KR101717566B1 - Liquid crystal aligning agent, method for forming liquid crystal alignment film, and liquid crystal display device - Google Patents

Abstract

로 나타나는 구조로 대표되는 특정의 구조를 갖는 감방사선성 중합체를 함유한다.(Problem) The alignment regulating force of liquid crystal molecules can be imparted by the photo alignment method, and when the liquid crystal display device is applied to a vertical alignment type liquid crystal display device, the balance between the vertical alignment regulating force and the coating performance is excellent. On the other hand, Or a liquid crystal aligning agent which gives a liquid crystal alignment film excellent in alignment regulating force when applied to a transverse electric field type liquid crystal display device.
(Solution) The liquid crystal aligning agent is represented by the following formula (1'-1):

The radiation-sensitive polymer having a specific structure represented by the structure represented by the formula

Description

TECHNICAL FIELD [0001] The present invention relates to a liquid crystal aligning agent, a liquid crystal aligning agent, a liquid crystal aligning agent, a liquid crystal aligning agent, a liquid crystal aligning agent,

The present invention relates to a liquid crystal aligning agent and a liquid crystal display element. More specifically, the present invention relates to a liquid crystal aligning agent for imparting a liquid crystal alignment film excellent in alignment control force of liquid crystal molecules and a liquid crystal display element having excellent display quality.

Conventionally, a nematic liquid crystal having a positive dielectric anisotropy is formed into a sandwich structure with a transparent electrode-attached substrate having a liquid crystal alignment film, and the long axis of the liquid crystal molecules is continuously twisted 0 to 360 ° continuously (Twisted Nematic) type and STN (Super Twisted Nematic) type liquid crystal display devices are known (see Patent Documents 1 and 2).

In such a liquid crystal display element, it is necessary to form a liquid crystal alignment film on the substrate surface in order to align the liquid crystal molecules in a predetermined direction with respect to the substrate surface. This liquid crystal alignment film is usually formed by a method (rubbing method) in which the surface of the organic film formed on the substrate surface is rubbed in a direction such as rayon or the like. However, when the formation of the liquid crystal alignment film is performed by rubbing treatment, dust or static electricity easily occurs in the process, so that dust adheres to the surface of the alignment film, which causes a problem of display defects. Particularly, in the case of a substrate having a TFT (Thin Film Transistor) element, circuit breakage of the TFT element occurs due to the generated static electricity, which may cause a reduction in yield. In addition, in a liquid crystal display device which is gradually and finer in the future, irregularities are generated on the surface of the substrate with increasing density of pixels, so that it is difficult to uniformly perform the rubbing treatment.

As another means for restricting alignment of liquid crystal molecules in a liquid crystal display element, a method of irradiating polarized or non-polarized radiation to a photosensitive thin film such as polyvinyl cinnamate, polyimide, or azobenzene derivative formed on the substrate surface, An optical alignment method is known. According to this method, uniform liquid crystal alignment can be realized without generating static electricity or dust (see Patent Documents 3 to 13).

On the other hand, a VA (Vertical Alignment) type liquid crystal display device in which liquid crystal molecules having negative dielectric anisotropy are vertically aligned on a substrate is also known as an operation mode of the liquid crystal display device different from the above. In this operation mode, when a voltage is applied between the substrates to tilt the liquid crystal molecules toward the direction parallel to the substrate, it is necessary that the liquid crystal molecules are inclined from one direction of the substrate normal to one direction within the substrate surface. As a means for this, for example, a method of forming protrusions on the substrate surface, a method of forming stripes on the transparent electrode, and a method of slightly tilting the liquid crystal molecules toward one direction in the substrate surface from the substrate normal direction (Pre-tilting) method and the like have been proposed.

It is known that the photo alignment method is also useful as a method of controlling the tilt direction of liquid crystal molecules in a vertical alignment type liquid crystal display element. That is, it has been known that the tilt direction of the liquid crystal molecules at the time of voltage application can be controlled uniformly by using a vertically aligning liquid crystal alignment film imparted with alignment control ability and pretilt angle manifestation by the photo alignment method (see Patent Document 11 12 and 14-16).

However, when a liquid crystal alignment film to be applied to a liquid crystal display device of a TN type, an STN type or a vertical alignment type is to be formed by a photo alignment method, a liquid crystal aligning agent stably expressing an industrially sufficient liquid crystal alignment regulating force It is not known for now. In particular, when the liquid crystal display device is applied to a vertical alignment type liquid crystal display device, in order to manifest a liquid crystal aligning regulating force in a direction perpendicular to the substrate surface, the polymer to be a liquid crystal alignment film must have a rigid liquid crystal like structure , There is a problem that the coating property and the printing property of the liquid crystal aligning agent containing the same are impaired, and a vertical alignment type liquid crystal aligning agent having good liquid crystal alignability and good coating property to date has not been known.

Recently, there has been proposed a liquid crystal display element of a transverse electric field system (IPS mode) in which an electrode is formed only on the side of a pair of substrates arranged opposite to each other and an electric field is generated in a direction parallel to the substrate (Patent Document 17) . The liquid crystal display element of the transverse electric field system is a liquid crystal display element in which electrodes are formed only on the side of a pair of oppositely disposed substrates and an electric field is generated in a direction parallel to the substrate, It is known that a liquid crystal display element having a wide viewing angle characteristic and capable of high-quality display can be obtained as compared with the conventional liquid crystal display element of the conventional system which generates an electric field in the vertical direction. Since the liquid crystal display element of the transverse electric field system responds to the electric field only in the direction parallel to the substrate, there is no problem of the refractive index change in the major axis direction of the liquid crystal molecules, and even when the viewing angle is changed, There is little change in the contrast and the color tone of the display color, so that high-quality display is possible regardless of the time.

However, when a liquid crystal alignment film to be applied to such a liquid crystal display device of the transverse electric field system is formed by the photo alignment method, it is pointed out that the alignment regulating force of the liquid crystal molecules is not sufficient, and improvement is demanded.

Japanese Laid-Open Patent Publication No. 56-91277 Japanese Unexamined Patent Application Publication No. 1-120528 Japanese Patent Application Laid-Open No. 6-287453 Japanese Patent Application Laid-Open No. 10-251646 Japanese Laid-Open Patent Publication No. 11-2815 Japanese Patent Application Laid-Open No. 11-152475 Japanese Patent Application Laid-Open No. 2000-144136 Japanese Patent Application Laid-Open No. 2000-319510 Japanese Patent Application Laid-Open No. 2000-281724 Japanese Patent Application Laid-Open No. 9-297313 Japanese Patent Application Laid-Open No. 2003-307736 Japanese Laid-Open Patent Publication No. 2004-163646 Japanese Patent Application Laid-Open No. 2002-250924 Japanese Patent Application Laid-Open No. 2004-83810 Japanese Patent Application Laid-Open No. 9-211468 Japanese Patent Application Laid-Open No. 2003-114437 U.S. Patent No. 5,928,733 Japanese Patent Application Laid-Open No. 63-291922 Japanese Laid-Open Patent Publication No. 2010-097188

 &Quot; Science of Sol-Gel Method ", published by Agnes Shofusha, 1988, pp. 154-161

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and its object is to provide a liquid crystal display device capable of imparting an alignment regulating force of liquid crystal molecules by a photo alignment method and, when applied to a vertical alignment type liquid crystal display device, And a liquid crystal aligning agent which gives a liquid crystal alignment film excellent in alignment control performance when applied to a liquid crystal display device of a TN type, an STN type or a transverse electric field system.

Another object of the present invention is to provide a liquid crystal display element excellent in liquid crystal alignment restraining force and excellent in display quality.

Other objects and advantages of the present invention will become apparent from the following description.

The above objects and advantages of the present invention are achieved by firstly,

The following formulas (1 ') and (2'):

Wherein R ¹ is a hydrogen atom, a fluorine atom, an alkyl group having 1 to 20 carbon atoms or a fluoroalkyl group having 1 to 20 carbon atoms, or a monovalent group having a steroid skeleton, and R ² is a cyclohexylene group or a phenylene group, X is a single bond, an oxygen atom, a sulfur atom, a methylene group, having 2 or 3 of an alkylene ^{group, -CH = CH-, -NH-, *} -COO- or ^* - OCO- (binds with only "*" are binding hand R ² attached to), and, R ³ is a phenylene group, cyclohexylene group, a methylene group, -NH-, or the formula (R ³ -1) or (R ³ -2):

(In the formulas (R ³ -1) and (R ³ -2), X ¹ is ⁺ COO-, ⁺ -OCO- (in which the bonding hands attached with "+" , d is 0 or 1, e is an integer of 0 to 12 when d is 0, and e is an integer of 1 to 12 when d is 1)

A is an integer of 0 to 3, b is an integer of 0 to 3, c is 0 or 1, and when a is 2 or 3, plural R ² and X exist in the same May be different from the sea]

And a structure represented by each of the structures represented by the following formulas (1) and (2).

The above objects and advantages of the present invention are secondly,

And a liquid crystal alignment film formed of the above liquid crystal aligning agent.

The liquid crystal aligning agent of the present invention can impart the alignment regulating force of the liquid crystal molecules by the photo alignment method. In the case of applying the liquid crystal aligning agent to the vertically aligned liquid crystal display element, the liquid crystal aligning agent of the present invention has a good balance between the vertical alignment regulating force On the other hand, when the present invention is applied to a liquid crystal display device of a TN type, an STN type, or a transversal electric field system, a liquid crystal alignment film excellent in alignment control force of liquid crystal molecules can be provided.

The liquid crystal display element of the present invention including the liquid crystal alignment film formed of the liquid crystal aligning agent of the present invention can be applied effectively as various display devices because it can display high quality and is inexpensive.

(Mode for carrying out the invention)

The liquid crystal aligning agent of the present invention contains a radiation-sensitive polymer having at least one group selected from the group consisting of the groups represented by the formulas (1 ') and (2').

Examples of the skeleton of the radiation-sensitive polymer include polyamic acid, polyimide, polyamic acid ester, polyorganosiloxane, polyester, polyamide, cellulose and derivatives thereof, polyacetal, polystyrene and derivatives thereof, poly (styrene- Phenylmaleimide) and derivatives thereof, and poly (meth) acrylate. Of these, polyorganosiloxanes are preferred. That is, as the radiation-sensitive polymer containing the liquid crystal aligning agent of the present invention, a radiation-sensitive polyorganosiloxane having at least one group selected from the group consisting of the groups represented by the formulas (1 ') and (2' .

<Radiation-sensitive polyorganosiloxane>

The radiation-sensitive polyorganosiloxane preferably contained in the liquid crystal aligning agent of the present invention has at least one kind of group selected from the group consisting of the groups represented by the above formulas (1 ') and (2').

Examples of the alkyl group having 1 to 20 carbon atoms for R ¹ in the formulas (1 ') and (2') include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, A decyl group, an undecyl group, a dodecyl group, a tridecyl group, a tetradecyl group, a pentadecyl group, a hexadecyl group, a heptadecyl group, an octadecyl group, and an eicosyl group;

Examples of the fluoroalkyl group having 1 to 20 carbon atoms include trifluoromethyl group, pentafluoroethyl group, nonafluorobutyl group, tridecafluorohexyl group, pentadecafluoroheptyl group, heptadecafluorooctyl group, Nonadecafluorononyl group and the like;

Examples of the monovalent group having a steroid skeleton include a 3-cholestanyl group and a 3-cholestenyl group. The alkyl group and the fluoroalkyl group are preferably straight-chain.

When R ¹ is a hydrogen atom, a fluorine atom, an alkyl group having 1 to 5 carbon atoms, or a fluoroalkyl group having 1 to 5 carbon atoms, the liquid crystal aligning agent of the present invention is suitable for liquid crystal display devices of TN type, STN type, And,

When R ¹ is an alkyl group having 5 to 20 carbon atoms or a fluoroalkyl group having 5 to 20 carbon atoms, or a monovalent group having a steroid skeleton, the liquid crystal aligning agent of the present invention can be suitably applied to a vertically aligned liquid crystal display element have.

The cyclohexylene group and the phenylene group of R ² are preferably 1,4-cyclohexylene group and 1,4-phenylene group, respectively.

X is preferably a single bond or ^* -COO- (provided that a bonded ring having "*" attached thereto is bonded to R ² ).

A R ^{3-cyclohexylene} group and a phenylene group, respectively, is preferably 1,4-cyclohexylene group and a 1,4-phenylene group, R ³ is the formula (R ³ -1) or (R ³ - 2), the cyclohexylene group or the phenylene group contained in the group is preferably a 1,4-cyclohexylene group or a 1,4-phenylene group, respectively. E in the formulas (R ³ -1) and (R ³ -2) is preferably an integer of 0 to 4 when d is 0, and an integer of 1 to 4 when d is 1.

Specific examples of the group of the radiation-sensitive polyorganosiloxane contained in the liquid crystal aligning agent of the present invention include groups represented by the above formula (1 '), for example, the following formulas (1'-1) to (1'- 49):

&Lt; / RTI &gt;

Examples of the group represented by the formula (2 ') include the following groups (2'-1) to (2'-26):

And the like. In the above examples, n is an integer of 1 to 20, and the group C _n H _{2n + 1} - may be substituted with one or more fluorine atoms.

The content ratio of the at least one group selected from the group consisting of the groups represented by the formulas (1 ') and (2') in the radiation-sensitive polyorganosiloxane contained in the liquid crystal aligning agent of the present invention, More preferably 0.2 to 6 millimoles / g-polymer, and still more preferably 0.3 to 5 millimoles / g-polymer.

The radiation-sensitive polyorganosiloxane contained in the liquid crystal aligning agent of the present invention may further contain at least one group selected from the group consisting of the groups represented by the formulas (1 ') and (2'), . In this case, the epoxy equivalent of the radiation-sensitive polyorganosiloxane is preferably 150 g / mol or more, more preferably 200 to 10,000 g / mol, and still more preferably 200 to 2,000 g / mol. By using such an epoxy equivalent of a radiation-sensitive polyorganosiloxane, the liquid crystal aligning agent of the present invention can form a liquid crystal alignment film having excellent liquid crystal alignability and excellent afterimage characteristics without impairing the storage stability of the liquid crystal aligning agent So that it is preferable.

For the radiation-sensitive polyorganosiloxane contained in the liquid crystal aligning agent of the present invention, the weight average molecular weight in terms of polystyrene measured by gel permeation chromatography is preferably 1,000 to 200,000, more preferably 2,000 to 100,000 And particularly preferably 3,000 to 30,000.

<Synthesis of radiation-sensitive polyorganosiloxane>

The radiation-sensitive polyorganosiloxane preferably contained in the liquid crystal aligning agent of the present invention may be those synthesized by any method as described above. As a method of synthesizing the radiation-sensitive polyorganosiloxane contained in the liquid crystal aligning agent of the present invention, for example,

A hydrolyzable silane compound having at least one group selected from the group consisting of the groups represented by the above formulas (1 ') and (2'), or a mixture of the hydrolyzable silane compound and other hydrolyzable silane compounds, A method of decomposition and condensation,

A polyorganosiloxane having an epoxy group, and a polyorganosiloxane having the following formulas (1) and (2):

(Wherein R ¹ , R ² , R ³ , X, a, b and c in the formulas (1) and (2) are the same as those in the formulas (1 ') and (2'

(Hereinafter, referred to as &quot; specific carbonic acid &quot;), and the like.

Of these, from the viewpoints of ease of synthesis of the starting compound, ease of reaction, and the like, it is preferable to use the latter method.

Hereinafter, a method of reacting a polyorganosiloxane having an epoxy group with a specific carboxylic acid, which is a preferable method for synthesizing a radiation-sensitive polyorganosiloxane contained in the liquid crystal aligning agent of the present invention, will be described.

[Polyorganosiloxane Having an Epoxy Group]

The epoxy group in the polyorganosiloxane having an epoxy group is preferably a structure in which an ethylene oxide skeleton or a 1,2-epoxycycloalkane skeleton is bonded to a silicon atom via an alkylene which may be directly or interrupted by an oxygen atom Is preferably present in the polyorganosiloxane as a group contained in the group (group having an epoxy group). Examples of the group having such an epoxy group include groups represented by the following formulas (EP-1) or (EP-2):

(In the formulas (EP-1) and (EP-2), &quot; * &quot;

And the like.

The epoxy equivalent of the polyorganosiloxane having an epoxy group is preferably 100 to 10,000 g / mol, and more preferably 150 to 1,000 g / mol.

The weight average molecular weight of the polyorganosiloxane having an epoxy group in terms of polystyrene measured by gel permeation chromatography is preferably 500 to 100,000, more preferably 1,000 to 10,000, particularly preferably 1,000 to 5,000 Do.

Such a polyorganosiloxane having an epoxy group can be prepared by, for example, hydrolysis and condensation of a silane compound having an epoxy group or a mixture of a silane compound having an epoxy group and another silane compound, preferably in the presence of an appropriate organic solvent, Can be synthesized by condensation.

Examples of the silane compound having an epoxy group include 3-glycidyloxypropyltrimethoxysilane, 3-glycidyloxypropyltriethoxysilane, 3-glycidyloxypropylmethyldimethoxysilane, 3- 3-glycidyloxypropyldimethylmethoxysilane, 3-glycidyloxypropyldimethylethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3- 2- (3,4-epoxycyclohexyl) ethyltriethoxysilane, and the like.

Examples of the other silane compounds include tetrachlorosilane, tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetra-i-propoxysilane, tetra-n-butoxysilane, tetra- -Butoxysilane, trichlorosilane, trimethoxysilane, triethoxysilane, tri-n-propoxysilane, tri-i-propoxysilane, tri-n-butoxysilane, tri- , Fluorotrichlorosilane, fluorotrimethoxysilane, fluorotriethoxysilane, fluorotri-n-propoxysilane, fluorotri-i-propoxysilane, fluorotri-n-butoxysilane, fluorotri-sec -Methyltriethoxysilane, methyltri-n-propoxysilane, methyltri-i-propoxysilane, methyltri-n-butoxysilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriethoxysilane, methyltri- Tri-sec-butoxy silane, 2- (trifluoromethyl) ethyl trichlorosilane, 2- (Trifluoromethyl) ethyltrimethoxysilane, 2- (trifluoromethyl) ethyltriethoxysilane, 2- (trifluoromethyl) ethyltri-n-propoxysilane, 2- (trifluoromethyl) ethyl tri-n-butoxysilane, 2- (trifluoromethyl) ethyl tri-sec-butoxysilane, 2- (perfluoro- N-hexyl) ethyltriethoxysilane, 2- (perfluoro-n-hexyl) ethyltrimethoxysilane, 2- (perfluoro- (Perfluoro-n-hexyl) ethyltri-n-butoxysilane, 2- (perfluoro-n-hexyl) ethyltri- Octyl) ethyltrichlorosilane, 2- (perfluoro-n-octyl) ethyl tri-sec-butoxysilane, 2- (perfluoro- Methoxy silane, 2- (perfluoro-n-octyl) ethyl triethoxy silane,

Octyl) ethyltri-i-propoxysilane, 2- (perfluoro-n-octyl) ethyltri-n-propoxysilane, 2- (perfluoro- ) Ethyltri-n-butoxysilane, 2- (perfluoro-n-octyl) ethyltri-sec-butoxysilane, hydroxymethyl trichlorosilane, hydroxymethyltrimethoxysilane, Hydroxymethyl tri-n-propoxysilane, hydroxymethyl tri-n-butoxysilane, hydroxymethyl tri-sec-butoxysilane, 3- ( (Meth) acryloxypropyltriethoxysilane, 3- (meth) acryloxypropyltriethoxysilane, 3- (meth) acryloxypropyltriethoxysilane, 3- (Meth) acryloxypropyltri-sec-butoxysilane, 3 (meth) acryloxypropyltri-i-propoxysilane, 3- - Me 3-mercaptopropyltriethoxysilane, 3-mercaptopropyltriethoxysilane, 3-mercaptopropyltri-n-propoxysilane, 3-mercaptopropyltriethoxysilane, 3-mercaptopropyltriethoxysilane, Mercaptopropyltrimethoxysilane, mercaptopropyltriethoxysilane, mercaptomethyltriethoxysilane, vinyltrichlorosilane, vinyltrimethoxysilane, vinyltrimethoxysilane, vinyltrimethoxysilane, vinyltrimethoxysilane, vinyltrimethoxysilane, Vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriethoxysilane, vinyltri-n-propoxysilane, vinyltri-i-propoxysilane, vinyltri-n-butoxysilane, vinyltri- Silane, allyltrimethoxysilane, allyltriethoxysilane, allyltri-n-propoxysilane, allyltri-i-propoxysilane, allyltri-n-butoxysilane, allyltri- , Phenyl trichlorosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltri-n-propoxysilane, phenyltriethoxysilane, butoxy silane, phenyl tri-sec-butoxy silane, methyldichlorosilane, methyl dimethoxy silane, methyl diethoxy silane, methyl di-n-propoxy silane, methyl di- butoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, dimethyl di-n-propoxysilane, dimethyl di-n-butoxysilane, dimethyl di-sec-butoxysilane, dimethyldichlorosilane, dimethyldimethoxysilane, i-propoxy silane, dimethyl di-n-butoxy silane, dimethyl di-sec-butoxysilane,

(Perfluoro-n-octyl) ethyl] dimethoxysilane, (methyl) [2- (perfluoro-n-octyl) ethyl] dichlorosilane, N-octyl) ethyl] diethoxysilane, (methyl) [2- (perfluoro-n-octyl) ethyl] (Methyl) [2- (perfluoro-n-octyl) ethyl] di-i-propoxysilane, Octyl) ethyl] di-sec-butoxysilane, (methyl) (3-mercaptopropyl) dichlorosilane, (methyl) (3- mercaptopropyl) dimethoxysilane, Propoxysilane, (methyl) (3-mercaptopropyl) di-n-propoxysilane, (methyl) (3-mercaptopropyl) (methyl) (vinyl) dimethoxysilane, (methyl) (vinyl) dichlorosilane, (methyl) (vinyl) dimethoxysilane, Diethoxy silane, (methyl) (vinyl) di-n-propoxy (Methyl) (vinyl) di-sec-butoxysilane, divinyldichlorosilane, di (vinyl) di-n-butoxysilane, Divinyldiethoxysilane, divinyldi-n-propoxysilane, divinyldi-i-propoxysilane, divinyldi-n-butoxysilane, divinyldi-sec-butoxysilane , Diphenyldichlorosilane, diphenyldimethoxysilane, diphenyldiethoxysilane, diphenyldi-n-propoxysilane, diphenyldi-i-propoxysilane, diphenyldi-n-butoxysilane, diphenyl Di-sec-butoxysilane, chlorodimethylsilane, methoxydimethylsilane, ethoxydimethylsilane, chlorotrimethylsilane, bromotrimethylsilane, iodotrimethylsilane, methoxytrimethylsilane, ethoxytrimethylsilane, n-propoxy Propoxytrimethylsilane, sec-butoxytrimethylsilane, t-butoxytrimethylsilane, (chloro) (vinyl) dimethylsilane, ( (Methoxy) (vinyl) dimethylsilane, (ethoxy) (vinyl) dimethylsilane, (chloro) (methyl) diphenylsilane, (methoxy) , A silane compound having one silicon atom,

X-21-5841, X-21-5842, X-21-5843, X-21-5844, X-21-5845, K- X-21-5846, X-21-5847, X-21-5848, X-22-160 AS, X-22-170B, X-22-170BX, X-22-170D, X-22-170DX, X X-22-176B, X-22-176D, X-22-176DX, X-22-176F, X-40-2308, X-40-2651, X-40-2655A, X- -2672, X-40-9220, X-40-9225, X-40-9227, X-40-9246, X-40-9247, X-40-9250, X-40-9323, X-41-1053 , X-41-1056, X-41-1805, X-41-1810, KF6001, KF6002, KF6003, KR212, KR-213, KR-217, KR220L, KR242A, KR271, KR282, KR300, KR311, KR401N, KR500 SH804, SH805, SH806A, SH840, SR2400, SR2402, SR2405 (trade names, manufactured by Shin-Etsu Chemical Co., Ltd.), KR510, KR5206, KR5230, KR5235, KR9218, KR9706 , DMS-S12, DMS-S15, DMS-S21, DMS (manufactured by Nippon Unicar Co., Ltd.), SR2406, SR2410, SR2411, SR2416, and SR2420 (manufactured by Toray / Dow Corning Toray Co., -S27, DMS-S31, DMS-S32, DMS-S33, DMS-S DMS-S45, DMS-S51, DMS-227, PSD-0332, PDS-1615, PDS-9931 and XMS-5025 (manufactured by Chisso Corporation) , Ethyl silicate 28, ethyl silicate 40, ethyl silicate 48 (manufactured by Colcote Kabushiki Kaisha), GR100, GR650, GR908, and GR950 Manufactured by Wako Pure Chemical Industries, Ltd.), and the like, and at least one of these may be used.

Examples of other silane compounds include tetramethoxysilane, tetraethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, 3- (meth) acryloxypropyltrimethoxysilane, 3- (meth) acryloxy Propyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane, allyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, 3-mercaptopropyltrimethoxy It is preferable to use at least one member selected from the group consisting of silane, 3-mercaptopropyltriethoxysilane, mercaptomethyltrimethoxysilane, mercaptomethyltriethoxysilane, dimethyldimethoxysilane and dimethyldiethoxysilane desirable.

In the synthesis of the polyorganosiloxane having an epoxy group in the present invention, the use ratio of the silane compound having an epoxy group and the other silane compound is adjusted so that the epoxy equivalent of the resulting polyorganosiloxane falls within the above- .

Examples of the organic solvent that can be used in synthesizing the polyorganosiloxane having an epoxy group include hydrocarbons, ketones, esters, ethers, and alcohols.

Examples of the hydrocarbon include toluene, xylene, etc. Examples of the ketone include methyl ethyl ketone, methyl isobutyl ketone, methyl n-amyl ketone, diethyl ketone, cyclohexanone and the like;

Examples of the ester include ethyl acetate, n-butyl acetate, i-amyl acetate, propylene glycol monomethyl ether acetate, 3-methoxybutyl acetate, ethyl lactate and the like;

Examples of the ether include ethylene glycol dimethyl ether, ethylene glycol diethyl ether, tetrahydrofuran, dioxane and the like;

Examples of the alcohols include 1-hexanol, 4-methyl-2-pentanol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene glycol mono-n- , Propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether and the like. Of these, non-water-soluble ones are preferable.

These organic solvents may be used alone or in combination of two or more.

The amount of the organic solvent to be used is preferably 10 to 10,000 parts by weight based on 100 parts by weight of the total of the silane compounds (total amount of the silane compound having an epoxy group and other silane compounds used arbitrarily) Preferably 50 to 1,000 parts by weight.

The amount of water used when synthesizing the polyorganosiloxane having an epoxy group is preferably 0.5 to 100 moles, more preferably 1 to 30 moles, per 1 mole of the total amount of the silane compound.

As the catalyst, for example, an acid, an alkali metal compound, an organic base, a titanium compound, a zirconium compound and the like can be used.

Examples of the alkali metal compound include sodium hydroxide, potassium hydroxide, sodium methoxide, potassium methoxide, sodium ethoxide, potassium ethoxide and the like.

Examples of the organic base include primary and secondary organic amines such as ethylamine, diethylamine, piperazine, piperidine, pyrrolidine and pyrrole; triethylamine, tri-n-propylamine, tri- Tertiary organic amines such as butylamine, pyridine, 4-dimethylaminopyridine and diazabicyclo-undecene; and quaternary organic amines such as tetramethylammonium hydroxide. Among these organic bases, tertiary organic amines such as triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine and 4-dimethylaminopyridine, quaternary organics such as tetramethylammonium hydroxide Amines are preferred.

As a catalyst for synthesizing a polyorganosiloxane having an epoxy group, an alkali metal compound or an organic base is preferable. By using an alkali metal compound or an organic base as a catalyst, a desired polyorganosiloxane can be obtained at a high hydrolysis and condensation rate without causing a side reaction such as ring opening of an epoxy group, Do. The liquid crystal aligning agent of the present invention containing a reaction product of a polyorganosiloxane having an epoxy group synthesized using an alkali metal compound or an organic base as a catalyst and a cinnamic acid derivative is suitable because of its excellent storage stability. This is because, as pointed out in Non-Patent Document 1 ("Science of Sol-Gel Process", published by Agneshofusha Co., Ltd., 1988, pp. 154-161), as a catalyst in the hydrolysis and condensation reaction It is contemplated that the use of an alkali metal compound or an organic base may result in the formation of a three-dimensional structure such as a random structure or a basket structure, resulting in a polyorganosiloxane having a small content of silanol groups. The condensation reaction between the silanol groups and the other polymers is suppressed when the condensation reaction between the silanol groups is suppressed because the content of the silanol groups is small and the liquid crystal aligning agent of the present invention contains the other polymer described below, Resulting in excellent storage stability.

As the catalyst, an organic base is particularly preferable. The amount of the organic base to be used differs depending on the kind of the organic base, the reaction conditions such as the temperature, and the like, and should be appropriately set. For example, the amount is preferably 0.01 to 3 moles per 1 mole of the total amount of the silane compound, 0.05 to 1 mol.

The hydrolysis and condensation reaction in the synthesis of a polyorganosiloxane having an epoxy group can be carried out by dissolving an epoxy group-containing silane compound and, if necessary, other silane compounds in an organic solvent, mixing this solution with an organic base and water, For example, by heating using an appropriate heating device such as an oil bath.

In the hydrolysis and condensation reaction, the heating temperature is preferably 130 占 폚 or lower, more preferably 40 to 100 占 폚, preferably 0.5 to 12 hours, and more preferably 1 to 8 hours . During the heating, the mixed solution may be stirred, the stirring may not be performed, or the mixed solution may be left under reflux.

After completion of the reaction, the organic solvent layer separated from the reaction mixture is preferably washed with water. At the time of this cleaning, it is preferable that the cleaning operation is facilitated by washing with water containing a small amount of salt, for example, an aqueous solution of ammonium nitrate of about 0.2 wt%. The washing is carried out until the water layer after the washing becomes neutral. Thereafter, the organic solvent layer is dried with an appropriate drying agent such as anhydrous calcium sulfate and molecular sieves, if necessary, and then the solvent is removed to obtain a polyol having an intended epoxy group To obtain a siloxane.

In the present invention, a commercially available polyorganosiloxane having an epoxy group may be used. Examples of such commercially available products include DMS-E01, DMS-E12, DMS-E21 and EMS-32 (manufactured by Chisso Corporation).

[Specific Carbonic Acid]

Specific examples of the specific carbonic acid include carbonic acid obtained by bonding a hydrogen atom to the bond of the group exemplified above as a group represented by each of the formulas (1 ') and (2').

[Synthesis of radiation-sensitive polyorganosiloxane]

The radiation-sensitive polyorganosiloxane preferably contained in the liquid crystal aligning agent of the present invention is preferably a polyorganosiloxane having an epoxy group as described above and a specific carbonic acid, preferably in the presence of a catalyst and an organic solvent And then the reaction is carried out.

Here, the total amount of the specific carbonic acid is preferably 0.01 to 5 mol, more preferably 0.05 to 2 mol, and still more preferably 0.1 to 0.8 mol, relative to 1 mol of the epoxy group of the polyorganosiloxane .

In the present invention, a part of the specific carbonic acid is added in the range of the following formula (3):

R ^I -R ^II -COOH (3)

(Wherein R ^I is an alkyl or alkoxyl group having 8 to 20 carbon atoms or a fluoroalkyl group or fluoroalkoxyl group having 1 to 21 carbon atoms, R ^II is a single bond, a 1,4-cyclohexylene group or a 1,4-phenylene group)

May be substituted for the compound represented by the formula In this case, the synthesis of the radiation-sensitive polyorganosiloxane is carried out by reacting a mixture of a polyorganosiloxane having an epoxy group with a specific carbonic acid and a compound represented by the formula (3).

As a preferable example of the compound represented by the formula (3), for example, a compound represented by the following formula (3-1) or (3-2):

(Wherein f is an integer of 1 to 3, g is an integer of 3 to 18, h is an integer of 1 to 20, and i is an integer of 0 to 18)

(3-2-1) to (3-2-3): &lt; EMI ID =

Are preferred.

Since the compound represented by the formula (3) reacts with the polyorganosiloxane having an epoxy group together with the specific carbonic acid and becomes a site giving the pretilt angularity to the resulting liquid crystal alignment film, the liquid crystal aligning agent Can be suitably used in the case of applying the liquid crystal display device to a vertical alignment type liquid crystal display device. In the present specification, the compound represented by the formula (3) is hereinafter referred to as "other carbonic acid".

In the present invention, when at least one kind selected from the group consisting of the compounds represented by the specific carbonic acid is used, the total amount of the specific carbonic acid and the other carbonic acid is preferably within the range Is preferably 0.001 to 1.5 moles, more preferably 0.01 to 1 mole, and still more preferably 0.05 to 0.9 mole, per 1 mole. In this case, the other carbonic acid is preferably used in an amount of not more than 50 mol%, more preferably not more than 25 mol% with respect to the total amount with the specific carbonic acid. When the ratio of the other carbonic acid is more than 50 mol%, there arises a problem that an abnormal domain occurs when the liquid crystal display element is turned ON.

As the catalyst, known compounds can be used as so-called curing accelerators for promoting the reaction between an organic base or an epoxy compound and an acid anhydride.

The organic base includes, for example, primary and secondary organic amines such as ethylamine, diethylamine, piperazine, piperidine, pyrrolidine and pyrrole;

Tertiary organic amines such as triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine, 4-dimethylaminopyridine and diazabicycloundecene;

And quaternary organic amines such as tetramethylammonium hydroxide. Of these organic bases, tertiary organic amines such as triethylamine, tri-n-propylamine, tri-n-butylamine, pyridine and 4-dimethylaminopyridine;

Quaternary organic amines such as tetramethylammonium hydroxide are preferred.

Examples of the curing accelerator include tertiary amines such as benzyldimethylamine, 2,4,6-tris (dimethylaminomethyl) phenol, cyclohexyldimethylamine and triethanolamine;

2-phenylimidazole, 2-phenyl-4-methylimidazole, 1-benzyl-2-methylimidazole, 2- Methylimidazole, 1-benzyl-2-phenylimidazole, 1,2-dimethylimidazole, 2-ethyl-4-methylimidazole, 1- (2-cyanoethyl) 1- (2-cyanoethyl) -2-n-octylimidazole, 1- (2-cyanoethyl) 2-phenyl-4-methylimidazole, 2-phenyl-4-methyl-5-hydroxymethylimidazole, 2- (2-cyanoethoxy) methyl] imidazole, 1- (2-cyanoethyl) -2-n-undecylimidazolium trimellitate (2- cyanoethyl) -2-phenylimidazolium trimellitate, 1- (2-cyanoethyl) -2-ethyl-4-methylimidazolium trimellitate, 2,4- Ethyl-s-triazine, 2,4-diamino-6- (2'-n-undecylimidazolyl) ethyl-s- Triazine, 2,4-di Methyl-imidazolyl- (1 ')] ethyl-s-triazine, isocyanuric acid adducts of 2-methylimidazole, 2-phenylimidazole Imidazole compounds such as the isocyanuric acid adduct of 2,4-diamino-6- [2'-methylimidazolyl (1 ')] ethyl-s-triazine;

Organic phosphorus compounds such as diphenylphosphine, triphenylphosphine, and triphenylphosphate;

Benzyltriphenylphosphonium chloride, tetra-n-butylphosphonium bromide, methyltriphenylphosphonium bromide, ethyltriphenylphosphonium bromide, n-butyltriphenylphosphonium bromide, tetraphenylphosphonium bromide, ethyltriphenylphosphonium Iodine, tetra-n-butylphosphonium benzotriazolate, tetra-n-butylphosphonium tetrafluoroacetate, tetra- Quaternary phosphonium salts such as roboalate, tetra-n-butylphosphonium tetraphenylborate and tetraphenylphosphonium tetraphenylborate;

Diazabicycloalkenes such as 1,8-diazabicyclo [5.4.0] undecene-7 and its organic acid salts;

Organometallic compounds such as zinc octylate, tin octylate, and aluminum acetyl acetone complex;

Quaternary ammonium salts such as tetraethylammonium bromide, tetra-n-butylammonium bromide, tetraethylammonium chloride and tetra-n-butylammonium chloride;

Boron compounds such as boron trifluoride, triphenyl borate;

Metal halide compounds such as zinc chloride and stannic chloride;

A high melting point dispersed latent curing accelerator such as an amine addition type accelerator such as dicyandiamide or an adduct of an amine with an epoxy resin;

A microcapsulated latent curing accelerator in which the surface of a curing accelerator such as an imidazole compound, an organic phosphorus compound or a quaternary phosphonium salt is coated with a polymer;

Amine salt type latent curing accelerator;

And latent curing accelerators such as high temperature dissociation type thermal cationic polymerization latent curing accelerators such as Lewis acid salts and Bronsted acid salts.

Of these, quaternary ammonium salts such as tetraethylammonium bromide, tetra-n-butylammonium bromide, tetraethylammonium chloride and tetra-n-butylammonium chloride are preferable.

The catalyst is used in an amount of preferably 100 parts by weight or less, more preferably 0.01 to 100 parts by weight, and still more preferably 0.1 to 20 parts by weight, based on 100 parts by weight of the polyorganosiloxane having an epoxy group.

The reaction of the polyorganosiloxane having an epoxy group with the specific carboxylic acid can be carried out in the presence of an organic solvent if necessary. Examples of such organic solvents include hydrocarbons, ethers, esters, ketones, amides, and alcohols. Of these, ethers, esters or ketones are preferable in view of the solubility of the raw materials and the products and the solubility of the products in purification. The solvent is used in such a ratio that the solid concentration (the ratio of the weight of the components other than the solvent in the reaction solution to the total weight of the solution) is preferably 0.1% by weight or more, and more preferably 5 to 50% by weight.

The reaction temperature is preferably 0 to 200 캜, more preferably 50 to 150 캜. The reaction time is preferably 0.1 to 50 hours, more preferably 0.5 to 20 hours.

The synthesis of such a radiation-sensitive polyorganosiloxane is selected from the group consisting of the groups represented by each of the above-mentioned formulas (1 ') and (2') by the ring-opening portion of epoxy contained in the polyorganosiloxane having an epoxy group At least one kind of group is introduced. This synthesis method is very suitable in that it can be easily introduced and can increase the introduction rate of at least one group selected from the group consisting of the groups represented by each of the formulas (1 ') and (2').

<Other components>

The liquid crystal aligning agent of the present invention contains the above radiation-sensitive polymer, preferably a radiation-sensitive polyorganosiloxane.

The liquid crystal aligning agent of the present invention may further contain other components in addition to the above radiation-sensitive polymer, preferably the radiation-sensitive polyorganosiloxane, so long as the effect of the present invention is not impaired. Examples of such other components include a polymer other than the radiation sensitive polymer (hereinafter referred to as "other polymer"), a curing agent, a curing catalyst, a curing accelerator, a compound having at least one epoxy group in the molecule (Hereinafter referred to as "epoxy compound"), a functional silane compound (excluding those corresponding to the above-mentioned radiation-sensitive polyorganosiloxane), a surfactant, and the like have.

[Other Polymers]

The other polymer can be used to further improve the solution characteristics of the liquid crystal aligning agent of the present invention and the above characteristics of the resulting liquid crystal alignment film. These other polymers are polymers having neither groups represented by each of the above-mentioned formulas (1 ') and (2'), and examples thereof include polyamic acid, polyimide, polyolefins other than the above radiation-sensitive polyorganosiloxane (Hereinafter referred to as &quot; other polyorganosiloxane &quot;); (Styrene-phenylmaleimide) derivatives, poly (meth) acrylate, and the like. Of these, at least one of them is preferably used .

As the other polymer in the present invention, it is preferable to use at least one polymer selected from the group consisting of polyamic acid and polyimide or other polyorganosiloxane.

{Polyamic acid}

The polyamic acid can be obtained by reacting a tetracarboxylic acid dianhydride with a diamine.

Examples of the tetracarboxylic acid dianhydride used for synthesizing the polyamic acid in the present invention include aliphatic tetracarboxylic acid dianhydride, alicyclic tetracarboxylic acid dianhydride, and aromatic tetracarboxylic dianhydride. Specific examples thereof include aliphatic tetracarboxylic acid dianhydrides such as butanetetracarboxylic dianhydride;

As the alicyclic tetracarboxylic acid dianhydride, for example, 1,2,3,4-cyclobutanetetracarboxylic acid dianhydride, 2,3,5-tricarboxycyclopentyl acetic acid dianhydride, 1,3,3a, 4, 5,9b-hexahydro-5- (tetrahydro-2,5-dioxo-3-furanyl) -naphtho [1,2- c] furan-1,3-dione, , 5,9b-hexahydro-8-methyl-5- (tetrahydro-2,5-dioxo-3-furanyl) -naphtho [ (Tetrahydrofuran-2 ', 5'-dione), 5- (2,5-dioxotetrahydro-3 ' 3-cyclohexene-1,2-dicarboxylic anhydride, 3,5,6-tricarboxy-2-carboxymethylnorbornane-2: 3,5: 6-2 anhydride, 2,4,6,8-tetracarboxybicyclo [3.3.0] octane-2: 4,6: 8-2 anhydride, 4,9-dioxatricyclo [5.3.1.0 ^2,6 ] undecane- , 5,8,10-tetralone, and the like;

As the aromatic tetracarboxylic acid dianhydride, for example, pyromellitic dianhydride and the like,

A tetracarboxylic acid dianhydride described in JP-A-2010-097188 (Patent Document 19) can be used.

Among the tetracarboxylic acid dianhydrides used for synthesizing the polyamic acid, those containing an alicyclic tetracarboxylic dianhydride are preferable, and 2,3,5-tricarboxycyclopentyl acetic acid dianhydride and 1, , 2,3,4-cyclobutanetetracarboxylic acid dianhydride, and particularly preferably 2,3,5-tricarboxycyclopentyl acetic acid dianhydride. .

The tetracarboxylic acid dianhydride used for synthesizing the polyamic acid may be selected from the group consisting of 2,3,5-tricarboxycyclopentyl acetic acid dianhydride and 1,2,3,4-cyclobutanetetracarboxylic acid dianhydride. Is contained preferably in an amount of 10 mol% or more, more preferably 20 mol% or more, and more preferably in the range of 2, 3, 5-tricarboxycyclopentyl acetic acid dianhydride and / And most preferably at least one selected from the group consisting of 1,2,3,4-cyclobutane tetracarboxylic acid dianhydride.

Examples of diamines used for synthesizing polyamic acid include aliphatic diamines, alicyclic diamines, aromatic diamines, diaminoorganosiloxanes, and the like. Specific examples thereof include aliphatic diamines such as 1,1-meta-xylylenediamine, 1,3-propanediamine, tetramethylenediamine, pentamethylenediamine, hexamethylenediamine and the like;

As the alicyclic diamine, for example, 1,4-diaminocyclohexane, 4,4'-methylenebis (cyclohexylamine), 1,3-bis (aminomethyl) cyclohexane and the like;

As aromatic diamines, for example, p-phenylenediamine, 4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylsulfide, 1,5-diaminonaphthalene, 2,2'-dimethyl Diaminobiphenyl, 4,4'-diamino-2,2'-bis (trifluoromethyl) biphenyl, 2,7-diaminofluorene, 4,4'-diamino Diphenyl ether, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 9,9- 4,4'- (m-tert-butylphenyl) hexafluoropropane, 2,2-bis (4-aminophenyl) hexafluoropropane, Bis (4-aminophenoxy) benzene, 4,4'-bis (4-aminophenoxy) biphenyl, 2,6-diaminopyridine, 3,4 Diaminopyrimidine, 3,6-diaminoacridine, 3,6-diaminocarbazole, N-methyl-3,6-diaminocarbazole, N-ethyl-3 , 6-diaminocarbazole, N-phenyl-3,6-di (4-aminophenyl) -N, N'-dimethylbenzidine, 1,4-bis- (4-aminophenyl) Phenyl) -piperazine, 3,5-diaminobenzoic acid, cholestanyloxy-3,5-diaminobenzene, cholestenyloxy-3,5-diaminobenzene, cholestanyloxy-2,4-di 4-diaminobenzene, 3,5-diaminobenzoic acid cholestanyl, 3,5-diaminobenzoic acid cholestenyl, 3,5-diaminobenzoic acid lanostanyl, 3 (4-aminophenoxy) cholestane, 4- (4'-trifluoromethoxybenzoyloxy) cyclohexyl-3,5-dia Diaminobenzoate, 1,1-bis (4 - ((aminophenyl) methyl) phenyl) -4-butyl (4-trifluoromethylbenzoyloxy) cyclohexyl- (4 - ((aminophenoxy) methyl) phenyl) -4-heptylcyclohexane, 1,1-bis Butyl cyclohexane, 1,1-bis (4 - ((amino) methyl) phenyl) -4- (4-heptyl cyclohexyl) cyclohexane, and the following formula (D-1):

(Formula (D-1) of, X ^I are also combined with the alkyl group having a carbon number of 1~3, ^* -O-, ^* -COO- or ^* -OCO- (However, the combined hand-diamino phenyl group attached to "*" M is 0 or 1, n is an integer of 0 to 2, and p is an integer of 1 to 20);

Examples of the diaminoorganosiloxane include 1,3-bis (3-aminopropyl) -tetramethyldisiloxane and the like,

Diamine described in Japanese Patent Application Laid-Open No. 2010-097188 (Patent Document 19) can be used.

X ^I in the formula (D-1) is preferably an alkyl group having 1 to 3 carbon atoms, ^* -O- or ^* -COO- (provided that the bond attached with "*" is bonded to a diaminophenyl group) Do. Specific examples of the group C _p H _{2p + 1} - include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, an n-pentyl group, N-hexadecyl group, n-heptadecyl group, n-octadecyl group, n-octadecyl group, n-hexadecyl group, - nonadecyl group, and n-eicosyl group. The two amino groups in the diaminophenyl group are preferably in the 2,4-position or 3,5-position with respect to the other groups.

Specific examples of the compound represented by the formula (D-1) include dodecanoxy-2,4-diaminobenzene, tetradecanoxy-2,4-diaminobenzene, pentadecanoxy- Diaminobenzene, hexadecaneoxy-2,4-diaminobenzene, dodecaneoxy-2,5-diaminobenzene, tetradecanoxy-2,5-diaminobenzene, pentadecanoxy-2,5-diaminobenzene (D-1-1) to (D-1-4): wherein R &lt; 1 &gt; is a hydrogen atom,

And the like.

In the formula (D-1), it is preferable that m and n are not 0 at the same time.

These diamines may be used alone or in combination of two or more.

The ratio of the tetracarboxylic acid dianhydride and the diamine to be used for the synthesis reaction of the polyamic acid is preferably such that the amount of the acid anhydride group of the tetracarboxylic acid dianhydride is 0.2 to 2 equivalents based on 1 equivalent of the amino group contained in the diamine compound , More preferably 0.3 to 1.2 equivalents.

The synthesis reaction of the polyamic acid is preferably carried out in an organic solvent under a temperature condition of preferably -20 to 150 캜, more preferably 0 to 100 캜, preferably 0.5 to 24 hours, 10 hours. The organic solvent is not particularly limited as long as it can dissolve the polyamic acid to be synthesized, and examples thereof include N-methyl-2-pyrrolidone, N, N-dimethylacetamide, N, , Aprotic polar solvents such as N, N-dimethylimidazolidinone, dimethylsulfoxide,? -Butyrolactone, tetramethylurea and hexamethylphosphotriamide;

phenol-based solvents such as m-cresol, xylenol, phenol, halogenated phenol and the like. The amount (a) of the organic solvent to be used is preferably 0.1 to 50% by weight, more preferably 5 to 30% by weight, based on the total amount (a + b) of the tetracarboxylic acid dianhydride and the diamine compound %.

As described above, a reaction solution obtained by dissolving polyamic acid is obtained. The reaction solution may be directly supplied to the preparation of the liquid crystal aligning agent. Alternatively, the polyamic acid contained in the reaction solution may be isolated and then supplied to the preparation of the liquid crystal aligning agent, or after the isolated polyamic acid is purified, .

When the polyamic acid is subjected to dehydration ring closure to form a polyimide, the reaction solution may be directly supplied to the dehydration ring-closing reaction. Alternatively, the polyamic acid contained in the reaction solution may be isolated and then subjected to dehydration ring- May be purified and then subjected to a dehydration ring-closing reaction.

The polyamic acid may be isolated by pouring the reaction solution into a large amount of a poor solvent to obtain a precipitate and drying the precipitate under reduced pressure, or a method of distilling off the organic solvent in the reaction solution under reduced pressure have. The polyamic acid is dissolved again in an organic solvent and then precipitated with a poor solvent. Alternatively, a solution obtained by dissolving the polyamic acid in an organic solvent is washed, and the organic solvent in the solution is subjected to vacuum distillation The polyamic acid can be purified by a method such as one or several times.

{Polyimide}

The polyimide can be synthesized by dehydration ring closure of the arboric acid structure of the polyamic acid obtained as described above. At this time, all of the arboric acid structure may be completely imidized by dehydrating and ring closure, or only a part of the arboric acid structure may be dehydrated and cyclized to form a partial imide having an acid structure and an imide structure.

The dehydration ring-closure of the polyamic acid can be carried out by a method of (i) heating the polyamic acid, or (ii) dissolving the polyamic acid in an organic solvent, adding a dehydrating agent and a dehydrating ring- .

The reaction temperature in the method of heating the polyamic acid of (i) is preferably 50 to 200 캜, more preferably 60 to 170 캜. If the reaction temperature is less than 50 캜, the dehydration ring-closure reaction does not proceed sufficiently, and if the reaction temperature exceeds 200 캜, the molecular weight of the obtained polyimide may be lowered. The reaction time in the method of heating the polyamic acid is preferably 0.5 to 48 hours, more preferably 2 to 20 hours.

On the other hand, in the method of adding the dehydrating agent and dehydrating ring-closing catalyst to the polyamic acid solution of (ii), for example, acid anhydrides such as acetic anhydride, propionic anhydride and trifluoroacetic anhydride can be used. The amount of the dehydrating agent to be used is preferably 0.01 to 20 mol based on 1 mol of the polyamic acid structural unit. As the dehydration cyclization catalyst, for example, tertiary amines such as pyridine, collidine, lutidine and triethylamine can be used. However, the present invention is not limited thereto. The amount of the dehydration ring-closing catalyst to be used is preferably 0.01 to 10 mol based on 1 mol of the dehydrating agent to be used. Examples of the organic solvent used in the dehydration ring-closure reaction include the organic solvents exemplified for use in the synthesis of polyamic acid. The reaction temperature of the dehydration ring closure reaction is preferably 0 to 180 캜, more preferably 10 to 150 캜, and the reaction time is preferably 0.5 to 20 hours, more preferably 1 to 8 hours.

The polyimide obtained in the above method (i) may be directly supplied to the preparation of the liquid crystal aligning agent, or may be provided in the preparation of the liquid crystal aligning agent after the obtained polyimide is purified. On the other hand, in the above method (ii), a reaction solution containing polyimide is obtained. This reaction solution may be provided as it is in the preparation of a liquid crystal aligning agent or may be provided in the preparation of a liquid crystal aligning agent after removing the dehydrating agent and the dehydration ring-closing catalyst from the reaction solution. Alternatively, after the polyimide is isolated, Or may be provided to the preparation of a liquid crystal aligning agent after purification of the isolated polyimide. In order to remove the dehydrating agent and the dehydration ring-closing catalyst from the reaction solution, for example, a method such as solvent substitution can be applied. Isolation and purification of polyimide can be carried out by performing the same operation as described above as a method for isolating and purifying polyamic acid.

{Other polyorganosiloxane}

Other polyorganosiloxanes in the present invention are polyorganosiloxanes other than the above-mentioned radiation-sensitive polyorganosiloxanes. Such other polyorganosiloxanes are obtained by reacting at least one silane compound (hereinafter also referred to as a &quot; raw silane compound &quot;) selected from the group consisting of an alkoxysilane compound and a halogenated silane compound, preferably in an appropriate organic solvent , In the presence of water and a catalyst.

Examples of the raw material silane compound used herein include tetramethoxysilane, tetraethoxysilane, tetra-n-propoxysilane, tetra-iso-propoxysilane, tetra-n-butoxysilane, tetra- Butoxysilane, tetra-tert-butoxysilane, tetrachlorosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltri-n-propoxysilane, methyltriiso- Butoxysilane, methyltri-sec-butoxysilane, methyltri-butoxysilane, methyltriphenoxysilane, methyltrichlorosilane, ethyltrimethoxysilane, ethyltriethoxysilane, ethyltri-n -Propoxysilane, ethyltri-iso-propoxysilane, ethyltri-n-butoxysilane, ethyltri-sec-butoxysilane, ethyltri-tert-butoxysilane, ethyltrichlorosilane, phenyltrimethoxy Silane, phenyltriethoxysilane, phenyltrichlorosilane, dimethyldimethoxysilane, dimethyldiethoxy Silane, dimethyldichlorosilane, trimethylmethoxysilane, trimethylethoxysilane, trimethylchlorosilane and the like, and it is preferable to use at least one of them. In particular, tetramethoxysilane, tetraethoxysilane, methyltri At least one member selected from the group consisting of methoxysilane, methyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, trimethylmethoxysilane, and trimethylethoxysilane Is preferably used.

Other polyorganosiloxanes in the present invention can be synthesized in the same manner as described above as a method for synthesizing a polyorganosiloxane having an epoxy group, except that the raw silane compound as described above is used.

For other polyorganosiloxanes, the weight average molecular weight in terms of polystyrene measured by gel permeation chromatography is preferably 1,000 to 100,000, more preferably 5,000 to 50,000.

{Use ratio of other polymer}

When the liquid crystal aligning agent of the present invention contains other polymers together with the above-mentioned radiation-sensitive polymer, the use ratio of other polymer is preferably 10,000 parts by weight or less based on 100 parts by weight of the radiation-sensitive polymer. A more preferable use ratio of the other polymer differs depending on the kind of the polymer contained in the liquid crystal aligning agent of the present invention.

In the case where the liquid crystal aligning agent of the present invention contains at least one polymer selected from the group consisting of a radiation-sensitive polyorganosiloxane and a polyamic acid and a polyimide, The total amount of polyamic acid and polyimide relative to 100 parts by weight of the polyorganosiloxane is preferably 100 to 5,000 parts by weight, more preferably 200 to 2,000 parts by weight.

On the other hand, in the case where the liquid crystal aligning agent of the present invention contains a radiation-sensitive polyorganosiloxane and other polyorganosiloxane, the proportion of the liquid crystal aligning agent to be used is preferably more than 100 parts by weight of the radiation-sensitive polyorganosiloxane And the amount of the other polyorganosiloxane is 100 to 2,000 parts by weight.

When the liquid crystal aligning agent of the present invention contains other polymers together with the radiation-sensitive polymer, examples of the other polymer include at least one polymer selected from the group consisting of polyamic acid and polyimide, or other polyorganosiloxane Or both of them.

[Curing agent and curing catalyst]

The curing agent and the curing catalyst may be contained in the liquid crystal aligning agent of the present invention for the purpose of strengthening the crosslinking reaction of the radiation-sensitive polymer, preferably the radiation-sensitive polyorganosiloxane, and the curing accelerator May be contained in the liquid crystal aligning agent of the present invention for the purpose of promoting the curing reaction.

As the curing agent, a curing agent generally used for curing a curable composition containing an epoxy group or a compound having an epoxy group can be used. Examples of the curing agent include a polyvalent amine, a polyvalent carboxylic acid anhydride, and a polyvalent carboxylic acid .

Examples of the polyvalent carboxylic acid anhydrides include anhydrides of cyclohexanetricarboxylic acid and other polyvalent carboxylic acid anhydrides.

Specific examples of the cyclohexanetricarboxylic acid anhydride include cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride, cyclohexane-1,3,5-tricarboxylic acid-3,5-anhydride , Cyclohexane-1,2,3-tricarboxylic acid-2,3-acid anhydride and the like, and examples of other polyvalent carboxylic acid anhydrides include 4-methyltetrahydrophthalic anhydride, methylnadonic anhydride, Dodecenylsuccinic anhydride, succinic anhydride, maleic anhydride, phthalic anhydride, trimellitic anhydride, the following formula (CA-1):

　

　

(In the formula (CA-1), q is an integer of 1 to 20)

And tetracarboxylic acid dianhydrides generally used in the synthesis of polyamic acids, as well as the reaction products of the alicyclic compounds having conjugated double bonds such as? -Terpinene and alo cymene with maleic anhydride and the Hydrogenated products, and the like.

As the curing catalyst, for example, an antimony hexafluoride compound, a hexafluorophosphate compound, aluminum trisacetylacetonate and the like can be used. These catalysts can promote cationic polymerization of epoxy groups by heating.

As the curing accelerator, for example, an imidazole compound;

A quaternary compound;

Quaternary amine compounds;

Diazabicycloalkenes such as 1,8-diazabicyclo [5.4.0] undecene-7 and its organic acid salts;

Organometallic compounds such as zinc octylate, tin octylate, and aluminum acetyl acetone complex;

Boron compounds such as boron trifluoride, triphenyl borate, metal halide compounds such as zinc chloride and stannic chloride;

Amine-type accelerators such as dicyandiamide, adducts of amines and epoxy resins, and the like;

A microcapsulated latent curing accelerator in which a surface of a quaternary phosphonium salt or the like is coated with a polymer;

Amine salt type latent curing accelerator;

High-temperature dissociation type thermal cationic polymerization latent curing accelerators such as Lewis acid salts and Bronsted acid salts, and the like.

[Epoxy Compound]

The epoxy compound can be contained in the liquid crystal aligning agent of the present invention from the viewpoint of improving the adhesion to the substrate surface of the liquid crystal alignment film to be formed.

Examples of such epoxy compounds include ethylene glycol diglycidyl ether, polyethylene glycol diglycidyl ether, propylene glycol diglycidyl ether, tripropylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, Neopentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, glycerin diglycidyl ether, 2,2-dibromoneopentyl glycol diglycidyl ether, 1,3,5, Tetraglycidyl-2,4-hexanediol, N, N, N ', N'-tetraglycidyl-m-xylylenediamine, 1,3-bis (N, N-diglycidylamino Methyl) cyclohexane, N, N, N ', N'-tetraglycidyl-4,4'-diaminodiphenylmethane, N, N-diglycidyl- Di-aminomethylcyclohexane, and the like.

When the liquid crystal aligning agent of the present invention contains an epoxy compound, the content of the liquid crystal aligning agent is preferably 40 parts by weight or less based on 100 parts by weight of the total amount of the radiation-sensitive polymer and the other polymer optionally used, Preferably 0.1 to 30 parts by weight.

When the liquid crystal aligning agent of the present invention contains an epoxy compound, a base catalyst such as 1-benzyl-2-methylimidazole may be used in combination for the purpose of efficiently causing the crosslinking reaction.

[Functional silane compound]

The functional silane compound can be used for the purpose of improving the adhesion of the obtained liquid crystal alignment film to the substrate. Examples of the functional silane compound include 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 2-aminopropyltrimethoxysilane, 2-aminopropyltriethoxysilane, N- (2- Aminoethyl) -3-aminopropyltrimethoxysilane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, 3-ureidopropyltrimethoxysilane, 3-ureidopropyltriethoxysilane , N-ethoxycarbonyl-3-aminopropyltrimethoxysilane, N-ethoxycarbonyl-3-aminopropyltriethoxysilane, N-triethoxysilylpropyltriethylenetriamine, N-trimethoxy Silane triethylenetriamine, 10-trimethoxysilyl-1,4,7-triazadecane, 10-triethoxysilyl-1,4,7-triazadecane, 9-trimethoxysilyl- 6-diazanonyl acetate, 9-triethoxysilyl-3,6-diazanonyl acetate, N-benzyl-3-aminopropyltrimethoxysilane, N- Aminopropyltrimethoxysilane, N-phenyl-3-aminopropyltriethoxysilane, N-bis (oxyethylene) -3-aminopropyltrimethoxysilane, N- Bis (oxyethylene) -3-aminopropyltriethoxysilane, 3-glycidyloxypropyltrimethoxysilane, and 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane. A reaction product of a tetracarboxylic acid dianhydride with a silane compound having an amino group or the like can be used as disclosed in Patent Document 18 (Japanese Unexamined Patent Publication (Kokai) No. 63-291922).

When the liquid crystal aligning agent of the present invention contains a functional silane compound, the content thereof is preferably 50 parts by weight or less based on 100 parts by weight of the total amount of the above radiation-sensitive polymer and other polymer optionally used , And more preferably 20 parts by weight or less.

[Surfactants]

Examples of the surfactant include nonionic surfactants, anionic surfactants, cationic surfactants, amphoteric surfactants, silicone surfactants, polyalkylene oxide surfactants, and fluorine-containing surfactants.

When the liquid crystal aligning agent of the present invention contains a surfactant, the content thereof is preferably 10 parts by weight or less, more preferably 1 part by weight or less, based on 100 parts by weight of the total amount of the liquid crystal aligning agent.

<Liquid Crystal Aligner>

As described above, the liquid crystal aligning agent of the present invention contains a radiation-sensitive polymer as an essential component and, if necessary, other components, but preferably contains a liquid phase composition in which each component is dissolved in an organic solvent .

As the organic solvent which can be used for preparing the liquid crystal aligning agent of the present invention, it is preferable to dissolve the radiation-sensitive polymer and other components which are optionally used, and not to react with them.

The organic solvent that can be preferably used for the liquid crystal aligning agent of the present invention differs depending on the kind of the polymer contained in the liquid crystal aligning agent of the present invention.

When the liquid crystal aligning agent of the present invention contains at least one polymer selected from the group consisting of a radiation-sensitive polyorganosiloxane and a polyamic acid and a polyimide, and when the radiation-sensitive polyorganosiloxane, Amide, in addition to at least one kind of polymer other polyorganosiloxane. Examples of the preferable organic solvent used in the synthesis of polyamic acid include the organic solvents exemplified above . These organic solvents may be used alone or in combination of two or more.

On the other hand, when the liquid crystal aligning agent of the present invention is a polymer containing only a radiation-sensitive polyorganosiloxane as a polymer or a group containing a radiation-sensitive polyorganosiloxane and other polyorganosiloxane but containing polyamic acid and polyimide , For example, 1-ethoxy-2-propanol, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene glycol mono Propylene glycol monoacetate, dipropylene glycol methyl ether, dipropylene glycol ethyl ether, dipropylene glycol propyl ether, dipropylene glycol dimethyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, Ethylene glycol monobutyl ether (Butyl cellosolve), ethylene glycol monoamyl ether, ethylene glycol monohexyl ether, diethylene glycol, methyl cellosolve acetate, ethyl cellosolve acetate, propyl cellosolve acetate, butyl cellosolve acetate, methyl carbitol, Butyl acetate, sec-butyl acetate, n-pentyl acetate, sec-pentyl acetate, acetic acid 3- butanol, Butyl acetate, 2-ethylhexyl acetate, benzyl acetate, n-hexyl acetate, cyclohexyl acetate, octyl acetate, amyl acetate, isoamyl acetate and the like. Among these, n-propyl acetate, i-propyl acetate, n-butyl acetate, i-butyl acetate, sec-butyl acetate, n-pentyl acetate and sec-

The preferred solvent used in the preparation of the liquid crystal aligning agent of the present invention is one obtained by combining one or more of the above organic solvents depending on whether or not other polymers are used and the kind thereof. , The components contained in the liquid crystal aligning agent are not precipitated, and the surface tension of the liquid crystal aligning agent is in the range of 25 to 40 mN / m. The solid concentration of the liquid crystal aligning agent of the present invention, that is, the ratio of the total weight of all components other than the solvent in the liquid crystal aligning agent to the total weight of the liquid crystal aligning agent is selected in consideration of viscosity, volatility, etc., By weight. The liquid crystal aligning agent of the present invention is applied to the surface of the substrate to form a coating film that becomes a liquid crystal alignment film. When the solid concentration is less than 1% by weight, the film thickness of the coating film becomes too small to obtain a good liquid crystal alignment film . On the other hand, when the solid concentration exceeds 10% by weight, the film thickness of the coating film becomes excessively large, which makes it difficult to obtain a good liquid crystal alignment film, and the viscosity of the liquid crystal aligning agent is increased and coating properties are sometimes insufficient. A particularly preferable range of the solid concentration is different depending on the method employed when the liquid crystal aligning agent is applied to the substrate. For example, in the case of the spinner method, the range of 1.5 to 4.5 wt% is particularly preferable. In the case of the printing method, it is particularly preferable to set the solid concentration in the range of 3 to 9% by weight and the solution viscosity in the range of 12 to 50 mPa · s accordingly. In the case of the ink-jet method, it is particularly preferable that the solid concentration is in the range of 1 to 5 wt%, and the solution viscosity is in the range of 3 to 15 mPa · s accordingly.

The temperature for preparing the liquid crystal aligning agent of the present invention is preferably 0 ° C to 200 ° C, and more preferably 0 ° C to 40 ° C.

&Lt; Method of forming liquid crystal alignment film &

The liquid crystal aligning agent of the present invention can be suitably used for forming a liquid crystal alignment film used in TN type, STN type, transverse electric field type (IPS type) or VA type liquid crystal display device by the photo alignment method. The liquid crystal aligning agent of the present invention exhibits the maximum effect of the present invention when applied to liquid crystal display elements of the TN type, the STN type, or the transverse electric field system, particularly the liquid crystal display element of the transverse electric field system, desirable.

In order to form a liquid crystal alignment film using the liquid crystal aligning agent of the present invention, it is possible to apply a method of applying a liquid crystal aligning agent of the present invention on a substrate to form a coated film, and irradiating the coated film with radiation.

Here, when the liquid crystal aligning agent of the present invention is applied to a liquid crystal display device of a TN type, an STN type or a VA type, two substrates on which a patterned transparent conductive film is formed are paired, On the formation surface, the liquid crystal aligning agent of the present invention is applied to form a coating film. On the other hand, when the liquid crystal aligning agent of the present invention is applied to a liquid crystal display element of a transverse electric field system, a substrate having a transparent conductive film or a metal film patterned in the form of a comb and a counter substrate The liquid crystal aligning agent of the present invention is applied to the surface of the comb-shaped electrode and the surface of the counter substrate, respectively, to form a coating film.

In any case, as the substrate, for example, a transparent substrate made of plastic such as float glass, glass such as soda glass, polyethylene terephthalate, polybutylene terephthalate, polyether sulfone, polycarbonate, or the like can be used. As the transparent conductive film, for example, an ITO film made of In ₂ O ₃ -SnO ₂ , a NESA (registered trademark) film made of SnO ₂ , or the like can be used. As the metal film, for example, a film made of a metal such as chromium can be used. The patterning of the transparent conductive film and the metal film includes, for example, a method of forming a pattern by a photo-etching method or a sputtering method after forming a transparent conductive film without a pattern, a method of forming a transparent conductive film by using a mask having a desired pattern Method, and the like.

A functional silane compound, titanate, or the like may be previously coated on the substrate and the electrode in order to improve the adhesion between the substrate or the conductive film or the electrode and the coating film upon application of the liquid crystal aligning agent onto the substrate .

The application of the liquid crystal aligning agent onto the substrate can be preferably carried out by an appropriate application method such as offset printing, spin coating, roll coatering, inkjet printing, etc., followed by preheating (prebaking) Followed by baking (post baking) to form a coating film. The prebaking condition is, for example, 0.1 to 5 minutes at 40 to 120 占 폚, and the postbaking condition is preferably 120 to 300 占 폚, more preferably 150 to 250 占 폚, preferably 5 to 200 minutes, Preferably 10 to 100 minutes. The film thickness of the coated film after post baking is preferably 0.001 to 1 mu m, more preferably 0.005 to 0.5 mu m.

The coating film thus formed is irradiated with linearly polarized light or partially polarized radiation or non-polarized radiation, thereby imparting liquid crystal aligning ability. Here, as the radiation, for example, ultraviolet rays and visible rays including light having a wavelength of 150 to 800 nm can be used, but ultraviolet rays including light having a wavelength of 300 to 400 nm are preferable. When the radiation to be used is linearly polarized light or partially polarized light, the irradiation may be performed from a direction perpendicular to the substrate surface, or may be performed in an oblique direction to give a pre-tilt angle, or may be performed in combination. In the case of irradiating non-polarized radiation, the irradiation direction needs to be an oblique direction.

As the light source to be used, for example, a low pressure mercury lamp, a high pressure mercury lamp, a deuterium lamp, a metal halide lamp, an argon resonance lamp, a xenon lamp, an excimer laser, The ultraviolet ray of the above-mentioned preferable wavelength range can be obtained by a means for using the light source together with a filter, a diffraction grating, or the like.

The irradiation dose of the radiation is preferably 1 J / m 2 or more and less than 10,000 J / m 2, and more preferably 10 to 3,000 J / m 2. Further, in the case of imparting the liquid crystal aligning ability to the coating film formed by the conventionally known liquid crystal aligning agent by the photo alignment method, a radiation dose of 10,000 J / m 2 or more was required. However, when the liquid crystal aligning agent of the present invention is used, good liquid crystal aligning ability can be imparted even when the dose of radiation in the photo alignment method is 3,000 J / m 2 or less, or even 1,000 J / m 2 or less, Thereby contributing to reduction of manufacturing cost.

<Manufacturing Method of Liquid Crystal Display Element>

The liquid crystal display element formed using the liquid crystal aligning agent of the present invention can be produced, for example, as follows.

First, a pair of substrates on which a liquid crystal alignment film is formed as described above is prepared, and a liquid crystal cell having a configuration in which liquid crystal is sandwiched between the pair of substrates is manufactured. To produce a liquid crystal cell, for example, the following two methods can be mentioned.

The first method is a conventionally known method. First, two substrates are opposed to each other with a gap (cell gap) interposed therebetween so that the respective liquid crystal alignment films face each other, and the peripheral portions of the two substrates are bonded together using a sealant, The liquid crystal is injected and filled in the cell gap, and then the injection hole is sealed, whereby the liquid crystal cell can be manufactured.

The second method is a so-called ODF (One Drop Fill) method. For example, an ultraviolet curable sealant is applied to a predetermined place on one of the two substrates on which the liquid crystal alignment film is formed, the liquid crystal is further dropped on the liquid crystal alignment film surface, A liquid crystal cell can be manufactured by bonding one of the substrates and then curing the sealing agent by irradiating ultraviolet light to the entire surface of the substrate.

In either case, it is preferable that the liquid crystal cell used in the liquid crystal cell is heated to a temperature at which the liquid crystal using the liquid crystal is in an isotropic phase, and then gradually cooled to room temperature to remove the flow alignment upon liquid crystal filling.

The liquid crystal display element of the present invention can be obtained by bonding a polarizing plate to the outer surface of the liquid crystal cell. Here, a desired liquid crystal display element can be obtained by appropriately adjusting the angle between the polarizing direction of the irradiated linearly polarized radiation and the angle between each substrate and the polarizing plate in the two substrates on which the liquid crystal alignment film is formed.

As the sealing agent, for example, an aluminum oxide spheres as a spacer and an epoxy resin containing a curing agent can be used.

As the liquid crystal, for example, a nematic liquid crystal, a smectic liquid crystal or the like can be used. It is preferable to have a positive dielectric anisotropy for forming a nematic liquid crystal, and examples thereof include biphenyl-based liquid crystal, phenylcyclohexane-based liquid crystal, ester-based liquid crystal, terphenyl-based liquid crystal, biphenylcyclohexane- Based liquid crystal, a dioxane-based liquid crystal, a bicyclooctane-based liquid crystal, a quartz-based liquid crystal, and the like. Further, it is also possible to add a cholesteric liquid crystal such as cholesteryl chloride, cholesteryl nonanoate or cholesteryl carbonate to the liquid crystal;

Chiral agent sold under the trade names "C-15" and "CB-15" (manufactured by Merck Ltd.);

p-decyloxybenzylidene-p-decyloxybenzylidene-p-amino-2-methylbutyl cinnamate and the like may further be added and used.

Examples of the polarizer used for the outside of the liquid crystal cell include a polarizing plate in which a polarizing film called "H film" in which iodine is absorbed while polyvinyl alcohol is oriented in a stretched state is sandwiched between cellulose acetate protective films or a polarizing plate made of H film itself .

The liquid crystal display of the present invention thus manufactured is excellent in display characteristics because it has excellent alignment control force of liquid crystal molecules.

(Example)

Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to these examples.

The weight average molecular weight (Mw) in the following Synthesis Examples is a polystyrene reduced value measured by gel permeation chromatography under the following conditions.

Column: TSKgelGRCXLII, manufactured by Toso K.K.

Solvent: tetrahydrofuran

Temperature: 40 ° C

Pressure: 68kgf / ㎠

Further, in the following synthesis examples, the synthesis of the raw material compound and the polymer was repeated as necessary with the following synthesis scale to ensure the required amount in the following examples.

<Synthesis Example of Polyorganosiloxane Having an Epoxy Group>

Synthesis Example ES1

100.0 g of 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 500 g of methyl isobutyl ketone and 10.0 g of triethylamine were placed in a reaction vessel equipped with a stirrer, a thermometer, a dropping funnel and a reflux condenser, And mixed at room temperature.

Subsequently, 100 g of deionized water was added dropwise from the dropping funnel over 30 minutes, and the mixture was reacted at 80 DEG C for 6 hours while mixing under reflux. After completion of the reaction, the organic layer was taken out and washed with a 0.2 wt% aqueous ammonium nitrate solution until the washed water became neutral, and then the solvent and water were distilled off under reduced pressure to obtain a polyorganosiloxane having an epoxy group (ES -1) as a viscous transparent liquid.

As a result of ¹ H-NMR analysis of the polyorganosiloxane having the epoxy group, a peak based on the epoxy group was obtained in the vicinity of the chemical shift (?) = 3.2 ppm as the theoretical intensity, and a side reaction of the epoxy group occurred during the reaction .

The viscosity, Mw, and epoxy equivalent of the polyorganosiloxane (ES-1) having the epoxy group are shown in Table 1.

Synthesis Example ES2-3

Polyorganosiloxanes (ES-2) and (ES-3) each having an epoxy group were obtained as viscous transparent liquids in the same manner as in Synthesis Example ES1 except that the starting materials were as shown in Table 1.

The Mw and the epoxy equivalent of the polyorganosiloxane having the epoxy group are shown in Table 1.

In Table 1, the abbreviations of the raw material silane compounds have the following meanings respectively.

ECETS: 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane

MTMS: methyltrimethoxysilane

PTMS: phenyltrimethoxysilane

<Synthesis Example of Specific Carboxylic Acid>

Scheme 1:

(1-1), (1-2) and (1-3), respectively. In the above reaction scheme 1, the product when R is a trifluoromethyl group is the compound (1-1), the product when R is a cyclohexyl group is the compound (1-2), R is n-octyl Is the compound (1-3).

The following synthesis procedure was carried out in an inert atmosphere.

Synthesis Example (1) -1

9.8 g of maleic anhydride, 100 ml of dehydrated methylene chloride and 32 g of aluminum chloride were added to a 300 ml three-necked flask equipped with a stirrer, a cooling tube and a dropping funnel, and 50 ml of a methylene chloride solution obtained by dissolving 14.6 g of benzotrifluoride was added dropwise did. After completion of dropwise addition, the reaction was continued under stirring for 2 hours. After completion of the reaction, the reaction mixture was poured into 400 mL of dilute hydrochloric acid cooled with an ice bath and stirred. To this was added 200 mL of ethyl acetate and extracted. The obtained organic layer was washed with 100 mL of pure water three times, dried over magnesium sulfate, and then the solvent was distilled off. The resulting solid was recrystallized from ethanol to obtain 8.5 g of the compound (1-1).

Synthesis Examples (1) -2 and (1) -3

Except that 16 g of cyclohexylbenzene (Synthesis Example (1) -2) and 19 g of n-octylbenzene (Synthesis Example (1) -3) were used instead of benzotrifluoride in Synthesis Example (1) 14.2 g of the compound (1-2) and 12 g of the compound (1-3) are obtained in the same manner as in the synthesis example (1) -1.

&Lt; Comparative synthesis example of carbonic acid &gt;

Synthesis Example R-1

Scheme 2:

, A comparative carboxylic acid (R-1) was synthesized.

11.21 g of 4-hydroxycalcone, 8.35 g of ethyl bromoacetate, 13.8 g of potassium carbonate and 100 mL of dimethylacetamide were placed in a 200 mL three-necked flask, and the reaction was carried out at 120 DEG C for 7 hours with stirring. After completion of the reaction, the reaction solution was cooled at room temperature, and then 100 mL of ethyl acetate was added. The organic layer was washed with water and the solvent was removed under reduced pressure to obtain a solid. Recrystallization was performed from a mixed solvent of ethanol and water (ethanol: water = 4: 1 (volume ratio) g.

Subsequently, 6.2 g of the compound (R-1a), 2 g of sodium hydroxide, 200 mL of ethanol and 50 mL of water were placed in a 500-mL three-necked flask equipped with a cooling tube, and the reaction was carried out with stirring for 3 hours under reflux. After completion of the reaction, the reaction mixture was cooled, diluted hydrochloric acid was added thereto to make it acidic, and then 500 mL of ethyl acetate was added to carry out liquid fraction extraction. The obtained organic layer was washed with water and then the solvent was removed under reduced pressure to obtain 4.1 g of compound (R-1).

&Lt; Synthesis Example of a Radiation-Sensitive Polyorganosiloxane &gt;

Synthesis Example S-1

9.3 g of the polyorganosiloxane (ES-1) having the epoxy group obtained in Synthesis Example ES1, 26 g of methyl isobutyl ketone, the compound (1-1) obtained in Synthesis Example (1) -1, , And 0.10 g of UCAT 18X (a quaternary amine salt, trade name, manufactured by SANAPRO Corporation) were placed, and the reaction was carried out at 80 ° C for 12 hours with stirring. After completion of the reaction, methanol was added to the reaction mixture, and the resulting precipitate was recovered. The resulting precipitate was dissolved in ethyl acetate, washed three times with water, and then the solvent was distilled off to obtain a radiation-sensitive polyorganosiloxane (S-1 ) As a white powder. The weight-average molecular weight (Mw) of the radiation-sensitive polyorganosiloxane (S-1) was 7,100.

Synthesis Examples S-2 and S-3

Synthesis Example S-1 was repeated except that the kinds and the amounts of the polyorganosiloxane having an epoxy group and the carboxylic acid (the compound represented by the formula (1) In the same manner, the radiation-sensitive polyorganosiloxanes (S-2) and (S-3) were obtained, respectively. The weight average molecular weights (Mw) of these radiation-sensitive polyorganosiloxanes are shown in Table 2.

&Lt; Comparative synthesis example of radiation-sensitive polyorganosiloxane &gt;

Synthesis Example RS-1

1 was obtained in the same manner as in Synthesis Example S-1 except that 3.52 g of the compound (R-1) obtained in Synthesis Example R-1 was used instead of the compound (1-1) To obtain a polyorganosiloxane (RS-1). The weight average molecular weight (Mw) of the radiation-sensitive polyorganosiloxane (RS-1) is shown in Table 2.

&Lt; Synthesis Example of Other Polymer &

[Synthesis example of polyamic acid]

Synthesis Example PA-1

19.61 g (0.1 mole) of cyclobutanetetracarboxylic dianhydride and 21.23 g (0.1 mole) of 4,4'-diamino 2,2'-dimethylbiphenyl were dissolved in 367.6 g of N-methyl-2-pyrrolidone , And the reaction was carried out at room temperature for 6 hours. The reaction mixture was then poured into a large excess of methanol to precipitate the reaction product. The precipitate was collected, washed with methanol, and dried at 40 캜 for 15 hours under reduced pressure to obtain 35 g of polyamic acid (PA-1).

Synthesis Example PA-2

(0.1 mol) of 2,3,5-tricarboxycyclopentyl acetic acid dianhydride and 14.23 g (0.1 mol) of cyclohexane bis (methylamine) were dissolved in 329.3 g of N-methyl-2-pyrrolidone, Lt; 0 &gt; C for 6 hours. The reaction mixture was then poured into a large excess of methanol to precipitate the reaction product. The precipitate was washed with methanol and dried under reduced pressure at 40 占 폚 for 15 hours to obtain 32 g of polyamic acid (PA-2).

This polyamic acid (PA-2) was partly provided in the preparation of a liquid crystal aligning agent in the following examples, and the remaining part was provided for the synthesis of the following polyimide.

[Synthesis of polyimide]

Synthesis Example PI-1

17.5 g of the polyamic acid (PA-2) obtained in the above Synthesis Example PA-2 was added, 232.5 g of N-methyl-2-pyrrolidone, 3.8 g of pyridine and 4.9 g of acetic anhydride were added thereto, Imidization reaction was carried out. The resulting reaction mixture was poured into a large excess of methanol to precipitate the reaction product. The precipitate was washed with methanol and dried under reduced pressure for 15 hours to obtain 15 g of polyimide (PI-1).

Example 1

&Lt; Preparation of liquid crystal aligning agent &

100 parts by weight of the radiation-sensitive polyorganosiloxane (S-1) obtained in the above Example S-1 and 1,000 parts by weight of the polyamic acid (PA-1) obtained in the above Synthesis Example PA- (N-methyl-2-pyrrolidone: butyl cellosolve = 50: 50 (weight ratio)) consisting of 2-pyrrolidone and butyl cellosolve and dissolved in a solution having a solid concentration of 3.0 wt% did. This solution was filtered with a filter having a pore diameter of 1 탆 to prepare a liquid crystal aligning agent.

&Lt; Production of liquid crystal display element &

A liquid crystal aligning agent prepared as described above was applied to each of the electrode formation surface of a glass substrate having a chromium metal electrode patterned in a comb shape and the opposing glass substrate where no electrode was formed using a spinner, After prebaking on a hot plate for 1 minute, post-baking was performed in an oven where the inside of the tube was replaced with nitrogen at 200 DEG C for 1 hour to form a coating film having a thickness of 0.1 mu m. Subsequently, a pair of substrates having a liquid crystal alignment film was obtained by irradiating the surface of this coating film with a polarizing ultraviolet ray 600 K / m 2 containing a bright line of 313 nm from the normal direction of the substrate using an Hg-Xe lamp and a Glane Taylor prism.

An epoxy resin adhesive containing aluminum oxide spheres having a diameter of 5.5 占 퐉 was applied to the periphery of the surface of the substrate having the chromium metal electrode on the surface of the pair of substrates on which the liquid crystal alignment film was formed by screen printing, The orientation films were faced to each other, pressed so that the directions of the respective substrates when irradiated with ultraviolet rays were opposite to each other, and heated at 150 DEG C for 1 hour to thermally cure the adhesive. Subsequently, a liquid crystal MLC-7028 manufactured by Merck Ltd. was filled in the gap between the substrates from the liquid crystal injection port, and then the liquid crystal injection port was sealed with an epoxy adhesive. Further, in order to remove the flow orientation at the time of injecting the liquid crystal, it was heated to 150 캜 and then gradually cooled to room temperature. Next, a liquid crystal display element of a transverse electric field system was manufactured by joining a polarizing plate on both outer sides of the substrate so that the polarizing directions thereof were orthogonal to each other and perpendicular to the projection direction of the optical axis of the ultraviolet ray of the liquid crystal alignment film to the substrate surface .

&Lt; Evaluation of liquid crystal display element &

This liquid crystal display element was evaluated by the following method. The evaluation results are shown in Table 3.

(1) Evaluation of liquid crystal alignment property

With respect to the liquid crystal display device manufactured as described above, the presence or absence of an abnormal domain in a change in light and dark when a voltage of 5 V was turned ON / OFF (applied / released) was observed by an optical microscope, Was evaluated as &quot; positive &quot;, and the case where an abnormal domain was observed was evaluated as &quot; poor &quot; in the liquid crystal alignment property.

(2) Evaluation of Voltage Conservation Rate

A voltage of 5 V at 60 占 폚 was applied to the liquid crystal display device manufactured in the above manner at an application time of 60 microseconds and a span of 167 milliseconds, and the voltage maintenance ratio after 167 milliseconds after the application was released was measured. VHR-1 manufactured by Toyo Technica Co., Ltd. was used as a measuring device.

Examples 2 to 8 and Comparative Example 1

A liquid crystal display device was prepared in the same manner as in Example 1 except that the kind of the radiation-sensitive polyorganosiloxane and the kind and the amount of the other polymer were changed as shown in Table 3, A display device was manufactured and evaluated. The evaluation results are shown in Table 3.

In Comparative Example 1, the amount of irradiated polarized ultraviolet rays at the time of manufacturing the liquid crystal display device was set to 1,000 J / m 2.

Claims (11)

The following formula (1 '):

Wherein R ¹ is a hydrogen atom, a fluorine atom, an alkyl group having 1 to 20 carbon atoms or a fluoroalkyl group having 1 to 20 carbon atoms, or a monovalent group having a steroid skeleton, R ² is cyclohexylene X is a single bond, an oxygen atom, a sulfur atom, a methylene group, an alkylene group having 2 or 3 carbon atoms, -CH = CH-, -NH-, ^* -COO- or ^* * "binds hand is combined with R ² attached to), and, R ³ is a phenylene group, cyclohexylene group, a methylene group, -NH-, or the formula (R ³ -1) or (R ³ -2):

{Wherein (R ³ -1), and (R ³ -2) of, X ¹ is -COO- ^{+, +} -OCO- (however, the coupling hand attached to "+", the formula (R ³ -1) in combining phenylene group, and wherein the formula (R ³ -2) in cyclohexane and xylene group also coupled) or an oxygen atom, d is 0 or 1, d is 0 e is an integer of 0 to 12 when, d is 1, e is an integer of 1 to 12}
A is an integer of 0 to 3, b is an integer of 0 to 3, c is 0 or 1, and when a is 2 or 3, plural R ² and X exist in the same May be different from the sea]
Wherein the liquid crystal aligning agent comprises a radiation-sensitive polymer having a structure represented by the following formula (1). The method according to claim 1,
Wherein the radiation-sensitive polymer is a radiation-sensitive polyorganosiloxane having a structure represented by the formula (1 '). 3. The method of claim 2,
Wherein the radiation-sensitive polyorganosiloxane is at least one selected from the group consisting of
A polyorganosiloxane having an epoxy group,
The following formula (1)

(Wherein R ¹ , R ² , R ³ , X, a, b and c in the formula (1) are the same as those in the formula (1 '
Wherein the liquid crystal aligning agent is a reaction product of a compound represented by the formula 4. The method according to any one of claims 1 to 3,
Further, a liquid crystal aligning agent containing at least one polymer selected from the group consisting of polyamic acid and polyimide (provided that the polymer does not have a structure represented by the formula (1 ')). 4. The method according to any one of claims 1 to 3,
Further, a liquid crystal aligning agent containing a polyorganosiloxane (provided that the polyorganosiloxane does not have a structure represented by the above formula (1 ')). A method for forming a liquid crystal alignment film, characterized by comprising applying a liquid crystal aligning agent according to any one of claims 1 to 3 on a substrate to form a coating film, and irradiating the coating film with radiation. A liquid crystal display element comprising a liquid crystal alignment film formed of the liquid crystal aligning agent according to any one of claims 1 to 3. 8. The method of claim 7,
Wherein R ¹ in the formula (1 ') is a hydrogen atom, a fluorine atom, an alkyl group having 1 to 5 carbon atoms or a fluoroalkyl group having 1 to 5 carbon atoms, and the liquid crystal display element is a TN type, STN type, A liquid crystal display element which is a liquid crystal display element. 9. The method of claim 8,
A liquid crystal display element in which the liquid crystal display element is a liquid crystal display element of a transverse electric field system. 8. The method of claim 7,
Wherein R ¹ in the formula (1 ') is an alkyl group having 5 to 20 carbon atoms or a fluoroalkyl group having 5 to 20 carbon atoms, or a monovalent group having a steroid skeleton and the liquid crystal display element is a vertically aligned liquid crystal display Liquid crystal display element. delete