KR101720798B1 - 마이크로리소그래피 투영 노광 장치의 광학 래스터 소자, 광학 적분기 및 조명 시스템 - Google Patents

마이크로리소그래피 투영 노광 장치의 광학 래스터 소자, 광학 적분기 및 조명 시스템 Download PDF

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KR101720798B1
KR101720798B1 KR1020110011010A KR20110011010A KR101720798B1 KR 101720798 B1 KR101720798 B1 KR 101720798B1 KR 1020110011010 A KR1020110011010 A KR 1020110011010A KR 20110011010 A KR20110011010 A KR 20110011010A KR 101720798 B1 KR101720798 B1 KR 101720798B1
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KR
South Korea
Prior art keywords
optical
raster element
integrator
section
array
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KR1020110011010A
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English (en)
Korean (ko)
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KR20110093663A (ko
Inventor
미카엘 파트라
Original Assignee
칼 짜이스 에스엠티 게엠베하
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Publication of KR20110093663A publication Critical patent/KR20110093663A/ko
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Publication of KR101720798B1 publication Critical patent/KR101720798B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020110011010A 2010-02-09 2011-02-08 마이크로리소그래피 투영 노광 장치의 광학 래스터 소자, 광학 적분기 및 조명 시스템 KR101720798B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP10001311.9 2010-02-09
EP10001311A EP2354853B1 (de) 2010-02-09 2010-02-09 Optisches Rasterelement, optischer Integrator und Beleuchtungssystem eines mikrolithografischen Projektionsbelichtungsgerätes

Publications (2)

Publication Number Publication Date
KR20110093663A KR20110093663A (ko) 2011-08-18
KR101720798B1 true KR101720798B1 (ko) 2017-03-28

Family

ID=42316083

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110011010A KR101720798B1 (ko) 2010-02-09 2011-02-08 마이크로리소그래피 투영 노광 장치의 광학 래스터 소자, 광학 적분기 및 조명 시스템

Country Status (4)

Country Link
US (1) US8724080B2 (de)
EP (1) EP2354853B1 (de)
JP (1) JP5762051B2 (de)
KR (1) KR101720798B1 (de)

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WO2013115208A1 (ja) * 2012-02-03 2013-08-08 株式会社ニコン 伝送光学系、照明光学系、露光装置、およびデバイス製造方法
FR2996016B1 (fr) * 2012-09-25 2014-09-19 Sagem Defense Securite Illuminateur de photolithographie telecentrique selon deux directions
JP2014146012A (ja) * 2013-01-30 2014-08-14 Hitachi High-Technologies Corp パターン形成方法及び装置
DE102014217612A1 (de) * 2014-09-03 2016-03-03 Carl Zeiss Smt Gmbh Beleuchtungoptik für die Projektonslithograpfie
US10330902B1 (en) 2017-06-16 2019-06-25 Dbm Reflex Enterprises Inc. Illumination optics and devices
CN116414010B (zh) * 2023-04-06 2024-04-26 上海镭望光学科技有限公司 一种自由光瞳产生装置及其产生自由光瞳照明的方法

Citations (4)

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JP2006030651A (ja) 2004-07-16 2006-02-02 Nikon Corp 微細パターンの製造方法、光学素子の製造方法および露光装置。
US20070216887A1 (en) 2004-04-23 2007-09-20 Carl Zeiss Smt Ag Illumination System for a Microlithographic Projection Exposure Apparatus
US20070279535A1 (en) 2004-02-26 2007-12-06 Damian Fiolka Illumination System For A Microlithography Projection Exposure Installation
JP2009527114A (ja) 2006-02-17 2009-07-23 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明システム用の光結合器

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US20070279535A1 (en) 2004-02-26 2007-12-06 Damian Fiolka Illumination System For A Microlithography Projection Exposure Installation
US20070216887A1 (en) 2004-04-23 2007-09-20 Carl Zeiss Smt Ag Illumination System for a Microlithographic Projection Exposure Apparatus
JP2006030651A (ja) 2004-07-16 2006-02-02 Nikon Corp 微細パターンの製造方法、光学素子の製造方法および露光装置。
JP2009527114A (ja) 2006-02-17 2009-07-23 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置の照明システム用の光結合器

Also Published As

Publication number Publication date
US20110194090A1 (en) 2011-08-11
EP2354853B1 (de) 2013-01-02
KR20110093663A (ko) 2011-08-18
US8724080B2 (en) 2014-05-13
JP2011166158A (ja) 2011-08-25
EP2354853A1 (de) 2011-08-10
JP5762051B2 (ja) 2015-08-12

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