KR100994160B1 - 토크 및 비틀림 각 검출 센서용 옵티컬 디스크 제조 방법 - Google Patents
토크 및 비틀림 각 검출 센서용 옵티컬 디스크 제조 방법 Download PDFInfo
- Publication number
- KR100994160B1 KR100994160B1 KR1020080041987A KR20080041987A KR100994160B1 KR 100994160 B1 KR100994160 B1 KR 100994160B1 KR 1020080041987 A KR1020080041987 A KR 1020080041987A KR 20080041987 A KR20080041987 A KR 20080041987A KR 100994160 B1 KR100994160 B1 KR 100994160B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- optical disk
- nickel
- exposure
- stainless substrate
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/14—Forme preparation for stencil-printing or silk-screen printing
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D2202/00—Metallic substrate
- B05D2202/10—Metallic substrate based on Fe
- B05D2202/15—Stainless steel
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
Claims (5)
- 옵티컬 디스크를 제조하는 옵티컬 디스크 제조 방법으로서,스테인레스 기판의 표면을 전처리하는 전처리 단계,상기 전처리된 스테인레스 기판 위에 감광제를 도포하여 감광제 층을 형성하는 감광제 층 형성 단계,상기 감광제 층의 표면 중 상기 옵티컬 디스크의 형상에 대응하는 부분 이외의 부분이 빛에 노출될 수 있도록 하는 패턴을 가지는 필름을 상기 감광제 층 위에 배치한 후 노광을 수행하여 상기 감광제 층을 부분적으로 경화시키는 노광 단계,상기 노광 단계를 수행한 후 상기 감광제 층 중 경화되지 않은 부분이 제거되도록 상기 감광제 층을 현상하는 현상 단계,상기 감광제 층이 제거된 부분에 니켈 층이 형성되도록 니켈 전주 도금(electroforming)을 수행하는 전주 도금 단계, 그리고상기 형성된 니켈 층을 상기 스테인레스 기판으로부터 분리하는 분리 단계를 포함하고,상기 전주 도금 단계는 표면에 복수의 통공이 형성된 쉴드가 상기 니켈 층이 형성되는 상기 스테인레스 기판의 면을 둘러싸도록 설치된 상태에서 수행되는 옵티컬 디스크 제조 방법.
- 제1항에서,상기 전처리 단계에서 상기 스테인레스 기판의 표면에 헤어라인 패턴(hair line pattern)이 형성되는 옵티컬 디스크 제조 방법.
- 제1항에서,상기 감광제 층 형성단계에서 상기 감광제는 인쇄 타입의 실크스크린 방식으로 도포되는 옵티컬 디스크 제조 방법.
- 제1항에서,상기 노광 단계에서 상기 감광제 층이 형성된 스테인레스 기판을 고정한 상태에서 UV램프에서 발산된 빛을 자동으로 차폐함으로써 노광이 수행되는 옵티컬 디스크 제조 방법.
- 삭제
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080041987A KR100994160B1 (ko) | 2008-05-06 | 2008-05-06 | 토크 및 비틀림 각 검출 센서용 옵티컬 디스크 제조 방법 |
Applications Claiming Priority (1)
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KR1020080041987A KR100994160B1 (ko) | 2008-05-06 | 2008-05-06 | 토크 및 비틀림 각 검출 센서용 옵티컬 디스크 제조 방법 |
Publications (2)
Publication Number | Publication Date |
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KR20090116195A KR20090116195A (ko) | 2009-11-11 |
KR100994160B1 true KR100994160B1 (ko) | 2010-11-12 |
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KR1020080041987A KR100994160B1 (ko) | 2008-05-06 | 2008-05-06 | 토크 및 비틀림 각 검출 센서용 옵티컬 디스크 제조 방법 |
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KR (1) | KR100994160B1 (ko) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100603082B1 (ko) | 2004-10-18 | 2006-08-09 | 한국기계연구원 | 노광용 마스크를 이용한 나노패턴 니켈 스탬퍼 제작 방법 |
KR100669482B1 (ko) * | 2005-05-06 | 2007-01-15 | 김영준 | 컬러 금속스티커의 제조방법 |
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- 2008-05-06 KR KR1020080041987A patent/KR100994160B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100603082B1 (ko) | 2004-10-18 | 2006-08-09 | 한국기계연구원 | 노광용 마스크를 이용한 나노패턴 니켈 스탬퍼 제작 방법 |
KR100669482B1 (ko) * | 2005-05-06 | 2007-01-15 | 김영준 | 컬러 금속스티커의 제조방법 |
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