KR100856988B1 - 매립된 다공성 실리콘층의 산화에 의한 절연체상 실리콘 게르마늄 구조의 형성 - Google Patents

매립된 다공성 실리콘층의 산화에 의한 절연체상 실리콘 게르마늄 구조의 형성 Download PDF

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KR100856988B1
KR100856988B1 KR1020067003316A KR20067003316A KR100856988B1 KR 100856988 B1 KR100856988 B1 KR 100856988B1 KR 1020067003316 A KR1020067003316 A KR 1020067003316A KR 20067003316 A KR20067003316 A KR 20067003316A KR 100856988 B1 KR100856988 B1 KR 100856988B1
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sige
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insulator
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KR20060061839A (ko
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스티븐 더블유 베델
광수 최
카이스 에프 포겔
데벤드라 케이 사다나
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인터내셔널 비지네스 머신즈 코포레이션
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/10—Isolation regions comprising dielectric materials
    • H10W10/17—Isolation regions comprising dielectric materials formed using trench refilling with dielectric materials, e.g. shallow trench isolations
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/10—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of nickel or cobalt or alloys based thereon
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6758—Thin-film transistors [TFT] characterised by the insulating substrates
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
    • H10P90/19—Preparing inhomogeneous wafers
    • H10P90/1904—Preparing vertically inhomogeneous wafers
    • H10P90/1906—Preparing SOI wafers
    • H10P90/191—Preparing SOI wafers using full isolation by porous oxide silicon [FIPOS]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/01—Manufacture or treatment
    • H10W10/011—Manufacture or treatment of isolation regions comprising dielectric materials
    • H10W10/014—Manufacture or treatment of isolation regions comprising dielectric materials using trench refilling with dielectric materials, e.g. shallow trench isolations
    • H10W10/0142—Manufacture or treatment of isolation regions comprising dielectric materials using trench refilling with dielectric materials, e.g. shallow trench isolations the dielectric materials being chemical transformed from non-dielectric materials
    • H—ELECTRICITY
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    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W10/00—Isolation regions in semiconductor bodies between components of integrated devices
    • H10W10/10—Isolation regions comprising dielectric materials
    • H10W10/181—Semiconductor-on-insulator [SOI] isolation regions, e.g. buried oxide regions of SOI wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
    • H10P14/2901—Materials
    • H10P14/2902—Materials being Group IVA materials
    • H10P14/2904—Silicon carbide
    • H—ELECTRICITY
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    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
    • H10P14/2901—Materials
    • H10P14/2902—Materials being Group IVA materials
    • H10P14/2905—Silicon, silicon germanium or germanium
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/32—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by intermediate layers between substrates and deposited layers
    • H10P14/3202—Materials thereof
    • H10P14/3204—Materials thereof being Group IVA semiconducting materials
    • H10P14/3211—Silicon, silicon germanium or germanium
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/34—Deposited materials, e.g. layers
    • H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
    • H10P14/3404—Deposited materials, e.g. layers characterised by the chemical composition being Group IVA materials
    • H10P14/3411—Silicon, silicon germanium or germanium
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
    • H10P14/38—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by treatments done after the formation of the materials
    • H10P14/3802—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth

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  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Recrystallisation Techniques (AREA)
  • Element Separation (AREA)
  • Local Oxidation Of Silicon (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
KR1020067003316A 2003-09-12 2004-09-10 매립된 다공성 실리콘층의 산화에 의한 절연체상 실리콘 게르마늄 구조의 형성 Expired - Fee Related KR100856988B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/662,028 US7125458B2 (en) 2003-09-12 2003-09-12 Formation of a silicon germanium-on-insulator structure by oxidation of a buried porous silicon layer
US10/662,028 2003-09-12

Publications (2)

Publication Number Publication Date
KR20060061839A KR20060061839A (ko) 2006-06-08
KR100856988B1 true KR100856988B1 (ko) 2008-09-04

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KR1020067003316A Expired - Fee Related KR100856988B1 (ko) 2003-09-12 2004-09-10 매립된 다공성 실리콘층의 산화에 의한 절연체상 실리콘 게르마늄 구조의 형성

Country Status (9)

Country Link
US (1) US7125458B2 (https=)
EP (1) EP1665340B1 (https=)
JP (1) JP4856544B2 (https=)
KR (1) KR100856988B1 (https=)
CN (1) CN100429761C (https=)
AT (1) ATE368939T1 (https=)
DE (1) DE602004007940T2 (https=)
TW (1) TWI330388B (https=)
WO (1) WO2005031810A2 (https=)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7566482B2 (en) * 2003-09-30 2009-07-28 International Business Machines Corporation SOI by oxidation of porous silicon
US7172930B2 (en) * 2004-07-02 2007-02-06 International Business Machines Corporation Strained silicon-on-insulator by anodization of a buried p+ silicon germanium layer
US7767541B2 (en) * 2005-10-26 2010-08-03 International Business Machines Corporation Methods for forming germanium-on-insulator semiconductor structures using a porous layer and semiconductor structures formed by these methods
US7833884B2 (en) * 2007-11-02 2010-11-16 International Business Machines Corporation Strained semiconductor-on-insulator by Si:C combined with porous process
US7772096B2 (en) * 2008-07-10 2010-08-10 International Machines Corporation Formation of SOI by oxidation of silicon with engineered porosity gradient
FR2935194B1 (fr) * 2008-08-22 2010-10-08 Commissariat Energie Atomique Procede de realisation de structures geoi localisees, obtenues par enrichissement en germanium
US8618554B2 (en) * 2010-11-08 2013-12-31 International Business Machines Corporation Method to reduce ground-plane poisoning of extremely-thin SOI (ETSOI) layer with thin buried oxide
JP2014535124A (ja) 2011-09-30 2014-12-25 インテル コーポレイション エネルギー貯蔵デバイスのエネルギー密度及び達成可能な電力出力を増やす方法
US8518807B1 (en) 2012-06-22 2013-08-27 International Business Machines Corporation Radiation hardened SOI structure and method of making same
US9087716B2 (en) * 2013-07-15 2015-07-21 Globalfoundries Inc. Channel semiconductor alloy layer growth adjusted by impurity ion implantation
US9343303B2 (en) 2014-03-20 2016-05-17 Samsung Electronics Co., Ltd. Methods of forming low-defect strain-relaxed layers on lattice-mismatched substrates and related semiconductor structures and devices
US10032870B2 (en) 2015-03-12 2018-07-24 Globalfoundries Inc. Low defect III-V semiconductor template on porous silicon
US9899274B2 (en) 2015-03-16 2018-02-20 International Business Machines Corporation Low-cost SOI FinFET technology
US10833175B2 (en) * 2015-06-04 2020-11-10 International Business Machines Corporation Formation of dislocation-free SiGe finFET using porous silicon
US20190131454A1 (en) * 2017-11-01 2019-05-02 Qualcomm Incorporated Semiconductor device with strained silicon layers on porous silicon
CN112908849A (zh) * 2021-01-28 2021-06-04 上海华力集成电路制造有限公司 一种形成SiGe沟道的热处理方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4104090A (en) 1977-02-24 1978-08-01 International Business Machines Corporation Total dielectric isolation utilizing a combination of reactive ion etching, anodic etching, and thermal oxidation
US5686343A (en) 1992-12-22 1997-11-11 Goldstar Electron Co. Ltd. Process for isolating a semiconductor layer on an insulator

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831730B2 (ja) * 1979-10-15 1983-07-08 松下電器産業株式会社 半導体装置の製造方法
JPS592185B2 (ja) * 1980-02-04 1984-01-17 日本電信電話株式会社 半導体基体内への絶縁領域の形成法
US6376859B1 (en) * 1998-07-29 2002-04-23 Texas Instruments Incorporated Variable porosity porous silicon isolation
US5950094A (en) * 1999-02-18 1999-09-07 Taiwan Semiconductor Manufacturing Company, Ltd. Method for fabricating fully dielectric isolated silicon (FDIS)
JP4212228B2 (ja) * 1999-09-09 2009-01-21 株式会社東芝 半導体装置の製造方法
JP2002305293A (ja) * 2001-04-06 2002-10-18 Canon Inc 半導体部材の製造方法及び半導体装置の製造方法
US6812116B2 (en) * 2002-12-13 2004-11-02 Taiwan Semiconductor Manufacturing Company, Ltd. Method of fabricating a wafer with strained channel layers for increased electron and hole mobility for improving device performance

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4104090A (en) 1977-02-24 1978-08-01 International Business Machines Corporation Total dielectric isolation utilizing a combination of reactive ion etching, anodic etching, and thermal oxidation
US5686343A (en) 1992-12-22 1997-11-11 Goldstar Electron Co. Ltd. Process for isolating a semiconductor layer on an insulator

Also Published As

Publication number Publication date
TW200516666A (en) 2005-05-16
DE602004007940T2 (de) 2008-04-24
KR20060061839A (ko) 2006-06-08
WO2005031810A3 (en) 2005-06-23
EP1665340B1 (en) 2007-08-01
JP2007505502A (ja) 2007-03-08
EP1665340A2 (en) 2006-06-07
ATE368939T1 (de) 2007-08-15
DE602004007940D1 (de) 2007-09-13
TWI330388B (en) 2010-09-11
CN100429761C (zh) 2008-10-29
US20050056352A1 (en) 2005-03-17
CN1957458A (zh) 2007-05-02
WO2005031810A2 (en) 2005-04-07
US7125458B2 (en) 2006-10-24
JP4856544B2 (ja) 2012-01-18

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