KR101000670B1 - Method for arranging spacer of liquid crystal display and spacer structure - Google Patents

Abstract

The present invention discloses a strut spacer structure of a liquid crystal display and a method of forming the same. The strut spacer structure of the liquid crystal display device according to the present invention includes an upper substrate and a lower substrate; An active region black matrix and a peripheral black matrix formed at predetermined intervals on the upper substrate; An overcoat layer formed on the upper substrate including the black matrix; A gate line formed at a predetermined interval on a portion of the peripheral black matrix and the lower substrate corresponding to the active area black matrix; A data line formed on the gate line at a position corresponding to a portion of the peripheral black matrix; A strut spacer disposed between the overcoating layer formed on the active region black matrix and the gate line; A sealing line disposed between the overcoating layer formed on the peripheral black matrix and the data line; And a liquid crystal layer injected between the upper substrate and the lower substrate.

Description

Method for arranging spacer structure of liquid crystal display device and its structure {Method for arranging spacer of liquid crystal display and spacer structure}

1 is a cross-sectional view of a strut structure of a liquid crystal display device according to the prior art;

2 is a cross-sectional view of a strut structure of a liquid crystal display device according to the present invention;

[Description of Drawing Reference]

31: upper substrate 33a: active area black matrix

33b: Peripheral Black Matrix 35: Overcoating Layer

41: lower substrate 43: gate line

45: data line 47: holding spacer

49: sealing line 51: liquid crystal layer

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a liquid crystal display device, and more particularly, to a method of forming a strut spacer and a structure of the liquid crystal display device applied to a strut design of a black matrix unit in a black and white LCD monitor.

Referring to the drawings, a strut design method in a liquid crystal display device according to the related art is as follows.

1 is a schematic cross-sectional view of a liquid crystal display device having a strut design structure in a strut design method in a liquid crystal display device according to the prior art.

The liquid crystal display device in which the strut design structure according to the related art is formed, referring to FIG. 1, is composed of an upper substrate 1 and a lower substrate 11 and a liquid crystal layer 21 injected therebetween.

Here, the upper substrate 1 is formed with a black matrix 3 composed of an active area black matrix 3a and a peripheral black matrix 3b, and over the upper substrate 1 including the black matrix 3. The coating film 5 is formed.

In addition, a gate line 13 is formed at a portion of the lower substrate 11 corresponding to portions of the active region black matrix 3a and the peripheral black matrix 3b, and a portion of the peripheral black matrix 3b. The data line 15 is formed on the gate line 13 formed at the corresponding position.

A spacer 17 is formed between the gate line 13 and the corresponding overcoat layer 5 at a predetermined interval, and the peripheral black matrix 3b is formed on the data line 15. A sealing line 19 is formed between the overcoat films 5 on the? Here, reference numeral h1 is the strut height, g1 is a cell gap, and B1-B1 is a cutting line.

As described above, in the black and white filter (black and white filter), unlike the RGB color filter, a seal gap occurs as shown in "A" of FIG.

Generally, when the resin black matrix is applied, a step occurs by the resin black matrix (BM) height, that is, 1.2 μm thickness.

Accordingly, a step of 1.2 μm occurs, which causes problems such as rubbing irregularities in the rubbing process.

In order to overcome this problem, over coating is applied on the resin black matrix. When coating the over coating agent, the thickness of the overcoating film on the active area BM and the overcoating film thickness on the peripheral BM are different. The overcoat film thickness of is as high as + α. Here, + α depends on the type of overcoating film and the film forming process, and generally exhibits a thickness characteristic of 0.3 to 1 μm.

In the case of forming the support on the overcoating layer thus formed, a seal gap defect occurs due to the thickness of the overcoating film (+ α) even with the same support height.

Accordingly, the present invention has been made to solve the above-mentioned problems of the prior art, and an object of the present invention is to realize a uniform cell gap in the active area by designally removing the strut spacer on the peripheral black matrix causing the seal gap defect. The present invention provides a method and structure for forming a strut spacer of a liquid crystal display device capable of preventing a seal gap defect.

The strut spacer structure of the liquid crystal display device according to the present invention for achieving the above object, the upper substrate and the lower substrate; An active region black matrix and a peripheral black matrix formed at predetermined intervals on the upper substrate; An overcoat layer formed on the upper substrate including the black matrix; A gate line formed at a predetermined interval on a portion of the peripheral black matrix and the lower substrate corresponding to the active area black matrix; A data line formed on the gate line at a position corresponding to a portion of the peripheral black matrix; A strut spacer disposed between the overcoating layer formed on the active region black matrix and the gate line; A sealing line disposed between the overcoating layer formed on the peripheral black matrix and the data line; And a liquid crystal layer injected between the upper substrate and the lower substrate.

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In addition, the holding spacer forming method of the liquid crystal display according to the present invention comprises the steps of preparing an upper substrate and a lower substrate; Forming an active region black matrix and a peripheral black matrix formed at predetermined intervals on the upper substrate; Forming an overcoating layer on the upper substrate including the black matrix; Forming a gate line on a portion of the peripheral black matrix and the lower substrate corresponding to the active region black matrix at a predetermined interval; Forming a data line on a gate line at a position corresponding to a portion of the peripheral black matrix; Forming a support spacer between the gate layer and the overcoating layer formed on the active area black matrix; Forming a sealing line between the overcoating layer formed on the peripheral black matrix and the data line; And injecting a liquid crystal layer between the upper substrate and the lower substrate.

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(Example)

Hereinafter, a method and a structure of a support spacer forming method of a liquid crystal display according to the present invention will be described in detail with reference to the accompanying drawings.

2 is a cross-sectional view of a strut structure of a liquid crystal display according to the present invention.

Referring to FIG. 2, the strut spacer structure of the liquid crystal display device according to the present invention includes an upper substrate 31 and a lower substrate 41 and a liquid crystal layer 51 injected therebetween.

Here, the upper substrate 31 is formed with a black matrix 33 composed of an active region black matrix 33a and a peripheral black matrix 33b, and over the upper substrate 31 including the black matrix 33. The coating film 35 is formed.

In addition, a portion of the lower substrate 41 corresponding to a portion of the active area black matrix 33a and the peripheral black matrix 33b is provided with a gate line 43 at a predetermined interval, and the peripheral black matrix 33b. The data line 45 is formed on the gate line 43 formed at a position corresponding to a portion of the.

A post spacer 47 is formed between the gate line 43 and the corresponding overcoat layer 35 at a predetermined interval, and the peripheral black matrix 33b is formed on the data line 45. The sealing line 49 is formed between the overcoat films 35 on the (). Here, a post spacer 47 is not formed between the overcoating layer 35 and the gate line 43 on the peripheral black matrix 33b.

Here, reference numeral h2 is the strut height, g2 is the cell gap, and B2-B2 is the cutting line.

As above, the strut spacer is generally formed uniformly in the active region. The strut shape is formed into a square, circle, hexagon, etc. in consideration of rubbing, etc., and the strut size is formed to be 500 to 3000 μm ² / mm ² , and the number of struts generally has a constant repeating pattern at regular intervals and has 4 to 20 ea. It can be formed up to / mm ² . The strut height is formed considering the cell gap. Here, the post height is represented as follows.

Strut height = Cell gap-array step + Strut strain

In addition, the cell gap is about 2.5 to 5 μm in the case of fringe field switching (FFS), and about 3 to 6 μm in the case of twisted nematic (TN) in consideration of the fast response.

However, in the present invention, as shown in FIG. 2, the mask for forming the strut spacer in the black and white filters is changed.

In general, the area from the active area to the edge of the black matrix BM has an area of 2 to 6 mm. In this area, the seal width of 1 to 2 mm is generally located at a distance of 0.5 mm from the scribe brine (B2-B2), and the posts are removed at 1 to 4 mm, which is the distance from the active area to the seal. do. Here, the distance from the scribe brine B2-B2 to the edge of the black matrix 33b is 0.5 mm which is the same as the outside of the seal to the scribe brain B2-B2.

In addition, the strut 47 in the active area is the same as before. Here, the size of the strut 47 is formed to 500 ~ 3000 μm ² / mm ² , the strut interval is formed within the range of 4 ~ 20ea / mm 2. The strut shape is formed in a square shape, and the strut height is formed to correspond to the FFS in the range of 2.3 to 4.8 μm.

In the FFS black and white LCD monitors to which the black and white filters formed as described above are applied, the uniform luminance due to the uniform cell gap g2 in the active area can be realized, thereby preventing the real gap.

As described above, according to the present invention, the black and white filter changes the mask forming the strut spacer so that the strut spacer on the periphery BM that causes the seal gap defect, i.e., 1 to 4 mm, the distance from the active region to the yarn. By eliminating the struts, the uniform brightness of the FFS black and white LCD monitors to which the black and white filters are applied can be realized by the uniform cell gap g2 in the active area, thereby preventing the seal gap.

On the other hand, the present invention is not limited to the above-described specific preferred embodiments, and various changes can be made by those skilled in the art without departing from the gist of the invention claimed in the claims. will be.

Claims (10)

Upper and lower substrates; An active region black matrix and a peripheral black matrix formed at predetermined intervals on the upper substrate; An overcoat layer formed on the upper substrate including the black matrix; A gate line formed at a predetermined interval on a portion of the peripheral black matrix and the lower substrate corresponding to the active area black matrix; A data line formed on the gate line at a position corresponding to a portion of the peripheral black matrix; A strut spacer disposed between the overcoating layer formed on the active region black matrix and the gate line; A sealing line disposed between the overcoating layer formed on the peripheral black matrix and the data line; And A holding spacer of a liquid crystal display device, comprising: a liquid crystal layer injected between the upper substrate and the lower substrate. The strut spacer of claim 1, wherein the strut spacer is rectangular, circular or hexagonal, the strut size is 500 to 3000 μm ² / mm ² , and the number of struts is 4 to 20ea / mm ² . . The strut spacer of claim 1, wherein the strut spacer has a height of 2.3 to 4.8 μm. The strut spacer of claim 1, wherein a strut spacer does not exist between the overcoating layer formed on the peripheral black matrix and the gate line. Preparing an upper substrate and a lower substrate; Forming an active region black matrix and a peripheral black matrix formed at predetermined intervals on the upper substrate; Forming an overcoating layer on the upper substrate including the black matrix; Forming a gate line on a portion of the peripheral black matrix and the lower substrate corresponding to the active region black matrix at a predetermined interval; Forming a data line on a gate line at a position corresponding to a portion of the peripheral black matrix; Forming a support spacer between the gate layer and the overcoating layer formed on the active area black matrix; Forming a sealing line between the overcoating layer formed on the peripheral black matrix and the data line; And Injecting a liquid crystal layer between the upper substrate and the lower substrate; Forming a holding spacer of the liquid crystal display device comprising a. 6. The strut spacer of claim 5, wherein the strut spacer is rectangular, circular or hexagonal, the strut size is 500 to 3000 µm ² / mm ² , and the strut number is 4 to 20ea / mm ² . Formation method. The method according to claim 5, wherein the height of the support spacer is 2.3 to 4.8 µm. 6. The method of claim 5, wherein a strut spacer does not exist between the overcoating layer formed on the peripheral black matrix and the gate line. delete delete

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