KR100815905B1 - 식각용 버블판 및 그를 이용한 식각장치 - Google Patents
식각용 버블판 및 그를 이용한 식각장치 Download PDFInfo
- Publication number
- KR100815905B1 KR100815905B1 KR1020010088501A KR20010088501A KR100815905B1 KR 100815905 B1 KR100815905 B1 KR 100815905B1 KR 1020010088501 A KR1020010088501 A KR 1020010088501A KR 20010088501 A KR20010088501 A KR 20010088501A KR 100815905 B1 KR100815905 B1 KR 100815905B1
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- South Korea
- Prior art keywords
- etching
- etchant
- air
- bubble plate
- nozzle assembly
- Prior art date
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
- H01L21/32134—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by liquid etching only
Abstract
Description
Claims (9)
- 내부에 공기 통로가 있는 한 쌍의 프레임으로부터 연결되어 일정한 간격을 두고 일렬로 배열된 복수개의 공기튜브;상기 공기튜브의 표면에 형성된 복수개의 공기구멍; 및상기 공기 구멍에 맞고 상기 공기 튜브에서 돌출되는 노즐 어셈블리를 포함한 것을 특징으로 하는 식각용 버블판.
- 제 1항에 있어서, 상기 노즐 어셈블리는 플라스틱 재질인 것을 특징으로 하는 식각용 버블판.
- 제 1항에 있어서, 상기 노즐 어셈블리는 상기 공기구멍에 끼울 때 상기 공기튜브에 걸리도록 하는 중앙 둘레부분에 턱이 있는 것을 특징으로 하는 식각용 버블판.
- 제 1 항에 있어서, 상기 노즐 어셈블리는 상기 공기튜브의 표면에서부터 둘레가 줄어들고 끝단의 표면적이 최소인 것을 특징으로 하는 식각용 버블판.
- 식각액을 수용하는 식각조;상기 식각조의 내벽에 상기 식각액의 공급량을 감지하는 식각액 센서;상기 식각조의 바닥면에 고정되도록 설치된 가이드; 및상기 가이드에 의해 지지되는 제 1 항의 식각용 버블판을 포함하는 식각장치.
- 제 5 항에 있어서, 상기 버블판 위에 설치된 다공판;상기 버블판 아래의 식각액 공급관과 연결되어 상기 식각액을 공급하는 식각액 혼합탱크;상기 버블판 아래의 식각액 배출관과 연결되어 상기 식각액이 저장되는 버퍼탱크; 및상기 버블판과 연결되어 공기를 공급하는 공기공급관을 추가로 포함하는 것을 특징으로 하는 식각장치.
- 제 6 항에 있어서, 상기 식각액 혼합탱크에 연결되어 식각액 혼합탱크에 탈이온수(DI)를 공급하는 DI공급부와, 식각원액을 공급하는 식각원액공급부를 추가로 포함하는 것을 특징으로 하는 식각장치.
- 제 5 항에 있어서, 상기 식각액은 불산인 것을 특징으로 하는 식각장치.
- 제 5 항에 있어서, 상기 식각조 내에 온도센서가 장착된 것을 특징으로 하는 식각장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020010088501A KR100815905B1 (ko) | 2001-12-29 | 2001-12-29 | 식각용 버블판 및 그를 이용한 식각장치 |
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KR1020010088501A KR100815905B1 (ko) | 2001-12-29 | 2001-12-29 | 식각용 버블판 및 그를 이용한 식각장치 |
Publications (2)
Publication Number | Publication Date |
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KR20030058114A KR20030058114A (ko) | 2003-07-07 |
KR100815905B1 true KR100815905B1 (ko) | 2008-03-21 |
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KR1020010088501A KR100815905B1 (ko) | 2001-12-29 | 2001-12-29 | 식각용 버블판 및 그를 이용한 식각장치 |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06151085A (ja) * | 1992-11-10 | 1994-05-31 | Shimizu Corp | 取手類の静電気防止処理方法及び静電防止塗料 |
KR20000019079A (ko) * | 1998-09-08 | 2000-04-06 | 구본준, 론 위라하디락사 | 유리기판의 식각장치 |
JP2000147474A (ja) * | 1998-11-02 | 2000-05-26 | System Technology Inc | 薄膜トランジスタ液晶ディスプレイ用ガラスの自動エッチング装置 |
US6151085A (en) * | 1996-04-15 | 2000-11-21 | Canon Kabushiki Kaisha | Electrode plate, process for producing the plate, liquid crystal device including the plate and process for producing the device |
JP2008000001A (ja) * | 2004-09-30 | 2008-01-10 | Osaka Univ | 免疫刺激オリゴヌクレオチドおよびその医薬用途 |
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2001
- 2001-12-29 KR KR1020010088501A patent/KR100815905B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06151085A (ja) * | 1992-11-10 | 1994-05-31 | Shimizu Corp | 取手類の静電気防止処理方法及び静電防止塗料 |
US6151085A (en) * | 1996-04-15 | 2000-11-21 | Canon Kabushiki Kaisha | Electrode plate, process for producing the plate, liquid crystal device including the plate and process for producing the device |
KR20000019079A (ko) * | 1998-09-08 | 2000-04-06 | 구본준, 론 위라하디락사 | 유리기판의 식각장치 |
JP2000147474A (ja) * | 1998-11-02 | 2000-05-26 | System Technology Inc | 薄膜トランジスタ液晶ディスプレイ用ガラスの自動エッチング装置 |
JP2008000001A (ja) * | 2004-09-30 | 2008-01-10 | Osaka Univ | 免疫刺激オリゴヌクレオチドおよびその医薬用途 |
Non-Patent Citations (3)
Title |
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공개특허 제2000-0019079호 |
미국특허 제6,151,085호 |
일본특개평12-147474 |
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KR20030058114A (ko) | 2003-07-07 |
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