KR100790409B1 - Apparatus and method for forming coating layer on subject with curved surface - Google Patents

Apparatus and method for forming coating layer on subject with curved surface Download PDF

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Publication number
KR100790409B1
KR100790409B1 KR1020070040698A KR20070040698A KR100790409B1 KR 100790409 B1 KR100790409 B1 KR 100790409B1 KR 1020070040698 A KR1020070040698 A KR 1020070040698A KR 20070040698 A KR20070040698 A KR 20070040698A KR 100790409 B1 KR100790409 B1 KR 100790409B1
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South Korea
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coating film
deposition material
jig
curved surface
chamber
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KR1020070040698A
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Korean (ko)
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김칠암
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(주)비피에스
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221Ion beam deposition
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/246Replenishment of source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

An apparatus and a method for forming a coating film on objects with curved surfaces are provided to form a coating film on a plurality of objects by one process, allow an accelerated deposition material to be deposited well on both flat and curved surfaces of the objects, and improve water repellency of the coating film and reinforce contamination resistance and anti-fingerprint properties of the coating film. An apparatus for forming a coating film on objects(100) with curved surfaces comprises a chamber(300) having a gas supply pipe(310) for supplying reaction gas, at least one gun(350) which can project electron beams and ion beams and is positioned in the chamber, a crucible(360) in which a deposition material is contained, which is heated by the electron beams projected from the gun to evaporate the deposition material, and in which the evaporated deposition material is accelerated by the ion beams, a jig(330) which is positioned in the chamber correspondingly to the crucible, and on which at least one object with curved and flat surfaces is mounted in a state that a deposition material that has reacted with reaction gas supplied by the gas supply pipe is deposited to form a coating film on the curved and flat surfaces of the object, and a holder(320) for holding and rotating the jig, wherein a groove is formed on a surface of the object opposite to a coating film-formed surface of the object, a projection is formed on the jig and inserted into the groove of the object such that the object is mounted on the jig, and the object is projected from a surface of the jig.

Description

곡면을 갖는 대상물에 코팅막을 형성하는 장치 및 방법{ Apparatus and method for forming coating layer on subject with curved surface }Apparatus and method for forming coating layer on subject with curved surface}

도 1은 본 발명에 따라 곡면을 갖는 대상물에 코팅막을 형성하는 방법을 설명하기 위한 개념도1 is a conceptual diagram for explaining a method for forming a coating film on a curved object in accordance with the present invention

도 2는 본 발명에 따라 곡면을 갖는 대상물에 코팅막을 형성하는 방법을 설명하기 위한 흐름도2 is a flowchart illustrating a method of forming a coating film on a curved object according to the present invention.

도 3은 본 발명에 따라 곡면을 갖는 대상물의 개략적인 단면도3 is a schematic cross-sectional view of an object having a curved surface in accordance with the present invention.

도 4는 본 발명에 따라 곡면을 갖는 대상물에 코팅막을 형성하기 위한 장치의 구성을 설명하기 위한 개략적인 단면도Figure 4 is a schematic cross-sectional view for explaining the configuration of the apparatus for forming a coating film on a curved object in accordance with the present invention

도 5는 본 발명에 따라 곡면을 갖는 대상물이 지그에 장착되어 있는 상태를 도시한 개략적인 단면도5 is a schematic cross-sectional view showing a state in which an object having a curved surface is mounted on a jig according to the present invention.

도 6a 및 6b는 본 발명에 따라 일례의 대상물에 코팅막이 형성된 상태를 도시한 사진도6A and 6B are photographic views showing a state in which a coating film is formed on an example object according to the present invention;

도 7은 본 발명에 따라 곡면을 갖는 대상물에 형성된 코팅막에 수막 또는 초발수층이 형성된 상태를 도시한 개략적인 단면도7 is a schematic cross-sectional view showing a state in which a water film or a super water-repellent layer is formed on a coating film formed on a curved object according to the present invention.

도 8은 본 발명에 따라 코팅막에 형성된 초발수층의 구조를 도시한 개념도8 is a conceptual diagram showing the structure of the super water-repellent layer formed on the coating film according to the present invention

<도면의 주요부분에 대한 부호의 설명><Description of the symbols for the main parts of the drawings>

100 : 대상물 110 : 코팅막100: object 110: coating film

120 : 홈 150 : 초발수층120: groove 150: super water-repellent layer

151 : 헤드 152 : 테일151 head 152 tail

200 : 증착 물질 300 : 챔버200: deposition material 300: chamber

310 : 가스 공급관 320 : 홀더310: gas supply pipe 320: holder

330 : 지그(Jig) 331 : 돌출부330: jig 331: protrusion

350 : 건(Gun) 360 : 도가니 350: Gun 360: Crucible

본 발명은 곡면을 갖는 대상물에 코팅막을 형성하는 장치 및 방법에 관한 것으로, 보다 상세하게는 대상물의 곡면(曲面)(Curved surface) 및 평면(平面)을 포함한 코팅 영역에 코팅막을 형성하고, 그 코팅막이 소정의 색상을 갖게 할 수 있는 곡면을 갖는 대상물에 코팅막을 형성하는 장치 및 방법에 관한 것이다.The present invention relates to an apparatus and method for forming a coating film on an object having a curved surface, and more particularly, to form a coating film in a coating area including a curved surface and a plane of the object, and the coating film The present invention relates to an apparatus and method for forming a coating film on an object having a curved surface which can have a predetermined color.

일반적으로, 외장품의 컬러 구현 및 코팅하기 위하여 도장 및 도금법이 사용되고 있다.In general, coating and plating methods are used to implement and coat the color of the exterior article.

이 외장품의 코팅은 물체의 표면을 피복하여 그 물체를 보호하고 미화하는 것을 목적으로 한다.The coating of this enclosure is intended to cover the surface of the object to protect and beautify the object.

한편, 도료는 표면을 피복하기가 간단하고 용이할 뿐만 아니라 피막의 갱신이 자유롭고 경제적이어서, 외장품의 코팅에 주로 사용되고 있다.On the other hand, the paint is not only simple and easy to coat the surface, but also freely and economically renews the coating, and thus is mainly used for coating exterior products.

이러한, 도료를 이용한 도장은 도장물을 보호하여 원하는 만큼의 수명을 유지시키며, 또한 미관을 좋게 한다.This, the coating using the paint protects the painting to maintain the desired life, and also improves the appearance.

도장 수행에 있어서 적절한 도장물의 표면처리와 알맞은 도료의 선택과 도장을 수행하는 방법 등이 중요하다.In performing painting, the proper surface treatment of the coating, the selection of a suitable paint, a method of performing the painting, and the like are important.

도장의 종류로는 붓도장, 주걱도장, 로울러 도장, 에어스프레이법 등이 있다.Types of painting include brush painting, spatula painting, roller painting, and air spraying.

대부분의 도료는 유기용제를 다량 함유하고 있으며, 방청도료 및 선지도료는 중 금속 화합물을, 상충도료 및 곰팡이 방지도료는 유기계 독극물을 함유하고 있는 등 안전에 유해한 약품들이 사용되고 있다.Most paints contain large amounts of organic solvents. Anti-corrosive paints and lead coatings contain heavy metal compounds, and conflicting paints and anti-fungal paints contain organic poisons.

또한, 유기용제들은 증기압이 유난히 낮고 증발 잠열이 작고, 물보다 증발되기가 쉽고 증발 증기의 비중은 공기보다 크며, 도장중 및 도막 건조의 단계에서 휘발하는 용제증기는 공기중에 쉽게 확산된다.In addition, organic solvents have exceptionally low vapor pressure, low latent heat of evaporation, are easier to evaporate than water, and the specific gravity of evaporated vapor is larger than air, and the solvent vapor volatilized during painting and at the stage of coating drying easily diffuses in the air.

이러한 유기용제들은 발화점은 상당히 높으나, 인화점이 대단히 낮아 상온에서 인화의 위험성이 상당히 높다. These organic solvents have a very high flash point, but a very low flash point, so the risk of ignition at room temperature is very high.

그러므로, 도장 작업장에서 피부의 접촉과 호흡으로 인해 나타나는 외적 증상으로는 발진과 같은 피부염이나 내적 증상으로 눈자극, 코자극, 두통, 구토, 근육경련, 질식 등과 같은 건강의 위험을 야기한다.Therefore, external symptoms caused by skin contact and breathing in the paint shop may cause dermatitis such as rashes or internal symptoms such as eye irritation, nasal irritation, headache, vomiting, muscle spasms, and asphyxiation.

도금은 높은 내마모, 윤활성, 내열성, 내식성, 이형성을 필요로 하는 곳에 사용되며, 미려한 장식성이 요구되는 경우나 내약품성을 요구하는 부품에 적용되고 있으며, 대표적으로 크롬 도금이 널리 사용되고 있다.Plating is used in places requiring high wear resistance, lubricity, heat resistance, corrosion resistance, and releasability, and is applied to parts requiring beautiful decoration or chemical resistance, and chromium plating is widely used.

크롬도금의 경우, 코팅하는 막을 필요 이상 두껍게 하면 도금면에 핀홀(Pin Hole), 균열 등이 많게 되므로 전체적으로 도금두께가 0.5㎛ 이하가 되어야 한다.In the case of chromium plating, if the coating film is thickened more than necessary, the plating surface has a lot of pin holes, cracks, etc., so that the overall plating thickness should be 0.5 μm or less.

또한, 도금의 경우 소재의 표면상태에 상당히 민감해 소재 자체에 핀홀, 주물소, 갈라짐 등과 같은 흡집이 있을 경우 크롬도금 자체의 부착성이 나쁘므로 이러한 결함을 없애기가 힘들다.In addition, in the case of plating is very sensitive to the surface state of the material, it is difficult to eliminate such defects because the adhesion of the chromium plating itself is bad when there is an absorption such as pinholes, foundry, cracks in the material itself.

또한, 도금은 주로 크롬이 함유되어 있는 액을 사용하게 되는데, 최근 환경문제가 심각해짐에 따라 이 물질 사용에 관한 규제가 심화되고 있다.In addition, the plating mainly uses a liquid containing chromium, and as environmental problems become more serious, regulations on the use of this material are intensifying.

이에 따라, 인산염계, 주석산염계, 불화물계 등의 크롬을 함유하지 않는 액을 이용한 표면처리 방법을 개발하고 있으나, 습식 공정 특성상 화학약품 및 화학 연마제를 사용함으로써, 산업 환경적인 측면에서 청정생산 공정 기술이 필요한 실정이다.Accordingly, the surface treatment method using a chromium-free liquid such as phosphate, stannate, fluoride, etc. has been developed, but due to the nature of the wet process, by using chemicals and chemical abrasives, it is a clean production process in terms of industrial environment. Skills are needed.

이에 본 발명은 상기한 바와 같은 문제점을 해결하기 위하여 안출된 것으로, 회전되는 대상물의 곡면 및 평면을 포함한 코팅 영역에 코팅막을 형성시킬 수 있는 곡면을 갖는 대상물에 코팅막을 형성하는 장치 및 방법을 제공하는 데 그 제 1 목적이 있다. Accordingly, the present invention has been made to solve the problems described above, and provides an apparatus and method for forming a coating film on the object having a curved surface to form a coating film on the coating area including the curved surface and the plane of the object to be rotated Its primary purpose is to.

본 발명의 제 2 목적은 증발된 증착 물질을 반응 가스와 반응시키고, 이 반응된 증착 물질을 가속시켜 대상물에 증착시킴으로써, 대상물에 증착된 코팅막이 소정의 색상을 갖게 할 수 있는 공진 영역을 갖는 대상물에 코팅막을 형성하는 장치 및 방법을 제공하는 있다.A second object of the present invention is to react an evaporated evaporation material with a reaction gas, and accelerate the deposited evaporation material to deposit on the object, whereby an object having a resonance region capable of giving a predetermined color to the coating film deposited on the object. There is provided an apparatus and method for forming a coating film.

본 발명의 제 3 목적은 복수개의 대상물들을 지그에 장착하여, 한 번의 공정으로 복수개의 대상물들에 코팅막을 형성할 수 있는 곡면을 갖는 대상물에 코팅막을 형성하는 장치 및 방법을 제공하는 있다.It is a third object of the present invention to provide an apparatus and method for mounting a plurality of objects on a jig to form a coating film on an object having a curved surface to form a coating film on the plurality of objects in one process.

본 발명의 제 4 목적은 대상물이 지그 표면으로부터 돌출시켜 코팅막을 형성함으로써, 대상물의 평면뿐만 아니라, 곡면에도 가속된 증착 물질을 잘 증착시킬 수 있는 곡면을 갖는 대상물에 코팅막을 형성하는 장치 및 방법을 제공하는 있다.A fourth object of the present invention is to provide an apparatus and method for forming a coating film on an object having a curved surface capable of well depositing the accelerated deposition material on the curved surface as well as the surface of the object by protruding from the jig surface to form a coating film. There is to offer.

본 발명의 제 5 목적은 코팅막 상부에 수막 또는 초발수층을 형성함으로써, 발수성을 향상시키고, 내오염성 및 내지문성을 강화할 수 있는 곡면을 갖는 대상물에 코팅막을 형성하는 장치 및 방법을 제공하는 있다.A fifth object of the present invention is to provide an apparatus and method for forming a coating film on an object having a curved surface which can improve water repellency and enhance stain resistance and fingerprint resistance by forming a water film or super water-repellent layer on the coating film.

상기한 본 발명의 목적들을 달성하기 위한 바람직한 양태(樣態)는, 반응 가스를 공급하기 위한 가스 공급관이 구비된 챔버와; A preferred aspect for achieving the above object of the present invention is a chamber provided with a gas supply pipe for supplying a reaction gas;

전자빔과 이온빔을 출사시킬 수 있으며, 상기 챔버 내측에 위치된 적어도 하 나 이상의 건(Gun)과; At least one gun which is capable of emitting an electron beam and an ion beam, and located inside the chamber;

증착 물질이 담겨져 있고, 상기 건에서 출사된 전자빔에 의해 가열되어 상기 증착 물질이 증발되고, 상기 이온빔에 의해 상기 증발된 증착 물질이 가속되는 도가니와; A crucible containing a deposition material, heated by an electron beam emitted from the gun to evaporate the deposition material, and to accelerate the vaporized deposition material by the ion beam;

상기 도가니와 대응되어, 상기 챔버 내측에 위치되고, 상기 가스 공급관으로 공급된 반응 가스와 반응된 증착 물질이 증착되어 코팅막이 형성되는 곡면 및 평면을 갖는 대상물이 적어도 하나 이상 장착되어 있는 지그(Jig)와; A jig corresponding to the crucible, which is located inside the chamber and is equipped with at least one object having a curved surface and a plane on which a deposition material reacted with a reaction gas supplied to the gas supply pipe is deposited to form a coating film. Wow;

상기 지그를 홀딩(Holding) 및 회전시키는 홀더로 구성된 곡면을 갖는 대상물에 코팅막을 형성하는 장치가 제공된다.There is provided an apparatus for forming a coating film on an object having a curved surface consisting of a holder for holding and rotating the jig.

상기한 본 발명의 목적들을 달성하기 위한 바람직한 다른 양태(樣態)는, 곡면 및 평면을 갖는 대상물을 준비하는 단계와;Another preferred aspect for achieving the above object of the present invention comprises the steps of preparing an object having a curved surface and a plane;

상기 대상물을 회전시키는 단계와;Rotating the object;

증착 물질을 증발시키고, 반응 가스와 상기 증발된 증착 물질을 반응시키는 단계와;Evaporating a deposition material and reacting a reactant gas with the evaporated deposition material;

상기 반응되어진 증착 물질을 가속시켜, 상기 회전되는 대상물의 곡면 및 평면에 증착하여 코팅막을 형성하는 단계로 이루어진 곡면을 갖는 대상물에 코팅막을 형성하는 방법이 제공된다.A method of forming a coating film on an object having a curved surface formed by accelerating the reacted deposition material and depositing on the curved surface and the plane of the rotated object to form a coating film is provided.

이하, 첨부된 도면을 참조하여 본 발명의 바람직한 실시예를 설명하면 다음과 같다.Hereinafter, exemplary embodiments of the present invention will be described with reference to the accompanying drawings.

도 1은 본 발명에 따라 곡면을 갖는 대상물에 코팅막을 형성하는 방법을 설명하기 위한 개념도로서, 곡면(曲面)(Curved surface) 및 평면(平面)을 갖는 대상물(100)의 하부에 증착 물질(200)을 위치시키고, 상기 대상물(100)을 회전시킨 후, 상기 증착 물질(200)을 전자빔으로 증발시키고, 증발된 증착 물질을 이온빔으로 가속시켜, 상기 회전되는 대상물(100)에 증착시킨다.1 is a conceptual view illustrating a method of forming a coating film on an object having a curved surface according to the present invention. The deposition material 200 is disposed below the object 100 having a curved surface and a plane. ), Rotate the object 100, evaporate the deposition material 200 with an electron beam, accelerate the evaporated deposition material with an ion beam, and deposit it on the rotated object 100.

이로써, 상기 회전되는 대상물의 곡면 및 평면을 포함한 코팅 영역에 코팅막(110)이 형성되는 것이다.Thus, the coating film 110 is formed in the coating area including the curved surface and the plane of the object to be rotated.

도 2는 본 발명에 따라 곡면을 갖는 대상물에 코팅막을 형성하는 방법을 설명하기 위한 흐름도로서, 먼저, 곡면 및 평면을 갖는 대상물을 준비한다.(S10단계)2 is a flowchart illustrating a method for forming a coating film on an object having a curved surface according to the present invention. First, an object having a curved surface and a plane is prepared.

그 후, 상기 대상물을 회전시킨다.(S20단계)Thereafter, the object is rotated.

그 다음, 증착 물질을 증발시키고, 반응 가스와 상기 증발된 증착 물질을 반응시킨다.(S30단계)Next, the deposition material is evaporated, and the reaction gas reacts with the evaporated deposition material.

상기 증착 물질의 증발은 전자빔을 이용하는 것이 바람직하다.Preferably, the evaporation of the deposition material uses an electron beam.

전술된 S20단계와 S30단계 사이에, 상기 대상물의 표면을 식각하는 단계를 더 수행할 수도 있다.Between the above-described step S20 and step S30, the step of etching the surface of the object may be further performed.

연이어, 상기 반응되어진 증착 물질을 가속시켜, 상기 회전되는 대상물의 곡면 및 평면에 증착하여 코팅막을 형성한다.(S40단계)In succession, the reacted deposition material is accelerated and deposited on the curved surface and the plane of the rotated object to form a coating film.

상기 반응되어진 증착 물질의 가속은 이온빔을 이용하는 것이 바람직하다.The acceleration of the reacted deposition material is preferably using an ion beam.

여기서, 상기 대상물을 회전시키면서 증착시키면, 상기 대상물의 곡면 및 평면 모두에 증착 물질로 코팅할 수 있게 된다.Here, when the object is rotated and deposited, both the curved surface and the plane of the object may be coated with a deposition material.

그리고, 상기 증발된 증착 물질과 상기 반응 가스가 반응되어 상기 대상물에 증착되면, 상기 대상물에 증착된 코팅막은 소정의 색상을 갖게 된다.When the evaporated deposition material and the reaction gas react with each other and are deposited on the object, the coating film deposited on the object has a predetermined color.

이때, 상기 증착 물질과 상기 반응 가스의 종류에 따라 다양한 색상을 구현할 수 있다.In this case, various colors may be implemented according to the type of the deposition material and the reaction gas.

또한, 상기 증착 물질은 Ti, Zr, Al, Cr 등을 포함하는 모든 금속이고, 상기 반응 가스는 상기 증착 물질과 반응할 수 있는 가스이며, 상기 증착 물질이 금속인 경우, 산소(O2), 질소(N2), 아세틸렌(acetylene) 등을 포함하는 가스이다.In addition, the deposition material is all metals including Ti, Zr, Al, Cr, etc., the reaction gas is a gas that can react with the deposition material, when the deposition material is a metal, oxygen (O 2 ), It is a gas containing nitrogen (N 2 ), acetylene, and the like.

예를 들어, 증착 물질이 Ti이고, 반응 가스가 아세틸렌인 경우, 대상물에 증착된 코팅막은 TiC이며, 검정색의 색상을 띄게 된다.For example, when the deposition material is Ti and the reaction gas is acetylene, the coating film deposited on the object is TiC, and has a black color.

그리고, 증착 물질이 Ti이고, 반응 가스가 질소인 경우, 대상물에 증착된 코팅막은 TiN이며, 검은색의 색상을 띄게 된다.When the deposition material is Ti and the reaction gas is nitrogen, the coating film deposited on the object is TiN, and has a black color.

이때, 반응 가스량 및 반응 온도에 따라 짙은 군청색 또는 노란색의 색상을 띄게 된다.At this time, the color becomes dark navy blue or yellow depending on the amount of reaction gas and the reaction temperature.

도 3은 본 발명에 따라 곡면을 갖는 대상물의 개략적인 단면도로서, 대상물(100)은 곡면(A)과 평면(B)을 구비하고 있다.3 is a schematic cross-sectional view of an object having a curved surface according to the present invention, in which the object 100 has a curved surface A and a plane B. FIG.

본 발명은 이 대상물(100)의 곡면(A)과 평면(B)을 포함한 코팅 영역에 코팅막(110)을 형성하는 것이다.The present invention is to form a coating film 110 in the coating area including the curved surface (A) and the plane (B) of the object (100).

한편, 상기 대상물(100)은 전자 제품 케이스와 기계 부품 케이스를 포함한 전(全) 산업용 케이스 또는 자동차와 같은 기계 부품을 포함한 전(全) 산업용 부품이 바람직하다.Meanwhile, the object 100 is preferably an all-industrial case including an electronic case and a mechanical part case, or an all-industrial part including a mechanical part such as an automobile.

더 바람직하게는, 상기 대상물(100)은 휴대폰 케이스, 키패드와 배터리 커버 중 하나가 바람직하다.More preferably, the object 100 is preferably one of a mobile phone case, a keypad and a battery cover.

도 4는 본 발명에 따라 곡면을 갖는 대상물에 코팅막을 형성하기 위한 장치의 구성을 설명하기 위한 개략적인 단면도로서, 반응 가스를 공급하기 위한 가스 공급관(310)이 구비된 챔버(300)와; 전자빔과 이온빔을 출사시킬 수 있으며, 상기 챔버(300) 내측에 위치된 적어도 하나 이상의 건(Gun)(350)과; 증착 물질이 담겨져 있고, 상기 건(350)에서 출사된 전자빔에 의해 가열되어 상기 증착 물질이 증발되고, 상기 이온빔에 의해 상기 증발된 증착 물질이 가속되는 도가니(360)와; 상기 도가니(360)과 대응되어, 상기 챔버(300) 내측에 위치되고, 상기 가스 공급관으로 공급된 반응 가스와 반응된 증착 물질이 증착되어 코팅막이 형성되는 곡면및 평면을 갖는 대상물이 적어도 하나 이상 장착되어 있는 지그(Jig)(330)와; 상기 지그(330)를 홀딩(Holding)하고, 회전시키는 홀더(320)로 구성된다.Figure 4 is a schematic cross-sectional view for explaining the configuration of the apparatus for forming a coating film on a curved object in accordance with the present invention, the chamber 300 is provided with a gas supply pipe 310 for supplying a reaction gas; At least one gun 350 which is capable of emitting an electron beam and an ion beam and is located inside the chamber 300; A crucible 360 containing a deposition material and heated by an electron beam emitted from the gun 350 to evaporate the deposition material and to accelerate the vaporized deposition material by the ion beam; At least one object corresponding to the crucible 360 is disposed inside the chamber 300 and has a curved surface and a planar surface in which a deposition material reacted with a reaction gas supplied to the gas supply pipe is deposited to form a coating film. Jig 330; The jig 330 is configured to hold and rotate the holder 320.

이렇게 구성된 장치는, 상기 곡면을 갖는 대상물이 적어도 하나 이상이 장착되어 있는 지그(330)를 상기 챔버(300) 내의 홀더(320)로 홀딩시킨다.The device configured as described above holds the jig 330 in which at least one object having the curved surface is mounted to the holder 320 in the chamber 300.

이어서, 상기 홀더(320)를 회전시킨다.Then, the holder 320 is rotated.

이때, 상기 홀더(320)의 회전으로 상기 대상물(100)도 역시 회전된다.At this time, the object 100 is also rotated by the rotation of the holder 320.

연이어, 상기 건(350)에서 전자빔을 출사하여, 상기 도가니(360)를 가열시켜 상기 증착 물질을 증발시킨다.Subsequently, an electron beam is emitted from the gun 350 to heat the crucible 360 to evaporate the deposition material.

그 후, 상기 가스 공급관(310)으로 반응 가스를 공급하고, 상기 증발된 증착물질과 상기 반응 가스를 반응시킨다.Thereafter, a reaction gas is supplied to the gas supply pipe 310, and the evaporated deposition material and the reaction gas are reacted.

그 다음, 상기 건(350)에서 이온빔을 출사시켜, 상기 반응 가스와 반응된 증착 물질을 상기 대상물(100)에 증착시켜, 상기 대상물(100)에 코팅막을 형성하는 것이다.Next, an ion beam is emitted from the gun 350 to deposit a deposition material reacted with the reactant gas on the object 100 to form a coating film on the object 100.

여기서, 상기 코팅막을 형성하는 공정 중, 상기 챔버(300)는 진공 상태이다.Here, during the process of forming the coating film, the chamber 300 is in a vacuum state.

도 5는 본 발명에 따라 곡면을 갖는 대상물이 지그에 장착되어 있는 상태를 도시한 개략적인 단면도로서, 본 발명에 적용된 대상물(100)은 코팅막이 형성되는 반대면에 홈(120)이 형성되어 있고, 지그(330)에는 상기 대상물(100)의 홈(120)에 삽입되어 상기 대상물(100)이 지그(330)에 장착될 수 있는 돌출부(331)가 형성되어 있는 것이 바람직하다.5 is a schematic cross-sectional view showing a state in which an object having a curved surface is mounted on a jig according to the present invention, the object 100 applied to the present invention has a groove 120 formed on an opposite surface on which a coating film is formed. The jig 330 is preferably formed with a protrusion 331 inserted into the groove 120 of the object 100 to allow the object 100 to be mounted on the jig 330.

즉, 상기 지그(300)의 돌출부(331)가 상기 대상물(100)의 홈(120)에 삽입되어 상기 대상물(100)이 상기 지그(330)에 장착됨으로써, 상기 대상물(100)은 상기 지그(330) 표면으로부터 돌출되게 된다.That is, the protrusion 331 of the jig 300 is inserted into the groove 120 of the object 100 so that the object 100 is mounted on the jig 330, so that the object 100 is the jig ( 330 protrudes from the surface.

그러므로, 본 발명은 복수개의 대상물들을 지그에 장착하여, 한 번의 공정으 로 복수개의 대상물들에 코팅막을 형성할 수 있는 장점이 있다.Therefore, the present invention has the advantage of forming a coating film on the plurality of objects in a single process by mounting a plurality of objects in the jig.

또한, 본 발명은 대상물이 지그 표면으로부터 돌출되어 있기 때문에, 대상물의 평면(B) 뿐만 아니라, 곡면(A)에도 가속된 증착 물질이 잘 증착됨으로, 챔버 내에서 한 번의 공정으로 곡면을 포함한 대상물의 모든 증착 영역에 증착시킬 수 있는 장점이 있다.In addition, since the accelerated deposition material is well deposited on the curved surface A as well as the plane B of the object because the object protrudes from the surface of the jig, the object including the curved surface in one process in the chamber. There is an advantage that can be deposited in all deposition areas.

또한, 본 발명은 증착 효율도 증가된다.In addition, the present invention also increases the deposition efficiency.

도 6a 및 6b는 본 발명에 따라 일례의 대상물에 코팅막이 형성된 상태를 도시한 사진도로서, 먼저, 도 6a는 대상물이 휴대폰의 키패드인 경우, 키패드에 코팅막이 형성된 사진이다.6A and 6B are photographs showing a state in which a coating film is formed on an example object according to the present invention. First, FIG. 6A is a photograph in which a coating film is formed on a keypad when an object is a keypad of a mobile phone.

그리고, 도 6b는 대상물이 배터리 커버인 경우, 배터리 커버에 코팅막이 형성된 사진이다.6B is a photograph in which a coating film is formed on a battery cover when the object is a battery cover.

전술된 도 6a의 키패드 및 도 6b의 배터리 커버에는 코팅막이 잘 형성되어 있고, 그 코팅막은 착색이 잘되어 있음을 알 수 있다.It can be seen that the coating film is well formed on the keypad of FIG. 6A and the battery cover of FIG. 6B, and the coating film is well colored.

도 7은 본 발명에 따라 곡면을 갖는 대상물에 형성된 코팅막에 수막 또는 초발수층이 형성된 상태를 도시한 개략적인 단면도로서, 본 발명은 곡면을 갖는 대상물(100)에 형성된 코팅막(110)을 형성한 후, 상기 코팅막(110) 상부에 수막 또는 초발수층(150)을 더 형성하는 공정을 수행할 수도 있다.7 is a schematic cross-sectional view showing a state in which a water film or a super water-repellent layer is formed on a coating film formed on an object having a curved surface according to the present invention, and the present invention forms a coating film 110 formed on an object 100 having a curved surface. Thereafter, a process of further forming a water film or a super water-repellent layer 150 on the coating film 110 may be performed.

한편, 상기 대상물(100)이 휴대폰 케이스, 키패드 및 배터리 커버인 경우, 휴대폰 사용자의 지문이 상기 코팅막(100)에 접촉되어 지문으로 얼룩지게 된다.On the other hand, when the object 100 is a mobile phone case, keypad and battery cover, the fingerprint of the mobile phone user is in contact with the coating film 100 is stained with the fingerprint.

그러므로, 상기 수막 또는 초발수층(150)이 상기 코팅막(110) 상부에 형성되어 있으면, 사용자의 지문으로 오염되는 것을 방지하게 된다.Therefore, if the water film or super water-repellent layer 150 is formed on the coating film 110, it is prevented from being contaminated with the fingerprint of the user.

즉, 상기 수막 또는 초발수층(150)은 발수성을 증가시키고, 내오염성 및 내지문성을 강화할 수 있는 것이다.That is, the water film or super water-repellent layer 150 is to increase the water repellency, it is possible to enhance the stain resistance and fingerprint resistance.

한편, 상기 수막 또는 초발수층(150)은 상기 대상물(100)에 코팅막(110)을 형성한 후, 도 4의 장치 내에서 후속공정으로 형성하는 것이 바람직하다.On the other hand, the water film or super water-repellent layer 150 is preferably formed in a subsequent process in the apparatus of Figure 4 after the coating film 110 is formed on the object 100.

도 8은 본 발명에 따라 코팅막에 형성된 초발수층의 구조를 도시한 개념도로서, 전술된 바와 같이, 초발수층(150)은 코팅막 상부에 형성된다.8 is a conceptual view showing the structure of the super water-repellent layer formed on the coating film according to the present invention, as described above, the super water-repellent layer 150 is formed on the coating film.

이런 초발수층(150)의 표면은 카본 사슬을 포함한 무기입자로 이루어진 헤드(Head)(150)와 불소로 구성된 테일(Tail)(151)로 이루어지는 것이 바람직하다.The surface of the super water-repellent layer 150 is preferably made of a head (150) made of inorganic particles including carbon chains and a tail (151) made of fluorine.

즉, 카본 사슬을 포함한 무기입자로 이루어진 헤드(Head)(150)와 불소로 구성된 테일(Tail)(151)로 이루어진 초발수층(150)은 표면적을 줄일 수 있어, 잔긁힘에도 우수한 특성을 나타낼 수 있다.That is, the super water-repellent layer 150 made of a head (150) made of inorganic particles including carbon chains and a tail (151) made of fluorine can reduce the surface area, and thus exhibit excellent properties in residual scratches. Can be.

이상 상술한 바와 같이, 본 발명은 회전되는 대상물의 곡면 및 평면을 포함한 코팅 영역에 코팅막을 형성시킬 수 있는 효과가 있다. As described above, the present invention has the effect of forming a coating film on the coating area including the curved surface and the plane of the object to be rotated.

그리고, 본 발명은 증발된 증착 물질을 반응 가스와 반응시키고, 이 반응된 증착 물질을 가속시켜 대상물에 증착시킴으로써, 대상물에 증착된 코팅막이 소정의 색상을 갖게 할 수 있는 효과가 있다.In addition, the present invention reacts the vaporized evaporation material with a reaction gas, and accelerates the reacted evaporation material to be deposited on the object, whereby the coating film deposited on the object may have a predetermined color.

또한, 본 발명은 복수개의 대상물들을 지그에 장착하여, 한 번의 공정으로 복수개의 대상물들에 코팅막을 형성할 수 있는 효과가 있다.In addition, the present invention is equipped with a plurality of objects in the jig, there is an effect that can form a coating film on the plurality of objects in one process.

더불어, 본 발명은 대상물이 지그 표면으로부터 돌출시켜 코팅막을 형성함으로써, 대상물의 평면뿐만 아니라, 곡면에도 가속된 증착 물질을 잘 증착시킬 수 있는 효과가 있다.In addition, the present invention has the effect of being able to deposit the accelerated deposition material on the curved surface as well as the surface of the object by the object protruding from the jig surface to form a coating film.

게다가, 본 발명은 코팅막 상부에 수막 또는 초발수층을 형성함으로써, 발수성을 향상시키고, 내오염성 및 내지문성을 강화할 수 있는 효과가 있다.In addition, the present invention has an effect of improving the water repellency and strengthening the stain resistance and fingerprint resistance by forming a water film or a super water-repellent layer on the coating film.

본 발명은 구체적인 예에 대해서만 상세히 설명되었지만 본 발명의 기술사상 범위 내에서 다양한 변형 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 특허청구범위에 속함은 당연한 것이다.Although the invention has been described in detail only with respect to specific examples, it will be apparent to those skilled in the art that various modifications and variations are possible within the spirit of the invention, and such modifications and variations belong to the appended claims.

Claims (10)

반응 가스를 공급하기 위한 가스 공급관이 구비된 챔버와; A chamber provided with a gas supply pipe for supplying a reaction gas; 전자빔과 이온빔을 출사시킬 수 있으며, 상기 챔버 내측에 위치된 적어도 하나 이상의 건(Gun)과; At least one gun which is capable of emitting an electron beam and an ion beam and is located inside the chamber; 증착 물질이 담겨져 있고, 상기 건에서 출사된 전자빔에 의해 가열되어 상기 증착 물질이 증발되고, 상기 이온빔에 의해 상기 증발된 증착 물질이 가속되는 도가니와; A crucible containing a deposition material, heated by an electron beam emitted from the gun to evaporate the deposition material, and to accelerate the vaporized deposition material by the ion beam; 상기 도가니와 대응되어, 상기 챔버 내측에 위치되고, 상기 가스 공급관으로 공급된 반응 가스와 반응된 증착 물질이 증착되어 코팅막이 형성되는 곡면 및 평면을 갖는 대상물이 적어도 하나 이상 장착되어 있는 지그(Jig)와; A jig corresponding to the crucible, which is located inside the chamber and is equipped with at least one object having a curved surface and a plane on which a deposition material reacted with a reaction gas supplied to the gas supply pipe is deposited to form a coating film. Wow; 상기 지그를 홀딩(Holding) 및 회전시키는 홀더로 구성되며,It consists of a holder for holding and rotating the jig, 상기 대상물은 코팅막이 형성되는 반대면에 홈이 형성되어 있고, 상기 지그에는 상기 대상물의 홈에 삽입되어 상기 대상물이 지그에 장착될 수 있는 돌출부가 형성되어 있으며, 상기 대상물은 상기 지그의 표면으로부터 돌출되어 있는 것을 특징으로 하는 곡면을 갖는 대상물에 코팅막을 형성하는 장치.The object has a groove formed on an opposite surface on which a coating film is formed, and the jig has a protrusion formed in the groove of the object to mount the object to the jig, and the object protrudes from the surface of the jig. Apparatus for forming a coating film on the object having a curved surface characterized in that. 삭제delete 삭제delete 제 1 항에 있어서, The method of claim 1, 상기 대상물은,The object, 산업용 케이스 또는 산업용 부품인 것을 특징으로 하는 곡면을 갖는 대상물에 코팅막을 형성하는 장치.Apparatus for forming a coating film on the object having a curved surface, characterized in that the industrial case or industrial parts. 제 1 항에 있어서, The method of claim 1, 상기 대상물은,The object, 휴대폰 케이스, 키패드 또는 배터리 커버 중 하나인 것을 특징으로 하는 곡면을 갖는 대상물에 코팅막을 형성하는 장치.Apparatus for forming a coating film on the object having a curved surface, characterized in that the mobile phone case, keypad or one of the battery cover. 제 1 항에 있어서, The method of claim 1, 상기 증착 물질은,The deposition material, 금속이고, Metal, 상기 반응 가스는,The reaction gas, 상기 증착 물질과 반응할 수 있는 가스인 것을 특징으로 하는 곡면을 갖는 대상물에 코팅막을 형성하는 장치.Apparatus for forming a coating film on the object having a curved surface, characterized in that the gas that can react with the deposition material. 곡면을 갖는 대상물이 장착된 지그(Jig)를 챔버 내에 위치된 홀더에 홀딩시키는 단계와; Holding a jig on which an object having a curved surface is mounted to a holder located in the chamber; 상기 홀더를 회전시키는 단계와; Rotating the holder; 상기 챔버 내부에 있는 도가니의 증착 물질을 증발시키고, 상기 챔버에 반응 가스를 공급하여 상기 증발된 증착 물질을 반응시키는 단계와;Evaporating the deposition material of the crucible in the chamber and supplying a reaction gas to the chamber to react the evaporated deposition material; 상기 반응되어진 증착 물질을 가속시켜, 상기 회전되는 대상물의 곡면 및 평면에 증착하여 코팅막을 형성하는 단계로 이루어지며,Accelerating the reacted deposition material, and is formed on the curved surface and the plane of the rotating object to form a coating film, 상기 대상물은 코팅막이 형성되는 반대면에 홈이 형성되어 있고, 상기 지그에는 상기 대상물의 홈에 삽입되어 상기 대상물이 지그에 장착될 수 있는 돌출부가 형성되어 있으며, 상기 대상물은 상기 지그의 표면으로부터 돌출되어 있는 것을 특징으로 하는 곡면을 갖는 대상물에 코팅막을 형성하는 방법.The object has a groove formed on an opposite surface on which a coating film is formed, and the jig has a protrusion formed in the groove of the object to mount the object to the jig, and the object protrudes from the surface of the jig. The method of forming a coating film in the object which has a curved surface characterized by the above-mentioned. 제 7 항에 있어서, The method of claim 7, wherein 상기 증착 물질의 증발은 전자빔을 이용하고, Evaporation of the deposition material using an electron beam, 상기 반응되어진 증착 물질의 가속은 이온빔을 이용하는 것을 특징으로 하는 곡면을 갖는 대상물에 코팅막을 형성하는 방법.Acceleration of the reacted deposition material to form a coating film on the object having a curved surface, characterized in that using the ion beam. 제 7 항에 있어서, The method of claim 7, wherein 상기 홀더를 회전시키는 단계와 상기 챔버 내부에 있는 도가니의 증착 물질을 증발시키고, 상기 챔버에 반응 가스를 공급하여 상기 증발된 증착 물질을 반응시키는 단계 사이에,Between rotating the holder and evaporating the deposition material of the crucible in the chamber and supplying a reaction gas to the chamber to react the evaporated deposition material, 상기 대상물의 표면을 식각하는 단계를 더 구비되어 있는 것을 특징으로 하는 곡면을 갖는 대상물에 코팅막을 형성하는 방법.Etching the surface of the object further comprises the step of forming a coating film on the object having a curved surface, characterized in that it is further provided. 삭제delete
KR1020070040698A 2007-04-26 2007-04-26 Apparatus and method for forming coating layer on subject with curved surface KR100790409B1 (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08119642A (en) * 1994-10-20 1996-05-14 Canon Inc Mold for forming optical element and its production
JPH09217173A (en) * 1996-02-14 1997-08-19 Nissin Electric Co Ltd Substrate holder and method for mounting substrate
KR19990069603A (en) * 1998-02-11 1999-09-06 이윤복 Electromagnetic shielding multilayer metal thin film manufacturing apparatus using a barrel.
KR200315877Y1 (en) 2002-06-26 2003-06-12 유재원 Apparatus for Forming Metal Thin Film on a Ball-Shaped Substrate
KR20040083611A (en) * 2003-03-24 2004-10-06 주식회사 컴텍스 Chamber device used in sputtering system

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08119642A (en) * 1994-10-20 1996-05-14 Canon Inc Mold for forming optical element and its production
JPH09217173A (en) * 1996-02-14 1997-08-19 Nissin Electric Co Ltd Substrate holder and method for mounting substrate
KR19990069603A (en) * 1998-02-11 1999-09-06 이윤복 Electromagnetic shielding multilayer metal thin film manufacturing apparatus using a barrel.
KR200315877Y1 (en) 2002-06-26 2003-06-12 유재원 Apparatus for Forming Metal Thin Film on a Ball-Shaped Substrate
KR20040083611A (en) * 2003-03-24 2004-10-06 주식회사 컴텍스 Chamber device used in sputtering system

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