KR101109999B1 - 입체리쏘그래피에 의해 제조된 무색 투명한 3차원 제품 및 상기 제품의 제조방법 - Google Patents
입체리쏘그래피에 의해 제조된 무색 투명한 3차원 제품 및 상기 제품의 제조방법 Download PDFInfo
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- KR101109999B1 KR101109999B1 KR1020097018012A KR20097018012A KR101109999B1 KR 101109999 B1 KR101109999 B1 KR 101109999B1 KR 1020097018012 A KR1020097018012 A KR 1020097018012A KR 20097018012 A KR20097018012 A KR 20097018012A KR 101109999 B1 KR101109999 B1 KR 101109999B1
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Classifications
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
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Abstract
Description
화합물 유형 | 성분 | 중량% |
지환족 에폭시 | 셀록사이드 2021P | 44.5800 |
수소화 비스페놀 A 다이글리시딜 에터 | 에포넥스 1510 | 10.0000 |
옥세테인 | OXT-101 | 8.0000 |
프로폭실화 트라이메틸올 프로페인 트라이아크릴레이트 | SR 492 | 11.9995 |
비스페놀 A 다이글리시딜에터 다이아크릴레이트 | 에베크릴 3700 | 6.0000 |
폴리에터 폴리올 | 플루라콜 GP 430 | 12.0000 |
유리 라디칼 광개시제 | 어가큐어(Irgacure) 184 | 3.0000 |
양이온성 광개시제 | 치바큐어(Chivacure) 1176 | 4.0000 |
산화방지제, 첨가제 | 어가녹스 1035 | 0.2000 |
습윤제, 첨가제 | 실웨트(Silwet) L-7600 | 0.2000 |
공기 방출제, 첨가제 | BYK A501 | 0.0200 |
청색 안료 분산액 | 프탈로시아닌 블루 | 0.0002 |
자색 안료 분산액 | 카바졸 바이올렛 | 0.0003 |
총 | 100.0000 |
화합물 유형 | 성분 | 중량% |
지방족 우레탄 다이아크릴레이트 올리고머 | BR 543 | 35.50 |
폴리에틸렌 글리콜(400) 다이아크릴레이트(MW 508) | SR344 | 12.00 |
(에톡실화)4 노닐페놀 아크릴레이트(450 MW) | SR 504D | 15.00 |
비닐 아마이드 | 비닐 카프로락탐 | 8.00 |
사이클릭 트라이메틸올프로페인 폼알 아크릴레이트(200 MW) | SR 531 | 18.00 |
아이소데실 아크릴레이트 (192 MW) | SR 395 | 8.00 |
입체장애 페놀 산화방지제 | 어가녹스 1035 | 0.50 |
알파, 알파-다이메톡시-알파-페닐아세토페논 유리 라디칼 개시제 | 어가큐어 651 | 3.00 |
청색 안료 분산액 | 프탈로시아닌 블루 | 0.0002 |
자색 안료 분산액 | 카바졸 바이올렛 | 0.0003 |
총 | 100.00 |
상품명 | 공급처 | 설명 |
에베크릴 3700 | 사이텍 | 비스페놀 A 다이글리시딜에터 다이아크릴레이트 |
셀록사이드 2021P | 다이셀 케미칼 | 지환족 에폭시 |
에포넥스 1510 | 헥시온 | 수소화 비스페놀 A 다이글리시딜 에터 |
OXT-101 | 토아고세이 | 3-에틸-3-하이드록시메틸 옥세테인 |
SR 492 | 사토머 | 프로폭실화 트라이메틸올프로페인 트라이아크릴레이트 |
플루라콜 GP430 | BASF | 프로폭실화 글리세롤(폴리에터 트라이올) |
실웨트 L-7600 | 모멘티브 | 폴리알킬렌옥사이드 개질화 폴리다이메틸실록세인 |
BYK-A-501 | BYK-케미 | 폼 제거(form destroying) 중합체의 실리콘-부재 용액 |
어가녹스 1035 | 시바 | 입체장애 페놀 산화방지제 |
프린트 블루 15DT7083 | 더 플린트 그룹 | 프탈로시아닌 청색 안료 |
호스타펌 바이올렛 RL, 안료 바이올렛 23 |
클라리언트 | 카바졸 자색 안료 |
어가큐어 184 | 시바 | 1-하이드록시사이클로헥실 페닐 케톤, 유리 라디칼 광개시제 |
치바큐어 1176 | 차이텍 | 트라이아릴설포늄 헥사플루오로안티모네이트 염, 양이온성 광개시제의 혼합물 |
BR-543 | 보마르 스페셜치 | 지방족 우레탄 다이아크릴레이트 올리고머 |
SR 344 | 사토머 | 폴리에틸렌 글리콜(400) 다이아크릴레이트(MW 508) |
SR 504D | 사토머 | 에톡실화(4) 노닐페놀 아크릴레이트(MW 450) |
SR 531 | 사토머 | 사이클릭 트라이메틸올프로페인 폼알 아크릴레이트(MW 200) |
SR 395 | 사토머 | 아이소데실 아크릴레이트(MW 192) |
어가큐어 651 | 시바 | α, α-다이메톡시-알파-페닐아세토페논 유리 라디칼 광개시제 |
비닐 카프로락탐 | BASF | 비닐 아마이드 |
화합물 유형 | 성분 | 중량% |
지환족 에폭시 | 셀록사이드 2021P | 44.5800 |
수소화 비스페놀 A 다이글리시딜 에터 | 에포넥스 1510 | 10.0000 |
옥세테인 | OXT-101 | 8.0000 |
프로폭실화 TMPTA | SR 492 | 11.9995 |
비스페놀 A 다이글리시딜에터 다이아크릴레이트 | 에베크릴 3700 | 6.0000 |
폴리에터 폴리올 | 플루라콜 GP 430 | 12.0000 |
유리 라디칼 광개시제 | 어가큐어 184 | 3.0000 |
양이온성 광개시제 | 치바큐어 1176 | 4.0000 |
산화방지제, 첨가제 | 어가녹스 1035 | 0.2000 |
습윤제, 첨가제 | 실웨트 L-7600 | 0.2000 |
공기 방출제, 첨가제 | BYK A501 | 0.0200 |
청색 안료 분산액 | 프탈로시아닌 블루 | 0.0002 |
자색 안료 분산액 | 카바졸 바이올렛 | 0.0003 |
총 | 100.0000 |
Claims (19)
- 무색 투명한 3차원 제품으로 경화될 수 있는 액체 방사선 경화성 수지의 제조 방법으로서,a) 액체 방사선 경화성 수지를 배합하는데 사용되는 가능한 성분들의 각각의 목록으로부터 선택 항목을 선택하는 단계;b) 상기 단계 a)의 액체 방사선 경화성 수지를 사용하여 제조되는 경화된 3차원 입체리쏘그래픽 제품의 예상되는 색상 및 투명도를 결정하는 단계; 및c) 액체 방사선 경화성 수지로부터 제조되는 경화된 3차원 입체리쏘그래픽 제품의 무색 투명한 외관을 위해 액체 방사선 경화성 수지용 색상 마스킹제를 선택하는 단계를 포함하되, 상기 무색 투명한 3차원 제품이i) 400 내지 500nm 범위에서 자외선-가시광선 분광광도계에 의해 측정시 67% 초과의 투과도 및 투명도; 및ii) 400 내지 750nm의 가시광선 파장에서 분광광도계에 의해 측정시 CIELAB 색공간에서 -0.5 내지 +2.5의 b* 값으로 측정된 무색성(lack of color)의 특성을 갖는, 방법.
- a) 하나 이상의 2작용성- 또는 다작용성 아크릴레이트;b) 하나 이상의 에폭시 화합물로서, 상기 에폭시 화합물들 중 하나 이상이 지환족 에폭시 화합물, 수소화 비스페놀 A 다이글리시딜에터 및 이들의 혼합물로 구성된 군 중에서 선택되는 화합물;c) 선택적으로, 옥세테인;d) 선택적으로, 하나 이상의 하이드록실-작용성 화합물;e) 선택적으로, i) 광 안정화제/UV 흡수제, ii) 산화방지제, iii) 산 안정화제, iv) 습윤제, v) 공기 방출제(air release agent)로 구성된 군 중에서 선택된 하나 이상의 첨가제;f) 유리 라디칼 광개시제;g) 양이온성 광개시제; 및h) 색상 마스킹제를 포함하는 액체 방사선 경화성 수지로서, 상기 액체 방사선 경화성 수지가, 경화되는 경우,i) 400 내지 500nm 범위에서 자외선-가시광선 분광광도계에 의해 측정시 67% 초과의 투과도 및 투명도; 및ii) 400 내지 750nm의 가시광선 파장에서 분광광도계에 의해 측정시 CIELAB 색공간에서 -0.5 내지 +2.5의 b* 값으로 측정된 무색성의 특성을 갖는, 액체 방사선 경화성 수지.
- a) 하나 이상의 일작용성, 이작용성 또는 다작용성 아크릴레이트 및 하나 이상의 우레탄 아크릴레이트 올리고머로 구성된 군 중에서 선택된 아크릴레이트 성분;b) 선택적으로, 하나 이상의 하이드록실-작용성 화합물;c) 선택적으로, i) 광 안정화제/UV 흡수제; ii) 산화방지제; iii) 습윤제; iv) 공기 방출제로 구성된 군중에서 선택되는 하나 이상의 첨가제;d) 유리 라디칼 광개시제; 및e) 색상 마스킹제를 포함하는 액체 방사선 경화성 수지로서, 상기 액체 방사선 경화성 수지가, 경화되는 경우,i) 400 내지 500nm 범위에서 자외선-가시광선 분광광도계에 의해 측정시 67% 초과의 투과도 및 투명도; 및ii) 400 내지 750nm의 가시광선 파장에서 분광광도계에 의해 측정시 CIELAB 색공간에서 -0.5 내지 +2.5의 b* 값으로 측정된 무색성의 특성을 갖는, 액체 방사선 경화성 수지.
- 입체리쏘그래피 방법을 사용하여 제조된 무색 투명한 3차원 제품으로서, 상기 제품을 제조하는데 사용되는 액체 방사선 경화성 수지가,a) 하나 이상의 2작용성- 또는 다작용성 아크릴레이트;b) 하나 이상의 에폭시 화합물로서, 상기 에폭시 화합물들 중 하나 이상이 지환족 에폭시 화합물, 수소화 비스페놀 A 다이글리시딜에터 및 이들의 혼합물로 구성된 군 중에서 선택되는 화합물;c) 선택적으로, 옥세테인;d) 선택적으로, 하나 이상의 하이드록실-작용성 화합물;e) 선택적으로, i) 광 안정화제/UV 흡수제, ii) 산화방지제, iii) 산 안정화제, iv) 습윤제, v) 공기 방출제로 구성된 군 중에서 선택된 하나 이상의 첨가제;f) 유리 라디칼 광개시제;g) 양이온성 광개시제; 및h) 색상 마스킹제를 포함하고, 상기 무색 투명한 3차원 제품이,i) 400 내지 500nm 범위에서 자외선-가시광선 분광광도계에 의해 측정시 67% 초과의 투과도 및 투명도; 및ii) 400 내지 750nm의 가시광선 파장에서 분광광도계에 의해 측정시 CIELAB 색공간에서 -0.5 내지 +2.5의 b* 값으로 측정된 무색성의 특성을 갖는, 무색 투명한 3차원 제품.
- 입체리쏘그래피 방법을 사용하여 제조된 무색 투명한 3차원 제품으로서, 상기 제품을 제조하는데 사용되는 액체 방사선 경화성 수지가,a) 하나 이상의 일작용성, 이작용성 또는 다작용성 아크릴레이트 및 하나 이상의 우레탄 아크릴레이트 올리고머로 구성된 군 중에서 선택된 아크릴레이트 성분;b) 선택적으로, 하나 이상의 하이드록실-작용성 화합물;c) 선택적으로, i) 광 안정화제/UV 흡수제; ii) 산화방지제; iii) 습윤제; iv) 공기 방출제로 구성된 군중에서 선택되는 하나 이상의 첨가제;d) 유리 라디칼 광개시제; 및e) 색상 마스킹제를 포함하고, 상기 무색 투명한 3차원 제품이,i) 400 내지 500nm 범위에서 자외선-가시광선 분광광도계에 의해 측정시 67% 초과의 투과도 및 투명도; 및ii) 400 내지 750nm의 가시광선 파장에서 분광광도계에 의해 측정시 CIELAB 색공간에서 -0.5 내지 +2.5의 b* 값으로 측정된 무색성의 특성을 갖는, 무색 투명한 3차원 제품.
- 제 1 항에 있어서,상기 측정된 투명도 및 투과도가, 400 내지 500nm 범위에서 자외선-가시광선 분광광도계에 의해 측정시 70% 초과인, 방법.
- 제 1 항에 있어서,400 내지 750nm의 가시광선 파장에서 분광광도계에 의해 측정시 CIELAB 색공간에서 0 내지 +2.5의 b*값으로 측정된 무색성이 존재하는, 방법.
- 제 2 항에 있어서,상기 측정된 투명도 및 투과도가, 400 내지 500nm 범위에서 자외선-가시광선 분광광도계에 의해 측정시 70% 초과인, 수지.
- 제 2 항에 있어서,400 내지 750nm의 가시광선 파장에서 분광광도계에 의해 측정시 CIELAB 색공간에서 0 내지 +2.5의 b*값으로 측정된 무색성이 존재하는, 수지.
- 제 3 항에 있어서,상기 측정된 투명도 및 투과도가, 400 내지 500nm 범위에서 자외선-가시광선 분광광도계에 의해 측정시 70% 초과인, 수지.
- 제 3 항에 있어서,400 내지 750nm의 가시광선 파장에서 분광광도계에 의해 측정시 CIELAB 색공간에서 0 내지 +2.5의 b*값으로 측정된 무색성이 존재하는, 수지.
- 제 4 항에 있어서,상기 측정된 투명도 및 투과도가, 400 내지 500nm 범위에서 자외선-가시광선 분광광도계에 의해 측정시 70% 초과인, 제품.
- 제 4 항에 있어서,400 내지 750nm의 가시광선 파장에서 분광광도계에 의해 측정시 CIELAB 색공간에서 0 내지 +2.5의 b*값으로 측정된 무색성이 존재하는, 제품.
- 제 5 항에 있어서,상기 측정된 투명도 및 투과도가, 400 내지 500nm 범위에서 자외선-가시광선 분광광도계에 의해 측정시 70% 초과인, 제품.
- 제 5 항에 있어서,400 내지 750nm의 가시광선 파장에서 분광광도계에 의해 측정시 CIELAB 색공간에서 0 내지 +2.5의 b*값으로 측정된 무색성이 존재하는, 제품.
- 제 2 항에 있어서,옥세테인이 존재하는, 수지.
- 제 3 항에 있어서,옥세테인이 존재하는, 수지.
- 제 1 항에 있어서,상기 색상 마스킹제가 하나 이상의 청색 안료를 포함하는 방법.
- 제 1 항에 있어서,상기 색상 마스킹제가 하나 이상의 자색 안료를 포함하는 방법.
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US11/819,508 US20090004579A1 (en) | 2007-06-27 | 2007-06-27 | Clear and colorless three-dimensional articles made via stereolithography and method of making said articles |
PCT/US2008/007267 WO2009005576A1 (en) | 2007-06-27 | 2008-06-11 | Clear and colorless three-dimensional articles made via stereolithography and method of making said articles |
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JP5444565B2 (ja) | 2014-03-19 |
EP2160649A1 (en) | 2010-03-10 |
KR20100009531A (ko) | 2010-01-27 |
US20090292040A1 (en) | 2009-11-26 |
US20090286181A1 (en) | 2009-11-19 |
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