KR101403716B1 - Cleaning Composition and Process of Cleaning Panel Using the Same - Google Patents

Abstract

The present invention relates to a cleaning liquid composition for a flat panel display (FPD) substrate such as a liquid crystal display, a plasma display, a flexible display and the like, and a cleaning method using the same. More particularly, the present invention relates to a cleaning composition using a basic compound, The present invention relates to a cleaning liquid composition for a flat panel display substrate and a cleaning method using the same. More particularly, the present invention relates to a cleaning liquid composition for a flat panel display substrate, It can be effectively removed without damaging the wiring or the like.

Cleaning, FPD, liquid crystal display

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning composition,

The present invention relates to a cleaning liquid composition for a flat panel display (FPD) substrate such as a liquid crystal display, a plasma display, and a flexible display, and a cleaning method using the same.

An FPD represented by a liquid crystal display is manufactured by a process such as a film forming process, an exposure process, a wiring etching process and the like like a semiconductor device. By this process, various kinds of organic substances and inorganic substances, Very small particles are attached and contamination occurs. When the following process steps are carried out with such contaminants adhered, pinholes, pits, wirings and bridges of the film are generated, and the yield of the product is lowered.

Therefore, cleaning to remove contaminants is carried out between each process, and many proposals have been made for the cleaning liquid.

For example, Japanese Patent Application Laid-Open No. 2005-154558 proposes a cleaning liquid containing H ₃ PO ₄ , HF, ammonia, and / or an amine.

However, since the cleaning liquid is not only a cleaning liquid for a semiconductor device but also includes a glass substrate, which is the most typical FPD substrate, and HF which vigorously etches Al, which is the most typical wiring material, for cleaning the FPD substrate There is no problem.

On the other hand, Japanese Patent Application Laid-Open No. 2000-232063 proposes using phosphoric acid and ammonium phosphate as a corrosion inhibitor. However, since the application process is not only for removing the resist residue but also the pH of the composition used is in the acidic range, There is a problem that the ability to remove particles such as very small organic substances and inorganic substances having a size of 1 占 퐉 or less and the corrosion prevention performance of aluminum wiring are insufficient.

It is an object of the present invention to provide a cleaning liquid composition suitable for removing organic contaminants and particles on a glass substrate in a process of manufacturing an FPD substrate and a cleaning method using the cleaning liquid composition .

It is another object of the present invention to provide a cleaning liquid composition which does not corrode an aluminum or aluminum alloy wiring formed on an FPD substrate and a cleaning method using the same.

As a result of efforts made to achieve the above object, the inventors of the present invention have found that when an ammonium salt compound is added to a basic solution, an organic contaminant or particles on the glass substrate are excellent in removing ability and at the same time, Thereby completing the invention.

In order to accomplish the above object, one aspect of the present invention provides a cleaning liquid composition for a flat panel display substrate comprising a basic compound, an ammonium phosphate salt compound and water.

A second aspect of the present invention provides a cleaning method using the cleaning liquid composition.

INDUSTRIAL APPLICABILITY The cleaning liquid composition according to the present invention is excellent in the ability to remove organic contaminants and particles from the surface of a flat panel display substrate, in particular, the surface of a glass substrate before forming an alignment film of a liquid crystal display element, It is excellent in prevention effect and contains a large amount of deionized water, so it is easy to handle and environmentally friendly.

Hereinafter, the present invention will be described more specifically.

One aspect of the present invention relates to a cleaning liquid composition for a flat panel display substrate comprising a basic compound, an ammonium phosphate salt compound and water.

The cleaning liquid composition for a flat panel display substrate preferably further comprises a quantum alkylene glycol monoalkyl ether compound or a surfactant.

Hereinafter, the cleaning liquid composition for a flat panel display substrate of the present invention will be described in detail.

Basic compound

In the cleaning liquid composition of the present invention, preferred examples of the basic compound include inorganic bases such as ammonium hydroxide, sodium hydroxide, and potassium hydroxide, and examples of the organic base include methylamine, ethylamine, isopropylamine, Primary amine; Secondary amines such as diethylamine, diisopropylamine and dibutylamine; Tertiary amines such as trimethylamine, triethylamine, triisopropyramine and tributylamine; (Ethylamino) ethanol, 2- (methylamino) ethanol, N-methyldiethanolamine, dimethylaminoethanol, N-methyldiethanolamine, Alkanolamines such as diethylaminoethanol, nitrilotriethanol, 2- (2-aminoethoxy) ethanol, 1-amino-2-propanol, triethanolamine, monopropanolamine and dibutanolamine, Or a mixture of two or more of them may be used.

Among these, ammonium hydroxide, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, monoethanolamine or a mixture thereof is preferably used.

The amount of the basic compound to be used is preferably 0.05 to 5% by weight, more preferably 0.1 to 1% by weight based on the total composition.

      If the concentration of the basic compound of the present invention is lower than 0.05% by weight, a sufficient cleaning effect can not be achieved. If the concentration exceeds 5% by weight, the pH increases and corrosion to aluminum or aluminum alloy wiring increases, The yield of the substrate is lowered.

Ammonium phosphate salt  compound

In the cleaning liquid composition of the present invention, the ammonium phosphate salt compound means a salt compound of phosphate ion or poly phosphate ion and ammonium ion. The phosphoric acid component in the salt compound has an excellent effect on corrosion prevention against aluminum or an aluminum alloy, and the ammonium component has an excellent effect on the removal of organic contaminants and particles on the glass substrate together with the hydroxy group of the basic compound.

Specific examples of the ammonium phosphate salt compound in the cleaning liquid composition include ammonium monohydrogenphosphate, ammonium dihydrogenphosphate, ammonium triphosphate, ammonium diphosphate, ammonium orthophosphate, ammonium dihydrogenphosphate, ammonium dihydrogen orthophosphate, ammonium hypophosphite , Ammonium polyphosphate represented by W _{n + 2} P _n O _{3n +1} (W = NH ₄ , n is an integer of 2 or more and 20 or less), and a mixture thereof, selected from the group consisting of ammonium polyphosphate, ammonium orthophosphate, It is most preferred to use ammonium monohydrogen phosphate, among them.

The content of the ammonium salt compound of the present invention in the cleaning liquid composition is preferably 0.01 to 20% by weight, more preferably 0.1 to 2% by weight.

If the content of the ammonium phosphate compound of the present invention is less than 0.01% by weight, the corrosion inhibiting ability against the metal of the cleaning composition is deteriorated. If the content exceeds 20% by weight, the corrosion inhibiting effect is not increased proportionally, May remain on the surface.

water

The cleaning liquid composition of the present invention preferably comprises an amount of water together with the above components to provide an aqueous cleaning composition, and the water is preferably deionized water.

The content of the water is preferably 65 to 99.7% by weight, more preferably 80 to 99% by weight. If water is used at less than 65 wt%, the cost of the composition increases, which is inefficient in terms of cost and performance, and disadvantageous in terms of environmental stability.

Quantum property Alkylene glycol Monoalkyl ether  compound

The cleaning fluid composition of the present invention may further comprise a quantum alkylene glycol monoalkyl ether compound. The quantum alkylene glycol monoalkyl ether compound serves as a solvent for dissolving organic contaminants. In addition to the function as a solvent, the compound also lowers the surface tension of the cleaning liquid to increase the wettability to the glass substrate, thereby improving the cleaning power.

Examples of the quantum alkylene glycol monoalkyl ether compound include ethylene glycol monobutyl ether (BG), diethylene glycol monomethyl ether (MDG), diethylene glycol monoethyl ether (carbitol), diethylene glycol monobutyl ether (BDG) , Dipropylene glycol monomethyl ether (DPM), dipropylene glycol monoethyl ether (MFDG), triethylene glycol monobutyl ether (BTG), triethylene glycol monoethyl ether (MTG), propylene glycol monomethyl ether And a mixture thereof. It is preferable to use at least one compound selected from the group consisting of these compounds.

The content of the quantum alkylene glycol monoalkyl ether of the present invention in the cleaning liquid composition is preferably 0.05 to 20% by weight, more preferably 0.5 to 10% by weight.

If the content of the protonic alkylene glycol monoalkyl ether of the present invention is less than 0.05 wt%, the increase in solubility of the cleaning liquid composition due to the addition of the quantitative alkylene glycol monoalkyl ether to organic contaminants can not be expected, When used in excess, no further effect on wettability can be expected.

Surfactants

The cleaning liquid composition of the present invention may further comprise a surfactant. The cleaning composition of the present invention, which further comprises the above-described surfactant, increases the wettability to the substrate, thereby achieving uniform cleaning. In the cleaning process of the substrate having the metal pattern and the oxide film, corrosion of the metal and over- .

As the surfactant, a negative, positive, or nonionic surfactant may be used. Among them, nonionic surfactants having excellent wettability and less bubble formation are preferably used.

The nonionic surfactant is generally selected from the group consisting of polyoxyethylene alkyl ether type, polyoxyethylene alkyl phenyl ether type, polyoxyethylene polyoxypropylene alkyl ether type, polyoxyethylene polyoxybutylene alkyl ether type, polyoxyethylene alkylamino Ether type, polyoxyethylene alkylamide ether type, polyethylene glycol fatty acid ester type, sorbitan fatty acid ester type, glycerin fatty acid ester type, alkyrol amide type and glycerine ester type. Among these, polyoxyethylene polyoxybutylene alkyl (meth) acrylates having oxyethylene groups (EO groups) as hydrophilic groups and oxypropylene groups (PO groups) and oxybutylene groups Ether type copolymer.

Wherein the EO group is represented by -CH ₂ -CH ₂ -O-, the oxypropylene group is -CH (CH ₃ ) -CH ₂ -O- or -CH ₂ -CH (CH ₃ ) -O-, _{CH 2 -CH 2 -CH 2 -CH 2} -O-, -CH (CH 3) -CH 2 -CH 2 -O-, -CH 2 -CH (CH 3) -CH 2 -O-, or -CH ₂ is represented by _{-CH 2 -CH (CH 3) -O-} .

The copolymerized portion of the EO group, the PO group and the BO group may be a block copolymer, a random copolymer, or a block copolymer.

The copolymer molecule may be a copolymer of EO group and PO group, a copolymer of EO group and BO group, or a copolymer of EO group and PO group or BO group.

When the total number of moles of the EO group is X and the total number of moles of the PO group or BO group is Y, the ratio of the EO group of the hydrophilic group and the PO group or BO group of the hydrophobic group in the surfactant molecule is X / (X + Y) is in the range of 0.05 to 0.7.

In addition, the terminal of the surfactant may be either hydrogen or hydroxyl group, may be an alkyl or alkenyl group, or may have a structure in which ethylenediamine or glycerin is added.

Specific examples of the nonionic surfactant include polyoxyethylene polyoxypropylene condensates, polyoxyethylene polyoxybutylene condensates, polyoxyethylene polyoxypropylene decaneyl ether condensates, polyoxyethylene polyoxypropylene decaneyl ether Condensates, polyoxyethylene polyoxypropylene undecanyl ether condensates, polyoxyethylene polyoxypropylene dodecanyl ether condensates, polyoxyethylene polyoxypropylene tetradecanyl ether condensates, polyoxyethylene polyoxybutylene decanyl ether Condensate, polyoxyethylene polyoxybutylene undecanyl ether condensate, polyoxyethylene polyoxybutylene dodecanyl ether condensate, polyoxyethylene polyoxybutylene tetradecanyl ether condensate, polyoxyethylene polyoxypropylene 2 - ethylhexyl ether, polyoxyethylene polyoxypropyl Polyoxyethylene polyoxypropylene stearyl ether, glycerin addition type polyoxyethylene polyoxypropylene condensate, ethylene diamine addition type polyoxyethylene polyoxypropylene condensate, polyoxyethylene polyoxybutylene 2-ethylhexyl ether , Polyoxyethylene polyoxybutylene lauryl ether, polyoxyethylene polyoxybutylene stearyl ether, glycerin addition type polyoxyethylene polyoxybutylene condensate, and ethylene diamine addition type polyoxyethylene polyoxybutylene condensate, .

Preferred are polyoxyethylene polyoxypropylene condensates, polyoxyethylene polyoxybutylene condensates, glycerin addition type polyoxyethylene polyoxypropylene condensates and ethylene diamine addition type polyoxyethylene polyoxypropylene condensates, and most preferably poly Oxyethylene polyoxypropylene condensate or ethylene diamine addition type polyoxyethylene polyoxypropylene condensate.

The nonionic surfactant may be contained in the cleaning liquid alone or may be contained in the cleaning liquid.

The content of the surfactant in the cleaning liquid composition of the substrate for a liquid crystal display element is preferably 0.001 to 1.0 wt%, more preferably 0.01 to 0.5 wt%. If the content of the surfactant is less than 0.001 wt%, the effect of increasing the cleaning uniformity of the glass substrate is insignificant. If the content of the surfactant exceeds 1 wt%, the cleaning uniformity is constant but does not increase more but converges within a certain range.

The pH of the cleaning liquid composition using the basic compound of the present invention is preferably in the range of 7 to 13, more preferably 8 to 11. [

A second aspect of the present invention relates to a method of cleaning a flat panel display substrate using the cleaning composition.

When cleaning the flat panel display substrate using the cleaning liquid composition, the temperature of the cleaning liquid composition capable of exhibiting the most excellent cleaning effect is 20 to 80 캜, preferably 20 to 50 캜. The cleaning time is preferably 30 seconds to 10 minutes.

The cleaning method is not particularly limited, but may be performed by a spray method, a spin method, a dipping method, or a dipping method using ultrasonic waves.

Hereinafter, the present invention will be described in more detail with reference to specific examples. The following examples are intended to further illustrate the present invention, and the scope of the present invention is not limited by the following examples. The following examples illustrate preferred compositions of the present invention as well as preferred cleaning methods for using the compositions of the present invention.

The cleaning solution composition used in the following examples is a cleaning solution prepared by adding an ammonium phosphate salt to a basic aqueous solution and, if necessary, further adding a protonic alkylene glycol monoalkyl ether or a water-soluble surfactant.

In the cleaning method using the cleaning solution of the present invention, a method of spraying a cleaning solution onto the surface of the contaminated substrate or dipping the substrate in a bath containing a cleaning solution was used. That is, a spray method, a spin method, a dipping method, or a dipping method using ultrasonic waves can be used.

      It is possible to effectively remove organic contaminants and particles on the substrate through the wet process, and it is advantageous to lengthen the time of the wet process when the removal efficiency is expected. However, considering the productivity, the wet process time is about 30 seconds to 10 minutes desirable.

Example  One

0.2% by weight of tetramethylammonium hydroxide, 0.4% by weight of ammonium monohydrogenphosphate and a balance of water were mixed and stirred as a cleaning liquid.

      First, a glass substrate on which aluminum was formed to a thickness of 2000 占 was dipped in the cleaning liquid for 30 minutes. At this time, the temperature of the cleaning liquid is 40 DEG C and the thickness of the aluminum film is measured before and after dipping, and the dissolution rate of the aluminum film is measured from the change in thickness of the aluminum film.

Example  2 to 15 and Comparative Example  1-3

A cleaning liquid composition containing a cleaning component and a residual amount of water as the composition shown in the following Table 1 was prepared and the corrosion prevention effect was evaluated in the same manner as in Example 1. [

[Table 1]

Basic compound phosphate Al etching rate
(Å / min)
Kinds ingredient
(weight%) Kinds ingredient
(weight%) Example 1 TMAH 0.2 *One) 0.2 0.9 Example 2 TMAH 0.2 *2) 0.2 1.3 Example 3 TMAH 0.2 * 3) 0.2 1.4 Example 4 TMAH 1.0 *One) 1.0 0.7 Example 5 TMAH 1.0 *2) 1.0 1.0 Example 6 NH ₄ OH 0.2 *One) 0.2 1.5 Example 7 NH ₄ OH 0.2 *2) 0.2 1.8 Example 8 NH ₄ OH 0.2 * 3) 0.2 2.2 Example 9 NH ₄ OH 1.0 *One) 1.0 1.2 Example 10 NH ₄ OH 1.0 *2) 1.0 1.5 Example 11 MEA 0.2 *One) 0.2 1.1 Example 12 MEA 0.2 *2) 0.2 1.4 Example 13 MEA 0.2 * 3) 0.2 1.4 Example 14 MEA 1.0 *One) 1.0 2.0 Example 15 MEA 1.0 *2) 1.0 2.2 Comparative Example 1 TMAH 1.0 - - 62 Comparative Example 2 NH ₄ OH 1.0 - - 70 Comparative Example 3 MEA 1.0 - - 66

Note) TMAH: tetramethylammonium hydroxide

NH ₄ OH: ammonium hydroxide

    MEA: Monoethanolamine

    * 1): Ammonium hydrogen phosphate

    * 2): Ammonium dihydrogen phosphate

    * 3): Ammonium phosphate

As can be seen from the results of Table 1, in Examples 1 to 15, the addition of the phosphate had an anti-corrosion effect on aluminum. However, in the case of Comparative Examples 1 to 3, phosphate was not added and corrosion of aluminum was observed.

Example  16

1% by weight of tetramethylammonium hydroxide, 1.0% by weight of ammonium monohydrogenphosphate, 0.5% by weight of diethylene glycol monomethyl ether and the balance of water were mixed and stirred.

1) Evaluation of removing organic contaminants -1

To evaluate the removability of organic contaminants, a 5 cm x 5 cm glass substrate was stained with a human fingerprint or an organic component pen, and the contaminated substrate was cleaned with a spray-type glass substrate cleaning apparatus at 40 ° C for 2 minutes, . After washing, it was washed with ultrapure water for 30 seconds and then dried with nitrogen.

In Table 2, the presence or absence of organic contaminants was indicated by o when it was removed, and by x when it was not removed. The results of removing the organic contaminants according to Example 16 are shown in FIGS. 1 and 2. FIG.

2) Evaluation of removal efficiency of organic contaminants -2

The glass substrate was allowed to stand in the air for 24 hours and contaminated with various organic substances, minerals and particles in the air, and then cleaned with the aqueous solution at 40 ° C for 2 minutes using a spray-type glass substrate cleaner. After cleaning, Washed and then dried with nitrogen. 0.5 占 퐇 of ultrapure water droplets were dropped on the glass substrate to measure the contact angle after cleaning.

Example  17 to 23

The cleaning liquid composition (the balance being water) was prepared as shown in the following Table 2, and the organic contaminant removing ability was evaluated in the same manner as in Example 16. [

[Table 2]

Basic compound phosphate * GE Surfactants abandonment
Fingerprint
abandonment
Marker pen
Contact angle
Kinds ingredient
(weight%) Kinds ingredient
(weight%) Kinds ingredient
(weight%) Kinds ingredient
(weight%) Example
4 TMAH 1.0 *One) 1.0 - - - - ○ ○ 35 Example
9 NA ₄ OH 1.0 *One) 1.0 - - - - ○ ○ 38 Example
14 MEA 1.0 *One) 1.0 - - - - ○ ○ 33 Example
16 TMAH 1.0 *One) 1.0 *4) 0.5 - - ○ ○ 35 Example
17 TMAH 1.0 *One) 1.0 * 5) 0.5 - - ○ ○ 29 Example
18 TMAH 1.0 *One) 1.0 * 6) 0.5 - - ○ ○ 32 Example
19 TMAH 0.2 *One) 0.2 *4) 1.0 - - ○ ○ 30 Example
20 NA ₄ OH 0.2 *One) 0.2 *4) 1.0 - - ○ ○ 34 Example
21 MEA 0.2 *One) 0.2 *4) 1.0 - - ○ ○ 29 Example
22 TMAH 0.2 *One) 0.2 - - * 7) 0.02 ○ ○ 34 Example
23 MEA 0.2 *One) 0.2 - - *8) 0.1 ○ ○ 27

* GE: quantum alkylene glycol monoalkyl ether

* 4): diethylene glycol monomethyl ether

* 5): diethylene glycol monobutyl ether

* 6): triethylene glycol monoethyl ether

* 7): Polyoxyethylene / polyoxypropylene glycol

* 8): Polyoxyethylene / polyoxypropylene ethylenediamine condensate

As can be seen from the results in Table 2, all of the organic pollutants were removed in Examples 4, 9, 14 and 16, and the contact angle was 20 ° to 40 ° Which indicates the ability to remove organic contaminants.

Each of the cleaning liquid compositions prepared in Examples 4, 9, 14, 19, and 22 was cleaned with a glass substrate contaminated with an organic particle solution. That is, the glass substrate was contaminated with an organic particle solution having an average particle size of 0.8 탆, spin-dried at 3000 rpm for 1 minute, washed with each cleaning liquid at 40 캜 for 2 minutes using a spray-type glass substrate cleaning apparatus Respectively. After washing, it was washed with ultrapure water for 30 seconds and then dried with nitrogen.

The number of particles before and after cleaning was measured with a surface particle analyzer (Topcon WM-1500).

[Table 3]

Basic compound phosphate * GE Surfactants Number of particles before cleaning Number of particles after cleaning Removal rate
(%) Kinds ingredient
(weight%) Kinds ingredient
(weight%) Kinds ingredient
(weight%) Kinds ingredient
(weight%) Example
4 TMAH 1.0 *One) 1.0 - - - - 2751 325 88 Example
9 NA ₄ OH 1.0 *One) 1.0 - - - - 2866 356 87 Example
14 MEA 1.0 *One) 1.0 - - - - 2805 297 89 Example
19 TMAH 0.2 *One) 0.2 *4) 1.0 - - 2813 270 90 Example
22 TMAH 0.2 *One) 0.2 - - * 7) 0.02 3087 242 92

As shown in Table 3 above, when the cleaning solution composition of the present invention was used for cleaning, the particle removal power was close to 90%.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a photograph showing the result of removal of an organic sine pen from organic contaminants using a cleaning liquid composition according to an embodiment of the present invention. FIG.

FIG. 2 is a photograph showing the result of removal of human fingerprint components from organic contaminants using a cleaning liquid composition according to an embodiment of the present invention. FIG.

Claims (16)

A cleaning liquid composition for a flat panel display substrate, comprising a basic compound, an aluminum corrosion inhibitor, and an aluminum phosphate salt and a water-containing aluminum corrosion inhibitor, wherein the ammonium phosphate salt compound is selected from the group consisting of ammonium monohydrogenphosphate, ammonium dihydrogenphosphate and ammonium triphosphate , Wherein the cleaning liquid composition for flat panel display substrates is at least one selected from the group consisting of: The flat panel display according to claim 1, wherein the content of the basic compound is 0.05 to 5 wt%, the content of the ammonium phosphate salt compound is 0.01 to 20 wt%, and the content of the water is 65 to 99.7 wt% Cleaning composition. The cleaning liquid composition for a flat panel display substrate according to claim 1, further comprising a quantum alkylene glycol monoalkyl ether compound. The cleaning liquid composition for a flat panel display substrate according to any one of claims 1 to 3, further comprising a surfactant. The flat panel display of claim 1, wherein the basic compound is selected from the group consisting of ammonium hydroxide, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, monoethanolamine, and mixtures thereof. Cleaning liquid composition. delete The method of claim 3, wherein the quantum alkylene glycol monoalkyl ether compound is selected from the group consisting of ethylene glycol monobutyl ether (BG), diethylene glycol monomethyl ether (MDG), diethylene glycol monoethyl ether (carbitol), diethylene glycol monobutyl (BDG), dipropylene glycol monomethyl ether (DPM), dipropylene glycol monoethyl ether (MFDG), triethylene glycol monobutyl ether (BTG), triethylene glycol monoethyl ether (MTG), propylene glycol monomethyl ether (MFG), and mixtures thereof. ≪ Desc / Clms Page number 13 > 4. The cleaning liquid composition for a flat panel display board according to claim 3, wherein the amount of the quantum alkylene glycol monoalkyl ether compound is 0.05 to 20% by weight. The cleaning liquid composition for a flat panel display substrate according to claim 4, wherein the surfactant is a nonionic surfactant. The nonionic surfactant according to claim 9, wherein the nonionic surfactant is a polyoxyethylene polyoxypropylene condensate, a polyoxyethylene polyoxybutylene condensate, a glycerin addition type polyoxyethylene polyoxypropylene condensate, and an ethylene diamine addition type polyoxyethylene polyoxypropylene A condensate, and a mixture thereof. The cleaning liquid composition for a flat panel display substrate according to claim 1, The cleaning liquid composition for a flat panel display substrate according to claim 4, wherein the content of the surfactant is 0.001 to 1.0% by weight. The cleaning liquid composition for a flat panel display substrate according to claim 1, wherein the pH of the cleaning liquid composition is from 7 to 13. A cleaning method for a flat panel display substrate using the cleaning liquid composition according to claim 1. 14. The cleaning method of a flat panel display substrate according to claim 13, wherein the cleaning liquid composition is cleaned by keeping it at a temperature of 20 to 80 캜. 14. A method of cleaning a flat panel display substrate according to claim 13, wherein the cleaning time using the cleaning composition is from 30 seconds to 10 minutes. [14] The method of claim 13, wherein the cleaning method is performed by a spray method, a spin method, a dipping method, or a dipping method using ultrasonic waves.

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