KR100995579B1 - Liquid Crystal Display Device And Method For Manufacturing The Same - Google Patents

Abstract

A liquid crystal display device in which an organic insulating film is removed at a boundary between a transmission region and a transmission region-transmission region and a manufacturing method thereof are described. The liquid crystal display device includes a reflective region having a portion of a pixel region and an organic insulating film formed on a portion of the pixel region boundary and a reflective electrode, and a data line having protrusions at another portion of the pixel region and another portion of the pixel region boundary. It includes a transmission region formed overlapping with. The liquid crystal display device formed by the above-described method has the characteristics that the pattern is precisely formed without the occurrence of residual images and light leakage during rubbing due to the reduction of the level difference at the boundary between the transmission region and the transmission region, and the occurrence of short circuit defects due to adjacent pixel regions. have.

Description

Liquid Crystal Display Device And Method For Manufacturing The Same

1 is a plan view of a liquid crystal display device according to the prior art.

FIG. 2 is a cross-sectional view taken along the line II-II ′ of FIG. 1.

3 is a plan view of a liquid crystal display device according to an exemplary embodiment of the present invention.

4 is a cross-sectional view of the liquid crystal display shown in FIG. 3 taken along the cutting line IV-IV '.

5A through 5G are cross-sectional views of the method of manufacturing the liquid crystal display device illustrated in FIG. 3.

<Description of the symbols for the main parts of the drawings>

300: first substrate 301: gate wiring

301a: gate electrode 302: gate insulating film

303: active layer 304, 304a, 304b: ohmic contact layer

305: source / drain metal 305a: source electrode

305b: drain electrode 305c: data wiring

308: weapon shield 309: contact hole

310, 310a: organic insulating film 311: pixel electrode

312: reflective electrodes 330, 335: mask                 

340 transmission region 350 second substrate

351: light blocking layer 352: color filter layer

353: overcoat layer 354: common electrode

370: liquid crystal layer 380a, 380b: pixel electrode protection unit

390a, 390b, 390c, 390d: rubbing direction

395a, 395b: protrusions

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method of manufacturing the same, and more particularly, to remove an organic insulating film at a boundary between a transmission region and a transmission region-transmission region to block afterimages and light leakage during rubbing, and to prevent a short circuit due to adjacent defects. A liquid crystal display device and a method for manufacturing the same.

Due to the characteristics such as thin type, low voltage driving, low power consumption, and full color implementation, liquid crystal display devices have been diversified in use from watches, mobile phones, computer monitors and small TVs to personal portable terminals, aviation monitors, and large TVs. .

The liquid crystal display device as described above uses a property in which transmittance varies while light incident from a backlight on a lower or side panel of the panel and light reflected from a reflective electrode pass through the liquid crystal. In addition, a screen is realized by combining the colors of the light having different transmittances through the color filter layer.                         

The reflective electrode is formed on the thin film transistor or on the other side to form a reflective region, and the other portion forms a transmissive region using only the pixel electrode. And the screen quality is excellent.

On the other hand, the present applicant has invented a reflective electrode that can improve the image quality of the image by uniformly diffuse reflection, and Korea Patent Application No. 1999-7093 (name of the invention: reflective type liquid crystal display device) on March 4, 1999 And a method for producing the same).

In addition, the present applicant has invented a reflective electrode for improving the reflection efficiency in a specific direction, the Korean application No. 2000-66972 dated November 11, 2000 (name of the invention: a reflective liquid crystal display device and a manufacturing method thereof) Has been filed.

In addition, the present applicant has invented a reflective electrode for improving the reflection efficiency irrespective of the step difference of the pixel boundary portion, and Korean Patent Application No. 2001-5966 (name of the invention: reflective type liquid crystal display device) on February 7, 2001. Has been filed.

The reflective electrode of the conventional liquid crystal display device has a convex embossed organic insulating film formed below to increase the reflection efficiency.

In order to realize an optimal image in one liquid crystal mode in the liquid crystal display, the transmission region has a double cell gap structure in which a pixel electrode is formed at a portion from which an organic insulating layer is removed, and the cell region is different from the reflection region.

The transmissive region is formed in the pixel region and the outside thereof is surrounded by the reflective electrode and does not overlap the wiring.

A conventional liquid crystal display device as described above will be described with reference to the accompanying drawings.

1 is a plan view of a liquid crystal display device according to the prior art.

Referring to FIG. 1, a pixel region represented by the pixel electrode 111 is formed in an area where an upper portion of the thin film transistor 120 intersects the gate wiring 101 and the data wiring 105c, and a transmissive region is formed inside the pixel region. An organic insulating layer pattern 110a is formed outside the transmission region 140, and a turtle lamp shaped reflective electrode 112 is formed on the organic insulating layer pattern 110a.

If an alignment layer (not shown) is formed on the liquid crystal display and the surface is rubbed horizontally and vertically from the transmissive region to the reflective region, the portion at which the rubbing starts on the four surfaces 190a, 190b, 190c, and 190d of the transmissive region 140 is formed. Light leakage occurs where afterimage rubbing ends. In addition, when rubbing from the transmissive region to the reflective region at 12 to 3 o'clock or 9 to 12 o'clock, afterimage and light leakage also occur in the direction.

The first cause of the afterimage and the light leakage is due to the difference in the cell gap between the reflection area and the transmission area, and the second cause is due to the separation of the data line and the transmission area.

2 is a cross-sectional view taken along the line II-II ′ of FIG. 1.

Referring to FIG. 2, a cross-sectional view of a conventional liquid crystal display device includes a thin film transistor 120 formed on a first substrate 100 and a portion of an upper portion of the thin film transistor 120 and a boundary between a transmission region and a transmission region. The insulating film pattern 110a is formed. The organic insulating film pattern 110a is removed to form the via hole 114 including the contact hole 109 on the drain electrode 105b and is embossed in other regions. The organic insulating layer pattern 110a is not formed in the transmission region.

Subsequently, the pixel electrode 111 is formed on the entire surface except the upper portion of the data line 105c, and the reflective electrode 112 is formed on a portion other than the transmissive region above the pixel electrode.

The reflective region has a cell gap of d1 with the second substrate 150, and the double cell gap has a cell gap of d2 with the second substrate 150.

However, the transmission area and the reflection area have a step of d3, and thus, after rubbing, there is a problem that afterimages and light leakage occur at the portion. In addition, there is a problem that a residual image and light leakage occur due to a step of d3 at the boundary between the transmission region and the transmission region-transmission region.

In addition, at the boundary between the transmission region and the transmission region, pixel adjacent defects due to a short circuit between the upper pixel electrode 111 and the reflective electrode 112 are caused by the organic insulating layer pattern 110a of embossing. There is a problem.

Accordingly, a first object of the present invention for solving the above-described problems is to provide a liquid crystal display device in which afterimages, light leakage, and adjacent defects do not occur.

In addition, a second object of the present invention is to provide a method of manufacturing a liquid crystal display device having excellent screen quality from which afterimages, light leakage, and pixel adjacent defects are removed.

       The present invention for achieving the first object described above,

       A plurality of gate wires formed on the first substrate and extending in the first direction; A plurality of data wires formed on the first substrate and extending in a second direction perpendicular to the first direction; A transmissive region having a protrusion defined by two adjacent gate wirings of the gate wirings and two adjacent data wirings of the data wirings and overlapping a portion of the data wirings, and a corresponding reflective region; A divided pixel region; An organic insulating film formed at a boundary between the pixel area of the reflective area and the pixel area of the reflective area; A reflective electrode formed on the organic insulating layer; And a liquid crystal layer formed between the first substrate and the second substrate facing the first substrate.

In addition, the present invention for achieving the second object,

Forming a plurality of gate lines formed on the first substrate and extending in the first direction; Forming a plurality of data lines on the first substrate to extend in a second direction perpendicular to the first direction; The gate line is defined by two adjacent gate lines and two data lines adjacent among the data lines, and overlaps a portion of the data line, and is divided into a transmissive region having a protrusion and a corresponding reflective region. Forming a pixel area; Forming an organic insulating film at a boundary between the pixel area of the reflective area and the pixel area of the reflective area; Forming a reflective electrode on the organic insulating layer; And forming a liquid crystal layer between the first substrate and a second substrate facing the first substrate.

As described above, the liquid crystal display device and the method of manufacturing the same according to the present invention prevent the afterimage and the light leakage by removing the organic insulating film at the boundary between the transmission region and the transmission region-transmission region, and the pixel electrode and the reflection at the boundary of the transmission region-transmission region. The shorting of the electrodes is prevented, thereby minimizing the adjacent pixel defects of the panel, thereby increasing productivity and reducing costs.

Hereinafter, the present invention will be described in more detail with reference to the drawings and specific examples. However, the present invention is not limited to these examples.

In the present invention, the transmissive region overlaps with the data line and a protrusion is formed to correspond to the 12 o'clock to 3 o'clock direction in the reflection region direction or the rubbing direction at 9 o'clock to 12 o'clock.

       The transmissive region is formed of only the pixel electrode without forming a reflective electrode on the pixel electrode. A liquid crystal display device having such a transmissive region and a method of manufacturing the same are shown in FIGS. 3, 4 and 5A to 5G.

3 is a plan view of a liquid crystal display device according to an exemplary embodiment of the present invention.

Referring to FIG. 3, a pixel region represented by the pixel electrode 311 is formed in an area where the upper portion of the thin film transistor 320, the gate wiring 301, and the data wiring 305c intersect, and the data is formed inside the pixel region. A transmissive region 340 is formed which overlaps the wiring 305c and has projections 395a and 395b for the 12 o'clock to 3 o'clock direction in the reflection region direction or the rubbing direction for the 9 o'clock to 12 o'clock.

       The protrusions 395a and 395b of the transmission region 340 are formed toward the reflection region at both ends of a boundary between the transmission region 340 and the reflection region in the pixel region. In addition, the protrusions 395a and 395b of the transmission area 340 may be formed toward the reflection area at the first end of the boundary area between the transmission area 340 and the reflection area in the pixel area. 395a) and a second protrusion 395b formed toward the reflective region at the second end opposite to the first end.

       In addition, the first protrusion 395a is formed toward the reflective region so as to form sides of a right triangle shape at the first end of the data line 305c, the transmission region 340, and the boundary portion of the reflective region. An angle between the hypotenuse and the data line 305c of the right triangle-shaped sides at the first end is 30 ° to 60 °.

       The second protrusion 395b is formed toward the reflective region so as to form right-angled triangular sides at the second end of the data line 305c, the transmission region 340, and the boundary of the reflective region. An angle between the hypotenuse and the data line among the sides of the right triangle shape at the second end is 30 ° to 60 °.

In the transmission region-transmission region boundary, a turtle lamp-shaped reflection electrode 312 is formed on the pixel electrode 311.

In addition, the reflective electrode 312 is formed on the pixel electrode 311 between the transmission region 340 and the gate wiring 301.

An organic insulating layer pattern 310a is formed in a reflective region other than the transmission region 340, and the pixel electrode 311 and the reflective electrode 312 are formed on the organic insulating layer pattern 310a. .

When the alignment layer (not shown) is formed on the liquid crystal display and the horizontal and vertical rubbing is performed from the transmissive region to the reflective region, the 12 o'clock rubbing among the four directions rubbing 390a, 390b, 390c, and 390d of the transmissive region 340 is performed. 390a is covered by the reflective electrode 312 even after an afterimage and light leakage are generated, and the 3 o'clock rubbing 390b and the 9 o'clock rubbing 390d are formed of an organic insulating film pattern at the boundary between the transmission region and the transmission region. The afterimage and the light leakage are not generated by eliminating the step 310a).

Further, when obliquely rubbing from the transmissive region to the reflective region, the projections 395a and 395b in the 12 to 3 o'clock and 9 to 12 o'clock directions in the reflective region direction correspond to blocking the generation of afterimages and light leakage in the direction.

In addition, light leakage is blocked by partially overlapping the data line 305c, the transmission region 340, and the reflection region.

4 is a cross-sectional view of the liquid crystal display shown in FIG. 3 taken along the cutting line IV-IV '.

      Referring to FIG. 4, in the cross-sectional view of the liquid crystal display device, a thin film transistor 320 is formed on the first substrate 300, and an organic insulating layer is formed on a portion of the upper portion of the thin film transistor 320 and the boundary between the reflection area and the reflection area. The pattern 310a is formed. The organic insulating layer pattern 310a is removed to form the via hole 314 including the contact hole 309 on the drain electrode 305b and is embossed in other regions. The organic insulating layer pattern 310a is not formed at the boundary between the transmission region and the transmission region-transmission region.

Subsequently, the pixel electrode 311 is formed on the entire surface except the upper portion of the data line 305c and the reflective electrode 312 is formed on a portion other than the transmissive region above the pixel electrode.

Here, the reflective region has a cell gap of d1 with the second substrate 350, and the double cell gap having a cell gap of d2 with the second substrate 350 is formed.

At this time, since the organic insulating layer pattern is removed at the boundary between the transmission region and the transmission region-transmission region, there is no step so that afterimages and light leakage do not occur when rubbing.

In addition, since the organic insulating layer pattern of the embossing is removed at the boundary between the transmission region and the transmission region, pixel adjacent defects due to a short between the upper pixel electrode 311 and the reflective electrode 312 are not caused.

In this case, since the vertical cross talk value may be increased by removing the organic insulating layer pattern of the embossing at the boundary between the transmission region and the transmission region, a floating matal is used as the gate wiring.

The reflective electrode is formed to surround the edge of the pixel electrode 312 at the boundary between the reflection area-reflection area, the reflection area-transmission area, and the transmission area-transmission area to protect the pixel electrode 311 so as to protect the pixel electrode 311. Opening of the pixel electrode 311 is prevented.

When the pixel electrode 311 is disconnected, the reflective electrode 312 may be welded using the conductive property to repair the disconnection failure of the pixel electrode 311.                     

A method of manufacturing a liquid crystal display device for preventing afterimages, light leakage, short circuits, and short circuits as described above is as follows.

5A through 5G are cross-sectional views of the method of manufacturing the liquid crystal display device illustrated in FIG. 3.

Referring to FIG. 5A, the first substrate 300 is cleaned, a gate metal is formed by a sputtering method, a photoresist is applied thereon, a first mask is installed, exposed, developed, and wet etched. When the photoresist is peeled off, a gate wiring (not shown) and a gate electrode 301a are formed. In addition, a gate insulating layer 302 of silicon nitride (SiNx) or silicon oxide (SiOx) is formed on the entire surface including the gate wiring (not shown), and a semiconductor layer 303 and an impurity doped ohmic contact layer 304 are formed thereon. E).

Referring to FIG. 5B, an ohmic contact layer 304a formed by coating a photoresist on the semiconductor layer 303 and the ohmic contact layer 304, installing a second mask, exposing, developing, and patterning the left and right sides is patterned. A semiconductor layer 303 having 304b is formed. Then, a source / drain metal is deposited on the semiconductor layer 303, a photoresist is applied on the semiconductor layer 303, a third mask is installed, exposed, and developed to wet-etch and dry-etch the source / drain metal. The source electrode 305a, the drain electrode 305b, and the data wiring 305c are formed.

Referring to FIG. 5C, an inorganic protective film of silicon nitride (SiNx) is deposited on the entire surface including the channel layer, an organic insulating film 310 of acrylate or epoxy is coated on the upper surface, a photoresist is applied, and a contact hole 309 is applied. A fourth mask 330 for the via hole 314 is installed, exposed, and developed so that the organic insulating layer 310 is patterned only around the channel layer.

Referring to FIG. 5D, when a photoresist is coated on the organic insulating film (not shown), a patterned fifth mask 335 for embossing the organic insulating film (not shown) is installed, exposed, and developed. A patterned organic insulating layer 310a is formed only around the channel layer.

Referring to FIG. 5E, the pixel electrode 311 is deposited on the entire surface of the patterned organic insulating layer 310a to be connected to the lower drain electrode 305b through the contact hole 309 and the via hole 314. A photoresist is applied thereon, a sixth mask is provided, exposed, developed, wet etched, and the photoresist is peeled off to form a pixel electrode 311 pattern.

Here, the pixel electrode 311 is formed at portions except the upper portion of the data line 305c. The channel portion of the pixel electrode 311 has a step difference from that of the other portions by the organic insulating layer pattern 310a. The data line 305c at the boundary between the transmission region and the transmission region outside the channel layer has the step of removing the embossed organic insulating layer pattern 310a and removing the embossed organic insulating layer pattern 310a. Therefore, pixel adjacent defects due to a short connected to the pixel electrode 311 do not occur in the upper portion of the data line 305c at the boundary between the transmission region and the transmission region outside the channel layer.

Referring to FIG. 5F, a reflective electrode 312 is deposited on one side of the pixel electrode 311 to include the thin film transistor 320, a photoresist is applied thereon, a seventh mask is provided, and the light is exposed. After developing, wet etching, and peeling the photoresist, a reflective electrode 312 pattern is formed.

At this time, the reflective electrode 312 has the step of the data line 305c at the boundary between the transmission region and the transmission region outside the channel layer and the embossed organic insulating layer pattern 310a is removed. Therefore, afterimage rubbing in the transmission region toward the transmission region-transmission region boundary does not generate afterimages or light leakage.

In addition, pixel adjacent defects due to a short connected to the reflective electrode 312 do not occur in the upper portion of the data line 305c at the boundary between the transmission region and the transmission region outside the channel layer.

In addition, the reflective electrode 312 between the reflective region-reflective region, the reflective region-transmissive region, and the transparent region-transmissive region boundary, like the pixel electrode protector 380a, forms an edge of the pixel electrode 311. The encapsulation protects the pixel electrode 311 from being opened, and repairs the reflective electrode 312 by laser welding when the pixel electrode 311 is disconnected.

Finally, referring to FIG. 5G, the light blocking layer 351 and the color filter layer 352 overlapping two of the red, green, and blue color filters are formed on the second substrate 350, and planarization is performed thereon. The common electrode 354 is formed of the overcoat layer 353 and the transparent electrode. After that, after the two substrates are bonded together, the liquid crystal is injected therebetween to form the liquid crystal layer 370, or the liquid crystal is dropped on one substrate and then bonded to the other substrate to form the liquid crystal layer 370.

As described above, the liquid crystal display device and the manufacturing method thereof according to the present invention have the following effects.

First, the liquid crystal display of the present invention and a method of manufacturing the same prevent the afterimage and light leakage from rubbing by removing the organic insulating film at the boundary between the transmission region and the transmission region.

Second, the liquid crystal display of the present invention and a method of manufacturing the same can prevent the adjacent pixel defects in which the pixel electrode and the reflective electrode are subsequently shorted by removing the organic insulating film at the boundary between the transmission region and the transmission region.

Third, the liquid crystal display of the present invention and a method of manufacturing the same prevent the disconnection of the pixel electrode by forming a reflective electrode so as to surround the edge of the pixel electrode at the reflective region-transmissive region boundary and the transparent region-transmissive region boundary. When disconnected, it can be repaired by laser welding with the reflective electrode.

Although the above has been described with reference to a preferred embodiment of the present invention, those skilled in the art will be able to variously modify and change the present invention without departing from the spirit and scope of the invention as set forth in the claims below. It will be appreciated.

Claims (23)

A plurality of gate wires formed on the first substrate and extending in the first direction; A plurality of data wires formed on the first substrate and extending in a second direction perpendicular to the first direction; A transmissive region having a protrusion defined by two adjacent gate wirings of the gate wirings and two adjacent data wirings of the data wirings and overlapping a portion of the data wirings, and a corresponding reflective region; A divided pixel region; An organic insulating film formed at a boundary between the reflective region of the pixel region and the reflective region of another pixel region adjacent to the pixel region; A pixel electrode formed in the pixel area; A reflective electrode formed on the organic insulating layer to surround an edge of the pixel electrode at a boundary between a transmission region of the pixel region and a transmission region of another pixel region adjacent to the pixel region; And And a liquid crystal layer formed between the first substrate and a second substrate facing the first substrate. The liquid crystal display of claim 1, wherein the pixel area is formed to overlap a portion of the data line. The liquid crystal display device according to claim 1, wherein the projections of the transmission region are formed toward the reflection region at both ends of a boundary between the transmission region and the reflection region in the pixel region. 4. The projection of claim 3, wherein the projection of the transmissive region is formed from the first end of the transmissive region in the pixel region and the boundary of the reflective region toward the reflective region and the first opposing to the first end. And a second protrusion formed at two ends toward the reflective region. The liquid crystal display of claim 4, wherein the first protrusion is formed toward the reflective region to form sides of a right triangle shape at the first end of the boundary between the data line, the transmissive region and the reflective region. device. 6. The liquid crystal display device according to claim 5, wherein an angle between the hypotenuse and the data line among the sides of the right triangular shape at the first end is 30 degrees to 60 degrees. The liquid crystal display according to claim 4, wherein the second protrusion is formed toward the reflective region so as to form sides of a right triangle shape at the second end of the boundary between the data line, the transmissive region and the reflective region. device. 8. The liquid crystal display device according to claim 7, wherein an angle formed by the hypotenuse and the data line among the sides of the right triangular shape at the second end is 30 degrees to 60 degrees.        The liquid crystal display device of claim 1, further comprising an inorganic protective film formed on an entire surface of the data line. The liquid crystal display device of claim 9, wherein the pixel electrode is formed on the inorganic passivation layer. delete The liquid crystal display of claim 10, wherein the reflective region includes the reflective electrode formed to surround an edge of the pixel electrode at a reflective region-reflective region boundary and a reflective region-transmissive region boundary. The liquid crystal display device according to claim 1, wherein the reflective region is formed on the thin film transistor. The liquid crystal display device of claim 1, wherein the reflective electrode is made of an aluminum alloy.        The liquid crystal display device according to claim 1, wherein the organic insulating film has an embossed pattern shape.        The liquid crystal display device according to claim 1, wherein the organic insulating film is made of epoxy or acrylate. The liquid crystal display device of claim 1, wherein the second substrate further comprises a light shielding layer formed of at least two of red, green, and blue color filters. 18. The liquid crystal display device of claim 17, further comprising an overcoat layer for planarization formed on the light shielding layer.        Forming a plurality of gate lines formed on the first substrate and extending in the first direction; Forming a plurality of data lines on the first substrate to extend in a second direction perpendicular to the first direction; The gate line is defined by two adjacent gate lines and two data lines adjacent among the data lines, and overlaps a portion of the data line, and is divided into a transmissive region having a protrusion and a corresponding reflective region. Forming a pixel area; Forming an organic insulating film at a boundary between the reflective region of the pixel region and the reflective region of another pixel region adjacent to the pixel region; Forming a pixel electrode in the pixel region on the organic insulating layer; Forming a reflective electrode on the organic insulating layer to surround an edge of the pixel electrode at a boundary between a transmission region of the pixel region and a transmission region of another pixel region adjacent to the pixel region; And        Forming a liquid crystal layer between the first substrate and a second substrate facing the first substrate. 20. The method of claim 19, further comprising forming an inorganic protective film on the entire surface of the data line. 21. The method of claim 20, further comprising forming a pixel electrode on the inorganic passivation layer. delete 22. The liquid crystal display of claim 21, wherein the reflective region comprises forming the reflective electrode surrounding an edge of the pixel electrode at a reflective region-reflected region boundary and a reflective region-transmissive region boundary. Way.

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