KR101182316B1 - Liquid Crystal Display and Method for Manufacturing the Same - Google Patents

Abstract

The present invention relates to a liquid crystal display device and a method of manufacturing the same, which improve a defect by making a groove in a surface of a column spacer corresponding to a lower substrate and strengthening a fastening with the lower substrate through the groove. A first substrate and a second substrate facing each other, a gate line and a data line crossing each other on the first substrate to define a pixel region, and a step portion on the first substrate, A first column spacer formed between the first substrate and the second substrate, the first column spacer having a groove that is larger than the corresponding surface of the step and having the step in which the step enters the first surface. Characterized by including a liquid crystal layer.

Cross Recess, Groove, Column Spacer, Press Test, Bad Touch, Halftone Mask, Compensation Pattern, Diffraction Exposure Mask

Description

Liquid Crystal Display and Method for Manufacturing the Same

1 is a cross-sectional view of an LCD including a column spacer.

2A and 2B are plan and cross-sectional views illustrating a touch failure of a liquid crystal display including a column spacer.

3 is a cross-sectional view of a liquid crystal display device in which gravity failure occurs.

4A is a cross-sectional view illustrating a protrusion structure of the liquid crystal display of the present invention.

4B is a cross-sectional view illustrating in detail a state in which protrusions and column spacers correspond to each other.

5 is a plan view showing a liquid crystal display of the present invention.

6 is a cross-sectional view illustrating a thin film transistor region and first and second column spacers of FIG. 5.

7 is a cross-sectional view of a liquid crystal display according to a first exemplary embodiment of the present invention.

8 is a plan view when the column spacer of FIG. 7 is viewed from below.

9 is a cross-sectional view illustrating a column spacer and protrusions corresponding thereto in the liquid crystal display according to the second exemplary embodiment of the present invention.

10 is a cross-sectional view of a liquid crystal display according to a second exemplary embodiment of the present invention.

FIG. 11 is a plan view when the column spacer of FIG. 10 is viewed from below.

12 is a cross-sectional view illustrating in detail the protrusions and the column spacer corresponding to those of FIG. 10.

13 is a plan view showing a mask for forming the column spacer of the present invention.

Description of the Related Art [0002]

100: first substrate 101: gate line

101a: gate electrode 102: data line

102a: source electrode 102b: drain electrode

103: pixel electrode 103a: first storage electrode

104: common electrode 104a, 104c: common line

104b: second storage electrode 105: gate insulating film

106: protective film 107b: compensation pattern

120: protrusion 120a: semiconductor layer pattern

120b: source / drain metal layer 200: second substrate

201: black matrix layer 202: color filter layer

203: overcoat layer 210: first column spacer

220: second column spacer 230: first column spacer

240: second column spacer 240a: groove

250: liquid crystal layer

300: mask 301: transmissive portion

302: transflective part 303: shading part

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device and a method of manufacturing the same, which improve a defect by making a groove in a surface of a column spacer corresponding to a lower substrate and strengthening a fastening with the lower substrate through the groove. .

(PDP), Electro Luminescent Display (ELD), Vacuum Fluorescent (VFD), and the like have been developed in recent years in response to the demand for display devices. Display) have been studied, and some of them have already been used as display devices in various devices.

Among them, LCD is the most widely used as the substitute for CRT (Cathode Ray Tube) for mobile image display device because of its excellent image quality, light weight, thinness, and low power consumption. In addition to the use of the present invention has been developed in various ways such as a television and a computer monitor for receiving and displaying broadcast signals.

In order to use such a liquid crystal display as a general screen display device in various parts, it is a matter of how high quality images such as high definition, high brightness and large area can be realized while maintaining the characteristics of light weight, thinness and low power consumption. Can be.

The general liquid crystal display device is comprised from the 1st board | substrate and the 2nd board | substrate bonded by the fixed space, and the liquid crystal layer injected between the said 1st board | substrate and the 2nd board | substrate.

In more detail, the first substrate has a plurality of gate lines in one direction and a plurality of data lines at regular intervals in a direction perpendicular to the gate line to define a pixel area. A pixel electrode is formed in each of the pixel regions, and a thin film transistor is formed at a portion where the gate line and the data line cross each other, and the data signal of the data line is applied to each pixel electrode according to a signal applied to the gate line. To apply.

In addition, a black matrix layer is formed on the second substrate to block light in portions other than the pixel region, and R, G, and B color filter layers are formed on portions corresponding to the pixel regions. The common electrode is formed on the color filter layer to implement an image.

In the liquid crystal display as described above, the liquid crystal of the liquid crystal layer formed between the first and second substrates is aligned by an electric field between the pixel electrode and the common electrode, and the light passes through the liquid crystal layer according to the degree of alignment of the liquid crystal layer. You can express the image by adjusting the amount of.

Such a liquid crystal display is called a twisted nematic (TN) mode liquid crystal display, and the TN mode liquid crystal display has a disadvantage of having a narrow viewing angle. Switching mode liquid crystal display device has been developed.

In the transverse electric field (IPS) mode liquid crystal display, a pixel electrode and a common electrode are formed parallel to each other at a predetermined distance in a pixel area of the first substrate so that a transverse electric field (horizontal electric field) is generated between the pixel electrode and the common electrode. The liquid crystal layer is aligned by the lateral electric field.

Meanwhile, spacers are formed between the first and second substrates of the liquid crystal display device formed as described above to maintain a constant gap between the liquid crystal layers.

Such spacers are divided into ball spacers or column spacers according to their shape.

The ball spacer has a spherical shape, is distributed and manufactured on the first and second substrates, the movement is relatively free even after the bonding of the first and second substrates, and the contact area with the first and second substrates is small.

On the other hand, the column spacer is formed in an array process on the first substrate or the second substrate, and is fixed in a pillar shape having a predetermined height on the predetermined substrate. Therefore, the contact area with the 1st, 2nd board | substrate is relatively large compared with a ball spacer.

Hereinafter, a liquid crystal display having a conventional column spacer will be described with reference to the accompanying drawings.

1 is a cross-sectional view illustrating a liquid crystal display including a column spacer.

As shown in FIG. 1, a liquid crystal display including a column spacer includes a column spacer formed between a first substrate 30 and a second substrate 40 facing each other, and the first and second substrates 30 and 40. And a liquid crystal layer (not shown) filled between the 20 and the first and second substrates 30 and 40.

On the first substrate 30, the gate lines 31 and the data lines (not shown) are arranged perpendicularly to each other to define pixel regions, and the gate lines 31 and the data lines cross each other. A thin film transistor TFT is formed, and a pixel electrode (not shown) is formed in each pixel area.

The black matrix layer 41 is formed on the second substrate 40 to correspond to an area except the pixel area, and the color filter layer 42 on the stripe corresponding to the pixel areas on the vertical line parallel to the data line is formed. The common electrode or overcoat layer 43 is formed on the front surface.

Here, the column spacer 20 is formed corresponding to a predetermined position on the gate line 31.

In addition, a gate insulating layer 36 is formed on the entire surface of the substrate including the gate line 31 on the first substrate 30, and a passivation layer 37 is formed on the gate insulating layer 36.

2A and 2B are plan and cross-sectional views illustrating a touch failure of a liquid crystal display including a column spacer.

As shown in FIGS. 2A and 2B, when the liquid crystal display device including the above-described conventional column spacer touches the surface of the liquid crystal panel 10 in a predetermined direction using a hand or other object, the touched portion Stain occurs at Such spots are referred to as touch spots, which are called touch spots, and are also referred to as touch defects because spots are observed on the screen.

Such a touch failure is considered to be large because the contact area between the column spacer 20 and the first substrate 1 facing the column spacer 20 is larger than the structure of the previous ball spacer. That is, since the column spacer 20 formed in a cylindrical shape compared to the ball spacer has a large contact area with the first substrate 1 as shown in FIG. 2B, the first and second substrates 1 and 2 are touched. After the liver is shifted, it takes a long time to restore to the original state, so the stain remains until the original state is restored.

3 is a cross-sectional view illustrating a liquid crystal display device in which gravity failure occurs.

As shown in FIG. 3, the liquid crystal 3 is filled between the first and second substrates 1 and 2 facing each other, and the liquid crystal in which the column spacer 20 is formed at a predetermined portion between the first and second substrates. When the display device is in a standing state and is in a high temperature environment, when the liquid crystal is thermally expanded and the cell gap increases according to the height of the column spacer 20, the liquid crystal 3 flows to the lower end and the lower end is bulged. The visible gravity failure is observed.

The conventional liquid crystal display including the column spacer has the following problems.

First, since the contact area between the column spacer and the opposing substrate is large, when the substrate is shifted during the touch due to the large frictional force, it takes a long time to recover to the original state, and touch failure is observed during the restoration time.

Second, when the liquid crystal panel including the column spacer is upright, when it is placed in a high temperature environment, thermal expansion of the liquid crystal occurs. The phenomenon of visual opacity is observed.

The present invention has been made in order to solve the above problems, a liquid crystal display device and a method of manufacturing the same to improve the defects by making a groove on the surface of the column spacer corresponding to the lower substrate and strengthening the fastening with the lower substrate through the groove To provide it, its purpose is.

In order to achieve the above object, a liquid crystal display of the present invention includes a first substrate and a second substrate facing each other, a gate line and a data line crossing each other on the first substrate to define a pixel region, and the first substrate. A first surface formed on the second substrate corresponding to the stepped portion on the first substrate, the first surface corresponding to the stepped portion being larger than the corresponding surface of the stepped portion, and having a groove into which the step enters the first surface; It is characterized in that it comprises one column spacer and a liquid crystal layer formed between the first substrate and the second substrate.

The groove is formed larger than the protrusion.

The groove is cross-shaped.

In addition, the liquid crystal display device of the present invention for achieving the same object includes a first substrate and a second substrate facing each other, a gate line and a data line crossing the first substrate to define a pixel region, A thin film transistor formed at a common line parallel to the gate line, an intersection of the gate line and the data line, a pixel electrode formed at the pixel region, a protrusion formed on the gate line or the common line, and corresponding to the protrusion A first column spacer formed on a second substrate, the first surface corresponding to the protrusion being larger than the corresponding surface of the protrusion, and having a groove into which the protrusion enters the first surface; and the first substrate and the second substrate. Another feature is that the liquid crystal layer is formed between the substrates.

The thin film transistor may include a gate electrode protruding from the gate line, a source electrode protruding from the data line, a drain electrode spaced apart from the source electrode by a predetermined distance, and an upper portion of the gate electrode and a lower portion of the source / drain electrode. And a semiconductor layer contacting the source electrode and the drain electrode to form a channel between the source electrode and the drain electrode.

The protrusion is formed by stacking a semiconductor layer pattern of the same layer as the semiconductor layer and a source / drain metal layer of the same layer as the source / drain electrode.

The groove is formed larger than the protrusion.

The groove is cross-shaped.

The pixel region further includes a common electrode alternate with the pixel electrode.

The common electrode and the common line are connected to each other.

A second column spacer is further included on the second substrate to correspond to a predetermined portion of the gate line or the common line where the protrusion is not formed.

A compensation pattern is further provided on a gate line or a common line on the first substrate corresponding to the second column spacer.

The compensation pattern is formed to a lower thickness than the protrusion.

In addition, the liquid crystal display device of the present invention for achieving the same object includes a first substrate and a second substrate facing each other, a gate line and a data line crossing the first substrate to define a pixel region, and the gate A common line formed in parallel with the line, a thin film transistor formed at an intersection of the gate line and the data line, a pixel electrode formed in the pixel region, a protrusion formed on the gate line or the common line, and corresponding to the protrusion A first column spacer formed on a second substrate, a compensation pattern formed on a gate line or a common line on which the protrusion is not formed, and a compensation pattern formed on the second substrate corresponding to the compensation pattern; In response, the corresponding first surface is larger than the corresponding surface of the compensation pattern, and the compensation pattern enters the first surface. Having a groove has its features in the yirueojim a liquid crystal layer formed between the second column spacer and the first and second substrates.

The thin film transistor may include a gate electrode protruding from the gate line, a source electrode protruding from the data line, a drain electrode spaced apart from the source electrode by a predetermined distance, and an upper portion of the gate electrode and a lower portion of the source / drain electrode. And a semiconductor layer contacting the source electrode and the drain electrode to form a channel between the source electrode and the drain electrode.

The protrusion is formed by stacking a semiconductor layer pattern of the same layer as the semiconductor layer and a source / drain metal layer of the same layer as the source / drain electrode.

The compensation pattern is formed of a semiconductor layer pattern on the same layer as the semiconductor layer.

The groove is formed larger than the compensation pattern.

The groove is cross-shaped.

The pixel region further includes a common electrode alternate with the pixel electrode.

The common electrode and the common line are connected to each other.

In addition, the manufacturing method of the liquid crystal display device of the present invention for achieving the same object comprises the steps of preparing a first substrate and a second substrate, forming a step on the first substrate, and on the second substrate Forming a column spacer having a groove in which a step may enter at a position corresponding to the step of the first substrate, dropping a liquid crystal onto any one of the first substrate and the second substrate, and It is characterized in that it comprises the step of bonding the first and second substrate.

The forming of the column spacer may include applying a negative photosensitive material to the entire surface of the second substrate, a light blocking portion at a portion where the column spacer is not formed, a semi-transmissive portion at a portion where the groove corresponds, In the column spacer forming portion, a mask in which a transmission portion is defined is corresponded to an upper portion of the negative photosensitive material, and a column spacer is formed by exposing and developing the negative photosensitive material by using the mask.

The forming of the column spacer may include applying a positive photosensitive material to the entire surface of the second substrate, a transmissive portion in a portion where the column spacer is not formed, a semi-transmissive portion in a portion where the groove corresponds, and excluding a groove. The remaining column spacer forming portion may correspond to a mask having a light blocking portion defined on the positive photosensitive material, and exposing and developing the positive photosensitive material by using the mask to form column spacers.

The mask is a halftone mask.

The mask is a diffraction exposure mask.

Hereinafter, a liquid crystal display and a manufacturing method thereof according to the present invention will be described in detail with reference to the accompanying drawings.

FIG. 4A is a cross-sectional view schematically illustrating the protrusion structure of the liquid crystal display of the present invention, and FIG. 4B is a cross-sectional view illustrating a state in which the protrusion and the column spacer of FIG. 4A correspond to each other.

As shown in FIG. 4A, the liquid crystal display of the present invention including the protrusion structure includes a first substrate 60 and a second substrate 70 facing each other, and a column spacer 80 formed at a predetermined portion on the first substrate 60. ), Protrusions 85 formed on the second substrate 70 and the first and second substrates to have a relatively smaller volume than the column spacers 80 and to partially contact the column spacers 80. It includes a liquid crystal layer (not shown) filled between (60, 70).

As such, when the protrusion 85 is included, the first substrate 60 or the second substrate 60 may be touched when the surface of the first substrate 60 or the second substrate 70 is touched (or rubbed in one direction). When the substrate 70 is shifted relative to the counter substrate, the contact area between the column spacer 80 and the protrusion 85 is formed on the upper surface of the column spacer 80 (the first substrate 60 on which the column spacer is formed). In this case, the surface corresponding to the column spacer on the surface of the first substrate 60 is reduced to the upper area of the relatively small protrusions 85 as compared to the lower surface. The friction force between the column spacer 80 and the second substrate 70 that is the opposite substrate is reduced. Therefore, when the first substrate 60 or the second substrate 70 is pushed in one direction by the touch, restoration to the original state is easy.

As shown in FIG. 4B, a color filter array including a black matrix layer 61 and a color filter layer 62 is formed on the first substrate 60, and the column spacer 80 is disposed on a predetermined portion of the color filter layer 62. Is formed. Here, the color filter array may further include an overcoat layer (not shown).

On the second substrate 70, a gate line 71 and a data line (not shown) that cross each other to define a pixel area and a gate formed on the entire surface of the second substrate 70 including the gate line 71. An insulating film 72 and protrusions 85 and the like formed on a portion of the column spacer are formed on the gate line 71. Although not shown, a pixel electrode (not shown) is formed in the pixel region, and a thin film transistor (not shown) is formed at an intersection of the gate line 71 and the data line, and the data line and the pixel electrode are formed. A protective film 73 is further formed between the layers. In this case, the protrusion 85 is formed of a stack of a semiconductor layer pattern 85a and a source / drain metal pattern 85b.

In the structure including the protrusions 85, when the first and second substrates 60 and 70 are bonded to each other, the change of the shape of the column spacer 80 corresponding to the protrusions 85 will be described. The force is concentrated only at the portion corresponding to the protrusion 85, and thus the color filter layer 62 and the black matrix layer 61, which are lower layers including the column spacer 80, are pressed together. As such, when a single or a plurality of layers are pressed, when the cell gap is increased by thermal expansion of the liquid crystal when the liquid crystal panel is placed in a high temperature environment, the column spacer 80 and the following layers are pressed again to the extent that the layers are pressed. It can be restored to the original state and can support between the first and second substrates 60 and 70, so that the gravity failure caused by the liquid crystal sag downward can be improved as compared to the structure without the projections.

However, in the case of using a projection having a small volume and surface area corresponding to the center of the column spacer having such a shape, when the column spacer and the lower layers are pressed by the projection, the projection 85 corresponds to the column spacer 80. If the part of the intensive force is applied, and the contact pressure between the first and second substrates 60 and 70 becomes excessive at the time of contact (when the pressing force on the rear surface of one of the first and second substrates is excessive) ), The column spacer 80 is pressed by the protrusions 85 and deforms, which does not return to its original state.

The pressing operation may be performed in a separate pressing test before the release of the liquid crystal display, or may be performed in an assembly process of assembling the liquid crystal display module.

Hereinafter, the liquid crystal display of the present invention having durability against pressing pressure and a method of manufacturing the same will be described in more detail with reference to the accompanying drawings.

FIG. 5 is a plan view illustrating the liquid crystal display of the present invention, and FIG. 6 is a cross-sectional view illustrating the thin film transistor region and the first and second column spacers of FIG. 5.

5 and 6, the liquid crystal display of the present invention is largely filled between the first substrate 100 and the second substrate 200 facing each other, and the first and second substrates 100 and 200. The liquid crystal layer 250 is formed.

On the first substrate 100, a thin film transistor TFT formed at an intersection of the gate line 101 and the data line 102 and the gate line 101 and the data line 102 that cross each other to define a pixel area. ), A first storage electrode 103a electrically connected to the drain electrode 102b of the thin film transistor TFT, a pixel electrode 103 branched from the first storage electrode 103a, and the pixel electrode. A branched common electrode 104 alternated with 103, and a common line formed in the pixel area in parallel with and adjacent to the inlet gate line 101 and the front gate line (not shown), respectively; And a second storage electrode 104b connected to the common lines 104a and 104c and the common lines 104 and the common electrode 104 and overlapping the first storage electrode 103a.

In this case, the thin film transistor TFT is defined in a region between a source electrode 102a and a drain electrode 102b having a 'U' shape, and the channel is formed along the inside of the shape of the source electrode 102a. It is defined as U '. The thin film transistor TFT includes a gate electrode 101a protruding from the gate line 101, a 'U' source electrode 102a protruding from the data line 102, and the 'U'. The drain electrode 102b is formed to be spaced apart from the female source electrode 102a by a predetermined interval and enters into the 'U'-shaped source electrode 102a. Further, a semiconductor layer (107a of FIG. 6) is further disposed below the data line 102, the source electrode 102a, the drain electrode 102b, and the channel region between the source electrode 102a and the drain electrode 102b. Is formed. Here, the semiconductor layer is formed of a laminate of an amorphous silicon layer (not shown) and an n + layer (impurity layer) (not shown) from below, and corresponds to a region between the source electrode 102a and the drain electrode 102b. In the channel region, the n + layer (impurity layer) is removed. The semiconductor layer may be selectively formed only under the source / drain electrodes 102a and 102b and the region therebetween, or the data line 102, the source electrode 102a and the region except for the channel region. It may be formed under the drain electrode 102b. Meanwhile, as illustrated, the shape of the source electrode 102a is 'U', and the liquid crystal display having the 'U' channel has been described. However, the liquid crystal display of the present invention is the source electrode 102a. May be formed to protrude from the data line 102 in a '-' shape, or may be formed in other shapes.

The gate line 101, the common lines 104a and 104c, and the common electrode 104 are formed of the same metal on the same layer.

A gate insulating film 105 is interposed between the gate line 101 and the semiconductor layer, and a protective film 106 is interposed between the data line 102 and the pixel electrode 103.

Meanwhile, the second storage electrode 104b connected to the common line 104a passing through the pixel region, the first storage electrode 103a formed thereon, and the gate insulating layer 105 and the passivation layer interposed between the two electrodes. 106 constitutes a storage capacitor.

Here, the drain electrode 102b and the first storage electrode 103a formed between the different layers may be contact holes 106a formed by removing the passivation layer 106 on an upper portion of the drain electrode 102b. Contact via).

In addition, a predetermined portion on the gate line 101 or the common lines 104a and 104c is the same as the semiconductor layer pattern 120a and the source / drain electrodes 102a and 102b of the same layer as the semiconductor layer 107a. A protrusion 120 in which the source / drain metal layer 120b of the layer is stacked is formed.

Here, the thickness of the semiconductor layer pattern 120a is about 0.2 to 0.3 μm, and the thickness of the source / drain metal layer 120b is about 0.2 to 0.4 μm, and the remaining gate lines 101 on which the protrusion 120 is not formed are formed. The step where the protrusion 120 is formed as compared to the site on the step) is formed about 0.4 ~ 0.7㎛. The liquid crystal display including the protrusions 120 may include a first column spacer formed on the protrusions 120 and the second substrate 200 when the first and second substrates 100 and 200 are bonded to each other to form a cell gap. 210 corresponds. At this time, the upper surface of the protrusion 120 is relatively the upper surface of the first column spacer 210 (in this case, the first column spacer 210 formed on the second substrate 200) 2, the surface corresponding to the substrate 200 is assumed to be a lower surface. 1 The column spacer 210 and the protrusion 120 are in contact with each other.

Here, a passivation layer 106 formed in the remaining region except for the contact hole 106a is further disposed on the protrusion 120 to contact the first column spacer 210 formed on the second substrate 200. The portion to be corresponds to the protective layer 106 on the protrusion 120.

On the other hand, on the second substrate 200 facing the first substrate 100, a black matrix layer 201 formed corresponding to a region (gate line and data line region) except for the pixel region, and the second substrate An overcoat layer 203 for planarization is formed on the color filter layer 202 formed on the 200 and the second substrate 200 including the black matrix layer 201 and the color filter layer 202.

The first column spacer 210 is formed on the overcoat layer 203 of the portion corresponding to the protrusion 120, and the portion corresponding to the gate line 101 of the predetermined portion where the protrusion 120 is not formed. The second column spacer 220 is formed on the overcoat layer 203.

Here, the first column spacer 210 and the second column spacer 220 are formed at the same height on the overcoat layer 203.

The second column spacer 220 may reduce the contact area by reducing the contact area due to the effect of contacting the first column spacer 210 with the protrusion 120 with a small contact area. In this case, because the characteristics are poor against the pressing, it is placed to improve the pressing characteristics. The second column spacer 220 is protruded when a predetermined pressure or more is applied to the rear surfaces of the first and second substrates 100 and 200 in a pressing test or a module process. After contact with the 120, the second column spacer 220 corresponds to a predetermined portion of the gate line 101 or the common lines 104a and 104c in which the protrusions 120 are not formed, before being severely changed. To disperse the pressure.

At this time, since the step between the gate line 101 or the common lines 104a and 104c and the protrusion 120 where the protrusion 120 is not formed is about 0.4 to 0.7 μm, the first column spacer when pressed After the contact between the 210 and the protrusion 120, the plastic deformation of the first column spacer 210 may occur severely before the second column spacer 220 contacts the first substrate 100. To prevent this, a compensation pattern 107b is further formed on the gate line 101 or the common lines 104a and 104c to which the second column spacer 210 corresponds. In this case, the compensation pattern 107b is made of the same material as the semiconductor layer 107a. Therefore, when the first column spacer 210 is pressed by the thickness of the source / drain metal layer 120b of the protrusion 120 when pressed, the first and second column spacers 210 and 220 are first pressed. The second column spacer 220 may be in contact with the upper surface of the substrate 100 to distribute the pressure concentrated on the first column spacer 210 to prevent plastic deformation.

Meanwhile, the first and second column spacers 210 and 220 may be formed in various shapes such as a polygonal shape such as a circular cross section or a square. In consideration of the alignment margin in the process, it may be advantageous to form a circular or regular polygon.

First Embodiment

Hereinafter, the structure of preventing the defects more effectively by changing the shape of the upper surfaces of the first and second column spacers will be described.

FIG. 7 is a cross-sectional view of a liquid crystal display according to a first exemplary embodiment of the present invention, and FIG. 8 is a plan view when the column spacer of FIG. 7 is viewed from below.

7 and 8, in the liquid crystal display according to the first exemplary embodiment, the groove 240a is formed in the upper surface (the surface corresponding to the first substrate 100) of the second column spacer 240. Same as shown in Figure 6 except for the provided.

The second column spacer 240 may have a groove 240a through which the compensation pattern 107b may enter, corresponding to the compensation pattern 107b formed at a predetermined portion of the gate line 101 or the common lines 104a and 104c. When the pressure at the time of pressing is severe, the compensation pattern 107b is inserted into the groove 240a provided in the second column spacer 240 so that the second column spacer 240 Plastic deformation can be minimized.

FIG. 8 illustrates a top view of the second column spacer 240 viewed from below. A cross groove 24a is formed on the top surface of the second column spacer 240, and a pressing pressure is illustrated in FIG. In this severe case, the stepped portion formed by the compensation pattern 107b on the compensation pattern 107b in the cross-shaped groove 240a corresponds to the inside of the groove 240a. In this case, when pressed, the second column spacer 240 is inserted into the groove 240a in which the second column spacer 240 is already provided, thereby minimizing plastic deformation of the second column spacer 240. The compensation pattern 107b and the second column spacer 240 correspond to each other.

FIG. 7 illustrates a case in which a cell gap is formed during bonding, and the first and second column spacers 210 and 240 are pressed when the pressing pressure is applied during the actual pressing test.

In the structure of the liquid crystal display according to the first exemplary embodiment of the present invention, only the first column spacer 210 may be formed on the first substrate 100, that is, on the protrusion 120. In contact with each other, an area corresponding to the upper surface of the protrusion 120 is brought into contact. Therefore, since the contact area at the time of touch is small, restoration to the original state is easy after the shift between the first and second substrates 100 and 200 by touch.

On the other hand, the shape of the groove 240a is formed larger than the compensation pattern 107b, and as shown, it can be deformed into various shapes that can be cross-shaped or left and right up and down shift.

Second Embodiment

9 is a cross-sectional view illustrating a column spacer and protrusions corresponding thereto in the liquid crystal display according to the second exemplary embodiment of the present invention. 10 is a cross-sectional view illustrating a liquid crystal display according to a second exemplary embodiment of the present invention, FIG. 11 is a plan view when the column spacer of FIG. 10 is viewed from below, and FIG. 12 is a projection and a corresponding column of FIG. 10. A cross-sectional view showing the spacer in detail.

As shown in FIG. 9, the liquid crystal display according to the second exemplary embodiment of the present invention includes a groove 230a formed on an upper surface of the first column spacer 230 formed to correspond to a portion where the protrusion 120 is formed. The step formed by the 120 is a structure corresponding to the inside of the groove 230a. In this structure, the protrusion 120 is fitted into the groove 230a of the first column spacer 230 when the first substrate 100 and the second substrate 200 are bonded to each other.

In this case, the first column spacer 230 is holding the protrusion 120 when a touch of pushing or sweeping one of the first substrate 100 and the second substrate 200 in one direction is performed. Due to the shift of the first substrate 100 or the second substrate 200 is not easy.

In FIG. 9, a black matrix layer 201 and a color filter layer 202 are formed under the column spacer 230. Although omitted in the drawing, an overcoat layer (not shown) may be further formed on the color filter layer 202 and under the first column spacer 230.

The protrusion 120 is formed on a predetermined portion of the gate line 101 or the common line (refer to 104a and 104c in FIG. 5), and the semiconductor layer pattern 120a and the source / drain metal layer 120b are sequentially formed from below. These are stacked on each other.

The liquid crystal display according to the second exemplary embodiment of the present invention differs in that the grooves are provided in the first column spacer in the liquid crystal display shown in FIG. 6, and the remainders are the same. Mark it.

As shown in FIG. 10, the liquid crystal display according to the second exemplary embodiment of the present invention may be formed inside the groove 230a in the first column spacer 230 when the first and second substrates 100 and 200 are bonded to each other. The upper protective layer 106 of the protrusion 230a corresponds to enter. In this bonding, the second column spacer 220 is maintained at a distance from the upper portion of the first substrate 100, that is, the passivation layer 106.

When the second column spacer 220 is touched, as shown in FIG. 11, the groove of the first column spacer 230 with respect to the second substrate 200 is formed by the first substrate 100 including the protrusion 120. The protrusion 120 may move within the groove 230a, even when a pushing force is applied to the inside of the groove 230a when a touch force is applied. In addition, since the contact with the area corresponding to the upper surface of the protrusion 120 in the groove 230a of the first column spacer 230 when the touch, it is relatively larger than the upper surface of the first column spacer 230 The small area makes it easy to restore the original state. Therefore, the shift between the first and second substrates 100 and 200 during touch is not easy, and even if the shift occurs to some extent, the restoration of the original state occurs quickly, thereby minimizing luminance unevenness due to poor touch.

FIG. 12 is a structure in which the overcoat layer 203 is further formed on the color filter layer 202 in the structure of FIG. 9 and corresponds to a groove of the first column spacer 230 to which pressure is applied when pressed. As shown in Fig. 1, the protrusion 120 is completely fitted.

When pressed, as shown in FIGS. 11 and 12, the side portions corresponding to the steps other than the upper surface of the protrusion 120 are also pressed into the grooves 230a of the first column spacer 230 and correspond to each other. Corresponding to the first substrate 100 together with the two column spacers 220, the pressure at the time of pressing may be dispersed, thereby preventing a phenomenon in which some column spacers are plastically deformed by pressing.

13 is a plan view showing a mask for forming the column spacer of the present invention.

As shown in FIG. 13, in the first and second embodiments of the present invention, the mask 300 for forming the column spacer including the groove corresponds to the horizontal cross section of the column spacer, corresponding to the formation portion of the column spacer. A transparent portion 301 is formed. The light blocking portion 303 is provided at a portion where the column spacer is not formed, and a semi-transmissive portion 302 is provided at the portion where the groove in the column spacer is to be formed.

FIG. 13 illustrates a diffraction exposure mask in which a plurality of slits for diffraction exposure are provided in the transflective portion 302, and slits in the transflective portion 302 are formed at intervals lower than the resolution of an exposure apparatus used for exposure. In this case, a portion corresponding to the transflective portion 302 may be relatively exposed to light when the exposure amount is smaller than that of the transmissive portion 301.

When such a mask 300 is applied, the formation process of the column spacer is as follows.

First, before forming a column spacer, a first substrate on which a step such as protrusions and a TFT array are formed, and a second substrate on which a color filter array are formed are prepared.

A negative photosensitive material is coated on the entire surface of the second substrate.

Subsequently, the mask 300 is aligned on the negative photosensitive material, and then the negative photosensitive material is exposed and developed using the mask 300 to form column spacers including grooves.

In this case, the column spacer is formed in a portion corresponding to the transmission portion 301 of the mask 300, the groove is formed in the shape of a cross-shaped semi-transmissive portion 302 inside the transmission portion 301. In this case, a groove is formed in a portion corresponding to the transflective portion 302 having a relatively low exposure amount among the formation portions of the formed column spacers 230 or 240.

The mask 300 may be applied by replacing a halftone mask in which a halftone material is applied to a portion corresponding to the transflective portion 302.

When the column spacer is formed, the negative photosensitive material is replaced with the positive photosensitive material, and when formed, the transmissive part 301 and the light blocking part 303 of the mask are inverted.

This method of forming the column spacer is used when forming the second column spacer 240 of the first embodiment or the first column spacer 230 of the second embodiment.

After the formation of the first or second column spacers 230 or 240, a liquid crystal is dropped on one of the first substrate 100 and the second substrate 200, and then the liquid crystal is not dropped. After inverting, the two substrates are bonded together.

The liquid crystal display device described above and a manufacturing method thereof relate to a transverse electric field type liquid crystal display device. Herein, the liquid crystal display and the manufacturing method using the column spacer having the groove of the present invention are not limited to the transverse electric field mode, but may also be applied to the twisted nematic (TN) mode.

In the TN mode, the pixel electrode and the common electrode do not alternate in the pixel area on the first substrate, and only the pixel electrode is formed. And the remainder of the same or similar structure.

In the first and second embodiments, a structure in which grooves correspond to an upper surface of any one of the first and second column spacers has been described. However, in order to more effectively prevent plastic deformation during pressing, For example, grooves may be provided on both the upper surface of the first column spacer corresponding to the protrusion and the upper surface of the second column spacer corresponding to the compensation pattern.

The liquid crystal display of the present invention as described above and a method of manufacturing the same have the following effects.

First, by applying a protruding structure to a portion corresponding to a predetermined first column spacer, the contact area between the first column spacer and the corresponding substrate can be reduced, thereby reducing the contact area at the time of touch and the original state after pushing by the touch. It is easy to restore the furnace. Therefore, it is possible to prevent luminance unevenness due to touch.

Second, in order to prevent plastic deformation of the first column spacer in a pressing test, etc., when applying the first column spacer corresponding to the protrusion when the protrusion structure is applied to prevent the touch failure, the substrate is spaced apart from the corresponding substrate. If further pressure is applied, a further second column spacer capable of contacting the corresponding substrate is further provided. As a result, since the step where the protrusion is formed is larger than the other part where the protrusion is not formed, a compensation pattern having a lower height than the protrusion is further formed on the first substrate corresponding to the second column spacer to be formed separately. When the second column spacer is pressed by the compensation pattern, the first column spacer corresponds to the upper part of the compensation pattern before plastic deformation by pressing pressure, thereby dispersing the pressure during pressing, thereby firing the first and second column spacers. The deformation can be prevented.

Third, a groove is provided in the upper surface (protrusion contact surface) of the first column spacer of the portion corresponding to the projection, so that the projection is fitted in the first column spacer groove when the bonding is performed, and the first and second by touch. It prevents the occurrence of the board-to-substrate structurally prevents touch failure. In this case, when pressed, the first column spacer is also in contact with the first column spacer on the upper surface and the side surface of the protrusion having the groove, and further, the second column spacer can be contacted with the corresponding substrate. Compared with the structure having only the second column spacer for preventing the pressing, the contact area during the pressing can be further increased to prevent plastic deformation of the column spacer during the pressing.

Fourth, a groove is formed in the upper surface (compensation pattern contact portion) of the second column spacer of the portion corresponding to the compensation pattern, so that the compensation pattern corresponds to the groove when pressed by the pressing, so that the compensation pattern into the previously provided groove This can be counteracted to minimize deformation of the column spacer.

Claims (26)

A first substrate and a second substrate facing each other; A gate line and a data line crossing each other on the first substrate to define a pixel area; A groove formed on the second substrate corresponding to the stepped portion on the first substrate, the first surface corresponding to the stepped portion being larger than the corresponding surface of the stepped portion, and the stepped portion entering the first surface; A first column spacer provided; And And a liquid crystal layer formed between the first substrate and the second substrate. The method of claim 1, The groove is formed larger than the step portion. 3. The method of claim 2, And the groove is cross-shaped. A first substrate and a second substrate facing each other; A gate line and a data line crossing each other on the first substrate to define a pixel area; A common line parallel to the gate line; A thin film transistor formed at an intersection of the gate line and the data line; A pixel electrode formed in the pixel area; A protrusion formed on the gate line or the common line; A first column spacer formed on the second substrate corresponding to the protrusion, the first surface corresponding to the protrusion being larger than the corresponding surface of the protrusion, and having a groove into which the protrusion enters the first surface; And And a liquid crystal layer formed between the first substrate and the second substrate. 5. The method of claim 4, The thin film transistor is A gate electrode protruding from the gate line; A source electrode protruding from the data line; A drain electrode spaced apart from the source electrode at a predetermined interval; And And a semiconductor layer formed over the gate electrode and under the source / drain electrode, the semiconductor layer being in contact with the source electrode and the drain electrode to form a channel between the source electrode and the drain electrode. 6. The method of claim 5, And the protrusion is formed by stacking a semiconductor layer pattern of the same layer as the semiconductor layer and a source / drain metal layer of the same layer as the source / drain electrode. 5. The method of claim 4, And the groove is larger than the protrusion. 8. The method of claim 7, And the groove is cross-shaped. 6. The method of claim 5, The pixel area further includes a common electrode alternate with the pixel electrode. 10. The method of claim 9, And the common electrode and the common line are connected to each other. 5. The method of claim 4, And a second column spacer on the second substrate corresponding to a predetermined portion of the gate line or the common line where the protrusion is not formed. 12. The method of claim 11, And a compensation pattern on a gate line or a common line on the first substrate corresponding to the second column spacer. 13. The method of claim 12, And the compensation pattern is formed to have a thickness lower than that of the protrusion. A first substrate and a second substrate facing each other; A gate line and a data line crossing each other on the first substrate to define a pixel area; A common line formed in parallel with the gate line; A thin film transistor formed at an intersection of the gate line and the data line; A pixel electrode formed in the pixel area; A protrusion formed on the gate line or the common line; A first column spacer formed on the second substrate corresponding to the protrusion; A compensation pattern formed on the gate line or the common line where the protrusion is not formed; The first surface corresponding to the compensation pattern is formed on the second substrate, and the first surface corresponding to the compensation pattern is larger than the corresponding surface of the compensation pattern, and the groove includes a groove into which the compensation pattern enters. Second column spacer; And And a liquid crystal layer formed between the first substrate and the second substrate. 15. The method of claim 14, The thin film transistor is A gate electrode protruding from the gate line; A source electrode protruding from the data line; A drain electrode spaced apart from the source electrode at a predetermined interval; And And a semiconductor layer formed over the gate electrode and under the source / drain electrode, the semiconductor layer being in contact with the source electrode and the drain electrode to form a channel between the source electrode and the drain electrode. 16. The method of claim 15, And the protrusion is formed by stacking a semiconductor layer pattern of the same layer as the semiconductor layer and a source / drain metal layer of the same layer as the source / drain electrode. 16. The method of claim 15, The compensation pattern is a liquid crystal display device comprising a semiconductor layer pattern of the same layer as the semiconductor layer. 15. The method of claim 14, And the groove is formed larger than the compensation pattern. 19. The method of claim 18, And the groove is cross-shaped. 15. The method of claim 14, The pixel area further includes a common electrode alternate with the pixel electrode. The method of claim 20, And the common electrode and the common line are connected to each other. Preparing a first substrate and a second substrate; Forming a step on the first substrate; Forming a column spacer on the second substrate, the column spacer having a groove in which a step may enter at a position corresponding to the step of the first substrate; Dropping liquid crystal onto any one of the first substrate and the second substrate; And And bonding the first and second substrates together. 23. The method of claim 22, Forming the column spacer Applying a negative photosensitive material to the entire surface of the second substrate; Mapping a mask having a light shielding portion to a portion where the column spacer is not formed, a transflective portion to a portion corresponding to the groove and a transmissive portion to a portion of the column spacer forming portion except for the groove, on the upper portion of the negative photosensitive material; And forming a column spacer by exposing and developing the negative photosensitive material by using the mask. 23. The method of claim 22, Forming the column spacer Applying a positive photosensitive material to the entire surface of the second substrate; Mapping a mask having a transmissive portion to a portion where the column spacer is not formed, a transflective portion to a portion to which the groove corresponds, and a light shielding portion to a portion of the column spacer forming portion except for the groove, on the positive photosensitive material; And exposing and developing the positive photosensitive material using the mask to form column spacers. The method according to claim 23 or 24, And said mask is a halftone mask. The method according to claim 23 or 24, The mask is a method of manufacturing a liquid crystal display device, characterized in that the diffraction exposure mask.

Images