KR100776370B1 - 소성로 - Google Patents
소성로 Download PDFInfo
- Publication number
- KR100776370B1 KR100776370B1 KR1020060054945A KR20060054945A KR100776370B1 KR 100776370 B1 KR100776370 B1 KR 100776370B1 KR 1020060054945 A KR1020060054945 A KR 1020060054945A KR 20060054945 A KR20060054945 A KR 20060054945A KR 100776370 B1 KR100776370 B1 KR 100776370B1
- Authority
- KR
- South Korea
- Prior art keywords
- silicon wafer
- chamber
- transfer
- bar
- transfer bar
- Prior art date
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
- F27B9/3077—Arrangements for treating electronic components, e.g. semiconductors
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/12—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/14—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment
- F27B9/20—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity characterised by the path of the charge during treatment; characterised by the means by which the charge is moved during treatment the charge moving in a substantially straight path tunnel furnace
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/30—Details, accessories, or equipment peculiar to furnaces of these types
- F27B9/36—Arrangements of heating devices
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/12—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
- F27B2009/124—Cooling
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B9/00—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity
- F27B9/12—Furnaces through which the charge is moved mechanically, e.g. of tunnel type; Similar furnaces in which the charge moves by gravity with special arrangements for preheating or cooling the charge
- F27B2009/124—Cooling
- F27B2009/126—Cooling involving the circulation of cooling gases, e.g. air
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Furnace Details (AREA)
- Tunnel Furnaces (AREA)
Abstract
Description
Claims (5)
- 실리콘 웨이퍼가 가열되도록 단열된 공간을 제공하는 챔버;상하운동 및 직선운동이 가능하도록 두개 이상 구비되는 이송바와, 그 일단과 타단이 상기 이송바와 연결되는 바와, 상기 이송바의 하측에 구비되며 상기 이송바가 직선운동할 수 있도록 LM가이드가 형성된 플레이트와, 상기 이송바의 하측에 구비되며 상기 이송바를 상하이동시키는 이송바업다운장치를 포함하며, 실리콘 웨이퍼를 상기 챔버 내로 이송시키는 이송용셔틀유닛;상기 챔버 내부에 구비되며, 실리콘 웨이퍼를 가열시키는 히터;상기 챔버의 일측에 구비되어, 상기 챔버 내부로 가스를 공급하는 급기장치;상기 챔버의 일측에 구비되어, 상기 챔버 내부에서 가스를 배출시키는 배기장치;상기 이송용셔틀유닛의 일측에 구비되어 상기 가열된 실리콘 웨이퍼에 바람을 공급하여 상기 실리콘 웨이퍼를 냉각시키는 냉각팬;상기 이송용셔틀유닛의 일측에 구비되며, 상기 가열된 실리콘 웨이퍼에 냉풍을 공급하여 상기 실리콘 웨이퍼를 냉각시키는 냉풍공급부를;포함하는 것을 특징으로 하는 소성로.
- 제 1항에 있어서,상기 바는 석영관 재질로 구비되어 상기 히터에서 발생된 복사열이 실리콘 웨이퍼에 전달될 수 있도록 하는 것을 특징으로 하는 소성로.
- 삭제
- 제 1항에 있어서,상기 챔버는 상기 실리콘 웨이퍼가 단계적으로 가열되도록 그 내부에 형성된 공간을 다수의 독립된 공간으로 나누는 다수의 세라믹보드를 구비하는 것을 특징으로 하는 소성로.
- 제 1항에 있어서,상기 히터는 탄소섬유히터, 근적외선히터, 할로겐히터로 이루어진 군에서 선택된 어느 하나인 것을 특징으로 하는 소성로.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060054945A KR100776370B1 (ko) | 2006-06-19 | 2006-06-19 | 소성로 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060054945A KR100776370B1 (ko) | 2006-06-19 | 2006-06-19 | 소성로 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100776370B1 true KR100776370B1 (ko) | 2007-11-15 |
Family
ID=39062024
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060054945A KR100776370B1 (ko) | 2006-06-19 | 2006-06-19 | 소성로 |
Country Status (1)
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KR (1) | KR100776370B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113883885A (zh) * | 2021-10-19 | 2022-01-04 | 上海隆誉微波设备有限公司 | 一种立式长方体连续式微波高温烧结冶炼装置及工艺方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06291125A (ja) * | 1993-03-31 | 1994-10-18 | Mitsubishi Materials Corp | 半導体ウェーハの熱処理装置 |
KR19980044511U (ko) * | 1996-12-26 | 1998-09-25 | 김영환 | 반도체 소자의 열처리 장치 |
KR19990037034U (ko) * | 1999-06-16 | 1999-10-05 | 강종수 | 크린컨베이어열경화건조로 |
KR20020018241A (ko) * | 2000-09-01 | 2002-03-08 | 이 창 세 | 반도체 웨이퍼의 국부 열처리 장치 |
KR20060045446A (ko) * | 2004-05-12 | 2006-05-17 | 주식회사 비아트론 | 반도체 소자의 열처리 시스템 |
-
2006
- 2006-06-19 KR KR1020060054945A patent/KR100776370B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06291125A (ja) * | 1993-03-31 | 1994-10-18 | Mitsubishi Materials Corp | 半導体ウェーハの熱処理装置 |
KR19980044511U (ko) * | 1996-12-26 | 1998-09-25 | 김영환 | 반도체 소자의 열처리 장치 |
KR19990037034U (ko) * | 1999-06-16 | 1999-10-05 | 강종수 | 크린컨베이어열경화건조로 |
KR20020018241A (ko) * | 2000-09-01 | 2002-03-08 | 이 창 세 | 반도체 웨이퍼의 국부 열처리 장치 |
KR20060045446A (ko) * | 2004-05-12 | 2006-05-17 | 주식회사 비아트론 | 반도체 소자의 열처리 시스템 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113883885A (zh) * | 2021-10-19 | 2022-01-04 | 上海隆誉微波设备有限公司 | 一种立式长方体连续式微波高温烧结冶炼装置及工艺方法 |
CN113883885B (zh) * | 2021-10-19 | 2023-10-20 | 上海隆誉微波设备有限公司 | 一种立式长方体连续式微波高温烧结冶炼装置及工艺方法 |
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