KR101586426B1 - Repair method for susceptor - Google Patents

Abstract

The present invention relates to a repair method for susceptor, comprising: a plurality of protrusions of which each is protruded to an upper side and spaced apart from each other; and a chuck supporting a substrate placed on the plurality of protrusions in which an electrostatic film is installed therein and is electrostatic. The present invention comprises the following processes: preparing detergent and a cleaning member enabling the removal of protrusions; placing the cleaning member on the upper side of protrusions, and reacting the protrusions with the detergent for melting fusion; translocating the cleaning member to the upper side of the protrusions wherein a plurality of protrusions are melted from the chuck in order to remove a re-deposition layer deposited on the chuck; and forming a plurality of protrusions so that they are spaced part from each other on the upper side of the chuck. Accordingly, according to an embodiment of the present invention, a repair can be done in a simple way such that the protrusions and electrostatic films (512) are not operated by shortening a gap between the protrusions and electrostatic films. In this regard, a chuck is not discarded at the time of operation between the protrusions and electrostatic film, but is not re-used after repair, and a repair can be done in a simple way without dismantling a chuck body.

Description

Repair method for susceptor [0002]

BACKGROUND OF THE INVENTION 1. Field of the Invention [0001] The present invention relates to a susceptor for supporting a substrate and a method of repairing the substrate supporting apparatus, and more particularly, to a method of repairing a susceptor capable of repairing a susceptor by a simple method.

Generally, as disclosed in Korean Patent Laid-Open Publication No. 2001-0001581, a sputtering apparatus includes a chamber having an inner space, a chuck that is installed inside the chamber and supports the substrate, a target positioned opposite to the upper side of the substrate support, And a magnet portion spaced upward from the backing plate.

Generally, a chuck for supporting a substrate in a sputter is an electrostatic chuck in which an electrostatic film is installed and chucks a substrate on an upper portion by an applied electrostatic force. An upper portion of the chuck is projected upward, and a plurality of projections made of a conductor are provided, and the substrate is seated on the upper portion of the plurality of projections.

Meanwhile, in order to perform a process such as deposition or etching on a substrate, a process of heating the chuck to a process temperature is accompanied. However, if the process is repeated a plurality of times, the protrusions are melted by the heat of high temperature, which penetrates into the inside of the chuck and is energized with the electrostatic film provided inside the chuck. As a result, a defective electrostatic force is generated in the chuck, and the substrate is chucked, resulting in difficulty in the process.

Korean Patent Laid-Open No. 2001-0001581

The present invention provides a method of repairing a susceptor capable of repairing a susceptor by a simple method.

The present invention also provides a method of repairing a susceptor capable of repairing defective conduction in a susceptor without disassembling the susceptor.

There is provided a method of repairing a susceptor comprising a plurality of protrusions each projecting upward and provided with an electrostatic film therein and having a chuck for supporting a substrate on the plurality of protrusions with an electrostatic force A cleaning agent capable of removing the projections, and a cleaning member; Placing the cleaning member on the protrusion and reacting the protrusion with the cleaning agent to melt the protrusion; Removing the redeposited layer deposited on the chuck from the plurality of protrusions and the protrusions by moving the cleaning member above the protrusions; And forming a plurality of protrusions on the chuck so as to be spaced apart from each other.

And forming a protective layer on the chuck before forming a plurality of protrusions on the chuck so as to be spaced apart from each other.

The cleaning agent is a solution containing hydrofluoric acid (HF) and water (H ₂ O).

The cleaning agent is mixed with the hydrofluoric acid (HF) and the water (H ₂ O) at a ratio of 15: 1 to 25: 1.

A plurality of projections are formed by any one of a chemical vapor deposition method, a physical vapor deposition method, and a printing method in a process of forming a plurality of projections on the chuck so as to be spaced apart from each other.

Disposing a mask having a plurality of openings on the chuck in a process of forming a plurality of projections on the chuck so as to be spaced apart from each other; And forming a plurality of protrusions on the chuck by passing a protrusion forming material on the upper side of the mask.

The protective layer is formed by any one of a chemical vapor deposition method, a physical vapor deposition method, and a coating method.

The protective layer is either an insulator or a dielectric.

According to the present invention, there is provided a plasma display panel comprising: an upper body made of a material including ceramics and capable of supporting a substrate on one side, an electrostatic film disposed on the substrate, supporting the substrate on one side by an electrostatic force by the electrostatic film; And a lower body provided on the other side of the upper body, the lower body being made of a first metal; A cover installed to surround the side surface and the lower surface of the chuck body and configured to expose one side of the upper body; A support member connected to the lower body and made of a second metal; And a heating body installed between any one of the upper body and the lower body or between the upper body and the lower body;

A susceptor having a chuck having a chuck; A chuck power supply line installed to penetrate the susceptor and connected to the electrostatic film at one end to apply power to the electrostatic film; A heating power supply line connected to the heating element at one end to apply power to the heating element; Wherein the support portion is cut to separate the support body into a first body connected to the lower body of the chuck body and a second body separated from the first body, And a heating power supply line, respectively; Electrically connecting the exposed chuck power supply line and the electrostatic film, and electrically connecting the heating power supply line and the heating element; Placing the upper body and the first body on the protection member such that one side of the upper body faces the protection member; Placing the cover so as to surround the chuck body while exposing one side of the chuck body, and fastening the cover and the protecting member to each other; Positioning the second body on the first body of the support; Placing a jig above the second body, and fastening and fixing the jig, the cover, and the chuck body; And bonding the first body and the second body to each other.

Positioning the jig on the second body and aligning the jig and the second body by aligning the jig and the second body; and positioning the jig by aligning the jig with the second body, And inserting and mounting the alignment member through the alignment holes provided in the fixed block.

And a shaft through which the chuck power supply line and the heating power supply line pass, the second body of the cut support being connected to the shaft, and the jig Wherein the step of positioning the jig on the upper side of the second body includes passing the shaft through the insertion groove of the jig, And positioning the second body on an upper side of the second body.

The process of fastening and fixing the jig, the cover, and the chuck body includes the steps of: jigging the jig; inserting the cover into the cover; inserting and mounting a jig fixing member to penetrate the chucking hole formed in the chuck body; .

A method of repairing a susceptor for joining a first body and a second body by a laser welding method.

According to the embodiment of the present invention, it is possible to short-circuit between the protrusions and the electrostatic film by a simple method, and to prevent the protrusions from being energized with the electrostatic film 512. Thus, the chuck can be repaired without disposal in the communication between the protrusions and the electrostatic film, and the chuck body can be repaired in a simple manner without disassembling.

1 is a cross-sectional view of a sputtering apparatus according to an embodiment of the present invention;
2 is a cross-sectional view illustrating a substrate supporting apparatus according to an embodiment of the present invention.
3 is a perspective view of a part of a substrate supporting apparatus according to an embodiment of the present invention.
4 is a top view of a chuck according to an embodiment of the present invention.
FIG. 5 is a cross-sectional view of a chuck according to an embodiment of the present invention,
6 is a view sequentially showing a method of repairing a susceptor according to an embodiment of the present invention
7 is a view sequentially showing a method of repairing a susceptor according to a modification of the embodiment
9A to 9F and 10 are cross-sectional views illustrating a method of repairing a substrate holding apparatus according to an embodiment of the present invention

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. It should be understood, however, that the invention is not limited to the disclosed embodiments, but is capable of other various forms of implementation, and that these embodiments are provided so that this disclosure will be thorough and complete, It is provided to let you know completely.

1 is a cross-sectional view illustrating a sputtering apparatus according to an embodiment of the present invention. 2 is a cross-sectional view illustrating a substrate supporting apparatus according to an embodiment of the present invention. 3 is a perspective view showing a part of a substrate supporting apparatus according to an embodiment of the present invention. 4 is a top view of a chuck according to an embodiment of the present invention. 5 is an enlarged cross-sectional view of a part of a chuck according to an embodiment of the present invention. 6 is a view sequentially illustrating a method of repairing a susceptor according to an embodiment of the present invention. 7 is a view sequentially showing a repair method of a susceptor according to a modification of the embodiment.

1, a sputtering apparatus according to an embodiment of the present invention includes a chamber unit 100 having an internal space, a substrate support apparatus 100 installed inside the chamber unit 100, A target portion 300 and a target portion 300 which are spaced upward from the substrate supporting apparatus 200 and face the substrate supporting apparatus 200 in the chamber 100, And a magnet unit 400 extended to correspond to the target portion 300 and spaced upward from the target portion 300. A target power supply part 330 connected at one end to the target part 300 to apply power to the target part 300 for sputtering and a power supply part 330 connected to the magnet part 400 to rotate the magnet part 400, (Not shown).

The chamber part 100 is in the shape of a cylinder having an inner space capable of performing a sputtering process with respect to the substrate S. For example, the upper and lower chambers 100 and 100 may be separated from each other by an upper chamber (or a chamber lead) covering the upper opening of the lower chamber, but not limited thereto. But may be formed integrally.

The target portion 300 functions as a cathode in the sputtering process. The target portion 300 is spaced upward from the substrate supporting apparatus 200 and includes a target 310 mounted on the substrate S supported on the substrate supporting apparatus 200 so as to face the substrate S, And a backing plate 320 attached to the other surface of the target 310. The backing plate 320 may be a metal plate. More specifically, the target 310 is spaced on the upper side of the substrate supporting apparatus 200 so that the front surface (or the lower surface) of the target 310 faces the upper surface of the substrate S, (Or an upper surface)

The target 310 extends in the horizontal direction, and its cross-sectional shape is formed in a shape corresponding to the substrate S. For example, when a round wafer is used as the substrate S, the shape of the cross section of the target 310 is circular. The target 310 may be a metal material such as aluminum (Al) and nickel (Ni), and a metal material such as indium-tin oxide (ITO) -Zinc Oxide) and IO (Indium Oxide). Of course, the target 310 is not limited to the above-described materials, and can be changed into various materials depending on the purpose of the substrate processing process.

The backing plate 320 is made of a conductor and extends in a direction corresponding to the target 310 and is bonded to the rear surface of the target 310 by a method such as a separate adhesive or welding. The backing plate 320 according to the embodiment is manufactured to have a larger area than the target 310 and is bonded to the rear surface of the target 310.

The power supply unit 330 according to the embodiment is connected to the backing plate 320 constituting the target unit 300, but not limited thereto, and may be directly connected to the target 310.

The magnet unit 400 includes a N-pole and an S-pole, and forms a magnetic field in the chamber unit 100, thereby restricting or trapping the plasma at or near the target unit 300. The magnet unit 400 extends horizontally to correspond to the target unit 300 and is spaced apart from the upper side of the target unit 300 and more specifically to the upper side of the backing plate 320. At this time, it is preferable that the center portion of the magnet unit 400 is located above the center portion of the target 300 unit. Here, the center portion of the target portion 300 and the magnet portion 400 means the center portion in the horizontal direction. The magnet part 400 according to the embodiment is circular in shape such that its cross-sectional shape corresponds to the target part 300, but it is not limited thereto and can be changed into various shapes.

The rotation driving unit 900 includes a power source 910 for providing a rotational power and a power source 910 having one end connected to the power source 910 and the other end connected to the magnet unit 910 in the chamber unit 100, And a driving shaft 920 connected to the unit 400.

A substrate supporting apparatus 700 according to the present invention includes a substrate 500 on which a substrate such as a wafer is placed or supported and includes an electrostatic film 512 for supporting the substrate S and a heating element 512 for heating the substrate S A susceptor 500 installed to be connected to a lower portion of the susceptor 500 for supporting the susceptor 500 and rotating the susceptor 500 or driving the susceptor 500 ). The susceptor 500 includes a chuck 510 for heating the substrate S for processing, a chuck 510 installed to be positioned between the chuck 510 and the shaft 610, A first power supply part 810 for supplying power to the electrostatic film 512 provided in the susceptor 500, a second power supply part 810 for supplying power to the heating element 514, 2 power supply unit 720.

The chuck 510 supports the substrate S by placing the substrate S on one surface, for example, the upper surface. This chuck 510 is provided with a body (hereinafter, referred to as a chuck body 511) on which a substrate is placed at an upper portion, a cover (not shown) surrounding the outer and lower surfaces of the chuck body 511 and protecting the chuck body 511 515 and a plurality of projections 513 provided on the chuck body 511 so as to protrude upward from one side of the chuck body 511 on which the substrate S is placed and a chuck body 511 An electrostatic film 512 for chucking the substrate S to the chuck body by generating an electrostatic force in the chuck body 511 by an applied electric power (or electric power), a chuck body 511, And a heating element 514 installed inside the heating element 511 to heat the chuck body 511.

The cover 515 is installed to protect the outer surface and the lower surface of the chuck body 511 and protects the upper surface of the chuck body 511 on which the substrate S is mounted. Thus, the cover is hollow, for example, a circular ring shape having a central region opened so that the chuck body 511 can be inserted therein. Of course, the shape of the cover 515 is not limited to this, and can be changed into various shapes corresponding to the chuck body 511. The cover 515 is provided with a hole 515a penetrating in the up and down direction. The hole 515a may be provided with a separate jig fixing member 930 for fastening with the jig 900, which will be described later, (Hereinafter referred to as a first cover fastening hole 515a) inserted through the through hole. Here, the plurality of first cover fastening holes 515a are spaced from each other along the extending direction of the cover 515, which is a circular hollow shape. Further, on the cover 515, a hole 515b penetrating in the up and down direction is further provided outside the first cover engagement hole 515a, and the hole 515b is then inserted into the chuck body 511, (Hereinafter referred to as a second cover fastening hole 515b) provided for fastening the body 511 to the protective member 10 (see Fig. 8). Here, the plurality of second cover engagement holes 515b are provided so as to be spaced apart from each other along the extension direction of the cover from the outside of the first cover engagement hole 515a.

The chuck body 511 may have a shape corresponding to the substrate S, for example, a circular plate shape. Of course, the shape of the chuck body 511 is not limited to this, and may be changed into various shapes depending on the shape of the substrate S.

The chuck body 511 according to the embodiment is divided into an upper body 511a and a lower body 511b. An electrostatic film 512 is embedded in the upper body 511a, and the upper body 511a, And a heating element 514 is provided between the heating elements 511b. The upper body 511a according to the embodiment is made of a ceramic material such as aluminum nitride (AlN), and the lower body 511b is made of an iron (Fe) alloy. In manufacturing the chuck 510, the upper body 511a and the lower body 511b are bonded and bonded to each other.

At this time, the upper body 511a and the lower body 511b may be coupled to each other by thermocompression bonding or using a separate adhesive. Of course, the chuck body 511 may not be divided into the upper body 511a and the lower body 511b, but may be integrally manufactured.

The chuck body 511 is provided so as to pass through the chuck body 511 in the vertical direction at a position corresponding to the first cover engagement hole 515a provided in the cover 515 and to fix the chuck 510 to the jig 900 A plurality of holes (hereinafter, referred to as " chucking holes 511c ") provided so as to be able to insert the forcing jig fixing member 930 are provided. The chuck connection holes 511c are provided in the upper body 511a and the lower body 511b respectively and each of the plurality of chuck connection holes 511c includes a first cover engagement hole 515a provided in the cover 515, And is provided at a corresponding position.

A plurality of electrostatic films 512 are provided inside the chuck body 511 to impart an electrostatic force between the substrate S and the chuck body 511 so as to chuck the substrate S. The plurality of electrostatic films 512 are spaced apart from each other in the chuck body 511 and are radially formed to diffuse from the center of the chuck body 511 to the edge area. In other words, a plurality of electrostatic films 512 are arranged in a clockwise or counterclockwise direction to form mutually spaced apart patterns. These patterns are arranged in a line from the center of the chuck body 511 to the edge region. That is, the pattern according to the embodiment is a discontinuous ring shape, and a discontinuous ring-shaped pattern is arranged in the direction from the center of the chuck body 511 to the edge direction. The electrostatic film 512 according to the embodiment is made of tungsten and has a trapezoidal shape. However, the electrostatic film 512 is not limited thereto, and the electrostatic film 512 can be changed into various conductive materials and various shapes.

2, a hole 518 having one side and the other side opened is provided in the central region of the chuck body 511, and a groove 516 having one side open is formed so as to diffuse from the center of the chuck body 511 to the edge region. ). The hole 518 is a gas injection hole through which a coolant gas such as helium (He) gas for cooling the substrate S is injected. The hole 518 is formed at one side of the chuck body 511 on which the substrate S is placed, And the lower side in the opposite direction is opened. Further, the groove 516 is a passage through which the gas injected from the gas injection hole 518 moves, that is, the gas moving groove 516. The gas injection hole 518 is provided so as to penetrate the chuck body 511 in the vertical direction in a central region of the chuck body 511. Although not shown, And the coolant supply pipe may be installed inside the shaft 610 to be described later and connected to the gas injection hole 518.

The gas moving groove 516 is provided to communicate with the gas injection hole 518 provided in the central region of the chuck body 511 so that the refrigerant gas injected into the gas injection hole 518 flows into the edge of the chuck body 511, As shown in FIG. Here, the gas moving groove 516 is located on one side of the chuck body 511 on which the substrate S is seated, that is, the upper side is opened, and the bottom surface is located lower than the upper surface of the chuck body 511. The gas moving groove 516 is provided so as to be positioned between the electrostatic film 512 and the electrostatic film 512 in the region of the chuck body 511. In other words, inside the chuck body 511, the electrostatic film 512 is located in the region between the grooves 516. The gas moving groove 516 according to the embodiment may be, for example, a plurality of ring shapes and a radial shape combined with a linear shape extending from the gas injection hole 518 provided at the center of the chuck body 511 to the edge area . The height or the depth of the gas moving groove 516 may be variously changed depending on the overall thickness of the chuck body 511, the substrate processing conditions, and the kind of the refrigerant gas, and may be, for example, 10 μm to 100 μm.

The refrigerant gas supplied to the refrigerant supply pipe during the substrate processing process is discharged to the upper side of the chuck body 511 through the gas injection hole 518 and diffused in the space between the substrate S and the chuck body 511. That is, the refrigerant gas is injected through a hole provided at the center of the chuck body 511, and gradually moved or diffused to an edge or an outer region of the chuck body 511 and is discharged to the outside of the chuck body 511. By the movement of the coolant, the substrate S in process is cooled or cooled to prevent the substrate S from being damaged by the high temperature.

The heating element 514 is placed inside the chuck body 511 and heats the chuck body 511 to heat the substrate that is seated on the chuck body 511 to the process temperature. The heating element 514 may be a wire or a line-shaped heating wire that generates heat by an applied power source applied thereto. The heating element 514 is installed to be evenly distributed over the entire area of the chuck body 511 in the chuck body 511. For this purpose, the heating element 514 may be extended in a plurality of folded shapes. For example, Folded shape. Of course, the shape in which the heating element 514 made of a wire or a line-shaped heating wire is installed inside the chuck body 511 can be variously changed. Further, the heating element 514 is not limited to a wire or a line-shaped heating wire, but may be a heating element in the form of a thin film.

As described above, the chuck body 511 may include an upper body 511a and a lower body 511b coupled to a lower portion of the upper body 511a. At this time, the upper body 511a and the lower body 511b may be connected to each other, Is preferably the same. The electrostatic film 512 described above is installed in the upper body 511a of the chuck body 511 and the gas moving groove 516 which is a passage through which the cooling gas moves is moved from the upper surface of the upper body 511a And may be provided so as to have a predetermined depth inward. The gas injection holes 518 are formed to pass through the central region of the upper body 511a and the central region of the lower body 511b. The heating body 514 is provided with a heating element between the upper body 511a and the lower body 511b and the heating body is disposed between the upper body 511a and the lower body 511b before the upper body 511a and the lower body 511b are coupled. 511b, the upper body 511a and the lower body 511b are coupled to each other through thermocompression bonding or separate coupling means. At this time, the lower surface of the upper body 511a and the upper surface of the lower body 511b may be provided with receiving grooves for receiving the heating element 514, and the lower side of the upper body 511a may be open And the upper surface of the lower body 511b is provided with a receiving groove whose upper side is opened.

The protrusion 513 is formed to protrude above the upper surface of the chuck body 511 at an upper portion of the chuck body 511. [ The projections 513 are formed in the region of the upper surface of the chuck body 511 corresponding to the upper side of the electrostatic film 512. In other words, the projection 513 is formed on the upper surface of the chuck body 511 in the region between the gas moving groove 516 and the gas moving groove 516. [ The protrusions 513 may be formed in a plurality of regions in the region corresponding to the upper side of one electrostatic film 512. The protrusions 513 may be formed to have a circular cross section, for example, and may include titanium nitride (TiN), and may be formed by physical vapor deposition (PVD) such as sputtering or chemical vapor deposition .

The supporting part 520 is fixedly installed so as to be positioned between the lower part of the chuck body 511 and the susceptor driving part 900 so as to support the lower part of the chuck 510. [ The supporting portion 520 according to the embodiment may have a shape corresponding to that of the chuck body 511, for example, a circular cross-sectional shape, and may have a width or diameter smaller than that of the chuck body 511. Further, the support part 520 according to the present invention may be made of STS (Stainless Steel) which is a material different from the chuck.

A fixing block 530 is provided on both sides of the shaft 611 at a lower portion of the supporting portion 520 and each of the fixing blocks 530 is provided with a hole 531 penetrating in the vertical direction. Here, the hole 531 provided in the fixing block 530 is a hole into which an alignment member for alignment with the jig (hereinafter referred to as a chuck alignment hole 531) is inserted when the chuck is fastened to the jig for repairing.

The susceptor driving unit 600 supports the susceptor 500 to move the susceptor 500 up and down or rotate. The susceptor driving unit 600 includes a shaft 610 connected to the lower portion of the supporting unit 520 and a shaft power source 620 serving as a driving means for moving up and down the shaft 610.

A part of the shaft 610 is located inside the chamber 100 and connected to the support 520 and the rest is projected out of the chamber 100 and connected to the shaft power source 620. The shaft 610 is positioned below the support 520 and includes a shaft body 612 connected to the shaft power source 620 and a bellows 612 disposed between the shaft 520 and the support body 520 611). Here, in order to install the bellows so that the shaft 610 protrudes out of the chamber 100, the bellows should be installed so that the shaft 610 passes through the chamber 100, and the bellows is installed to surround the vicinity of the penetration portion of the chamber 100 And serves to seal or seal the chamber 100.

At least a part of the chuck power supply line 820 for applying a power for generating an electrostatic force to the electrostatic film 512 and a heating power source for connecting a power source for heating the substrate S to the heating element 514 are provided in the shaft 610, At least a portion of the line 720 is provided. Here, the chuck power supply line 820 includes a power supply line (hereinafter, referred to as a first power supply line 821) having one end connected to the electrostatic film 512, a power supply line The first power source line 821 and the second power source line 822 are connected to each other by a separate connection member (hereinafter referred to as a first connection member 830) do. The first power line 821 is connected to the electrostatic film 512 by a separate connecting member (hereinafter referred to as a second connecting member 840) inside the chuck body 511. That is, a conductive second connection member 840 is provided in the chuck body 511 and connected to the electrostatic film 512, and one end of the first power source line 821 is connected to the second connection member 840 . The second power source line 820 includes a power source line (hereinafter referred to as a third power source line 721) having one end connected to the heating body 514, a power source line The third power source line 721 and the fourth power source line 722 are connected to each other by a separate connection member (hereinafter referred to as a third connection member 730). The third power source line 721 is connected to the electrostatic film 512 by a separate connecting member (hereinafter referred to as a fourth connecting member 740) inside the chuck body 511. That is, a conductive fourth connecting member 740 is provided in the chuck body 511 and connected to the electrostatic film 512, and one end of the third power line 721 is connected to the fourth connecting member 740 .

6 is a view for sequentially explaining a method of repairing a chuck according to an embodiment of the present invention. 7 is a view for sequentially explaining a repair method of a chuck according to a modification of the embodiment.

The substrate S is placed on the susceptor 500 to form a thin film on the substrate S through a process such as sputtering and the substrate S is heated to the process temperature. Since a plurality of processes are performed on the susceptor 500 at this time, the process of heating the substrate S to the process temperature is repeated a plurality of times. At least a part of the protrusions 513 formed on the upper portion of the chuck 510 may be melted or dissolved by the heat of high temperature and penetrate or permeate into the interior of the chuck body 511. [ Particularly, as shown in FIG. 6A, the molten protrusion 513 material can penetrate through the gas moving groove 516 provided in the chuck body 511, through the side wall and the bottom surface surrounding the gas moving groove 516 The chuck body 511 can be infiltrated. Hereinafter, for convenience of explanation, the side dissolving from the protrusions 513 and flowing along the surface of the chuck body 511 to form a predetermined thin film layer will be referred to as "redeposited layer 513a ". In other words, it dissolves from the projection 513 and penetrates into the upper surface of the chuck body 511, the inner surface of the chuck body 511 which defines the gas moving groove 516, and the inside of the chuck body 511, The layer redeposited to be connected to the film 512 is referred to as "redeposited layer 513a ".

The redeposited layer 513a penetrated through the gas moving groove 516 penetrates in the direction of the electrostatic film 512 provided inside the chuck body 511 and can be connected to the electrostatic film 512. At this time, one end of the re-deposition layer 513a is connected to the protrusion 513 of the chuck body 511 and the other end is connected to the electrostatic film 512 so that the protrusion 513 and the electrostatic film are energized, And electrical connection failure occurs.

Therefore, the resistance of the power line connected to the electrostatic film 512 is measured several times or after a predetermined number of steps, and when it deviates from the reference resistance value, it is judged that the protrusion 513 and the electrostatic film 512 are energized. Repair and repair the chuck in the manner described below.

Hereinafter, with reference to FIG. 6, a method of repairing a chuck according to an embodiment of the present invention will be described.

First, the protrusion 513 formed on the upper surface of the chuck body 511 is removed. To this end, a cleaning agent for removing the protrusions 513 is provided. The cleaning agent may be, for example, a solvent or a mixture of hydrofluoric acid (HF) and water (H ₂ O) mixed with hydrofluoric acid (HF) and water (H ₂ O) at a ratio of 15: 1 to 25: . (HF: H ₂ O = 20: 1) is mixed with hydrofluoric acid (HF) and water (H ₂ O) in a ratio of 20 to 1, and this is used as a cleaning agent. Then, as shown in FIG. 6B, a cleaning member C such as a cleaning member, for example, fabric, fiber or cloth, is prepared to cover the entire upper portion of the chuck body 511. [ Thereafter, the cleaning agent C is sprayed to the cleaning member C, the cleaning member C is moved horizontally in a state in which the cleaning member C is in close contact with the upper portion of the chuck body 511, . In other words, the cleaning member C to which the cleaning agent is sprayed is moved as if wiping the chuck body 511. 6C, the protrusions 513 are removed from the chuck body 511, and the material of the protrusions 513, which is dissolved from the protrusions 513 and flows down to the upper surface of the chuck body 511, The deposition layer 513a is removed. More specifically, the redeposition layer 513a deposited on the upper surface of the chuck body 511 and the inner surface of the gas moving groove 516 is removed. Next, a plurality of protrusions 513 made of, for example, titanium nitride (TiN) are formed on the chuck body 511 by physical vapor deposition (PVD) or chemical vapor deposition (CVD). At this time, a plurality of protrusions 513 are selectively formed on the upper surface of the chuck body 511 at positions corresponding to the upper side of the vapor deposition or electrostatic film 512 or between the gas moving grooves 516 and the gas moving grooves 516 The deposition process is performed in a state where the mask M is placed on the chuck body 511 as shown in FIG. In the embodiment, the projection 513 is formed by a physical vapor deposition (PVD) method. The mask M is a mask M having a plurality of openings at positions corresponding to the positions of the protrusions 513 to be formed or the protrusions 513. Of course, the method of forming the protrusions 513 is not limited to the physical vapor deposition method described above, but may be formed by a chemical vapor deposition (CVD) method, a printing method, or the like.

A plurality of protrusions 513 are formed on the chuck body 511 by the deposition process described above with reference to FIG. 6E. At this time, the redistilled layer 513a deposited on the upper surface of the chuck body 511 and the inner surface of the gas moving groove 516 is melted from the previous protrusion 513 as described above. Therefore, even if the other end of the redeposited layer 513a that has melted from the previous protrusion 513 and has penetrated into the chuck body 511 is still connected to the electrostatic film 512, a portion of the material of the infiltrated protrusion 513 Is separated or short-circuited with the newly formed projection 513 on the upper portion of the chuck body.

Hereinafter, with reference to FIG. 7, a method for repairing a chuck according to a modification of the embodiment will be described.

In the repair method of the chuck 510 according to the modified example, a step of forming the protective layer 517 between the step of removing the projection 513 and the step of forming the projection 513 is added to the embodiment. 7A, the projection 513 is melted or melted and the projection 513 and the electrostatic film are energized (Fig. 7A) by the redistribution layer 513a, the cleaning member C is placed on the chuck body 511, After spraying the cleaning agent, the cleaning member C is moved to wipe the upper portion of the chuck body 511 (Fig. 7B). 7C, the redeposited layer 513a deposited on the upper surface of the chuck body 511 and the inner surface of the gas moving groove 516 is removed.

Next, a material such as an insulating material, a dielectric material or the like is deposited on the upper surface of the chuck body 511 by physical vapor deposition (PVD) or chemical vapor deposition (CVD) to form the protective layer 517. At this time, the protective layer 517 is formed on the bottom and sidewalls of the gas moving groove 516. In the embodiment, a protective layer 517 is formed by a physical vapor deposition (PVD) method. Of course, the method of forming the protective layer 517 is not limited to the physical vapor deposition method described above, and may be formed by a chemical vapor deposition (CVD) method, a coating method, or the like.

Then, a plurality of protrusions 513 made of, for example, titanium nitride (TiN) are formed again on the protective layer 517 by physical vapor deposition (PVD) or chemical vapor deposition (CVD). The mask M is placed on the chuck body 511 as shown in FIG. 7E, and a deposition process is performed to form a projection 513 between the groove or the groove at a position corresponding to the upper side of the electrostatic film 512 (Fig. 7F).

At this time, the redistilled layer 513a deposited on the upper surface of the chuck body 511 and the inner surface of the gas moving groove 516 is melted from the previous protrusion 513 as described above. Therefore, even if the other end of the redeposited layer 513a that has melted from the previous protrusion 513 and has penetrated into the chuck body 511 is still connected to the electrostatic film 512, a portion of the material of the infiltrated protrusion 513 Is separated or short-circuited with the newly formed projection 513 on the upper portion of the chuck body.

As described above, in the present invention, the protrusion 513 and the electrostatic film 512 are short-circuited by the same simple method as the above-described method, so that the protrusion 513 and the electrostatic film 512 can be protected from being energized. Thus, the chuck 510 can be repaired without being discarded in the communication between the protrusion 513 and the electrostatic film 512, and the chuck body 511 can be repaired in a simple manner without disassembling.

In the above description, the protrusion 513 is melted and the electrostatic film 512 in the chuck 510 is energized.

In addition, a connection failure between the electrostatic film 512 and the chuck power supply line 820 or a connection failure between the heating element 514 and the heating power supply line 720 may occur. In other words, the first power supply line 821 and the first connection member 830 or the first connection member 830 and the second power supply line 822 of the chuck power line 820 are short-circuited The third power supply line 721 and the third connection member 730 or the third connection member 730 and the fourth power supply line 722 of the heating power supply line 720 may be short-circuited without being connected.

In the case where such electrical connection failure occurs, a method of repairing the susceptor 500 according to an embodiment of the present invention will be described with reference to FIG.

8 is a perspective view of a jig according to an embodiment of the present invention.

9A to 9F and 10 are cross-sectional views illustrating a method of repairing a substrate holding apparatus according to an embodiment of the present invention.

In the present invention, a separate jig 900 is provided to repair the susceptor 500.

8, the jig 900 according to the embodiment includes:

The jig body 920 which is located on the upper side of the chuck 510 and fixes the chuck 510 when the susceptor 500 is fixed and the jig body 920 and the cover 515, And a cover 515, and an alignment member 924 for interlocking the jig body and the chuck body with each other for alignment between the jig body and the chuck body.

The jig body 920 is positioned above the chuck 510 disposed above the cover 515 when the susceptor 500 is supported and fixed to the jig 900 to repair the chuck 510, The chuck 510 of the susceptor 500 is supported and fixed on the cover 515. The jig body 920 is disposed above the chuck 510 when the susceptor 500 is fixed and at least a part of the shaft 610 is insertable in the lateral direction A main body 911 provided with a groove (hereinafter referred to as an insertion groove 923) so as to protrude outward from the outer surface of the main body 911, and a hole (not shown) (Hereinafter referred to as a jig hole 926).

The main body 911 has a smaller width than the jig body 920 and is positioned on the upper side of the opening provided in the jig body 920. The main body 911 is similar to the hollow shape with the center open, but has one side opened. The main body 911 according to the embodiment has a circular cross-sectional shape and is similar to a ring-shaped opening with a center, but has a shape with one side opened. In other words, in the shape of a ring having a circular cross section, a shape having an opening extended from an area of an outermost portion in an inward direction is formed, and the shaft 610 of the susceptor 500 is inserted into the opening. Hereinafter, the jig body 920 is provided in the inward direction from the outer side, and the opening into which the shaft 610 is inserted by opening the outer peripheral surface of the jig body 920 is referred to as an insertion groove 923. The insertion groove 923 is provided so as to have a larger width than the shaft 610 and is provided in the center of the jig body 920 in the side wall surface defining the wall around the insertion groove 923, And the wall surface of the adjacent region coincides with at least a part of the outer peripheral surface of the shaft 610. That is, since the shaft 610 according to the embodiment has a cylindrical shape and its outer circumferential surface has a curvature, the wall surface of the region adjacent to the center of the jig body 920 among the side wall surfaces defining the insertion groove 923, Is formed so as to be a curve having a curvature corresponding to the curvature of the substrate 610.

The main body 911 is provided with a hole (hereinafter, jig alignment hole 925) for insertion of the alignment member so as to allow alignment between the jig 900 and the chuck body 511. The jig alignment hole 925 extends from the insertion groove in the direction of the main body 911 so that one side of the jig alignment hole 925 is communicated with the insertion groove 923. The jig alignment holes 925 are provided on both sides with respect to the insertion groove 923, and a plurality of, for example, two jig alignment holes 925 are provided on both sides.

The fastening member 922 is formed so as to protrude outwardly from the outer surface of the main body 911. These fastening members 922 are spaced from each other along the extending direction of the outer surface of the main body 911 and each has a hole (hereinafter referred to as a jig hole 926) through which the jig fixing member 930 can pass do. The jig hole 926 is provided in a number corresponding to the first cover engagement hole 525a and the jig fixing member 930 of the cover and is formed on the upper side of the first cover engagement hole 515a, (515a).

The jig fixing member 930 is mounted so as to penetrate through the jig hole 926 provided in the fastening member 922 of the jig body 920 and the first cover fastening hole 515a provided in the cover 515, 500). The jig fixing members 930 according to the embodiment are provided in a plurality of, for example, three. A screw thread may be formed on the outer circumferential surface of the jig fixing member 930 and screw grooves may be formed on the inner circumferential surfaces of the first cover fastening hole 515a and the jig hole 836, respectively.

Hereinafter, with reference to Figs. 9 and 10, a method of repairing a chuck using the jig 900 according to the embodiment of the present invention will be described. A method of repairing the chuck 510 when an electrical short is generated in the chuck power supply line 820 for supplying power to the electrostatic film 512 and the heating power supply line 720 for supplying power to the heating element 514 Explain.

First, the chuck body 511 and the cover 515 are separated. 9A, the support 520 is cut by using a laser so that the second power line 822 and the first connection member 830 of the chuck power line 820, the first connection member 830, The fourth power source line 722 and the third connection member 730 of the second power source 720 are exposed to the outside. More specifically, by using a laser, the support 520 of a single body is cut so as to be divided into two in the vertical direction. At this time, since the cut support part 520 is cut in two in the vertical direction in a state of being connected to the chuck 510, one body is connected to the chuck 510 and the other is separated. The body of the supporting part 520 connected to the chuck 510 among the cut supporting parts 520 is referred to as a first body 521 and the body of the other supporting part 520 is referred to as a second body (522).

The support 520 is divided into the first body 521 and the second body 522 as shown in Figure 9B so that the second and fourth power lines 822 and 722 and the first and third connection members A maintenance operation for connecting the second power source line 822 and the first connection member 830 and connecting the fourth power source line 722 and the third connection member 830 when the first power source line 830 and the second power source line 730 are exposed, .

The chuck body 511 connected to the first body 521 of the support part 520 is seated on the protective member 10 provided separately. One side of the substrate S on which the substrate S is mounted, that is, a plurality of protrusions 513 So that the provided direction is directed toward the protective member 10. The protective member 10 protects the chuck body 511 and the protrusions 513 formed on the chuck body 511 at the time of maintenance and has a circular plate shape corresponding to the chuck body 511. At least one part of the chuck body 511 or a plurality of protrusions 513 is accommodated in one side surface of the protective member 10 and a receiving space in which the receiving space can be seated is provided. The protective member is provided with a hole (hereinafter referred to as a protective member hole) through which a separate fixing member (hereinafter referred to as a cover fixing member) is inserted for engagement with the cover. Here, the protection member hole 11 is provided at a position corresponding to the second cover engagement hole 515b provided in the cover 515. [

When the first body 521 and the chuck body 511 are seated on the protection member such that one surface of the chuck body 511, that is, a plurality of protrusions 513 faces the protection member 10 (Fig. 9C) 9d, the cover 515 is mounted so as to surround the side surface and the lower surface of the chuck body. The cover fixing member 12 is inserted and fixed from the upper side of the cover 515 so as to penetrate through the second cover engagement hole 515b and the protection member hole 11. A plurality of cover fixing members 12 are provided so as to correspond to the number of the second cover fixing holes 515b and the protection member holes 11 and each cover fixing member 12 is fixed to the second cover fixing hole 515b, And the protection member hole (11).

9E, the second body 522 is seated on the first body 521. At this time, the first body 521 and the second body 522 are fixed using the jig 900 according to the present invention. 522 are mutually aligned and fixed. The second body 522 is first placed on the first body 521 and the jig body 920 of the jig 900 is positioned on the second body 522. [ At this time, the jig body 920 or the second body 522 is moved so that the shaft 610 connected to the second body 522 passes through the insertion groove 923 of the jig body 920 of the jig 900 . Then, the position of the chuck body 511 is adjusted to align the position between the jig alignment holes provided in the jig body and the fixing block 530 provided in the second body 522 of the support portion. More specifically, the position of the chuck body 511 is adjusted so that the position between the jig alignment holes 925 of the jig body 920 and the chuck alignment holes 531 of the fixing block 530 of the second body 522 To align them.

9F, the jig is lowered, and the aligning member 954 is inserted and inserted so as to penetrate the jig alignment hole 925 and the chuck alignment hole 531 of the fixing block 530. Then,

9G, the jig fixing member 930 is inserted and inserted into the jig hole 926 of the jig body 920 and the chucking hole 511c provided in the chuck body 511, as shown in Fig. 9G. At this time, the jig fixing member 930 is rotated so that the threads provided on the outer circumferential surface of the jig fixing member 930 are fastened to the thread grooves provided in the jig hole 926 and the chuck fastening hole 511c, respectively. The first body 521 and the chuck body 511 of the cut support part 520 and the second body 522 of the support part 520 are aligned and fixed to each other.

The first body 521 and the second body 522 are joined to each other by welding, more specifically, a super beam welding method in a state where the first body 521 and the second body 522 thus cut are fixed.

6 and 7, when the projections 513 and the electrostatic film 512 are energized by the redistilled layer 513a melted from the protrusions 513 and deposited on the chuck body 511, And a method of repairing the electrical connection between the chuck power supply line 820 and the first connection member 830 and the electrical connection between the heating power supply line 720 and the third connection member 830 as shown in FIGS. It is explained separately.

However, the maintenance between the power supply lines 820 and 720 and the connecting members 830 and 720 may be continuously performed after the repair (Figs. 6 and 7) due to the conduction problem between the protrusion 513 and the electrostatic film 512 .

511: Chuck body 511c: Chuck tightening hole
512: electrostatic films 721, 722, 821, 822: power line
513: projection 513a: redeposited layer
514: Heating element 515: Cover
520: support part 900: jig
920: jig body 921: main body
922: fastening member 923: insertion groove
926: Jig hole 930: Jig fixing member
924: alignment member 925: alignment hole
10: protective member 11: protective member hole
12: Cover fixing member

Claims (13)

1. A method of repairing a susceptor comprising a plurality of projections each projecting upward and provided with spaced-apart projections, an electrostatic film disposed therein, and a chuck supporting the substrate on the plurality of projections by an electrostatic force,
A cleaning agent capable of removing the protrusions, and a cleaning member;
Placing the cleaning member on the protrusion and reacting the protrusion with the cleaning agent to melt the protrusion;
Removing the redeposited layer deposited on the chuck from the plurality of protrusions and the protrusions by moving the cleaning member above the protrusions;
Forming a plurality of protrusions on the chuck so as to be spaced apart from each other;
≪ / RTI > The method according to claim 1,
Before the process of forming a plurality of projections on the chuck,
And forming a protective layer on the chuck. The method according to claim 1 or 2,
Wherein the cleaning agent is a solution containing hydrofluoric acid (HF) and water (H ₂ O). The method of claim 3,
Wherein the cleaning agent is a mixture of hydrofluoric acid (HF) and water (H ₂ O) mixed in a ratio of 15: 1 to 25: 1. The method according to claim 1 or 2,
A method for repairing a susceptor, comprising the steps of: forming a plurality of protrusions on a top of the chuck by a method selected from the group consisting of a chemical vapor deposition method, a physical vapor deposition method, and a printing method. The method of claim 5,
In the process of forming a plurality of protrusions on the chuck so as to be spaced apart from each other,
Disposing a mask having a plurality of openings on the chuck;
Forming a plurality of protrusions on the chuck by passing a protrusion forming material over the mask;
≪ / RTI > The method of claim 2,
Wherein the protective layer is formed by any one of a chemical vapor deposition method, a physical vapor deposition method, and a coating method. The method of claim 7,
Wherein the protective layer is any one of an insulator and a dielectric. An upper body made of a material including ceramics and capable of supporting a substrate on one side thereof, an electrostatic film disposed on the inside thereof, supporting the substrate on one side by an electrostatic force by the electrostatic film; And
A plurality of protrusions protruding from one side of the upper body and spaced apart from each other;
A lower body installed on the other side of the upper body and made of a first metal;
A chuck body having a chuck body;
A cover installed to surround the side surface and the lower surface of the chuck body and configured to expose one side of the upper body;
A support member connected to the lower body and made of a second metal; And
A heating body installed between any one of the upper body and the lower body or between the upper body and the lower body;
A susceptor having a chuck having a chuck;
A chuck power supply line installed to penetrate the susceptor and connected to the electrostatic film at one end to apply power to the electrostatic film;
A heating power supply line connected to the heating element at one end to apply power to the heating element;
The method comprising the steps of:
A method for repairing a susceptor by electrical connection in accordance with conduction between the protrusions and the electrostatic film,
Melting the protrusions with a detergent capable of removing the protrusions to remove the redeposited layer deposited on the protrusions and the protrusions;
Forming a plurality of protrusions on the upper body so as to be spaced apart from each other;
/ RTI >
The method for repairing the susceptor according to the connection failure between the electrostatic film and the chuck power supply line or between the heating element and the heating power supply line,
Separating the support into a first body connected to the lower body of the chuck body and a second body separated from the first body by cutting the support to expose the chuck power line and the heating power line, ;
Electrically connecting the exposed chuck power supply line and the electrostatic film, and electrically connecting the heating power supply line and the heating element;
Placing the upper body and the first body on the protection member such that one side of the upper body faces the protection member;
Positioning the cover to surround the outer side surface and the other side of the chuck body, and fastening the cover and the protection member to each other;
Positioning the second body on the first body of the support;
Placing a jig above the second body, and fastening and fixing the jig, the cover, and the chuck body;
Joining the first body and the second body;
The method comprising the steps of: The method of claim 9,
Positioning the jig on the upper side of the second body and aligning the jig and the second body,
The positioning process
And inserting and mounting an alignment member through the alignment holes provided in the jig alignment holes provided in the jig and the fixing block mounted on the second body. The method of claim 10,
And a shaft which is connected to the supporter and supports the supporter and through which the chuck power supply line and the heating power supply line pass,
The second body of the cut support is connected to the shaft,
Wherein the jig includes an insertion groove provided in the center direction from the outer circumferential surface to allow the shaft to pass therethrough,
And positioning the jig above the second body,
And allowing the shaft to pass through the insertion groove of the jig, so that the jig is positioned on the upper side of the second body. The method of claim 9,
The process of fastening and fixing the jig, the cover and the chuck body,
And inserting and mounting a jig fixing member into a jig hole provided in the jig, a cover fastening hole provided in the cover, and a chuck fastening hole provided in the chuck body. The method according to any one of claims 9 to 11,
A method of repairing a susceptor for joining a first body and a second body by a laser welding method.

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