KR101793325B1 - 에칭 레지스트 조성물, 기판 및 그의 제조 방법 - Google Patents

에칭 레지스트 조성물, 기판 및 그의 제조 방법 Download PDF

Info

Publication number
KR101793325B1
KR101793325B1 KR1020150067841A KR20150067841A KR101793325B1 KR 101793325 B1 KR101793325 B1 KR 101793325B1 KR 1020150067841 A KR1020150067841 A KR 1020150067841A KR 20150067841 A KR20150067841 A KR 20150067841A KR 101793325 B1 KR101793325 B1 KR 101793325B1
Authority
KR
South Korea
Prior art keywords
etching
substrate
resist composition
resist
asphalt
Prior art date
Application number
KR1020150067841A
Other languages
English (en)
Korean (ko)
Other versions
KR20160007346A (ko
Inventor
가즈노리 니시오
요시히로 오노
도시하루 미야자와
시게루 우시키
Original Assignee
다이요 잉키 세이조 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 다이요 잉키 세이조 가부시키가이샤 filed Critical 다이요 잉키 세이조 가부시키가이샤
Publication of KR20160007346A publication Critical patent/KR20160007346A/ko
Application granted granted Critical
Publication of KR101793325B1 publication Critical patent/KR101793325B1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D195/00—Coating compositions based on bituminous materials, e.g. asphalt, tar, pitch
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L95/00—Compositions of bituminous materials, e.g. asphalt, tar, pitch

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Surface Treatment Of Glass (AREA)
  • General Chemical & Material Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
KR1020150067841A 2014-07-10 2015-05-15 에칭 레지스트 조성물, 기판 및 그의 제조 방법 KR101793325B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014141955A JP6293004B2 (ja) 2014-07-10 2014-07-10 エッチングレジスト組成物、基板およびその製造方法
JPJP-P-2014-141955 2014-07-10

Publications (2)

Publication Number Publication Date
KR20160007346A KR20160007346A (ko) 2016-01-20
KR101793325B1 true KR101793325B1 (ko) 2017-11-02

Family

ID=55232507

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020150067841A KR101793325B1 (ko) 2014-07-10 2015-05-15 에칭 레지스트 조성물, 기판 및 그의 제조 방법

Country Status (2)

Country Link
JP (1) JP6293004B2 (ja)
KR (1) KR101793325B1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7346041B2 (ja) * 2018-03-28 2023-09-19 太陽ホールディングス株式会社 エッチングレジスト組成物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005139039A (ja) * 2003-11-07 2005-06-02 Nippon Kaken Kk ガラス板の加工方法および有機ｅｌ表示装置用ガラス封止キャップならびにガラスチップ
KR101210507B1 (ko) 2012-06-25 2013-01-10 주식회사 디씨씨아이 경제성이 탁월하고, 친환경적이며, 노출형으로 사용가능한 하이브리드형 수성 아스팔트 방수재 조성물
JP2013147583A (ja) 2012-01-20 2013-08-01 Taiyo Holdings Co Ltd サンドブラストレジスト組成物、及びそれを用いた表面加工方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4053351A (en) * 1975-11-21 1977-10-11 Rockwell International Corporation Chemical machining of silica and glass
JPS6070188A (ja) * 1983-09-28 1985-04-20 Toshiba Corp シヤドウマスクの製造方法
JP4317626B2 (ja) * 1999-09-20 2009-08-19 太陽インキ製造株式会社 防振樹脂組成物
US6824600B2 (en) * 2000-05-23 2004-11-30 Shell Canada Limited Paving binders and manufacturing methods
JP4689568B2 (ja) * 2005-10-05 2011-05-25 関西ペイント株式会社 ガラスエッチング用紫外線硬化型レジスト組成物及びガラスエッチング処理方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005139039A (ja) * 2003-11-07 2005-06-02 Nippon Kaken Kk ガラス板の加工方法および有機ｅｌ表示装置用ガラス封止キャップならびにガラスチップ
JP2013147583A (ja) 2012-01-20 2013-08-01 Taiyo Holdings Co Ltd サンドブラストレジスト組成物、及びそれを用いた表面加工方法
KR101210507B1 (ko) 2012-06-25 2013-01-10 주식회사 디씨씨아이 경제성이 탁월하고, 친환경적이며, 노출형으로 사용가능한 하이브리드형 수성 아스팔트 방수재 조성물

Also Published As

Publication number Publication date
JP2016017021A (ja) 2016-02-01
JP6293004B2 (ja) 2018-03-14
KR20160007346A (ko) 2016-01-20

Similar Documents

Publication Publication Date Title
TW556054B (en) Stripping composition
CN1849386B (zh) 清洁组合物、清洁半导体基底的方法以及在半导体基底上形成配线的方法
WO2015056428A1 (ja) レジスト剥離液
WO2010119753A1 (ja) フォトレジスト剥離剤組成物及びフォトレジスト剥離方法
TWI548955B (zh) Resin stripping solution
CN105785725A (zh) 一种光阻残留物清洗液
JP2000039727A (ja) フォトレジスト用ストリッパ―組成物
JP6112446B2 (ja) フォトレジスト剥離液組成物
CN104102097A (zh) 抗蚀剂剥离剂组合物
KR101793325B1 (ko) 에칭 레지스트 조성물, 기판 및 그의 제조 방법
TWI413874B (zh) 光阻剝離劑組成物
CN103676504A (zh) 一种水性光刻胶剥离液
TWI795433B (zh) 用於移除乾膜光阻的剝離組成物及使用所述組成物的剝離方法
JP5565551B2 (ja) レジスト除去剤
WO2014002151A1 (ja) レジスト剥離剤
JP7346041B2 (ja) エッチングレジスト組成物
KR20080054714A (ko) 레지스트 박리용 알칼리 조성물
JP7291727B2 (ja) レジストパターンの形成に用いられる樹脂組成物、及び半導体製品の製造方法
CN102880017B (zh) 光刻胶用剥离液组合物及其制备和应用
KR20080076535A (ko) Ｎ-메틸아세트아마이드를 포함하는 포토레지스트용 박리액조성물
KR101584775B1 (ko) 유기절연막 및 감광성 고분자 제거용 박리액 조성물
JP7433984B2 (ja) エッチングレジスト組成物
JP7132214B2 (ja) 樹脂マスク剥離用洗浄剤組成物
JP5095527B2 (ja) ガラスマスク用熱硬化型保護液およびガラスマスク
WO2014208088A1 (ja) フォトレジスト用剥離液

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
AMND Amendment
E601 Decision to refuse application
AMND Amendment
X701 Decision to grant (after re-examination)
GRNT Written decision to grant