KR101192772B1 - Liquid Crystal Display Device and Method for Manufacturing the Same - Google Patents

Abstract

The present invention relates to a liquid crystal display device and a method of manufacturing the same, which realizes a touch failure and a depression failure simultaneously by implementing a separation distance between the column spacers formed on the second substrate and the first substrate in three or more steps. The liquid crystal display of the first and second substrates facing each other, and the first to n-1 (n is formed on the first substrate or the second substrate from the highest height to the lowest height in order from each other) 3 or more natural numbers) The first stepped portion corresponding to the stepped portion, the first stepped portion, the first column spacer contacting the first and second substrates, the remaining stepped portion (s) except the first stepped portion, and the stepped portions Second to n-th column spacers and the first substrate formed on the same height as the first column spacer on either one of the first substrate and the second substrate to correspond to a non-flat region. The yirueojim characterized by including a liquid crystal layer filled between the two substrates.

Column spacer, bad touch, bad press, paint stain, triple step

Description

Liquid crystal display device and method for manufacturing the same

1 is a cross-sectional view of an LCD including a column spacer.

2A and 2B are plan and cross-sectional views illustrating a touch failure of a liquid crystal display including a column spacer.

3 is a cross-sectional view showing the protrusion structure of the liquid crystal display of the present invention.

4 is a schematic cross-sectional view showing a liquid crystal display of the present invention.

5 is a plan view illustrating a second substrate of a liquid crystal display according to a first exemplary embodiment of the present invention.

6A and 6B are plan views illustrating structures of the second substrate according to the second and third embodiments of the liquid crystal display of the present invention.

7 is a plan view illustrating a second substrate of a liquid crystal display according to a fourth exemplary embodiment of the present invention.

FIG. 8 is a plan view illustrating a first substrate in which a liquid crystal display according to a first exemplary embodiment of the present invention is implemented in an IPS mode. FIG.

9 is a cross-sectional view of a liquid crystal display according to a first exemplary embodiment of the present invention.

10 is a cross-sectional view showing another form of the liquid crystal display according to the first embodiment of the present invention.

FIG. 11 is a plan view illustrating a first substrate in which a liquid crystal display according to a first exemplary embodiment of the present invention is implemented in a TN mode. FIG.

12 is a plan view illustrating a second substrate of a liquid crystal display according to a fifth exemplary embodiment of the present invention.

13 is a plan view illustrating a first substrate of a liquid crystal display according to a fifth exemplary embodiment of the present invention.

14 is a cross-sectional view of a liquid crystal display according to a fifth exemplary embodiment of the present invention.

15A to 15F are cross-sectional views illustrating a method of manufacturing a structure on a second substrate of the liquid crystal display of the present invention.

Description of the Related Art [0002]

100: first substrate 101: gate line

101a: gate electrode 102: data line

102a: source electrode 102b: drain electrode

103: pixel electrode 104: semiconductor layer

105: gate insulating film 106: protective film

106a: contact hole 107: common line

107a: common electrode 130: protrusion

140: first stepped portion 200: second substrate

201: black matrix layer 202a: first color filter

202b: second color filter 202c: third color filter

202d: Compensation Pattern 203: Overcoat Layer

210: first column spacer 220: second column spacer

230: third column spacer 250: second stepped portion

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display, and in particular, a liquid crystal display and a touch defect, which simultaneously achieve a touch failure and a press failure by implementing a separation distance between the column spacers formed on the second substrate and the first substrate in three or more steps. It relates to a manufacturing method.

(PDP), Electro Luminescent Display (ELD), Vacuum Fluorescent (VFD), and the like have been developed in recent years in response to the demand for display devices. Display) have been studied, and some of them have already been used as display devices in various devices.

Among them, LCD is the most widely used as the substitute for CRT (Cathode Ray Tube) for mobile image display device because of its excellent image quality, light weight, thinness, and low power consumption. In addition to the use of the present invention has been developed a variety of monitors such as television and computer to receive and display broadcast signals.

In order to use such a liquid crystal display as a general screen display device in various parts, it is a matter of how high quality images such as high definition, high brightness and large area can be realized while maintaining the characteristics of light weight, thinness and low power consumption. Can be.

The general liquid crystal display device is comprised from the 1st board | substrate and the 2nd board | substrate bonded by the fixed space, and the liquid crystal layer injected between the said 1st board | substrate and the 2nd board | substrate.

In more detail, the first substrate has a plurality of gate lines in one direction and a plurality of data lines at regular intervals in a direction perpendicular to the gate line to define a pixel area. A pixel electrode is formed in each of the pixel regions, and a thin film transistor is formed at a portion where the gate line and the data line cross each other, and the data signal of the data line is applied to each pixel electrode according to a signal applied to the gate line. To apply.

In addition, a black matrix layer is formed on the second substrate to block light in portions other than the pixel region, and R, G, and B color filter layers are formed on portions corresponding to the pixel regions. The common electrode is formed on the color filter layer to implement an image.

In the liquid crystal display as described above, the liquid crystal of the liquid crystal layer formed between the first and second substrates is aligned by an electric field between the pixel electrode and the common electrode, and the light passes through the liquid crystal layer according to the degree of alignment of the liquid crystal layer. You can express the image by adjusting the amount of.

Such a liquid crystal display is called a twisted nematic (TN) mode liquid crystal display, and the TN mode liquid crystal display has a disadvantage of having a narrow viewing angle. Switching mode liquid crystal display device has been developed.

In the transverse electric field (IPS) mode liquid crystal display, a pixel electrode and a common electrode are formed parallel to each other at a predetermined distance in a pixel area of the first substrate so that a transverse electric field (horizontal electric field) is generated between the pixel electrode and the common electrode. The liquid crystal layer is aligned by the lateral electric field.

Meanwhile, spacers are formed between the first and second substrates of the liquid crystal display device formed as described above to maintain a constant gap between the liquid crystal layers.

Such spacers are divided into ball spacers or column spacers according to their shape.

The ball spacer has a spherical shape, is distributed and manufactured on the first and second substrates, the movement is relatively free even after the bonding of the first and second substrates, and the contact area with the first and second substrates is small.

On the other hand, the column spacer is formed in an array process on the first substrate or the second substrate, and is fixed in a pillar shape having a predetermined height on the predetermined substrate. Therefore, the contact area with the 1st, 2nd board | substrate is relatively large compared with a ball spacer.

Hereinafter, a liquid crystal display having a conventional column spacer will be described with reference to the accompanying drawings.

1 is a cross-sectional view illustrating a liquid crystal display including a column spacer.

As shown in FIG. 1, a liquid crystal display including a column spacer includes a column spacer formed between a first substrate 30 and a second substrate 40 facing each other, and the first and second substrates 30 and 40. 20) and a liquid crystal layer (not shown) filled between the first and second substrates 30 and 40.

On the first substrate 30, the gate lines 31 and the data lines (not shown) are arranged perpendicularly to each other to define pixel regions, and the gate lines 31 and the data lines cross each other. A thin film transistor TFT is formed, and a pixel electrode (not shown) is formed in each pixel area.

The black matrix layer 41 is formed on the second substrate 40 to correspond to an area except the pixel area, and the color filter layer 42 on the stripe corresponding to the pixel areas on the vertical line parallel to the data line is formed. The common electrode or overcoat layer 43 is formed on the front surface.

Here, the column spacer 20 is formed corresponding to a predetermined position on the gate line 31.

In addition, a gate insulating layer 36 is formed on the entire surface of the substrate including the gate line 31 on the first substrate 30, and a passivation layer 37 is formed on the gate insulating layer 36.

2A and 2B are plan and cross-sectional views illustrating a touch failure of a liquid crystal display including a column spacer.

As shown in FIGS. 2A and 2B, when the liquid crystal display device including the above-described conventional column spacer touches the surface of the liquid crystal panel 10 in a predetermined direction using a hand or other object, the touched portion Stain occurs at Such spots are referred to as spot spots generated at the time of touch, and are referred to as touch spots, and are also referred to as touch defects because spots are observed on the screen.

Such a touch failure is considered to be large because the contact area between the column spacer 20 and the first substrate 1 facing the column spacer 20 is larger than the structure of the previous ball spacer. That is, since the column spacer 20 formed in a cylindrical shape compared to the ball spacer has a large contact area with the first substrate 1 as shown in FIG. 2B, the first and second substrates 1 and 2 are touched. After the liver is shifted, it takes a long time to restore to the original state, so the stain remains until the original state is restored. In this case, the liquid crystals (3) are collected at the end portion pushed by the touch during the touch, and the liquid crystals are insufficient until the spots passed during the touch are restored, so that the appropriate amount of liquid crystal is removed from the touch region until the original state is restored. Normal driving is difficult because it does not exist, and in addition, a portion of the black matrix layer that is to be covered by the shift between the substrates at the time of touch may be exposed, resulting in light leakage defects.

The conventional liquid crystal display including the column spacer has the following problems.

First, since the contact area between the column spacer and the opposing substrate is large, when the substrate is shifted during the touch due to the large frictional force, it takes a long time to recover to the original state, and touch failure is observed during the restoration time. In addition, a portion of the black matrix layer to be covered may be exposed so that light leakage defects may be observed.

Second, when the liquid crystal panel including the column spacer is upright, when it is placed in a high temperature environment, thermal expansion of the liquid crystal occurs. The phenomenon of visual opacity is observed.

Third, when the liquid crystal panel including the column spacer is pressed by applying a local region with a predetermined force, staining by pressing occurs at the corresponding region. This is referred to as paint stain, which is more severe when employing a structure for compensating for the touch failure.

The present invention has been made to solve the above problems by implementing a separation distance between the column spacers formed on the second substrate and the first substrate in three or more steps, the liquid crystal display at the same time to achieve the touch failure and the pressing failure It is an object to provide an apparatus and a method of manufacturing the same.

In order to achieve the above object, a liquid crystal display of the present invention includes a first substrate and a second substrate facing each other, and at a different height in order from the highest height to the lowest height on the first substrate or the second substrate. The first to n-1 (n is a natural number of 3 or more) stepped portions, a first column spacer formed to correspond to the first stepped portion, and in contact with the first and second substrates, and the first stepped portion Second to n-th column spacers formed at the same height as the first column spacer on any one of the first substrate and the second substrate, corresponding to the remaining step (s) except for the step portion and the flat region other than the step portions. And a liquid crystal layer filled between the first substrate and the second substrate.

The first to nth column spacers are formed on the second substrate, and the second to nth column spacers are spaced apart from the first substrate.

A thin film transistor array is formed on the first substrate, and a color filter array is formed on the second substrate. In this case, the first to nth stepped portions are formed in the thin film transistor array or the color filter array.

The thin film transistor array includes a gate line and a data line crossing each other to define a pixel region, a pixel electrode formed in the pixel region, and a thin film transistor formed at an intersection of the gate line and the data line, In this case, the thin film transistor is in contact with a gate electrode protruding from the gate line, a source electrode protruding from the data line, a drain electrode spaced apart from the source electrode by a predetermined distance, and both sides of the source electrode and the drain electrode. And a semiconductor layer formed between the source / drain electrodes and the gate electrode.

The first stepped portion may be a portion including any one of the source electrode and the drain electrode, or may be formed at a predetermined portion on the gate line, and may be the same as the data line on the same semiconductor layer pattern and the upper portion of the semiconductor layer. The projections of the laminate of the metal layers formed on the layers may be further defined and defined.

The color filter array may include a black matrix layer formed corresponding to an area excluding the pixel area, a color filter layer including first, second, and third color filters respectively formed to correspond to each of the pixel areas. And a compensation pattern formed on the predetermined portion between the first color filter and the second color filter. In this case, an overcoat layer may be further formed on the compensation pattern to reflect step coverage of the compensation pattern. In this case, the compensation pattern forming portion is any one of the second to n-1 step portions.

The first to nth column spacers are formed on the black matrix layer.

On the other hand, the liquid crystal display of the present invention for achieving the same object, the first substrate and the second substrate facing each other, a first step portion formed to have a first height on the first substrate, and the first step portion A second stepped portion formed to have a second height smaller than the first height on the second substrate facing the unformed portion, a first column spacer formed on the second substrate in contact with the first stepped portion; A second column spacer formed at the same height as the first column spacer on the second substrate in a portion other than the first and second stepped portions, and the second substrate formed on the second substrate in correspondence with the second stepped portions. Another feature is that the third column spacer formed at the same height as the first column spacer and the liquid crystal layer filled between the first substrate and the second substrate.

In addition, the manufacturing method of the liquid crystal display device of the present invention for achieving the same object comprises the steps of preparing a first substrate and a second substrate, and sequentially from the highest height to the low height on the first substrate or the second substrate Forming a first to n-th (n is a natural number of 3 or more) stepped part having different heights, and corresponding to each of the stepped parts and the flat areas other than the stepped parts, any one of the first substrate and the second substrate Forming a first to nth column spacer on the substrate, forming a liquid crystal layer between the first and second substrates, and bonding the first and second substrates to each other. There is this.

The first to n th column spacers are formed on the second substrate.

And forming the thin film transistor array and the color filter array including the first to n-th step portions on the first substrate and the second substrate, respectively.

In addition, a method of manufacturing a liquid crystal display device for achieving the same purpose includes forming a black matrix layer on a predetermined portion on a first substrate, and forming a protrusion corresponding to a predetermined portion of the black matrix layer on a second substrate. And forming first to third color filters of different colors spaced apart from each other on the first substrate, and between the first and second color filters in which the protrusions are not formed. Forming a compensation pattern of the same material as the third color filter on the black matrix layer, a first column spacer corresponding to the protrusion, a second column spacer corresponding to the compensation pattern, the protrusion and the compensation pattern Forming a third column spacer on the second substrate at a predetermined portion on the unformed black matrix layer, between the first and second substrates; It is another feature that comprises the step of forming a liquid crystal layer in the step and bonding the first substrate and the second substrate.

Hereinafter, a liquid crystal display and a manufacturing method thereof according to the present invention will be described in detail with reference to the accompanying drawings.

3 is a cross-sectional view showing the protrusion structure of the liquid crystal display of the present invention.

As shown in FIG. 3, the protrusion structure of the liquid crystal display of the present invention includes a first substrate 60 and a second substrate 70 facing each other, and a column spacer 80 formed at a predetermined portion on the second substrate 70. Projections 85 formed on the first substrate 60 to partially contact the column spacers 80 and have a volume and a corresponding surface relatively smaller than those of the column spacers 80 and the first and first It includes a liquid crystal layer (not shown) filled between the two substrates (60, 70).

As such, when the protrusions 85 are included, the first substrate 60 or the second substrate 60 may be touched when the surface of the first substrate 60 or the second substrate 70 is touched (or rubbed in one direction). When the substrate 70 is shifted relative to the opposing substrate, the contact area between the column spacer 80 and the protrusion 85 is the upper surface of the column spacer 80 (the second substrate 70 having the column spacer formed thereon). In this case, the surface corresponding to the column spacer on the surface of the second substrate 70 is reduced to the upper area of the relatively small protrusions 85 as compared to the lower surface), thereby reducing the friction area. The friction force between the spacer 80 and the first substrate 60, which is the opposing substrate, is reduced, and thus, when the first substrate 60 or the second substrate 70 is pushed in one direction by the touch, it is in an original state. It is easy to restore.

In the structure including the protrusions 85, when the first and second substrates 60 and 70 are bonded to each other, the change of the shape of the column spacer 80 corresponding to the protrusions 85 will be described. Force 80 is concentrated only on the portion corresponding to the projection 85, and thus the color filter array (overcoat layer, color filter layer (not shown) and the black matrix, which are lower layers including the column spacer 80). Layers (not shown) are pressed together. As such, when a single or a plurality of layers are pressed, when the cell gap is increased by thermal expansion of the liquid crystal when the liquid crystal panel is placed in a high temperature environment, the column spacer 80 and the following layers are pressed again to the extent that the layers are pressed. It is possible to restore the original state and stably support the first and second substrates 60 and 70, thereby improving gravity defects caused by sagging of liquid crystals as compared to the structure without protrusions.

However, in the case of using a projection having a smaller volume and surface area than the column spacer having such a shape, when a force for locally pressing a predetermined portion from the outside is applied, the phenomenon in which the column spacer is crushed by the projection of the portion to which the force is applied is observed. Occurs. This is called a badness by pressing and is called a badness, and when such a badness is pressed, the spot where the crushed part is observed black is called a paint stain.

Hereinafter, the liquid crystal display of the present invention having the structure of improving the touch failure and at the same time improving the pressing unevenness which is a problem in the above-described projection structure will be described.

4 is a schematic cross-sectional view showing a liquid crystal display of the present invention.

As shown in FIG. 4, the liquid crystal display of the present invention may be disposed at different portions on the first substrate 100 and the second substrate 200 and the first substrate 100 or the second substrate 200. A plurality of stepped parts (having first and second stepped parts 140 and 250 in FIG. 4) formed at different heights and corresponding to the first stepped part 140 having the highest height among the stepped parts are formed. A first column spacer 210 in contact with both the first substrate 100 and the second substrate 200, and the remaining step portion (s) (second step portion 250) and the first flat substrate other than the step portions And second to nth (n is a natural number of 3 or more, n is 3 is illustrated in FIG. 4) column spacers 220 and 230 formed on the 100 or the second substrate 200.

4 illustrates a case where two stepped parts having different heights are provided (140 and 250), and the first stepped part 140 is formed on the first substrate 100 at a first height H1. The second stepped part 250 is formed on the second substrate 200 to have a third height H3 smaller than the first height H1. Here, the first column spacer 210 is in contact with the first stepped part 140, and the first column spacer 210 is in contact with the first stepped part 140 at the time of bonding to maintain a cell gap. When the bonding is performed, a predetermined portion of a surface corresponding to the protrusion 140 may have a predetermined thickness due to the pressure between the first and second substrates 100 and 200. Accordingly, the second column spacer 220 formed on the flat surface of the second substrate 200 may have the first step by the thickness α in which the first column spacer 210 is pressed by the first step part 140. The height H1 of the part 140 is spaced apart from the first substrate 100 by a distance H2 = H1-α minus the pressed thickness α.

In addition, the third column spacer 230 is formed at a position relatively higher than the second column spacer 220 by the height of the second stepped portion H2, so that the third column spacer 230 and the The separation distance between the first substrates 100 corresponds to H2-H3.

As shown in FIG. 4, the stepped part may be provided with two or more. Even when three or more stepped portions are provided, the heights of the stepped portions are different from each other. As a result, the column spacers corresponding to the high stepped portions to the lower stepped portions are pressed when the surface of the first and second substrates 100 and 200 are pressed. The first substrate 100, which is an opposing substrate, comes into contact with each other, so that each column spacer is shared to take care of cell gaps without severely changing the shape of the column spacers when pressed.

As such, the column spacers having a plurality of stepped portions and formed on the first or second substrates 100 and 200 of the flat portions other than the stepped portions and the stepped portions may be formed of the first substrate 100 and the second substrate 200. In the case of bonding between them, they are either contacted with each other on the opposing substrate (the first substrate in FIG. 5) or spaced apart from each other.

Due to the difference in the degree of opposition of the opposing substrate (the first substrate 100 on the drawing) between the column spacers (the opposing substrate contact or the separation distance from the opposing substrate), the first column spacer among the column spacers when bonded Since only 210 is in contact with both of the substrates 100 and 200, and the remaining column spacers 220 and 230 maintain the separation degree, a small area at the touch after bonding (the first column spacer and the first step) Since the column spacer and the first substrate 100 are in contact only with each other, the frictional force is small, so that it is easy to return to the original state after the touch. Therefore, black luminance nonuniformity by touch can be prevented.

In addition, when a predetermined external pressure is applied after the bonding, the remaining second and third column spacers 220 and 230 which are not in contact with the opposing substrate (the first substrate 100) at the time of bonding are applied with the pressure. The parts may be in contact with each other according to the distance from the opposing substrate, and may support the cell gap between the first and second substrates 100 and 200 together with the first column spacer 210. Therefore, it is possible to prevent a phenomenon in which pressure is concentrated only on a predetermined portion, and therefore, a phenomenon in which the column spacer of the portion to which the pressure is applied or the pattern of the lower layer thereof collapses and a crushing defect (paint stain) occurs.

As such, the first to third column spacers 210, 220, and 230 are different in contact or spaced apart from the first substrate 100, respectively, and thus, the first to third column spacers 210, 220, and 230 are different from each other. ) Is a triple step with the upper surface of the first substrate (100).

Here, the first to third column spacers 210, 220, and 230 are formed at the same height in the same process. For example, the photosensitive material may be patterned through a photo process or may be formed by dotting to a predetermined portion by an ink-jet method.

Meanwhile, although the first stepped portion is illustrated as a channel portion of the thin film transistor TFT in FIGS. 5 to 11, the first stepped portion is not necessarily limited thereto, and a portion having a higher step height is relatively higher than that of other portions on the first substrate 100. 12 to 14, as shown in FIGS. 12 to 14, the protrusion 130 may be further formed to correspond to the first column spacer 210 to the protrusion to form a gap between the first column spacer 210 and the protrusion (not shown). The same effect can be obtained with a small contact area.

In addition, the number of the stepped portions may be plural, not limited to two, as shown. Here, each of the plurality of stepped portions is formed to have different heights, and when the predetermined pressure is applied to the back surface of the first and second substrates, the column spacers corresponding to the different stepped portions are sequentially formed. 1 will be in contact with the substrate to obtain the effect of the column spacers to slowly contact the opposite substrate, it will be able to prevent the pressing failure.

In FIG. 4, the height of the first stepped part 140 is greater than the height of the second stepped part 250. The first stepped part 140 may be defined as a predetermined part (source / drain electrode or channel part, etc.) of the thin film transistor in the thin film transistor array, or may be defined by further forming a protrusion, and the second stepped part ( 250 is a boundary between the first color filter 202a and the second color filter 202c when the first to third color filters 202a to 202c are formed among the color filter arrays formed on the second substrate 200. And a compensation pattern 202d formed of a color filter having the same color as that of the third color filter 202c by overlapping a predetermined portion with the first and second color filters 202a and 202b adjacent to the boundary. will be.

Hereinafter, a liquid crystal display and a manufacturing method thereof according to various embodiments of the present invention will be described with reference to the drawings.

In the following description, the first substrate is a thin film transistor array substrate on which a thin film transistor array is formed, and the second substrate is a color filter array substrate on which a color filter array is formed.

5 is a plan view illustrating a second substrate of the liquid crystal display according to the first exemplary embodiment of the present invention.

As shown in FIG. 5, a color peter array is formed on the second substrate of the liquid crystal display according to the first exemplary embodiment of the present invention.

First, the black matrix layer 201 is formed in correspondence with regions other than the pixel region, that is, gate line and data line portions and thin film transistor forming portions.

The first, second, and third color filters 202a, 202b, and 202c are each formed in an island shape in a region including the pixel region in the diagonal direction. Accordingly, each of the color filters 202a, 202b, and 202c overlaps the black matrix layer 201 formed around the pixel area. The overlapped portions are portions of the gate lines and data lines formed on the first substrate 100 on the line and the thin film transistor forming portions.

In the liquid crystal display according to the first exemplary embodiment of the present invention, a first column spacer 210 is formed on a thin film transistor portion on the third color filter 202c, and a second color filter 202b and a third color filter are formed. The second column spacer 220 is formed between the second and second color filters 202c, and the third column spacer 230 is formed between the first and second color filters 202a and 202b. Here, the thin film transistor TFT formed on the first substrate 100 corresponding to the first column spacer 210 functions as the first stepped portion 140 illustrated in FIG. 4.

In addition, a compensation pattern 202d having the same component as that of the third color filter 202c is further formed below the third column spacer 230 at a position between the first and second color filters 202a and 202b. In this case, the compensation pattern 202d serves as the second stepped portion 250 described with reference to FIG. 4.

Although not shown, an overcoat layer (not shown) is formed on the entire surface of the second substrate 200 on which the black matrix layer 201, the first to third color filters 202a, 202b, and 202c and the compensation pattern 202d are formed. , 203 of FIG. 9) is further formed. Here, the overcoat layer is formed to a thickness that reflects a step between the first to third color filters 202a, 202b, and 202c and the compensation pattern 202d. At this time, since the third column spacer 230 is formed on the upper portion where the compensation pattern 202d is formed, the third column spacer 230 is formed on a higher step.

In this case, the step of the thin film transistor TFT relative to other parts on the first substrate is a thickness in which a semiconductor layer and a source / drain electrode are stacked, wherein the thickness of the compensation pattern 202d is the semiconductor layer. And the source / drain electrodes are made smaller than the stacked thickness.

Here, the positions at which the first and second column spacers 210 and 220 are formed are not limited to the corresponding color filter shown, but may have a different arrangement from that shown in some cases. However, the third column spacer 230 may be formed on the compensation pattern 202d formed corresponding to a predetermined portion between the first and second color filters 202a and 202b.

Meanwhile, the case in which the first to third color filters 202a, 202b, and 202c described in FIG. 5 and the following embodiments are formed as color filters of R, G, and B colors, respectively, is limited in this order. Rather, the arrangement may vary with possible combinations of G, B, R or R, B, G and the like. In addition, the color filter is not necessarily limited to the above-described color, and may be expressed by increasing the color of the color filter in four or five colors, or may be expressed by changing the color.

6A and 6B are plan views illustrating structures of second substrates according to second and third embodiments of the liquid crystal display of the present invention.

6A is a plan view showing a second substrate structure of the liquid crystal display according to the second embodiment of the present invention, and the arrangement of each color filter is different from that of the above-described first embodiment. That is, the first color filter 202a is the first color filter 202a, the second color filter 202b is the second color filter 202b, and the third color filter 202c is the third color filter. 202c are formed to be spaced apart from each other in an island shape in correspondence with each pixel area on each horizontal line. As in the structure of the first embodiment, each color filter 202a, 202b, and 202c is formed at least in a region including a pixel region, and thus, each color filter 202a, 202b, and 202c is formed in a black matrix formed around the pixel region. Some overlap with layer 201 is formed. The overlapped portions are portions of the gate lines and data lines formed on the first substrate 100 on the line and the thin film transistor forming portions.

Here, the first to third column spacers 210, 220, and 230 are formed on the black matrix layer 201 on the second substrate 200, and the first column spacer 210 functions as a first stepped portion. The thin film transistor is formed on the first substrate (see 100 in FIG. 9), and the second column spacer 220 is formed between the second color filter 202b and the first color filter 202a. The third column spacer 230 is positioned between the first color filter 202a and the second color filter 202b. Here, a compensation pattern 202d of the same material as the third color filter 202c serving as the second step portion is formed between the first and second color filters 202a and 202b on which the third column spacer 230 is formed. Further, a third column spacer 230 is formed on the compensation pattern 220d higher than the black matrix layer 201 where the first and second column spacers 210 and 220 are formed.

In this case, the step of the thin film transistor TFT relative to other parts on the first substrate is a thickness in which a semiconductor layer and a source / drain electrode are stacked, wherein the thickness of the compensation pattern 202d is the semiconductor layer. And the source / drain electrodes are made smaller than the stacked thickness.

As shown in FIG. 6B, the second substrate of the liquid crystal display according to the third exemplary embodiment of the present invention is the first, second, and first pixels of the pixel regions of the line parallel to each other in parallel with each other in comparison with the second exemplary embodiment. Three color filters 202a, 202b, and 202c are formed. That is, the first color filter 202a is formed to correspond to the pixel areas of the first horizontal line, the second color filter 202b is formed to correspond to the pixel areas of the second horizontal line, and the third color filter. 202c is formed corresponding to the pixel areas of the third horizontal line.

The first to third column spacers 210, 220, and 230 are all formed on the black matrix layer 201, and the first column spacer 210 is formed on the black matrix layer 201. The second column spacer 220 is formed between the third and first color filters 202c and 202a on the black matrix layer 201 and is formed to correspond to the second color filter 202b. The column spacer 230 is formed on the compensation pattern 202d between the first and second color filters 202a and 202b on the black matrix layer 201.

As in the above-described embodiment, the first column spacer 210 is formed to correspond to the upper portion of the thin film transistor that functions as the first stepped portion, and the third column spacer 230 is formed on the compensation pattern that functions as the second stepped portion. The second column spacer 220 is formed at a portion that does not correspond to any of the stepped portions, and gradually the column spacers 210-> 230-> are pressed according to the pressure pressing the rear surfaces of the first and second substrates 100 and 200. 220) can share the cell gap support function at the time of pressing to prevent coating stains (poor pressing) caused by crushing of the column spacer of the localized portion.

7 is a plan view illustrating a second substrate of a liquid crystal display according to a fourth exemplary embodiment of the present invention.

FIG. 7 illustrates a second substrate of the liquid crystal display according to the fourth exemplary embodiment, in which first to third color filters 202a, 202b, and 202c are formed in a vertical line. In this case, a compensation pattern 202d made of the same material as that of the third color filter 202c is further formed between the first color filter 202a and the second color filter 202b spaced apart from each other. The third column spacer 230 is formed on the upper side. In addition, a first column spacer 210 is formed to correspond to a thin film transistor (TFT) portion of a pixel region among the pixel regions corresponding to the first or second color filter 202a or 202b, and corresponds to a gate line. The second column spacer 220 is formed at the portion to be formed. In some cases, except for the first column spacer 210, the second and third column spacers 220 and 230 may be formed on a gate line or a data line.

In this case, the third column spacer 230 is on the black matrix layer 201, and corresponding to the upper portion of the data line 102 on the first substrate 100, and spaced apart from each other. It is formed on the compensation pattern 202d formed on a predetermined portion above the color filters 202a and 202b.

FIG. 8 is a plan view illustrating a first substrate in which a liquid crystal display according to a first exemplary embodiment of the present invention is implemented in an in-plane switching (IPS) mode, and FIG. 9 is according to the first exemplary embodiment of the present invention. It is sectional drawing which shows the liquid crystal display device.

8 and 9, the liquid crystal display according to the first embodiment of the present invention implemented in the IPS mode includes a first substrate 100 and a second substrate 200 facing each other, and the first substrate ( A thin film transistor array including a thin film transistor (TFT) on the top surface; a color filter array including a compensation pattern 202d on a predetermined portion on the second substrate; The first column spacer 210 formed on the second substrate 200, the second column spacer 220 formed on the second substrate 200 having a flat portion, and the compensation pattern 202d may correspond to each other. And a third column spacer 230 formed on the second substrate 200 and a liquid crystal layer 150 filled between the first and second substrates 100 and 200.

The thin film transistor TFT may be formed on the semiconductor layer 104 and the source / drain electrodes 102a and 102b in comparison with the second and third column spacers 220 and 230 formed on the gate line 101. ) Is further stacked, and when the first column spacer 210 corresponds to the surface of the source / drain electrodes 102a / 102b, the first column spacer ( The corresponding portion has a step difference as high as the thickness of the semiconductor layer 104 and the source / drain electrodes 102a / 102b.

In addition, the compensation pattern 202d is formed at a predetermined portion between the first and second color filters 202a and 202b at the bottom where the first column spacer 210 is formed.

Hereinafter, the liquid crystal display according to the first embodiment of the present invention will be described in detail.

On the first substrate 100, a thin film transistor TFT formed at an intersection of the gate line 101 and the data line 102 and the gate line 101 and the data line 102 that cross each other to define a pixel area. ), A pixel electrode 103 electrically connected to the drain electrode 102b of the thin film transistor TFT and branched in a zigzag shape, and a branched common electrode 107a alternated with the pixel electrode 103. And a common line 107 connected to the common electrode 107a and parallel to the gate line 101 in the pixel area. Here, a predetermined portion of the pixel electrode 103 overlaps the common line 107 to form a storage capacitor at the overlapped portion.

In this case, the thin film transistor TFT is defined in a region between a source electrode 102a and a drain electrode 102b having a 'U' shape, and the channel is formed along the inside of the shape of the source electrode 102a. It is defined as U '. The thin film transistor TFT may include a gate electrode 101a protruding from the gate line 101, a 'U' source electrode 102a protruding from the data line 102, and the 'U'. The drain electrode 102b is formed to be spaced apart from the female source electrode 102a by a predetermined interval and enters into the 'U'-shaped source electrode 102a. The semiconductor layer 104 is further formed under the data line 102, the source electrode 102a, the drain electrode 102b, and the channel region between the source electrode 102a and the drain electrode 102b. Here, the semiconductor layer is formed of a laminate of an amorphous silicon layer (not shown) and an n + layer (impurity layer) (not shown) from below, and corresponds to a region between the source electrode 102a and the drain electrode 102b. In the channel region, the n + layer (impurity layer) is removed. The semiconductor layer may be selectively formed only under the source / drain electrodes 102a and 102b and the region therebetween, or the data line 102, the source electrode 102a and the region except for the channel region. It may be formed under the drain electrode 102b. Here, the thickness of the semiconductor layer 104 is about 0.2 ~ 0.3㎛, the thickness of the source / drain electrodes (102a / 102b) is about 0.2 ~ 0.4㎛, the remaining gate line without the thin film transistor (TFT) is formed The step where the thin film transistor TFT is formed in comparison with the site on the 101 is formed in a range of about 0.4 to 0.7 μm. Accordingly, the liquid crystal display according to the first exemplary embodiment of the present invention may have an upper surface of the thin film transistor TFT and the second substrate 200 at the time of bonding for forming a cell gap between the first and second substrates 100 and 200. The first column spacer 210 formed on the upper side is correspondingly positioned. Therefore, after bonding, when touching or sliding the first substrate 100 or the second substrate 200 in one direction, only a small area is contacted so that the frictional force of the corresponding portions of the column spacers is reduced. The black luminance non-uniformity caused by slow recovery to the original state after rolling can be prevented.

Here, the gate line 101, the common line 107, and the common electrode 107a are formed of the same metal on the same layer.

A gate insulating film 105 is interposed between the gate line 101 and the semiconductor layer, and a protective film 106 is interposed between the data line 102 and the pixel electrode 103.

Meanwhile, the second storage electrode 107b connected to the common line 107 passing through the pixel region, the first storage electrode 103a formed thereon, and the gate insulating layer 105 and the passivation layer interposed between the two electrodes. 106 constitutes a storage capacitor.

Here, the drain electrode 102b and the first storage electrode 103a formed between the different layers may be contact holes 106a formed by removing the passivation layer 106 on an upper portion of the drain electrode 102b. Contact via).

Meanwhile, as shown in FIG. 9, the shape of the source electrode 102a is 'U', and the liquid crystal display having the 'U' channel is described. Hereinafter, the shape of the source electrode 102a is described. A case where the data line 102 protrudes from the data line 102 will be described with reference to FIG. 10.

10 is a cross-sectional view illustrating another embodiment of the liquid crystal display according to the first embodiment of the present invention.

FIG. 10 shows another embodiment of the liquid crystal display according to the first exemplary embodiment of the present invention including a thin film transistor having a '-shaped channel', and only a portion of the cross section I to I 'is different from FIG. 9.

Here, the thin film transistor includes a semiconductor layer 104 formed through a gate electrode 101a, a gate insulating film 105 on the gate electrode 101a, a source electrode 102a and a drain formed on both sides of the semiconductor layer. Electrode 102b.

In addition, the pixel electrode 103 is further formed on the upper predetermined portion of the drain electrode 102b via the passivation layer 106.

Here, the first column spacer 210 is formed in contact with the passivation layer 106 corresponding to the source electrode 102a / the drain electrode 102b on the thin film transistor TFT or on the pixel electrode 103. It can be formed in contact. The position at which the first column spacer 210 is formed is an upper portion of the structure located at the top of the structure formed on the first substrate 100.

Meanwhile, the channel shape of the thin film transistor may be a 'U' shape described with reference to FIG. 9 or a '-' shape described with reference to FIG. 10. In some cases, the shape may be changed.

FIG. 11 is a plan view illustrating a first substrate in which a liquid crystal display according to a first exemplary embodiment of the present invention is implemented in a twisted nematic (TN) mode.

As shown in FIG. 11, when the liquid crystal display according to the first exemplary embodiment of the present invention is implemented in the TN mode, an area where the gate line 101 and the data line 102 intersect with each other is compared with the plan view of the IPS illustrated in FIG. 8. The same is true except that one pixel electrode 109 is formed to be connected to the drain electrode 102b in the pixel area defined in FIG.

That is, in the liquid crystal display of the TN mode according to the first embodiment of the present invention, the first column spacer 210 is formed to correspond to the thin film transistor (TFT) region, and the stepped portion such as the protrusion or the thin film transistor is not formed. A second column spacer 220 is formed on the planar gate line 101 and the black matrix layer (not shown, see 201 of FIGS. 9 and 10) on the second substrate 200, and as shown in FIG. 9, The second column spacer 230 is formed on the compensation pattern 202d formed at a predetermined region between the first and second color filters 202a and 202b.

Here, the black matrix layer 201 is formed to correspond to an area excluding the pixel area on the first substrate 100, that is, the gate line 101, the data line 102, and the thin film transistor TFT formation region. .

In the liquid crystal display of the TN mode, when the column spacers have multiple steps with respect to the opposing substrate 100, only the first column spacer 210 contacts the first substrate 100 at a predetermined portion when the column spacers are attached to each other. Touch failure is reduced due to frictional force due to the contact area, and even when a local pressure is applied to a predetermined portion at the time of pressing pressure, column spacers having a plurality of multi-steps in turn correspond to the first substrate 100, and only a part of the pressure is applied. This concentration is not concentrated, and several column spacers share the pressure, so that the shape of the column spacer of the predetermined portion does not change, and thus, coating stains can be prevented.

12 is a plan view illustrating a second substrate of the liquid crystal display according to the fifth exemplary embodiment of the present invention, FIG. 13 is a plan view illustrating the first substrate of the liquid crystal display according to the fifth exemplary embodiment of the present invention, and FIG. 14. Is a cross-sectional view illustrating a liquid crystal display device according to a fifth embodiment of the present invention.

12 to 14, in the liquid crystal display according to the fifth exemplary embodiment of the present invention, in the first exemplary embodiment of FIG. 5 described above, a gate line instead of a thin film transistor functioning as the first stepped portion (see 101 in FIG. 13). The projection 130 is responsible for the same function on a predetermined portion on the). In the fifth embodiment, the first column spacer 240 is formed to correspond to the upper portion of the protrusion 130. Except for the position of the protrusion 130 and the first column spacer 240 is the same as described in Figure 5, the same point will be omitted.

Although not shown, in each of the second to fourth embodiments, the first column spacer 240 is not formed on the thin film transistor, but is formed on the protrusion 130 formed corresponding to a predetermined portion on the gate line 101. The formed points may be applied to form corresponding liquid crystal displays of the embodiments.

The protrusion 130 may further include a semiconductor layer pattern 104a having the same layer as the semiconductor layer (see 104 in FIG. 9) of the thin film transistor and a predetermined portion of the gate line 101 and the common line 107. The source / drain electrodes 102a and 102b and the same source / drain metal layer 102c are stacked.

Hereinafter, a process of forming the color filter array and the column spacer formed on the second substrate will be described with reference to the drawings.

15A to 15F are cross-sectional views illustrating a method of manufacturing a structure on a second substrate of the liquid crystal display of the present invention.

As shown in FIG. 15A, first, a black matrix forming material is deposited on the second substrate 200 to be selectively removed to form a black matrix layer 201 on a predetermined portion. The black matrix layer 201 may be formed in a non-pixel region, that is, a gate line (see 101 in FIG. 8), a data line (see 102 in FIG. 8), and a thin film transistor (TFT) forming region on the first substrate 100. It is formed to correspond to. Here, the thickness of the black matrix layer 201a is about 0.1 to 1 μm.

As shown in FIG. 15B, after the first color filter material (R color material) is completely coated on the second substrate 200 including the black matrix layer 201, the first substrate 100 may be selectively removed. One first color filter 202a is formed for every three pixel areas of the image. As such, the first color filter 202a may have an island shape or may have a horizontal or vertical stripe shape.

As shown in FIG. 15C, after the second color filter material (G color material) is completely coated on the second substrate 200 including the black matrix layer 201, the first color filter ( Second color filters 202b are formed for each of the three pixel areas in a predetermined pixel area among the remaining pixel areas in which 202a is not formed.

As shown in FIG. 15D, after the third color filter material (B color material) is completely coated on the second substrate 200 including the black matrix layer 201, the first and second colors are selectively removed. The third color filter 202c is formed in the remaining pixel areas where the color filters 202a and 202b are not formed. At this time, at the same time as the third color filter 202c is formed, a predetermined portion of the boundary of the first and second color filters 202a and 202b and the first and second color filters 202b adjacent thereto are formed. A compensation pattern 202d of the same material as the three color filters 202c is formed.

Here, the thicknesses of the first to third color filters 202a to 202c and the compensation pattern 202d are set to 1 to 1.5 μm.

As shown in FIG. 15E, the overcoat layer 203 is formed on the entire surface of the second substrate 200 including the first to third color filters 202a, 202b, and 202c to reflect the step difference of the compensation pattern 202d. do. Here, since the distance between each color filter without the compensation pattern 202d is small, when the overcoat layer 203 is formed, the color filter and the black matrix layer on both sides are formed to have the thickness of the overcoat layer 203. Although the step of the overcoat layer 203 formed on the substrate hardly occurs, the surface of the overcoat layer 203 formed on the compensation pattern 202d may have the compensation pattern 202d on the black matrix layer 201. In a further formed state, it is formed by partially reflecting the step difference of the black matrix layer 201. At this time, the step that the overcoat layer 203 on the compensation pattern 202d has over the surface of the overcoat layer 203 of the other part is called H3, and is about 0.2 to 0.3 μm.

The thickness of the overcoat layer 203 is 0.5 ~ 1.5㎛.

According to the step on the surface of the overcoat layer 203, as shown in FIG. 15F, the photosensitive material is coated and then selectively exposed to expose the thin film transistor region on the first substrate 100 among the remaining areas without the step. When forming the protrusions (not shown), the first column spacers 210 are formed to correspond to the protrusion parts, and the second column spacers 220 are formed to correspond to a predetermined part of the parts having no remaining step, and the compensation pattern 204d is performed. ) To form the third column spacer 230. Here, the first to third column spacers 210 to 230 are formed to correspond to the upper portion of the black matrix layer 201, and are all formed at the same height. At this time, since only the third column spacer 230 is formed to correspond to the upper portion of the overcoat layer 203 having a step height as high as H3, the upper surface of the third column spacer 230 is also the first and second columns. It is higher than H3 than the upper surface of the spacers 210 and 220.

The height of the first column spacer 210 formed after the patterning is a thickness suitable for maintaining a cell gap, so that the photosensitive material is coated.

As described above, the second substrate 200 on which the color filter array and the column spacers are formed faces the first substrate 100 on which the thin film transistor array is formed, and then, is bonded to the second substrate 200. The liquid crystal is dropped on the upper part of any one of the (100) and the second substrates 200, and then bonded.

In the liquid crystal display device having a multi-stepped structure facing the first substrate 100 as in the present invention, the formation ratio of each column spacer is as follows.

That is, the ratio of the first column spacer 210 in contact with the first substrate 100 is less than 1/10 of the ratio of the total column spacers, and the second and third column spacers 220 and 230 are respectively It is made to be 1/2 or less of the ratio of a column spacer. In addition, the formation rate of the second column spacer 220 that is spaced the most from the first substrate 100 is at least greater than that of the third column spacer 230 that is smaller than that.

As such, the reason why the ratio of the first column spacer 210 is smaller among the ratio of the total column spacer is that the contact area between the first substrate 100 and the first column spacer 210 during bonding is relatively low to prevent touch failure. Since this should be small, the ratio is smaller than the arrangement of the second and third column spacers 220 and 230 having the anti-pressing function. In addition, the reason that the second column spacer 220 spaced apart from the first substrate 100 from the third column spacer 230 has a relatively large formation ratio is because the second column is only subjected to a large pressure at which plastic deformation occurs. This is because the spacer 220 is in contact with each other more stably.

Experimentally, the contact area between the first column spacer 210 and the stepped portion (protrusion or thin film transistor) has an area ratio of 150 ppm or less, which is excellent in touch failure characteristics, and the second and third column spacers 220, 230) and the cross-sectional area ratio of the cross-sectional area of the forming surface of the second substrate 200 corresponded to 2000 to 4000 ppm, respectively, and were excellent in preventing touch failure and depression failure.

On the other hand, in the structure of the liquid crystal display device including the projection structure, the touch defect was improved by reducing the contact area between the column spacer and the counter substrate, but on the other hand, the touch characteristics were poor because it was vulnerable to local pressure. In order to improve the pressing characteristics, the liquid crystal display device having a double stepped structure (having a cell gap holding column spacer corresponding to the protrusion and a pressing preventing column spacer corresponding to the non-protruding portion) does not increase the density of the cell gap holding column spacer. The problem of touch deterioration due to the increase of the area density and the cell gap maintenance column spacers fail to transfer the pressing stress to the spacer having the anti-pressing function, and the cell gap maintenance column spacers themselves are plastically deformed to cause staining. Such a touch and a pressing characteristic is a problem in which H (a separation distance between the non-pressing column spacer and the first substrate) and the like are simultaneously associated in a double step between the arrangement of the gap column spacer and the pressing column spacer.

The liquid crystal display device of the present invention adopts a column spacer structure and a column spacer arrangement structure to have at least triple step difference between the column spacer and the opposing substrate to compensate for the problems caused by the above-described double stepped liquid crystal display device. In addition, touch failure and depression failure are minimized.

The liquid crystal display of the present invention as described above and a method of manufacturing the same have the following effects.

First, only the minimum cell gap holding column spacer is in contact with the opposing substrate, and the corresponding area between the column spacer and the opposing substrate at the time of touch is small, so that the frictional force is small, and after shift between the first and second substrates at the time of touch, the original state Can be easily returned, and touch failure is improved.

Second, a minimum number of column spacers are arranged to maintain the gap between the cell gap holding column spacers, so that when a predetermined pressure is applied to the substrate backside from the outside, an external stress made up of the anti-press column spacers in the cell gap holding column spacers. The transfer is good and the anti-depression column spacers with different steps withstand the external stress in stages. Therefore, each column spacer is shared step by step with respect to the external stress, so that no severe plastic deformation occurs, and it is possible to return to the original state after removing the predetermined pressure, so that uneven coating can be prevented by plastic deformation.

Claims (33)

A first substrate and a second substrate facing each other; A gate line and a data line intersecting each other to define a pixel region, a pixel electrode formed in the pixel region, and an intersection portion of the gate line and the data line formed on the first substrate and protruding from the gate line; A gate electrode, a source electrode protruding from the data line, a drain electrode spaced apart from the source electrode by a predetermined distance, and both sides of the source electrode and the drain electrode are in contact with each other, and formed between the source / drain electrode and the gate electrode A thin film transistor array including a thin film transistor including a semiconductor layer and a protrusion having a thickness of the source / drain electrode and the semiconductor layer; A color filter layer including a black matrix layer formed on the second substrate corresponding to a region excluding the pixel region, and first, second, and third color filters respectively formed to correspond to each of the pixel regions; A color filter array including a compensation pattern formed at a height lower than the protrusions on a predetermined portion between the first color filter and the second color filter; A first column spacer formed on an upper surface of the color filter array to contact the protrusion; A second column spacer formed on the top surface of the color filter array at the same height as the first column spacer and having a first distance from the top surface of the thin film transistor array corresponding to the compensation pattern; A third surface having the same height as that of the first and second column spacers on a top surface of the color filter array in which the protrusions and the compensation patterns are not formed, and having a second distance greater than a first distance to a top surface of the thin film transistor array; Column spacers; and And a liquid crystal layer filled between the first substrate and the second substrate. delete delete delete delete delete delete delete delete delete delete The method of claim 1, The color filter array, And an overcoat layer on the compensation pattern, in which step coverage of the compensation pattern is reflected. delete The method of claim 1, The first to third column spacers are formed on the black matrix layer. A first substrate and a second substrate facing each other; A black matrix layer formed on a predetermined portion on the second substrate; First to third color filters spaced apart from each other and formed on the second substrate including the black matrix layer, the first to third color filters having different colors; A protrusion formed on the first substrate to have a first height corresponding to a predetermined portion of the black matrix layer; Compensation formed on the black matrix layer between the first color filter and the second color filter without the protrusion formed with the same material as the third color filter and having a second height smaller than the first height. pattern; A first column spacer formed on an uppermost surface of the second substrate in contact with the protrusion; A second column spacer corresponding to the compensation pattern and formed on the uppermost surface of the second substrate at the same height as the first column spacer; A third column spacer formed at the same height as the first column spacer on an uppermost surface of the second substrate in a region where the protrusion and the compensation pattern are not present; And And a liquid crystal layer filled between the first substrate and the second substrate. 16. The method of claim 15, And the second and third column spacers are spaced apart from the first substrate. 16. The method of claim 15, A gate line and a data line intersecting each other to define a pixel region, a pixel electrode formed in the pixel region, and a gate formed at an intersection of the gate line and the data line on the first substrate and protruding from the gate line; A semiconductor formed between an electrode, a source electrode protruding from the data line, a drain electrode spaced apart from the source electrode by a predetermined distance, and both sides of the source electrode and the drain electrode and interposed between the source / drain electrode and the gate electrode A thin film transistor array including a thin film transistor including a layer is formed, The projection is a liquid crystal display device comprising a laminate of a semiconductor layer pattern of the same layer as the semiconductor layer and a metal layer formed on the same layer as the data line on a predetermined portion on the gate line. delete delete delete delete delete delete delete delete delete delete delete delete delete Forming a black matrix layer on a predetermined portion on the first substrate; Forming a protrusion on a second substrate corresponding to a predetermined portion of the black matrix layer; Forming first to third color filters spaced apart from each other on the first substrate and having different colors; Forming a compensation pattern of the same material as the third color filter on the black matrix layer between the first color filter and the second color filter in which the protrusion is not formed; A first column spacer corresponding to the protrusion, a second column spacer corresponding to the compensation pattern, and a third column spacer on the second substrate at a predetermined portion on the black matrix layer where the protrusion and the compensation pattern are not formed. Forming; Forming a liquid crystal layer between the first and second substrates; And And bonding the first substrate and the second substrate to each other. The method of claim 1, The first column spacer is formed at a ratio of 1/10 or less of the total column spacer formed on the top surface of the color filter array, And the second and third column spacers are formed at a ratio of 1/2 or less of the total column spacers formed on the uppermost surface of the color filter array, respectively. 33. The method of claim 32, And the third column spacer is formed at a larger ratio than the second column spacer.

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