
- 230000008016 vaporization Effects 0.000 abstract description 12
- 238000007789 sealing Methods 0.000 abstract description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 abstract description 4
- 230000002087 whitening effect Effects 0.000 description 16
- 239000002086 nanomaterial Substances 0.000 description 7
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 239000008188 pellet Substances 0.000 description 5
- NQTSTBMCCAVWOS-UHFFFAOYSA-N 1-dimethoxyphosphoryl-3-phenoxypropan-2-one Chemical compound COP(=O)(OC)CC(=O)COC1=CC=CC=C1 NQTSTBMCCAVWOS-UHFFFAOYSA-N 0.000 description 4
- 238000000101 transmission high energy electron diffraction Methods 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 238000007731 hot pressing Methods 0.000 description 3
- 239000002159 nanocrystal Substances 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000002173 high-resolution transmission electron microscopy Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910016339 Bi—Sb—Te Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 206010027146 Melanoderma Diseases 0.000 description 1
- YZCKVEUIGOORGS-NJFSPNSNSA-N Tritium Chemical compound [3H] YZCKVEUIGOORGS-NJFSPNSNSA-N 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- -1 ingot) Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 239000002071 nanotube Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- CJJMLLCUQDSZIZ-UHFFFAOYSA-N oxobismuth Chemical compound [Bi]=O CJJMLLCUQDSZIZ-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- SITVSCPRJNYAGV-UHFFFAOYSA-L tellurite Chemical compound [O-][Te]([O-])=O SITVSCPRJNYAGV-UHFFFAOYSA-L 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- 229910052722 tritium Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/10—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects operating with only the Peltier or Seebeck effects
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/852—Thermoelectric active materials comprising inorganic compositions comprising tellurium, selenium or sulfur
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N10/00—Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects
- H10N10/80—Constructional details
- H10N10/85—Thermoelectric active materials
- H10N10/851—Thermoelectric active materials comprising inorganic compositions
- H10N10/853—Thermoelectric active materials comprising inorganic compositions comprising arsenic, antimony or bismuth
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Powder Metallurgy (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110051461A KR101853828B1 (ko) | 2011-05-30 | 2011-05-30 | 열전물질, 열전물질의 열전 효율 향상 방법 및 열전물질을 포함하는 지지체 |
PCT/KR2012/004260 WO2012165855A2 (fr) | 2011-05-30 | 2012-05-30 | Procédé de développement permettant d'améliorer le rendement thermoélectrique de matériau thermoélectrique via un traitement par recuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110051461A KR101853828B1 (ko) | 2011-05-30 | 2011-05-30 | 열전물질, 열전물질의 열전 효율 향상 방법 및 열전물질을 포함하는 지지체 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20120133009A KR20120133009A (ko) | 2012-12-10 |
KR101853828B1 true KR101853828B1 (ko) | 2018-05-02 |
Family
ID=47260073
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020110051461A KR101853828B1 (ko) | 2011-05-30 | 2011-05-30 | 열전물질, 열전물질의 열전 효율 향상 방법 및 열전물질을 포함하는 지지체 |
Country Status (2)
Country | Link |
---|---|
KR (1) | KR101853828B1 (fr) |
WO (1) | WO2012165855A2 (fr) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101528516B1 (ko) * | 2013-09-06 | 2015-06-12 | 한국과학기술연구원 | 유기-무기 하이브리드 복합체를 포함하는 고유연성 열전 변환 재료 및 이를 포함하는 열전 소자 |
KR101709755B1 (ko) * | 2014-10-31 | 2017-02-23 | 주식회사 엘지화학 | 등방 가압 고상반응법을 이용한 화합물 형성 방법 |
KR101719928B1 (ko) * | 2015-12-23 | 2017-03-27 | 한국세라믹기술원 | Bi-Te계 세라믹스의 제조방법 |
CN106549096B (zh) * | 2016-12-08 | 2019-03-26 | 苏州鸿凌达电子科技有限公司 | 热电薄膜材料及其制作工艺 |
CN114249305B (zh) * | 2020-09-23 | 2023-05-05 | 北京信息科技大学 | 一种具有宽温域性能稳定的碲化铋基热电薄膜及其制备方法 |
CN112376112B (zh) * | 2020-09-30 | 2022-03-25 | 杭州大和热磁电子有限公司 | 一种提高热电固态制冷器制冷温差的方法 |
CN114671688A (zh) * | 2022-03-08 | 2022-06-28 | 成都露思特新材料科技有限公司 | 一种碲化铋基热电材料的3d打印件及其打印方法、热电器件 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101680764B1 (ko) * | 2008-08-11 | 2016-11-29 | 삼성전자주식회사 | 이방성 신장 열전 나노복합물, 그의 제조방법 및 이를 포함한 열전소자 |
KR20100138171A (ko) * | 2009-06-24 | 2010-12-31 | 이화여자대학교 산학협력단 | 수열합성법을 이용한 다양한 형태의 비스무스 텔루라이드 나노구조체의 제조방법 및 이에 의해 제조된 비스무스 텔루라이드 나노구조체 |
KR101047610B1 (ko) * | 2009-10-15 | 2011-07-07 | 연세대학교 산학협력단 | 코어/쉘 구조를 갖는 열전 나노와이어의 제조방법 |
KR101594132B1 (ko) * | 2009-11-05 | 2016-02-16 | 삼성전자주식회사 | 나노복합체형 열전재료, 이를 포함하는 열전모듈과 열전 장치 |
-
2011
- 2011-05-30 KR KR1020110051461A patent/KR101853828B1/ko active IP Right Grant
-
2012
- 2012-05-30 WO PCT/KR2012/004260 patent/WO2012165855A2/fr active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2012165855A2 (fr) | 2012-12-06 |
KR20120133009A (ko) | 2012-12-10 |
WO2012165855A3 (fr) | 2013-03-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR101853828B1 (ko) | 열전물질, 열전물질의 열전 효율 향상 방법 및 열전물질을 포함하는 지지체 | |
Scheele et al. | Synthesis and thermoelectric characterization of Bi2Te3 nanoparticles | |
US7586033B2 (en) | Metal-doped semiconductor nanoparticles and methods of synthesis thereof | |
EP2483205B1 (fr) | Matériau composite à base de skuttérudite garnie de gasb et son procédé de fabrication | |
WO2007084173A2 (fr) | Procédés pour synthétiser des nanocristaux semiconducteurs et compositions thermo-électriques | |
Chen et al. | Microstructure and thermoelectric properties of n-and p-type doped Mg 2 Sn compounds prepared by the modified bridgman method | |
Mokari et al. | Synthesis of lead chalcogenide alloy and core–shell nanowires | |
Shendur et al. | Investigation of nano ceramics added bismuth antimony telluride for energy harvesting applications | |
WO2004031456A2 (fr) | Detecteur de rayonnement a antimoniure d'aluminium a resistivite elevee | |
US8435429B2 (en) | Process for optimum thermoelectric properties | |
US20070240750A1 (en) | Nanoscale thermoelectrics by bulk processing | |
Lee et al. | Disproportionation of thermoelectric bismuth telluride nanowires as a result of the annealing process | |
Zybała et al. | Characterization of nanostructured bulk cobalt triantimonide doped with tellurium and indium prepared by pulsed plasma in liquid method | |
Schröder et al. | Nanostructures in metastable GeBi 2 Te 4 obtained by high-pressure synthesis and rapid quenching and their influence on physical properties | |
KR101882443B1 (ko) | 열전 나노와이어를 포함하는 지지체 및 그의 열전 효율 향상 방법 | |
Berry et al. | Single crystal growth tricks and treats | |
González‐Barrios et al. | Perspective on Crystal Structures, Synthetic Methods, and New Directions in Thermoelectric Materials | |
Takano et al. | Single crystal growth of (LaO) CuS | |
CN104787733B (zh) | 一种二碲化锰纳米颗粒的制备方法 | |
Reddy et al. | Synthesis and cathodoluminescence properties of CdSe/ZnO hierarchical nanostructures | |
Umar et al. | Hierarchical ZnO nanostructures: growth and optical properties | |
JP5223432B2 (ja) | typeIクラスレート化合物の製造方法 | |
Vinokurov et al. | PbTe-VTe 2 phase diagram and properties of (PbTe) 1− x (VTe 2) x solid solutions | |
Jones et al. | Electrical contact resistance of bismuth telluride nanowires | |
Zhang et al. | Thermal behavior of antimony nanowire arrays embedded in anodic aluminum oxide template |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20110530 |
|
PG1501 | Laying open of application | ||
A201 | Request for examination | ||
PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20160504 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20110530 Comment text: Patent Application |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20170126 Patent event code: PE09021S01D |
|
E902 | Notification of reason for refusal | ||
PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20170726 Patent event code: PE09021S01D |
|
E701 | Decision to grant or registration of patent right | ||
PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20180129 |
|
GRNT | Written decision to grant | ||
PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20180425 Patent event code: PR07011E01D |
|
PR1002 | Payment of registration fee |
Payment date: 20180426 End annual number: 3 Start annual number: 1 |
|
PG1601 | Publication of registration | ||
PR1001 | Payment of annual fee |
Payment date: 20210315 Start annual number: 4 End annual number: 4 |
|
PR1001 | Payment of annual fee |
Payment date: 20220314 Start annual number: 5 End annual number: 5 |
|
PR1001 | Payment of annual fee |
Payment date: 20230313 Start annual number: 6 End annual number: 6 |
|
PR1001 | Payment of annual fee |
Payment date: 20240315 Start annual number: 7 End annual number: 7 |