KR101833555B1 - 플라즈마 애싱 장치용 튜닝 하드웨어 및 이 튜닝 하드웨어의 이용 방법 - Google Patents

플라즈마 애싱 장치용 튜닝 하드웨어 및 이 튜닝 하드웨어의 이용 방법 Download PDF

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KR101833555B1
KR101833555B1 KR1020127015178A KR20127015178A KR101833555B1 KR 101833555 B1 KR101833555 B1 KR 101833555B1 KR 1020127015178 A KR1020127015178 A KR 1020127015178A KR 20127015178 A KR20127015178 A KR 20127015178A KR 101833555 B1 KR101833555 B1 KR 101833555B1
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waveguide
plasma
actuator
core
microwave
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Korean (ko)
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KR20120095972A (ko
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아셈 스리바스타바
로버트 코울리아드
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램 리써치 코포레이션
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32229—Waveguides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators
    • H01J37/32256—Tuning means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32311—Circuits specially adapted for controlling the microwave discharge

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020127015178A 2009-11-18 2010-11-12 플라즈마 애싱 장치용 튜닝 하드웨어 및 이 튜닝 하드웨어의 이용 방법 Active KR101833555B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/621,136 2009-11-18
US12/621,136 US8906195B2 (en) 2009-11-18 2009-11-18 Tuning hardware for plasma ashing apparatus and methods of use thereof
PCT/US2010/002972 WO2011062610A1 (en) 2009-11-18 2010-11-12 Tuning hardware for plasma ashing apparatus and methods of use thereof

Publications (2)

Publication Number Publication Date
KR20120095972A KR20120095972A (ko) 2012-08-29
KR101833555B1 true KR101833555B1 (ko) 2018-02-28

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KR1020127015178A Active KR101833555B1 (ko) 2009-11-18 2010-11-12 플라즈마 애싱 장치용 튜닝 하드웨어 및 이 튜닝 하드웨어의 이용 방법

Country Status (7)

Country Link
US (1) US8906195B2 (https=)
EP (1) EP2502256A1 (https=)
JP (1) JP5826185B2 (https=)
KR (1) KR101833555B1 (https=)
CN (1) CN102598202B (https=)
TW (1) TWI492265B (https=)
WO (1) WO2011062610A1 (https=)

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* Cited by examiner, † Cited by third party
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US8576013B2 (en) * 2011-12-29 2013-11-05 Mks Instruments, Inc. Power distortion-based servo control systems for frequency tuning RF power sources
US20140263179A1 (en) * 2013-03-15 2014-09-18 Lam Research Corporation Tuning system and method for plasma-based substrate processing systems
JP6643034B2 (ja) * 2015-10-09 2020-02-12 東京エレクトロン株式会社 プラズマ処理装置
WO2017190793A1 (en) * 2016-05-06 2017-11-09 Arcelik Anonim Sirketi Cooking appliance with a microwave heating function
KR101967903B1 (ko) * 2017-10-16 2019-04-10 유니온테크 주식회사 마이크로웨이브 발진모듈과 이를 포함하는 마이크로웨이브를 이용한 농산물 건조 장치 및 이에 의해 건조된 건조 농산물
US10217654B1 (en) * 2018-02-12 2019-02-26 Varian Semiconductor Equipment Associates, Inc. Embedded features for interlocks using additive manufacturing
JP7360934B2 (ja) * 2019-12-25 2023-10-13 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
CN116145119B (zh) * 2023-02-01 2025-01-24 锐光信通科技有限公司 一种用于气相沉积的微波谐振腔
CN116581509A (zh) * 2023-04-25 2023-08-11 散裂中子源科学中心 一种耦合度在线可调的波导型高功率耦合器

Citations (1)

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Publication number Priority date Publication date Assignee Title
JP2003188103A (ja) 2001-12-14 2003-07-04 Tokyo Electron Ltd プラズマ処理装置

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US4689459A (en) * 1985-09-09 1987-08-25 Gerling John E Variable Q microwave applicator and method
US4851630A (en) * 1988-06-23 1989-07-25 Applied Science & Technology, Inc. Microwave reactive gas generator
JP2986166B2 (ja) * 1989-01-30 1999-12-06 株式会社ダイヘン マイクロ波回路のインピーダンス自動調整装置及びインピーダンス自動調整方法
US4943345A (en) * 1989-03-23 1990-07-24 Board Of Trustees Operating Michigan State University Plasma reactor apparatus and method for treating a substrate
US5262610A (en) * 1991-03-29 1993-11-16 The United States Of America As Represented By The Air Force Low particulate reliability enhanced remote microwave plasma discharge device
JPH06231711A (ja) 1993-02-02 1994-08-19 Nissin Electric Co Ltd マイクロ波イオン源装置における整合方法
US5387288A (en) * 1993-05-14 1995-02-07 Modular Process Technology Corp. Apparatus for depositing diamond and refractory materials comprising rotating antenna
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US6057645A (en) * 1997-12-31 2000-05-02 Eaton Corporation Plasma discharge device with dynamic tuning by a movable microwave trap
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KR101144449B1 (ko) * 2003-09-22 2012-05-10 엠케이에스 인스트루먼츠, 인코포레이티드 무선 주파수 플라즈마 프로세싱 내에서 불안정성을 방지하기 위한 장치 및 방법
JP5213150B2 (ja) * 2005-08-12 2013-06-19 国立大学法人東北大学 プラズマ処理装置及びプラズマ処理装置を用いた製品の製造方法
US7589470B2 (en) * 2006-01-31 2009-09-15 Dublin City University Method and apparatus for producing plasma
CN101518162A (zh) * 2006-09-13 2009-08-26 诺日士钢机株式会社 等离子体发生装置及设置有该装置的工件处理装置
GB2459461B (en) 2008-04-23 2012-08-01 Creo Medical Ltd A non-thermal microwave plasma sterilisation system using automatic tuning contained within the hand-piece of the applicator
JP2010027588A (ja) * 2008-06-18 2010-02-04 Tokyo Electron Ltd マイクロ波プラズマ処理装置及び給電方法

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JP2003188103A (ja) 2001-12-14 2003-07-04 Tokyo Electron Ltd プラズマ処理装置

Also Published As

Publication number Publication date
KR20120095972A (ko) 2012-08-29
TWI492265B (zh) 2015-07-11
JP2013511807A (ja) 2013-04-04
EP2502256A1 (en) 2012-09-26
US20110114115A1 (en) 2011-05-19
WO2011062610A1 (en) 2011-05-26
JP5826185B2 (ja) 2015-12-02
CN102598202B (zh) 2015-10-07
TW201142912A (en) 2011-12-01
US8906195B2 (en) 2014-12-09
CN102598202A (zh) 2012-07-18

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