KR101606082B1 - 로드 포트용 노즐 조립체 및 그것을 구비한 로드 포트 - Google Patents

로드 포트용 노즐 조립체 및 그것을 구비한 로드 포트 Download PDF

Info

Publication number
KR101606082B1
KR101606082B1 KR1020140090416A KR20140090416A KR101606082B1 KR 101606082 B1 KR101606082 B1 KR 101606082B1 KR 1020140090416 A KR1020140090416 A KR 1020140090416A KR 20140090416 A KR20140090416 A KR 20140090416A KR 101606082 B1 KR101606082 B1 KR 101606082B1
Authority
KR
South Korea
Prior art keywords
nozzle
housing
stage
foup
load port
Prior art date
Application number
KR1020140090416A
Other languages
English (en)
Korean (ko)
Other versions
KR20160009904A (ko
Inventor
권병철
Original Assignee
권병철
주식회사 엘에스테크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 권병철, 주식회사 엘에스테크 filed Critical 권병철
Priority to KR1020140090416A priority Critical patent/KR101606082B1/ko
Priority to TW104100052A priority patent/TWI559386B/zh
Publication of KR20160009904A publication Critical patent/KR20160009904A/ko
Application granted granted Critical
Publication of KR101606082B1 publication Critical patent/KR101606082B1/ko

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • H01L21/67028Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
KR1020140090416A 2014-07-17 2014-07-17 로드 포트용 노즐 조립체 및 그것을 구비한 로드 포트 KR101606082B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020140090416A KR101606082B1 (ko) 2014-07-17 2014-07-17 로드 포트용 노즐 조립체 및 그것을 구비한 로드 포트
TW104100052A TWI559386B (zh) 2014-07-17 2015-01-05 晶舟加載台用噴嘴組件及具備其的晶舟加載台

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020140090416A KR101606082B1 (ko) 2014-07-17 2014-07-17 로드 포트용 노즐 조립체 및 그것을 구비한 로드 포트

Publications (2)

Publication Number Publication Date
KR20160009904A KR20160009904A (ko) 2016-01-27
KR101606082B1 true KR101606082B1 (ko) 2016-03-24

Family

ID=55309252

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020140090416A KR101606082B1 (ko) 2014-07-17 2014-07-17 로드 포트용 노즐 조립체 및 그것을 구비한 로드 포트

Country Status (2)

Country Link
KR (1) KR101606082B1 (zh)
TW (1) TWI559386B (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7422577B2 (ja) * 2020-03-23 2024-01-26 平田機工株式会社 ロードポート及び制御方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004103937A (ja) 2002-09-11 2004-04-02 Shin Etsu Polymer Co Ltd 基板収納容器
JP2010270823A (ja) * 2009-05-21 2010-12-02 Shin Etsu Polymer Co Ltd パージバルブ及び基板収納容器
KR101099247B1 (ko) 2005-03-08 2011-12-27 가부시키가이샤 야스카와덴키 로드 포트 및 로드 포트의 제어 방법

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU1842400A (en) * 1999-12-06 2001-06-12 Robert A. Laibovitz Apparatus and method for delivery of small volumes of liquid
JP6131534B2 (ja) * 2012-06-11 2017-05-24 シンフォニアテクノロジー株式会社 パージノズルユニット、ロードポート、載置台、ストッカー

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004103937A (ja) 2002-09-11 2004-04-02 Shin Etsu Polymer Co Ltd 基板収納容器
KR101099247B1 (ko) 2005-03-08 2011-12-27 가부시키가이샤 야스카와덴키 로드 포트 및 로드 포트의 제어 방법
JP2010270823A (ja) * 2009-05-21 2010-12-02 Shin Etsu Polymer Co Ltd パージバルブ及び基板収納容器

Also Published As

Publication number Publication date
TWI559386B (zh) 2016-11-21
TW201604942A (zh) 2016-02-01
KR20160009904A (ko) 2016-01-27

Similar Documents

Publication Publication Date Title
TWI712098B (zh) 基板容器、用於基板容器之閥總成、沖洗模組及其替換方法
KR200472665Y1 (ko) 가스 충전 체크 밸브 및 가스 충전 체크 밸브를 구비하는 정밀 용기 장치
US10453723B2 (en) Gas purge filter
US9916997B2 (en) End structure of nozzle, purging device, and load port
US10047870B2 (en) One way valve assembly
EP3596369B1 (en) Valve with integral balancing passage
US9266760B2 (en) Ozone faucet
KR101606082B1 (ko) 로드 포트용 노즐 조립체 및 그것을 구비한 로드 포트
KR101542599B1 (ko) 확산핀을 가지는 전자소자 제조용 샤워 헤드 및 샤워 헤드 조립체
KR101881003B1 (ko) 충진 노즐
KR102116863B1 (ko) 공기압 조작 밸브 및 그 조립 방법
JP2015117758A (ja) 逃し弁
KR101469416B1 (ko) 퓨즈콕용 안전차단장치
JP5773487B2 (ja) 空気弁
KR20110125792A (ko) 파이프 연결용 소켓
KR101329605B1 (ko) 가전기기용 물탱크 연결장치
JP7109591B2 (ja) 吐水弁構造、及びそれを備えた加湿器
JP5311475B2 (ja) 液体吐出ポンプ
US9933086B2 (en) Gas supply control device
KR102035207B1 (ko) 역류 방지 밸브
US20170259895A1 (en) Connection system comprising a closing device for diving regulator
JP6165653B2 (ja) 基板収納容器
JP6277030B2 (ja) ポンプ
KR101403994B1 (ko) 감압 밸브
KR102509593B1 (ko) 진공밸브

Legal Events

Date Code Title Description
A201 Request for examination
N231 Notification of change of applicant
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20190129

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20200128

Year of fee payment: 5