KR101165260B1 - Apparatus and manufacture device for anti reflective film - Google Patents

Abstract

The present invention is to provide an anti-reflection film and its manufacturing apparatus, the base layer; A hard coating layer laminated on the matrix layer; A first low refractive index layer laminated on the hard coating layer; By including a second low refractive index layer laminated on the opposite side of the surface on which the hard coating layer is laminated in the substrate layer, by providing a double-side coated antireflection film to increase the antireflection efficiency and at the same time reduce the manufacturing cost Will be.

Anti-reflection film, matrix layer, synthetic resin film, hard coating layer, high refractive index, low refractive index, gravure roll

Description

Anti-reflective film and its manufacturing apparatus {Apparatus and manufacture device for anti reflective film}

1 is a cross-sectional view of a conventional antireflection film.

2 is a cross-sectional view of the anti-reflection film according to an embodiment of the present invention.

3 is a block diagram of an apparatus for manufacturing an antireflection film according to an embodiment of the present invention.

4 is a conceptual diagram illustrating an embodiment of the apparatus for manufacturing the antireflective film of FIG. 3.

5 is a graph showing a measurement result of reflectance (%) according to the wavelength of the antireflection film of FIG. 2.

Figure 6 is a graph showing a comparison value measured the transmission of the anti-reflection film according to the prior art and the present invention.

7 is a table showing measured values of the graph of FIG. 2.

Explanation of symbols on the main parts of the drawings

10: antireflection film 11: matrix layer

12 hard coating layer 13 first low refractive index layer

14: second low refractive index layer 20: coating material supply

21: first coating material supply unit 22: second coating material supply unit

30 transfer unit 31 first backup roll

32: 2nd backup roll 40: 1st coating part

41: first kneading roll 42: first gravure roll

50: second coating part 51: second kneading roll

52: second gravure roll 60: control unit

The present invention relates to an anti-reflective film, and more particularly, to an anti-reflective film and an apparatus for manufacturing the same, which provide a double-coated anti-reflective film to increase anti-reflective efficiency and reduce manufacturing cost. .

Anti-reflective films and the like have been developed to suppress surface reflection, glare and the like against external light in order to pursue high-definition and high quality of various displays, solar cells, semiconductor exposure processes and ultraviolet shielding films. There are two types of surface anti-radiation: AG (Anti glare) processing and AR (Anti reflection) processing. The AG process forms an irregular surface on the surface of the film and diffusely reflects the external light from the surface to show the anti-reflective effect. The AR process uses a deposition method or a coating method to deposit thin films of different layers with different refractive indexes on the surface of the film. By forming anti-reflective effect.

These antireflective films include large panels, liquid crystal televisions, liquid crystal display (LCD) polarizers, notebook computers, large monitors, projection TVs, plasma display panel (PDP) front panels, and organic EL (Electro). It is used for luminescent and solar cell field, semiconductor exposure process and UV shielding film to prevent surface reflection and glare.

1 is a cross-sectional view of a conventional antireflection film.

As shown therein, the synthetic resin film 1; A hard coating layer 2 laminated on the synthetic resin film 1 to a thickness of 3 to 7 μm; A high refractive index layer (3) stacked on the hard coating layer (2) with a thickness of 80 to 100 nm and having a refractive index of 1.4 to 1.5; It is composed of a low refractive index layer (Low Refractive Index Layer) 4 having a thickness of 100 to 120 nm on the high refractive index layer 3, and having a refractive index of 1.6 to 1.7.

Therefore, the synthetic resin film 1 uses a film having high transparency, such as polyethylene terephthalate (PET), tri-acetyl-cellulose (TAC), or polycarbonate.

And in order to hold the structure of the synthetic resin film 1, the hard coat layer 2 is formed.

The low refractive layer 4 may be formed on one surface of the synthetic resin film 1 on which the hard coating layer 2 is formed by using an inorganic material such as silica or magnesium fluoride.

In addition, the high refractive layer 3 is formed on one surface of the synthetic resin film 1 using inorganic materials such as titanium oxide and tin oxide, and then low refractive index is used on the high refractive layer 3 using inorganic materials such as silica or magnesium fluoride. Layer 4 may also be formed.

The reason for laminating the materials having different refractive indices in the production of the antireflection film is to use an interference effect in which light is extinguished by the light reflection law, and the thickness thereof is in a range of λ / 4 of the wavelength of light.

The high refractive index layer 3 and the low refractive index layer 4 may be formed using a physical vapor deposition (PVD) method, a chemical vapor deposition (CVD) method, a vacuum deposition method, an organic coating method, or the like.

However, this conventional technology has the following problems.

That is, when manufacturing the anti-reflection film by the PVD method, CVD method, vacuum deposition method, etc., there is a problem that the manufacturing price increases because a continuous process and a large-scale equipment is required.

In addition, when manufacturing the anti-reflection film by the organic coating method capable of continuous process coating, one layer is continuously laminated on one side, there is a problem in that the manufacturing process is lengthened when several layers are laminated.

Accordingly, the present invention has been proposed to solve the conventional problems as described above, and an object of the present invention is to provide an anti-reflection film coated on both sides to increase the anti-reflection efficiency and at the same time reduce the manufacturing cost and The manufacturing apparatus is provided.

In order to achieve the above object, the anti-reflection film according to an embodiment of the present invention,

Matrix layer; A hard coating layer laminated on the matrix layer; A first low refractive index layer laminated on the hard coating layer; In the substrate layer, the hard coating layer is characterized by including a second low refractive index layer laminated on the opposite side of the laminated surface.

In order to achieve the above object, the manufacturing apparatus of the anti-reflection film according to an embodiment of the present invention,

A coating material supply unit supplying a coating material forming a first low refractive index layer and a second low refractive index layer of the antireflection film; A transfer unit for transporting the matrix layer so that the matrix layer of the anti-reflection film travels and is coated; A first coating part for laminating a coating material supplied by the coating material supply part on the hard coating layer of the matrix layer transferred by the conveying part to form a first low refractive index layer; And a second coating for forming a second low refractive layer by laminating the coating material supplied by the coating material supplying part on the opposite side of the hard coating layer of the matrix layer conveyed by the conveying part. Features of the jacket.

Hereinafter, an embodiment of the present invention as described above, an antireflection film and a manufacturing apparatus thereof will be described with reference to the accompanying drawings.

2 is a cross-sectional view of the anti-reflection film 10 according to an embodiment of the present invention.

As shown therein, the matrix layer 11; A hard coating layer 12 stacked on the matrix layer 11; A first low refractive index layer 13 stacked on the hard coating layer 12; In the substrate layer 11, the hard coating layer 12 may include a second low refractive index layer 14 stacked on an opposite side of the stacked surface.

The hard coating layer 12 is positioned on the lower end of the second low refractive index layer 14 instead of being laminated on the upper substrate layer 11, or the second refractive layer 14 and the matrix layer 11. ) Or on top of the first low refractive index layer 13.

The matrix layer 11 may include PET, TAC, PEN (polyethylene naphthalate), polyamide, polyester, PES (polyethersulfone), polyolefin, or glass. It is characterized by using one or more of the system materials.

The matrix layer 11 is formed of a material having a refractive index in the range of 1.5 to 1.7.

The first low refractive index layer 13 and the second low refractive index layer 14 each have a refractive index of 1.4 to 1.69 in a material containing one or two or more of an epoxy resin, an acrylic resin, a vinyl series, and a thiol series. It is characterized by selecting the material to be formed.

3 is a block diagram of an apparatus for manufacturing an antireflection film according to an embodiment of the present invention.

As shown here, a coating material supply unit 20 for supplying a coating material for forming the first low refractive index layer 13 and the second low refractive index layer 14 of the anti-reflection film 10; A transfer part 30 for transferring the matrix layer 11 so that the matrix layer 11 of the anti-reflection film 10 travels and is coated; The first low refractive index layer 13 is formed by stacking the coating material supplied by the coating material supply unit 20 on the hard coating layer 12 of the matrix layer 11 transferred by the transfer unit 30. A first coating part 40 to be used; The second low refractive index layer 14 is formed by stacking the coating material supplied by the coating material supply unit 20 on the opposite side of the hard coating layer 12 of the matrix layer 11 transferred by the transfer unit 30. It characterized in that it comprises a second coating 50 to be formed.

The anti-reflective film manufacturing apparatus controls the operations of the coating material supply unit 20, the transfer unit 30, and the first and second coating units 40 and 50 so that both surfaces of the matrix layer 11 are formed. It characterized in that it further comprises a control unit 60 for controlling the first and second low refractive index layer 13, 14 to be formed.

4 is a conceptual diagram illustrating an embodiment of the apparatus for manufacturing the antireflective film of FIG. 3.

As shown therein, the apparatus for manufacturing an anti-reflection film may include a first coating material supply unit 21 and a second low refractive layer 14 for supplying a coating material for forming the first low refractive index layer 13. A coating material supply unit 20 including a second coating material supply unit 22 for supplying a coating material to be formed; Including a first back up roll (31) to allow the substrate layer 11 to run to be coated, and a second back up roll (32) to allow the substrate layer 11 to be coated to run A transfer part 30 configured; A first kneading roll 41 for transferring the coating material supplied from the first coating material supply part 21, and a coating material transferred by the first kneading roll 41 is the matrix layer 11. A first coating part 40 including a first gravure roll 42 to be laminated on the hard coating layer 12 of the first low refractive index layer 13; The second kneading roll 51 for conveying the coating material supplied from the second coating material supply unit 22 and the coating material conveyed by the second kneading roll 51 are hard on the substrate layer 11. It characterized in that it comprises a second coating portion 50 including a second gravure roll 52 to be laminated on the opposite side of the coating layer 12 to form a second low refractive index layer (14).

Referring to the accompanying drawings, the operation of the anti-reflection film and the manufacturing apparatus according to the present invention configured as described in detail as follows.

First, the present invention is to provide an anti-reflection film coated on both sides to increase the anti-reflection efficiency and at the same time reduce the manufacturing cost.

To this end, in the present invention, when the antireflection film 10 is configured, the second low refractive index layer 14, the matrix layer 11, the hard coating layer 12, and the first low refractive index layer 13 are configured in this order. The low refractive layers 13 and 14 are formed on both sides of the matrix layer 11.

In the present invention, it is also possible to form the hard coat layer 12 at any part. Thus, instead of configuring the hard coating layer 12 to be stacked on top of the matrix layer 11, it may be configured in another manner. That is, the hard coating layer 12 is positioned at the lower end of the second low refractive layer 14 so that the hard coating layer 12, the second low refractive layer 14, the matrix layer 11, and the first low refractive layer 13 are formed. Can be configured in the following order. In addition, the hard coating layer 12 is positioned between the second refractive layer 14 and the matrix layer 11 so that the second low refractive index layer 14, the hard coating layer 12, the matrix layer 11, and the first low refractive index are provided. It may be configured in the order of the layer 13. In addition, the hard coating layer 12 is positioned on top of the first low refractive layer 13 so that the second low refractive layer 14, the matrix layer 11, the first low refractive layer 13, and the hard coating layer 12 You can also configure in order.

In the description of one embodiment of the present invention, the second low refractive index layer 14, the matrix layer 11, the hard coating layer 12, and the first low refractive index layer 13 will be described. do.

Meanwhile, the matrix layer 11 may use a synthetic resin film, and films such as PET, TAC, PEN, polyamide, polyester, PES, and polyolefin may be used. It is also possible to use glass-based materials. Such a film should be provided in the refractive index range of 1.5 to 1.7 for use as the matrix layer 11.

Further, the first low refractive index layer 13 and the second low refractive index layer 14 are formed of a material having a refractive index lower than that of the matrix layer 11. For example, an epoxy resin, an acrylic resin, a vinyl type, a thiol type, etc. can be used.

The refractive indexes of the first low refractive index layer 13 and the second low refractive index layer 14 are in the range of 1.4 to 1.69. The refractive indexes of the first low refractive index layer 13 and the second low refractive index layer 14 may be the same or different. This may change the refractive indices of the first low refractive index layer 13 and the second low refractive index layer 14 depending on the purpose of using the antireflection film 10. In addition, the antireflection film 10 may be configured by changing only the refractive index of the second low refractive index layer 14 in a state where the refractive index of the first low refractive index layer 13 is fixed.

In addition, each of the first low refractive layer 13 and the second low refractive layer 14 has a refractive index of 1.4 to 1.69 in a material containing at least one of epoxy resin, acrylic resin, vinyl series and thiol series. Select material to form.

In addition, the antireflection film 10 has a total transmittance of 80% or more when the second refractive layer 14, the matrix layer 11, the hard coating layer 12, and the first low refractive layer 13 are combined. It is more preferable to set this to 85% or more.

Meanwhile, as shown in FIGS. 3 and 4, when forming the antireflection film 10, the first low refractive index layer 13 and the second low refractive index layer 14 are formed to have low refractive index on both sides of the matrix layer 11. Prepare to include layers.

Thus, the coating material supply unit 20 supplies a coating material for forming the first low refractive index layer 13 and the second low refractive index layer 14 of the antireflection film 10. The coating material supply unit 20 supplies a first coating material supply unit 21 for supplying a coating material for forming the first low refractive layer 13 and a coating material for forming a second low refractive layer 14. The second coating material supply unit 22 may be configured.

In addition, the transfer unit 30 transfers the matrix layer 11 so that the matrix layer 11 of the antireflection film 10 travels and is coated. The transfer part 30 includes a first back up roll 31 for coating the substrate layer 11 to run and a second backup roll 32 for coating the substrate layer 11 to run. ) Can be configured to include

In addition, the first coating part 40 allows the coating material supplied by the coating material supply part 20 to be stacked on the hard coating layer 12 of the matrix layer 11 transferred by the conveying part 30 so as to have a first low refractive index. Allow layer 13 to be formed. The first coating part 40 includes a first kneading roll 41 for transferring the coating material supplied from the first coating material supply part 21, and a coating material transferred by the first kneading roll 41. It may be configured to include a first gravure roll 42 to be laminated on the hard coat layer 12 of (11) so that the first low refractive index layer 13 is formed.

In addition, the second coating unit 50 allows the coating material supplied by the coating material supply unit 20 to be laminated on the opposite side of the hard coating layer 12 of the matrix layer 11 transferred by the transfer unit 30. The low refractive index layer 14 is formed. The second coating part 50 includes a second kneading roll 51 for transferring the coating material supplied from the second coating material supply part 22, and a coating material transferred by the second kneading roll 51. It may be configured to include a second gravure roll 52 to be laminated on the opposite surface of the hard coat layer 12 of (11) so that the second low refractive index layer 14 is formed.

Thus, the first coating material supply unit 21 supplies a coating material for forming the first low refractive index layer 13, and the second coating material supply unit 22 supplies a coating material for forming the second low refractive index layer 14. Supply.

The first kneading roll 41 transfers the coating material supplied from the first coating material supply part 21 to the first gravure roll 42, and the second kneading roll 51 supplies the second coating material supply part 22. The coating material supplied from is transferred to the second gravure roll 52.

In addition, the first gravure roll 42 allows the coating material transferred by the first kneading roll 41 to be laminated on the hard coating layer 12 of the matrix layer 11 so that the first low refractive layer 13 is formed. In addition, the second gravure roll 52 allows the coating material transferred by the second kneading roll 51 to be laminated on the opposite side of the hard coating layer 12 of the matrix layer 11. To be formed.

The first and second backup rolls 31 and 32 allow the matrix layer 11 to travel so that the first low refractive index layer 13 and the second low refractive layer 14 are formed on both sides of the matrix layer 11. To be formed simultaneously or at this time.

Here, the manufacturing apparatus for forming the first low refractive index layer 13 and the second low refractive index layer 14 on both sides of the matrix layer 11 at the same time or at this time can be configured in various ways, as shown in FIG. An example is an improvement of the gravure coating method in the wet coating method. That is, by improving the conventional gravure coating method that the coating was performed only on the cross section, the coating is performed on both sides of the matrix layer 11.

In addition, a thin film deposition technique may be used to form the first and second low refractive layers 13 and 14. Such thin film deposition techniques include wet coating, physical vapor deposition (PVD), chemical vapor deposition (CVD), and the like.

Wet coating methods include dip coating, spin coating, flow coating, spray coating, roll coating, and gravure coating, and PVD methods include sputtering, e-beam evaporation, and heat. Thermal evaporation, Laser Molecular Beam Epitaxy (L-MBE), Pulsed Laser Deposition (PLD), etc., and CVD methods include metal-organic chemical vapor deposition (MOCVD) and HVPE Hydride Vapor Phase Epitaxy).

Accordingly, in the present invention, the various thin film deposition techniques may be improved so that the first and second low refractive layers 13 and 14 may be simultaneously formed on both surfaces of the matrix layer 11.

5 is a graph showing a measurement result of reflectance (%) according to the wavelength of the antireflection film of FIG. 2.

Here, the experimental conditions are white light (White) mixed with all wavelengths as a light source (Illuminant) in the general air (Air), and the wavelength range of 380.0 ~ 780.0 nm, measured under these experimental conditions.

According to the measurement result, the maximum value was 1.6538% of the reflectance index at the wavelength of 381.0 nm, while the minimum value was 0.0001% at the 549.0nm wavelength, which is the most detectable in the human eye. Average was found to be an excellent antireflection film with 0.4%.

FIG. 6 is a graph showing a comparison value of measured transmittances of the antireflection film according to the related art and the present invention, and FIG. 7 is a table showing measured values of the graph of FIG. 2.

Thus, the transmittance of the antireflective film according to the prior art at 350 nm wavelength is 72.066%, whereas the transmittance of the antireflective film coated on both sides by the present invention is 72.856%, and the prior art is 87.513% at 497 nm wavelength. 92.197%, the present invention is 89.998% at 791 nm wavelength compared to 88.904%. Therefore, it can be confirmed that the present invention has a more excellent transmittance than the prior art.

In this manner, the antireflection film 10 having no problem in antireflection function can be obtained by the present invention.

As such, the present invention provides a double-sided coated anti-reflection film to increase anti-reflection efficiency and at the same time reduce manufacturing costs.

While the present invention has been particularly shown and described with reference to exemplary embodiments thereof, it is to be understood that the invention is not limited to the disclosed exemplary embodiments. It is clear that the present invention can be suitably modified and applied in the same manner. Therefore, the above description does not limit the scope of the invention defined by the limitations of the following claims.

As described above, the anti-reflection film and the apparatus for manufacturing the same according to the present invention provide an anti-reflection film coated on both sides, thereby increasing the anti-reflection efficiency and reducing the manufacturing cost.

In addition, the present invention is a low-cost manufacturing cost by manufacturing an anti-reflection film by a simple process by the vacuum deposition method, when the coating at the same time can be coated in two layers in one process, the coating process can be reduced more than once, manufacturing cost There is a lowering effect.

Claims (8)

Matrix layer; A hard coating layer laminated on the matrix layer; A first low refractive index layer laminated on the hard coating layer; An anti-reflection film comprising a second low refractive index layer laminated on the surface opposite to the surface of the hard coating layer is laminated on the base layer. The method according to claim 1, wherein the hard coating layer, Instead of being stacked on top of the matrix layer, it is located at the bottom of the second low refractive index layer, or between the second refractive layer and the matrix layer, or located on top of the first low refractive layer Anti-reflection film. The method according to claim 1 or 2, wherein the matrix layer, An antireflection film using at least one of PET, TAC, PEN, polyamide, polyester, PES, polyolefin, or glass-based material. The method according to claim 1 or 2, wherein the matrix layer, An antireflection film formed from a material having a refractive index in the range of 1.5 to 1.7. The method according to claim 1 or 2, wherein the first low refractive index layer and the second low refractive index layer, An anti-reflection film, characterized in that formed by selecting a material having a refractive index in the range of 1.4 to 1.69 from a material containing at least one of epoxy resin, acrylic resin, vinyl series, and thiol series. A coating material supply unit supplying a coating material forming a first low refractive index layer and a second low refractive index layer of the antireflection film; A transfer unit for transporting the matrix layer so that the matrix layer of the anti-reflection film travels and is coated; A first coating part for laminating a coating material supplied by the coating material supply part on the hard coating layer of the matrix layer transferred by the conveying part to form a first low refractive index layer; And a second coating part configured to stack a coating material supplied by the coating material supply part on the opposite side of the hard coating layer of the matrix layer transferred by the conveying part so that a second low refractive index layer is formed. Apparatus for producing antireflection film. The manufacturing apparatus of the said anti-reflection film of Claim 6, And a control unit configured to control operations of the coating material supply unit, the transfer unit, and the first and second coating units to form first and second low refractive layers on both sides of the matrix layer. Production apparatus of the prevention film. The manufacturing apparatus of the said anti-reflection film of Claim 6 or 7, A coating material supply part including a first coating material supply part supplying a coating material forming a first low refractive index layer, and a second coating material supply part supplying a coating material forming a second low refractive index layer; A transfer part including a first backup roll to allow the substrate layer to run and to be coated, and a second backup roll to allow the substrate layer to be coated and to be coated; A first kneading roll for transporting the coating material supplied from the first coating material supply unit and the coating material transported by the first kneading roll are laminated on the hard coating layer of the matrix layer to form a first low refractive index layer. A first coating part including a first gravure roll; A second kneading roll for transferring the coating material supplied from the second coating material supplying portion, and a coating material transferred by the second kneading roll to be laminated on an opposite surface of the hard coating layer of the matrix layer; An apparatus for producing an antireflection film, comprising a second coating comprising a second gravure roll to allow a layer to be formed.

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