KR101016742B1 - Apparatus and method for cleaning a mask - Google Patents

Apparatus and method for cleaning a mask Download PDF

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Publication number
KR101016742B1
KR101016742B1 KR1020040006759A KR20040006759A KR101016742B1 KR 101016742 B1 KR101016742 B1 KR 101016742B1 KR 1020040006759 A KR1020040006759 A KR 1020040006759A KR 20040006759 A KR20040006759 A KR 20040006759A KR 101016742 B1 KR101016742 B1 KR 101016742B1
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South Korea
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cleaning
mask
cleaning liquid
ultrasonic cleaner
liquid
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KR1020040006759A
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Korean (ko)
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KR20050078581A (en
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윤여일
김기동
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엘지디스플레이 주식회사
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/106—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by boiling the liquid
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electroluminescent Light Sources (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

본 발명은 유기 EL 소자의 유기물 증착에 사용되는 마스크를 세정하는 방법에 관한 것으로서, 특히 고순도의 세정액을 필터없이 반복 사용하여 마스크를 세정하는 방법에 관한 것이다. 본 발명에 따른 마스크 세정 장치는, 본 발명에 따른 마스크 세정 장치는, 초음파를 발생시켜 세정액에 잠겨있는 마스크를 세정하는 초음파 세정기; 상기 초음파 세정기와 배출관에 의해 연결되며, 상기 배출관을 통해 배출된 세정액을 저장한 후에 가열하여 증발시키는 저장조; 및 상기 저장조와 공급관에 의해 연결되며, 상기 공급관을 통해 배출된 기체상태의 세정액을 냉각시켜 액화시킴으로써, 고순도의 세정액을 상기 초음파 세정기로 공급하는 냉각기를 포함하고, 상기 저장조는 내부에 전기저항이 큰 물질로 된 발열체를 위치시켜 전기 공급에 의해 세정액을 가열하는 것을 특징으로 하며, 세정액은 솔벤트인 것이 바람직하다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cleaning a mask used for organic vapor deposition of an organic EL device, and more particularly, to a method for cleaning a mask by repeatedly using a high purity cleaning liquid without a filter. The mask cleaning device according to the present invention, the mask cleaning device according to the present invention comprises an ultrasonic cleaner for generating ultrasonic waves to clean the mask immersed in the cleaning liquid; A storage tank connected by the ultrasonic cleaner and the discharge pipe, and storing the cleaning liquid discharged through the discharge pipe and then heating and evaporating the cleaning solution; And a cooler connected to the reservoir and the supply pipe to cool the liquid in the gaseous state discharged through the supply pipe to liquefy, thereby supplying a high-purity cleaning liquid to the ultrasonic cleaner, wherein the reservoir has a large electrical resistance therein. It is characterized in that the cleaning solution is heated by an electric supply by placing a heating element made of a material, and the cleaning solution is preferably a solvent.

초음파 세정, 마스크Ultrasonic cleaning, mask

Description

마스크 세정 장치 및 방법{Apparatus and method for cleaning a mask}Mask cleaning apparatus and method {Apparatus and method for cleaning a mask}

도 1은 유기물 증착공정에 사용되는 마스크의 사시도.1 is a perspective view of a mask used in the organic material deposition process.

도 2는 종래의 마스크 세정 장치의 개략도.2 is a schematic view of a conventional mask cleaning apparatus.

도 3은 본 발명의 일 실시예에 따른 마스크 세정 장치의 개략도.3 is a schematic diagram of a mask cleaning apparatus according to an embodiment of the present invention.

본 발명은 유기 EL 소자의 유기물 증착에 사용되는 마스크를 세정하는 장치 및 방법에 관한 것으로서, 특히 고순도의 세정액을 필터없이 반복 사용하여 마스크를 세정하는 장치 및 방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus and method for cleaning a mask used for organic vapor deposition of an organic EL device, and more particularly, to an apparatus and method for cleaning a mask by repeatedly using a high purity cleaning liquid without a filter.

유기 EL 소자의 유기물 증착 공정에는 도 1에 도시된 바와 같은 마스크(1)가 사용되며, 유기물은 마스크(1)에 형성된 개구(2)를 통해 기판 상에 증착된다.In the organic material deposition process of the organic EL element, a mask 1 as shown in FIG. 1 is used, and the organic material is deposited on the substrate through the opening 2 formed in the mask 1.

이 과정에서 일부 유기물은 개구(2) 주위에 달라붙게 되고, 이에 따라 개구 크기가 감소되어 원활한 증착이 이루어지지 않는 문제점이 발생하며, 이를 방지하기 위하여 마스크(1)는 주기적으로 세정이 되어야만 한다.In this process, some organic matters are stuck around the opening 2, and thus, the size of the opening is reduced, so that the deposition is not performed smoothly. In order to prevent the mask 1, the mask 1 must be periodically cleaned.

도 2에는 종래의 마스크 세정 장치가 개략적으로 도시되어 있다. 마스크 세정장치는 초음파 세정기(10), 저장조(11), 펌프(12) 및 필터(13)로 구성되며, 각각 은 배관(14)을 통해 연결되어 있다.2 schematically shows a conventional mask cleaning apparatus. The mask cleaning device includes an ultrasonic cleaner 10, a reservoir 11, a pump 12, and a filter 13, and each of them is connected through a pipe 14.

마스크(1)는 초음파 세정기(10)의 내부로 이동되고, 세정액이 초음파 세정기(10)의 내부로 공급된다. 초음파 세정기(10)는 초음파 발생기(미도시)로 하여금 세정액을 진동하게 하여, 음압의 변화에 따른 공동(空洞)현상을 발생시켜 마스크(1)의 표면에 부착된 유기물을 제거한다.The mask 1 is moved into the ultrasonic cleaner 10, and the cleaning liquid is supplied into the ultrasonic cleaner 10. The ultrasonic cleaner 10 causes the ultrasonic generator (not shown) to vibrate the cleaning liquid, and generates a cavity phenomenon according to a change in sound pressure, thereby removing the organic matter attached to the surface of the mask 1.

세정에 사용된 세정액은 배관을 통해 도면에 도시된 화살표 방향으로 배출되어 저장조(11)로 이동되고, 펌프(12)를 통해 필터(13)로 이동된다. 필터(13)에서는 마스크(1)로부터 분리된 유기물 덩어리들이 걸러지게 되고, 걸러진 세정액은 다시 초음파 세정기(10)로 공급되어 세정에 사용된다.The cleaning liquid used for the cleaning is discharged in the direction of the arrow shown in the drawing through the pipe and moved to the reservoir 11, and is moved to the filter 13 through the pump 12. In the filter 13, the organic matter separated from the mask 1 is filtered, and the filtered cleaning liquid is supplied to the ultrasonic cleaner 10 again and used for cleaning.

그러나, 종래의 마스크 세정장치는 세정액 내의 유기물을 걸러내는 필터(13)가 상당히 고가이며, 그 교환주기가 짧아 비용적인 손실이 크다는 문제점을 갖는다. 또한, 한번 사용된 세정액은 필터(13)를 거친 후에는 세정력이 떨어지게 되어, 고가의 세정액을 반복하여 사용하는 것이 어려운 문제점이 존재한다.However, the conventional mask cleaning apparatus has a problem that the filter 13 which filters the organic matter in the cleaning liquid is considerably expensive, and its replacement cycle is short, resulting in a large cost loss. In addition, the cleaning liquid once used is deteriorated in the cleaning power after passing through the filter 13, there is a problem that it is difficult to repeatedly use the expensive cleaning liquid.

본 발명이 이루고자 하는 기술적 과제는 마스크의 초음파 세정에 사용되는 세정액을 필터없이 고순도의 상태로 반복적으로 사용할 수 있는 마스크 세정 장치 및 방법을 제공하는데 있다. SUMMARY OF THE INVENTION The present invention has been made in an effort to provide a mask cleaning apparatus and method capable of repeatedly using a cleaning liquid used for ultrasonic cleaning of a mask in a state of high purity without a filter.

상기 기술적 과제를 해결하기 위한 본 발명에 따른 마스크 세정 장치는, 초음파를 발생시켜 세정액에 잠겨있는 마스크를 세정하는 초음파 세정기; 상기 초음파 세정기와 배출관에 의해 연결되며, 상기 배출관을 통해 배출된 세정액을 저장한 후에 가열하여 증발시키는 저장조; 및 상기 저장조와 공급관에 의해 연결되며, 상기 공급관을 통해 배출된 기체상태의 세정액을 냉각시켜 액화시킴으로써, 고순도의 세정액을 상기 초음파 세정기로 공급하는 냉각기를 포함하고, 상기 저장조는 내부에 전기저항이 큰 물질로 된 발열체를 위치시켜 전기 공급에 의해 세정액을 가열하는 것을 특징으로 하며, 세정액은 솔벤트인 것이 바람직하다.According to an aspect of the present invention, there is provided a mask cleaning apparatus including: an ultrasonic cleaner for generating ultrasonic waves to clean a mask immersed in a cleaning liquid; A storage tank connected by the ultrasonic cleaner and the discharge pipe, and storing the cleaning liquid discharged through the discharge pipe and then heating and evaporating the cleaning solution; And a cooler connected by the reservoir and the supply pipe to cool the liquid in the gaseous state discharged through the supply pipe and liquefying the liquid, thereby supplying a high-purity cleaning liquid to the ultrasonic cleaner. It is characterized in that the cleaning solution is heated by an electric supply by placing a heating element made of a material, and the cleaning solution is preferably a solvent.

상기 냉각기는 상기 초음파 세정기의 상부에 설치된 냉각수관을 기체상태의 세정액이 통과하도록 하여 액화된 세정액이 상기 초음파 세정기의 내부로 공급될 수 있도록 하는 것이 바람직하다.The cooler may be such that the liquefied cleaning liquid is supplied to the inside of the ultrasonic cleaner by allowing the cleaning liquid in the gas state to pass through the cooling water pipe installed in the upper portion of the ultrasonic cleaner.

한편, 상기 기술적 과제를 해결하기 위한 본 발명에 따른 마스크 세정 방법은, (a) 세정액이 공급된 초음파 세정기로 마스크를 세정하는 단계; (b) 세정에 사용된 세정액을 배출한 후에 가열하여 증발시키는 단계; (c) 증발된 세정액 기체를 냉각시켜 액화시키는 단계; 및 (d) 액화된 고순도의 세정액을 상기 초음파 세정기로 공급하는 단계를 포함하고, 상기 (b) 단계는 전기저항이 큰 물질로 된 발열체에 전기를 공급하여 세정액을 가열하는 것을 특징으로 하며, 상기 (d) 단계는 세정액 기체를 냉각수 관으로 통과시켜 냉각시키는 것이 바람직하다.On the other hand, the mask cleaning method according to the present invention for solving the technical problem, (a) cleaning the mask with an ultrasonic cleaner supplied with a cleaning liquid; (b) heating and evaporating the cleaning liquid used for cleaning; (c) cooling and liquefying the evaporated rinse gas; And (d) supplying the liquefied high purity cleaning liquid to the ultrasonic cleaner, wherein step (b) supplies electricity to a heating element made of a material having high electrical resistance, thereby heating the cleaning liquid. Step (d) is preferably cooled by passing the cleaning liquid gas through the cooling water pipe.

이하 첨부도면을 참조하여 본 발명의 일 실시예에 대해 상세히 설명한다.Hereinafter, an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

도 3은 본 발명의 일 실시예에 따른 마스크 세정 장치에 대한 개략도가 도시되어 있다.3 is a schematic diagram of a mask cleaning apparatus according to an embodiment of the present invention.

본 실시예에 따른 세정 장치는 초음파 세정기(110), 저장조(111) 및 냉각기(112)를 포함하며, 초음파 세정기(110)와 저장조(111)는 배출관(113)으로 연 결되고, 저장조(111)와 냉각기(112)는 공급관(114)로 연결된다.The cleaning apparatus according to the present embodiment includes an ultrasonic cleaner 110, a reservoir 111, and a cooler 112, and the ultrasonic cleaner 110 and the reservoir 111 are connected to the discharge pipe 113, and the reservoir 111. ) And the cooler 112 are connected to the supply pipe 114.

초음파 세정기(110)는 종래의 공지된 초음파 세정기이며, 내부에 공급된 세정액에 초음파 진동을 가하여 마스크(1) 표면의 유기물을 제거한다. 초음파 세정기(110)에 공급되는 세정액으로는 솔벤트가 바람직하다.The ultrasonic cleaner 110 is a conventionally known ultrasonic cleaner and removes organic substances on the surface of the mask 1 by applying ultrasonic vibration to the cleaning liquid supplied therein. As the cleaning liquid supplied to the ultrasonic cleaner 110, a solvent is preferable.

초음파 세정이 종료된 후에 세정에 사용된 세정액은 마스크(1) 표면으로부터 분리된 유기물 덩어리가 포함되어 있으며, 이는 배출관(113)을 통해 초음파 세정기(110) 외부로 배출되어 도면에 도시된 화살표 방향을 따라 저장조(111)로 공급된다. After the ultrasonic cleaning is completed, the cleaning liquid used for cleaning includes a mass of organic material separated from the surface of the mask 1, which is discharged to the outside of the ultrasonic cleaner 110 through the discharge pipe 113 to change the direction of the arrow shown in the drawing. It is supplied to the reservoir 111 accordingly.

저장조(111)는 오염된 세정액을 저장한 후에 내부에 설치된 가열수단으로 오염된 세정액에 열을 가하여 세정액을 증발시킨다. 가열수단으로는 전기저항이 큰 물질이 저장조(111) 내부에 위치하도록 하고, 이 물질에 전기를 공급하여 발생되는 열로 가열하는 수단이 바람직하다.After storing the contaminated cleaning solution, the storage tank 111 heats the contaminated cleaning solution with a heating means installed therein to evaporate the cleaning solution. As a heating means, a material having a large electrical resistance is positioned inside the reservoir 111, and means for heating the material by heating the material generated with electricity is preferable.

증발된 세정액은 저장조(111) 상부에 설치된 공급관(114)을 통해 저장조(111) 외부로 배출된다. 배출된 세정액 증기는 초음파 세정기(110) 상부에 설치된 냉각기(112)에서 액화되어 초음파 세정기(110) 내부로 다시 공급된다. 냉각기(112)에 의한 냉각은 공급관(114) 주변을 냉각수가 흐르는 관으로 감싸는 방식으로 하여 증기를 냉각시키는 것이 바람직하다.The evaporated cleaning liquid is discharged out of the storage tank 111 through the supply pipe 114 installed on the storage tank 111. The discharged cleaning liquid vapor is liquefied in the cooler 112 installed above the ultrasonic cleaner 110 and is supplied back into the ultrasonic cleaner 110. Cooling by the cooler 112 preferably cools the steam by surrounding the supply pipe 114 with a pipe through which the coolant flows.

냉각기(112)에서 액화된 세정액은 불순물이 없는 고순도의 세정액이며, 이에 따라 반복적인 재사용이 가능하게 된다.The cleaning liquid liquefied in the cooler 112 is a high purity cleaning liquid without impurities, and thus can be reused repeatedly.

이상에서 설명한 바와 같이, 본 발명에 의한 마스크 세정 장치 및 방법은 고순도의 세정액을 반복하여 사용하므로 세정 효과가 일정하게 유지되고, 필터를 사용하는 종래 장치에 비해 보다 오래동안 반복적으로 사용이 가능하게 되는 효과를 갖는다. As described above, the mask cleaning apparatus and method according to the present invention uses a high-purity cleaning liquid repeatedly, so that the cleaning effect is kept constant, and thus the mask cleaning apparatus and method can be repeatedly used for a longer time than the conventional apparatus using the filter. Has an effect.

또한, 필터가 사용되지 않음으로 인해 세정 공정이 보다 간단해지며, 필터의 교환비용이 필요하지 않게 되는 효과를 갖는다.In addition, since the filter is not used, the cleaning process is simpler, and the replacement cost of the filter is not required.

Claims (6)

초음파를 발생시켜 세정액에 잠겨있는 마스크를 세정하는 초음파 세정기;An ultrasonic cleaner for generating ultrasonic waves to clean the mask immersed in the cleaning liquid; 상기 초음파 세정기와 배출관에 의해 연결되며, 상기 배출관을 통해 배출된 세정액을 저장한 후에 가열하여 증발시키는 저장조; 및A storage tank connected by the ultrasonic cleaner and the discharge pipe, and storing the cleaning liquid discharged through the discharge pipe and then heating and evaporating the cleaning solution; And 상기 저장조와 공급관에 의해 연결되며, 상기 공급관을 통해 배출된 기체상태의 세정액을 냉각시켜 액화시킴으로써, 고순도의 세정액을 상기 초음파 세정기로 공급하는 냉각기를 포함하고,It is connected by the reservoir and the supply pipe, by cooling the liquefied liquid in the gaseous state discharged through the supply pipe, comprising a cooler for supplying a high purity cleaning liquid to the ultrasonic cleaner, 상기 저장조는 내부에 전기저항이 큰 물질로 된 발열체를 위치시켜 전기 공급에 의해 세정액을 가열하는 것을 특징으로 하는 마스크 세정 장치.The reservoir is a mask cleaning apparatus, characterized in that for heating the cleaning liquid by electric supply by placing a heating element made of a material having a high electrical resistance therein. 삭제delete 제 1 항에 있어서, 상기 냉각기는 The method of claim 1, wherein the cooler 상기 초음파 세정기의 상부에 설치된 냉각수관을 기체상태의 세정액이 통과하도록 하여 액화된 세정액이 상기 초음파 세정기의 내부로 공급될 수 있도록 하는 것을 특징으로 하는 마스크 세정 장치.And a gaseous cleaning liquid passes through the cooling water pipe installed above the ultrasonic cleaner so that the liquefied cleaning liquid can be supplied into the ultrasonic cleaner. 제 1 항에 있어서, 세정액은 The method of claim 1, wherein the cleaning liquid 솔벤트인 것을 특징으로 하는 마스크 세정 장치.Mask cleaning apparatus, characterized in that the solvent. (a) 세정액이 공급된 초음파 세정기로 마스크를 세정하는 단계;(a) cleaning the mask with an ultrasonic cleaner supplied with the cleaning liquid; (b) 세정에 사용된 세정액을 배출한 후에 가열하여 증발시키는 단계;(b) heating and evaporating the cleaning liquid used for cleaning; (c) 증발된 세정액 기체를 냉각시켜 액화시키는 단계; 및 (c) cooling and liquefying the evaporated rinse gas; And (d) 액화된 고순도의 세정액을 상기 초음파 세정기로 공급하는 단계를 포함하고,(d) supplying the liquefied high purity cleaning liquid to the ultrasonic cleaner; 상기 (b) 단계는 전기저항이 큰 물질로 된 발열체에 전기를 공급하여 세정액을 가열하는 것을 특징으로 하는 마스크 세정 방법.Step (b) is a mask cleaning method characterized in that to heat the cleaning liquid by supplying electricity to a heating element made of a material having a high electrical resistance. 제 5 항에 있어서, 상기 (d) 단계는The method of claim 5, wherein step (d) 세정액 기체를 냉각수 관으로 통과시켜 냉각시키는 것을 특징으로 하는 마스크 세정 방법.A mask cleaning method characterized by passing the cleaning liquid gas through a cooling water pipe to cool.
KR1020040006759A 2004-02-02 2004-02-02 Apparatus and method for cleaning a mask KR101016742B1 (en)

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KR101388283B1 (en) * 2007-10-09 2014-04-22 엘지디스플레이 주식회사 Apparatus for cleaning a mask
KR101271122B1 (en) * 2011-11-24 2013-06-04 주식회사 케이씨텍 Mask cleaning apparatus for manufacturing OLED device
KR101271121B1 (en) * 2011-11-24 2013-06-04 주식회사 케이씨텍 Mask cleaning apparatus for manufacturing OLED device

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KR200231508Y1 (en) * 2001-01-30 2001-07-19 일성초음파산업 주식회사 I.P.A Ultrasonic Cleaning Apparatus

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