KR101403516B1 - Photoresist stripper composition for preparing color filter on array of LCD - Google Patents

Abstract

The present invention relates to a photoresist stripper composition for a color filter on array (COA) manufacturing process of a liquid crystal display, and more particularly, to a photoresist stripper composition for a color filter on array (COA) Of water, and a residual amount of a water-soluble organic solvent, the color filter on array structure of the liquid crystal display device is excellent in the prevention of swelling of the color filter, the prevention of metal corrosion and the removal of the photoresist film, To a photoresist stripper composition.

Stripper, color filter on array, liquid crystal display, swelling

Description

[0001] The present invention relates to a photoresist stripper composition for preparing a color filter on array of a liquid crystal display device,

More particularly, the present invention relates to a photoresist stripper composition for a liquid crystal display, and more particularly, to a photoresist stripper composition for a liquid crystal display, which is free from swelling of a color filter and has excellent metal corrosion prevention and photoresist removal effect, The present invention relates to a photoresist stripper composition used in the production of the photoresist stripper composition.

A liquid crystal display device is one of the most widely used flat panel display devices and is composed of two display panels on which electrodes are formed and a liquid crystal layer sandwiched therebetween and applies voltage to the electrodes to rearrange the liquid crystal molecules of the liquid crystal layer Thereby controlling the amount of transmitted light.

Among the liquid crystal display devices, a structure which is mainly used at present is a structure in which electric field generating electrodes are provided on two display panels. Among them, a structure in which a plurality of thin film transistors and pixel electrodes are arranged in the form of a matrix on one display panel and color filters of red, green, and blue are formed on the other display panel, to be.

However, since the pixel electrode and the color filter are formed on different display panels, it is difficult to precisely align the pixel electrode and the color filter, so that the alignment error may occur.

In order to solve this problem, a color filter on array (COA) structure in which a color filter is formed on a thin film transistor array by forming a color filter and a pixel electrode on the same display panel has recently been proposed. At this time, in the color filter-on-array structure, the color filter may be a photolithography process using a photoresist containing a color pigment, and a remover may be used for thin film patterning.

That is, in the case of the color filter-on-array structure, a thin film such as a pixel electrode is formed after the color filter is formed, and the color filter is exposed to the stripper used for patterning the thin film. However, when a conventional stripping agent having a general organic stripping agent composition is used, the color filter is damaged when the color filter is removed from the sensory film, resulting in non-uniformity of the surface of the color filter, resulting in poor adhesion with other thin films stacked on the top have. In addition, the thin film deposited on the upper side may cause an increase or a crack. In this case, the thickness of the portion where the liquid crystal is filled varies depending on the position, and there is a portion where the liquid crystal is not uniformly filled. This situation can be reduced by being able to be recognized.

SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a color filter-on-array structure of a liquid crystal display device capable of preventing defective display due to swelling of a color filter, minimizing damage to a lower film, Which is excellent in peeling performance of a color filter on-array structure of a liquid crystal display device.

It is still another object of the present invention to provide a method of manufacturing a liquid crystal display device having a color filter on array structure of a liquid crystal display device using the exfoliant composition.

In order to accomplish the above object, the present invention provides a color filter array of a liquid crystal display, comprising 1 to 40% by weight of a water-soluble organic amine compound, 3 to 40% by weight of water, on array of photoresist stripper compositions.

The exfoliant composition of the present invention may further contain 0.1 to 10 parts by weight of a corrosion inhibitor based on 100 parts by weight of the composition.

In particular, the composition may be applied to a liquid crystal display device of a color filter on array structure including a transparent insulating substrate, a gate electrode, a gate insulating film, a semiconductor layer, a source and a drain electrode, a color filter, The photoresist of the photosensitive pattern used for patterning the insulating film or the pixel electrode is peeled off in the manufacturing process.

The present invention provides a liquid crystal display device of a color filter on array structure including a color filter and a pixel electrode on one substrate, comprising the steps of forming an insulating protective film on a color filter, and forming a pixel electrode on the insulating protective film Wherein at least one of the steps of forming the insulating protective film and the step of forming the pixel electrode includes the steps of forming a photoresist film by coating a photoresist on the color filter or the insulating protective film to expose the photoresist film, Forming a pattern on the substrate; etching the substrate using the photosensitive pattern; and peeling the photosensitive pattern with the releasing agent.

Preferably, the method of the present invention

Forming a gate electrode on the transparent insulating substrate,

Forming a gate insulating film on the gate electrode,

Forming a semiconductor on the gate insulating film,

Forming a source electrode and a drain electrode on the semiconductor,

Forming a color filter on the source electrode and the drain electrode,

Forming an insulating protective film on the color filter, and

Forming a color filter on array structure of a liquid crystal display device including a pixel electrode on the insulating protective film,

At least one of the steps of forming the insulating protective film and forming the pixel electrode includes forming a photosensitive film by coating a photoresist on the color filter or the insulating protective film, exposing the photosensitive film to form a plurality of photosensitive patterns, Etching using a photosensitive pattern, and peeling the photosensitive pattern with the releasing agent.

Hereinafter, the present invention will be described in detail.

The present invention relates to a water-based stripper composition which can be used in the production of a color filter-on-array structure of a liquid crystal display device.

Such a releasing agent composition of the present invention may be a three-component composition comprising a water-soluble organic amine compound, a water-soluble organic solvent and water. Further, the present invention may further include a corrosion inhibitor in the composition. Accordingly, the present invention can provide a three-component release agent composition comprising a water-soluble organic amine compound, a water-soluble organic solvent and water, or a four-component release agent composition comprising a water-soluble organic amine compound, a water-soluble organic solvent, water and a corrosion inhibitor.

In particular, the exfoliant composition of the present invention comprises a color filter on array structure including a transparent insulating substrate, a gate electrode, a gate insulating film, a semiconductor layer, a source and a drain electrode, a color filter, And is used for peeling the photoresist of the photosensitive pattern used for patterning the insulating film or the pixel electrode in the manufacturing process of the device. That is, the photoresist is used for patterning the gate, the semiconductor layer, the source and drain electrodes, the insulating layer, and the pixel electrode, and a stripper is used to remove the photoresist. In the above process, the COA process is a process of forming a color filter on the source and drain electrodes. A color filter is formed between layers, and a photosensitizer is used for patterning the insulating layer and the pixel electrode. In the present invention, the three-component or four-component removers are used only for the step of removing the photosensitizer, Can be removed.

Hereinafter, each component used in the release agent composition of the present invention will be specifically described.

In the exfoliant composition of the present invention, the water-soluble organic amine compound is a main component that performs the function of peeling the photosensitive film. Examples of the water soluble organic amine compound include monoethanolamine, diethanolamine, triethanolamine, 2- (2-aminoethoxy) ethanol, 2- (2-aminoethylamino) ethanol, N, , N-diethylethanolamine, N-methylethanolamine, N-ethylethanolamine, N-butylethanolamine, N-methyldiethanolamine, monoisopropanolamine, diisopropanolamine, triisopropanolamine, tetramethylhexylamine , Tetraethylhydroxyamine, tetrabutylhydroxyamine, and tetrabutylhydroxyamine, may be used.

The content of the water-soluble organic amine compound is used in an amount of 1 to 40% by weight, more preferably 5 to 20% by weight, based on the total amount of the release agent composition. If the content of the water-soluble organic amine compound is less than 1% by weight, the peeling performance of the photosensitive film may deteriorate and the fine particles of the photosensitive film to be peeled may remain in the entire film. If the content exceeds 40% by weight, Becomes smaller and the contact angle becomes larger, and corrosion can be increased.

The water is preferably pure water filtered through an ion exchange resin, and it is more preferable to use ultrapure water having a specific resistance of 18 megaohms or more. The water content may be included in an amount of 3 to 40% by weight based on the total amount of the whole composition. If the content of water is less than 3% by weight, damage may be caused to the insulating film and the color filter. If the content is more than 40% by weight, there is a problem of deterioration of the sensory film peeling performance.

The water-soluble organic solvent is a component that simultaneously performs the function of dissolving solvent and the function of controlling the surface tension of the photosensitive film. As a result, the peeling performance of the releasing agent can be continuously exhibited during the peeling step and is advantageous in terms of storage stability.

The water-soluble organic solvent includes glycol ether compounds, sulfoxides, sulfones, sulfolanes, amides, lactams, and imidazolidinedones, which may be used alone or in combination. The glycol ether compound may be selected from the group consisting of ethylene glycol ethyl ether, ethylene glycol butyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, diethylene glycol propyl ether, diethylene glycol butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether , Triethylene glycol butyl ether, triethylene glycol, and tetraethylene glycol. The sulfoxide may be dimethylsulfoxide or the like, and the sulfone may be at least one selected from the group consisting of dimethyl sulfone, diethyl sulfone, bis (2-hydroxyethyl) sulfone, and tetramethylene sulfone. The sulfolane is preferably sulfolane, and the amide may be N, N-dimethylformamide, N-methylformamide, N, N-dimethylacetoamide, N-methylacetoamide, May be used. The lactams include N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N-propyl-2-pyrrolidone, N-hydroxymethyl- Imidazolidinone, 1,3-diethyl-2-imidazolidinone, 1,3-diisopropyl-2 - imidazolidinone may be used. For example, when two kinds of organic solvents are used in combination, the mixing weight ratio may be 5:95 to 95: 5, but is not limited thereto.

The water-soluble organic solvent may be contained in a residual amount relative to the total amount of the exfoliant composition, preferably 10 to 96 wt%, and more preferably 10 to 70 wt%. If the content of the water-soluble organic solvent is less than 10% by weight, the content of the amine compound and water may be increased to damage the color filter and the similar insulating film, and the solubility of the polymer gelled by the amine compound may deteriorate, Can be lowered. When the content of the water-soluble organic solvent is more than 96% by weight, the water-soluble organic amine and the water content may be relatively decreased and the peeling performance of the photoresist film may be deteriorated.

The corrosion inhibitor may be included in the exfoliant composition to minimize metal corrosion of aluminum and molybdenum of the lower film. Examples of the corrosion inhibitor include triazole-based compounds, sugar compounds, organic acid compounds, and aromatic hydroxy compounds, which may be used alone or in combination. As the triazole compound, at least one selected from the group consisting of benzotriazole, tolyl triazole, carboxylic benzotriazole, 1-hydroxybenzotriazole and nitrobenzotriazole can be used. The organic acid compound may be at least one selected from the group consisting of ascorbic acid, citric acid, gallic acid, maleic acid, salicylic acid, and lactic acid. Examples of the aromatic hydroxy compounds include 8-quinolinol, 8-quinolinol N-oxide, 2-quinolinol, 3-quinolinol, 1,2,3,4-tetrahydro- Quinolinol, etc., esters such as methyl gallate, hydroquinone, catechol, pyrogallol, and the like, and at least one selected from the above can be used. As the saccharide compound, sorbitol and the like can be used.

The content of the corrosion inhibitor is preferably 0.1 to 10 parts by weight, more preferably 0.5 to 5 parts by weight, based on 100 parts by weight of the composition including the amine, the solvent and water. If the amount of the corrosion inhibitor is less than 0.1 parts by weight, corrosion of the underlying metal film is increased. When the amount of the corrosion inhibitor is more than 10 parts by weight, it is uneconomical from an industrial point of view considering the production cost of the composition.

On the other hand, the present invention can form a COA structure of a liquid crystal display device by a usual method using the above releasing agent composition.

That is, a preferred example of the COA forming method of the liquid crystal display of the present invention includes forming a gate electrode on a transparent insulating substrate, forming a gate insulating film on the gate electrode, forming a semiconductor on the gate insulating film, Forming a source electrode and a drain electrode on the semiconductor; forming a color filter on the source electrode and the drain electrode; forming an insulating protective film on the color filter; and forming a pixel electrode on the insulating protective film. Wherein at least one of the step of forming the insulating film and the step of forming the pixel electrode comprises the steps of applying a photoresist film, exposing the photoresist film to form a plurality of photoresist patterns, etching the photoresist pattern using the photoresist pattern, By peeling the photosensitive pattern with the release agent according to the present invention, corrosion of the color filter without swelling There is a characteristic that a color filter-on-array structure excellent in the prevention effect and excellent in the photoresist removing ability can be formed.

Here, the structure of the liquid crystal display device and the manufacturing method of each step are obvious to those skilled in the art, except for using the releasing agent composition of the present invention in the formation of the photosensitive pattern, so a detailed description thereof will be omitted.

The liquid crystal display manufactured by the above method includes a first substrate and a second substrate, wherein the first substrate includes a first transparent insulating substrate, a black matrix (BM), a thin film transistor, an insulating film, a color filter, and a pixel electrode And the second substrate includes a second transparent insulating substrate and a common electrode. By using the stripping agent of the present invention, an alignment error between the pixel electrode and the color filter can be reduced. Preferably, the COA structure using the stripping agent of the present invention comprises a transparent insulating substrate 10, a gate electrode 20, a gate film 30 made of silicon nitride or the like, hydrogenated amorphous silicon or polycrystalline silicon A source electrode 65 and a drain electrode 66 and 67, a color filter 70, an insulating protective film 72, and a pixel electrode 82. The semiconductor layer 40 includes a source electrode 65 and a drain electrode 66, At this time, the semiconductor layer and the source and drain electrodes may further include an ohmic contact layer 54 or 56 made of a material such as silicide or an n + hydrogenated amorphous silicon doped with an n-type impurity at a high concentration .

In addition, the opposite surface of the insulating substrate of the COA structure includes a transparent insulating substrate having a common electrode, and a spacer and a liquid crystal layer are provided between both transparent substrates to form a liquid crystal display device by a conventional method.

Further, in the case of the COA structure, a separate black matrix may be formed on the transparent insulating substrate, or the data line may serve as a black matrix. In this case, each color filter of red, green, . At this time, the line width of the data line can be determined at about 10 to 15 mu m as in the case of a general liquid crystal display device.

The stripper composition according to the present invention not only has excellent photoresist peeling performance but also significantly reduces the swelling phenomenon of the color filter and the insulating film located at the lower part, and the degree of metal corrosion is also good. Accordingly, it is possible to prevent the surface of the color filter and the insulating film from being uneven due to swelling, thereby improving the adhesion with other thin films deposited on the upper side, and also the thickness of the portion filled with the liquid crystal becomes uniform, can do.

Hereinafter, the present invention will be described with reference to the following examples and comparative examples. However, these examples are only for illustrating the present invention, and the present invention is not limited thereto.

[Examples 1 to 16 and Comparative Examples 1 to 6]

The exfoliant compositions of Examples and Comparative Examples were prepared by the compositions and contents shown in Table 1 below.

Amine compound Organic solvent water
(weight%) Corrosion inhibitor ingredient content
(weight%) ingredient content
(weight%) ingredient content
(Parts by weight) Example 1 MEA 10 MDG 70 20 - - Example 2 MIPA 10 MDG 70 20 - - Example 3 AEE 10 MDG 70 20 - - Example 4 nMEA 10 MDG 70 20 - - Example 5 MEA 10 NMP 70 20 - - Example 6 MEA 10 DMSO 70 20 - - Example 7 MEA 10 DMAc 65 25 - - Example 8 AEE 20 NMF 60 20 - - Example 9 MEA 20 NMF 50 30 - - Example 10 MEA 20 MDG 40 40 - - Example 11 MEA 5 MDG 70 25 - - Example 12 MEA 20 MDG 50 30 - - Example 13 MEA 20 MDG 40 40 AA 0.5 Example 14 MIPA 15 MDG 65 20 PY 0.5 Example 15 MEA 15 BDG 65 20 IT 0.5 Example 16 Nmea 15 TEG 65 20 TT 0.5 Comparative Example 1 MEA 30 NMP 70 Comparative Example 2 MEA 5 NMP 95 - - - Comparative Example 3 MEA 50 BDG 50 - - - Comparative Example 4 MEA 50 BDG 20 30 - - Comparative Example 5 MEA 10 BDG 10 70 - - Comparative Example 6 MIPA 0.5 BDG 80 20 - - Comparative Example 7 MIPA 30 NMP 69.5 0.5 IT 0.01

MEA: monoethanolamine / NMAE: N-methylaminoethanol / MIPA: monoisopropanolamine / AEE: 2- (2-aminoethoxy) -1-ethanol / NMP: N-methylpyrrolidone / DMSO: dimethyl Diethylene glycol monomethyl ether / BDG: diethylene glycol monobutyl ether / BT: benzotriazole / AA: ascorbic acid / PY: pyrogallol / TT: tolyltriazole

[Experimental Example]

The compositions of Examples and Comparative Examples in Table 1 were used to evaluate the peeler performance, the degree of damage to the color filter and the insulating film, and the degree of corrosion of the metal. For this purpose, the following specimens were prepared.

First Specimen

To evaluate the damage to the lower film, a color filter and an insulating film of about 20,000 ANGSTROM were applied to the glass surface and oven baking was performed at a temperature of about 200 DEG C / hr.

The Second Psalm

Al (Al) and molybdenum (Mo) of about 2,000 Å were laminated on the glass surface, and the photosensitive film was coated and developed to evaluate the damage to the lower film.

Psalm 3

To evaluate the peeling performance of the photoresist film, an n + a-Si: H active film specimen, in which chromium (Cr) was laminated on an insulating glass, a photosensitive film was applied, wet etching was performed, and dry etching gas was supplied .

Psalm 4

The dry etching process was further performed once more to form a modified photoresist film by performing dry etching under more severe conditions than the third specimen. The adhesion of the photoresist is maximized in chromium, and when the dry etching gas is applied, the photoresist is deformed and it is not easy to peel off with a peeling agent. Therefore, it can be used as a specimen suitable for testing the peeling performance of the photoresist.

Photosensitive film peeling performance

The corrosion resistance (second specimen) of aluminum (Al) and molybdenum (Mo) (second specimen), the photoresist peeling performance (the third specimen And the fourth specimen) were evaluated, and the results are shown in Table 2.

Performance evaluation division Degree of color filter damage
(Psalm 1) Degree of damage of insulating film
(Psalm 1) Degree of metal corrosion
(Psalm 2) Photosensitive film
Peeling performance aluminum molybdenum (Psalm 3) (Psalm 4) Dipping at 40 캜 for 5 minutes 40 ℃ dipping for 30 seconds Example 1 ◎ ◎ △ △ ◎ ◎ Example 2 ◎ ◎ △ △ ◎ ◎ Example 3 ◎ ◎ △ △ ◎ ◎ Example 4 ◎ ◎ △ △ ◎ ◎ Example 5 ◎ ◎ △ △ ◎ ◎ Example 6 ◎ ◎ △ △ ◎ ◎ Example 7 ◎ ◎ △ △ ◎ ◎ Example 8 ◎ ◎ △ △ ◎ ◎ Example 9 ◎ ◎ △ △ ◎ ○ Example 10 ◎ ◎ △ △ ○ ○ Example 11 ◎ ◎ △ △ ◎ ○ Example 12 ◎ ◎ △ △ ◎ ◎ Example 13 ◎ ◎ ◎ ◎ ○ ○ Example 14 ◎ ◎ ◎ ◎ ◎ ◎ Example 15 ◎ ◎ ◎ ◎ ◎ ◎ Example 16 ◎ ◎ ◎ ◎ ◎ ◎ Comparative Example 1 X X X X △ △ Comparative Example 2 △ △ ○ ○ X X Comparative Example 3 X X X X △ △ Comparative Example 4 △ △ X X ◎ ◎ Comparative Example 5 ◎ ◎ X X X X Comparative Example 6 ◎ ◎ ○ ○ X X Comparative Example 7 △ △ △ △ △ △

(No swelling phenomenon at all), O (some swelling phenomenon occurred), Δ (large swelling phenomenon occurred), X (severe swelling phenomenon occurred)

* Corrosion rating criteria: ◎ (no corrosion at all), ○ (with little corrosion), △ (with severe corrosion), X (completely corroded)

Evaluation criteria of photoresist stripper performance:? (Complete removal of the photoresist film),? (With a slight photoresist film residue),? (Excessive photoresist film residue), X (no photoresist film peeling at all)

The results of Table 2 show that the stripper according to the present invention has excellent photoresist stripping performance and significantly reduces the swelling phenomenon in the color filter and the insulating film located at the lower portion of the comparative example, . Accordingly, the present invention prevents the surface of the color filter and the insulating film from being uneven due to swelling, and improves the adhesion to other thin films stacked on the upper side, as well as the thickness of the portion where the liquid crystal is filled becomes even, Can be prevented. Therefore, the release agent of the present invention can be usefully used for manufacturing a color filter-on-array structure of a liquid crystal display device.

1 is a cross-sectional view showing an example of a COA structure of a liquid crystal display device manufactured by applying a release agent composition according to the present invention.

Description of the Related Art

10: transparent insulating substrate 20: gate electrode

30: gate film 40: semiconductor layer

54, 56: resistance contact layer 65: source electrode

66, 67: drain electrode 70: color filter

72: insulating protective film 82: pixel electrode

Claims (8)

1 to 40% by weight of a water-soluble organic amine compound, 3 to 40% by weight of water, and Residual water-soluble organic solvent, The water-soluble organic solvent is selected from the group consisting of dimethylsulfoxide, dimethylsulfone, diethylsulfone, bis (2-hydroxyethyl) sulfone, tetramethylene sulfone, sulfolane, N, N-dimethylformamide, - N, N-diethylacetoamide, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N-propyl- N-hydroxymethyl-2-pyrrolidone, N-hydroxyethyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, And 1,3-diisopropyl-2-imidazolidinone, In a manufacturing process of a liquid crystal display device of a color filter on array structure including a transparent insulating substrate, a gate electrode, a gate insulating film, a semiconductor layer, source and drain electrodes, a color filter, an insulating film and a pixel electrode, Or a photoresist of a photosensitive pattern to be used for patterning the pixel electrode, A photoresist stripper composition for a color filter on array manufacturing process of a liquid crystal display device. The stripper composition according to claim 1, further comprising 0.1 to 10 parts by weight of a corrosion inhibitor based on 100 parts by weight of the composition. delete 2. The composition of claim 1, wherein the water soluble organic amine compound is selected from the group consisting of monoethanolamine, diethanolamine, triethanolamine, propanolamine, dipropanolamine, tripropanolamine, isopropanolamine, diisopropanolamine, 2- (2-aminoethoxy) Ethanol, N, N-dimethylethanolamine, N, N-diethylethanolamine, N-methylethanolamine, N-ethylethanolamine, N-butylethanolamine, N- At least one member selected from the group consisting of methyldiethanolamine, tetramethylhexyloxyamine, tetraethylhydroxyamine, tetrabutylhydroxyamine and tetrabutylhydroxyamine. delete 3. The composition of claim 2 wherein said corrosion inhibitor is selected from the group consisting of sorbitol, benzotriazole, tolyltriazole, carboxylic benzotriazole, 1-hydroxybenzotriazole, nitrobenzotriazole, ascorbic acid, citric acid, , Salicylic acid, lactic acid, 8-quinolinol, 8-quinolinol N-oxide, 2-quinolinol, 3-quinolinol, 1,2,3,4-tetrahydro-8- Of quinolizone, methyl gallate, hydroquinone, catechol, and pyrogallol. A method of manufacturing a liquid crystal display device of a color filter on array structure including a color filter and a pixel electrode on one substrate, comprising the steps of: forming an insulating protective film on a color filter; and forming a pixel electrode on the insulating protective film In this case, At least one of the steps of forming the insulating protective film and forming the pixel electrode includes forming a photosensitive film by coating a photoresist on the color filter or the insulating protective film, exposing the photosensitive film to form a plurality of photosensitive patterns, And etching the photosensitive pattern using a photosensitive pattern, and peeling the photosensitive pattern with the releasing agent of claim 1. A method of manufacturing a liquid crystal display device of a color filter-on-array structure, 8. The method of claim 7, wherein the method further comprises: forming a gate electrode on the transparent insulating substrate; Forming a gate insulating film on the gate electrode, Forming a semiconductor on the gate insulating film, Forming a source electrode and a drain electrode on the semiconductor, Forming a color filter on the source electrode and the drain electrode, Forming an insulating protective film on the color filter, and Forming a color filter on array structure of a liquid crystal display device including a pixel electrode on the insulating protective film, At least one of the steps of forming the insulating protective film and forming the pixel electrode includes forming a photosensitive film by coating a photoresist on the color filter or the insulating protective film, exposing the photosensitive film to form a plurality of photosensitive patterns, Etching using a photosensitive pattern, and peeling the photosensitive pattern with the releasing agent of claim 1 Wherein the liquid crystal display device is a liquid crystal display device.

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