KR100785674B1 - 알킬할로실란의 직접 합성을 위한 구리, 인 및 알칼리 금속기재 촉매 조성물 - Google Patents
알킬할로실란의 직접 합성을 위한 구리, 인 및 알칼리 금속기재 촉매 조성물 Download PDFInfo
- Publication number
- KR100785674B1 KR100785674B1 KR1020057010391A KR20057010391A KR100785674B1 KR 100785674 B1 KR100785674 B1 KR 100785674B1 KR 1020057010391 A KR1020057010391 A KR 1020057010391A KR 20057010391 A KR20057010391 A KR 20057010391A KR 100785674 B1 KR100785674 B1 KR 100785674B1
- Authority
- KR
- South Korea
- Prior art keywords
- weight
- additive
- metal
- silicon
- phosphorus
- Prior art date
Links
- 239000010949 copper Substances 0.000 title claims abstract description 44
- 229910052802 copper Inorganic materials 0.000 title claims abstract description 30
- 229910052698 phosphorus Inorganic materials 0.000 title claims abstract description 29
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 239000011574 phosphorus Substances 0.000 title claims abstract description 28
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910052783 alkali metal Inorganic materials 0.000 title claims abstract description 21
- 150000001340 alkali metals Chemical class 0.000 title claims abstract description 21
- 239000000203 mixture Substances 0.000 title claims description 39
- 238000003786 synthesis reaction Methods 0.000 title claims description 20
- 230000015572 biosynthetic process Effects 0.000 title claims description 15
- 230000003197 catalytic effect Effects 0.000 title claims 2
- 239000010703 silicon Substances 0.000 claims abstract description 45
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 45
- 239000003054 catalyst Substances 0.000 claims abstract description 41
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910052718 tin Inorganic materials 0.000 claims abstract description 28
- 239000011701 zinc Substances 0.000 claims abstract description 27
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 23
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 claims abstract description 14
- 150000001350 alkyl halides Chemical class 0.000 claims abstract description 12
- 239000007787 solid Substances 0.000 claims abstract description 10
- 229910052792 caesium Inorganic materials 0.000 claims abstract description 9
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 9
- 229910052701 rubidium Inorganic materials 0.000 claims abstract description 9
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000011591 potassium Substances 0.000 claims abstract description 8
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 claims abstract description 8
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims abstract description 7
- 125000000217 alkyl group Chemical group 0.000 claims abstract 6
- 239000002184 metal Substances 0.000 claims description 50
- 229910052751 metal Inorganic materials 0.000 claims description 48
- 239000000654 additive Substances 0.000 claims description 44
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 41
- 230000000996 additive effect Effects 0.000 claims description 40
- 150000001875 compounds Chemical class 0.000 claims description 30
- 238000006243 chemical reaction Methods 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 23
- 230000003455 independent Effects 0.000 claims description 16
- AIYUHDOJVYHVIT-UHFFFAOYSA-M caesium chloride Chemical compound [Cl-].[Cs+] AIYUHDOJVYHVIT-UHFFFAOYSA-M 0.000 claims description 10
- 239000000571 coke Substances 0.000 claims description 10
- 229910021591 Copper(I) chloride Inorganic materials 0.000 claims description 8
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 claims description 8
- 229910000906 Bronze Inorganic materials 0.000 claims description 7
- 239000010974 bronze Substances 0.000 claims description 7
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 claims description 7
- 238000009472 formulation Methods 0.000 claims description 7
- -1 phosphorus compound Chemical class 0.000 claims description 7
- 150000003018 phosphorus compounds Chemical class 0.000 claims description 7
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 claims description 6
- FGDZQCVHDSGLHJ-UHFFFAOYSA-M rubidium chloride Chemical compound [Cl-].[Rb+] FGDZQCVHDSGLHJ-UHFFFAOYSA-M 0.000 claims description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 claims description 4
- RIRXDDRGHVUXNJ-UHFFFAOYSA-N [Cu].[P] Chemical compound [Cu].[P] RIRXDDRGHVUXNJ-UHFFFAOYSA-N 0.000 claims description 3
- 229940045803 cuprous chloride Drugs 0.000 claims description 3
- 239000001103 potassium chloride Substances 0.000 claims description 3
- 235000011164 potassium chloride Nutrition 0.000 claims description 3
- 229910001510 metal chloride Inorganic materials 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 claims description 2
- 229940102127 rubidium chloride Drugs 0.000 claims description 2
- 235000005074 zinc chloride Nutrition 0.000 claims description 2
- 239000011592 zinc chloride Substances 0.000 claims description 2
- 229910000881 Cu alloy Inorganic materials 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 3
- 239000011135 tin Substances 0.000 description 23
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 20
- 239000000047 product Substances 0.000 description 12
- 239000011521 glass Substances 0.000 description 11
- 229940050176 methyl chloride Drugs 0.000 description 11
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 10
- 229910052757 nitrogen Inorganic materials 0.000 description 10
- 229910000077 silane Inorganic materials 0.000 description 10
- 150000004756 silanes Chemical class 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 230000001737 promoting effect Effects 0.000 description 9
- 239000000843 powder Substances 0.000 description 7
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 229920000548 poly(silane) polymer Polymers 0.000 description 6
- 238000004817 gas chromatography Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 3
- 238000000197 pyrolysis Methods 0.000 description 3
- 150000003606 tin compounds Chemical class 0.000 description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical class [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910001096 P alloy Inorganic materials 0.000 description 2
- 150000001339 alkali metal compounds Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 230000000977 initiatory effect Effects 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 238000007086 side reaction Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 150000003752 zinc compounds Chemical class 0.000 description 2
- IHGSAQHSAGRWNI-UHFFFAOYSA-N 1-(4-bromophenyl)-2,2,2-trifluoroethanone Chemical compound FC(F)(F)C(=O)C1=CC=C(Br)C=C1 IHGSAQHSAGRWNI-UHFFFAOYSA-N 0.000 description 1
- PGYDGBCATBINCB-UHFFFAOYSA-N 4-diethoxyphosphoryl-n,n-dimethylaniline Chemical compound CCOP(=O)(OCC)C1=CC=C(N(C)C)C=C1 PGYDGBCATBINCB-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- NDMVTZBPNPKEEX-UHFFFAOYSA-N C[Si]([Si](Cl)(Cl)Cl)(C)C.[P] Chemical compound C[Si]([Si](Cl)(Cl)Cl)(C)C.[P] NDMVTZBPNPKEEX-UHFFFAOYSA-N 0.000 description 1
- 239000006009 Calcium phosphide Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 150000001495 arsenic compounds Chemical class 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- RFKZUAOAYVHBOY-UHFFFAOYSA-M copper(1+);acetate Chemical compound [Cu+].CC([O-])=O RFKZUAOAYVHBOY-UHFFFAOYSA-M 0.000 description 1
- HFDWIMBEIXDNQS-UHFFFAOYSA-L copper;diformate Chemical compound [Cu+2].[O-]C=O.[O-]C=O HFDWIMBEIXDNQS-UHFFFAOYSA-L 0.000 description 1
- 229940076286 cupric acetate Drugs 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 230000003631 expected effect Effects 0.000 description 1
- 229940093920 gynecological arsenic compound Drugs 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 238000001802 infusion Methods 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- VAKIVKMUBMZANL-UHFFFAOYSA-N iron phosphide Chemical compound P.[Fe].[Fe].[Fe] VAKIVKMUBMZANL-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- FBMUYWXYWIZLNE-UHFFFAOYSA-N nickel phosphide Chemical compound [Ni]=P#[Ni] FBMUYWXYWIZLNE-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- BSPSZRDIBCCYNN-UHFFFAOYSA-N phosphanylidynetin Chemical compound [Sn]#P BSPSZRDIBCCYNN-UHFFFAOYSA-N 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- PVGYYKBIUKOMTG-UHFFFAOYSA-N trichloro-[chloro(dimethyl)silyl]silane Chemical compound C[Si](C)(Cl)[Si](Cl)(Cl)Cl PVGYYKBIUKOMTG-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/06—Halogens; Compounds thereof
- B01J27/08—Halides
- B01J27/122—Halides of copper
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/80—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with zinc, cadmium or mercury
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/835—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with germanium, tin or lead
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/14—Phosphorus; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/16—Preparation thereof from silicon and halogenated hydrocarbons direct synthesis
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Catalysts (AREA)
Abstract
Description
Claims (20)
- 알킬 할라이드와 접촉체로 칭하는 고형체와의 반응에 의한 알킬할로실란의 제조방법의 실시에 적합한 촉매 시스템의 사용 방법으로, 상기 고형체는 규소 및 촉매 시스템으로 형성되고, 상기 촉매 시스템은 (α) 구리 금속 또는 구리계 화합물 및 (β) 촉진제 배합물을 포함하는, 알킬 할라이드와 접촉체로 칭하는 고형체와의 반응에 의한 알킬할로실란의 제조방법의 실시에 적합한 촉매 시스템의 사용 방법에 있어서,코크의 원치않는 생성을 감소시키면서 직접 합성의 수행을 가능케 하는 목적으로, 촉진제 배합물이 하기를 포함하는 것을 특징으로 하는 사용 방법:- 10 내지 500 ppm 의 주석, 주석계 화합물 및 이들 독립물의 혼합물로부터 선택된 첨가제 β1(포함된 규소의 중량에 대한 금속의 중량으로서 계산),- 0.01 내지 3% 의 아연 금속, 아연계 화합물 및 이들 독립물의 혼합물로부터 선택된 첨가제 β2(포함된 규소의 중량에 대한 금속의 중량으로서 계산), 및- 0.01 내지 2% 의 세슘, 칼륨 및 루비듐, 상기 알칼리 금속 기재의 화합물 및 이들 독립물의 혼합물으로부터 선택된 첨가제 β3(포함된 규소의 중량에 대한 금속의 중량으로서 계산).
- 제 1 항에 있어서, 첨가제 β1의 함량이 30 내지 300 ppm 범위에 있는 것을 특징으로 하는 사용 방법.
- 제 1 항 또는 제 2 항에 있어서, 첨가제 β1이 주석 금속인 것을 특징으로 하는 사용 방법.
- 제 3 항에 있어서, 주석 금속이 청동의 형태로 충전되는 것을 특징으로 하는 사용 방법.
- 제 1 항 또는 제 2 항 있어서, 첨가제 β2의 함량이 0.02 내지 0.5 %의 범위에 있는 것을 특징으로 하는 사용 방법.
- 제 1 항 또는 제 2 항에 있어서, 첨가제 β2가 아연 금속 및/또는 염화아연인 것을 특징으로 하는 사용 방법.
- 제 1 항 또는 제 2 항에 있어서, 첨가제 β3의 함량이 0.05 내지 1.0 %의 범위에 있는 것을 특징으로 하는 사용 방법.
- 제 1 항 또는 제 2 항에 있어서, 첨가제 β3이 염화세슘, 염화칼륨, 염화루비듐 및/또는 이들 화합물의 혼합물인 것을 특징으로 하는 사용 방법.
- 삭제
- 삭제
- 삭제
- 제 1 항 또는 제 2 항에 있어서, 촉매 시스템의 부분 (α)가 포함된 규소의 총 중량에 대하여 1 내지 20 중량% 함량으로 사용되는 것을 특징으로 하는 사용 방법.
- 제 1 항 또는 제 2 항에 있어서, 촉매 시스템의 부분 (α)가 구리 금속, 염화제1구리 및 상기 화합물의 혼합물로부터 선택되는 것을 특징으로 하는 사용 방법.
- 제 1 항 또는 제 2 항에 있어서, 직접 합성 반응이 280℃ 내지 400℃의 범위 내의 온도에서 수행되는 것을 특징으로 하는 사용 방법.
- (α) 구리 금속 또는 구리계 화합물 및 (β) 촉진제 배합물을 포함하는, 제 1 항 또는 제 2 항에 청구된 사용 방법의 내용 중에서 채용된 촉매 시스템으로서,촉진제 배합물이 하기를 포함하는 것을 특징으로 하는 촉매 시스템:- 10 내지 500 ppm 의 주석, 주석계 화합물 및 이들 독립물의 혼합물로부터 선택된 첨가제 β1(포함된 규소의 중량에 대한 금속의 중량으로서 계산),- 0.01 내지 3% 의 아연 금속, 아연계 화합물 및 이들 독립물의 혼합물로부터 선택된 첨가제 β2(포함된 규소의 중량에 대한 금속의 중량으로서 계산),- 0.01 내지 2% 의 세슘, 칼륨 및 루비듐, 상기 알칼리 금속 기재의 화합물 및 이들 독립물의 혼합물으로부터 선택된 첨가제 β3(포함된 규소의 중량에 대한 금속의 중량으로서 계산), 및- 50 내지 3000 ppm 의 인 원소, 인계 화합물 및 이들 독립물의 혼합물로부터 선택된 첨가제 β4(포함된 규소의 중량에 대한 인 원소의 중량으로서 계산).
- 알킬 할라이드와 접촉체로 칭하는 고형체와의 반응에 의한 알킬할로실란의 제조방법으로, 상기 고형체는 규소 및 촉매 시스템으로 형성되고, 상기 촉매 시스템은 (α) 구리 금속 또는 구리계 화합물 및 (β) 촉진제 배합물을 포함하는, 알킬 할라이드와 접촉체로 칭하는 고형체와의 반응에 의한 알킬할로실란의 제조방법에 있어서,촉진제 배합물 (β)가 하기를 포함하는 것을 특징으로 하는 제조방법:- 10 내지 500 ppm 의 주석, 주석계 화합물 및 이들 독립물의 혼합물로부터 선택된 첨가제 β1(포함된 규소의 중량에 대한 금속의 중량으로서 계산),- 0.01 내지 3% 의 아연 금속, 아연계 화합물 및 이들 독립물의 혼합물로부터 선택된 첨가제 β2(포함된 규소의 중량에 대한 금속의 중량으로서 계산),- 0.01 내지 2% 의 세슘, 칼륨 및 루비듐, 상기 알칼리 금속 기재의 화합물 및 이들 독립물의 혼합물로부터 선택된 첨가제 β3(포함된 규소의 중량에 대한 금속의 중량으로서 계산), 및- 50 내지 3000 ppm의 인 원소, 인계 화합물 및 이들 독립물의 혼합물로부터 선택된 첨가제 β4(포함된 규소의 중량에 대한 인 원소의 중량으로서 계산).
- 제 1 항에 있어서, 촉진제 배합물이 추가로 50 내지 3000 ppm 의 인 원소, 인계 화합물 및 이들 독립물의 혼합물로부터 선택된 첨가제 β4(포함된 규소의 중량에 대한 인 원소의 중량으로서 계산)를 포함하는 것을 특징으로 하는 사용 방법.
- 제 17 항에 있어서, 첨가제 β4의 함량이 80 내지 1500 ppm 범위에 있는 것을 특징으로 하는 사용 방법.
- 제 17 항에 있어서, 첨가제 β4가 인화구리 Cu3P 및/또는 구리-인 합금인 것을 특징으로 하는 사용 방법.
- 제 17 항에 있어서, 첨가제 β3 및 β4 의 양이, 그들중 하나를 사용할 때, 상기 β3 및 β4의 함량 범위 내에서 선택되어 하기의 비가 1 내지 20 으로 다양한 것을 특징으로 하는 사용 방법:[ (알칼리금속의 그램원자수) / (인원소의 그램원자수) ].
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0215532A FR2848124B1 (fr) | 2002-12-09 | 2002-12-09 | Utilisation d'une composition comprenant cuivre, metal alcalin et phosphore comme systeme catalytique pour conduire la synthese directe d'alkylhalogenosilanes en attenuant la formation de coke |
FR0215532 | 2002-12-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050085450A KR20050085450A (ko) | 2005-08-29 |
KR100785674B1 true KR100785674B1 (ko) | 2007-12-14 |
Family
ID=32320106
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020057010391A KR100785674B1 (ko) | 2002-12-09 | 2003-12-08 | 알킬할로실란의 직접 합성을 위한 구리, 인 및 알칼리 금속기재 촉매 조성물 |
Country Status (10)
Country | Link |
---|---|
US (1) | US7238638B2 (ko) |
EP (1) | EP1569945B1 (ko) |
JP (1) | JP4368806B2 (ko) |
KR (1) | KR100785674B1 (ko) |
CN (1) | CN100451020C (ko) |
AT (1) | ATE439364T1 (ko) |
AU (1) | AU2003296770A1 (ko) |
DE (1) | DE60328821D1 (ko) |
FR (1) | FR2848124B1 (ko) |
WO (1) | WO2004063206A1 (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2861728B1 (fr) * | 2003-11-05 | 2005-12-30 | Rhodia Chimie Sa | Procede de synthese directe d'alkylhalogenosilanes |
DE102005005052A1 (de) | 2005-02-03 | 2006-08-10 | Wacker Chemie Ag | Verfahren zur Herstellung von Methylchlorsilanen |
EP2826782A3 (en) | 2008-12-23 | 2015-04-08 | Dow Corning Corporation | Processes for producing organohalohydrosilanes |
WO2013093234A1 (fr) * | 2011-12-19 | 2013-06-27 | Bluestar Silicones France | Procede de synthese directe d'alkylhalogenosilanes |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2552438B1 (fr) * | 1983-09-28 | 1985-11-08 | Rhone Poulenc Spec Chim | Procede et catalyseur avec un alcalin comme additif pour la synthese directe du dimethyldichlorosilane |
FR2552437B1 (fr) * | 1983-09-28 | 1986-09-12 | Rhone Poulenc Spec Chim | Procede et catalyseur avec le cesium comme additif pour la synthese directe du dimethyldichlorosilane |
FR2577929B1 (fr) * | 1985-02-22 | 1987-06-05 | Rhone Poulenc Spec Chim | Procede et catalyseur avec le baryum et/ou le strontium comme additif pour la synthese directe du dimethyldichlorosilane |
US4762940A (en) * | 1987-12-11 | 1988-08-09 | Dow Corning Corporation | Method for preparation of alkylhalosilanes |
US4966986A (en) * | 1989-08-03 | 1990-10-30 | Dow Corning Corporation | Method for preparing organohalosilanes |
US4962220A (en) * | 1990-01-02 | 1990-10-09 | Dow Corning Corporation | Method for preparing organohalosilanes |
FR2665446B1 (fr) * | 1990-07-31 | 1992-11-27 | Rhone Poulenc Chimie | Procede et catalyseur comprenant un compose de lanthanide comme additif promoteur pour la synthese directe du dimethyldichlorosilane. |
US5312948A (en) * | 1993-10-08 | 1994-05-17 | Dow Corning Corporation | Particle size distribution for fluidized-bed process for making alkylhalosilanes |
US5596119A (en) * | 1995-12-05 | 1997-01-21 | Dow Corning Corporation | Method for controlling the direct process product distribution |
US6258970B1 (en) * | 1999-04-19 | 2001-07-10 | General Electric Company | Method for promoting dialkyldihalosilane formation during direct method alkylhalosilane production |
FR2800376B1 (fr) * | 1999-10-28 | 2003-04-18 | Rhodia Chimie Sa | Procede pour la production d'alkylhalogenosilanes |
US6423860B1 (en) * | 2000-09-05 | 2002-07-23 | General Electric Company | Method for promoting dialkyldihalosilane formation during direct method alkylhalosilane production |
JP4174654B2 (ja) * | 2002-04-19 | 2008-11-05 | 信越化学工業株式会社 | 有機ハロシランの製造方法 |
-
2002
- 2002-12-09 FR FR0215532A patent/FR2848124B1/fr not_active Expired - Fee Related
-
2003
- 2003-12-08 WO PCT/FR2003/003613 patent/WO2004063206A1/fr active Application Filing
- 2003-12-08 EP EP03815083A patent/EP1569945B1/fr not_active Expired - Lifetime
- 2003-12-08 JP JP2004566096A patent/JP4368806B2/ja not_active Expired - Lifetime
- 2003-12-08 CN CNB2003801084998A patent/CN100451020C/zh not_active Expired - Fee Related
- 2003-12-08 AU AU2003296770A patent/AU2003296770A1/en not_active Abandoned
- 2003-12-08 DE DE60328821T patent/DE60328821D1/de not_active Expired - Lifetime
- 2003-12-08 AT AT03815083T patent/ATE439364T1/de not_active IP Right Cessation
- 2003-12-08 KR KR1020057010391A patent/KR100785674B1/ko active IP Right Grant
-
2005
- 2005-06-09 US US11/148,323 patent/US7238638B2/en not_active Expired - Lifetime
Non-Patent Citations (1)
Title |
---|
대한민국 특허출원 10-2005-7010397호 |
Also Published As
Publication number | Publication date |
---|---|
US7238638B2 (en) | 2007-07-03 |
FR2848124A1 (fr) | 2004-06-11 |
ATE439364T1 (de) | 2009-08-15 |
AU2003296770A1 (en) | 2004-08-10 |
CN100451020C (zh) | 2009-01-14 |
EP1569945A1 (fr) | 2005-09-07 |
CN1735622A (zh) | 2006-02-15 |
JP2006509032A (ja) | 2006-03-16 |
FR2848124B1 (fr) | 2006-03-10 |
DE60328821D1 (de) | 2009-09-24 |
EP1569945B1 (fr) | 2009-08-12 |
US20050283017A1 (en) | 2005-12-22 |
JP4368806B2 (ja) | 2009-11-18 |
WO2004063206A1 (fr) | 2004-07-29 |
KR20050085450A (ko) | 2005-08-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4500724A (en) | Method for making alkylhalosilanes | |
US4864044A (en) | Tin containing activated silicon for the direct reaction | |
JPH0551596B2 (ko) | ||
FI77040C (fi) | Foerfarande foer direkt syntes av dimetyldiklorsilan. | |
US6528674B1 (en) | Method for preparing a contact mass | |
USRE33452E (en) | Method for making alkylhalosilanes | |
US8410297B2 (en) | Process for producing organohalohydrosilanes | |
US4684741A (en) | Selective production of dimethyldichlorosilane | |
KR101630552B1 (ko) | 알킬할로게노실란 직접 합성 방법 | |
JPH0138794B2 (ko) | ||
US7238638B2 (en) | Composite copper/tin/alkali metal catalysts for the direct synthesis of alkylhalosilanes | |
US7202192B2 (en) | Composite catalysts for the direct synthesis of alkylhalosilanes | |
JPH04288088A (ja) | 促進剤としてランタニド化合物を含む触媒を使用するジメチルジクロルシランの直接合成法 | |
JP4408293B2 (ja) | アルキルハロシランの直接合成方法 | |
KR19980042036A (ko) | 할로실란 알킬의 제조 방법 | |
JP2007510698A6 (ja) | アルキルハロシランの直接合成方法 | |
JP4407805B2 (ja) | オルガノハロシランの製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20121122 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20131119 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20141124 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20151118 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20161123 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20171117 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20181115 Year of fee payment: 12 |