KR101057453B1 - Plasma processing device - Google Patents

Abstract

PURPOSE: A plasma processing apparatus is provided to immediately sterilize and decompose microorganism and organic materials by supplying gas into a dielectric pipe, which is immersed in a target object, and applying a voltage to a core electrode. CONSTITUTION: An insulating dielectric pipe(110) forms a gas inlet and a gas outlet. The gas inlet is separated from liquid target object, and the gas outlet is in connection with the liquid target object. A conductive core electrode(120) is separated from the liquid target object by being inserted into the hollow space of the dielectric pipe. A gas supplying part(140) supplies gas through the gas inlet. A blocking unit is mounted at the gas outlet in order to separate a core electrode from the target object. The dielectric pipe is vertically immersed on the surface of the target object.

Description

Plasma Processing Equipment {PLASMA PROCESSING DEVICE}

The present invention relates to a plasma processing apparatus for processing a liquid target object, and more particularly, to a plasma processing apparatus for treating a liquid target object with a plasma product generated by plasma discharge.

In contaminated water with a lot of organic matter, microorganisms can live together. If sewage flows into rivers or seawater as it is, decay of organic matter reduces oxygen concentrations, and fish and various aquatic organisms can die out due to lack of oxygen concentrations or toxins caused by harmful microorganisms. In addition, odor may be generated in the process of rot. Therefore, various methods have been used for the killing of microorganisms in wastewater used in livestock farms, farms or factories or for the treatment of organic matter.

Currently widely used methods for treating sewage include filtration, chlorination, UV irradiation, and ozonation.

However, the treatment method through filtration can remove microorganisms and organic materials together, but it is not suitable for sterilizing microorganisms, and requires periodic replacement of the filter, which is complicated in maintenance and management and increases in cost.

The chlorine treatment method is excellent in the sterilization effect of microorganisms, but does not have a sterilizing effect on all microorganisms, there is a problem that the toxicity of chlorine directly affects fish and other aquatic organisms.

The UV treatment method has a disadvantage in that it is not suitable for a large amount of sewage treatment because there is a limit to the penetration depth of the ultraviolet light, and the sterilization effect is not good because the proper energy density and wavelength are different for each microorganism, and the maintenance cost is not low due to the short life of the UV lamp.

In addition, the ozone injection method is excellent in killing microorganisms, but ozone must be rapidly decomposed at high temperature to maintain the waste water at a low water temperature, and the initial facility investment cost and maintenance cost are high.

The present invention provides a plasma processing apparatus capable of removing organic matter in sewage and killing microorganisms at the same time.

The present invention provides a plasma processing apparatus having an immediate organic matter removal of sewage and killing of microorganisms.

The present invention provides a plasma treatment apparatus capable of treating sewage without using a material such as a separate chemical agent, and facilitating continuity and automation of sewage treatment.

According to an exemplary embodiment of the present invention, a plasma processing apparatus for treating a liquid to be treated with a plasma product includes a dielectric tube having a gas inlet separated from the object to be treated and a gas outlet communicating with the object to be processed. A core electrode disposed inside the dielectric tube to be isolated from the object to be treated, and a gas supply unit supplying gas to the gas inlet port, and mounted to the gas outlet port to prevent the object to be introduced into the dielectric tube through the gas outlet port. The gas supplied through the gas inlet is exposed to the plasma discharge generated by applying power to the core electrode, and the gas containing the plasma product exposed to the plasma discharge is supplied to the object to be treated through the gas outlet. do.

The dielectric tube may be made of various dielectric materials, for example, ceramic materials such as quartz, glass, and glass laminates may be used, and in some cases, electrical insulation is good and thus many electrical parts may be used. Synthetic resins such as polycarbonate and polyethylene may be used, and glass laminates filled with epoxy may be used. Of course, the material of the dielectric tube is not limited to the material described above, and the dielectric tube can be made of any dielectric having good insulation and heat resistance.

The core electrode may be made of tungsten or other metal material, which is electrically conductive carbon or has excellent conductivity and good heat resistance and strength.

When an alternating current high voltage, that is, a power source is applied to the core electrode, a discharge is induced between the core electrode and the dielectric tube. At this time, various plasma products are generated from the gas forcibly supplied into the dielectric tube, and the plasma products may be supplied to the liquid to-be-processed object to treat the object to be processed.

In the present specification, the object to be treated may be understood as a liquid having a predetermined electrical conductivity, and the present invention is not limited or limited by the type and characteristic of the object to be treated. Specifically, the object to be treated may be sewage containing various organic matter or microorganisms used in a barn, farm or factory, and in some cases, may be pure water. Likewise, the gas may also be air in a general atmosphere including oxygen, hydrogen, argon, or the like, or may be one kind of gas such as oxygen.

Depending on the type of gas supplied to the dielectric tube, the type of plasma product to be produced may vary somewhat, and the properties of the object to be treated by the plasma product may also vary.

Specifically, when the object to be treated is sewage and the gas supplied to the dielectric tube is general air, the gas generates oxidative active species such as ozone, O, H ₂ O ₂ , OH, ultraviolet rays, etc. by plasma discharge. The organic matter and microorganisms in the sewage can be treated. For reference, in the present specification, the microorganism is an organism mainly constituting the body as a single cell or hyphae, and includes algae, bacteria, protozoa, fungi, yeast, And it can be used as a meaning including a virus (virus) and the like.

In addition, when the object to be treated is pure water and the gas is pure oxygen, ozone is generated from oxygen, and ozone water may be produced from the object to be treated with ozone.

On the other hand, the liquid to be processed object may be connected to the ground electrode, the liquid to be processed object serves as a ground electrode, it is possible to solve the problem of corrosion unlike when using a metal electrode.

In addition, the core electrode is disposed in the dielectric tube and does not directly contact the liquid object to be processed, thereby minimizing power loss due to electrical conduction of the liquid object to be processed.

In addition, the blocking member is mounted to the gas outlet to prevent the object to be introduced into the dielectric tube through the gas outlet, the blocking member may be a valve that can simply discharge the gas from the inside of the dielectric tube to the outside, It may be a diffuser for supplying a gas containing a plasma product to the object to be treated in a bubble state, and by supplying the gas to the liquid object to be treated in a bubble state, it is possible to improve the treatment effect of the plasma product. have.

In addition, the dielectric tube is immersed perpendicular to the surface of the object to be treated so that the gas inlet formed on the upper portion of the dielectric tube may be disposed outside the object to be treated, and the gas outlet formed under the dielectric tube may be immersed in the object to be treated. Can be.

In addition, when gas passes between the core electrode and the dielectric tube to which a high voltage of a predetermined voltage or more is applied, the insulating state of the dielectric tube is broken and a plasma state is generated. In this case, various kinds of plasma products (for example, ozone and radical) Active components such as ions, electrons, and excited molecules) are generated, and ultraviolet rays of various wavelengths are emitted by ions or excited molecules in the plasma state.

Therefore, by providing a photocatalyst coating layer including a photocatalyst on a surface including at least one of an inner surface and an outer surface of the dielectric tube, the sterilization effect by ultraviolet rays can be maximized, and TiO ₂ can be used as the photocatalyst. .

Meanwhile, the core electrode may be fixed to the inner center of the dielectric tube by the core electrode fixing member, and the through hole may be provided in the core electrode fixing member to allow gas to flow into the dielectric tube.

The core electrode fixing member may be made of polytetrafluoroethylene (PTFE), and polytetrafluoroethylene is a non-flammable material having good heat resistance and is not eroded by all chemicals except molten alkali metal and high temperature fluorine gas. Since the insulating property is good and the property does not change even when it is in direct contact with the core electrode, it is a useful material for fixing the core electrode to the dielectric tube.

As described above, the plasma processing apparatus according to the present invention may manufacture a plasma product with a simple configuration including a dielectric tube and a core electrode, and may use the same to process a liquid target object.

In addition, by supplying gas to the inside of the dielectric tube and applying only a voltage to the core electrode in a state in which the dielectric tube is directly immersed in the object to be treated, immediate sterilization and microorganism decomposition of the microorganism is possible.

In addition, because it does not use a material such as a separate chemical, it is very easy to implement the continuity and automation of sewage treatment.

In some cases, the plasma processing apparatus may further include a storage chamber including a chamber body for storing an object to be processed and a dielectric tube fixing member for disposing a dielectric tube inside the chamber body. In this case, it is possible to process the object to be treated in the storage chamber part.

For example, the chamber body is provided with a gas inlet chamber body for providing a gas inlet space in communication with the gas inlet of the dielectric tube, and a gas outlet of the dielectric tube, and provides a target object receiving space for receiving the object to be treated. It may include a chamber for receiving the object to be treated, wherein, the gas inlet chamber body and the object to be treated chamber body can form a space isolated from each other.

In addition, the storage chambers may be connected to each other to repeatedly process the object to be processed. Specifically, the other storage chambers may be supplied from one storage chamber by using a gas containing plasma products generated in the one storage chamber. The to-be-processed object of the plasma-treated liquid may be processed again.

The plasma processing apparatus of the present invention can produce a plasma product with a simple configuration including a dielectric tube and a core electrode, and can use the same to process a liquid target object.

In the plasma processing apparatus of the present invention, by directly supplying gas into the dielectric tube and applying only a voltage to the core electrode while the dielectric tube is directly immersed in the object to be treated, the microorganism can be immediately sterilized and the organic matter can be decomposed.

Since the plasma treatment apparatus of the present invention does not use a material such as a separate chemical agent, it is very easy to implement continuity and automation of sewage treatment.

The plasma processing apparatus of the present invention can easily change the properties of the object to be treated by the plasma product by changing the kind of gas supplied to the object to be treated and the dielectric tube. For example, when the object to be treated is pure water and the gas is pure oxygen, ozone can be generated from oxygen, and ozone water can be produced from the object to be treated with ozone.

The plasma processing apparatus of the present invention may connect at least two or more storage chambers to each other to repeatedly process an object to be processed.

1 is a state diagram in which a plasma processing apparatus according to an embodiment of the present invention is immersed in an object to be processed.
FIG. 2 is a cross-sectional view of the plasma processing apparatus shown in FIG. 1.
3 is a cross-sectional view of a plasma processing apparatus according to another embodiment of the present invention.
4 is a cross-sectional view of a plasma processing apparatus according to another embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the like elements throughout. For reference, in the present description, the same numbers refer to substantially the same elements, and may be described by quoting contents described in other drawings under such a rule, and the contents repeated or deemed apparent to those skilled in the art may be omitted.

1 is a state diagram in which a plasma processing apparatus according to an embodiment of the present invention is immersed in an object to be processed, and FIG. 2 is a cross-sectional view of the plasma processing apparatus shown in FIG. 1.

1 and 2, the object to be treated may be sewage generated from a farm or a livestock house, and the plasma processing apparatus is directly immersed in the object to be treated.

In conventional conventional sewage treatment facilities, chemicals such as antibiotics are directly injected into the sewage, chlorine gas or ozone is injected, or UV treatment is used to decompose organic matter or remove microorganisms. However, the conventional sewage treatment facility has to separately prepare a tank for storing gas, and there are many disadvantages in that maintenance and repair costs are not great and sterilization effects are insignificant.

However, since the plasma processing apparatus 100 according to the present invention is capable of treating sewage by supplying only air and power in a state directly immersed in sewage, a separate storage tank for storing a gas such as chlorine or ozone is provided. There is no need, and the risk of gas leaks is eliminated inherently, it is very easy to implement continuity and automation of sewage treatment with only air and power supply, and the maintenance cost is greatly reduced.

In addition, it is possible to maximize the sewage treatment effect by immediately generating a plasma product whenever the sewage treatment is required to treat the sewage.

Hereinafter, a plasma processing apparatus according to the present invention capable of treating sewage will be described in detail.

1 and 2, the plasma processing apparatus 100 includes a dielectric tube 110, a core electrode 120, a core electrode fixing member 130, a gas supply unit 140, a power supply unit 150, and a diffuser. 160.

The dielectric tube 110 may be made of a dielectric material, for example, may use a ceramic material such as quartz, glass, glass laminate, and in some cases, the electrical insulation may use a synthetic resin such as polycarbonate and polyethylene. It is also possible to use a mixture of a synthetic resin and a ceramic material, such as a glass laminate filled with epoxy. Of course, the material of the dielectric tube 110 is not limited to the above-described material, the dielectric tube 110 may be made of any dielectric having good insulation and heat resistance.

As will be described later, the core electrode 120 is disposed inside the dielectric tube 110 to be isolated from the object to be treated. Specifically, the diffuser 160 is mounted to the gas discharge port 114 so that the dielectric tube passes through the gas discharge port 114. The object to be treated is prevented from being introduced into the inside of the 110, and the upper core electrode fixing member 132 is mounted at the gas inlet 112 so that the object to be treated is introduced into the dielectric tube 110 through the gas inlet 112. Inflow is prevented.

The core electrode 120 may be made of tungsten or other metal material having good electrical conductivity or good conductivity and good heat resistance and strength.

The core electrode fixing member 130 is used to arrange the core electrode 120 at the inner center of the dielectric tube 110. In this embodiment, one core electrode 120 is disposed at the top of the dielectric tube 110 and at the inner middle of the dielectric tube 110. . Of course, the number may be changed so that the core electrode 120 can be more stably disposed inside the dielectric tube 110.

In the present exemplary embodiment, the upper core electrode fixing member 132 is mounted at the gas inlet 112 of the dielectric tube 110, and has a through hole 133 formed in the external gas supply unit 140 and the upper core electrode fixing member 132. Are connected to each other via a hose.

Therefore, the gas supplied from the gas supply unit 140 may be supplied into the dielectric tube 110 through the through hole 133 of the upper core electrode fixing member 132, and the object to be processed through the gas inlet 112. Inflow into the dielectric tube 110 is prevented.

In addition, the intermediate core electrode fixing member 134 is provided with a through hole 135 to allow gas flowing into the dielectric tube 110 to pass therethrough.

Meanwhile, the core electrode fixing member 130 may be made of polytetrafluoroethylene, and polytetrafluoroethylene is a non-flammable material having good heat resistance without being eroded by all chemicals except molten alkali metal and high temperature fluorine gas. In addition, since the electrical insulation is good, the properties of the core electrode 120 can be fixed to the dielectric tube 110 because the properties thereof do not change even when directly in contact with the core electrode 120.

As described above, the AC electrode supplied from the power supply unit 150, that is, the power is supplied to the core electrode 120 fixed inside the dielectric tube 110 by the core electrode fixing member 130, and simultaneously compresses gas. When air is supplied from the gas supply unit 140, such as a compressor, to the inside of the dielectric tube 110, the dielectric tube is placed in a discharge or plasma state while the insulation is broken. At this time, various plasma products are generated from the gas forcibly supplied into the dielectric tube 110. The generated plasma product may be supplied to the liquid to-be-processed object through the diffuser 160 mounted at the lower end of the dielectric tube 110 to treat the object to be processed.

On the other hand, the liquid to be processed object may be connected to the ground electrode, the liquid to be processed object serves as a ground electrode, it is possible to solve the problem of corrosion unlike when using a metal electrode.

In addition, the core electrode 120 is disposed in the dielectric tube 110 and does not directly contact the liquid to be processed, thereby minimizing power loss due to the electrical conduction of the liquid to be processed.

In addition, the gas outlet 114 of the dielectric tube 110 is equipped with a diffuser 160 for supplying a gas containing a plasma product to the object to be processed in a bubble state. By supplying a gas to the liquid to-be-processed object in a bubble state, the effect of treating a to-be-processed object of a plasma product can be improved.

Here, the diffuser 160 may prevent the object to be processed from being introduced into the dielectric tube 110 through the gas outlet 114, and may simply discharge air only from the inside of the dielectric tube 110 to the outside. It may also be provided in the form of a valve.

In addition, when a gas passes between the core electrode 120 and the dielectric tube 110 to which a high voltage or more is applied, a plasma state in which insulation is broken occurs. In this case, various kinds of plasma products (for example, ozone, latina) Active ingredients such as knives, ions, electrons, and excited molecules are generated, and ultraviolet rays of various wavelengths are emitted by ions or excited molecules in the plasma state.

Therefore, by providing a photocatalyst coating layer including a photocatalyst on a surface including at least one of an inner surface and an outer surface of the dielectric tube 110, the sterilization effect by ultraviolet rays can be maximized, and TiO ₂ is used as the photocatalyst. Can be used.

As described above, the plasma processing apparatus 100 according to the present invention manufactures a plasma product with a simple configuration including a dielectric tube 110 and a core electrode 120, and uses the same to process a liquid target object. can do.

In addition, the dielectric tube 110 is directly immersed in the object to be treated, by supplying gas into the dielectric tube 110 and applying only a voltage to the core electrode 120, thereby immediately disinfecting microorganisms and decomposing organic matter. Is possible.

In addition, because it does not use a material such as a separate chemical, it is very easy to implement the continuity and automation of sewage treatment.

On the other hand, in the present embodiment, the object to be treated is described as a sewage and the gas as a general air in the air, in some cases, the object to be treated is pure in addition to the sewage containing a variety of organic matter or microorganisms used in the barn, farm or factory It may be water. Similarly, the gas may also be air in the general atmosphere or may be a kind of gas such as oxygen.

Depending on the type of gas supplied to the dielectric tube 110, the type of plasma product may vary somewhat, and the properties of the object to be processed by the plasma product may also vary.

Specifically, when the object to be treated is filthy water, and the gas supplied to the dielectric tube 110 is general air, the gas is oxidized active species such as ozone, O, H ₂ O ₂ , OH, and ultraviolet rays by plasma discharge. Etc. can be generated to treat organic matter and microorganisms in the sewage.

In addition, when the object to be treated is pure water and the gas supplied to the dielectric tube 110 is pure oxygen, ozone may be generated from oxygen, and ozone water may be produced from the object to be treated with ozone.

3 is a cross-sectional view of a plasma processing apparatus according to another embodiment of the present invention.

The plasma processing apparatus shown in FIG. 3 is substantially the same as the plasma processing apparatus according to the previous embodiment. Thus, in the present embodiment will be described with respect to the components and the difference between the components added in the above embodiment, the description of the components already described in the previous embodiment can be omitted.

Referring to FIG. 3, the plasma processing apparatus 200 includes a dielectric tube 210, a core electrode 220, a core electrode fixing member 230, a gas supply unit 240, a power supply unit 250, a diffuser 260, And a storage chamber portion 270.

The storage chamber 270 includes a chamber body 280 capable of receiving and storing an object to be processed and a dielectric tube fixing member 290 for disposing the dielectric tube 210 inside the chamber body 280. It may be disposed adjacent to the object to be treated.

The chamber body 280 again includes a gas inlet chamber body 281 and a chamber body 285 for receiving an object to be processed.

Specifically, the gas inlet chamber body 281 provides a gas inlet space 282 in communication with the gas inlet 212 of the dielectric tube 210, the chamber body 285 for receiving the object to be treated is the dielectric tube 210. The gas outlet 214 is disposed, and provides a target object receiving space 286 for receiving the target object. The gas inlet space 282 of the gas inlet chamber body 281 and the object receiving space 286 of the chamber body 285 for receiving the object to be formed form a space that is isolated from each other, and is selectively selected only through the dielectric tube 210. Communicating with.

The gas supplied from the gas supply unit 240 may be introduced into the gas inlet 212 of the dielectric tube 210 exposed to the gas inlet space 282 of the gas inlet chamber body 281. In this embodiment, the gas supply unit 240 and the upper core electrode fixing member 232 are directly connected to each other by a hose, but in some cases, the gas supply unit 240 may include a gas supply hole formed in the gas inlet chamber body 281. The gas is supplied to the gas inlet space 282 through 283, and the gas introduced into the gas inlet space 282 is again passed through the through hole 233 formed in the upper core electrode fixing member 232. It may be designed to be introduced into the gas inlet 212 of. For reference, a through hole may also be provided in the intermediate core electrode fixing member 234 so that the gas supplied to the gas inlet 212 of the dielectric tube 210 may be discharged through the gas outlet 214.

On the other hand, the chamber body 285 for the object to be treated is provided with a target object inlet 287 for introducing the target object, the target object outlet 288 for discharging the target object, and the dielectric tube 210 A plasma product outlet 289 is formed for discharging the gas including the plasma product discharged through the gas outlet 214 of the back to the outside.

By separating the gas inlet space 282 of the gas inlet chamber body 281 and the object receiving space 286 of the chamber body 285 for receiving the object to be treated, the object to be treated in the object receiving space 286 to be treated. Plasma products collected on the surface of the water can be prevented from mixing with the gas flowing into the gas inlet space 282 of the gas inlet chamber body 281.

4 is a cross-sectional view of a plasma processing apparatus according to another embodiment of the present invention.

The plasma processing apparatus shown in FIG. 4 is substantially the same as the plasma processing apparatus according to the previous embodiment. Thus, in the present embodiment will be described with respect to the components and the difference between the components added in the above embodiment, the description of the components already described in the previous embodiment can be omitted.

Referring to FIG. 4, the same first and second storage chamber portions 370 and 470 as the storage chamber portions illustrated in FIG. 3 are disposed adjacent to each other.

The two first and second storage chamber portions 370 and 470 may be connected to each other to repeatedly process the object to be processed, and the second storage chamber portion 470 may be generated by the first storage chamber portion 370. By using the gas containing the plasma product, the object to be processed in the plasma-treated liquid supplied from the first storage chamber unit 370 may be processed again. Of course, a plurality of storage chambers may be connected to each other to process two or more objects to be processed.

Specifically, in addition to the first and second storage chamber portions 370 and 470, the plasma processing apparatus 500 includes a first dielectric tube 310 and a first dielectric tube 310 for generating a plasma product inside the first storage chamber portion 370. The core electrode 320, the first core electrode fixing member 330, the first gas supply part 340, the first power supply part 350, and the first diffuser 360 are included.

Similarly, inside the second storage chamber 470, a second dielectric tube 410, a second core electrode 420, a second core electrode fixing member 430, and a second gas supply unit 440 for generating plasma products. ), A second power supply 450, and a second diffuser 460.

In addition, the first plasma product outlet 389 of the first to-be-processed object chamber 385 of the first storage chamber 370 is connected to the gas inlet of the second dielectric tube 410.

Accordingly, by supplying a gas already exposed to the plasma in the first dielectric tube 310 in the first storage chamber 370 and containing the plasma product to the second dielectric tube 410 in the second storage chamber 470. The gas discharged through the gas outlet of the second dielectric tube 410 may include more abundant plasma products.

In addition, the first to-be-processed object outlet 388 of the first to-be-processed object chamber 385 of the first storage chamber 370 may have a second to-be-processed object chamber of the second storage chamber 470. It is connected to the second to-be-processed object inlet 478 of 485.

Therefore, the object to be processed once already processed by the plasma product in the first storage chamber 370 may be processed again in the second storage chamber 470.

As described above, although described with reference to the preferred embodiments of the present invention, those skilled in the art various modifications and variations of the present invention without departing from the spirit and scope of the invention described in the claims below I can understand that you can.

100: plasma processing apparatus 110: dielectric tube
112: gas inlet 114: gas outlet
120: core electrode 130: core electrode fixing member
132: upper core electrode fixing member 134: middle core electrode fixing member
140: gas supply part 150: power supply part
160: diffuser 270: storage chamber
280: chamber body 281: gas inlet chamber body
282: gas inlet space 283: gas supply port
285: chamber body for object to be treated 286: space for object to be treated
287: Object to be treated inlet 288: Object to be treated outlet
289: plasma product outlet 290: dielectric tube holding member

Claims (12)

In the plasma processing apparatus for processing a liquid to-be-processed object with a plasma product,
An insulating dielectric tube having an empty space therein and immersed in the liquid object to be treated, and having a gas inlet separated from the liquid object to be processed and a gas outlet communicating with the object to be processed;
A conductive core electrode inserted into an empty space inside the dielectric tube and isolated from the liquid target object;
A gas supply unit supplying gas to the gas inlet; And
The core electrode is prevented from flowing into the empty space inside the dielectric tube through the gas outlet while the dielectric tube is immersed in the liquid target object, thereby allowing the core electrode to be treated. A blocking member mounted to the gas outlet so as to be isolated from an object;
The plasma discharge space is formed by applying power to the core electrode is separated from the object to be processed in the liquid phase,
The gas supplied through the gas inlet is exposed to a plasma discharge generated by applying power to the core electrode, and the gas containing the plasma product exposed to the plasma discharge is supplied to the object to be processed through the gas outlet. Ultraviolet rays generated by the plasma discharge are directly supplied to the object to be treated in the liquid phase,
And the object to be treated is connected to a ground electrode. The method of claim 1,
The blocking member is a plasma processing apparatus, characterized in that the diffuser (diffuser) for supplying the gas containing the plasma product to the object to be processed in a bubble state. delete The method of claim 1,
And the dielectric tube is immersed perpendicular to the surface of the object to be treated. The method of claim 1,
And a photocatalyst coating layer comprising a photocatalyst formed on a surface of the dielectric tube. The method of claim 5,
The photocatalyst is a plasma processing apparatus comprising TiO ₂ . The method of claim 1,
The dielectric tube uses any one of quartz, glass, and ceramics. The method of claim 1,
Fixing the core electrode inside the dielectric tube,
And a core electrode fixing member in which a through hole through which gas flowing into the dielectric tube passes is formed. The method of claim 8,
The core electrode holding member is a plasma processing apparatus, characterized in that using polytetrafluoroethylene (PTFE). The method of claim 1,
A chamber body for storing the object to be processed; And
A dielectric tube fixing member for disposing the dielectric tube inside the chamber body;
The plasma processing apparatus further comprises a storage chamber comprising a. The method of claim 10,
The chamber body,
A gas inlet chamber body in communication with the gas inlet of the dielectric tube and providing a gas inlet space for receiving gas supplied from the gas supply part; And
A chamber body for receiving an object to be disposed, wherein the gas outlet of the dielectric tube is disposed and provides an object to be processed containing the object to be processed;
Plasma processing apparatus comprising a. The method of claim 11,
Another storage chamber portion is disposed adjacent to the storage chamber portion,
The other storage chamber portion using a gas containing a plasma product generated in the storage chamber portion,
Plasma processing apparatus characterized in that for further processing the object to be processed in the plasma-treated liquid supplied from the storage chamber.

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