KR100727645B1 - 이온 플레이팅장치 - Google Patents
이온 플레이팅장치 Download PDFInfo
- Publication number
- KR100727645B1 KR100727645B1 KR1020050118433A KR20050118433A KR100727645B1 KR 100727645 B1 KR100727645 B1 KR 100727645B1 KR 1020050118433 A KR1020050118433 A KR 1020050118433A KR 20050118433 A KR20050118433 A KR 20050118433A KR 100727645 B1 KR100727645 B1 KR 100727645B1
- Authority
- KR
- South Korea
- Prior art keywords
- base material
- motor
- motor shaft
- negative voltage
- chamber
- Prior art date
Links
- 238000007733 ion plating Methods 0.000 title claims abstract description 18
- 239000000463 material Substances 0.000 claims abstract description 42
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 6
- 150000002500 ions Chemical class 0.000 claims abstract description 4
- 239000012212 insulator Substances 0.000 claims description 11
- 239000004809 Teflon Substances 0.000 claims description 4
- 229920006362 Teflon® Polymers 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 abstract description 4
- 238000000576 coating method Methods 0.000 abstract description 4
- 239000002184 metal Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16B—DEVICES FOR FASTENING OR SECURING CONSTRUCTIONAL ELEMENTS OR MACHINE PARTS TOGETHER, e.g. NAILS, BOLTS, CIRCLIPS, CLAMPS, CLIPS OR WEDGES; JOINTS OR JOINTING
- F16B35/00—Screw-bolts; Stay-bolts; Screw-threaded studs; Screws; Set screws
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (5)
- 진공 챔버 내부에 플라즈마 상태로 존재하는 금속 이온이 이온화 되어 모재의 표면에 코팅되도록 상기 모재에 마이너스 전압이 걸리도록 외부로부터 마이너스 전압이 인가되며, 상기 모재가 이동되도록 상기 모재가 거치되는 회전부를 가지는 지그와; 상기 챔버의 외측에 설치되어 상기 회전부를 구동시킬 수 있도록 원동기어가 고정되어 있는 모터; 및 상기 모터의 모터축과 상기 원동기어는 상기 지그로 인가된 마이너스 전압이 상기 모터축을 통하여 상기 챔버로 통전되지 않도록 일측은 상기 모터축에 고정되고 타측은 상기 원동기어에 고정되어 있는 절연부재로 이루어진 이온 플레이팅 장치에 있어서,상기 절연부재는 상기 모터축 및 상기 원동기어의 회전축에 각각 고정되어 있는 상부 및 하부 고정판과; 상기 상부 및 하부 고정판 사이에 개제되어 상기 모터축과 상기 회전축을 절연하는 절연체로 구성되어 있는 것을 특징으로 하는 이온 플레이팅장치.
- 삭제
- 제 1 항에 있어서,상기 상부 및 하부 고정판은 중앙부에 상기 모터축 및 상기 고정축이 삽입되어 고정되도록 플랜지가 외측으로 돌출되어 형성되어 있으며, 볼트가 관통되는 관통구멍이 다수 형성되어 있고,상기 절연체의 상면 및 하면에는 상기 상부 및 하부 고정판의 관통구멍과 정렬되며 상기 볼트가 체결되는 체결구멍이 각각 형성되어 있는 것을 특징으로 하는 이온 플레이팅장치.
- 제 3 항에 있어서,상기 절연체는 고온에서 잘 견딜 수 있는 내열성이 우수한 테프론에 의하여 제작되어 있는 것을 특징으로 하는 이온 플레이팅장치.
- 제 3 항에 있어서,상기 상부 및 하부 고정판은 스테인레스에 의하여 제작되어 있는 것을 특징으로 하는 이온 플레이팅장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050118433A KR100727645B1 (ko) | 2005-12-06 | 2005-12-06 | 이온 플레이팅장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050118433A KR100727645B1 (ko) | 2005-12-06 | 2005-12-06 | 이온 플레이팅장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070059513A KR20070059513A (ko) | 2007-06-12 |
KR100727645B1 true KR100727645B1 (ko) | 2007-06-13 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050118433A KR100727645B1 (ko) | 2005-12-06 | 2005-12-06 | 이온 플레이팅장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100727645B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022108156A1 (ko) * | 2020-11-20 | 2022-05-27 | 엘에스일렉트릭 (주) | 모터 조립체 및 이를 포함하는 회로 차단기 |
-
2005
- 2005-12-06 KR KR1020050118433A patent/KR100727645B1/ko active IP Right Grant
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2022108156A1 (ko) * | 2020-11-20 | 2022-05-27 | 엘에스일렉트릭 (주) | 모터 조립체 및 이를 포함하는 회로 차단기 |
KR20220069681A (ko) * | 2020-11-20 | 2022-05-27 | 엘에스일렉트릭(주) | 모터 조립체 및 이를 포함하는 회로 차단기 |
KR102547703B1 (ko) * | 2020-11-20 | 2023-06-26 | 엘에스일렉트릭(주) | 모터 조립체 및 이를 포함하는 회로 차단기 |
Also Published As
Publication number | Publication date |
---|---|
KR20070059513A (ko) | 2007-06-12 |
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