KR101040739B1 - Antistatic film and manufacturing method thereof - Google Patents
Antistatic film and manufacturing method thereof Download PDFInfo
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- KR101040739B1 KR101040739B1 KR1020100006401A KR20100006401A KR101040739B1 KR 101040739 B1 KR101040739 B1 KR 101040739B1 KR 1020100006401 A KR1020100006401 A KR 1020100006401A KR 20100006401 A KR20100006401 A KR 20100006401A KR 101040739 B1 KR101040739 B1 KR 101040739B1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0226—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures having particles on the surface
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0268—Diffusing elements; Afocal elements characterized by the fabrication or manufacturing method
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/20—Properties of the layers or laminate having particular electrical or magnetic properties, e.g. piezoelectric
- B32B2307/21—Anti-static
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/22—Antistatic materials or arrangements
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Abstract
Description
The present invention relates to an antistatic diffuse reflection film and a manufacturing method thereof, and more particularly, a substrate; and a transparent conductive layer on the substrate; And a diffuse reflection layer on the transparent conductive layer, wherein the diffuse reflection layer satisfies both conductivity and diffuse reflection at the same time through an antistatic diffuse reflection film including conductive material particles, and reduces manufacturing cost, and a small amount of conductive material. It relates to an antistatic diffuse reflection film that can increase the antistatic effect while using.
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an antistatic diffuse reflection film applied to display surfaces such as LCDs used for image display of navigation, mobile phones, computers, televisions, and the like, and a method of manufacturing the same. As a result, foreign matters were attached to the surface or liquid crystals were broken by electric charges on the outer surface of a large liquid crystal display (LCD). In addition, in the case of an antistatic diffuser film coated with various principles, for example, an antistatic agent using a surfactant exhibits an antistatic effect by absorbing moisture in the air, it reacts sensitively to moisture and the antistatic performance disappears within a short time. In addition, the ionic surfactant has a problem that the ions are transferred to the surface to precipitate on the base film, and in the case of the antistatic agent using the conductive polymer, the antistatic agent is added in a large amount, such as problems such as lowering the hardness and lowering the transmittance due to the dark color have.
In addition, in the case of an antistatic diffuse reflection film including a conventional diffuse reflection layer by implementing a diffuse reflection property by a method of imparting fine concavo-convex structure by dispersing fine particles having transparency such as metal oxide, glass, plastic in the ultraviolet curable resin However, this method has a problem that it can not satisfy both diffuse reflection and conductivity at the same time, there has been a problem that a large amount of antistatic agent must be used to satisfy this conductivity.
Thus, the present inventors completed the present invention through an antistatic diffuse reflection film and a method of manufacturing the same to reduce the amount of antistatic agent used to solve the above problems while increasing the effect on the diffuse reflection characteristics.
The present invention has been made in consideration of the problems of the prior art described above, can reduce the amount of the antistatic agent used to reduce the manufacturing cost of the conductive material, by including a diffuse reflection layer containing a conductive material, improving the antistatic persistence, film An object of the present invention is to provide an antistatic diffuse reflection film capable of improving precipitation reduction, hardness improvement, diffuse reflection, and permeability.
Another object of the present invention is to provide a method for producing an antistatic diffuse reflection film.
The present invention provides a means for solving the above problems, a substrate; and a transparent conductive layer on the base; And a diffuse reflection layer on the transparent conductive layer, wherein the diffuse reflection layer provides an antistatic diffuse reflection film including conductive material particles.
In addition, the present invention as another means for solving the above problems, forming a transparent conductive layer on the substrate; Forming a diffuse reflection layer on the transparent conductive layer; wherein the forming the diffuse reflection layer includes a) preparing a dopant; and polymerizing a conductive polymer to the dopant prepared therein Preparing step b); And it provides a method for producing an antistatic diffuse reflection film comprising the step of c) coating the polymerized polymer on the transparent conductive layer using a binder resin.
According to the present invention, the manufacturing cost and process of the conductive material can be simplified, the resolution can be increased, the manufacturing cost and the processing cost can be reduced, and the fluorescent lamp is provided through the antistatic diffused film including the diffuse reflection layer containing the conductive material. To prevent the glare of the display screen by diffusely reflecting the external light source such as natural light, and to provide an antistatic diffuse reflection film that can increase the antistatic effect while using a small amount of conductive material.
1 is a schematic diagram showing the movement of the charge of the antistatic diffuse reflection film according to an embodiment of the present invention.
The present invention is a substrate; and a transparent conductive layer on the substrate; And a diffuse reflection layer on top of the transparent conductive layer, the diffuse reflection layer relates to an antistatic diffuse reflection film, characterized in that it comprises conductive material particles.
Hereinafter, the antistatic diffuse reflection film of the present invention will be described in more detail.
As described above, the antistatic diffuse reflection film of the present invention is a substrate; and a transparent conductive layer on top of the substrate; And a diffuse reflection layer on the transparent conductive layer, wherein the diffuse reflection layer includes conductive material particles.
The said base material is not specifically limited, It can select from the resin material used for a well-known plastic base film suitably, and can use. As such a resin material for the base film, for example, ester, ethylene, propylene, diacetate, triacetate, styrene, carbonate, methylpentene, sulfone, ether ethyl ketone, imide, fluorine, nylon, acrylate, or cycloaliphatic Polymers or copolymerized polymers having one selected from an olefin system or the like as the structural unit can be used.
In addition, the conductive layer formed on the substrate is zinc oxide, tin oxide, tin-containing indium oxide particles (ITO), tin-containing antimony oxide particles (ATO), indium oxide, zinc oxide, antimony pentoxide, zinc antimonate, polyethylene A conductive resin may be formed by coating a binder resin containing at least one conductive material selected from the group consisting of deoxythiophene, polyaniline, and polypyrrole on the substrate.
In this case, the binder resin may be used without particular limitation as long as it is a binder component capable of forming a transparent conductive layer. Examples of such binder components include alkyd resins, polyester resins, unsaturated polyester resins, polyurethane resins, acrylic resins, epoxy resins, phenol resins, vinyl resins, silicone resins, fluorine resins, phthalic acid resins, amino resins, and polyamides. Resin, polyacrylsilicone resin, melamine resin, urea resin, or modified binder resin thereof may be used alone or in combination of two or more thereof. Such binder resin may be a photocurable resin for the convenience of curing process. It is preferable.
Moreover, a crosslinking agent can be contained in the said binder component as needed. For example, any crosslinking agent having at least two basic functional groups such as amino groups, neutral functional groups such as hydroxyl groups (OH), acidic functional groups such as carboxyl groups, and reactive functional groups such as isocyanate groups can be used.
The diffuse reflection layer may be coated and cured on the conductive layer using a binder resin containing a conductive material to form a diffuse reflection layer. In this case, as the conductive material particles, a conductive material generally used may be used without limitation.
The conductive material particles may be prepared by using a composite of the dopant particles and the conductive polymer containing an anionic compound, preferably using a poly (3,4-ethylenedioxythiophene) as a conductive polymer, As the trope, polystyrene sulfonic acid complexed with polyethylene dioxythiophene complexed with polystyrene sulfonic acid may be prepared and used.
In this case, as the binder resin used for the diffuse reflection layer, the above-described binder resin for the conductive layer may be used in the same manner, but is not limited thereto.
In addition, the diffuse reflection layer may further include non-conductive particles, it is possible to increase the diffuse reflection by forming a diffuse reflection layer having a fine concavo-convex structure by the non-conductive particles and the conductive material. The method for forming the fine concavo-convex is not particularly limited, and the fine concavo-convex can be imparted by dispersing the non-conductive particles and the conductive material in the above-mentioned binder resin. At this time, it is preferable that the electrically-conductive material of this invention is contained in 1 to 60 weight part with respect to 100 weight part of binder resins. When the conductive material is less than 1 part by weight with respect to 100 parts by weight of the binder resin, the antistatic effect is lowered. When the conductive material exceeds 60 parts by weight, the antistatic effect is increased, but the dark color of the conductive particles is realized in the diffuse reflection layer, thereby decreasing transparency. There is a fear.
The non-conductive particles used in the present invention can be used without limitation as long as they have transparency such as metal oxide, glass, plastic, and the like. For example, the non-conductive particles may include metal oxides such as silica, zirconia, titania, calcium oxide, inorganic conductive fine particles such as alumina, tin oxide, indium oxide, cadmium oxide, and antimony oxide, polymethyl methacrylate, And crosslinked or uncrosslinked organic fine particles or silicone fine particles composed of various polymers such as polystyrene, polyurethane, acrylic-styrene copolymer, benzoguanamine, melamine, and polycarbonate, and the like, and can be used without limitation.
In addition, as described above, the composition including binder resin, non-conductive particles, and conductive material may be coated and cured on the conductive layer to form a diffuse reflection layer. At this time, the coating method and coating thickness are not particularly limited, but the coating thickness is preferably 0.1 μm to 20.0 μm in terms of profitability and physical properties.
Hereinafter, the present invention will be described in more detail with reference to the accompanying drawings.
Figure 1 shows a schematic diagram showing the movement of the charge of the antistatic diffuse reflection film according to an embodiment of the present invention.
Referring to FIG. 1, in the antistatic
Therefore, as in the present invention, by separately forming the
On the other hand, the present invention comprises the steps of forming a conductive layer on the substrate; Forming a diffuse reflection layer on the conductive layer; wherein the forming the diffuse reflection layer includes a) preparing a dopant; and preparing a conductive material by polymerizing a conductive conductive polymer to the prepared dopant. Step b); And c) coating the polymerized polymer on the conductive layer by using a binder resin.
That is, according to the method of manufacturing the antistatic diffuse reflection film of the present invention to form a conductive layer on the substrate, and to form a diffuse reflection layer on the conductive layer, in forming the diffuse reflection layer, to prepare a dopant, By polymerizing the conductive polymer to the prepared dopant, and then coated on the conductive layer using a binder resin, an antistatic diffuse reflection film can be produced, the antistatic diffuse reflection film formed in this way to increase the diffuse reflection and lower the surface resistance Can increase the antistatic ability.
The forming of the diffuse reflection layer may include: a) preparing a dopant; and b) preparing a conductive material by polymerizing a conductive polymer on the dopant. And c) coating the polymerized polymer on the conductive layer using a binder resin.
The dopant in step a) of preparing the dopant is not particularly limited as long as it is an anionic compound. Such anionic compound is a compound which has an anionic group in which the chemical oxidation dope to the above-mentioned conductive polymer can arise in a molecule | numerator. Specifically, at least one selected from the group consisting of a sulfate ester group, a phosphate ester group, a phosphoric acid group, a carboxyl group, and a sulfone group can be used, and more specifically, an anionic group-containing polymer can be used. Examples thereof include a polymer obtained by polymerizing an anion group into a polymer or polymerizing an anion group-containing polymerizable monomer by sulfating a polymer having no anionic group with a sulfonating agent.
Since such anion group containing polymer is easy to manufacture, it is preferable to polymerize and manufacture an anion group containing polymerizable monomer.
As a method for producing an anionic group-containing polymer by polymerization of an anionic group-containing polymerizable monomer, for example, a method for producing an anion group-containing polymerizable monomer in a solvent by oxidative polymerization or radical polymerization in the presence of an oxidizing agent or a polymerization catalyst. Can be mentioned. Specifically, a predetermined amount of anionic group-containing polymerizable monomer is dissolved in a solvent and kept at a constant temperature, and a solution in which a predetermined amount of an oxidizing agent or a polymerization catalyst is dissolved in the solvent is added to the reaction for a predetermined time. The polymer obtained by this reaction is adjusted to a constant concentration by the solvent. In this manufacturing method, you may copolymerize the polymerizable monomer which does not have an anion group to the anion group containing polymerizable monomer. The oxidizing agent or polymerization catalyst used in the above is not particularly limited, but at least one selected from the group consisting of acetyl sulfate, sodium lauryl sulfate, aluminum sulfate, potassium sulfate, chondroitin sulfate, and silver sulfate salt can be used.
The anionic group-containing polymerizable monomer is a monomer having an anionic group and a polymerizable functional group in a molecule, and specifically, vinylsulfonic acid and its salts, allylsulfonic acid and its salts, methacrylic sulfonic acid and its salts, styrenesulfonic acid and its salts, metallyl Oxybenzenesulfonic acid and its salts, allyloxybenzenesulfonic acid and its salts, α-methylstyrenesulfonic acid and its salts, acrylamide-t-butylsulfonic acid and its salts, 2-acrylamide-2-methylpropanesulfonic acid and its salts, cyclo Butylene-3-sulfonic acid and its salts, isoprenesulfonic acid and its salts, 1,3-butadiene- 1-sulfonic acid and its salts, 1-methyl- 1,3- butadiene-2-sulfonic acid and its salts, or 1-methyl -1, 3- butadiene- 4-sulfonic acid, its salt, etc. can be used, As a polymerizable monomer which does not have an anion group, Ethylene, a propene, 1-butene, 2-butene, 1-pentene, 2-pentene, 1 헥 , 2-hexene, styrene, p-methylstyrene, p-ethylstyrene, p-butylstyrene, 2,4,6-trimethylstyrene, p-methoxystyrene, α-methylstyrene, 2-vinylnaphthalene, 6-methyl 2-vinyl naphthalene, 1-vinylimidazole, vinylpyridine, vinyl acetate, acrylaldehyde, acrylonitrile and the like can be used.
As for such an anion group containing polymer, polystyrene sulfonic acid, polyisoprene sulfonic acid, ethyl sulfonic acid polyacrylate, butyl sulfonic acid polyacrylate is more preferable, and polystyrene sulfonic acid is more preferable. For example, as a method of preparing the polystyrene sulfonic acid as described above, conventional polystyrene particles are used, or polystyrene particles having a size of 2.0 μm to 3.2 μm and nano polystyrene particles having a size of 300 nm are synthesized through emulsion polymerization. In addition, the polystyrene particles synthesized above may be produced polystyrene sulfonic acid particles (dopant) using sulfuric acid.
In addition, the conductive polymer used in the step b); polymerizing the conductive polymer to the dopant prepared above is not particularly limited as long as it is a π conjugated organic conductive polymer.
Examples of the conductive polymer include polyaniline, polythiophene, polypyrrole, polyprene, polyacetylene, polyphenylene, polyphenylenevinylene, polyacene, and polythiophene vinylene. It is possible to select one or more from. As the conductive polymer, polythiophenes are preferably used, and more preferably, polyethylene dioxythiophene (poly (3,4-ethylenedioxythiophene)) can minimize the decrease in transparency.
The step b) is to polymerize the conductive polymer to the dopant prepared as described above. The complex is formed by chemically oxidizing the precursor monomer forming the conductive polymer in a suitable solvent in the presence of a suitable oxidizing agent, an oxidation catalyst and the dopant. Can be formed. In this case, the solvent may be used without limitation as long as it can disperse the precursor monomer and maintain the oxidizing power of the oxidizing agent or the oxidation catalyst.
The oxidizing agent or the oxidation catalyst is not limited as long as the precursor monomer can be oxidized to obtain a π-conjugated conductive polymer. Oxodisulfate; Ferric chloride, ferric sulfate, ferric nitrate, ferric trichloride (FeCl 3 ), ferrous sulfate (III), ferric tosylate (III), camphor sulfonate (III), cerium (IV) salt, potassium permanganate, One or more selected from the group consisting of iron sulfate pentahydrate (Fe 2 (SO 4 ) 3 · 5H 2 O), potassium thiosulfate (K₂S₂O₃), ammonium persulfate, potassium dichromate and copper (II) salts, Among them, it is preferable to use iron trichloride (FeCl 3 ).
Thus, the polymer polymerized through the polymerization process may be subjected to a filtration and drying process to prepare a conductive material.
In step c), the conductive material prepared above is coated on the conductive layer using a binder resin, and the binder resin including the coated conductive material may form a diffuse reflection layer on the conductive layer through a curing process.
In this case, as the binder resin used in step c), the above-described binder resin for the conductive layer may be used in the same manner, but is not limited thereto.
Hereinafter, although an Example demonstrates this invention concretely, this invention is not limited by these Examples.
[Production Example 1]
Manufacture of PPS (polystyrene complexed with polyethylene dioxythiophene)
Polystyrene was added to sulfuric acid at 75 ° C. for 1 hour to prepare polystyrenesulfonic acid particles, and 100.0 parts by weight of ethylenedioxythiophene was added based on 100.0 parts by weight of the polystyrenesulfonic acid particles prepared above, followed by uniform stirring for 1 day. Iron trichloride (FeCl 3 ), which is an oxidizing agent, was added to the stirred sample and reacted for 2 days, thereby preparing PPS (polystyrene complexed with polyethylenedioxythiophene) in which polystyrene particles were complexed with polystyrenedioxythiophene.
[Production Example 2]
-Manufacture of binder resin used for ovate layer-
5 parts by weight of pentaerytol triacrylate, 33 parts by weight of modified urethane acrylate, 2 parts by weight of 1-hydroxy cycloexyl phenyl ketone, 20 parts by weight of ethyl acetate, 40 parts by weight of methyl cellosolve, based on 100 parts by weight of the binder resin. The binder resin which becomes negative was mixed and manufactured.
Example 1
An ITO film coated by sputtering tin-containing indium oxide particles (ITO) on a polyethylene (PET) base film as a conductive layer was used. The binder resin prepared in Preparation Example 2 was used based on 100 parts by weight of the diffuse reflection composition. After preparing a diffuse reflection composition by mixing 98 parts by weight and 2 parts by weight of PPS (NPPS300) prepared in Preparation Example 1, the diffuse coating composition prepared above using a wire bar on the conductive layer is 6.0㎛ Coated to a temperature of 40 ° C. to 90 ° C. An antistatic diffuse reflection film was prepared by UV curing the dried antistatic diffuse reflection film to a light amount of 800mJ.
[Examples 2 to 6, Comparative Example 2]
An antistatic diffuse reflection film was prepared in the same manner as in Example 1 except for using the diffuse reflection composition prepared at the composition ratio shown in Table 1 below.
Example 7
Example 1 except for using a coated ITO film coated by sputtering tin-containing antimony oxide particles (ATO) on the base film and using a diffuse reflection composition prepared in the composition ratio shown in Table 1 below In the same manner as in the antistatic diffuse reflection film was prepared.
Comparative Example 1
An antistatic diffuse reflection film was prepared in the same manner as in Example 1, except that the diffuse reflection composition prepared in the composition ratio shown in Table 1 without the conductive layer was used.
SPS35: Nonconductive ordinary polystyrene (PS) particles, spherical polystyrene particles having a particle size of 3.5 μm
NPPS 300: 0.3 micrometer particle size polystyrene particles complexed with polyethylenedioxythiophene (PEDOT) according to Preparation 1
PPS20: 2.0 micrometer particle size polystyrene particles complexed with polyethylene dioxythiophene (PEDOT) as conductive particles
(Prepared in Production Example 1 using polystyrene particles having a particle size of 2.0㎛)
PPS32: 3.2 micrometer particle size polystyrene particles complexed with polyethylene dioxythiophene (PEDOT) as conductive particles
(Production Example 1 using polystyrene particles having a particle size of 3.2㎛)
(Ω / ㎠)
Test Example
Surface resistance measurement
The surface resistance of the conductive layer and the antistatic diffused film was measured at a temperature of 25 ° C. using an ultra insulation resistance / microammeter (manufactured by ADVANTEST Co., Ltd.), and the results are shown in Table 2 above. The unit of such a surface resistance value is (kV / cm <2>).
Haze measurement
The haze value of the antistatic diffuse reflection film was measured based on a PET film using a color haze meter (manufactured by Murakami Color Research Institute) and the results are shown in Table 2 above.
Permeability Measurement
Agilient 8453 UV-Vis was used to measure the transmittance of the conductive film at a wavelength of 600 nm, and the results are shown in Table 2 above.
Color difference measurement
D65 was used as a light source using a color difference measuring instrument (Kurashiki Co., Ltd., model "Akara 7e"), and the color difference value ΔE was measured at a 10-degree field of view, and the results are shown in Table 2 above.
As can be seen from the results of Table 2, in Examples 1 to 7 according to the present invention, by including a diffuse reflection layer containing a conductive material on the conductive layer, the comparison consisting of a diffuse reflection layer containing a conductive material without a conductive layer It can be confirmed that it is possible to have a much better surface resistance than Example 1 and Comparative Example 2 composed of a diffuse reflection layer containing a nonconductive material on the conductive layer.
From these results, it turned out that the electroconductive film of this invention can exhibit the outstanding electroconductivity. In addition, it can be seen from Table 2 that only a small amount of conductive material can be used to maintain the permeability.
10: base material 20: conductive layer
30: diffuse reflection layer 40: non-conductive particles
50: conductive material 60: charge
100: antistatic reflecting film
Claims (8)
A transparent conductive layer on top of the substrate; And
Include a diffuse reflection layer on top of the transparent conductive layer,
The diffuse reflection layer is an antistatic diffuse reflection film, characterized in that it comprises conductive material particles.
The transparent conductive layer is antimony tin oxide zinc oxide, tin oxide, tin-containing indium oxide particles (ITO), tin-containing antimony oxide particles (ATO), indium oxide, zinc oxide, antimony pentoxide, zinc antimonate, polyethylene dioxythi An antistatic diffuse reflection film comprising at least one conductive material selected from the group consisting of opene, polyaniline, and polypyrrole.
The conductive material particles are antistatic diffuse reflection film, characterized in that the composite is prepared by combining the conductive polymer and the dopant particles containing an anionic compound.
An antistatic diffuse reflection film, wherein the conductive polymer is poly (3,4-ethylenedioxythiophene) and the dopant is polystyrenesulfonic acid.
The diffuse reflection layer is an antistatic diffuse reflection film, characterized in that it further comprises non-conductive particles.
The non-conductive particles include metal oxides such as silica, zirconia, titania, calcium oxide, inorganic conductive particles such as alumina, tin oxide, indium oxide, cadmium oxide, and antimony oxide having conductivity, polymethyl methacrylate, polystyrene, and polyurethane. And at least one selected from crosslinked or uncrosslinked organic fine particles or silicone fine particles comprising various polymers such as acryl-styrene copolymer, benzoguanamine, melamine, and polycarbonate.
Forming a diffuse reflection layer on the transparent conductive layer;
Forming the diffuse reflection layer is a step of manufacturing a dopant; And
B) preparing a conductive material particle by polymerizing a conductive polymer on the dopant prepared above; And
Method for producing an antistatic diffuse reflection film comprising the step of c) coating the polymerized polymer on the transparent conductive layer using a binder resin.
In step b), the conductive polymer and the oxidizing agent are polymerized on the dopant to prepare conductive material particles.
The oxidizing agent may include peroxodisulfates such as ammonium peroxodisulfate, sodium peroxodisulfate and potassium peroxodisulfate; Ferric chloride, ferric sulfate, ferric nitrate, ferric trichloride (FeCl 3 ), ferrous sulfate (III), ferric tosylate (III), camphor sulfonate (III), cerium (IV) salt, potassium permanganate, Antistatic diffuse reflection, characterized in that at least one selected from the group consisting of iron sulfate pentahydrate (Fe₂ (SO 4 ) 3 · 5H 2 O), potassium thiosulfate (K₂S₂O₃), ammonium persulfate, potassium dichromate and copper (II) salt Method for producing a film.
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| KR1020100006401A KR101040739B1 (en) | 2010-01-25 | 2010-01-25 | Antistatic film and manufacturing method thereof |
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| KR1020100006401A KR101040739B1 (en) | 2010-01-25 | 2010-01-25 | Antistatic film and manufacturing method thereof |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101403865B1 (en) * | 2011-12-16 | 2014-06-10 | 제일모직주식회사 | Composition for use in an anisotropic conductive film, an anisotropic conductive film and semiconductor device |
| CN107383319A (en) * | 2017-08-29 | 2017-11-24 | 江南大学 | A kind of component of high intensity antistatic urethane elastomer and preparation method thereof |
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| KR19980084135A (en) * | 1997-05-21 | 1998-12-05 | 구자홍 | Cathode ray tube with charge and antireflection film |
| KR20050020226A (en) * | 2003-08-21 | 2005-03-04 | 삼성에스디아이 주식회사 | Cathod ray tube and method for preparation thereof |
| JP2009069317A (en) | 2007-09-12 | 2009-04-02 | Toppan Printing Co Ltd | Antireflection film |
| KR20090104807A (en) * | 2007-01-17 | 2009-10-06 | 아라까와 가가꾸 고교 가부시끼가이샤 | Organic solvent dispersion of conductive polymer?dopant and composition containing the dispersion |
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2010
- 2010-01-25 KR KR1020100006401A patent/KR101040739B1/en not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR19980084135A (en) * | 1997-05-21 | 1998-12-05 | 구자홍 | Cathode ray tube with charge and antireflection film |
| KR20050020226A (en) * | 2003-08-21 | 2005-03-04 | 삼성에스디아이 주식회사 | Cathod ray tube and method for preparation thereof |
| KR20090104807A (en) * | 2007-01-17 | 2009-10-06 | 아라까와 가가꾸 고교 가부시끼가이샤 | Organic solvent dispersion of conductive polymer?dopant and composition containing the dispersion |
| JP2009069317A (en) | 2007-09-12 | 2009-04-02 | Toppan Printing Co Ltd | Antireflection film |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101403865B1 (en) * | 2011-12-16 | 2014-06-10 | 제일모직주식회사 | Composition for use in an anisotropic conductive film, an anisotropic conductive film and semiconductor device |
| CN107383319A (en) * | 2017-08-29 | 2017-11-24 | 江南大学 | A kind of component of high intensity antistatic urethane elastomer and preparation method thereof |
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