KR100863526B1 - Cleaning agent composition - Google Patents

Abstract

As a cleaning agent used to remove a fixing agent or a protective film used in the polishing process of an optical article such as a lens, without using a halogen solvent, a flan solvent, or an aromatic solvent, which is concerned about environmental problems or human effects, Provided are compositions for cleaning agents having high cleaning power to various fixing agents and protective films.

For example, 75-25 weight% of alkylene glycol alkyl ethers, such as dipropylene glycol monomethyl ether and dipropylene glycol dimethyl ether, and cycloparaffins 25-75 of C10-C15 cycloparaffins, such as a cyclodecane, a cyclo undecane, and a cyclododecane The composition for detergent which consists of weight% is used.

Cleaning composition, alkylene glycol alkyl ether, cycloparaffin

Description

Cleaner composition {CLEANING AGENT COMPOSITION}

This invention relates to the composition for cleaning agents used for the purpose of removing the fixation agent, protective film, etc. which are used when manufacturing optical articles, such as a lens and a prism.

When manufacturing optical articles, such as a lens, it is necessary to grind and process the surface of optical base materials, such as a glass substrate. In this polishing step, the optical substrate is fixed to the support base and polished. However, in the fixing to the support base, a fixing agent composed of wax, asphalt pitch, or the like is used.

In addition, in the case where the other side is polished after polishing of one side is finished, a protective film is formed by applying a masking agent made of phenolic resin, acrylic resin, or the like to protect the polished side. After the completion of the polishing step, these fixing agents and protective films are removed from the optical substrate by using a cleaning agent, and the polished optical substrate is moved to the next step such as the abrasive removal step.

Conventionally, chlorine-based solvents or flon-based solvents have been used as cleaning agents for these fixing agents and protective films. In recent years, however, these solvents have caused problems of ozone layer destruction and groundwater contamination, and have been difficult to handle except for use by a completely sealed system.

As a countermeasure of these in recent years, as a composition for cleaning agents which can be used for optical article manufacture, (1) which mix | blended dialkyl glycol ether (refer Unexamined-Japanese-Patent No. 7-247499), (2) specific A mixture of an alcohol with propylene glycol monoalkyl ether or dipropylene glycol monoalkyl ether (see Japanese Patent Laid-Open No. 9-25496), (3) A solvent in which a specific aromatic compound and an aliphatic compound are mixed in a specific ratio (Japan (See Japanese Patent Application Laid-Open No. Hei 8-254602) and (4) a mixture of an isoparaffinic solvent and a glycol ether (see Japanese Patent Laid-Open No. 2001-329296).

However, although the cleaning composition of said (1) and (2) is excellent in the solubility of a wax pitch, it cannot be said that it is sufficient in the dissolution removal property of another asphalt pitch and a resinous protective film. In addition, in the cleaning agent of (3), not only the asphalt pitch and some resin protective films can be dissolved and removed, but the aromatic compounds have problems in terms of environmental problems and effects on the human body, and also have problems of strong odor. have. Moreover, although the cleaning agent of said (4) shows a favorable removal performance generally with respect to both fixatives, such as a wax pitch and an asphalt pitch, and a protective film, it does not necessarily need to be sufficient and it makes it sufficient to have sufficient cleaning power in both a pitch and a protective film. it's difficult.

It is therefore an object of the present invention to provide a cleaning agent in which the cleaning power for the wax is equivalent to the cleaning agent in the above (4), and the cleaning power for the pitch and the protective film is further improved.

Other objects and advantages of the present invention will become apparent from the following description.

MEANS TO SOLVE THE PROBLEM As a result of earnestly examining in order to solve the said subject, when this inventor used alkylene glycol alkyl ether and cycloparaffin together, compared with the case where alkylene glycol alkyl ether and isoparaffin were used together, the solubility to a pitch and a protective film was carried out. It was found that it was remarkably high and that the desired objective was achieved, and came to complete this invention.

That is, the above object and advantages of the present invention, first, the following formula

R _1- (OC _n H _2n ) _m -OR ₂

Wherein R ₁ is an alkyl group having 1 to 4 carbon atoms, R ₂ is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, m is an integer of 1 to 3, and n is 2 or 3. It is achieved by the composition for cleaning which consists of 75 to 25 weight% of glycol alkyl ethers, and 25 to 75 weight% of cycloparaffins with 10 to 15 carbon atoms.

The above objects and advantages of the present invention are secondly achieved by a cleaning agent based on the composition.

The object and advantage of the present invention is, thirdly, a substrate fixing step of fixing an optical substrate having at least two main surfaces to the substrate support using a fixing agent, and exposing the optical substrate fixed to the substrate support. A method for producing an optical article comprising a polishing step of polishing a major surface, and a substrate separation step of separating the polished substrate and the substrate support by removing the fixing agent using a cleaning agent, wherein the cleaning agent of the present invention is used as the cleaning agent. It is achieved by a method for producing an optical article characterized by using a cleaning agent.

In the above production method of the present invention, in the substrate fixing step, the polishing is performed using an optical substrate having at least one major surface coated with a protective film and at least one major surface not covered with a protective film as the optical substrate. In the step, at least one major surface not covered with the protective film may be polished, and the protective film may be removed together with the fixing agent in the substrate separation step.

Best Mode for Carrying Out the Invention

The composition for cleaning of this invention consists of 75-25 weight% of specific alkylene glycol alkyl ethers, and 25-75 weight% of cycloparaffins having 10 to 15 carbon atoms. By containing both in specific ratios, a synergistic effect will arise and the washing power which cannot be expected from each washing power independently can be obtained. Specifically, high cleaning power can be obtained for both the protective film and the fixing agent. From the viewpoint of the high cleaning power, the content ratio of the alkylene glycol alkyl ether is preferably 70 to 30% by weight, and the content ratio of the cycloparaffin is 30 to 70% by weight.

The alkylene glycol alkyl ether which is the 1st component of the composition of this invention is represented by a following formula.

R _1- (OC _n H _2n ) _m -OR ₂

In the above formula, R ₁ means an alkyl group having 1 to 4 carbon atoms, and R ₂ means a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. Examples of the alkyl group having 1 to 4 carbon atoms as R ₁ or R ₂ include methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, 2-butyl group and t-butyl group. In addition, m is an integer of 1-3, n is 2 or 3.

Examples of the alkylene glycol alkyl ether represented by the above formula that can be suitably used in the present invention include monopropylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, monopropylene glycol monopropyl ether, and di Propylene glycol monopropyl ether, tripropylene glycol monopropyl ether, monopropylene glycol monobutyl ether, dipropylene glycol monobutyl ether, tripropylene glycol monobutyl ether, monoethylene glycol monomethyl ether, diethylene glycol monomethyl ether, triethylene Glycol monomethyl ether, monoethylene glycol monopropyl ether, diethylene glycol monopropyl ether, triethylene glycol monopropyl ether, monoethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl Alkylene glycol monoalkyl ethers such as hotel; And alkylene glycol dialkyl ethers such as propylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, triethylene glycol dimethyl ether, diethylene glycol dimethyl ether, and diethylene glycol diethyl ether. These alkylene glycol alkyl ethers may be used alone or in combination of two or more different kinds thereof.

From the viewpoint of high cleaning power, low toxicity and easy handling, among them, (1) at least one alkylene glycol selected from the group consisting of dipropylene glycol dimethyl ether, diethylene glycol methylethyl ether and triethylene glycol dimethyl ether Dialkyl ether or (2) alkylene glycol dialkyl ether of (1) and monopropylene glycol monomethyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monomethyl ether, monopropylene glycol monopropyl ether, di At least one alkylene glycol monoalkyl ether selected from the group consisting of propylene glycol monopropyl ether, tripropylene glycol monopropyl ether, monopropylene glycol monobutyl ether, dipropylene glycol monobutyl ether and tripropylene glycol monobutyl ether Mixtures are suitable. In particular, in the above (1) and (2), the content ratio of the dialkyl ether is 30 to 100 wt%, and in particular, 30 to 100 wt% of dipropylene glycol dimethyl ether and 0 to 70 wt% of dipropylene glycol monomethyl ether. It is especially suitable to consist of.

As a C10-C15 cycloparaffin which is a 2nd component of the composition of this invention, the C10-C15 cycloparaffin whose boiling point is 180 degreeC-250 degreeC is suitable from a viewpoint that a simple washing | cleaning apparatus can be used. In the case of using cycloparaffins with less than 10 carbon atoms, care must be taken for handling as the flash point decreases, and the deterioration of the working environment and the change in the liquid composition due to the increase in the amount of dissipation caused by the decrease in the boiling point can be ignored. It becomes impossible. In addition, when the carbon number is more than 15, the ability to remove contaminants is reduced.

Specific examples of the cycloparaffin that can be suitably used in the present invention include cyclodecane, cycloundecane, cyclododecane and the like. These may be used independently, and may mix and use multiple types of different things.

The cleaning composition of the present invention is a substrate fixing step of fixing an optical substrate having at least two main surfaces to a substrate support using a fixing agent, such as a method for producing an optical lens, and exposure of the optical substrate fixed to the substrate support. A method of manufacturing an optical article comprising a polishing step of polishing a major surface and a substrate separation step of separating the polished substrate and the substrate support by removing the fixing agent using a cleaning agent, the method being used in the substrate separation step. It can use suitably as a composition for detergents.

An optical base material is a board | substrate, a block, etc. which consist of translucent materials, such as glass and quartz which are used as materials of optical articles, such as an optical lens and a prism, for example here. In addition, examples of the fixing agent include wax pitch, asphalt pitch, rosin and beeswax. In order to separate the substrate and the substrate support polished using the cleaning agent in the separation step, the substrate and the substrate support bonded by the fixing agent are immersed in the cleaning agent introduced into the cleaning tank, and, if necessary, cleaning is performed using ultrasonic waves. do. Since the washing | cleaning agent of this invention is extremely high in the washing | cleaning power with respect to the various components used as a fixing agent or a protective film, it can isolate | separate both in a short time.

In the method for producing an optical article as described above, when the optical article has two or more surfaces to be polished like an optical lens or a prism, the surface that has been polished when the other surface is polished after polishing one surface is polished. In order to avoid abrasion, it is common to coat the polished surface with a protective film. In this case, the polishing of the other surface is also performed through the substrate fixing step, the polishing step and the substrate separating step, but the protective film may be removed together with the fixing agent in the substrate separating step. Here, a protective film means the resin film which consists of a phenol resin or acrylic resin formed by apply | coating a masking agent, for example. The cleaning agent of the present invention has a high cleaning power not only for the fixing agent but also for such a protective film. Therefore, in the substrate separation step of the production method, the substrate and the substrate support can be separated cleanly, and the protective film can be removed.

When the cleaning composition of the present invention is used as the cleaning agent used in the substrate separation step as described above, the cleaning composition of the present invention can be used as the cleaning agent as it is, but the cleaning agent may further contain a component for increasing the cleaning power. As such a component, hydrocarbon-based solvents other than C10-C15 cycloparaffin, oxygen-containing organic solvents, such as alcohol, a ketone, and ether, surfactant etc. are mentioned, for example. Although the addition amount of these components is not specifically limited, From a viewpoint that the characteristic of the cleaning composition of this invention can fully be exhibited, it is suitable that it is 10 weight% or less, especially 5 weight% or less of the whole cleaning agent. As the surfactant, any of nonionic surfactants, anionic surfactants, cationic surfactants and amphoteric surfactants may be used, but it is desired to use a surfactant having a high hydrophobicity. Preferably it is a nonionic surfactant, For example, the alkylene oxide adduct of a higher alcohol, the alkylene oxide adduct of an alkylphenyl ether, the alkylene oxide adduct of a fatty acid, etc. are mentioned.

As mentioned above, although the case of using when manufacturing an optical article was demonstrated about the cleaning agent of this invention as an example, the use of the cleaning agent of this invention is not limited to this, For example, it uses a pitch and wax to a jig | tool. It can also be suitably used as a cleaning agent for removing contaminants such as cleaning of fixed and polished mechanical parts and electronic parts, cleaning of resin coating cloth masks, jigsaws, and the like.

EXAMPLE

Hereinafter, although an Example demonstrates this invention further in detail, this invention is not limited to these Examples. In addition, the symbol of the organic solvent used by each Example and a comparative example means the following compounds, respectively.

(1) alkylene glycol alkyl ethers

Monoalkyl ether

DPGME: dipropylene glycol monomethyl ether

TPGME: tripropylene glycol monomethyl ether

DPGPE: dipropylene glycol monopropyl ether

PGME: Propylene Glycol Monomethyl Ether

Dialkyl ether

DPGDME: dipropylene glycol dimethyl ether

DEGMEE: diethylene glycol methyl ethyl ether

TEGDME: triethylene glycol dimethyl ether

(2) hydrocarbon solvent

Cycloparaffin

TPS-3200: cycloparaffinic hydrocarbon cleaner TPS-3200 made by Tokuyama

C _n H _2n n = 11-13 Flash point 74 ℃

Isoparaffin

TPS-1150: isoparaffinic hydrocarbon cleaner TPS-1150 made by Tokuyama

C _n H _{2n +2} n = 9 to 14 Flash point 71 ° C

Normal paraffin

TPS-2250: Normal paraffin type hydrocarbon cleaner TPS-2250 made by Tokuyama

C _n H _{2n +2} n = 10-14 Flash point 52.5 ° C.

Reference Example  One

The Kokonoe polishing pitch class K No.8 (manufactured by Kokonoe Denki Co., Ltd.) was shaped into a button shape with a diameter of 6 mm to prepare a fixed sample, and the weight of the adhered pitch was measured. Was 56.2 mg. Subsequently, the said sample was immersed for 20 minutes in 20 ml of washing | cleaning agents (cycloparaffinic washing | cleaning agent TPS-3200 made in Tokuyama) maintained at 25 degreeC. Then, the sample was taken out and dried, and the weight of the residual pitch adhered to the glass plate was measured, and it was 17.1 mg. The amount of pitch removed from the difference between the initial weight and the remaining weight is 39.1 mg.

Moreover, when the washing | cleaning liquid in sample immersion and after immersion was observed visually, peeling of a pitch was not seen but it was a uniform solution. From this, it turns out that all the pitch is removed by melt | dissolution.

Comparative Example  1 and 2

Except replacing the cleaning liquid with isoparaffin-based cleaner TPS-1150 (manufactured by Tokuyama Co., Ltd.) (reference comparison example 1) or normal paraffin-based cleaner TPS-2250 (manufactured by Kabukishi Tokuyama) (reference example 2) In the same manner as in Reference Example 1, the amount of removal of the pitch was obtained. In addition, eye observation was made as to whether or not peeling of the formed pitch occurred during sample immersion. The results are shown in Table 1.

TABLE 1

As shown in Table 1, the dissolving power with respect to the pitch of the C10-C15 cycloparaffin is high. On the other hand, the removal amount of the pitch in the reference comparative example using isoparaffin or normal paraffin is smaller than the reference example 1, and peeling also occurs during immersion. In these reference comparative examples, the particles having the peeled pitch are floating around, and may be reattached to the object to be cleaned in the actual cleaning.

Example  1-3 and Comparative example  1 to 6

Various kinds of substances to be removed using the cleaning agents shown in Table 2 (Cleaning substances: Class K grade No. 8 (made by Kokonoe Eden Co., Ltd.) ), Recess Wax (Grade No.5 Kokonoe Denki Co., Ltd.) (hereafter Recess Wax), Shift Wax (hereinafter referred to as `` Shift Wax '', made by Nikka Seiko Co., Ltd.), Protective Film LG # Solubility evaluation was performed for 88 blocks (manufactured by Kana Edo Ogabu Shiki Co., Ltd.) (hereinafter referred to as 'protective film 88'). Evaluation was performed by putting a small amount of the removal target substance into each detergent maintained at 25 degreeC, and visually confirming the solubility at the time of standing for 5 minutes. The material to be removed is the protective film 88, which is dried for 1 day after application to the lens for evaluation.

The evaluation results are shown in Table 2. In addition, the evaluation criteria in these tables are as follows.

5 minutes of pitch K-8, recess wax and shift wax

5: completely soluble

4: almost soluble, but with some residue

3: The amount is reduced, but remains completely (less than 50% remaining)

2: quantity is reduced, but remains completely (survival rate 50% or more)

1: something that remains almost the same,

After 5 minutes of standing on the shield 88

5: something that can be removed without wiping

4: something that can be removed by wiping lightly

3: the surface of the lens after wiping off has a very small amount of protective film residue that is hard to see

2: A small amount of protective film residue visible on the surface of the lens after wiping off

1: Insufficient removal.

TABLE 2

As shown in Table 2, in Examples 1-3 using the cleaning agent of this invention, the high cleaning power is obtained with respect to all the removal target material. On the other hand, when the content rate of cycloparaffin is high beyond the range specifically determined by this invention (comparative example 1), the washing | cleaning power with respect to a wax and a protective film falls. Moreover, when the content rate of cycloparaffin is low beyond the range specifically defined by this invention (comparative example 2), the washing | cleaning power with respect to all the wash objects falls. When hydrocarbon-based cleaners other than cycloparaffin are used, even when the ratio of the hydrocarbon-based cleaner and alkylene glycol ether is in the range of 25:75 to 75:25 by weight ratio (Comparative Examples 3 and 4), the amount of cleaning to the protective film is carried out. It is smaller than the example.

The cleaning composition of the present invention is extremely high in the cleaning property of the fixing agent, the masking agent film or the protective film used in the polishing step, and can obtain a sufficient cleaning effect in a short cleaning time. Therefore, it becomes possible to manufacture optical articles, such as a lens, at low cost and high efficiency by using the cleaning agent which has the composition of this invention as a main component.

Claims (4)

The following formula R _1- (OC _n H _2n ) _m -OR ₂ (In formula, R <_1> is a C1-C4 alkyl group, R <_2> is a hydrogen atom or a C1-C4 alkyl group, m is an integer of 1-3, n is 2 or 3.) A composition for cleaning a fixing agent and a protective film during polishing of an optical article, comprising 75 to 25% by weight of alkylene glycol alkyl ether and 25 to 75% by weight of cycloparaffin having 10 to 15 carbon atoms. The cleaning agent which consists of a composition of Claim 1. A substrate fixing step of fixing an optical substrate having at least two major surfaces to a substrate support using a fixing agent, a polishing step of polishing an exposed main surface of the optical substrate fixed to the substrate support, and a cleaning agent A method of manufacturing an optical article comprising a substrate separation step of separating a ground substrate and a substrate support by removing the fixing agent using As the cleaning agent, Formula R _1- (OC _n H _2n ) _m -OR ₂ (In formula, R <_1> is a C1-C4 alkyl group, R <_2> is a hydrogen atom or a C1-C4 alkyl group, m is an integer of 1-3, n is 2 or 3.) The manufacturing method of the optical article characterized by using the cleaning agent which consists of 75-25 weight% of alkylene glycol alkyl ethers and 25-75 weight% of C10-C15 cycloparaffins. The method of claim 3, At least one optical surface having at least one major surface coated with a protective film and at least one major surface not covered with a protective film as the optical substrate in the substrate fixing step, and at least one not coated with a protective film in the polishing step A major surface is polished and the protective film is removed together with the fixing agent in the substrate separation step.