KR101311834B1 - The disposal system of perfluorinated compounds - Google Patents

Abstract

PURPOSE: A PFC processing system is provided to increase reliability and performance of the system by increasing PFC process efficiency. CONSTITUTION: A PFC processing system comprises: a preprocessor (1), a main processor, and a post processor. The preprocessor (1) comprises: a ventury scrubber (11), a cyclone scrubber (12), and a dust collection water storage (13). The ventury scrubber removes large particle contained in the induced waste gas by a gas-liquid contact. The cyclone scrubber collects and removes floating solid-liquid fine particle contained in the waste gas by spraying a neutralizer. The main processor disassembles PFC contained in the waste gas ejected by the preprocessor by accelerating the heat generation by plasma from high frequency or resonance of water molecule by the plasma, or changing into a radical state. The post processor neutralizes strong acid in the object gas from which the PFC is removed.

Description

PFC processing system {The disposal system of perfluorinated compounds}

The present invention relates to a PFC treatment system, and more particularly, to collect and remove particles in waste gas delivered to a main treatment device using large centrifugal force and liquid to large particles as well as suspended solid and liquid fine particles, and neutralize strong acids. The present invention relates to a PFC processing system that reduces the load on the main processing unit to increase the processing efficiency of the PFC, and can process the PFC economically and efficiently by using the fossil fuel at a lower temperature than using the fossil fuel.

In general, the waste gas generated during the semiconductor or LCD production process is composed of volatile organic compounds (VOCs), perfluorinated compounds (PFCs), materials added in photoresists such as butyl acetate and 2-ectoethylethyl acetate, and water. And mixtures of other foreign substances and the like.

The volatile organic compound (VOC) is a substance that causes harmful air and odors, such as the formation of smog through photochemical reactions with the harmful effects on the human body such as disorders of the respiratory tract and carcinogenicity, generation of odors, and urban ozone concentration. It is known as a major substance that causes environmental pollution such as rising, and PFC is one of gaseous components generated during semiconductor etching process and chemical vapor deposition process.It is very stable gas that promotes global warming and is known as a gas that is difficult to decompose during processing. have.

In general, a PFC treatment system includes a pretreatment apparatus for removing particles contained in waste gas, a main treatment apparatus for thermally decomposing PFC in waste gas supplied from the pretreatment apparatus into LNG, and a post treatment for removing strong acid generated from the main treatment apparatus. It consists of a device.

However, such a conventional PFC treatment system is clogged with the nozzle of the burner area or the pores of the heat accumulator due to the particles which are not removed from the pretreatment apparatus, resulting in high energy consumption, short duration of incomplete combustion and maintenance, and thus, There was a problem that the function is lost.

In addition, as described above, as the waste gas is passed back to the main processing unit without particles completely removed, the particles put a load on the processing power of the main processing unit, thereby preventing PFC processing from being effectively performed. There was a problem that caused the degradation.

On the other hand, the main treatment device is a heating incineration method, which is a method of incineration of about 700 ~ 800 degrees Celsius or more, because the reaction temperature is high, the nitrogen and oxygen contained in the exhaust gas reacts with a large amount of nitrogen oxides as harmful substances Generated by the high temperature operation, there is a problem of shortening the maintenance period and increasing the burden of operating costs due to the high temperature operation.

In addition, regenerative thermal oxidation (RTO) and catalytic thermal oxidation (CTO) methods are used as the PFC and industrial waste gas removal apparatus, but all of these require enormous energy consumption because they require LNG or other heat sources. Not only does this reduce the economics, but there is also a risk that volatile organic compounds and industrial waste gas storage tanks may explode if firearms flow back.

In the case of fossil fuels, the processing temperature is about 1100 ~ 1300 ℃ and the environmental pollution is caused by the generation of carbon monoxide and rust due to incomplete combustion, and the temperature is high, so the material, namely heat resistance, acid resistance, etc. Difficult and expensive materials have caused a problem of economic deterioration due to cost increases.

Accordingly, the present invention has been made to solve the above-mentioned conventional problems, and its purpose is to collect particles in the waste gas delivered to the main treatment apparatus using centrifugal force and liquid to large particles as well as suspended solid and liquid fine particles. It removes the neutral acid and neutralizes the strong acid, which reduces the load on the main processing equipment caused by the particles, thereby increasing the processing efficiency of the PFC, and processing the PFC at a lower temperature than fossil fuel without using fossil fuel. To provide a PFC processing system.

In addition, an object of the present invention is to compensate for the heat of the plasma when decomposing and processing the PFC by the high-frequency plasma to generate high heat without LNG or auxiliary heat source to increase the decomposition efficiency and energy saving for PFC and explosion due to fire It is to provide a PFC treatment system that can prevent the risk of an accident in advance.

It is also an object of the present invention to provide a PFC treatment system that has the ability to decompose waste gas even at a temperature lower than the plasma temperature by using a high frequency catalyst to ensure heat quantity for temperature rise, ease of material selection, and economics. .

One embodiment of the PFC treatment system according to the present invention for achieving the object of the present invention is to collect and remove large particles in the particles in the waste gas through the gas-liquid contact, the suspended solid particles in the particles are centrifugal force and liquid A pretreatment device for collecting and removing using the; PFC in the waste gas discharged from the pre-treatment device to accelerate the generation of heat by the high-frequency plasma and the resonance of water molecules by the plasma, or to change the radical state to the main processing device having a decomposition ability by promoting the chain reaction of the waste gas Wow; And a post-treatment apparatus for neutralizing the strong acid in the target treatment gas from which the PFC has been removed through the main treatment apparatus.

In addition, the pretreatment apparatus includes a venturi scrubber for removing particles of large particles contained in the waste gas introduced through the gas and liquid contact; A cyclone scrubber that collects and removes suspended solids and liquid fine particles in the waste gas by using a liquid by neutralizing agent by injecting a neutralizer while forming a downturn air stream by the waste gas supplied from the venturi scrubber; And a dust collecting storage tank provided in communication with the lower portion of the venturi scrubber and the cyclone scrubber to collect the dust collected inside the venturi scrubber and the cyclone scrubber.

The venturi scrubber may include a vertical venturi body having a waste gas inlet formed at an upper side thereof and a process gas outlet formed at a lower side thereof; A venturi part which is gradually reduced in cross section in the venturi body and expands again through the neck portion to maintain the original cross-sectional size; And a dust collecting venturi supply pipe installed at an upper side of the venturi body and having a plurality of venturi injection nozzles so as to spray water to the lower side of the venturi body.

In addition, the cyclone scrubber is a vertical cyclone body formed with a waste gas supply portion to form a downturn air flow by the waste gas of the venturi scrubber at a constant high speed in the tangential direction of the inner side wall on one side, the process gas outlet is formed on the upper side; A hollow central axis formed in the center of the upper end of the cyclone body to be the center of the downturn air flow; It is installed on the outer periphery of the central axis, characterized in that consisting of; dust collecting cyclone supply pipe having a plurality of cyclone injection nozzles to inject a neutralizing agent in the interior of the cyclone body, wherein the cyclone body is demister in the upper inside of the central axis It characterized in that it further comprises.

In addition, the main processing unit includes a frequency supply unit for generating a high frequency by the applied power; A microwave plasma reactor including a plasma generator for generating a plasma by discharging high frequency transmitted from the frequency supply unit; A water spray unit spraying water in a spray form to the plasma generator side of the microwave plasma reactor; Characterized in that the temperature reduction portion for reducing the temperature of the gas discharged from the microwave plasma reactor.

In addition, the frequency supply unit includes a power supply for generating a high voltage, a magnetron for generating a high frequency by the power applied from the power supply, an isolate for preventing damage to the magnetron due to the reflected wave at the rear end, and impedance. Automatically set, characterized in that consisting of a tuner to achieve impedance matching with the microwave plasma reactor.

The plasma generator may further include a high frequency aggregation unit that aggregates high frequencies delivered into the microwave plasma reactor, an ignition unit that discharges the collected high frequencies, and supplies a carrier gas to maintain the generated plasma. Characterized in that it comprises a plasma discharge unit for creating a smooth plasma atmosphere, the main processing device is characterized in that it further comprises an oxygen supply unit for supplying oxygen to the plasma generator side of the microwave plasma reactor.

In addition, the main processing unit includes a frequency supply unit for generating a high frequency by the applied power; And a catalytic reactor which absorbs the high frequency transmitted from the frequency supply unit, releases heat, and reacts with the released heat to promote and remove and process the decomposition of PFC contained in the waste gas. The catalytic reactor comprises a high frequency input unit. And a waste gas input part formed at one side and having an absorber and a catalyst part spaced apart from each other inside the reactor body in which a process gas discharge part is formed at the other side.

In addition, the catalytic reactor is formed by forming a honeycomb-type catalyst structure inside the reactor body in which the high frequency input unit and the waste gas input unit are formed at one side, and the processing gas discharge unit is formed at the other side, and a coating layer made of an absorber material is formed on the catalyst structure. It is characterized by.

As described above, the present invention enables to collect and remove particles in waste gas delivered to the main processing unit by the pretreatment unit as well as suspended solid and liquid fine particles, thereby reducing the load of the main processing unit due to the particles. As a result, the performance and reliability of the system according to the increase in the PFC processing efficiency can be further increased.

In addition, the present invention generates a plasma by using a high frequency to enable processing at a lower temperature than the fossil fuel without using the fossil fuel in the main processing device, the heat generated in the plasma by the plasma resonates by the plasma to accelerate the heat generation By supplementing with the supply of water molecules and oxygen which change to a radical or radical state, it is possible to save energy by generating high heat without LNG or auxiliary heat source, thereby improving the efficiency of decomposition to PFC more economically, and explosion by fire The risk of an accident can be prevented in advance, thereby improving the performance and reliability of the system as well as ensuring safety.

In addition, the present invention can have a PFC decomposition ability at a temperature lower than the plasma temperature by a catalyst using a high frequency, as well as ensuring the heat amount for the temperature rise, as well as the ease and economical efficiency of material selection, as well as to increase the efficiency There is an advantage that can improve the performance of the device according to the simplification and miniaturization of the device.

1 is a block diagram showing the overall configuration of a PFC processing system according to the present invention.
Figure 2a and 2b shows a pretreatment apparatus applied to the present invention,
Figure 2a is a longitudinal sectional view showing the overall configuration.
FIG. 2B is a plan sectional view of FIG. 2A;
Figure 3 is a block diagram showing a main processing device applied to the present invention.
4 is a block diagram showing the configuration of the plasma generator of FIG.
Figure 5 is a block diagram showing another embodiment of the main processing apparatus applied to the present invention.
6 is a cross-sectional view showing the structure of the catalytic reactor of FIG.
7 is a perspective view showing another embodiment of the catalytic reactor of FIG.

Hereinafter, the configuration of the present invention will be described in detail with reference to the accompanying drawings.

As shown in FIG. 1, the present invention comprises a pretreatment device 1, a main processing device 2, and a post-treatment device 3, wherein the pretreatment device 1 has particles in waste gas through gas and liquid contact. The large particles in the air are collected and removed, and the suspended solid liquid particles in the particles are configured to be collected and removed using centrifugal force and the liquid.

The main processing apparatus 2 accelerates heat generation or changes the radicals into a radical state by resonating the PFC in the waste gas supplied through the pretreatment apparatus 1 by the high-frequency plasma and the water molecules by the plasma. It is configured to have a decomposition ability by reaction promotion.

Next, a device that is a feature of the present invention will be described in more detail with reference to the accompanying drawings.

2A and 2B show a pretreatment apparatus applied to the present invention, and FIG. 2A is a longitudinal sectional view showing the overall configuration, and FIG. 2B is a plan sectional view of FIG. 2A.

As shown therein, the pretreatment apparatus 1 is supplied from a venturi scrubber 11 and a venturi scrubber 11 for removing resin and large particles contained in waste gas through a gas-liquid contact. Cyclone scrubber (12) for collecting and removing suspended solids and liquid fine particles in the waste gas by using a liquid, while forming a downturn air stream by the used waste gas, and the venturi scrubber (11) and cyclone scrubber It is composed of a dust collecting storage tank 13 provided in communication with the lower side of the (12) so that the dust collection inside the venturi scrubber 11 and the cyclone scrubber 12 is collected and stored.

The venturi scrubber 11 constitutes a venturi body 111 in a vertical tube shape, and a waste gas inlet 111a and waste gas to which waste gas to be treated is supplied to an upper side and a lower side of the venturi body 111. After the inlet 111a is introduced into the venturi body 111, a processing gas outlet 111b is formed through which waste gas from which resin and large particles are collected and removed is discharged.

In addition, the venturi main body 111 is gradually reduced in cross section and then expands again through the neck portion to form the venturi part 112 so as to maintain the original cross-sectional size, and the upper venturi main body of the venturi part 112 ( Inside the 111, a dust collecting venturi supply pipe 113 having a plurality of venturi injection nozzles 113a is installed.

The cyclone scrubber 12 constitutes a cyclone body 121 in a vertical cylindrical shape, and on one side and the upper side of the cyclone body 121 to the waste gas supplied at a constant high speed from the venturi scrubber 11 in the tangential direction of the inner side wall. The waste gas supply part 121a and the waste gas supply part 121b are formed so that the waste gas which the particulate particle collect | collected and removed in the inside of the cyclone main body 121 can be sent to the main processing apparatus 2 side, so that the downward turning air flow may be formed. do. In this case, the waste gas supply part 121a of the cyclone body 121 is connected to the processing gas outlet 111b of the venturi body 111 to communicate with each other.

In addition, a cylindrical central axis 122 penetrated up and down is formed at the center of the upper end of the cyclone body 121 and configured to be the center of the downturn air flow, and a plurality of cyclones are formed on the outside of the central axis 122. A dust collecting cyclone supply pipe 123 having an injection nozzle 123a is provided. In addition, the cyclone body 121 further includes a demister 124 inside the upper portion of the central axis 122. Reference numerals 113b and 123b herein refer to valves.

In the pretreatment apparatus 1 of the present invention configured as described above, first, waste gas to be treated is introduced through the waste gas inlet 111a of the venturi scrubber 11 to pass through the inside of the venturi body 111, and the venturi body 111 is disposed. Water is sprayed from the venturi injection nozzle 113a of the dust collecting venturi supply pipe 113 installed inside.

The water sprayed from the venturi injection nozzle 113a of the dust collecting venturi supply pipe 113 is atomized by increasing the kinetic energy in the venturi part 112 and decreasing the static pressure, thereby increasing the flow velocity. The particles and the inertia collision to remove the particles of large particles, the particles and water of the large particles containing water is collected by dropping to the lower side dust collecting storage tank 13 side of the venturi body (111).

The waste gas from which the large particles are removed is tangentially formed in the lateral direction of the inner sidewall of the cyclone body 121 through the process gas outlet 111b of the venturi body 111 and the waste gas supply 121a of the cyclone venturi part 112. The neutralizing agent is supplied to form a descending swirling air flow in the cyclone main body 121 and to remove the strong acid in the waste gas from the cyclone injection nozzle 123a of the dust collecting cyclone supply pipe 123 installed inside the cyclone main body 121. do.

Accordingly, particles in the form of suspended solid and liquid fine particles in the waste gas containing the neutralizing agent collide with the inner wall of the cyclone body 121 by centrifugal force and then fall and are collected in the dust collecting storage tank 13, and the particles in the form of fine particles are removed. The waste gas is raised from the hollow central shaft 122, which is the center of the downturn air flow, and passes through the demister 124, so that the remaining fine particles contained in the waste gas are collected and removed again, and then the cyclone scrubber 12 is treated. It is sent to the main processing apparatus 2 through the gas outlet 121b, and is processed.

3 is a block diagram showing the overall configuration of the main processing apparatus applied to the present invention, wherein the main processing apparatus 2 is provided from the frequency supply section 21, the microwave plasma reactor 22, and the microwave plasma reactor 22. The microwave plasma reactor 22 is configured to reduce the temperature of the discharged gas, and to compensate for the heat of plasma generated in the microwave plasma reactor 22 and to promote decomposition of the target processing gas. The water injection unit 23 and the oxygen supply unit 24 for spraying water in the form of a spray is provided inside the.

The frequency supply unit 21 uses a microwave, that is, a high frequency, a power supply device 211 for generating a high voltage, and a magnetron 212 for generating a high frequency by the power applied from the power supply device 211 and And an isolator 213 for preventing damage to the magnetron 212 due to the reflected wave at the rear end, and a tuner 214 for automatically setting the impedance and matching the impedance with the microwave plasma reactor 22.

In addition, the microwave plasma reactor 22 has a plasma generator 221 disposed therein as shown in FIG. 4, and the plasma generator 221 discharges the high frequency gathering unit 222 and the collected high frequency waves. And an ignition unit 223 for generating plasma and a plasma discharge unit 224 for supplying a carrier gas to maintain the generated plasma to form a smooth plasma atmosphere. Water and oxygen in a spray form are supplied through the injection unit 23 and the oxygen supply unit 24.

In the main processing apparatus 2 configured as described above, first, a high voltage is applied to the magnetron 212 to generate a high frequency in the magnetron 212, and the high frequency is passed through the isolator 213 and the tuner 214. It is delivered to) side. At this time, the isolator 213 prevents damage to the magnetron 212 due to the reflected wave at the rear end, and the tuner 214 automatically sets the impedance to achieve impedance matching with the microwave plasma reactor 22.

The high frequency transmitted to the microwave plasma reactor 22 forms plasma by the plasma generator 221 inside the microwave plasma reactor 22. At this time, the water molecules injected into the microwave plasma reactor 22 may cause resonance by the plasma to accelerate heat generation or change to a radical state, thereby treating the target processing gas introduced into the microwave plasma reactor 22, that is, waste gas. By promoting the chain reaction of the to increase the decomposition efficiency.

Accordingly, it is possible to solve the problem of economic efficiency and efficiency of decomposing target gas using plasma by supplementing the calorific value of plasma which is significantly insufficient compared with fossil fuel and promoting decomposition.

On the other hand, oxygen acts as a flame retardant to promote the heat of plasma and the target processing gas, thereby completely burning, thereby minimizing the environmental pollution due to the increase in energy efficiency and the emission of carbon monoxide. .

5 and 6 show another embodiment of the main treatment device applied to the present invention, wherein the characteristics are that the catalyst is used instead of the plasma using the high frequency, and as shown in FIG. 5, the frequency supply unit 21 and the catalyst are shown. It is composed of a reactor 25, the frequency supply unit 21 is the same as the configuration of the plasma using a high frequency, so in order to avoid duplication, a detailed description is omitted, with reference to the accompanying drawings for the catalytic reactor 25 in detail Let's explain.

Figure 6 is a cross-sectional view showing a catalytic reactor applied to the main treatment apparatus of the present invention, as shown in the catalytic reactor 25 is a high frequency input unit 251a and waste gas input unit 251b is formed on one side, the treatment on the other side It consists of the reactor main body 251 which has the gas discharge part 251c. An inside of the reactor body 251 is provided with an absorber 252 such as ceramic or graphite, which absorbs high frequency and converts it into heat, and reacts with heat emitted from the absorber 252 to decompose PFC contained in the waste gas. Alumina-based catalyst portion 253 to promote is provided with the absorber 252 at intervals.

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In the catalytic reactor 25 of the present invention configured as described above, the high frequency and the target processing gas are introduced into the reactor body 251 through the high frequency input unit 251a and the waste gas input unit 251b, and the absorber (inside the reactor body 251) ( 252 absorbs the high frequency applied to the microwave reactor 22 and converts it into heat, and water injected in the form of spray from the water injection unit 23 reacts with the catalyst to form OH radicals to promote decomposition of the PFC. Decomposition catalyst takes place.

Thus, when using catalysts and alumina-based catalysts, they have waste gas decomposition capability even at temperatures lower than those of LNG (1300 ~ 1500) (700 ~ 800 ° C). It can be economical as well as has the advantage of further improving the performance of the device according to the increase in efficiency, the temperature reduction unit 26 is discharged from the microwave plasma reactor 22 to the temperature of the treated gas to the water jet It is reduced by, the after-treatment device 3 is to neutralize and remove the residual strong acid contained in the waste gas by spraying a neutralizing agent.

Figure 7 shows another embodiment of the catalyst unit of the main treatment device applied to the present invention, wherein the characteristics are not provided with the absorber 252 and the catalyst unit 253, respectively, as shown in Figure 6, the catalyst The part 253 absorbs a high frequency, converts it into heat, and discharges it in parallel. To this end, the catalyst unit 253 has a honeycomb-shaped catalyst structure 253c therein to have a stable structure, and a coating layer 253d of an absorber material is formed on the catalyst structure 253c to form a coating layer 253d. It is configured to absorb and convert high frequency to release heat. When the heat release and the catalyst are simultaneously performed in the catalyst unit 253, there is an advantage in that the configuration of the device can be simplified as well as the size can be reduced.

As described above, the present invention enables to collect and remove particles in the waste gas delivered to the main treatment unit by the pretreatment unit as well as large particles and suspended solid particles, thereby reducing the load on the main processing unit due to the particles. will be.

In addition, the plasma is generated by using a high frequency so that the main processor can be processed at a lower temperature than fossil fuel without using fossil fuel, and the heat of plasma is resonated by the plasma to accelerate heat generation or radical state. By supplementing with the supply of water molecules and oxygen, which can be converted into high-temperature heat without LNG or auxiliary heat source, energy can be saved more economically. Will be prevented in advance.

In addition, by using a high frequency catalyst to have a PFC decomposition ability at a temperature lower than the temperature of the plasma, it is possible to secure the amount of heat for the temperature rise, as well as the ease of selecting materials and economics.

Although the PFC processing system according to the present invention has been described in detail above, this is only for describing the most preferred embodiments of the present invention, and the present invention is not limited thereto, and the scope thereof is determined by the appended claims. Are limited. It will be apparent to those skilled in the art that various changes and modifications can be made by those skilled in the art without departing from the scope of the present invention.

1: pretreatment unit
11: Venturi Scrubber
111: Venturi body 111a: waste gas inlet
111b: process gas outlet 112: venturi section
113: collecting dust venturi supply piping 113a: venturi injection nozzle
113b: valve
12: cyclone scrubber
121: cyclone body 121a: waste gas supply unit
121b: treatment gas outlet 122: central axis
123: collection cyclone supply pipe 123a: cyclone injection nozzle
123b: valve
13: collection tank
2: main processing unit
21: frequency supply
211: power supply 212: magnetron
213: isolator 214: tuner
22: microwave plasma reactor
221: plasma generator 222: high frequency aggregation unit
223 ignition unit 224 plasma discharge unit
23: water injection unit 24: oxygen supply unit
25: catalytic reactor
251: reactor body 251a: high frequency input unit
251b: waste gas input unit 251c: process gas discharge unit
252: absorber 253: catalytic part
253a: mesh 253b: pellet
253c catalyst structure 253d coating layer
3: aftertreatment device

Claims (12)

delete A pretreatment apparatus (1) for collecting and removing large particles in particles in the waste gas through gas and liquid contact, and collecting and removing suspended solids and liquid fine particles in particles using centrifugal force and liquid; PFC in the waste gas discharged from the pretreatment apparatus 1 has a decomposition ability by accelerating the heat generation or radical change to the radical state by the high-frequency plasma and the resonance of the water molecules by the plasma to promote the chain reaction of the waste gas A main processing unit 2; In the PFC processing system consisting of;
The pretreatment device (1) comprises a venturi scrubber (11) for removing particles of large particles contained in the waste gas introduced through the gas and liquid contact;
A cyclone scrubber (12) for trapping and removing suspended solids and liquid fine particles in the waste gas by injecting a neutralizing agent while forming a downturn air stream by the air flow of the waste gas supplied from the venturi scrubber (11);
And a dust collecting storage tank 13 provided in communication with the lower portion of the venturi scrubber 11 and the cyclone scrubber 12 to store dust collected in the venturi scrubber 11 and the cyclone scrubber 12. One PFC processing system.
3. The method of claim 2,
The venturi scrubber 11 includes a vertical venturi body 111 having a waste gas inlet 111a formed at an upper side thereof and a process gas outlet 111b formed at a lower side thereof;
A venturi part 112 formed in the venturi main body 111 to gradually reduce the cross section and expand again while passing through the neck portion to maintain the original cross-sectional size;
The dust collecting venturi supply pipe is installed inside the venturi body 111 of the upper side of the venturi part 112 and has a plurality of venturi injection nozzles 113a to spray water to the lower side of the venturi body 111. P113 processing system, characterized in that consisting of.
3. The method of claim 2,
The cyclone scrubber 12 has a waste gas supply part 121a is formed so that the waste gas of the venturi scrubber 11 flows at a constant high speed in a tangential direction of the inner sidewall on one side thereof to form a downturn air flow, and a process gas outlet to the upper side ( A vertical cyclone body 121 in which 121b) is formed;
A hollow central shaft 122 formed at the center of the upper end of the cyclone body 121 to be the center of the downturn air flow;
A dust collecting cyclone supply pipe 123 installed at an outer side of the central axis 122 and having a plurality of cyclone injection nozzles 123a to inject a neutralizer into the cyclone body 121. One PFC processing system.
5. The method of claim 4,
The cyclone body (121) further comprises a demister (124) on the upper inner side of the central axis (122).
3. The method of claim 2,
The main processing unit (2) includes a frequency supply unit (21) for generating a high frequency by the applied power;
A microwave plasma reactor (22) comprising a plasma generator (221) for generating a plasma by discharging high frequency transmitted from the frequency supply part (21);
A water spraying unit (23) for spraying water in a spray form toward the plasma generator (221) of the microwave plasma reactor (22);
PFC processing system, characterized in that consisting of a temperature reducing unit (26) for reducing the temperature of the gas discharged from the microwave plasma reactor (22).
The method according to claim 6,
The frequency supply unit 21 includes a power supply device 211 for generating a high voltage, a magnetron 212 for generating a high frequency by the power applied from the power supply device 211, and a magnetron 212 due to a reflected wave at a rear end thereof. PFC processing system comprising an isolator (213) to prevent damage to the), and a tuner (214) to automatically set the impedance and achieve impedance matching with the microwave plasma reactor (22).
The method according to claim 6,
The plasma generator 221 includes a high frequency collection unit 222 for collecting high frequencies transmitted to the inside of the microwave plasma reactor 22, an ignition unit 223 for generating plasma by discharging the collected high frequencies, and PFC processing system comprising a plasma discharge unit 224 for supplying a carrier gas to maintain a plasma to create a smooth plasma atmosphere.
The method according to claim 6,
The main processing apparatus (2) further comprises an oxygen supply unit (24) for supplying oxygen to the plasma generator (221) side of the microwave plasma reactor (22).
delete A pretreatment apparatus (1) for collecting and removing large particles in particles in the waste gas through gas and liquid contact, and collecting and removing suspended solids and liquid fine particles in particles using centrifugal force and liquid; PFC in the waste gas discharged from the pretreatment apparatus 1 has a decomposition ability by accelerating the heat generation or radical change to the radical state by the high-frequency plasma and the resonance of the water molecules by the plasma to promote the chain reaction of the waste gas A main processing unit 2; In the PFC processing system consisting of;
The main processor 2 absorbs the high frequency transmitted from the frequency supply unit 21 and the high frequency transmitted from the frequency supply unit 21 by the applied power to release heat, and reacts with the emitted heat to be included in the waste gas. A catalytic reactor 25 for promoting the removal and processing of the decomposed PFCs;
The catalytic reactor 25 has a high frequency input unit 251a and a waste gas input unit 251b formed on one side, and an absorber 252 and a catalyst unit inside the reactor body 251 on which the processing gas discharge unit 251c is formed on the other side. A PFC processing system characterized by including 253 at intervals.


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