KR100970104B1 - 고주파 스케일러의 팁용 dlc코팅장치 및 이를 이용한스케일러용 팁의 제조방법 - Google Patents
고주파 스케일러의 팁용 dlc코팅장치 및 이를 이용한스케일러용 팁의 제조방법 Download PDFInfo
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- KR100970104B1 KR100970104B1 KR1020080062543A KR20080062543A KR100970104B1 KR 100970104 B1 KR100970104 B1 KR 100970104B1 KR 1020080062543 A KR1020080062543 A KR 1020080062543A KR 20080062543 A KR20080062543 A KR 20080062543A KR 100970104 B1 KR100970104 B1 KR 100970104B1
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- scaler
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4409—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber characterised by sealing means
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45559—Diffusion of reactive gas to substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Abstract
Description
코팅두께(㎛) | 경도(Hv) | 마찰계수 | |
티타늄을 코팅한 팁 | 2~4 | 2000이상 | 0.3~0.4 |
DLC로 코팅한 팁 | 0.5~1 | 2000이상 | 0.1 |
Claims (2)
- 스케일러용 팁을 코팅하는 DLC코팅장치에 있어서,본체의 내부의 상측 일부를 막으면서 그 하측으로 가스를 흐르게 하는 가스가이드판이 본체의 내부 상측에서 하측으로 향하도록 설치되고, 외기의 온도로 팁의 후단부를 냉각하는 팁냉각체가 본체의 하측 중앙부에서 삽입되고, 팁이 상기 팁냉각체에 세워져 설치됨과 더불어 팁의 선단부가 상기 가스가이드판의 하측에 위치되고, 상기 팁의 선단부를 가열하는 핫필라멘트가 상기 본체에 설치되어 상기 가스가이드판의 한쪽 면의 하부를 향하고, 상기 팁의 선단부와 핫필라멘트 사이에 가스를 분사하는 노즐이 상기 본체의 내부에 설치되며, 상기 가스가이드판의 다른쪽 면에 형성되는 본체의 상측 내부의 가스를 배출하는 진공펌프가 상기 본체의 상부에 설치되고, 상기 가스가이드판의 다른쪽 면에 있는 본체 내부의 가스를 흡입하여 상기 가스가이프판의 한쪽 면에 있는 본체 내부로 가스를 분사하는 피드백펌프가 상기 본체의 외부에 설치되고, 상기 팁에 양극을 인가함과 더불어 상기 핫필라멘트에 전기를 인가하는 전기공급기가 상기 팁과 핫필라멘트에 연결되는 것으로 이루어지는 고주파 스케일러의 팁용 DLC코팅장치.
- 절삭기와 금형으로 팁의 형상으로 형성한 뒤, 이를 연마, 세척 및 건조하는 것으로 이루어지는 공지의 스케일러 팁의 제조방법에 있어서,상기 팁을 연마, 세척 및 건조한 뒤, DLC코팅장치로 팁의 앞쪽 부위를 코 팅하는 것으로 포함하여 이루어지되,양극과 연결된 팁의 후단부를 외기의 온도로 냉각하면서 팁의 선단부 주위를 핫필라멘트로 집중 가열하여 650℃ ~ 750℃를 유지하고, 상기 팁의 선단부와 핫필라멘트 사이에 메탄과 수소를 혼합한 가스를 분사함과 더불어 상기 핫필라멘트에 150V ~ 350V의 전압을 가하고, 가스가이드판을 이용하여 가스가 팁의 선단부의 내측과 외측으로 흐르게 하며, 가스를 충전하면서 팁과 핫필라멘트, 가스분사노즐을 내장한 용기 내의 가스를 가스순환펌프로 순환시키는 것으로 이루어지는 고주파 스케일러의 팁용 DLC코팅장치를 이용한 스케일러 팁의 제조방법.
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KR1020080062543A KR100970104B1 (ko) | 2008-06-30 | 2008-06-30 | 고주파 스케일러의 팁용 dlc코팅장치 및 이를 이용한스케일러용 팁의 제조방법 |
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KR1020080062543A KR100970104B1 (ko) | 2008-06-30 | 2008-06-30 | 고주파 스케일러의 팁용 dlc코팅장치 및 이를 이용한스케일러용 팁의 제조방법 |
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KR20100002594A KR20100002594A (ko) | 2010-01-07 |
KR100970104B1 true KR100970104B1 (ko) | 2010-07-16 |
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CN106756880B (zh) * | 2015-11-24 | 2019-03-01 | 中国科学院深圳先进技术研究院 | 一种金刚石/类金刚石多层复合涂层及其制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5891100A (ja) | 1981-11-25 | 1983-05-30 | Natl Inst For Res In Inorg Mater | ダイヤモンドの合成法 |
JPH01167299A (ja) * | 1987-12-24 | 1989-06-30 | Showa Denko Kk | 気相法ダイヤモンドの合成方法 |
KR100360281B1 (ko) | 2000-10-19 | 2002-11-09 | 신승도 | 다이아몬드 기상 합성 장치 및 이를 이용한 합성 방법 |
US20080063888A1 (en) | 2006-09-11 | 2008-03-13 | Anirudha Vishwanath Sumant | Nanocrystalline diamond coatings for micro-cutting tools |
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Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5891100A (ja) | 1981-11-25 | 1983-05-30 | Natl Inst For Res In Inorg Mater | ダイヤモンドの合成法 |
JPH01167299A (ja) * | 1987-12-24 | 1989-06-30 | Showa Denko Kk | 気相法ダイヤモンドの合成方法 |
KR100360281B1 (ko) | 2000-10-19 | 2002-11-09 | 신승도 | 다이아몬드 기상 합성 장치 및 이를 이용한 합성 방법 |
US20080063888A1 (en) | 2006-09-11 | 2008-03-13 | Anirudha Vishwanath Sumant | Nanocrystalline diamond coatings for micro-cutting tools |
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