DE602006016863D1 - Zufuhr von teilchenförmigem material zu einer verdampfungszone - Google Patents

Zufuhr von teilchenförmigem material zu einer verdampfungszone

Info

Publication number
DE602006016863D1
DE602006016863D1 DE602006016863T DE602006016863T DE602006016863D1 DE 602006016863 D1 DE602006016863 D1 DE 602006016863D1 DE 602006016863 T DE602006016863 T DE 602006016863T DE 602006016863 T DE602006016863 T DE 602006016863T DE 602006016863 D1 DE602006016863 D1 DE 602006016863D1
Authority
DE
Germany
Prior art keywords
supply
particle material
evaporation zone
evaporation
zone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602006016863T
Other languages
German (de)
English (en)
Inventor
Michael Long
Ronald Myron Wexler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Global OLED Technology LLC
Original Assignee
Global OLED Technology LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Global OLED Technology LLC filed Critical Global OLED Technology LLC
Publication of DE602006016863D1 publication Critical patent/DE602006016863D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
DE602006016863T 2005-10-24 2006-10-11 Zufuhr von teilchenförmigem material zu einer verdampfungszone Active DE602006016863D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/264,349 US7993459B2 (en) 2005-10-24 2005-10-24 Delivering particulate material to a vaporization zone
PCT/US2006/039756 WO2007050293A1 (en) 2005-10-24 2006-10-11 Delivering particulate material to a vaporization zone

Publications (1)

Publication Number Publication Date
DE602006016863D1 true DE602006016863D1 (de) 2010-10-21

Family

ID=37853028

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602006016863T Active DE602006016863D1 (de) 2005-10-24 2006-10-11 Zufuhr von teilchenförmigem material zu einer verdampfungszone

Country Status (7)

Country Link
US (1) US7993459B2 (https=)
EP (1) EP1966409B1 (https=)
JP (1) JP5155173B2 (https=)
KR (1) KR101196334B1 (https=)
DE (1) DE602006016863D1 (https=)
TW (1) TWI377714B (https=)
WO (1) WO2007050293A1 (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7883583B2 (en) * 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
US8741062B2 (en) * 2008-04-22 2014-06-03 Picosun Oy Apparatus and methods for deposition reactors
US7972443B2 (en) * 2008-11-14 2011-07-05 Global Oled Technology Llc Metering of particulate material and vaporization thereof
US8048230B2 (en) * 2008-11-14 2011-11-01 Global Oled Technology Llc Metering and vaporizing particulate material
US8062427B2 (en) * 2008-11-14 2011-11-22 Global Oled Technology Llc Particulate material metering and vaporization
CN102576665A (zh) * 2009-08-26 2012-07-11 泰拉半导体株式会社 蒸镀气体供给装置
KR101225377B1 (ko) * 2012-04-02 2013-01-25 주식회사 야스 유기물질 카트리지 및 박막제작에 이를 사용하는 방법
DE102016111214B3 (de) 2016-06-20 2017-06-29 Ancosys Gmbh Vorrichtung zur Pulverdosierung für chemische Produktionsprozesse unter Reinraumbedingungen, Verwendung derselben und Zudosierungsverfahren
CN107088150B (zh) * 2017-05-01 2023-02-28 宁德职业技术学院 一种葡萄籽花青素蒸脸美容器

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2447789A (en) 1945-03-23 1948-08-24 Polaroid Corp Evaporating crucible for coating apparatus
US2524560A (en) * 1945-09-22 1950-10-03 Us Automatic Box Machinery Co Method and machine for filling containers with powdered material and for removing dust and airborne particles at region ambient the container
US2800252A (en) * 1954-03-17 1957-07-23 Eugene A Wahl Powder-feeding apparatus
US3270857A (en) * 1964-02-24 1966-09-06 Deere & Co Screw-conveyor feeder
US3447789A (en) * 1967-05-31 1969-06-03 Chemrock Corp Portable perlite handling apparatus and method
US3754529A (en) * 1970-06-08 1973-08-28 Nat Beryllia Corp Apparatus for continuously depositing beryllia through vaporization of a basic formate
US4885211A (en) * 1987-02-11 1989-12-05 Eastman Kodak Company Electroluminescent device with improved cathode
US4990371A (en) * 1989-08-01 1991-02-05 Gte Products Corporation Process for coating small solids
EP0585848A1 (de) * 1992-09-02 1994-03-09 Hoechst Aktiengesellschaft Verfahren und Vorrichtung zur chemischen Gasphasenabscheidung dünner Schichten
US5937996A (en) * 1998-01-13 1999-08-17 Vibrascrew Inc. Vibrating screw feeder
JP2000068055A (ja) 1998-08-26 2000-03-03 Tdk Corp 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法
US6685762B1 (en) * 1998-08-26 2004-02-03 Superior Micropowders Llc Aerosol method and apparatus for making particulate products
DE10048759A1 (de) * 2000-09-29 2002-04-11 Aixtron Gmbh Verfahren und Vorrichtung zum Abscheiden insbesondere organischer Schichten im Wege der OVPD
US6774318B2 (en) * 2001-02-14 2004-08-10 Process Control Corporation Removable material hopper assembly and method of using same to eliminate residual ingredient material
US6749906B2 (en) 2002-04-25 2004-06-15 Eastman Kodak Company Thermal physical vapor deposition apparatus with detachable vapor source(s) and method
US20040144321A1 (en) 2003-01-28 2004-07-29 Eastman Kodak Company Method of designing a thermal physical vapor deposition system
US7611587B2 (en) * 2003-05-16 2009-11-03 Chow Peter P Thin-film deposition evaporator
JP4551996B2 (ja) * 2003-10-09 2010-09-29 グローバル・オーエルイーディー・テクノロジー・リミテッド・ライアビリティ・カンパニー 蒸発装置
US7501152B2 (en) 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone

Also Published As

Publication number Publication date
JP5155173B2 (ja) 2013-02-27
KR101196334B1 (ko) 2012-11-01
US20070092645A1 (en) 2007-04-26
EP1966409B1 (en) 2010-09-08
EP1966409A1 (en) 2008-09-10
WO2007050293A1 (en) 2007-05-03
KR20080059247A (ko) 2008-06-26
JP2009512786A (ja) 2009-03-26
TWI377714B (en) 2012-11-21
US7993459B2 (en) 2011-08-09
TW200725959A (en) 2007-07-01

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DE602006016863D1 (de) Zufuhr von teilchenförmigem material zu einer verdampfungszone