KR100713182B1 - Reflector manufacturing method and apparatus thereof - Google Patents

Abstract

The present invention provides an apparatus and a manufacturing method of a reflector capable of mass-producing a reflector having a low non-uniformity in quality efficiently and at low cost.

The inverted type (second inverted type) 23 may be formed of, for example, silicon rubber having a thickness of about 10 mm, and a plurality of fine convex portions are formed on one surface. The convex part is formed in the resist material 18 by pressing the convex part to the surface of the resist material 18 of the substrate material 19. Further, fine irregularities 28 having a surface roughness of several micrometers are formed on the back surface side of the inverted die 23. In addition, the reflector 23 is obtained by arranging a plurality of reflection molds 23 on one support plate and pressing the components on the substrate.

Description

REFLECTOR MANUFACTURING METHOD AND APPARATUS THEREOF

1 is a partial perspective view showing an example of a configuration of a reflector of one embodiment;

2 is a schematic cross-sectional view of the reflector shown in FIG. 1;

3 is a plan configuration diagram of a recess formed in the reflector shown in FIG. 1;

4 is a cross-sectional view along the line G-G shown in FIG. 3;

5 is a cross-sectional view showing an apparatus for manufacturing a reflector of the present invention;

6 is an external perspective view of the inverted type when viewed from the surface side;

7 is an external perspective view of the reverse type when viewed from the back side;

8 is an external perspective view of the pedestal when viewed from the back side;

9 is an external perspective view of the pedestal when viewed from the surface side;

10 is an enlarged cross-sectional view showing the vicinity of the boundary between the inverted type and the pedestal;

11 is a cross-sectional view showing one step of a method for manufacturing a reflector using the apparatus for manufacturing a reflector of the present invention;

12 is a cross-sectional view showing one step of a method for manufacturing a reflector using the apparatus for manufacturing a reflector of the present invention;

13 is a cross-sectional view showing a process of a method of manufacturing a reflector using the apparatus for manufacturing a reflector of the present invention;

14 is a cross-sectional view showing one step of a method for manufacturing a reflector using the apparatus for manufacturing a reflector of the present invention;

15 is an explanatory diagram showing a verification result of an apparatus for manufacturing a reflector of the present invention;

16 is a cross-sectional view showing one step in the method of manufacturing a reflector of the present invention;

17 is a cross-sectional view showing one step of the method of manufacturing a reflector of the present invention;

18 is a cross-sectional view showing one step in the method of manufacturing a reflector of the present invention;

19 is a cross-sectional view showing one step in the method of manufacturing a reflector of the present invention;

20 is a cross-sectional view showing one step in the method of manufacturing a reflector of the present invention;

21 is a sectional view showing one step in the method of manufacturing a reflector of the present invention;

Fig. 22 is a sectional view showing one step of the manufacturing method of the reflector of the present invention;

It is sectional drawing which shows one process of the manufacturing method of the reflector of this invention.

※ Explanation of symbols for main parts of drawing

10 reflector 11 substrate

12 reflecting film 13 recessed portion

16: resist layer 23: reflective

24: pedestal 25: convex

28: groove or irregularity 41: master type

46: first inverted type 51: replica type

56: second inversion

The present invention relates to an apparatus and a manufacturing method of a reflector comprising a substrate and a reflecting film on which a plurality of recesses are formed.

For example, in a portable electronic device such as a mobile phone or a portable game machine, since the battery driving time greatly affects the convenience in use, a reflective liquid crystal display device capable of suppressing power consumption is provided as a display unit. The reflection type liquid crystal display device has a reflection film for reflecting external light incident from the front surface thereof, and has a reflection film embedded between two substrates constituting the liquid crystal panel, or the back of a transmissive liquid crystal panel. It is known to provide a reflector provided with a semi-transmissive film on the side.

As a reflector for reflecting light, the reflector which formed the reflecting film into the surface of the board | substrate which provided many recessed parts in the surface is known. Such a reflector can obtain uniform reflected light without spots in the reflecting surface by the action of a plurality of recesses. The recess is preferably formed in a random shape in the reflecting surface to form uniform reflected light without spots.

As a formation method of the recessed part of such a reflector, the method described in following patent documents 1-3 is mentioned, for example. That is, a method of forming a plurality of fine recesses in the substrate constituting the reflector by sand blast using fine particles having a predetermined particle diameter, or forming a resist layer on the substrate constituting the reflector, the recess layer in the resist layer Background Art A method of forming a recess by photo lithography using a corresponding photo mask is known.

[Patent Document 1]

Japanese Patent Application Laid-Open No. 57-49983

[Patent Document 2]

Japanese Patent Laid-Open No. 6-82771

[Patent Document 3]

Japanese Patent Application Laid-Open No. 4-212931

Moreover, as a conventional manufacturing method of a reflector, the method described in following patent document 4 is mentioned, for example. That is, a master mold having a plurality of recesses serving as a base is formed, a plurality of inverted molds are molded from the master mold, and recesses are formed in a substrate such as a resin plate using the inverted mold. Then, after hardening a board | substrate, the method of obtaining a reflector by forming a reflecting film, such as aluminum, on the surface of the board | substrate with which the recess was formed is known.

[Patent Document 4]

Japanese Patent Application Laid-Open No. 2002-22913

However, in the method of forming the concave portion of the reflector as described above, it is difficult to manufacture a large number of reflectors in a large number of production lines because of the many processing steps and time. Moreover, in order to obtain a predetermined reflection angle, it is almost impossible to form the concave portion, in particular, its cross-sectional shape, by controlling the desired inclination, making it difficult to manufacture a reflector having high reflection characteristics.

In particular, in a practical use state of a portable device incorporating a liquid crystal display device, in order to achieve a desired reflection visual characteristic, in order to achieve a desired reflection visual characteristic, the reflection characteristic of the reflector is increased in a light receiving angle range that becomes asymmetrical (with respect to the normal reflection direction). It is necessary to precisely control the depth and shape of the micro-roughness, which is an element, and it is almost impossible to realize by the existing apparatus and method.

Moreover, in the manufacturing method of a reflector as described above, when a large number of reflectors are manufactured in a large number of production lines, it is necessary to mold a plurality of inverted molds from one master mold, and to form a plurality of inverted molds. The master mold is worn out in the process. If the master die is worn out, non-uniformity occurs in the shape of the inverted die obtained, resulting in a problem that a large number of reflectors cannot be manufactured with a certain quality. In addition, the use of the master type as a model of many inverted types causes damage or contamination to the master type due to a miss during operation, and as a result, it is impossible to produce in a mass production process that requires a large number of inverted types.

In particular, the master mold used for the production of the inverted die is made of a material that is harder than that on the surface of a plastically deformed member, for example, a metal, a hard polymer, or the like, such as cemented carbide, ceramic, diamond, or the like. The tip shape is repeatedly obtained by repeatedly pressing the indenter, which has a shape corresponding to the cross-sectional shape, depth, and pitch of the unevenness of the reflector to be obtained, to form a recess in the base material. It is expensive and it is virtually impossible to form a plurality of the same shape. For this reason, there has been a demand for a method of mass-producing a reflector with a certain quality by forming a large number of identical inverted types in which the cross-sectional shape, depth, pitch and the like are strictly controlled from each other.

Alternatively, in forming the first inverted mold from the above-described master mold, a method in which an epoxy resin, a urethane resin or the like is poured into the master mold, and a pattern is obtained to obtain the first inverted mold can also be considered. However, it is very difficult to release the cured resin from the master mold by pouring it into a master mold precisely formed of metal. In particular, the unevenness transferred from the master mold to the resin is very fine, about several micrometers, and when the resin adhered to the master mold is peeled off from the master mold, such fine unevenness is collapsed or the uneven shape is precisely transferred by the shrinkage of the resin. There is no fear. If the resin material remains in the master mold even at the time of peeling off of the resin, stains or scratches occur in the second inverted mold to be molded, and the master mold is no longer available.

In order to prevent shrinkage of resin and to transfer irregularities precisely, there is a method of kneading a filler called a filler in the resin, but in order to have the effect of preventing the shrinkage of the resin, it is necessary to incorporate about 20% of the filler fine powder in the resin by volume fraction. There is. In order to satisfy this volume fraction, a very large amount of fine powder is required, and enormous time and cost are required to uniformly knead the filler in the resin. In order to prevent the incorporation of dust into the mold to be molded, the operation in the clean room is essential, but as described above, a large amount of powder is likely to contaminate the process of the clean room, resulting in the generation of foreign matter in the process.

 This invention is made | formed in view of the said situation, and an object of this invention is to provide the reflector manufacturing apparatus and manufacturing method which can mass-produce a reflector with few nonuniformity in quality efficiently and at low cost.

In order to achieve the above object, according to the present invention, in the apparatus for manufacturing a reflector comprising a substrate having a plurality of recesses formed on one surface and a reflective film formed on one surface of the substrate, the convex of the shape in which the recesses are inverted There is provided an inverting type having a large number of portions formed on a surface thereof, and the inverting type is pressed against the substrate to form the recessed portion in the substrate.

The substrate may be provided with at least a photocurable or thermosetting resist layer on its surface. It is preferable that the said inversion type is formed of bendable resin, and the back surface side of the said inversion type is provided with the base which supports the said inversion type.

The inverted type is hermetically adhered to a circumferential edge with respect to the pedestal, and when pressing the inverted die on the substrate, a gas of a predetermined pressure is injected between the inverted die and the pedestal so that the surface of the inverted die is opened. It is preferable to make it expandable toward the said board | substrate. It is preferable that a means for preventing the inverted type and the pedestal from being in close contact is formed on at least one of the back surface of the inverted type or the surface side of the pedestal in contact with the inverted type.

In order to achieve the above object, according to the present invention, there is provided a method of manufacturing a reflector comprising a substrate having a plurality of recesses formed on one surface and a reflective film formed on one surface of the substrate. A first inverted mold is formed from a master mold having a plurality of irregularities modeled after the shape of the recess, and a replica type provided with a plurality of irregularities modeled after the master mold is formed from the first inverted mold. A plurality of second inverted dies are molded from a replica type, and a plurality of the second inverted dies are arranged on one support plate to mold-press the constituent material of the substrate, thereby obtaining the reflector. . The first inverted type and the second inverted type may each be formed of resin.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described with reference to drawings. First, an example of the reflector manufactured by the manufacturing apparatus of the reflector of this invention is demonstrated first. 1 is a partial perspective view showing an example of the configuration of a reflector, FIG. 2 is a schematic cross-sectional view of the reflector shown in FIG. 1, FIG. 3A is a plan configuration diagram of a recess formed in the reflector shown in FIG. 1, and FIG. 3B is shown in FIG. 3. It is a cross-sectional block diagram along the GG line shown.

As shown in FIG. 1, the reflector 10 is comprised by the board | substrate 11 and the reflecting film 12 of high reflectivity, such as Al and Ag, laminated | stacked on the one surface 11a of this board | substrate 11, and is comprised. . The substrate 11 is composed of a support layer 15 and a resist layer 16 formed on the support layer 15. The resist layer 16 provides the reflective film 12 with a predetermined surface shape, that is, a recess 12a in which the recess 13 of the resist layer 16 is modeled. 13) is installed.

Such concave portions are randomly controlled, for example, on a surface of a model material such as a plastically deformable metal or a resin, by controlling the depth and the pitch of a processing tool corresponding to the concave cross-sectional shape of the reflector intended for the tip shape thereof. It can form by pressurizing a lot and can also be formed using what reversed the mold for processing twice based on the obtained master (master).

The recessed portion 12a is formed in the reflective film 12 by the recessed portion 13, thereby giving the reflective film 12 uniform reflectivity without spots. The support layer 15 constituting such a substrate 11 may be made of, for example, a glass plate with SiO ₂ or a polymer film (PET, polycarbonate, acrylic, triacetyl cellulose, etc.), and the resist layer 16 What is necessary is just to consist of ultraviolet curable resin. The thickness of such a board | substrate 11 is preferable in it being the range of 5 to 1000 micrometers, for example.

The reflective film 12 may be formed by depositing a metal having high reflection characteristics such as Al or Ag on one surface 11a of the substrate, and the film thickness is preferably in the range of 0.05 to 0.3 µm, and 0.08 to 0.2. Particularly preferred is a range of μm. If the film thickness of the reflecting film 12 is less than 0.05 µm, the reflectance decreases, which is not preferable. If the thickness of the reflecting film 12 is more than 0.3 µm, the film forming cost is more than necessary, and the recess 12a given by the recess 13 is small. It is not preferable because it is lost.

The recessed part 13 is formed by heating type pressurization (so-called embossing) or heating type pressurization without using the inverted type described later in detail with respect to the resist layer 16 of the substrate 11. As shown in FIG. 1 and FIG. 2, the contours 13c of the recesses 13 are in contact with each other on the reflective film 12. The portions where the contours 13c are in contact with each other are formed in a sharp peak shape, and it is preferable from the characteristics of the reflection that the areas of the flat portions 13d between the recesses 13 are small. In other words, the portions in which the contours 13C are in contact with each other become a sharp peak shape, and are controlled so as to be higher in a desired viewing range in the predetermined reflection time characteristic imparted to the reflector by the cross-sectional inclination angle of the concave (or convex) portion. Such control of the cross-sectional shape cannot be realized by conventional processing methods such as sand blasting, photolithography using a plurality of gradation masks, or a combination thereof.

3, the inner surface of the recessed part 13 contains the 1st curved surface 13a and the 2nd curved surface 13b which are a part of two spherical surfaces respectively, for example, whose radius is different, and these curved surfaces The centers O1 and O2 of the 13a and 13b are arranged on the normal line of the deepest point O of the recess 13. The first curved surface 13a becomes part of the spherical surface of radius R1 centered on O1, and the second curved surface 13b is part of spherical surface of radius R2 centered on O2. And in the top view shown in FIG. 3A, the 1st curved surface 13a and the 2nd curved surface 13b are passed through the deepest point O of the recessed part 13, and in the vicinity of the straight line H orthogonal to a GG line. ) Is roughly divided. The depth of the recess 13 should just be formed about 0.3-2.0 micrometers, for example. Moreover, it is preferable that the adjacent recessed parts 13 are irregularly scattered by the pitch within the range of 1 micrometer or more and 30 micrometers or less.

By doing in this way, while suppressing generation | occurrence | production of unnecessary moiré (it arises by interference of these minute uneven | corrugated shapes of a reflector and the regularity of the electrode or a color filter pattern of a liquid crystal display element), or rainbow-shaped interference color, reflection visual characteristic is desired A reflector controlled to be high in the viewing range can be obtained.

FIG. 4 irradiates light to the reflector 10 having the above-described configuration from the right side of the drawing in FIG. 3 at an incident angle of 30 °, and the light-receiving angle is centered on 30 ° which is the direction of regular reflection with respect to the reflective surface. It is a graph which shows the result of measuring the reflectance (%) of the reflector 10 by shaking in the range of 30 degrees (0 degrees-60 degrees; 0 degrees correspond to the normal direction of one surface of a reflector).

As is apparent from the graph shown in FIG. 4, according to the reflector 10 having the above configuration, the inclination angle (for example, as shown in FIG. 3B) of the second curved surface 13b formed of a spherical surface having a relatively small radius is shown in cross section. Since the absolute value of the cross section obtained by dividing the micro-section into, for example, about 0.5 μm or less) is relatively large, the reflected light is scattered at a wide angle to obtain a high reflectance in a wide light receiving range of about 15 ° to 50 °. have. Moreover, since reflection in the 1st curved surface 13a which consists of a spherical surface with a relatively large radius produces reflection which scatters in a narrow range of a specific direction rather than the said 2nd curved surface 13b, the reflectance as a whole is 30 degree which is a specular reflection direction. It becomes the maximum at a smaller angle, and the reflectance in the vicinity of the peak also becomes high.

As a result, since the peak of the light incident on the reflector 10 and reflected is shifted toward the side closer to the normal direction of the reflector 10 than the normal reflection direction, the reflectance of the reflector 10 in the front direction can be increased. Therefore, when such a reflector 10 is applied to the reflective layer of the liquid crystal display device, the reflected luminance in the front direction of the liquid crystal display device can be improved, and the luminance in the observer direction of the liquid crystal display device can be increased. In the above example, the curved surface of the concave portion has been described as an example of spherical surface, but the same effect can be obtained even if the curved surface other than the spherical surface whose tilt angle is controlled.

Next, the manufacturing apparatus of the reflector of this invention is demonstrated. It is sectional drawing which shows a part (processing head part) of the type | mold press working machine (manufacturing apparatus of a reflector) used when manufacturing a reflector. The type pressurizing machine a substrate material 19 coated with a resist material 18 made of an ultraviolet-curing resin or the like onto the support layer 15 formed by such as SiO ₂ attached to a glass plate when manufacturing a reflector (10) by using 20 The substrate material 19 is set in the mold press working machine 20.

The die pressurizing machine 20 is a die press block 21 formed of an inverted die 23 and a base 24 made of metal (for example, made of SUS), and a base made of SUS on which the die press block 21 is installed. The plate 22 is provided. 6 is an external perspective view of the inverted die 23 viewed from the surface side. The inverted type 23 may be formed of a rubber elastic material having a thickness of about 10 mm, for example, nitrile, urethane, acrylic, fluorine, silicone, or the like appropriately selected, and has a number of fine convex portions 25 on the surface thereof. Is formed.

Properties required for various rubber elastomers include stability to a resist agent or a solvent thereof, or peelability with these material systems, small polymerization torsion, shape stability, durability or resilience to mechanical deformation, and the like. As satisfy | filling these requirements, a fluorine type or a silicone type etc. are preferable, and when a thing of rubber hardness 30-60 is chosen among these, a good result can be obtained. When the hardness is low, unevenness tends to occur at the time of peeling from the substrate surface immediately after pressure processing, which is not preferable. In addition, if the hardness is too hard, it is not preferable because the depth of the recessed portion to be pressurized is insufficient and the desired reflection characteristic is hardly obtained. Moreover, when hardening at the temperature of room temperature -50 degrees C or less, hardening distortion is small or it is preferable at the time of shaping | molding because it can reproduce faithfully the fine cross-sectional shape, depth, and pitch of a master type | mold (with 99% or more of dimensional precision).

The rubber thickness also depends on the length of the inverted type, but in the case of the inverted size of 40 to 100 mm, the rubber thickness is usually 6 mm to 15 mm. At 6 mm or less, excessive deformation tends to occur at the time of pressurization, so that the cross-sectional shape of the concave portion is deformed, or staining is likely to occur at the time of peeling from the substrate after pressure processing, and the durability of the mold is also reduced. On the other hand, in the case of 15 mm or more, the depth of the entire concave portion becomes shallow or tends to be particularly insufficient in pressure at the mold peripheral portion.

The convex portion 25 may be a shape in which the concave portion 13 formed in the reflector 10 is inverted, and the concave portion 25 is applied to the resist material 18 by pressing the surface of the resist material 18 of the substrate material 19. 13). In addition, it is preferable that the recessed part 13 arrange | positions the thing from which the diameter and depth of which planar shape or cross-sectional shape were controlled as mentioned above differs at random.

7 is an external perspective view of the inverted shape 23 viewed from the back side. On the back surface side of the inverted type 23, a fine unevenness 28 having a surface roughness of several micrometers, which is formed by a blast treatment or the like, is formed on approximately the entire surface of the inner surface of the inverted type except for the peripheral portion 27 bonded to the pedestal 24. It is. Such an uneven shape can be easily provided by forming the uneven shape on the molding master surface beforehand. In addition, the unevenness | corrugation 28 should just be formed centering on the part which contact | connects one end of the ventilation hole 34 shown in FIG.

In each of the peripheral portions 27 of the inverted type 23, the anti-sticking mark 29 is integrally formed. Such mark 29 plays a role of restricting the installation direction when installing the inverted type 23 with respect to the pedestal 24 which explains the structure in detail later. This identification mark is not limited to that shown in the figure, and may be an angle drop or a letter display.

8 is an external perspective view when the pedestal 24 is viewed from the back side. The pedestal 24 may be formed of, for example, stainless steel having a thickness of about 20 mm, and a portion 31 left for bonding the inverted die with a predetermined width is formed at the peripheral edge of one surface.

Moreover, the anti-sticking mark 42 is formed in one peripheral edge of the base 24, respectively. Such marks 42 are fitted to the marks 29 of the inverted shape 23 shown in FIG. 7, respectively. Since the marks 29 and 42 are formed only on one side of each of the inverted shape 23 and the pedestal 24, the directions in which the inverted shape 23 and the pedestal 24 can be installed are defined to one side. Since the concave portion 12a of the reflective film 12 controls the reflection direction with a constant regularity, light is controlled at a predetermined reflection angle by regulating the installation directions of the inverted type 23 and the pedestal 24 to one side. The reflecting body 10 which reflects can be manufactured. For this reason, it is important to prevent the mistake which makes the inverted type | mold 23 and the base 24 fit in the direction other than the direction prescribed | regulated at the time of manufacture of the mold | type press block 21.

9 is an external perspective view of the pedestal 24 when viewed from the surface side. In the center of the pedestal 24, a ventilation hole 34 penetrating from the upper surface 24a to the opposing surface (see Fig. 8) with the inverted shape 23 is formed. Moreover, the positioning hole 35 and the screw hole 36 are formed in the left and right of the ventilation hole 34, respectively.

Referring to FIG. 5 again, an adhesive layer 33 is formed between the peripheral portion 27 of the inverted type 23 and the portion 31 left for bonding. Such an adhesive layer 33 connects the inverted shape 23 and the pedestal 24 and maintains the gap between the inverted shape 23 and the opposing surface of the pedestal 24 in an airtight manner.

The base plate 22 may be formed of, for example, a metal plate having a thickness of about 20 mm. The base plate 22 is provided in a vertical movement mechanism (not shown) to move the mold pressing block 21 up and down. The base plate 22 may be provided with a plurality of mold pressing blocks 21, and the positioning protrusions 37 to be fitted to the positioning holes 35 of the pedestal 24 at the installation positions of the mold pressing blocks 21 respectively. Is installed to protrude. The mold pressing block 21 is positioned at a predetermined position of the base plate 22 by the fitting of the positioning holes 35 and the positioning projections 37.

A vent opening 38 is formed at the position where the base plate 22 corresponds to the vent hole 34 of the pedestal 24, and at the position corresponding to the screw hole 36 of the pedestal 24, a screw opening ( 39 are formed respectively. Then, by screwing the screw 41 into the screw hole 36 via the screw opening 39, the mold pressing block 21 is fixed to the base plate 22.

On the other hand, the air supply / exhaust pipe 42 extending from a compressor (not shown) is connected to the ventilation opening 38 when air is supplied, for example. From such an air supply and exhaust pipe 42, pressure-controlled air is sent when the mold pressing block 21 is pressed against the surface of the resist material 18 of the substrate material 19 to form a recess, and the vent hole 34 is provided. An air layer is formed between the inverted type 23 and the opposing surface of the pedestal 24 via. By forming the air layer in this manner, the inverted shape 23 made of rubber expands slightly around the center portion to remove the mold pressing block 21 from the substrate material 19, and thus the concave before curing formed on the surface of the resist material 18. Prevent negative mold collapse.

As shown in FIG. 10, when air is sent between the inverted shape 23 and the opposing surface of the pedestal 24, the inverted shape 23 is formed by the unevenness 28 formed on the inner surface of the inverted shape 23. The inner surface of the c) is prevented from coming into close contact with the opposite surface of the pedestal 24 so that the air is uniformly and quickly spread throughout the inverted inner surface voids to form an air layer. Thereby, processing control at the time of pressurization can be performed stably.

Therefore, the degree of swelling of the inverted type is important and also depends on the size of the inverted type. For example, in the inverted type having a length of 40 to 100 mm, the radius of curvature is about 3 m to 10 m. (The dimension of the swelling content corresponding to these curvatures corresponds to 0.1 mm to 1.7 mm in the case of the inverted dimension described above, but usually good results are obtained at 0.3 mm to 1 mm.) m or more), close to the plate pressurization, the depth of the recess is insufficient, and the characteristics as a reflector deteriorate. If the depth of the recess is to be secured, the pressurization mechanism becomes large, and the apparatus cost also increases. Moreover, at the time of peeling from the board | substrate after a pressurization process, a nonuniform peeling stain also arises easily. On the other hand, when the radius of curvature is small (less than 3 m), the depth of the concave portion processed into the center portion and the periphery of the inverted shape is changed, which causes staining of reflection characteristics. In addition, the stress on the inverted type is increased, so the durability of the inverted type is likely to be lowered.

Next, the process of forming a recessed part in the surface of a resist material is demonstrated in detail about the action | action of the manufacturing apparatus of the reflector of this invention. In manufacturing the reflector 10 shown in FIG. 1, the board | substrate material 46 provided with the support layer 15 by which the resist material 45 was laminated | stacked on the surface as shown in FIG. Set.

The die pressing machine 20 lowers the die pressing block 21 supported by the base plate 22 at the time of die pressing, and simultaneously pressurizes the air controlled by the compressor or the like to the vent hole 34 of the pedestal 24. Send it. Then, as shown in FIG. 12, air spreads quickly between the inverted type 23 and the opposing surface of the base 24, and the air layer 51 is formed. The air layer 51 expands the inverted shape 23 formed of the rubber material in the direction of the substrate material 46 so as to incline gently from the center toward the circumferential edge.

The inverted mold 23 is pressed against the resist material 45 of the substrate material 46 by the drop of the mold pressing block 21, but at this time, the inverted mold 23 is gently expanded from the center toward the circumferential edge. 12, the inverted type 23 is pressed against the resist material 45 while discharging air between the resist material 45 to the circumferential edge. In this way, if the inverted die 23 is expanded, and then pressurized to the resist material 45, the air curled between the inverted die 23 and the resist material 45 can be almost eliminated.

Since the degree of expansion of the inverted type and its speed also greatly influence the planar or cross-sectional shape of the unevenness, not only the reflection time characteristic of the resultant reflector is changed, but also unevenness of the in-plane reflection characteristic occurs and staining occurs. Such partial staining is very easy to detect with the naked eye because the highly reflective metal is laminated so that the reflectivity of the reflector is increased.

And, as shown in FIG. 13, when the inversion type 23 is fully pressurized by the resist material 45, the air layer 51 will become a flat layer by pressurization, and the surface of the inversion type 23 will also become a substantially flat shape. . As a result, the resist material 45 is formed with a large number of recessed portions 13 in which the convex portions 25 are inverted, in which a desired cross-sectional shape is maintained.

Subsequently, as shown in FIG. 14, when the mold pressing block 21 rises, as the pressing force applied to the air layer 51 is gradually lowered, the inverted mold 23 slowly expands from the center toward the peripheral edge again, Away from material 46. In this way, by removing the inverted mold 23 from the substrate material 46 while expanding the inverted mold 23, the inverted mold is gradually removed from the pressurized center toward the periphery. Prevents traces from leaving

As the speed at this time, 5 mm / sec or less is set. More than that, stains and peeling traces are likely to remain (but if the speed is too slow, the processing time is increased, so that it is usually 0.1 mm / sec or more). The resist material 45 of the substrate material 46 is formed with a fine recess 13 in which the convex portion 25 of the inverted type 23 is inverted faithfully.

As described above, the present invention is to give a model a processing apparatus capable of forming a stable and uniform over a large area faithfully a large number of concave portions formed by controlling the cross-sectional shape, depth, pitch of each one. In particular, the greatest feature is that the cross-sectional shape of the concave portion designed to have the desired reflective characteristic can be processed while controlling the one concave portion. In the method of forming a diffusion surface which is well known in the art, for example, sand blasting, photolithography, or a combination thereof, any one of the cross-sectional shapes of the concave portion (or convex portion), in particular, the concave portion (or convex portion) Since the sloping angle of the top (or bottom part) of the slack is caused, it is most often the reflection characteristic of the broad Gaussian distribution type.

Subsequently, ultraviolet rays or the like are irradiated to the substrate material 946 on which the recesses 13 are formed to cure the resist material 45, and when aluminum or the like is formed again, the fine recesses (as shown in FIG. The reflector 10 in which the 13 is formed can be obtained.

Next, the manufacturing method of the reflector of this invention is demonstrated in detail centering on the manufacturing process of an inverted type | mold. In manufacturing a reflector, as shown in FIG. 6, the master type | mold 41 which becomes circular is manufactured. The master die 41 is prepared by polishing a surface of a plastically deformable metal, such as an aluminum plate, to a level that is sufficiently harder than the material to be plastically deformed, for example, cemented carbide, silicon carbide, or the like. The recessed part which controlled the position, depth, pitch, etc. on the surface of the metal plate by moving the process jig | tool 43 provided with the indenter 42 which consists of diamond etc. at the front end, controlling the position, while angled to the said metal plate. (Concave-convex) 44 is formed in many numbers. It is also possible to use hard plastic instead of metal. In this case, of course, the indenter 42 may be made of a material that is more flexible than cemented carbide.

In the manufacture of such a master die 41, the external shape of the diamond indenter 42 may be made the same as the design size of the recess 13 (see FIG. 1) of the reflector 10 for the purpose of manufacture. Moreover, it is preferable to form the recessed part 44 of the master die 41 so that regularity may not generate | occur | produce in a random pitch. For this reason, the movement of the metal plate and the processing jig 43 may be performed at random. In the master die 41, about 17 million recesses 44 may be formed on a 50 × 50 mm surface, for example. For the shanghai east of the processing jig 43, for example, a hollow cabinet equipped with a hollow mechanism using a solenoid or a piezo element may be used.

As shown in FIG. 17, the 1st inversion type | mold 46 is formed using the master type | mold 41 next. The first inverted die 46 may be formed by injecting a rubber elastic body appropriately selected from a moldable material such as nitrile, urethane, acryl, fluorine, silicon, or the like into the master die 41. Thereby, in the 1st inversion type | mold 46, the convex part 47 which inverted the recessed part 44 of the master type | mold 41 was formed. Then, as shown in FIG. 18, the resin shape | molded from the master mold 41 was mold-released, and the 1st reverse mold | type 46 can be obtained.

The replica 51 is formed using the 1st inversion type 46 obtained in this way, as shown in FIG. The replica type 51 consists of the support body 53 which laminated | stacked the resist layer 52 on the surface, and many recessed part (unevenness | corrugation) 54 is formed in the resist layer 52. As shown in FIG. Such replica type 51 presses the first inverted mold 46 to the resist layer 52 to form a recessed portion (concave-convex) 54, and then, as shown in FIG. The replica mold 51 formed before the curing was released and the resist layer 52 having the recess 54 formed thereon was cured with ultraviolet rays or the like to obtain the replica mold 51. Thereby, the recessed part 54 in which the convex part 47 of the 1st inversion type | mold 46 was inverted was formed in the resist layer 52, and the recessed part 54 of the master type 41 shown in FIG. The recess 44 has the same shape in cross-sectional shape, depth, and pitch.

By using the replica 51 obtained in this way, as shown in FIG. 21, many 2nd inversion types 56 are formed. In the production of the second inverted die 56, a silicone resin may be formed by injection into the replica 51, for example. Thereby, the 2nd inversion type | mold 56 is provided with many convex parts 57 in which the recessed part 54 of the replica type | mold was reversed. In this case, the molding surface may be formed such that a surface having a surface roughness of about several micrometers is formed on the side opposite to the surface on which the convex portion 57 of the second inverted die 56 is formed.

The 2nd inversion type | mold 56 obtained in this way is provided in the base 24 shown in FIG. 5 which created separately, and the mold pressing block 21 is completed. As shown in Fig. 23, a plurality of such mold pressing blocks 2 are arranged on the base plate 22 of the mold pressing machine 20, and a plurality of mold pressing blocks 2 are provided with respect to the resist layer 16 of the reflector 10 shown in Fig. 1. Can be formed by pressing the concave portion 13 by one pressing operation.

As described above, in the manufacturing method of the reflector 100 according to the present invention, a circular master type is obtained in order to obtain the second inverted type 56 which forms the recess 13 with respect to the resist layer 16 of the reflector 10. 41, a first inverted type 46 is formed, and the first inverted type 46 is used to form a duplicate type 51, and this duplicated type 51 is used to form a plurality of second inverted types ( 56)

Thereby, when forming the recessed part 13 collectively with respect to the resist layer 16 of the several reflector 10, it becomes unnecessary to form the inverted type many times directly using the master type | mold 41. As shown in FIG. Therefore, it is not necessary to manufacture a large number of master dies 41, which require time and cost to manufacture, and also prevents abrasion of the master dies 41, which is difficult to form a plurality of identical dies in any of cross-sectional shapes, depths, and pitches. do. It is possible to mass-produce the reflector 10 at low cost with a certain quality.

(Example 1)

The effect of the manufacturing apparatus of the present invention was verified. In the verification, as shown in FIG. 12, after the air is sent from the vent hole 34 of the pedestal 24 and the silicone rubber inverted die 23 having a thickness of about 10 mm is expanded about 0.5 mm, the mold pressing block ( 21) was lowered and the inverted mold 23 was brought into contact with the resist material 45 at a slow speed of about 0.5 mm / sec, and then a load was gradually applied. As shown in FIG. 13, the inverted mold 23 was pressed against the resist material 45 at a unit area load of 0.8 kg / cm 2 for 50 seconds. Thereafter, the mold pressing block 21 was raised to the same speed as above, and the inverted mold 23 was removed from the resist material 45. At this time, as shown in FIG. 14, the inversion type 23 was removed from the peripheral edge part of the resist material 45. As shown in FIG. Thus, as shown in FIG. 15, transfer unevenness was hardly seen in the resist material 45 which provided the recessed part 13 obtained in this way, and the uniform process surface was obtained.

After the substrate was treated under a predetermined heating condition (240 ° C. for about 1 hour), an alumina film was deposited at about 1500 GPa to form a reflector substrate, and then a CF (color filter) layer was formed again to prepare an STN panel.

The obtained STN panel exhibited uniform high reflectivity (reflectance of 40%) on the entire panel, and at the same time, the maximum reflectance was obtained within 10 to 20 degrees from the panel normal as shown in FIG. 4.

(Example 2)

Using the same apparatus as above, the inverted die's falling speed when contacting the substrate was changed to a range of 0.1 to 0.5 mm / sec, but good results were obtained. Moreover, when the STN panel was produced and the panel characteristic was evaluated similarly to Example 1, the favorable result was similarly obtained. These results are shown in Table 1.

Speed, mm / s Surface appearance of resist after processing 0.1 ◎, no stain. 0.20 ◎, no stain. 0.30 ◎, almost no dirt. 0.50 ○, very slight stains. (Slightly streaked stains when irradiated with strong light obliquely to the substrate)

(Example 3)

Micro uneven | corrugated process was performed using the above apparatus which set the silicone rubber inversion type which changed the thickness as shown in Table 2. In any case, good results were obtained, but particularly good results were obtained at 8 mm to 12 m.

Reflective thickness (mm) Surface appearance of resist after processing 6 △, when the number of times of pressurization increases (more than 200 times), random minor staining occurs. 8 ◎, good, no stain. 10 ◎, good, no stain. 12 ◎, Good, but there is a part where the reflective characteristic is slightly changed in the substantial part of the outer peripheral part of the mold. 14 (Triangle | delta), The part with which a reflective characteristic changes in the substantial part of a mold outer peripheral part exists. The stain is noticeable.

(Comparative Example 1)

In the inverted type having the same dimensions as in Example 1, the recess was pressed to the resist material by using a mold whose center portion was made of silicon which was previously expanded about 60 µm with respect to the peripheral portion. The conditions of the falling-pressing-increasing of the inversion type at this time were the same as that of Example 1. Slightly linear unevenness occurred in the central portion of the obtained processed surface. In addition, a number of faintly irregular radial spots were generated at the periphery.

The uneven surface thus obtained was heat-cured under a predetermined heating condition (240 deg. X about 1 hour), and then an alumina film was deposited at about 1500 Pa to form a reflector substrate. When the STN panel was produced using this, in the initial state without voltage application, linear unevenness was remarkably seen in the central portion and the peripheral portion of the panel surface.

(Comparative Example 2)

In Comparative Example 1, the amount of expansion of the center portion of the inverted type was changed to 10 µm, 30 µm, 100 µm, or 20 µm, but in all cases, linear irregularities occurred after the pressurization, resulting in a significant damage to the appearance.

(Comparative Example 3)

In the inverted die having the same dimensions as in Example 1, the recess was pressed against the resist material by using a mold made of silicon whose central portion was not expanded. The conditions of the falling-pressing-increasing of the inversion type at this time were the same as that of Example 1. The small point (about 300 micrometers in diameter) without surface diffusivity generate | occur | produced in the substantially center part of the obtained processing surface.

The uneven surface thus obtained was heat-cured under a predetermined heating condition (240 deg. X about 1 hour), and then an alumina film was deposited at about 1500 Pa to form a reflector substrate. When the STN panel was manufactured using this, in the initial state without voltage application, many bright spots were observed in the center part in the panel surface.

(Comparative Example 4)

About the same board | substrate as Example 1, the glass sphere of 33 micrometers of average particle diameters was ejected by compressed air, and the random and fine recessed parts of average diameter 6-9 micrometers and depth 0.15-0.4 micrometer were obtained. Moreover, the cross-sectional shape of this recessed part was that the uneven | corrugated curve was connected smoothly.

Then, after wash | cleaning this board | substrate, the alumina film of thickness about 1500 kPa was formed into a film, and the reflector was obtained. The reflecting property of this reflector had a maximum value of the reflected luminance in the substrate normal direction, and the brightness was insufficient (reflectivity of 20% or less). Moreover, when this reflector was assembled and observed in the STN panel similarly to Example 1, the brightness of the panel was dark within 20 degrees before and behind from the panel normal line, and the visibility was bad.

The effect of the manufacturing apparatus of the reflector of this invention was confirmed by the Example mentioned above. In these embodiments, the example applied to the STN type reflective display is given, but it is clear that the apparatus of the present invention can be applied to various modes other than STN. For example, it is a phase transition type of cholesteric liquid crystal, a polymer network type element, etc., such as TN, OCB, VA, and IPS which drive active elements, such as TFT. In addition to the reflection type, a predetermined opening may be applied to the transflective display element formed in the reflective film.

(Example 4)

The effect of the production method of the present invention was verified. In verification, as shown in FIG. 23, the thing which arrange | positioned the processing jig which consists of a plurality (40) pedestal 24 and the inversion type 21 to the base plate 22 was prepared.

The fine concavo-convex of the inverted type faithfully reproduced the surface shape of the master type (concave portion depth 0.4 to 2 µm, pitch 3 to 30 µ) with an accuracy of 90% or more. Using this, the resultant was pressed on a surface of a resist material (not shown) coated with a thickness of 3.5 占 퐉 on a 0.55 mm glass substrate.

At this time, air is sent from the vent hole 34 of the pedestal 24 to expand the silicone rubber inverting type 23 having a thickness of about 10 mm by about 0.1 mm, and then the mold pressing block 21 is lowered, and the inverting type 23 is provided. Was brought into contact with the resist material 45 at a slow speed of about 0.3 mm / sec, and then a load was gradually applied. And the inversion type 23 was pressed to the resist material for 50 second by the unit area load of 0.8 kg / cm <2>. Thereafter, the mold pressing block 21 was raised to the same speed as above, and the inverted mold 23 was removed from the resist material. In the resist material which formed the recessed part 13 obtained in this way, transfer unevenness was hardly seen, and the uniform process surface was obtained.

After the substrate was treated under a predetermined heating condition (240 ° C. for about 1 hour), an alumina film was deposited at about 1500 Å to become a reflector substrate (a characteristic of the reflector substrate alone, which is close to the designed reflection visual characteristic). After the (color filter) layer was formed, an STN panel was produced.

The obtained STN panel showed uniform high reflectivity (reflectance of 40%) on the entire panel, and as shown in FIG. 4, the maximum reflectance was obtained within 10 to 20 degrees from the panel normal.

Moreover, in the range of 15 degrees to 40 degrees, the brightness of the panel was good in practical use.

(Comparative Example 1)

About the same board | substrate as Example 4, the glass sphere of 33 micrometers of average particle diameters was blown out by compressed air, and the random and fine recessed parts of average diameter 6-9 micrometers and depth 0.15-0.4 micrometers were obtained. Moreover, the cross-sectional shape of this recessed part was that the uneven | corrugated curve was connected smoothly.

Then, after wash | cleaning this board | substrate, the alumina film of thickness about 1500 kPa was formed into a film, and the reflector was obtained.

The reflecting property of this reflector had a maximum value of reflectance in the direction of the substrate normal, and lacked brightness (reflectivity of 20% or less). Moreover, when this reflector was assembled and observed in STN panel similarly to Example 1, the panel brightness was dark within 20 degrees back and front from the panel normal, and the visibility was bad.

According to the manufacturing apparatus of the reflector of the present invention, since the concave portion is formed by pressing the substrate under a predetermined inversion pressure condition by using an inverted type having a large number of convex portions formed on the surface by inverting the concave portion, irregularities in quality are caused. It is possible to provide an apparatus for manufacturing a reflector capable of mass production of such a small reflector efficiently and at low cost.

In addition, when pressurizing the inverted die to the substrate, transfer unevenness or peeling is performed on the substrate on which the recess is formed by injecting a gas controlled at a predetermined pressure between the inverted die and the pedestal and expanding the inverted surface toward the substrate. It is possible to prevent the trace from remaining and to obtain a precise concave portion in which the inverted convex portions are faithfully inverted.

In addition, according to the method for manufacturing a reflector of the present invention, in order to obtain a second inverted form for forming a recessed portion with respect to the substrate of the reflector, a circular recess obtained by randomly forming a large number of minute recesses by controlling their cross-sectional shape, depth and pitch is A first inverted form can be formed from the master form, and the first inverted form can be used to form a replica form, and a plurality of second inverted forms can be obtained using this replica form.

This eliminates the necessity of forming the inverted type directly many times using the master type when forming the concave portions collectively with respect to the substrates of the plurality of reflectors. Therefore, it is not necessary to manufacture a large number of master molds that require time and cost in production, and wear of the master mold, which makes it difficult to form a plurality of the same type, is also prevented. It is possible to mass produce a reflector whose ripples, cross-sectional shape, depth, pitch, etc. are strictly controlled with a constant quality at low cost.

Claims (9)

In the manufacturing apparatus of the reflector which comprises the board | substrate with many recessed parts in one surface, and the reflecting film formed into one surface of this board | substrate, And a concave portion having a large number of convex portions formed on the surface thereof by inverting the concave portion, wherein the concave portion is pressed against the substrate to form the concave portion on the substrate. The method of claim 1, The said board | substrate is equipped with the photocurable or thermosetting resist layer at least on the surface, The manufacturing apparatus of the reflector characterized by the above-mentioned. The method of claim 1, The inverting type is formed of a bendable resin, and at the back side of the inverting type is provided with a pedestal for supporting the inverting type. The method of claim 3, wherein The inverted type is hermetically bonded to the periphery with respect to the pedestal, and when the inverted type is pressed against the substrate, a gas of a predetermined pressure is injected between the inverted type and the pedestal so that the surface of the inverted type is lifted. An apparatus for manufacturing a reflector, wherein the reflector is capable of expanding toward a substrate. The method according to claim 3 or 4, The reflector manufacturing apparatus of the said inverted type | mold is formed in the back surface of the said inverted type | mold, and the means which prevents contact | adherence of the said base. The method of claim 5, The apparatus for manufacturing a reflector, wherein the adhesion preventing means is a plurality of microgrooves formed on at least one of the rear surface of the inverted type or the surface side of the pedestal in contact with the inverted type. The method of claim 5, The apparatus for manufacturing a reflector, wherein the adhesion preventing means is an uneven rough surface formed on at least one of the rear surface of the inverted type or the surface side of the pedestal in contact with the inverted type. In the manufacturing method of the reflector which comprises the board | substrate with many recessed parts in one surface, and the reflecting film formed into one surface of this board | substrate, In forming the concave portion, a first inverted mold is formed from a master mold having a plurality of irregularities modeled after the shape of the recessed portion, and a replica type having a plurality of irregularities modeled after the master mold is formed from the first inverted mold. Shaping, forming a plurality of second inverted dies from the replica type, arranging a plurality of second inverted dies on one support plate, and pressing the component material of the substrate to obtain the reflector. Way. The method of claim 8, The said 1st inversion type and the 2nd inversion type are each formed from resin, The manufacturing method of the reflector characterized by the above-mentioned.

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