KR101358188B1 - Electrode of CVD chamber and method for recycling thereof - Google Patents

Abstract

The present invention comprises the steps of primarily cutting the surface of the fixing portion; Copper plating the surface of the first cut part; Secondary cutting the surface of the copper plated fixture to a predetermined dimension; and plating the surface of the secondary cut fixture with silver; To an electroload of an integrated CVD chamber.
According to the present invention, even if the fixing portion to which the graphite electrode is fixed in the electrorod of the CVD chamber is damaged, the regeneration of the fixing portion is prevented, thereby reducing the cost and reducing the cost. It provides superior quality while minimizing cost and effort, which increases the reliability of the regenerative electroload.

Description

Electrode of CVD chamber and method for recycling thereof

The present invention relates to an electroload of a CVD chamber and a method for regenerating the same, and more particularly, even if the fixing part to which graphite is fixed in the electroload of the CVD chamber is damaged, regeneration of the fixing part prevents disposal of the entire electrorod. The present invention relates to an electroload of a CVD chamber and a method of regenerating the same to provide a high quality while minimizing the cost and effort required for regeneration of the fixing part.

In general, chemical vapor deposition (hereinafter, referred to as CVD) is a process of forming a thin film on a deposit including a substrate such as a semiconductor wafer by using a chemical reaction. Is a step of sending a reaction gas having a high vapor pressure to the heated substrate in order to grow a film of the reaction gas on the substrate.

Such a CVD process is also used in a method for producing high-purity polysilicon. For example, a high-temperature seed in a mixed atmosphere of hydrogen or a mixture of silane gases such as monosilane, dichlorosilane, trichlorosilane, etc., with hydrogen is mixed under a high atmosphere. Silicon may also be deposited on the surface of the seed filament by contacting the filament.

A CVD chamber for performing a conventional CVD process is provided with an electrorod for generating plasma therein, which will be described below with reference to the accompanying drawings.

1 is a cross-sectional view showing an electrorod of a CVD chamber according to the prior art.

As shown in FIG. 1, the electrorod 10 of the CVD chamber according to the prior art largely includes an electrorod body 11 and a guide tube assembly 12.

Electrode body 11 has a fixing portion (11a) is provided at the end to be fixed to the chamber body for performing the CVD process, the hollow portion 11b that is opened through one side is formed inside, the hollow portion 11b ) Are formed with first and second holes 11c and 11d for supplying and discharging cooling water, respectively.

The fixing part 11a is fixed with a graphite electrode for producing polysilicon. In addition, the hollow portion 11b may be formed in the longitudinal direction inside the cylindrical rod body 11 and may be formed so that the opposite side of the fixing portion 11a is opened. In addition, the first and second holes 11c and 11d may be the supply holes for the cooling water, and the second hole 11d may be the discharge port for the cooling water, but the present invention is not limited thereto. The sphere and the outlet can be formed in reverse. Meanwhile, the fixing part 11a may be divided into a converter type in which a male screw part is formed to be screwed to the graphite electrode, and a reactor type of conical shape in which a vertex is omitted so as to be inserted into the graphite electrode. have.

The guide tube assembly 12 has a guide tube 12a inserted into the hollow portion 11b to have a clearance, and the guide base 12c integrally provided at the end of the guide tube 12a has a hollow portion 11b. The connection hole 12b may be formed at the side portion to be joined to the open side of the c) for sealing and to be in close contact with one of the first and second holes 11c and 11d.

The guide tube 12a allows the coolant supplied through the connection hole 12b to be supplied to the hollow portion 11b through the open side of one end, or the coolant supplied from the hollow portion 11b through the one end of the open side is connected. It provides a movement path of the coolant to be discharged through the hole 12b, and as in the present embodiment, the connection hole 12b is connected to the first hole 11c. In addition, the contact portion 12f may be formed around the end of the guide tube 12a to be in close contact with the inner surface of the hollow portion 11b, and the electric guide bar for supplying current may be provided at the guide base 12c. For example, a plurality of coupling parts 12d formed of a female screw part may be provided on one surface to be fixed by a bolt or the like.

The electrorod body 11 and the guide tube assembly 12 are joined by brazing by applying heat by filling the filler metal with the open side of the hollow part 11b and the guide base 12c. .

However, the fixing portion 11a to which the graphite electrode is fixed in the electrorod of the CVD chamber according to the prior art is damaged due to chemical, mechanical or spark as shown in FIGS. 2 and 3, in which case the electrorod ( 10) had the problem of discarding the whole.

In order to solve the conventional problems as described above, the present invention, even if the fixing portion to which the graphite electrode is fixed in the electrorod of the CVD chamber is damaged, by reducing the cost to reduce the disposal of the entire electrode through the regeneration of the fixing portion to reduce the cost The purpose is to help.

Other objects of the present invention will become readily apparent from the following description of the embodiments.

In order to achieve the above object, according to an aspect of the present invention, a method for electrorod regeneration of a CVD chamber in which a fixing portion for fixing a graphite electrode is damaged, the method comprising: first cutting the surface of the fixing portion; Copper plating the surface of the first cut part; A second step of cutting the surface of the copper plated fixing part to a predetermined dimension; and plating the surface of the second cut fixing part with silver is provided.

The primary and secondary cutting may be cut into a tapered shape in which the diameter decreases toward the end of the fixing part.

The said primary and secondary cutting processes can be cut so that an external thread may be formed in the outer peripheral surface of the said fixed part.

The said primary cutting process can cut the surface of the said fixed part 2-6 mm.

In the secondary cutting, the machining dimension of the fixing part may be smaller than the final dimension of the fixing part in consideration of the silver plating layer formed by the silver plating.

Cleaning the fixing unit firstly after finishing the first cutting process, and cleaning the fixing unit secondly after finishing the second cutting process, the first and second cleaning steps include: The fixing unit may be washed using any one of pure water, detergent, immersion degreasing solution, IPA, or a combination thereof.

Primarily cutting the surface of the fixture; Copper plating the surface of the first cut part; Secondary cutting the surface of the copper plated fixture to a predetermined dimension; and plating the surface of the secondary cut fixture with silver; An electroload of the CVD chamber is provided.

According to the electroload of the CVD chamber and the regeneration method thereof according to the present invention, even if the fixing portion to which the graphite electrode is fixed in the electrorod of the CVD chamber is damaged, regeneration of the fixing portion prevents the disposal of the entire electrorod, thereby reducing costs. This provides high quality while minimizing the cost and effort required for the regeneration of the fixture, thereby increasing the reliability of the regenerative electrorod.

1 is a cross-sectional view showing an electrorod of a CVD chamber according to the prior art,
2 and 3 are images showing a damaged fixture in the electrorod of the CVD chamber according to the prior art,
4 is a flowchart illustrating an electroload regeneration method of a CVD chamber according to an embodiment of the present invention;
5 to 7 are diagrams for describing an electroload regeneration method of a CVD chamber according to an embodiment of the present invention.

While the invention is susceptible to various modifications and alternative forms, specific embodiments thereof are shown by way of example in the drawings and will herein be described in detail. It is to be understood, however, that the invention is not to be limited to the specific embodiments, but is to be understood to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention, And the scope of the present invention is not limited to the following examples.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings, wherein like or corresponding elements are denoted by the same reference numerals, and redundant explanations thereof will be omitted.

4 is a flowchart illustrating an electroload regeneration method of a CVD chamber according to an exemplary embodiment of the present invention.

As shown in FIG. 4, an electrorod regeneration method of a CVD chamber according to an embodiment of the present invention is a regeneration method of an electrorod in which a fixing portion for fixing a graphite electrode is damaged. Cutting (S11), plating the surface of the fixing part with copper (S13), cutting the surface of the fixing part (S14), and plating the surface of the fixing part with silver It may include (S16).

According to the step S11 of first cutting the surface of the fixing part, the surface of the damaged fixing part is first cut by using an NC lathe while the body of the electrode is fixed with a jig to prevent scratching. Processing is performed, and it is performed when it is determined that the reproducibility is possible for the fixing unit before. In this case, the dimension to be cut may be within 2 to 6mm. In other words, when cutting the fixed part less than 2mm, cutting of the damaged part is not done properly, and when cutting more than 6mm, the final dimensions cannot be satisfied by the subsequent copper plating and silver plating, and also the product quality. Cannot satisfy.

After finishing the first cutting process on the surface of the fixing unit, it is possible to perform the first step of cleaning the fixing unit (S12). Here, the first step of cleaning (S12) may be cleaned using any one or a combination of pure water, detergent, immersion degreasing solution, IPA (Iso Propyl Alcohol) for the fixing portion. In this case, the detergent may be used as a mixed liquid of pure water.

First cleaning step (S12) is, for example, a high-pressure spraying a mixture of detergent and pure water to the fixed portion with an air gun (Air gun), and again can be cleaned with pure water using an air gun, and then the deposition degreasing liquid Deposition degreasing can be carried out using, and then ultrasonic cleaning can be performed using IPA and an ultrasonic cleaner, and when it is finished, cleaning can be completed using pure water.

According to the step (S13) of plating the surface of the fixing part with copper, as shown in FIG. 5, the surface of the fixing part which has been cut and finished the first cleaning is plated with copper. To this end, first mask the upper part of the electrode to prevent penetration of the plating solution to the remaining portions except the fixing part, and then copper plating the surface of the fixing part using a plating apparatus, but the plating thickness is determined. Plating is carried out until the thickness is reached. In FIG. 5, (a) shows that the fixed part is a converter type, and (b) shows that the fixed part is a reactor type.

According to the step (S14) of the surface of the fixing part, the surface of the fixing part plated with copper, as shown in the converter type fixing part (a) and the reactor type fixing part (b) of FIG. The secondary cutting process to a predetermined dimension, for this purpose is fixed to the NC lathe using a jig so as not to scratch the body of the electrorod, and then the copper plated surface of the fixed portion is cut using the NC lathe.

On the other hand, the first and second cutting step (S11, S14) can be cut so that the male thread is formed on the outer peripheral surface of the fixing portion, which is to reproduce the converter-type fixing portion as shown in Figs. It is applied to a cutting process for cutting, otherwise, it is possible to cut into a tapered shape in which the diameter decreases toward the end of the fixing part, which is to reproduce the reactor type fixing part as shown in (b) of FIGS. Is applied to the cutting process.

In addition, the step S14 of the secondary cutting process takes into account the silver plated layer formed by the step S16 of silver-plating the processing dimension of the fixing part, which is more than the final dimension of the fixing part, that is, the final dimension delivered as a product. It can be formed smaller than ~ 150㎛, in this case can be a cutting process 100㎛ smaller than the final dimension in the case of the converter-type fixing part, and can be cut 150㎛ smaller than the final dimension in the case of the reactor-type fixing part.

After finishing the second cutting process on the surface of the fixing unit, it is possible to perform the step (S15) of cleaning the fixing unit secondary. The second cleaning step (S15) may be cleaned using any one or a combination of pure water, detergent, immersion degreasing solution, IPA, or a combination thereof for the fixing part, and may be performed in the same manner as the first cleaning step (S12). have.

According to the step (S16) of plating the surface of the fixing part with silver, as shown in the converter type fixing part (a) and the reactor type fixing part (b) of FIG. 7, secondary cutting and secondary cleaning are performed. The surface of the fixed part is plated with silver using a plating apparatus. At this time, after masking the portion of the upper portion of the electrode except for the fixing part, silver plating is performed, and silver plating by energization is performed until a desired plating thickness layer is obtained. Here, the silver plating layer formed by silver plating not only prevents oxidation of copper plating, but also prevents diffusion of impurities to prevent contamination of the CVD chamber and improve contact characteristics.

After the silver plating on the fixing part, processing (S17) to have a final dimension as a product can be carried out. In this case, a variety of methods such as using a lathe or polishing may be used.

The electrorod of the CVD chamber according to an embodiment of the present invention is an electrorod regenerated by the regeneration method as described above. Since the electrorod regeneration method of the CVD chamber has been described in detail above, the description thereof will be omitted. .

According to the electroload of the CVD chamber and the regeneration method thereof according to the present invention, even if the fixing portion to which the graphite electrode is fixed in the electrorod of the CVD chamber is damaged, regeneration of the fixing portion is prevented, thereby preventing disposal of the entire electrorod. This reduces costs and provides superior quality while minimizing the cost and effort of regenerating the fixture, thereby increasing the reliability of the regenerative electroload.

Although the present invention has been described with reference to the accompanying drawings, it is to be understood that various changes and modifications may be made without departing from the spirit of the invention. Therefore, the scope of the present invention should not be limited to the described embodiments, but should be determined by the equivalents of the claims, as well as the following claims.

Claims (7)

A method of electroload regeneration of a CVD chamber in which a fixing portion for fixing a graphite electrode is damaged,
Primarily cutting the surface of the fixing part;
Copper plating the surface of the first cut part;
Secondly cutting the surface of the copper plated fixing part to a predetermined dimension; and
And plating the surface of the second cut part with silver;
The primary and secondary cutting processing,
Cutting into a tapered shape in which the diameter decreases toward the end of the fixing part,
Cutting to form a male screw on the outer peripheral surface of the fixing portion,
The secondary cutting process,
And the processing dimension of the fixing portion is smaller than the final dimension of the fixing portion in consideration of the silver plating layer formed by the silver plating. delete delete The method of claim 1, wherein the primary cutting process,
And cutting the surface of the fixing part by 2 to 6 mm. delete 2. The method of claim 1, further comprising: cleaning the fixing unit firstly after the first cutting process, and cleaning the fixing unit secondly after the second cutting process;
The first and second cleaning step,
The fixed part is washed with any one or a combination of pure water, detergent, immersion degreasing solution, IPA or a combination thereof. The electroload of the CVD chamber, which is regenerated by the electroload regeneration method of the CVD chamber according to any one of claims 1, 4 and 6.

Images