KR101735052B1 - 메조포러스 실리카 나노입자 및 이의 제조방법 - Google Patents
메조포러스 실리카 나노입자 및 이의 제조방법 Download PDFInfo
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 110
- 239000000377 silicon dioxide Substances 0.000 title claims abstract description 50
- 238000000034 method Methods 0.000 title claims abstract description 32
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- QAQSNXHKHKONNS-UHFFFAOYSA-N 1-ethyl-2-hydroxy-4-methyl-6-oxopyridine-3-carboxamide Chemical compound CCN1C(O)=C(C(N)=O)C(C)=CC1=O QAQSNXHKHKONNS-UHFFFAOYSA-N 0.000 claims description 20
- 239000000243 solution Substances 0.000 claims description 18
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 16
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- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- 238000006243 chemical reaction Methods 0.000 claims description 4
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- ICSSIKVYVJQJND-UHFFFAOYSA-N calcium nitrate tetrahydrate Chemical compound O.O.O.O.[Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ICSSIKVYVJQJND-UHFFFAOYSA-N 0.000 claims description 2
- MFUVDXOKPBAHMC-UHFFFAOYSA-N magnesium;dinitrate;hexahydrate Chemical compound O.O.O.O.O.O.[Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MFUVDXOKPBAHMC-UHFFFAOYSA-N 0.000 claims 2
- ZHJGWYRLJUCMRT-UHFFFAOYSA-N 5-[6-[(4-methylpiperazin-1-yl)methyl]benzimidazol-1-yl]-3-[1-[2-(trifluoromethyl)phenyl]ethoxy]thiophene-2-carboxamide Chemical compound C=1C=CC=C(C(F)(F)F)C=1C(C)OC(=C(S1)C(N)=O)C=C1N(C1=C2)C=NC1=CC=C2CN1CCN(C)CC1 ZHJGWYRLJUCMRT-UHFFFAOYSA-N 0.000 claims 1
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- 150000002500 ions Chemical class 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
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- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- ABCGFHPGHXSVKI-UHFFFAOYSA-O meso-tetrakis(n-methyl-4-pyridyl)porphine(4+) Chemical compound C1=C[N+](C)=CC=C1C(C1=CC=C(N1)C(C=1C=C[N+](C)=CC=1)=C1C=CC(=N1)C(C=1C=C[N+](C)=CC=1)=C1C=CC(N1)=C1C=2C=C[N+](C)=CC=2)=C2N=C1C=C2 ABCGFHPGHXSVKI-UHFFFAOYSA-O 0.000 description 5
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- 238000001354 calcination Methods 0.000 description 4
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- 229910052749 magnesium Inorganic materials 0.000 description 3
- AUHZEENZYGFFBQ-UHFFFAOYSA-N 1,3,5-trimethylbenzene Chemical compound CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 2
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- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
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- RNAMYOYQYRYFQY-UHFFFAOYSA-N 2-(4,4-difluoropiperidin-1-yl)-6-methoxy-n-(1-propan-2-ylpiperidin-4-yl)-7-(3-pyrrolidin-1-ylpropoxy)quinazolin-4-amine Chemical compound N1=C(N2CCC(F)(F)CC2)N=C2C=C(OCCCN3CCCC3)C(OC)=CC2=C1NC1CCN(C(C)C)CC1 RNAMYOYQYRYFQY-UHFFFAOYSA-N 0.000 description 1
- GTZCNONABJSHNM-UHFFFAOYSA-N 5,10,15,20-tetraphenyl-21,23-dihydroporphyrin zinc Chemical compound [Zn].c1cc2nc1c(-c1ccccc1)c1ccc([nH]1)c(-c1ccccc1)c1ccc(n1)c(-c1ccccc1)c1ccc([nH]1)c2-c1ccccc1 GTZCNONABJSHNM-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 241000283707 Capra Species 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- 229910019427 Mg(NO3)2-6H2O Inorganic materials 0.000 description 1
- 206010028980 Neoplasm Diseases 0.000 description 1
- 229910020175 SiOH Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 229910001425 magnesium ion Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- JZRYQZJSTWVBBD-UHFFFAOYSA-N pentaporphyrin i Chemical compound N1C(C=C2NC(=CC3=NC(=C4)C=C3)C=C2)=CC=C1C=C1C=CC4=N1 JZRYQZJSTWVBBD-UHFFFAOYSA-N 0.000 description 1
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- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/122—Lepidoic silicic acid
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/124—Preparation of adsorbing porous silica not in gel form and not finely divided, i.e. silicon skeletons, by acidic treatment of siliceous materials
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Silicates, Zeolites, And Molecular Sieves (AREA)
Abstract
본 발명에 따르면, 극대화된 포화 크기를 가지는 MSN 물질을 제조하기 위하여, 가장 일반적인 포어 확장 분자를 사용하는 방법 대신에 부분적인 탈금속화 공정을 통하여 선택적인 에칭 방법을 이용하였다. 이러한 공정에서는, Al, 또는 Si 원자들이 스팀 또는 화학적 에천트에 의해 선택적으로 제거될 수 있으며, 결과적으로 포어 크기는 부분적으로 증가하게 된다. 따라서 본 발명에서는 SiO2의 조절된 에칭을 통하여 200nm 이내에 있는 포어-확장된 MSN 물질을 제조할 수 있는 효과를 가진다. 또한, MSN 크기는 다양한 용도에 적합하도록 200nm 이하로 유지할 수 있다.
Description
도 2는 하소된 MSN(a) 과 Ca-MSN (b)의 FE-SEM 이미지와, 다른 확대Ca-MSN (c)와 Mg-MSN (d)를 다른 배율로 확대시킨 TEM 이미지이고,
도 3은 as-prepared MSN (a), Ca-MSN (b), 및 Mg-MSN (c)의 고체 상태의 13C CP-MAS NMR 스펙트럼이고,
도 4는 as-prepared MSN, 하소된 MSN, Ca-MSN, 및 Mg-MSN의 TG 프로파일 그래프이고,
도 5는 구조 에칭을 통하여 템플릿이 없는 Ca-MSN 과 Mg-MSN의 생성 과정 및 CTPB 템플릿의 이온-교환 과정을 모식화한 것이고,
도 6은 비코팅된 Mg-MSN 의 상이한 배율로 측정한 SEM 이미지이고, (ㅧ30 000 (a) and ㅧ50 000 (b))
도 7은 하소된 MSN, Ca-MSN, 및 Mg-MSN (a)의 PXRD 패턴이고, 하소된 MSN, Ca-MSN, 및 Mg-MSN (b)의 N2 가스 흡착/탈착 결과이고, MSN (c), Ca-MSN (d), 및 Mg-MSN (e) 의 BJH 포어 크기 분포 그래프를 나타낸 것이며,
도 8은 ultra microtomed Ca-MSN의 TEM 이미지이고,
도 9는 Ca-MSN을 상이한 경사각에 따른 각 2D TEM 이미지를 작업하여 그 입자의 3D TEM 이미지를 나타낸 것이고,
도 10은 Ca-MSN (a)의 2D TEM 이미지와, single Ca-MSN 의 3D 재구성을 통하여 얻어진 단면의 이미지(b)이고,
도 11은 하소된 MSN (a), Ca-MSN (b), 및 Mg-MSN (c)의 고체 상태의 29Si DP-MAS NMR 스펙트럼이고,
도 12a는 3가지 종류의 포피린 게스트 분자의 구조이고,
도 12b는 MSN, Ca-MSN, 및 Mg-MSN에 흡착된 세가지 포피린 화합물의 함량을 나타낸 것이고,
도 12c는 BSA (PDB entry 4F5S) 와 IgG (PDB entry 1IGT)의 구조이고
도 12d는 MSN, Ca-MSN, 및 Mg-MSN에 흡착된 BSA 와 IgG의 함량을 나타낸 것이고,
도 13은 Ca-MSN으로부터 흡착된 IgG의 시험관내(in-vitro) 방출 특성을 측정 그래프이다.
재료 | ζ-otential(mV) |
하소된 MSN(대조군 1) | -36.66ㅁ0.46 |
Ca-MSN(실시예 1) | -23.60ㅁ0.39 |
Mg-MSN(실시예 2) | -21.50ㅁ0.43 |
Claims (5)
- 삭제
- 삭제
- 계면활성제를 포함하는 염기성 수용액에 실리카 전구체를 혼합하여 메조포러스 실리카 나노 입자를 제조하는 단계,
상기 제조된 메조포러스 실리카 나노 입자를 메탄올 용매를 사용하는 알칼리 토금속염 용액과 혼합하여 반응시키는 단계, 및
상기 반응으로 생성된 생성물을 세척 및 건조시키는 단계를 포함하는 메조포러스 실리카 나노입자(MSNs)의 제조방법.
- 제3항에 있어서,
상기 계면활성제를 포함하는 염기성 수용액은 계면활성제로서 세틸피리디늄 브로마이드(CTPB)와 NaOH수용액을 혼합한 것을 특징으로 하는 메조포러스 실리카 나노입자(MSNs)의 제조방법.
- 제3항에 있어서,
상기 알칼리 토금속염 용액은 질산칼슘 4수화물(Ca(NO3)2·4H2O) 또는 질산마그네슘 6수화물(Mg(NO3)2·6H2O)의 용액인 것을 특징으로 하는 메조포러스 실리카 나노입자(MSNs)의 제조방법.
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