KR100974626B1 - 접촉 구조의 나노로드 반도체 소자 및 그 제조 방법 - Google Patents
접촉 구조의 나노로드 반도체 소자 및 그 제조 방법 Download PDFInfo
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- KR100974626B1 KR100974626B1 KR1020090129029A KR20090129029A KR100974626B1 KR 100974626 B1 KR100974626 B1 KR 100974626B1 KR 1020090129029 A KR1020090129029 A KR 1020090129029A KR 20090129029 A KR20090129029 A KR 20090129029A KR 100974626 B1 KR100974626 B1 KR 100974626B1
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Abstract
Description
Claims (20)
- 투명 기판;상기 투명 기판 위에 형성된 투명 전극층;상기 투명 전극층 위에 성장된 제1극성으로 도핑된 복수의 반도체 나노로드들을 포함하는 나노로드층; 및제2극성으로 도핑되고, 상기 반도체 나노로드들의 말단에 일정한 물리적 접촉을 형성하는 단결정 반도체층을 포함하는, 접촉 구조의 반도체 소자.
- 제 1 항에 있어서,상기 반도체 나노로드들이 n형으로 도핑될 때, 상기 단결정 반도체층은 p형으로 도핑되는 것을 특징으로하는, 접촉 구조의 반도체 소자.
- 제 1 항에 있어서,상기 반도체 나노로드들이 p형으로 도핑될 때, 상기 단결정 반도체층은 n형으로 도핑되는 것을 특징으로 하는, 접촉 구조의 반도체 소자.
- 제 1 항에 있어서,상기 반도체 나노로드들은 상기 투명 기판에 대해 수직 배향되는 것을 특징으로 하는, 접촉 구조의 반도체 소자.
- 제 1 항에 있어서,상기 반도체 나노로드들은 상기 투명 기판에 대해 수직이 아닌 각도로 성장된 것을 특징으로 하는, 접촉 구조의 반도체 소자.
- 제 1 항에 있어서,상기 나노로드층은 단원자 단결정 반도체 또는 다원자 단결정 화합물 반도체 중 어느 하나인 것을 특징으로 하는, 접촉 구조의 반도체 소자.
- 제 1 항에 있어서,상기 반도체 나노로드들은 높이가 0.3 μm 내지 300 μm 이고, 직경이 10 nm 내지 1,000 nm 인 것을 특징으로 하는, 접촉 구조의 반도체 소자.
- 제 1 항에 있어서,상기 나노로드층은에너지 금지대역을 이루는 원자가띠와 전도띠의 모서리(edge)가 이루는 폭(gap)이 0.5 - 10 eV인 물질인 것을 특징으로 하는, 접촉 구조의 반도체 소자.
- 제 1 항에 있어서,상기 단결정 반도체층은단결정 실리콘 기판인 것을 특징으로 하는, 접촉 구조의 반도체 소자.
- 제 1 항에 있어서,상기 단결정 반도체층의 상면에 부착된 금속 방열층을 더 포함하는 것을 특징으로 하는, 접촉 구조의 반도체 소자.
- 투명 기판 위에 투명 전극층을 형성하는 단계;상기 투명 전극층 위에 제1극성으로 도핑된 복수의 반도체 나노로드들을 성장하여 나노로드층을 형성하는 단계;상기 나노로드층 위에 제2극성으로 도핑된 단결정 반도체층을 접촉하는 단계; 및상기 단결정 반도체층의 상면에 소정의 압력을 가하여 상기 단결정 반도체층을 상기 나노로드층에 고정하는 단계를 포함하는, 접촉 구조의 반도체 소자 제조 방법.
- 제 11 항에 있어서,상기 투명 전극층의 상면에서 외부로 노출된 영역과 상기 단결정 반도체층의 상면에 각각 금속층을 형성하는 단계; 및상기 금속층에 열처리하여 오믹접합을 형성하는 단계를 더 포함하는 것을 특징으로 하는, 접촉 구조의 반도체 소자 제조 방법.
- 제 11 항에 있어서,상기 나노로드층은 단원자 단결정 반도체 또는 다원자 단결정 화합물 반도체 중 어느 하나인 것을 특징으로 하는, 접촉 구조의 반도체 소자 제조 방법.
- 제 11 항에 있어서,상기 나노로드층을 형성하는 단계는상기 투명 전극층 위에 상기 반도체 나노로드들을 직접 성장하는 단계인 것을 특징으로 하는, 접촉 구조의 반도체 소자 제조 방법.
- 제 11 항에 있어서,상기 나노로드층을 형성하는 단계는카탈리스트 방법을 사용하여 상기 반도체 나노로드들을 성장하는 단계인 것을 특징으로 하는, 접촉 구조의 반도체 소자 제조 방법.
- 제 11 항에 있어서,상기 나노로드층을 형성하는 단계는버퍼층을 형성한 후 상기 반도체 나노로드들을 성장하는 단계인 것을 특징으로 하는, 접촉 구조의 반도체 소자 제조 방법.
- 제 11 항에 있어서,상기 나노로드층을 형성하는 단계는기상 수송 증착법(Vapor Phase Transport process), 유기금속 화학 기상 증착법(Metal-Organic source Chemical Vapor Deposition), 스퍼터법(Sputter), 전해 증착법 (Chemical Electrolysis Deposition) 중 어느 하나의 방법으로 상기 반도체 나노로드들을 성장하는 단계인 것을 특징으로 하는, 접촉 구조의 반도체 소자 제조 방법.
- 제 11 항에 있어서,상기 단결정 반도체층은단결정 실리콘 기판인 것을 특징으로 하는, 접촉 구조의 반도체 소자 제조 방법.
- 제 11 항에 있어서,상기 단결정 반도체층을 상기 나노로드층에 고정하는 단계는상기 단결정 반도체층의 상면에 0.05 내지 8 N/cm2 의 압력을 가하는 단계인 것을 특징으로 하는, 접촉 구조의 반도체 소자 제조 방법.
- 제 11 항에 있어서,상기 단결정 반도체층을 상기 나노로드층에 고정하는 단계는상기 단결정 반도체층의 상면에 압력을 가한 상태에서 상기 단결정 반도체층의 측면, 상기 투명 전극층 및 상기 투명 기판의 측면을 이어주는 에폭시를 부착하는 단계를 더 포함하는 것을 특징으로 하는, 접촉 구조의 반도체 소자 제조 방법.
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KR1020090129029A KR100974626B1 (ko) | 2009-12-22 | 2009-12-22 | 접촉 구조의 나노로드 반도체 소자 및 그 제조 방법 |
PCT/KR2010/009158 WO2011078555A2 (ko) | 2009-12-22 | 2010-12-21 | 접촉 구조의 나노로드 반도체 소자 및 그 제조 방법 |
US13/518,238 US20120319083A1 (en) | 2009-12-22 | 2010-12-21 | Nanorod semiconductor device having a contact structure, and method for manufacturing same |
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WO2020095179A1 (en) * | 2018-11-05 | 2020-05-14 | King Abdullah University Of Science And Technology | Optoelectronic semiconductor device |
CN110364582A (zh) * | 2019-06-20 | 2019-10-22 | 华南理工大学 | 一种基于石墨烯模板上AlGaN纳米柱基MSM型紫外探测器及其制备方法 |
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