KR101267873B1 - 마스크의 평가 패턴을 평가하기 위한 방법 및 시스템 - Google Patents

마스크의 평가 패턴을 평가하기 위한 방법 및 시스템 Download PDF

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Publication number
KR101267873B1
KR101267873B1 KR1020080003080A KR20080003080A KR101267873B1 KR 101267873 B1 KR101267873 B1 KR 101267873B1 KR 1020080003080 A KR1020080003080 A KR 1020080003080A KR 20080003080 A KR20080003080 A KR 20080003080A KR 101267873 B1 KR101267873 B1 KR 101267873B1
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South Korea
Prior art keywords
pattern
moments
evaluation
evaluation pattern
differences
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English (en)
Korean (ko)
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KR20080065942A (ko
Inventor
이샤이 쉬워즈밴드
쉬물릭 만간
챠임 브라우데
마이클 벤-이샤이
가디 그린버그
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어플라이드 머티리얼즈 이스라엘 리미티드
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/0006—Industrial image inspection using a design-rule based approach
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/60—Analysis of geometric attributes
    • G06T7/66—Analysis of geometric attributes of image moments or centre of gravity
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Geometry (AREA)
  • Quality & Reliability (AREA)
  • Image Analysis (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020080003080A 2007-01-10 2008-01-10 마스크의 평가 패턴을 평가하기 위한 방법 및 시스템 Expired - Fee Related KR101267873B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US88430807P 2007-01-10 2007-01-10
US60/884,308 2007-01-10

Publications (2)

Publication Number Publication Date
KR20080065942A KR20080065942A (ko) 2008-07-15
KR101267873B1 true KR101267873B1 (ko) 2013-05-27

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ID=39594343

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080003080A Expired - Fee Related KR101267873B1 (ko) 2007-01-10 2008-01-10 마스크의 평가 패턴을 평가하기 위한 방법 및 시스템

Country Status (4)

Country Link
US (1) US8098926B2 (https=)
JP (1) JP5140437B2 (https=)
KR (1) KR101267873B1 (https=)
CN (1) CN101436216B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2008957A (en) * 2011-07-08 2013-01-09 Asml Netherlands Bv Methods and systems for pattern design with tailored response to wavefront aberration.
US9341580B2 (en) * 2014-06-27 2016-05-17 Applied Materials, Inc. Linear inspection system
CN109891319B (zh) * 2016-10-24 2023-11-10 Asml荷兰有限公司 用于优化图案化装置图案的方法
US11321835B2 (en) * 2020-03-17 2022-05-03 Applied Materials Israel Ltd. Determining three dimensional information

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001264955A (ja) 1999-11-12 2001-09-28 Applied Materials Inc グレーレベルシグネチャを使用する欠陥検出
JP2004013095A (ja) 2002-06-11 2004-01-15 Fujitsu Ltd パターン画像比較方法、パターン画像比較装置及びプログラム

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5996642A (ja) * 1982-11-24 1984-06-04 Hamamatsu Photonics Kk 二次電子増倍器の製造方法
JPS6033679A (ja) * 1983-08-04 1985-02-21 Nec Corp モ−メント算出回路
JP2700260B2 (ja) * 1988-11-18 1998-01-19 株式会社日立製作所 画像処理装置
JP3247823B2 (ja) * 1995-06-26 2002-01-21 株式会社日立製作所 欠陥検査方法およびその装置並びに薄膜磁気ヘッド用の素子の製造方法
JPH09147109A (ja) * 1995-11-20 1997-06-06 Ricoh Co Ltd 特定マーク検出方法及び特定マーク検出装置
JPH1049684A (ja) * 1996-07-31 1998-02-20 Nec Corp 高速モーメント計算装置
JP3675629B2 (ja) * 1997-08-04 2005-07-27 株式会社リコー パターン認識方法、装置および記録媒体
US6081658A (en) * 1997-12-31 2000-06-27 Avant! Corporation Proximity correction system for wafer lithography
JP2004212277A (ja) * 2003-01-07 2004-07-29 Orbotech Ltd パターンを検査するための方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001264955A (ja) 1999-11-12 2001-09-28 Applied Materials Inc グレーレベルシグネチャを使用する欠陥検出
JP2004013095A (ja) 2002-06-11 2004-01-15 Fujitsu Ltd パターン画像比較方法、パターン画像比較装置及びプログラム

Also Published As

Publication number Publication date
US20080166038A1 (en) 2008-07-10
CN101436216A (zh) 2009-05-20
JP5140437B2 (ja) 2013-02-06
JP2008181124A (ja) 2008-08-07
CN101436216B (zh) 2013-03-06
US8098926B2 (en) 2012-01-17
KR20080065942A (ko) 2008-07-15

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