KR101781176B1 - Heat Treatment Apparatus having Multi Slot - Google Patents

Heat Treatment Apparatus having Multi Slot Download PDF

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Publication number
KR101781176B1
KR101781176B1 KR1020160005093A KR20160005093A KR101781176B1 KR 101781176 B1 KR101781176 B1 KR 101781176B1 KR 1020160005093 A KR1020160005093 A KR 1020160005093A KR 20160005093 A KR20160005093 A KR 20160005093A KR 101781176 B1 KR101781176 B1 KR 101781176B1
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South Korea
Prior art keywords
heater
support
substrate
module
substrate support
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KR1020160005093A
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Korean (ko)
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KR20170086148A (en
Inventor
김병국
김현수
권오철
한맹군
손효수
장종일
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주식회사 비아트론
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Priority to KR1020160005093A priority Critical patent/KR101781176B1/en
Publication of KR20170086148A publication Critical patent/KR20170086148A/en
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/007—Other surface treatment of glass not in the form of fibres or filaments by thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B27/00—Tempering or quenching glass products
    • C03B27/012—Tempering or quenching glass products by heat treatment, e.g. for crystallisation; Heat treatment of glass products before tempering by cooling
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

An object of the present invention is to provide a heat treatment apparatus in which the construction of the process chamber is simple and the number of glass substrates to be heat-treated is increased in comparison with the height of the process chamber.
In accordance with another aspect of the present invention, there is provided a process chamber including a process chamber, at least two heater modules spaced vertically apart from each other in the process chamber, and at least two heater modules spaced vertically inside the process chamber, A heat treatment apparatus having a multislot including two substrate support modules is disclosed.

Description

TECHNICAL FIELD [0001] The present invention relates to a heat treatment apparatus having a multi-

The present invention relates to a heat treatment apparatus for heat treating a glass substrate applied to a display device.

In general, a large-sized substrate of 2200 × 2500 mm or larger is used to produce a 50-inch or larger display panel, which is referred to as an 8th generation production line. Recently, major display manufacturers are expanding such an 8th generation production line to improve production yield. As the display substrate becomes larger in size, the substrate heat treatment apparatus must also be enlarged.

In recent years, the height of the process chamber has been limited according to the height limit of the production facility, and development of a system capable of charging the same or a larger number of glass substrates despite the reduced height of the process chambers has been required .

An object of the present invention is to provide a heat treatment apparatus in which the construction of the process chamber is simple and the number of glass substrates to be heat-treated is increased in comparison with the height of the process chamber.

It is another object of the present invention to provide a heat treatment apparatus in which a glass substrate is uniformly heat-treated and heat treatment efficiency and cooling efficiency are increased.

It is another object of the present invention to provide a heat treatment apparatus for efficiently exhausting organic fumes generated during a heat treatment process of a glass substrate.

According to an aspect of the present invention, there is provided a multi-slot heat processing apparatus including a process chamber, at least two heater modules vertically spaced apart from each other to form at least one slot in the process chamber, And at least two substrate supporting modules which are vertically spaced apart and on which a substrate is mounted.

In addition, the process chamber may be formed by stacking a plurality of the slots in the vertical direction.

In addition, the process chamber may be formed with an internal heat insulating partition wall that is horizontally disposed inside and separates the internal space upward.

The heater module may be formed of a flat plate heater module including a heater tube and a heat line positioned inside the heater tube, and the heat treatment apparatus may further include a heater support module for supporting the heater module.

The heater module may include a plurality of bar heaters or a plurality of halogen lamps arranged in a horizontal direction.

The heater support module may include a heater support frame and a plurality of heater support bars spaced apart from each other inside the heater support frame and having the heater module disposed thereon.

The heater support module may further include a heater support block coupled to an upper surface of the heater support bar and having the flat plate heater module mounted on an upper surface thereof.

The substrate support module may further include a substrate support frame, a plurality of substrate support bars arranged between the substrate support frames, and a substrate support block coupled to an upper surface of the substrate support bar, .

The substrate support block may include a support ball groove formed in a rectangular tube shape, a cylindrical shape, or a hemispherical shape on an upper surface thereof. The substrate support module may be inserted into the support ball groove of the substrate support block so as to protrude upward, And a substrate support ball for supporting the substrate.

The substrate support bar may have a support bar protrusion formed thereon, and the substrate support block may further include a support protrusion groove into which the support bar protrusion is inserted.

In addition, the substrate support bar may be formed of a stainless steel bar, a quartz bar, a stainless steel tube, or a quartz tube.

In addition, the process chamber may be formed on one side or both sides of the interior to include a gas pipe for supplying or exhausting the process gas.

Since the heat treatment apparatus having the multislot according to the present invention is equipped with at least two glass substrates between the exhaust modules spaced up and down, the number of heat-treated glass substrates is increased compared to the height of the process chamber.

Further, in the heat treatment apparatus having a multislot according to the present invention, two glass substrates are positioned between two flat plate heaters, so that the glass substrate and the flat plate heaters to be heat-treated are constituted one to one.

Further, in the heat treatment apparatus having the multislot according to the present invention, a flat plate heater is provided on the exhaust module to simultaneously perform the heat treatment process and the exhaust process of the glass substrate, thereby simplifying the structure of the process chamber.

Further, in the heat treatment apparatus having a multislot according to the present invention, as the structure of the process chamber is simplified, the inside of the process chamber is rapidly heated, the heat treatment efficiency is increased, and the cooling efficiency is increased.

In the heat treatment apparatus having the multislot according to the present invention, the air is supplied from the left and right sides of the glass substrate, and the exhaust gas is discharged from the substantially central portion of the glass substrate, thereby shortening the exhaust path of the organic fume, The efficiency is improved.

1 is a vertical sectional view of a heat treatment apparatus having a multislot according to an embodiment of the present invention.
FIG. 2 is a schematic view showing a supply direction and an exhaust direction in a heat treatment apparatus having a multislot according to an embodiment of the present invention. FIG.
FIG. 3 is a perspective view of the exhaust module shown in FIG. 1 with a flat plate heater mounted thereon.
4 is a partial perspective view of the exhaust module shown in Fig.
5 is a vertical sectional view taken along line AA of FIG.
6 is a perspective view of the heater support block shown in Fig.
7 is a perspective view of the flat plate heater shown in Fig.
8A is a plan view of the flat plate heater of Fig.
8B is an enlarged view of "A" in FIG. 8A.
8C is a vertical cross-sectional view of the heater unit of FIG. 8A.
Figure 9 is a front view of the inner support bar shown in Figure 8a.
Figure 10 is a front view of the outer support bar shown in Figure 8a.
11 is a perspective view of the fixing bracket shown in FIG. 8A.
Figure 12 is a perspective view of the substrate support module shown in Figure 1;
13 is a vertical cross-sectional view of BB of Fig.
14 is a perspective view of the substrate support block shown in Fig.
15 is a vertical cross-sectional view of CC of Fig.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

The embodiments of the present invention are described in order to more fully explain the present invention to those skilled in the art, and the following embodiments may be modified into various other forms, It is not limited to the embodiment. Rather, these embodiments are provided so that this disclosure will be more faithful and complete, and will fully convey the scope of the invention to those skilled in the art.

In the following drawings, thickness and size of each layer are exaggerated for convenience and clarity of description, and the same reference numerals denote the same elements in the drawings. As used herein, the term "and / or" includes any and all combinations of one or more of the listed items.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the singular forms "a," "an," and "the" include singular forms unless the context clearly dictates otherwise. Also, " comprise "and / or" comprising "when used in this specification are taken to specify the presence of stated features, steps, numbers, operations, elements, elements and / Steps, numbers, operations, elements, elements, and / or groups.

Hereinafter, a heat treatment apparatus having a multislot according to an embodiment of the present invention will be described.

1 is a vertical sectional view of a heat treatment apparatus having a multislot according to an embodiment of the present invention. FIG. 2 is a schematic view showing a supply direction and an exhaust direction in a heat treatment apparatus having a multislot according to an embodiment of the present invention. FIG. FIG. 3 is a perspective view of the exhaust module shown in FIG. 1 with a flat plate heater mounted thereon. 4 is a partial perspective view of the exhaust module shown in Fig. 5 is a vertical sectional view taken along line A-A in Fig. 6 is a perspective view of the heater support block shown in Fig. 7 is a perspective view of the flat plate heater shown in Fig. 8A is a plan view of the flat plate heater of Fig. 8B is an enlarged view of "A" in FIG. 8A. 8C is a vertical cross-sectional view of the heater unit of FIG. 8A. Figure 9 is a front view of the inner support bar shown in Figure 8a. Figure 10 is a front view of the outer support bar shown in Figure 8a. 11 is a perspective view of the fixing bracket shown in FIG. 8A. Figure 12 is a perspective view of the substrate support module shown in Figure 1; 13 is a vertical sectional view taken along the line B-B in Fig. 14 is a perspective view of the substrate support block shown in Fig. 15 is a vertical sectional view taken along the line C-C of Fig.

1 to 15, a process chamber 100, a heater support module 200, a heater module 300, and a substrate support module 400 (not shown) ). The heat treatment apparatus including the multislot includes a heater support module 200 for supporting the heater module 300 when the heater module 300 is formed of a flat heater module. However, when the heater module 300 is not formed as a flat heater module, the heater supporting module 200 may be omitted.

The heat treatment apparatus includes at least a heater module 300 or a heater support module 200 spaced up and down in the process chamber 100 to form a slot 100a and a heater module 300 or a heater support module 200, the number of slots 100a is increased. In the slot 100a, preferably, two or more substrate supporting modules 400 are disposed, and three or more substrate supporting modules 400 may be positioned. Since the substrate a to be heat-treated is located in each substrate supporting module 400, at least two substrates a are mounted in each slot 100a and heat-treated to a height of the process chamber 100 The number of the substrates a can be increased. Since the heater module 300 is mounted on the upper and lower sides of each slot 100a in the thermal processing apparatus, when the two glass substrates a are positioned in one slot 100a, the substrate a and the heater module 300 are formed in a one-to-one manner, and the substrate (a) is uniformly heat-treated. The substrate (a) may be a glass substrate or a substrate on which a coating layer coated with a material forming a transparent substrate such as polyimide is formed on a glass substrate.

The process chamber 100 is formed in a substantially hexahedral shape having a hollow interior. Although not shown in detail, the process chamber 100 is open at the front, and a separate shutter is provided at the front of the process chamber 100 to seal the inside of the process chamber during the heat treatment process. In the process chamber 100, a plurality of heater modules 300 or heater supporting modules 200 are vertically spaced apart from each other. In the process chamber 100, a plurality of substrates a are vertically spaced apart from each other and heat-treated.

The process chamber 100 may have a gas pipe 110 for supplying or exhausting a process gas on one side or both sides thereof. The gas pipe 110 is formed at a position corresponding to each slot 100a between the heater supporting modules 200 spaced vertically inside the process chamber 100 and is filled with nitrogen gas An inert gas such as argon gas, or various gases used in the process, or exhaust the process gas from each slot 100a. Further, when organic fumes are generated in the heat treatment process of the substrate (a), it can be discharged together with the process gas. Since the gas pipe 110 is formed at a position corresponding to each slot 100a, the process gas can be supplied or discharged more efficiently and the organic fume can be exhausted. The inside of the process chamber 100 is heated by the operation of the heater module 300 to heat the substrate a. The process chamber 100 may be formed as a chamber used in a general heat treatment apparatus for heat treatment of the substrate a.

A plurality of the heater supporting modules 200 are vertically spaced and stacked in the process chamber 100. Two heater supporting modules 200 are vertically spaced to form at least one slot 100a and two or three or more substrate supporting modules 400 are positioned in each slot 100a. The heater module 300 is mounted on the heater support module 200 and the heater module 300 is opposed to the substrate a mounted on the substrate support module 400. Meanwhile, the heater supporting module 200 may be omitted when the heater module 300 is not formed of a flat heater module or when the flat heater module is supported by a separate frame in the process chamber 100.

Further, the heater supporting module 200 may be formed to exhaust or supply the process gas. The heater support module 200 exhausts the process gas when the gas pipe 110 of the process chamber 100 supplies the process gas and the heater support module 200 when the gas pipe 110 exhausts the process gas. 0.0 > (100) < / RTI > In addition, the heater supporting module 200 can discharge the organic fumes generated from the substrate (a) under heat treatment to the outside. That is, the heater supporting module 200 efficiently discharges the organic fumes generated in the heat treatment process of the substrate a, which is placed on the upper side of the substrate supporting module 400 located at the lower side. The heater support module 200 directly discharges the organic fumes generated in the substrate (a) upward to minimize the discharge path of the process gas and the organic fumes, thereby improving the exhaust efficiency. The heat treatment apparatus is suitable for heat treatment of a large-area display substrate. In addition, the heater supporting module 200 together with the function of supporting and supporting the heater module 300 can simplify the components of the heat treatment apparatus as a whole.

The heater support module 200 includes a heater support frame 210 and a heater support bar 220. The heater support module 200 may further include a heater support block 230 and a heater exhaust pipe 250. Further, the heater supporting module 200 may further include a connection panel 240.

The heater support frame 210 is formed in a substantially rectangular shape in plan view. The heater support frame 210 is formed to have a larger area than the substrate a to be heat-treated. Further, the heater support frame 210 may further include fixing protrusions 211a and 211b. The fixing protrusions 211a and 211b are fixed to the support rails formed on the left and right sides of the process chamber 100, respectively.

The heater support frame 210 may be formed as a hollow pipe. In this case, the heater support frame 210 may further include a frame hole 212 penetrating from the side to the inside thereof, and may function to supply or exhaust the process gas. The frame hole 212 injects the process gas supplied from the outside into the heater support frame 210 onto the top of the substrate a. In addition, the frame hole 212 sucks the process gas or the organic material used in the process chamber 100 into the interior of the heater support frame 210.

The heater support bar 220 is formed in a bar shape, and a plurality of the heater support bars 220 are horizontally coupled from the inside to the rear of the heater support frame 210. The heater support bar 220 may have a circular cross section, a triangular cross section, a pentagonal cross section, or a hexagonal cross section.

The heater support bars 220 are spaced apart from one another on the inside of the heater support frame 210 and are coupled to the heater support frame 210. A heater module 300 is positioned and supported on the heater support bar 220.

The heater support bar 220 may be formed of a hollow hollow tube. When the heater support bar 220 is formed of a tube, the process gas is supplied into the process chamber 100 or exhausted from the process chamber 100. At this time, the heater support bar 220 may include gas nozzles 221 formed in the form of through-holes on both sides or at the top. The gas nozzle 221 may be spaced apart from the heater support bar 220 along the longitudinal direction of the heater support bar 220 so as to inject gas in the horizontal direction at the heater support bar 220. The gas nozzles 221 are formed by injecting the process gas supplied through the heater support frame 210 to both sides or top of the heater support bar 220 and supplying the process gas to the process chamber 100, As shown in Fig.

The heater support block 230 includes a heater block body 231 and a flow ball 233 and a support flow block 235. The heater support block 230 is coupled to the upper surface of the heater support bar 220, and the heater module 300 is seated on the upper surface.

The heater block body 231 is formed in a hexagonal shape having a predetermined height and area, and has a body ball groove 231a on its upper surface. The body ball groove 231a is formed at a predetermined depth downward from the upper surface. The heater block body 231 is coupled to the upper surface of the heater support bar 220.

The floating ball 233 is coupled to the main body ball groove so that a part of the upper part protrudes. The flow ball 233 allows the support flow block 235, which is seated on the top of the heater block body 231, to flow relative to the heater block body 231. The supporting block 235 and the heater block body 231 may expand due to the difference in thermal expansion coefficient during the heat treatment process, causing friction and causing foreign particles. The flow ball 233 is positioned between the support flow block 235 and the heater block body 231 to allow the support flow block 235 and the heater block body 231 to flow with each other, . Since the flow ball 233 is in point contact with the support block 235 and the heater block body 231, the friction area between the support block 235 and the heater block body 231 is reduced, Thereby minimizing the generation of particles.

The support flow block 235 is formed in a hexagonal shape having a predetermined height and area and is formed to have a length longer than the width of the heater block body 231. The support flow block 235 has a body coupling groove 235a formed on a lower surface thereof. In addition, the support flow block 235 may have a heater tube groove 235b on which the heater tube of the heater module 300 is mounted.

The body coupling groove 235a is formed at an upper portion of the lower surface of the support flow block 235 and has a shape corresponding to the upper shape of the heater block body 231. [ The support flow block 235 is coupled to the main body coupling groove 235a formed on the lower surface while inserting the upper part of the heater block main body 231. [ At this time, the supporting flow block 235 is in fluid contact with the lower surface of the flow ball 233. When the heater module 300 is mounted on the upper portion of the support flow block 235, the support flow block 235 supports the heater module 300 more stably while flowing by the flow ball 233.

The heater tube groove 235b is formed in a shape corresponding to the lower shape of the heater tube constituting the heater module 300. That is, the heater tube groove 235b is formed to have a circular arc shape in section perpendicular to the central axis. The heater tube groove 235b allows the lower portion of the heater tube to be coupled when the heater module 300 is mounted to the support flow block 235, so that the heater module 300 can be stably supported without flowing. In the case where the heater tube of the heater module 300 is formed of quartz or ceramic, the heater module 300 may be damaged due to impact or the like during the mounting or use of the heater module 300.

The connection panel 240 is formed in a substantially plate shape and is coupled to the heater support frame 210 through a separate panel connection tube 241. The connection panel 240 connects the heater support frame 210 and the heater exhaust pipe 250 through the panel connection tube to provide a path through which the process gas flows. The connection panel 240 serves to shield the opening of the process chamber 100 on which the heater supporting module 200 is mounted. The connection panel 240 is mounted with a panel power supply unit 243 for supplying power to the heater module 300.

The heater exhaust pipe 250 is connected to the heater support frame 210 and forms a path for supplying a process gas into the heater support frame 210 or exhausting the process gas. The heater exhaust pipe 250 is connected to the heater support frame 210 through the panel connection tube of the connection panel 240. The heater exhaust pipe 250 extends outside the process chamber 100.

The heater module 300 is vertically spaced apart from the process chamber to form at least one slot 100a. The heater module may be formed of a flat panel heater module or a plurality of bar-shaped heaters or a plurality of halogen lamps. When the heater module 300 is formed of a rod heater or a halogen lamp, a plurality of rod heaters or halogen lamps are arranged in a horizontal direction within the process chamber 100, do. The bar heater or the halogen lamp is formed in a general configuration used in a heat treatment apparatus, and a detailed description thereof will be omitted. Hereinafter, the case where the heater module 300 is formed as a flat heater module will be mainly described.

The heater module 300 includes a heater unit 310, an inner support bar 330, an outer support bar 350, and a fixing bracket 370. The plurality of heater modules 300 are formed on the upper portion of the heater supporting module 200. Referring to FIG. 3, the heater modules 300 may be mounted on the heater support module 200.

The heater module 300 is divided into at least three control areas 300a, 300b, and 300c, and a heater unit 310 is independently controlled in each control area. In the heater module 300, the heating temperature and the heating rate can be independently controlled in the three control areas 300a, 100b, and 100c, and thus various heat treatment profiles can be realized. 8A to 8C, the heater module 300 includes a first control region 300a located on one side, a second control region 300b located on the other side and a third control region 300b located on the other side, And an area 300c. Meanwhile, the heater module 300 is shown to have three control areas, but the present invention is not limited thereto. The heater module 300 may be divided into a plurality of control areas according to the required area.

The heater unit 310 includes a heater tube 311, a heat ray 313, and a tube stopper 315.

The heater units 310 may be formed in a number corresponding to the number of control regions of the heater module 300 and may have the same or different planar shapes. When a plurality of the heater units 310 are combined, a specific shape is determined so as to form a plane shape corresponding to the substrate (a) to be mounted on the heater module 300. Meanwhile, although the heater units 310 have the same or different planar shapes, the basic structure of the heater unit 310 is the same as that described above.

The heater tube 311 may be formed in a hollow tube shape and may have a circular, square, or polygonal cross-sectional shape. The heater tube 311 includes a straight portion 311a and a connection portion 311b and the straight portion 311a and the connection portion 311b are alternately connected to form a zigzag shape as a whole. That is, the heater tube 311 is formed so that the linear portion 311a is spaced apart in the horizontal direction perpendicular to the longitudinal direction and the connecting portion 311b connects the ends of the two linear portions 311a adjacent to each other to form a zigzag shape . Here, the straight portion 311a may be formed in a straight line, and the connection portion 311b may be formed to have a "C" shape or a "C" shape. The heater tube 311 has a planar shape corresponding to a control region where the heater unit 310 is located. That is, the heater tube 311 may have a rectangular shape.

 The heater tube 311 is formed by joining a straight portion 311a formed of the same material and a connection portion 311b by welding or heat welding. Therefore, the heater tubes 311 are integrally formed of the same material. Therefore, since the heater tube 311 has the same thermal expansion coefficient, generation of foreign matter due to breakage or cracking during heating or cooling is minimized. The straight portion 311a and the connection portion 311b are formed to have the same diameter.

The heater tube 311 is made of anhydrous silicic acid (SiO 2 ) (quartz) having a purity of 99.99% or more and has a relatively small gas content. Accordingly, the heater tube 311 is suitable for the semiconductor industry, which is chemically stable and therefore requires stability at high temperatures. Since the heater tube 311 has a softening point of about 1683 캜 and can be used at a high temperature and has a small coefficient of thermal expansion (5 x 19 -7 cm / 占 폚), the heater tube 311 is also resistant to quenching and rapid heat. In addition, the heater tube 311 is excellent in energy efficiency by transmitting not only ultraviolet rays but also infrared rays and wavelengths, as well as ordinary glass tubes which can not transmit ultraviolet rays. Moreover, the heater tube 311 has high electrical insulation property and very high acid resistance.

Further, the heater tube 311 may be formed of alumina, silicon carbide, zirconia, silicon oxide, or a mixture thereof. The heater tube 311 may be formed of stainless steel, inconel, cobalt alloy, tungsten, titanium, Hastelloy or a mixture thereof. At this time, the heater tube 311 may further include an insulating layer or an insulating tube (not shown) formed on the inner circumferential surface of a material such as alumina, silicon carbide, zirconia, silicon oxide, or a mixture thereof.

The heating wire 313 is formed of a heating element, and generates heat by a supplied power source to heat the substrate a. The heat ray 313 is inserted into the heater tube 311 and positioned one by one in one heater tube 311. Therefore, the heat ray 313 is also bent in a zigzag shape inside the heater tube 311. The heating wires 313 are respectively inserted into heater tubes 311 located in the respective control areas and are independently supplied with power to be controlled.

The heat ray 313 is an Fe-Cr-Al-based electric resistance heating body and can be used at the highest temperature among the heat resistance resistance alloys. The heat ray 313 may be formed of a NiCr alloy, titanium, a tungsten alloy, stainless steel, MoSi 2, or a mixture thereof.

In the figure, reference numeral 314 denotes a power supply line for supplying power to the heat line 313.

The tube stopper 315 is coupled to the end of the heater tube 311 to shield the end of the heater tube 311. The tube stopper 315 is preferably formed of the same material as the heater tube 311 and is formed of quartz material. Accordingly, the tube stopper 315 has the same thermal expansion coefficient as that of the heater tube 311, and thermal deformation or breakage during the heat treatment process is minimized. The power supply line 314 penetrates through the tube stopper and is connected to a heat line located inside the heater tube.

The inner supporting bar 330 includes an upper inner body 331, a lower inner body 332, an inner supporting groove 333, an inner engaging projection 335, and an inner bracket hole 337. The inner support bar 330 is formed in a bar shape and supports the heater tube 311 by being connected to the straight portion 311a of the heater tube 311 at both sides perpendicularly to the longitudinal direction of the straight portion 311a . Accordingly, the inner support bar 330 is preferably formed of at least two. The inner support bar 330 may be formed of three or more in order to more stably support the heater tube 311 when the straight portion 311a of the heater tube 311 is long.

The inner supporting bar 330 is formed such that the upper inner body 331 and the lower inner body 332 are coupled to the upper and lower portions of the straight portion 311a of the heater tube 311 and the heater tubes 311 are arranged at regular intervals Keep the shape. The inner support bar 330 is coupled to the heater tube 311 at both sides of the straight portion 311a of the heater tube 311 to stably support the heater tube 311. [

The inner support bar 330 may be formed of one or a mixture thereof selected from the group consisting of stainless steel, Inconel, Coba alloy, tungsten, titanium, and Hastelloy. The inner support bar 330 may be made of glass, neoceramic, alumina (Al 2 O 3 ), silicon carbide (SiC), zirconia (ZrO 2 ), or quartz (quartz) .

The upper inner body 331 is formed in a bar shape and has a length corresponding to the width of the heater unit 310 to be coupled. For example, the upper inner main body 331 may have a length corresponding to the width of the first control area 300a shown in FIG. 8A. More specifically, when the linear portions 311a of the heater unit 310 are spaced apart from each other in the horizontal direction, the upper internal body 331 is larger than the distance between the straightest portions 311a located at the outermost positions . The upper inner main body 331 may have a width greater than the entire width of the second control area 300b and the third control area 300c.

The lower inner body 332 is formed in a bar shape having the same length as that of the upper inner body 331 and is preferably formed in a shape symmetrical to the upper inner body 331.

The inner support groove 333 is formed in a shape of arc on the lower surface of the upper inner body 331 and the upper surface of the lower inner body 332, respectively. The inner support groove 333 is formed in a arc shape having a radius corresponding to the radius of the heater tube 311. The inner support groove 333 formed on the lower surface of the upper inner body 331 and the upper surface of the lower inner body 332 forms a circle corresponding to the outer diameter of the heater tube 311 as a whole. The inner support groove 333 is coupled to the outer circumferential surface of the straight portion 311a of the heater tube 311 and supports the heater tube 311.

The inner coupling protrusions 335 are protruded from both ends of the upper inner body 331 and the lower inner body 332. The inner engaging projection 335 is engaged with the outer supporting bar 350 to fix the inner supporting bar 330 to the outer supporting bar 350. One or at least two of the inner engaging projections 335 may be arranged vertically.

The inner bracket hole 337 is formed through the other surface of the upper inner body 331. The inner bracket holes 337 are formed on or between the inner support grooves 333 on both sides of the upper inner body 331. A bolt (not shown) for fixing the fixing bracket 370 is coupled to the inner bracket hole 337. The inner bracket hole 337 may be omitted when the fixing bracket 370 is coupled to the upper inner main body 331 by welding or the like. The inner bracket hole 337 may be formed in the lower internal body 332 according to the direction in which the fixing bracket 370 is coupled.

The external support bar 350 is formed to include an external coupling hole 351 and a bracket groove 353. The outer support bar 350 is formed in a bar shape and has a length corresponding to the length of the heater module 300. The outer support bars 350 are located at both sides of the heater module 300 and are coupled to the ends of the inner support bars 330 to support the inner support bars 330.

The outer support bar 350 may be formed of one or a mixture thereof selected from the group consisting of stainless steel, inconel, cobalt alloy, tungsten, titanium, and Hastelloy. The outer support bar 350 may be formed of glass, neoceramic, alumina (Al 2 O 3 ), silicon carbide (SiC), zirconia (ZrO 2 ), quartz (Quartz) .

The outer coupling hole 351 is formed in a hole shape penetrating from one surface to the other surface and is formed in a number corresponding to the inner coupling protrusion 335 formed in the inner supporting bar 330. For example, the outer joining holes 351 are formed by arranging one or at least two outer joining holes 351 in the upper and lower outer support bars 350. The outer engaging groove 315b is formed in a shape corresponding to the shape of the inner engaging projection 335. For example, in the case where the inner engaging projection 335 is formed in a rectangular column or a cylindrical shape, the outer engaging hole 351 is formed in a hole shape having a rectangular or circular cross section. The inner coupling protrusion 335 of the inner supporting bar 330 is coupled to the outer coupling hole 351.

The bracket groove 353 may be formed to have a predetermined depth in the downward direction from the upper end and penetrate from the front surface to the rear surface. That is, the bracket groove 353 may be formed in a hole shape that opens to the upper end when viewed from the front side. The bracket groove 353 is formed on both sides of the outer support bar 350 and is formed at a position where the inner support bar 330 located at the outermost position is engaged. That is, the bracket groove 353 is formed instead of the position where the outermost coupling hole 351 is formed. Therefore, the inner engaging protrusion 335 of the inner support bar 330 can be coupled to the bracket groove 353. [ In the bracket groove 353, a fixing bracket 370 is coupled to the bracket groove 353. The outer engaging groove 315b is formed to have a size corresponding to a portion where the fixing bracket 370 is engaged. Meanwhile, the bracket groove 353 may be omitted when the fixing bracket 370 is coupled to the outer support bar 350 by welding or the like.

The fixing bracket 370 includes a bracket body 371, an outer engaging portion 373, an inner engaging portion 375, and a fixing bracket hole 377. The fixing bracket 370 is coupled to the inner support bar 330 and the outer support bar 350 to firmly fix the inner support bar 330 and the outer support bar 350.

The fixing bracket 370 may be formed of one selected from the group consisting of stainless steel, inconel, cobalt alloy, tungsten, titanium, and Hastelloy, or a mixture thereof. The fixing bracket 370 may be formed of glass, neoceramic, alumina (Al 2 O 3 ), silicon carbide (SiC), zirconia (ZrO 2 ), quartz (Quartz) .

The bracket body 371 is formed in a plate shape having a length and a width and is formed to extend from the outer surface of the outer support bar 350 to the upper portion of the inner support bar 330. The lower bracket body 371 is coupled to the upper surface of the inner support bar 330. The bracket body 371 is inserted into the bracket groove 353 of the outer support bar 350 and is engaged.

The external coupling portion 373 is formed in a plate shape extending downward from the outer end of the bracket body 371. The outer joining portion 373 is supported such that its inner side is in contact with the outer side of the outer supporting bar 350 and the fixing bracket 370 is not separated from the outer supporting bar 350.

The inner coupling portion 375 is formed in a plate shape extending downward from the other side end of the inside of the bracket body 371. The inner engaging portion 375 is in contact with one side surface or the other side surface of the inner supporting bar 330 and is supported so that the fixing bracket 370 is not separated from the inner supporting bar 330.

The fixing bracket hole 377 is formed at a position corresponding to the inner bracket hole 337 of the inner support bar 330 when the fixing bracket 370 is coupled to the inner support bar 330. A separate bolt (not shown) is fastened to the fixing bracket hole 377 and the inner bracket hole 337 to connect the fixing bracket 370 and the inner supporting bar 330. The fixing bracket hole 377 may be omitted when the fixing bracket 370 is joined by welding or the like.

The substrate support module 400 is formed to include a substrate support frame 410 and a substrate support bar 420. Further, the substrate supporting module 400 may further include a substrate supporting block 430 and a substrate supporting ball 440.

The substrate support frame 410 is formed such that at least two substrate frame bars 410a having a predetermined length are parallel and spaced from each other in a direction perpendicular to the longitudinal direction. At this time, the substrate frame bar 410a is larger than the length or width of the substrate a so as to have a larger area than the substrate a to be heat-treated, and spaced apart from the width or length of the substrate a. That is, the substrate support frame 410 is formed such that the distance between the substrate frame bar 410a and the substrate frame bar 410a is greater than the width and length of the substrate a. The substrate frame bars 410a are fixed within the process chamber 100, respectively. The substrate frame bars 410a may have different lengths. The substrate support frame 410 may include four substrate frame bars 410a and may have a substantially rectangular shape. The substrate support frame 410 may be formed of a hollow hollow pipe.

The substrate support bar 420 is formed in a bar shape and supports a substrate a that is seated on the top. The substrate support bar 420 is formed to have a length greater than the width or length of the substrate a. A plurality of the substrate supporting bars 420 are coupled to each other along the longitudinal direction of the substrate supporting frame 410. At this time, the substrate supporting bar 420 is spaced apart at least in a region corresponding to the length or width of the substrate a. Therefore, the substrate support bar 420 stably supports the substrate a.

In addition, the substrate support bar 420 is formed so as to be separated into two upper and lower layers. That is, the substrate support bar 420 includes an upper substrate support bar 420a and a lower substrate support bar 420b, which are positioned at an upper portion. In addition, the substrate support bar 420 may be spaced apart from the substrate support bar 420 to form three layers vertically. Accordingly, the substrate support bar 420 is formed such that the two substrates a are stacked up and down. In addition, the substrate support bar 420 may be formed so that three or more substrates a are stacked up and down.

Both ends of the substrate support bar 420 are coupled to the substrate support frame 410 by a separate support bracket 421. More specifically, one end of the substrate support bar 420 is coupled to the substrate support frame 410 located at one side, and the other end is coupled to the substrate support frame 410 located at the other side. At this time, the other end of the substrate support bar 420 may be coupled to the substrate support frame 410 to be movable in the longitudinal direction. For example, the support bracket 421 coupled to the end of the substrate support bar 420 may be formed such that a bolt hole for engaging the substrate support frame 410 extends in the longitudinal direction of the substrate support bar 420 have. The support bracket 421 of the substrate support bar 420 is coupled to the substrate support frame 410 so as to be spaced apart in the longitudinal direction without being vertically moved. The substrate support bar 420 may be extended in the longitudinal direction with respect to the substrate support frame 410 when the substrate support bar 420 is heated and thermally expanded in the heat treatment process. Therefore, the substrate support bar 420 is not bent even when thermally expanded, and can stably support the substrate a.

The substrate support bar 420 may be formed into a bar shape filled with the inside or a tube shape hollow inside. The substrate support bar 420 may be formed of a stainless steel bar, a quartz bar, a stainless steel tube, or a quartz tube. In addition, the substrate support bar 420 may have a circular cross section, a triangular cross section, a pentagonal cross section, or a hexagonal cross section.

The substrate support bar 420 may further include a support bar protrusion 423. The support bar protrusion 423 is formed in a protruding shape protruding to a predetermined height above the substrate support bar 420. A plurality of the support bar protrusions 423 are formed along the longitudinal direction of the substrate support bar 420.

The substrate support block 430 is formed in a block shape and includes a support ball groove 431 and a support protrusion groove 433. Further, the substrate support block 430 may further include a support bar groove 435.

The substrate support block 430 is coupled to the upper surface of the substrate support bar 420, and the substrate a is seated thereon. The substrate support block 430 may be formed of stainless steel or quartz.

 The support ball groove 431 is formed in a groove shape on the upper surface of the substrate support block 430 to provide a space in which the substrate support ball 440 is inserted and seated. The support ball groove 431 may be formed in a rectangular tube shape, a cylindrical shape, or a hemispherical shape. At this time, the support ball groove 431 has a width or diameter larger than the diameter of the substrate support ball 440 and is formed at a depth lower than the diameter of the support ball. Accordingly, the support ball groove 431 allows the substrate support ball 440 to protrude to the upper portion of the substrate support block 430 while moving.

The support protrusion groove 433 is formed in a groove shape extending upward from the lower surface of the substrate support block 430. The base protrusion groove is formed in a shape corresponding to the support bar protrusion 423. That is, when the support bar protrusion 423 is formed in a cylindrical shape, the support protrusion groove 433 may be formed in a cylindrical shape. The support bar protrusion 423 is inserted into the support protrusion groove 433 and is coupled thereto. The support protrusions 423 are inserted into the support protrusions 433 so that the substrate support block 430 is stably fixed to the substrate support bar 420.

The support bar groove 435 extends upward from a lower surface of the substrate support block 430 and is formed to penetrate from one surface to the other surface. The base bar groove is formed corresponding to the shape of the upper outer circumferential surface of the substrate support bar 420. That is, when the substrate support bar 420 is formed in a columnar shape, the support bar groove 435 may be formed in a shape corresponding to half of the cylinder. A substrate support bar 420 is inserted into and coupled to the support bar groove 435. The support bar groove 435 allows the substrate support block 430 to be stably fixed to the substrate support bar 420.

The substrate support ball 440 is formed in a spherical shape and inserted into the support ball groove 431 to be seated. The upper portion of the substrate support ball 440 protrudes to the upper portion of the substrate support block 430. Thus, the substrate support ball 440 supports the substrate positioned above the substrate support block 430, and supports the substrate in a flowable manner.

As described above, the present invention is not limited to the above-described embodiment, and it is to be understood that the present invention is not limited to the above-described embodiments, It will be understood by those of ordinary skill in the art that various changes in form and details may be made therein without departing from the spirit and scope of the invention.

100: Process chamber
110: a gas pipe
200: heater supporting module
210: heater support frame 220: heater support bar
230: heater support block 240: connection panel
250: heater exhaust pipe
300: Plate heater module
310: heater unit 330: inner support bar
350: external support bar 370: fixed bracket
400: substrate support module
410: substrate support frame 420: substrate support bar
430: substrate support block 440: substrate support ball

Claims (12)

A process chamber,
At least two heater modules spaced vertically apart from each other in the process chamber to form at least one slot,
A heater support module for exhausting the process gas of the process chamber or supplying the process gas to the process chamber and supporting the heater module,
And at least two substrate support modules spaced up and down in the slots and having a substrate mounted thereon. The method of claim 1, wherein
The process chamber
And the plurality of slots are stacked in the vertical direction. The method of claim 1, wherein
The process chamber
And an inner heat insulating partition wall which is disposed in a horizontal direction and separates the inner space in an upward direction. The method according to claim 1,
Wherein the heater module is formed of a flat plate heater module including a heater tube and a heat line positioned inside the heater tube. The method according to claim 1,
Wherein the heater module includes a plurality of bar-shaped heaters or a plurality of halogen lamps arranged in a horizontal direction. 5. The method of claim 4,
The heater support module
The heater support frame
And a plurality of heater support bars spaced apart from each other in the heater support frame and having the heater module disposed thereon. The method according to claim 6,
Wherein the heater support module further comprises a heater support block coupled to an upper surface of the heater support bar and having the flat plate heater module mounted on an upper surface thereof. The method according to claim 1,
The substrate support module
A substrate support frame,
A plurality of substrate support bars arranged between the substrate support frames,
And a substrate support block coupled to an upper surface of the substrate support bar and having the substrate positioned thereon. 9. The method of claim 8,
Wherein the substrate support block includes a support ball groove formed in a rectangular tube shape, a cylindrical shape or a hemispherical shape on an upper surface thereof,
Wherein the substrate support module further comprises a substrate support ball inserted into the support ball groove of the substrate support block so as to protrude upward to support the substrate. 9. The method of claim 8,
The substrate support bar may have a support bar protrusion formed thereon,
Wherein the substrate support block further comprises a support protrusion groove into which the support bar protrusion is inserted. 9. The method of claim 8,
Wherein the substrate support bar is formed of a stainless steel bar, a quartz bar, a stainless steel tube, or a quartz tube. The method according to claim 1,
Wherein the process chamber includes a gas pipe formed on one side or both sides of the gas chamber for supplying or exhausting the process gas.
KR1020160005093A 2016-01-15 2016-01-15 Heat Treatment Apparatus having Multi Slot KR101781176B1 (en)

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Application Number Priority Date Filing Date Title
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KR101781176B1 true KR101781176B1 (en) 2017-09-25

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010037012A (en) * 2008-08-01 2010-02-18 Koyo Thermo System Kk Workpiece support member, and workpiece support pin position adjustment method using the same
KR101479925B1 (en) * 2013-07-25 2015-01-12 주식회사 비아트론 Plane Heater for Heat Treatment Apparatus of Substrate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010037012A (en) * 2008-08-01 2010-02-18 Koyo Thermo System Kk Workpiece support member, and workpiece support pin position adjustment method using the same
KR101479925B1 (en) * 2013-07-25 2015-01-12 주식회사 비아트론 Plane Heater for Heat Treatment Apparatus of Substrate

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