KR101216490B1 - film cleaning system - Google Patents

Abstract

The present invention provides a cleaning system for a film which can continuously remove even very fine dust, plastic film, and contamination of several micrometers attached to the surface of a plastic film.

To this end, in the present invention, the running film 12 is provided with a washing unit 36 for washing with a cleaning liquid, and a drying unit 38 for drying the washed running film. 36 is a structure which wash | cleans by the water flow along at least one surface, by supplying a washing | cleaning liquid to the at least one surface side of the said film front and back surface while running the film 12. As shown in FIG.

Description

Film cleaning system {FILM CLEANING SYSTEM}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning system for films that continuously clean dust, film pieces, and contaminants adhering to the surface of a plastic film. The present invention particularly relates to the fields of FPD (flat panel display), electronics, and optics where cleanness is required. A film cleaning system.

Plastic films are used in various fields, such as the field of FPD, the field of electronics, and the field of optics. The plastic film used for the field of FDP and electronics is used as a member and a process material through processes, such as film forming, coating, joining, and the like. In the manufacturing process, handling in a clean environment is essential, and defects such as incorporation and adhesion of foreign matter such as dust, fibers, and film debris into products, and physical defects such as scars and dents caused by them It is strictly managed. Market requirements for the frequency of occurrence of these defects are rapidly becoming strict. Moreover, also about the grade of a defect, the very fine defect which did not become a problem conventionally is not accepted, and improvement is calculated | required.

As a method of solving such a problem, bonding is used to remove dust, fibers, and film debris from the surface of the plastic film by using an adhesive roll, but the effect of removing foreign substances by retransition of dust and dust from the adhesive roll, etc. Is not enough. In addition, since static electricity generated when peeling from the adhesive roll remains in the plastic film, there is a concern that a problem that the defect frequency increases as a result of attracting the surrounding foreign matter.

In addition, although a high pressure air is blown out and sucked in a plastic film continuously, and the bonding which removes dust and dust is performed, there exists a problem that it cannot remove sufficiently about what adhered firmly.

In recent years, laminating | stacking which removes dust and dust is performed by wash | cleaning a plastic film. In patent document 1, the unwinding part of a film roll is provided, The washing | cleaning apparatus of the plastic film characterized by providing the washing | cleaning part which wash | cleans the unwinded film by alcohol washing | cleaning liquid, a steam drying part, an air drying part, and a winding part in order. It is.

And in patent document 2, after wash | cleaning a film with the washing | cleaning liquid containing surfactant, vibrating with an ultrasonic wave, washing | cleaning which blows air obliquely from the advancing direction forward of a film by a slit nozzle or a series porous nozzle on both surfaces of a film, and washes. An apparatus has been proposed.

Moreover, in patent document 3, it surrounds the washing | cleaning part and the whole dry part of a plastic film, raises the atmosphere temperature in an apparatus, and makes the guide roll surface temperature in a drying apparatus the temperature equivalent to a dry atmosphere, A washing apparatus has been proposed in which heat is efficiently applied so that drying proceeds quickly.

In addition, Patent Document 4 proposes a cleaning and drying method of an optical plastic film in which a cleaning liquid is continuously sprayed from the cleaning nozzle as the cleaning means, the cleaning liquid dropped as the cleaning liquid recycling means is recycled, and the drying means continuously blows out the warm air. It is.

[Patent Document 1]

Japanese Patent Application Laid-Open No. 2002-316116

[Patent Document 2]

Japanese Patent Application Laid-Open No. 2003-300025

[Patent Document 3]

Japanese Patent Application Laid-Open No. 2002-86079

[Patent Document 4]

Japanese Patent Application Laid-Open No. 2002-292347

However, in patent document 1, a plasticizer is contained in the optical plastic film, and when it washes with alcohol, a plasticizer elutes, and a change of a film characteristic and a fall of uniformity become a problem.

And in patent document 2, when surfactant contains in a washing | cleaning liquid, the wettability of the film surface arises. As a result, when providing a coating layer on a film surface, the problem of the elasticity of a coating liquid and the adhesive fall of a coating layer arises, and versatility is not obtained.

Moreover, in patent document 3, when washing | cleaning with a spray and a brush, although dust and a dust can be fully removed, a minute wound | wounds generate | occur | produce on the surface of an optical plastic film, and the member in the field of electronic display, electronics, It cannot be used for process materials. Moreover, when alkali, alcohol, ketone, etc. are used as a washing | cleaning liquid, the plasticizer of an optical plastic film elutes, and a change of a film characteristic and a fall of a uniformity become a problem.

In addition, in patent document 4, when alcohol, ester, etc. are used as a washing | cleaning liquid, the plasticizer of an optical plastic film elutes, and a change of a film characteristic and a fall of uniformity become a problem. Moreover, only the squeegeeing by a roll or bar does not remove a washing | cleaning liquid enough, and there exists a problem that productivity is low.

And even if it wash | cleans a film like these patent documents 1-4, the very fine foreign material of several micrometers on a film has the problem that adhesive force with respect to a film is strong, and cannot be removed preferably.

This invention is made | formed in view of such a situation, and an object of this invention is to provide the cleaning system of the film which can remove continuously the very fine dust of several micrometers, a film piece, and contamination attached to the surface of a plastic film.

MEANS TO SOLVE THE PROBLEM This invention is a washing | cleaning system of the film which has at least the washing | cleaning part which wash | cleans using a washing | cleaning liquid, and the drying part which dries the cleaned film, in the film which runs in order to achieve the said objective, The said washing | cleaning part is the said It provides a cleaning system for a film, wherein the cleaning liquid is supplied to at least one surface side of the film front and back while running the film, thereby cleaning with water flow along the at least one surface. And this washing | cleaning part may be provided in multiple stages.

The cleaning section includes one or two parallel members and a cleaning liquid supply slit formed on the parallel member and flushing the cleaning liquid to at least one surface side of the film front and back. In this case, the gap between the parallel member and the film is preferably 0.25 mm or less. Or an ultrasonic cleaner using convergent ultrasound is provided on at least one surface side of the film front and back.

The film cleaning system configured as described above can continuously remove even very fine dust, film fragments, and dirt of several micrometers attached to the surface of the plastic film.

That is, the cleaning liquid supplied from the supply slit is made up of a clearance of 0.25 mm or less consisting of the cleaning liquid supply slit for supplying the cleaning liquid to at least one surface side of the film front and back and the parallel member and the film, so that the cleaning liquid supplied from the supply slit has a large gap of 0.25 mm or less. Since it has a velocity gradient, very fine dust, film pieces, and contamination of several micrometers can be removed from the film. Moreover, also by washing | cleaning in the washing | cleaning part provided with the ultrasonic cleaner using convergent ultrasonic wave, very fine dust, film piece, and contamination of several micrometers can be removed from a film.

Here, when providing a washing | cleaning liquid supply slit and an ultrasonic cleaner only in the one surface side of a film front and back, it is applied when only one surface of a film is to be cleaned.

The washing | cleaning system of the film of this invention WHEREIN: The unwinding part which unwinds a film from the roll which wound the film, the static electricity removal part which removes the charge of the film dried by the said drying part, and the film which finished the said static electricity in roll shape It is preferable to have a winding part to take. In this case, it is preferable to provide a foreign material inspection apparatus for inspecting foreign substances of the film at the front end of the winding portion.

The cleaning system of the film of the present invention further includes, at a rear end of the cleaning part, an air knife for removing the cleaning liquid attached to the film, and an electrostatic discharge mechanism for ionizing the air supplied to the air outlet of the air knife. desirable. And it is preferable that the washing | cleaning system of the film of this invention has the whole cover which covers the whole system. Moreover, it is preferable to equip this whole cover with the apparatus which supplies clean air by FFU (fan filter unit) so that it may become a wind direction of a film width direction. And when the apparatus which supplies this clean air is provided, it is preferable that the separation | cover cover which has a slit through which the film | membrane passes and removes every provided part is provided in the whole cover.

According to the present invention, it is possible to provide a film cleaning system capable of continuously removing even very fine dust, film pieces, and contamination of several micrometers attached to the surface of a plastic film.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described in detail according to an accompanying drawing.

BRIEF DESCRIPTION OF THE DRAWINGS It is a schematic side view which shows the whole structure when the washing | cleaning system of the film of this invention is assembled to the coating device of a film.

As shown in FIG. 1, the coating device 40 of the film of this embodiment is the unwinding part 42 of the plastic film roll, the cleaning system 10 of the film of this invention, the coating part 44, and the drying part ( The drying part after coating) 46 and the winding-up part 48 are provided in order. The sheet-shaped plastic film 12 unwound from the unwinding part 42 of a plastic film roll is conveyed by the conveyance rollers 14 and 16 to the washing | cleaning system 10 of the film of this invention.

The washing | cleaning system 10 of the film of FIG. 1 is equipped with the washing | cleaning parts 36 and 36 which wash | clean by using a washing | cleaning liquid for the film which runs, and the drying part 38 which drys the cleaned film. Here, although the washing | cleaning part 36 shows the example which is two steps and the drying part 38 is one step, it is not limited, For example, even if the washing | cleaning part 36 is three steps and the drying part 38 is two steps, for example. do. Moreover, it is preferable to have the whole cover 50 which covers the whole system in the washing | cleaning system 10 of a film.

The objects to be cleaned in the present invention are very fine dust, film pieces, and stains of several micrometers attached to the surface of the plastic film.

And the washing | cleaning part 36 which concerns on this invention is a structure which wash | cleans by the water flow along at least one surface by supplying a washing | cleaning liquid to the at least one surface side of the film front and back surface while running a film. And the cleaning liquid is constantly supplied.

FIG. 2: shows embodiment of the washing | cleaning part 36 which concerns on this invention, FIG. 2 (a) is a perspective view, FIG. 2 (b) is sectional drawing which shows a part of cross section seen from the side surface. In addition, the washing | cleaning part 36 of FIG. 2 is a case where it wash | cleans one side of a film.

The cleaning part 36 shown in FIG. 2 consists of one parallel member 53 and the cleaning liquid supply slits 52 and 52 provided in the parallel member 53 which supplies a cleaning liquid perpendicularly to one side of a film. . The gap 54 between the parallel member and the film is preferably a width D of 0.25 mm or less.

By flowing the cleaning liquid into such a narrow gap 54, the flow velocity of the cleaning liquid has a large velocity gradient in the narrow gap of 0.25 mm or less, so that it is parallel to the film surface between the parallel members 53 and the film surface. In addition, parallel flows with high flow rates occur. This makes it possible to remove very fine dust, film pieces, and dirt of several micrometers from the film.

3 shows another embodiment of the cleaning unit 36 according to the present invention.

The cleaning part 36 shown in FIG. 3 is the cleaning liquid supply slit 52 and 52 provided in the two parallel members 53 and 53 and the parallel members 53 and 53 which supply a cleaning liquid perpendicularly to the film front and back. ) The two parallel members 53 and 53 respectively form narrow gaps 54 and 54 in which the width D of the gap between the parallel member and the film is 0.25 mm or less.

Since the flow rate of the cleaning liquid has a large velocity gradient in the narrow gap of 0.25 mm or less by flowing the cleaning liquid into such a narrow gap 54, a film is formed between the film front and back and the two parallel members 53 and 53. Parallel flows that are parallel to the plane and have a high flow rate occur. This makes it possible to remove very fine dust, film pieces, and dirt of several micrometers from the film.

FIG. 4A shows another embodiment of the cleaning unit 36 according to the present invention, in which a plurality of cleaning liquid supply slits 52 of FIG. 3 are provided on the film front and back. In addition, in order to prevent the cleaning liquid from remaining in the narrow gap by providing a plurality of cleaning liquid supply slits, a cleaning liquid discharge slit 56 for discharging the cleaning liquid from the narrow gap is provided between the cleaning liquid supply slits 52 and 52. have. By setting it as the washing | cleaning part 36 of FIG. 4 (a), since the washing | cleaning method in the washing | cleaning part of FIG. 3 can be repeated in multiple steps, the fine foreign material on a film can be further removed. In addition, as shown in FIG.4 (b), the position of the washing | cleaning liquid supply slit 52 may shift in the film front and back.

5 shows another embodiment of the cleaning unit 36 according to the present invention, and the cleaning unit 36 is provided with an ultrasonic cleaner 65 using convergent ultrasonic waves. The ultrasonic cleaner 65 is provided with a plate-shaped ultrasonic vibrator 66, and an acoustic lens 68 is provided on the ultrasonic vibrator 66. Ultrasonic waves transmitted from the ultrasonic vibrator 66 are focused on the predetermined focusing focal point by the acoustic lens 68 and irradiated to the cleaning liquid. Thus, the ultrasonic waves are focused so that radicals that contribute to the cleaning efficiently near the focusing focal point are concentrated. Can be generated. Therefore, this focusing focus is set in the vicinity of the surface of the film 12. In addition, the back surface of the film 12 is supported by the roller 67. In addition, the cleaning part 36 is provided with a cleaning liquid supply slit 52 and a cleaning liquid discharge slit 56.

The flow rate of the cleaning liquid has a large velocity gradient by flowing the cleaning liquid through the narrow gap 54 in the cleaning part 36 having such a configuration, so that the film is supported between the film surface supported by the roller 67 and the ultrasonic cleaner 65. In addition, parallel flow is generated which is parallel to the film surface and has a high flow velocity. It is possible to remove even very fine dust, film pieces, and dirt of several micrometers from the film.

In addition, the frequency range of the ultrasonic wave suitable for generation | occurrence | production of radicals is 0.3 MHz-1 MHz.

In addition, in this embodiment, although the ultrasonic wave irradiated to a washing | cleaning liquid is made into the structure which focuses with the acoustic lens 18, you may irradiate without focusing, but by converging an ultrasonic wave, the radical which contributes to washing | cleaning near a focusing focal point It can generate | occur | produce efficiently, and the washing | cleaning effect can be improved.

In addition, in this embodiment, although the ultrasonic wave oscillated from the ultrasonic vibrator is focused to a predetermined focusing point using an acoustic lens, the structure which focuses an ultrasonic wave is not limited to this. For example, the ultrasonic wave can be focused at a predetermined focusing point by forming the surface of the ultrasonic oscillator to oscillate in an arc shape (the ultrasonic vibrator is formed into a so-called trough). In this case, the acoustic lens becomes unnecessary.

Here, when it is the washing | cleaning part 36 in which two or more ultrasonic cleaners 65 are provided like FIG. 5, it is preferable to provide the partition plate 70 which divides in the part shown in FIG.

As shown in FIG. 7 (a), the partition plate 70 is provided with a slit 71 through which the film 12 passes, and supports the film 12 on each of the upstream side and the downstream side of the slit. A pair of rollers 72 are provided. Moreover, as shown to FIG. 7 (b), it is preferable that the pair of roller 72 which pinches the film 12 is provided in the slit.

Thus, by providing the partition plate 70 in the washing | cleaning part 36 of FIG. 4, the washing | cleaning liquid can be sealed with respect to each of the ultrasonic cleaners 65, ... 65. Therefore, since the space in which the cleaning liquid is filled is independent for each of the ultrasonic cleaners 65, it is possible to clean the film using different kinds of cleaning liquids for each space.

As mentioned above, the film 12 wash | cleaned by the washing | cleaning part 36 of the washing | cleaning system 10 of the film of this invention is sent to the drying part 38 by the rollers 24 and 25. FIG.

Moreover, it is preferable to provide the air knife which removes the washing | cleaning liquid adhered to a film, and the static electricity removal mechanism which ionizes the air supplied to the blower outlet of the air knife in the rear end of the washing | cleaning part 36.

The coated liquid 12 is applied to the cleaned and dried film 12, passes through the drying part 46 while being conveyed by a roller, and is wound in a roll state by the winding part 48.

The plastic film used in the present invention is not particularly limited as long as it is in a transparent sheet or film form. For example, a polyester film, polyethylene film, polypropylene film, cellophane film, diacetyl cellulose film, triacetyl cellulose film, Acetylcellulose butyrate film, polyvinyl chloride film, polyvinylidene chloride film, polyvinyl alcohol film, ethylene vinyl alcohol film, polystyrene film, polycarbonate film, polymethylpentel film, polysulfone film, polyether ketone film, polyether To thermoplastic resin films, such as a sulfone film, a polyetherimide film, a polyimide film, a fluororesin film, a nylon film, a polycycloolefin film, an acrylic film, and at least one surface of these plastic films, such as application | coating, coating, bonding, printing, etc. The multilayer film which processed. In the case of using a triacetylcellulose film, a polyester film, a polycycloolefin film, or a polycarbonate film having a high transmittance and requiring high film uniformity, it is easy to identify defects caused by dust, dirt, and the like. .

The thickness of the plastic film used for this invention can be arbitrarily selected in 5-2000 micrometers, Preferably it is 15-500 micrometers, Especially preferably, it is the range of 20-200 micrometers.

Moreover, the cleaning system 10 of the film of this invention may be equipped with the unwinding part which unwinds a film from the roll which wound the film, and the winding-up part which winds a film in roll shape as shown in FIG. Thereby, a film can be wash | cleaned independently, without being assembled to the coating device 40 of a film like FIG.

Moreover, it is preferable that the cleaning system 10 of the film of FIG. 8 is equipped with the static electricity removal part (not shown) which removes the charge of the film dried by the drying part 38. FIG. Moreover, it is also preferable to install the foreign material inspection apparatus (not shown) which inspects the foreign material of a film in the front end of the winding-up part 48.

As mentioned above, although the washing | cleaning system of the film of this invention was demonstrated based on drawing, this invention is not limited to the structure described in the said drawing, The meaning of combining the structure described in each drawing suitably, etc. The configuration can be changed as appropriate without departing from the scope.

For example, it is also preferable to equip the whole cover 50 of FIG. 1 and FIG. 8 with the apparatus which supplies clean air by FFU (fan filter unit) so that the wind direction of a film width direction may be provided.

In addition, it is preferable that the separation cover which has the slit through which the film | membrane separates each provided part is provided in the whole cover 50 of FIG. 1 and FIG. As the slit portion of the separation cover, a partition plate 70 shown in Fig. 7B can be used.

BRIEF DESCRIPTION OF THE DRAWINGS The figure which shows the coating device of the film which assembled the cleaning system of the film of this invention.

2 is a diagram showing an embodiment of a cleaning unit according to the present invention;

3 shows another embodiment of the cleaning unit according to the present invention;

4 shows another embodiment of the cleaning unit according to the present invention;

5 shows another embodiment of the cleaning unit according to the present invention;

6 is a view showing the position of the partition plate as another embodiment of the cleaning unit according to the present invention;

7 is a view showing a partition plate;

It is a figure which shows another embodiment of the cleaning system of the film of this invention.

[Description of Drawings]

10 film cleaning system 12 film

36: washing part 38: drying part

40: coating device of film 42: unwinding part

48: winding 50: full cover

52: cleaning liquid supply slit 53: parallel member

54: gap 56: cleaning liquid discharge slit

65: ultrasonic cleaner 66: ultrasonic vibrator

68: acoustic lens 70: partition plate

71: slit 72: 1 pair of roller

D: width of gap between parallel member and film

Claims (11)

In the washing | cleaning system of the film provided with the washing | cleaning part which wash | cleans using a washing | cleaning liquid and the drying part which dries the cleaned film to the film which runs, The cleaning unit, It is a structure which wash | cleans by the water flow along the at least one surface by supplying a washing | cleaning liquid to the at least one surface side of the said film front and back surface while running the said film, The cleaning unit includes one or two parallel members and a cleaning liquid supply slit formed on the parallel member to flush the cleaning liquid to at least one surface side of the film front and back, The gap between the parallel member and the film is 0.25 mm or less, The film thickness is 20 to 200 μm, the film cleaning system, characterized in that. The method of claim 1, The said washing part is provided in multiple steps, The cleaning system of the film characterized by the above-mentioned. delete delete The method according to claim 1 or 2, The cleaning unit, An ultrasonic cleaning machine using convergent ultrasound is provided on at least one surface side of the film front and back. The method of claim 1, The cleaning system for the film includes a winding-up unit which unwinds the film from a roll wound around the film, an antistatic unit for removing the charge of the film dried in the drying unit, and winding-up winding the film after the static elimination. It further comprises a part, The cleaning system of the film characterized by the above-mentioned. The method according to claim 6, The front end of the said winding part, the foreign material inspection apparatus which inspects the foreign material of a film was provided, The film cleaning system characterized by the above-mentioned. The method of claim 1, At the rear end of the washing section and the front end of the drying section, And an air knife for removing the cleaning liquid adhering to the film, and an electrostatic charge mechanism for ionizing air supplied to the air outlet of the air knife. The method of claim 1, The cleaning system for the film has a total cover covering the entire system. 10. The method of claim 9, The said whole cover was equipped with the apparatus which supplies clean air by FFU (fan filter unit) so that the wind direction of a film width direction may be provided, The film cleaning system characterized by the above-mentioned. 10. The method of claim 9, The said whole cover is provided with the separation cover which isolate | separates every provided part and has a slit through which a film passes, The film cleaning system characterized by the above-mentioned.

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