KR101130594B1 - 애퍼크로매틱 단위 배율 투영 광학 시스템 - Google Patents

애퍼크로매틱 단위 배율 투영 광학 시스템 Download PDF

Info

Publication number
KR101130594B1
KR101130594B1 KR1020077009974A KR20077009974A KR101130594B1 KR 101130594 B1 KR101130594 B1 KR 101130594B1 KR 1020077009974 A KR1020077009974 A KR 1020077009974A KR 20077009974 A KR20077009974 A KR 20077009974A KR 101130594 B1 KR101130594 B1 KR 101130594B1
Authority
KR
South Korea
Prior art keywords
optical system
projection optical
type glass
mirror
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020077009974A
Other languages
English (en)
Korean (ko)
Other versions
KR20070069186A (ko
Inventor
로메오 아이 메르카도
Original Assignee
울트라테크 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 울트라테크 인크. filed Critical 울트라테크 인크.
Publication of KR20070069186A publication Critical patent/KR20070069186A/ko
Application granted granted Critical
Publication of KR101130594B1 publication Critical patent/KR101130594B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
KR1020077009974A 2004-11-01 2005-10-27 애퍼크로매틱 단위 배율 투영 광학 시스템 Expired - Fee Related KR101130594B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/980,110 2004-11-01
US10/980,110 US7148953B2 (en) 2004-11-01 2004-11-01 Apochromatic unit-magnification projection optical system
PCT/US2005/038777 WO2006050029A2 (en) 2004-11-01 2005-10-27 Apochromatic unit-magnification projection optical system

Publications (2)

Publication Number Publication Date
KR20070069186A KR20070069186A (ko) 2007-07-02
KR101130594B1 true KR101130594B1 (ko) 2012-04-02

Family

ID=36261404

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020077009974A Expired - Fee Related KR101130594B1 (ko) 2004-11-01 2005-10-27 애퍼크로매틱 단위 배율 투영 광학 시스템

Country Status (5)

Country Link
US (1) US7148953B2 (https=)
JP (1) JP2008519433A (https=)
KR (1) KR101130594B1 (https=)
TW (1) TWI420149B (https=)
WO (1) WO2006050029A2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107064016A (zh) * 2017-04-14 2017-08-18 中国科学院长春光学精密机械与物理研究所 一种光栅色散成像光谱仪

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20160085375A (ko) 2004-05-17 2016-07-15 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
EP1912098B1 (en) 2006-10-12 2012-04-25 Carl Zeiss SMT GmbH Unit magnification projection objective
DE102008015775A1 (de) 2007-04-16 2008-12-18 Carl Zeiss Smt Ag Chromatisch korrigiertes Lithographieobjektiv
US7710564B1 (en) * 2007-09-03 2010-05-04 Kla-Tencor Corporation Polarized broadband wafer inspection
US8493670B2 (en) 2010-09-10 2013-07-23 Coherent, Inc. Large-field unit-magnification catadioptric projection system
US8659823B2 (en) 2011-04-22 2014-02-25 Coherent, Inc. Unit-magnification catadioptric and catoptric projection optical systems
US8830590B2 (en) 2012-05-30 2014-09-09 Ultratech, Inc. Unit magnification large-format catadioptric lens for microlithography
US8845163B2 (en) * 2012-08-17 2014-09-30 Ultratech, Inc. LED-based photolithographic illuminator with high collection efficiency
US9341951B2 (en) 2012-12-21 2016-05-17 Ultratech, Inc. Wynn-dyson imaging system with reduced thermal distortion
US9488811B2 (en) 2013-08-20 2016-11-08 Ultratech, Inc. Wynne-Dyson optical system with variable magnification
US9436103B2 (en) * 2014-05-19 2016-09-06 Ultratech, Inc. Wynne-Dyson projection lens with reduced susceptibility to UV damage
JP2016218299A (ja) * 2015-05-22 2016-12-22 財団法人國家實驗研究院 単一非球面共通光学素子露光機レンズセット

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6809888B1 (en) 2003-04-16 2004-10-26 Ultratech, Inc. Apparatus and methods for thermal reduction of optical distortion

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4103989A (en) * 1977-02-07 1978-08-01 Seymour Rosin Unit-power concentric optical systems
US4171870A (en) * 1977-05-06 1979-10-23 Bell Telephone Laboratories, Incorporated Compact image projection apparatus
US4171871A (en) * 1977-06-30 1979-10-23 International Business Machines Corporation Achromatic unit magnification optical system
CA1171555A (en) * 1981-05-15 1984-07-24 Ronald S. Hershel Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4391494A (en) * 1981-05-15 1983-07-05 General Signal Corporation Apparatus for projecting a series of images onto dies of a semiconductor wafer
US4469414A (en) * 1982-06-01 1984-09-04 The Perkin-Elmer Corporation Restrictive off-axis field optical system
US4934801A (en) * 1984-11-29 1990-06-19 Lockheed Missiles & Space Company, Inc. Optical imaging system
US4768869A (en) * 1984-11-29 1988-09-06 Lockheed Missiles & Space Company, Inc. Catadioptric imaging system
US4681407A (en) * 1985-12-02 1987-07-21 Lockheed Missiles & Space Company, Inc. Two-glass photographic objective color-corrected at four wavelengths
US4704011A (en) * 1985-12-13 1987-11-03 Lockheed Missiles & Space Company, Inc. Three-glass photographic objective color-corrected at four wavelengths
US4929071A (en) * 1985-12-20 1990-05-29 Lockheed Missiles & Space Company, Inc. Long-focus color-corrected petzval-type optical objective
US5000548A (en) * 1988-04-25 1991-03-19 Lockheed Missiles & Space Company, Inc. Microscope objective
US4964705A (en) * 1988-11-07 1990-10-23 General Signal Corporation Unit magnification optical system
US5040882A (en) * 1988-11-07 1991-08-20 General Signal Corporation Unit magnification optical system with improved reflective reticle
US5031977A (en) * 1989-12-27 1991-07-16 General Signal Corporation Deep ultraviolet (UV) lens for use in a photolighography system
US5161062A (en) * 1991-07-11 1992-11-03 General Signal Corporation Optical projection system including a refractive lens assembly having a gap between constituent lenses
US5559629A (en) * 1994-08-19 1996-09-24 Tamarack Scientific Co., Inc. Unit magnification projection system and method
JPH08211294A (ja) * 1995-02-02 1996-08-20 Nikon Corp 投影露光装置
US5940222A (en) * 1997-10-27 1999-08-17 Wescam Inc. Catadioptric zoom lens assemblies
US6963403B2 (en) * 2002-01-15 2005-11-08 Council Of Scientific And Industrial Research Method for determining the reflectance profile of materials
US6879383B2 (en) * 2002-12-27 2005-04-12 Ultratech, Inc. Large-field unit-magnification projection system
US6813098B2 (en) * 2003-01-02 2004-11-02 Ultratech, Inc. Variable numerical aperture large-field unit-magnification projection system
US6863403B2 (en) * 2003-05-27 2005-03-08 Ultratech, Inc. Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6809888B1 (en) 2003-04-16 2004-10-26 Ultratech, Inc. Apparatus and methods for thermal reduction of optical distortion

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107064016A (zh) * 2017-04-14 2017-08-18 中国科学院长春光学精密机械与物理研究所 一种光栅色散成像光谱仪

Also Published As

Publication number Publication date
US7148953B2 (en) 2006-12-12
TWI420149B (zh) 2013-12-21
US20060092395A1 (en) 2006-05-04
WO2006050029A2 (en) 2006-05-11
JP2008519433A (ja) 2008-06-05
TW200615577A (en) 2006-05-16
KR20070069186A (ko) 2007-07-02
WO2006050029A3 (en) 2006-08-10

Similar Documents

Publication Publication Date Title
US7177099B2 (en) Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus
US6879383B2 (en) Large-field unit-magnification projection system
USRE38421E1 (en) Exposure apparatus having catadioptric projection optical system
TWI470269B (zh) 折反射投射物鏡
US7116496B1 (en) High NA large-field unit-magnification projection optical system
KR101130594B1 (ko) 애퍼크로매틱 단위 배율 투영 광학 시스템
WO2005059617A2 (en) Projection objective having a high aperture and a planar end surface
US6867922B1 (en) Projection optical system and projection exposure apparatus using the same
KR100511360B1 (ko) 투영광학계 및 그것을 사용한 투영노광장치, 및디바이스제조방법
JP5196869B2 (ja) 投影光学系、露光装置及びデバイス製造方法
KR101432822B1 (ko) 결상 시스템, 특히 마이크로 리소그래픽 투영 조명 유닛에 사용될 수 있는 결상 시스템
WO2023144100A1 (en) Projection lens, projection exposure apparatus and projection exposure method
EP1316832A1 (en) Relay image optical system, and illuminating optical device and exposure system provided with the optical system
US20050073666A1 (en) Illumination optical system and exposure apparatus having the same
US20060238732A1 (en) High-NA unit-magnification projection optical system having a beamsplitter
WO2007086220A1 (ja) 反射屈折結像光学系、露光装置、およびデバイスの製造方法
JP2002072080A (ja) 投影光学系および該投影光学系を備えた露光装置
WO2008104192A1 (en) Catadioptric projection objective with pupil correction
WO2008006265A1 (en) Large working distance unit-magnification projection optical system
JP2003114381A (ja) 対物レンズ系、結像光学系、観察装置、および該観察装置を備えた露光装置

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20160218

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20170220

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20180321

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20180321