KR101196334B1 - 증발 대역으로의 미립자 물질 전달 장치 - Google Patents

증발 대역으로의 미립자 물질 전달 장치 Download PDF

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Publication number
KR101196334B1
KR101196334B1 KR1020087009716A KR20087009716A KR101196334B1 KR 101196334 B1 KR101196334 B1 KR 101196334B1 KR 1020087009716 A KR1020087009716 A KR 1020087009716A KR 20087009716 A KR20087009716 A KR 20087009716A KR 101196334 B1 KR101196334 B1 KR 101196334B1
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South Korea
Prior art keywords
particulate material
cartridge
organic
evaporation
auger
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KR1020087009716A
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English (en)
Korean (ko)
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KR20080059247A (ko
Inventor
마이클 롱
로날드 마이론 웩슬러
Original Assignee
글로벌 오엘이디 테크놀러지 엘엘씨
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Publication of KR20080059247A publication Critical patent/KR20080059247A/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020087009716A 2005-10-24 2006-10-11 증발 대역으로의 미립자 물질 전달 장치 Active KR101196334B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/264,349 2005-10-24
US11/264,349 US7993459B2 (en) 2005-10-24 2005-10-24 Delivering particulate material to a vaporization zone
PCT/US2006/039756 WO2007050293A1 (en) 2005-10-24 2006-10-11 Delivering particulate material to a vaporization zone

Publications (2)

Publication Number Publication Date
KR20080059247A KR20080059247A (ko) 2008-06-26
KR101196334B1 true KR101196334B1 (ko) 2012-11-01

Family

ID=37853028

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020087009716A Active KR101196334B1 (ko) 2005-10-24 2006-10-11 증발 대역으로의 미립자 물질 전달 장치

Country Status (7)

Country Link
US (1) US7993459B2 (https=)
EP (1) EP1966409B1 (https=)
JP (1) JP5155173B2 (https=)
KR (1) KR101196334B1 (https=)
DE (1) DE602006016863D1 (https=)
TW (1) TWI377714B (https=)
WO (1) WO2007050293A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7883583B2 (en) * 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
US8741062B2 (en) * 2008-04-22 2014-06-03 Picosun Oy Apparatus and methods for deposition reactors
US7972443B2 (en) * 2008-11-14 2011-07-05 Global Oled Technology Llc Metering of particulate material and vaporization thereof
US8048230B2 (en) * 2008-11-14 2011-11-01 Global Oled Technology Llc Metering and vaporizing particulate material
US8062427B2 (en) * 2008-11-14 2011-11-22 Global Oled Technology Llc Particulate material metering and vaporization
CN102576665A (zh) * 2009-08-26 2012-07-11 泰拉半导体株式会社 蒸镀气体供给装置
KR101225377B1 (ko) * 2012-04-02 2013-01-25 주식회사 야스 유기물질 카트리지 및 박막제작에 이를 사용하는 방법
DE102016111214B3 (de) 2016-06-20 2017-06-29 Ancosys Gmbh Vorrichtung zur Pulverdosierung für chemische Produktionsprozesse unter Reinraumbedingungen, Verwendung derselben und Zudosierungsverfahren
CN107088150B (zh) * 2017-05-01 2023-02-28 宁德职业技术学院 一种葡萄籽花青素蒸脸美容器

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2447789A (en) 1945-03-23 1948-08-24 Polaroid Corp Evaporating crucible for coating apparatus
US2524560A (en) * 1945-09-22 1950-10-03 Us Automatic Box Machinery Co Method and machine for filling containers with powdered material and for removing dust and airborne particles at region ambient the container
US2800252A (en) * 1954-03-17 1957-07-23 Eugene A Wahl Powder-feeding apparatus
US3270857A (en) * 1964-02-24 1966-09-06 Deere & Co Screw-conveyor feeder
US3447789A (en) * 1967-05-31 1969-06-03 Chemrock Corp Portable perlite handling apparatus and method
US3754529A (en) * 1970-06-08 1973-08-28 Nat Beryllia Corp Apparatus for continuously depositing beryllia through vaporization of a basic formate
US4885211A (en) * 1987-02-11 1989-12-05 Eastman Kodak Company Electroluminescent device with improved cathode
US4990371A (en) * 1989-08-01 1991-02-05 Gte Products Corporation Process for coating small solids
EP0585848A1 (de) * 1992-09-02 1994-03-09 Hoechst Aktiengesellschaft Verfahren und Vorrichtung zur chemischen Gasphasenabscheidung dünner Schichten
US5937996A (en) * 1998-01-13 1999-08-17 Vibrascrew Inc. Vibrating screw feeder
JP2000068055A (ja) 1998-08-26 2000-03-03 Tdk Corp 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
US6685762B1 (en) * 1998-08-26 2004-02-03 Superior Micropowders Llc Aerosol method and apparatus for making particulate products
DE10048759A1 (de) * 2000-09-29 2002-04-11 Aixtron Gmbh Verfahren und Vorrichtung zum Abscheiden insbesondere organischer Schichten im Wege der OVPD
US6774318B2 (en) * 2001-02-14 2004-08-10 Process Control Corporation Removable material hopper assembly and method of using same to eliminate residual ingredient material
US6749906B2 (en) 2002-04-25 2004-06-15 Eastman Kodak Company Thermal physical vapor deposition apparatus with detachable vapor source(s) and method
US20040144321A1 (en) 2003-01-28 2004-07-29 Eastman Kodak Company Method of designing a thermal physical vapor deposition system
US7611587B2 (en) * 2003-05-16 2009-11-03 Chow Peter P Thin-film deposition evaporator
JP4551996B2 (ja) * 2003-10-09 2010-09-29 グローバル・オーエルイーディー・テクノロジー・リミテッド・ライアビリティ・カンパニー 蒸発装置
US7501152B2 (en) 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone

Also Published As

Publication number Publication date
JP5155173B2 (ja) 2013-02-27
DE602006016863D1 (de) 2010-10-21
US20070092645A1 (en) 2007-04-26
EP1966409B1 (en) 2010-09-08
EP1966409A1 (en) 2008-09-10
WO2007050293A1 (en) 2007-05-03
KR20080059247A (ko) 2008-06-26
JP2009512786A (ja) 2009-03-26
TWI377714B (en) 2012-11-21
US7993459B2 (en) 2011-08-09
TW200725959A (en) 2007-07-01

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