KR100708323B1 - Mask apparatus and controlling method thereof - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mask device for chucking a mask and applying a tensile force to the mask in the manufacturing process of a semiconductor device and a display device, and a control method thereof. The mask device comprises a mask sheet; A mask frame for supporting the mask sheet under the mask sheet; A plurality of chucking and tension applying devices for chucking the mask sheet with a resin chuck and applying tension to the mask sheet in an X-axis direction and a Y-axis direction; A movable base plate; Freely installed between the movable base plate and the chucking and tension applying device to freely move the chucking and tension applying device in the X and Y axis directions while tension is generated by the chucking and tension applying device. A moving table; And a push bracket installed between the mask frame and the mask frame to apply a repulsive force acting in the opposite direction of the tension to the mask frame while tension is applied to the mask sheet.

Mask, tension, free move table, push bracket

Description

Mask Apparatus and Controlling Method

1 is a view schematically showing a conventional mask device.

2 is a plan view from above of a mask device according to an embodiment of the present invention;

Figure 3 is a side view as viewed from the side of the mask device according to an embodiment of the present invention.

4 is a plan view and a side view showing a mask sheet, a reference pattern sheet, and a mask frame.

5 illustrates the ideal alignment of the mask pattern and the reference pattern.

6 is a cross-sectional view showing in detail the chucking and tension applying device shown in FIGS.

7 is a flowchart showing step by step a control procedure of the mask apparatus according to the embodiment of the present invention.

8 is a diagram showing the operation of a three-position pneumatic cylinder and a free movement table in stages.

<Description of Symbols for Main Parts of Drawings>

10: tension device 12: chucking device

13, 100: mask sheet 14, 15, 16: tension direction

17: rotation direction 18, 100a: mask pattern

19, 110: mask frame 201: metal chuck base

202: resin chuck 203: pneumatic cylinder for chucking

204: lever 205: chuck base plate

206: tension drive source 207a, 207b, 207c: free movement table

208: Push Bracket 209: LM Guide

210: spring block 211: movable base plate

200, 200 (+ X), 200 (-X), 200 (+ Y), 200 (-Y): Chucking and tensioning device

300 (+ X), 300 (-X), 300 (+ Y), 300 (-Y): 3 position pneumatic cylinder

410: alignment camera 420: laser exit machine

500: reference pattern alignment device 501: mask frame support device

600: reference pattern up / down device 800: control device

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mask device, comprising: a mask device for chucking a mask required for a deposition process such as a sputtering process and an evaporation process in a manufacturing process of a semiconductor device and a display device and applying a tensile force to the mask; The control method is related.

Conventional mask apparatuses used in the manufacturing process of semiconductor devices and display devices include a mask sheet having a transmissive pattern corresponding to a thin film pattern formed on a substrate, a mask frame for supporting the mask sheet, and a mask sheet applied thereto and a tensile force applied thereto. And a chucking and tensioning device for stretching the mask sheet in various directions, a welding device for welding the stretched mask sheet to the mask frame, and the like.

In the conventional mask device, as shown in FIG. 1, the mask sheet 13 is welded to the chucking device 12 or the surface of the mask sheet 13 is scratched and deformed in order to apply tension to the mask sheet 13. After fixing the chucking device 12 to the chucking device 12, the tension device 10 in the horizontal direction and the tension device 13 in the vertical direction are driven to the horizontal direction 15 and the vertical direction 14 of the mask sheet 13. At the same time the tension is applied to stretch the mask sheet 13 in four directions.

 However, in the conventional mask device, first, the surface of the mask sheet 13 is damaged or deformed by welding or scratching and deformation processing which is performed to fix the mask sheet 13 to the chucking device 12, and the mask pattern 18. Second, the transverse tension device 10 does not correspond to the longitudinal elongation change 15, and the longitudinal tension device 20 does not correspond to the elongation change 14 in the horizontal direction. The problem that the tension direction 16 is rotated 17 due to the influence of the tension acting in the other direction. Third, after the mask sheet 13 and the mask frame 19 are welded, the tension applied to the mask sheet 13 is released. Since the direction and magnitude of the force are different between the restoring force of the mask sheet 13 due to the tension applied to the mask sheet 13 and the repulsive force of the mask frame 19, the mask sheet 13 and the mask frame 19 are deformed or Position It occurs, and there is a problem such that the deformation of the mask pattern 18 is generated.

Deformation of the mask frame 19 and mask pattern 18 by the restoring force by the tension applied to the mask sheet 13 when removing the tension applied to the mask sheet 13 after the mask sheet 13 and the mask frame are attached. In order to solve the problem of deformation of), a method of increasing the rigidity of the mask frame 19 is used. In order to increase the rigidity of the mask frame 19, the mask frame 19 may be increased to increase the thickness and width of the mask frame 19 so that the mask frame 19 can sufficiently cope with the restoring force of the mask sheet 13. Design. However, even if the thickness and width of the mask frame 19 is increased, the micro deformation due to the tension applied to the mask sheet 13 cannot be prevented, and the heavy load design of the device that fixes or moves the mask by increasing the weight of the mask is prevented. This lowers the precision in the alignment of the mask and the substrate to be deposited.

Accordingly, the present invention has been made to solve the problems of the prior art, and an object of the present invention is to prevent damage to the mask sheet during mask chucking and without affecting the tensile force in other directions when applying the tensile force to the mask in various directions. The present invention provides a mask device and a method of controlling the same to apply a tensile force to the mask and to prevent deformation of the mask sheet, the mask frame and the mask pattern.

In order to achieve the above object, the mask device according to the present invention comprises a mask sheet; A mask frame for supporting the mask sheet under the mask sheet; A plurality of chucking and tension applying devices for chucking the mask sheet with a resin chuck and applying tension to the mask sheet in an X-axis direction and a Y-axis direction; A movable base plate; Freely installed between the movable base plate and the chucking and tension applying device to freely move the chucking and tension applying device in the X and Y axis directions while tension is generated by the chucking and tension applying device. A moving table; And a push bracket installed between the mask frame and the mask frame to apply the opposite reaction force to the mask frame generated by the tension while the tension is applied to the mask sheet.

The plurality of chucking and tension applying devices include a plurality of first chucking and tension applying devices for chucking the mask sheet with a first resin chuck and applying tension to the mask sheet in a + X axis direction; A plurality of second chucking and tension applying devices for chucking the mask sheet with a second resin chuck and applying tension to the mask sheet in the -X axis direction; A plurality of third chucking and tension applying devices for chucking the mask sheet with a third resin chuck and applying tension to the mask sheet in the + Y axis direction; And a plurality of fourth chucking and tension applying devices for chucking the mask sheet with a fourth resin chuck and applying tension to the mask sheet in the -Y axis direction.

Each of the chucking and tension applying devices may include a chucking base plate installed with a metal chuck, a chucking pneumatic cylinder installed on the chuck base plate through a hinge point formed on a protrusion protruding from one side of the chuck base plate, and the chucking pneumatic cylinder. A lever and a movable base plate rotatably installed between the hinge point positioned at the rod end and the hinge point positioned on the chuck base plate, and the resin chuck mounted to rotate according to the rod extension and compression of the chucking pneumatic cylinder. A tension drive source for advancing and retracting the chuck base plate, and between a fixed base plate and the movable base plate, an LM guide for guiding the movement of the movable base plate, and installed at a lower end of the movable base plate. Long holes are formed It has a spring block in which a pring is inserted.

The free moving table is a guide rail installed on the movable base plate, a first slide slidably installed between the guide rail and the chuck base plate to enable movement in the X- and Y-axis directions of the chuck base plate; And a second slider, a long hole formed in common in the sliders and the guide rail, and a lock mounted in the long hole.

The mask device is commonly inserted into the holes of the plurality of spring blocks respectively installed in the plurality of chucking and tension applying devices; A three position pneumatic cylinder for advancing and retracting the bar; A reference pattern corresponding to the mask pattern formed on the mask sheet; A welder for welding the mask sheet and the mask frame; A camera for photographing the alignment of the mask pattern and the reference pattern; And a control device for controlling the chucking and tension applying device, the three-position pneumatic cylinder, the lifting and lowering of the lock, and analyzing the image photographed by the camera.

The control method of the mask device chucks the mask sheet with the resin chuck of the chucking and tension applying device and applies tension to the mask sheet in the X-axis direction and the Y-axis direction, and simultaneously between the mask frame and the mask frame. Applying a repulsive force acting in the opposite direction of the tension to the mask frame by using a push bracket installed; Freeing the X-axis and Y-axis movement of the chucking and tension applying device by using a free movement table installed under the chucking and tension applying device while the tension applied to the mask sheet.

Hereinafter, exemplary embodiments of the present invention will be described with reference to FIGS. 2 to 8.

2 to 5, the mask device according to the embodiment of the present invention is a chucking and tension applying device (200 (+ X), 200 (-X), 200 (+ Y), 200 (-Y)), 3 position pneumatic cylinder (300 (+ X), 300 (-X), 300 (+ Y), 300 (-Y)), alignment camera 410, laser exit machine 420, reference pattern alignment device 500 ), A reference pattern up / down device 600, and a control device 800.

The chucking and tension applying devices 200 (+ X), 200 (-X), 200 (+ Y), and 200 (-Y) are installed on the base plate 701 so that they can be moved back and forth on the mask sheet 100 in the principle of leverage. When chucking and applying tension to the mask sheet 100, the free movement table is slid to the extension of the mask sheet 100 due to the tension acting in the other direction. This free movement table prevents rotation of the chucking and tension application device 200 (+ X), 200 (-X), 200 (+ Y), 200 (-Y) and the mask sheet 100. In addition, the chucking and tension applying devices 200 (+ X), 200 (-X), 200 (+ Y), and 200 (-Y) are applied in the tension direction by the tension while applying tension to the mask sheet 100. Repulsive force is applied to the mask frame 110 in the opposite direction to balance the restoring force of the mask sheet 100 and the restoring force of the mask frame 110 after welding the mask sheet 100 and the mask frame 110. 100, the deformation of the mask frame 110 and the mask pattern 100a is prevented. The chucking and tension applying devices 200 (+ X), 200 (-X), 200 (+ Y), and 200 (-Y) apply a tension to the mask sheet 100 in the + X direction and simultaneously the mask frame. A plurality of first chucking and tension applying devices 200 (+ X) for applying a repulsive force to the + X direction to the 110 and the mask frame 110 while simultaneously applying tension to the mask sheet 100 in the -X direction. ) And a plurality of second chucking and tension applying devices 200 (-X) for applying the repulsive force in the -X direction to the mask frame 100 while simultaneously applying tension in the + Y direction to the mask sheet 100. A plurality of third chucking and tension applying devices 200 (+ Y) for applying the repulsive force in the + Y direction and the mask sheet 100 while applying tension in the -Y direction to the mask frame 110. And a plurality of fourth chucking and tensioning devices 200 (-Y) for applying a repulsive force in the Y direction. Detailed configuration description of the chucking and tension applying device 200 (+ X), 200 (-X), 200 (+ Y), and 200 (-Y) will be described later with reference to FIG. These chucking and tensioning devices 200 (+ X), 200 (-X), 200 (+ Y), 200 (-Y) are controlled by the control device 800.

The three-position pneumatic cylinder 300 (+ X), 300 (-X), 300 (+ Y), 300 (-Y) is a reference position before the mask sheet 100 is chucked under the control of the control device 800. Place the chucking and tensioning device 200 (+ X), 200 (-X), 200 (+ Y), 200 (-Y) in the loading position before chucking, and then apply chucking and tensioning to the chucking position of the mask sheet. Advance device 200 (+ X), 200 (-X), 200 (+ Y), 200 (-Y), and then chuck and tension application device immediately before applying tension with mask sheet 100 chucked Power generated to retract (200 (+ X), 200 (-X), 200 (+ Y), 200 (-Y)) to the neutral position where no force is applied to the mask frame 110 is generated. These three-position pneumatic cylinders 300 (+ X), 300 (-X), 300 (+ Y), 300 (-Y) penetrate a plurality of first chucking and tensioning devices 200 (+ X). Two first three-position pneumatic cylinders for connecting the rods on both sides of the bar 301 (+ X) to advance the plurality of first chucking and tensioning devices 200 (+ X) along the X-axis direction. (300 (+ X)) and the first three-position pneumatic cylinder (300 (+ X)) complementary to the bar 301 penetrating through a plurality of second chucking and tension application device 200 (-X) (-X)) its rods are connected to two second three-position pneumatic cylinders 300 (for moving the second chucking and tensioning device 200 (-X) along the X axis direction. -X)) and its rods are connected to both sides of the plurality of third chucking and tension applying devices 200 (+ Y) to allow the plurality of third chucking and tensions to be applied. Two third three-position pneumatic cylinders 300 (+ Y) for advancing and retracting the device 200 (+ Y) along the Y-axis direction, Complementary with the third three-position pneumatic cylinder (300 (+ Y)) to the two sides of the bar (301 (-Y)) through the plurality of fourth chucking and tension application device (200 (-Y)) The rod of is connected to include a fourth fourth position pneumatic cylinder 300 (-Y) for advancing the plurality of fourth chucking and tension application device 200 (-Y) along the Y-axis direction.

The alignment camera 410 photographs the mask pattern 100a formed on the mask sheet 100 and the reference pattern 120a formed on the reference pattern sheet 120 as shown in FIGS. 4 and 5. And the alignment state of the reference pattern 120a is transmitted to the control device 700.

When the alignment of the mask pattern 100a and the reference pattern 120a is ideal as shown in FIG. 5, the laser emitter 420 is driven under the control of the control device 800 to direct the laser beam to the mask sheet 100 and the mask frame ( The mask sheet 100 is laser-welded onto the mask frame 110 by irradiating to 110.

The alignment camera 410 and the laser emitter 420 are installed in the lifting device 706 controlled by the control device 800, and the lifting device 706 is controlled by the control device 800. It is provided in the XY robot 705 which transfers the lifting device 706 in two axial directions. Accordingly, the alignment camera 410 and the laser emitter 420 may move to any point on the XY plane above the mask sheet 100 and move up and down in the Z axis direction.

The first and second supporters 702 for supporting the XY robot 705 at a predetermined height between the XY robot 705 and the base plate 701 for transporting the alignment camera 410 and the laser emitter 420. 703 is installed.

The control device 800 is a chucking and tension application device 200 (+ X), 200 (-X), 200 (+ Y), 200 (-Y), 3-position pneumatic cylinder 300 (+ X), 300 ( -X), 300 (+ Y), 300 (-Y)), camera 410 for alignment, laser emitter 420, reference pattern aligner 500, reference pattern up / down device 600 and operation A display device (not shown) for displaying a situation or an image captured by the alignment camera 410 is controlled. The control device 800 includes a microcomputer for executing an operation program, a memory, a user interface device that enables input of user commands or user data, and the like.

The reference pattern aligning device 500 positions the reference pattern 120a under the mask frame 110 and the mask sheet 100 under the control of the control device 800, and the reference pattern in the X-axis, Y-axis direction, and θ direction. Finely adjust 120a on the plane. The reference pattern up / down device 600 lifts the reference pattern aligning device 500 under the control of the control device 800 to finely adjust the distance between the reference pattern 120a and the mask sheet 100 in the Z-axis direction. As a result, the focal length of the alignment camera 410 is optimally maintained.

4 and 5 illustrate ideal alignment between the mask pattern 100a and the reference pattern 120a. The reference pattern sheet 120 on which the reference pattern 120a is formed is installed in the reference pattern aligning device 500 at the bottom of the mask frame 110.

6 shows an enlarged view of the chucking and tensioning device 200.

Referring to FIG. 6, the chucking and tension applying device 200 includes a chuck base plate 205 on which a metal chuck base 201 is installed, a lever 204 on which a resin chuck 202 is mounted, and a pneumatic cylinder for chucking ( 203, tension drive source 206, free movement tables 207a, 207b, 207c, push bracket 208, tension drive source 206, free movement tables 207a, 207b, 207c and push bracket 208 are installed. A movable base plate 211, a spring block 210 provided at the lower end of the movable base plate 211, and an LM guide 209 provided on the base plate 701 are provided.

The resin chuck 202 is made of synthetic or natural rubber or resin material having a soft and high surface friction coefficient to press the mask sheet 100 onto the metal chuck base 201 by the rotation of the lever 204. By the resin chuck 202, the mask sheet 100 is pressed between the resin chuck 202 and the metal chuck base 201 without being scratched or deformed.

The lever 204 rotates clockwise when the rod 203a of the chucking pneumatic cylinder 203 is extended when the mask sheet 100 is chucked to lower the resin chuck 202 and release the tension of the mask sheet 100. After the rod 203a of the chucking pneumatic cylinder 203 is compressed, the resin chuck 202 is raised by rotating counterclockwise. The lever 204 is positioned at the end of the coupler connected to the rod 203a of the chucking pneumatic cylinder 203 of the first hinge shaft 204a, and the second hinge shaft 204b is provided with a metal chuck base 201. Positioned on the chuck base plate 205.

The push bracket 208 is made of a metal or nonmetal having elasticity. This push bracket 208 is fixed on the movable base plate 211 and its upper end is located between the end of the chuck base plate 205 and the mask frame 101 so that tension is applied to the mask sheet 100. Due to the repulsive force of the mechanism to act as a tension acting on the mask sheet 100 serves to apply a repulsive force to the mask frame 101 in the direction opposite to the tension direction. As the tension is applied to the mask sheet 100 by the push bracket 208, a preload is applied to the mask frame 101 in the opposite direction to balance the force acting on the mask sheet 100 and the mask frame 101. As a result, deformation of the mask sheet 100 and the mask frame 101 does not occur when the tension on the mask sheet 100 is removed after welding the mask sheet 100 and the mask frame 101.

The chucking pneumatic cylinder 203 extends its rod 203a during chucking of the mask sheet 100 under the control of the controller 800, while the rod 203a is released after the tension of the mask sheet 100 is released. ) The chucking pneumatic cylinder 203 is formed on the movable base plate 211 by a first hinge axis formed between the rod opposite end 203b of the rod side connected to it and the projection 205a of the movable base plate 211. It is rotatably provided, and is rotatably installed by the 2nd hinge shaft formed between the rod 203a and the upper end of the lever 204.

The tension drive source 206 is implemented as a servo motor or pneumatic cylinder to extend its rod 206a upon chucking of the mask sheet 100 under the control of the controller 800, while tension is applied to the mask sheet 100. Compresses its rod 206a. The rod 206a of this tension drive source 206 is connected to the movable base plate 211. Accordingly, when the rod 206a of the tension drive source 206 is extended and compressed, the mask chucking device including the movable base plate 211, the chucking pneumatic cylinder 203, the lever 204, the metal chuck base 201, and the like is provided. It moves in conjunction with the rod 206a. The tension drive source 206 has an advantage in designing the position of the point to apply the tension to each of the chucking and tension applying device 200 and the quantity of the chucking and tension applying device 200 in an appropriate amount. to provide.

A long hole is formed in the spring block 210, and the bar 301 and the spring are inserted into the long hole. The spring block 210 is fixed to the lower end of the movable base plate 205 and is separated from the base plate 701 so that the movable base moves in the direction of movement when the bar 301 is moved by the driving of the 3-position pneumatic cylinder 300. The plate 211 and the mechanisms installed thereon are moved.

The free moving tables 207a, 207b, and 207c are guide rails 207a fixed in the Y-axis (or X-axis) direction on the movable base plate 211 so as to be movable in the Y-axis (or X-axis) direction. The first slider 207b fastened to 207a and the first slider 207b fasten to the X-axis direction and include a second slider 207c fixed to the lower end of the chuck base plate 205. In addition, the free moving tables 207a, 207b, and 207c flow in the long holes 207d and the long holes 207d formed through the guide rails 207a, the first and second sliders 207b, and 207c as shown in FIG. And a lock 207e that is possibly installed. The lock 207e is elevated by the air pressure injected under the control of the control device 800 to restrain or release the first and second sliders 207b and 207c. The free moving tables 207a, 207b, and 207c have a shape in which two LM guides orthogonal to each other are coupled to each other so that when the tension is applied to the mask sheet 100 in the X-axis and Y-axis directions, the X-axis and the Y-axis By moving freely in the direction by the amount of elongation generated by the tension in the other direction so that the tension direction does not rotate due to the tension in the other direction.

The LM guide 209 is a three-position pneumatic cylinder including a guide rail installed on the base plate, a slider mounted on the guide rail so as to be movable in the X-axis (or Y-axis) direction and fixed to the lower end of the movable base plate 211. When the bar 201 is moved by (300 (+ X), 300 (-X), 300 (+ Y), 300 (-Y)), the movement of the chucking and tension application device 200 as a whole in the direction of movement is performed. It serves as a guide.

7 and 8 will be described step by step the operation of the mask device according to an embodiment of the present invention.

7 and 8, in steps S1 and S2, the operator installs the mask frame 101 on the mask frame support device 501 and aligns the mask sheet 100 on the mask frame 101. Subsequently, the control device 800 detects the alignment state of the mask frame 101 and the mask sheet 100 by a sensor (not shown) and optimizes the alignment state of the mask frame 101 and the mask sheet 100. In step S3, the chucking and tension applying device 200 is loaded and the rod of the 3 position pneumatic cylinder 300 is initialized to the A position. Subsequently, the control device 800 controls the reference pattern up / down device 600 and the reference pattern aligning device 500 to correctly position the reference pattern 120a.

In step S4, the control device 800 compresses the rod of the 3 position pneumatic cylinder 300 to the C position to advance the chucking and tension applying device 200 toward the mask sheet 100. At the same time, the control device 800 extends the rod of the chucking pneumatic cylinder 203 so that the mask sheet 100 is chucked by the metal chuck base 201 and the resin chuck 202.

In step S5, the control device 800 extends the rod of the 3-position pneumatic cylinder 300 to the B position to adjust the position of the chucking and tension applying device 200 to the neutral position.

In steps S1 to S5, the control device 800 injects air pressure into the long hole in the free movement table 207 to float the lock 207e to fix the first and second sliders 207b and 207c of the free movement table. .

In step S6, the control device 800 releases the air pressure injected into the long hole 207d in the free movement table while maintaining the rod of the three-position pneumatic cylinder 300 in the B position to lower the lock 207e. The restraint of the first and second sliders 207b and 207c is released, and the tension driving source 206 of the chucking and tension applying device 200 is driven to apply tension to the mask sheet 100.

In operation S7, when the alignment state of the reference pattern 120a and the mask pattern 100a is optimized as shown in FIG. 5 based on the image photographed by the alignment camera 410, the laser output device in operation S8. The 420 is driven to laser weld the mask sheet 100 and the mask frame 101.

In step S9, the control device 800 controls the tension driving source 206 to release the tension applied to the mask sheet 100, and then, in step S10, the control device 800 controls the chucking pneumatic cylinder 203 to control the lever 204. The chucking applied to the mask sheet 100 is released by rotating counterclockwise.

In step S11, the control device 800 restrains the first and second sliders 207b and 207c by injecting air pressure into the long hole 207d in the free movement table to raise the lock 207e, and then in step S12, Initializes the rod of the position pneumatic cylinder 300 to the A position.

In operation S13, the operator removes the mask sheet 100 and the mask frame 101 welded from the reference pattern aligning apparatus 500 and sputters the mask sheet 100 and the mask frame 101. It is put into the evaporation process.

As described above, the mask device and the control method according to the present invention prevents damage to the mask sheet during mask chucking by using a resin chuck, and applies tensile force to the mask in various directions by using a free flow table and a push bracket. When applied, it is possible to apply a tensile force to the mask without affecting the tensile force in the other direction and to prevent deformation of the mask sheet, mask frame and mask pattern.

Those skilled in the art will appreciate that various changes and modifications can be made without departing from the technical spirit of the present invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification but should be defined by the claims.

Claims (4)

A mask sheet; A mask frame for supporting the mask sheet under the mask sheet; A plurality of chucking and tension applying devices for chucking the mask sheet with a resin chuck and applying tension to the mask sheet in an X-axis direction and a Y-axis direction; A movable base plate; Freely installed between the movable base plate and the chucking and tension applying device to freely move the chucking and tension applying device in the X and Y axis directions while tension is generated by the chucking and tension applying device. A moving table; And a push bracket installed between the mask frame and the mask frame to apply a repulsive force acting in the opposite direction of the tension to the mask frame while tension is applied to the mask sheet. The method of claim 1, The plurality of chucking and tension applying device, A plurality of first chucking and tension applying devices for chucking the mask sheet with a first resin chuck and applying tension to the mask sheet in the + X axis direction; A plurality of second chucking and tension applying devices for chucking the mask sheet with a second resin chuck and applying tension to the mask sheet in the -X axis direction; A plurality of third chucking and tension applying devices for chucking the mask sheet with a third resin chuck and applying tension to the mask sheet in the + Y axis direction; A plurality of fourth chucking and tension applying devices for chucking the mask sheet with a fourth resin chuck and applying tension to the mask sheet in a -Y axis direction; Each of the chucking and tension applying devices may include a chucking base plate installed with a metal chuck, a chucking pneumatic cylinder installed on the chuck base plate through a hinge point formed on a protrusion protruding from one side of the chuck base plate, and the chucking pneumatic cylinder. A lever and a movable base plate rotatably installed between the hinge point positioned at the rod end and the hinge point positioned on the chuck base plate, and the resin chuck mounted to rotate according to the rod extension and compression of the chucking pneumatic cylinder. A tension drive source for advancing and retracting the chuck base plate, and between a fixed base plate and the movable base plate, an LM guide for guiding the movement of the movable base plate, and installed at a lower end of the movable base plate. Long holes are formed The ring is provided with an inserted spring block; The free moving table is a guide rail installed on the movable base plate, a first slide slidably installed between the guide rail and the chuck base plate to enable movement in the X- and Y-axis directions of the chuck base plate; And a second slider, a hole formed in common in the sliders and the guide rail, and a lock provided to be elevated in the hole. The method of claim 1, Commonly inserted in the holes of the plurality of spring blocks respectively installed in the plurality of chucking and tension applying devices; A three position pneumatic cylinder for advancing and retracting the bar; A reference pattern corresponding to the mask pattern formed on the mask sheet; A welder for welding the mask sheet and the mask frame; A camera for photographing the alignment of the mask pattern and the reference pattern; And a control device for controlling the chucking and tension applying device, the three-position pneumatic cylinder, the lifting and lowering of the lock, and analyzing an image photographed by the camera. In the control method of the mask frame for welding the mask sheet and the mask frame for supporting the mask sheet under the mask sheet after the tension is applied to the mask sheet and the tension is released, The mask sheet is chucked by the resin chuck of the chucking and tension applying device and the tension is applied to the mask sheet in the X-axis direction and the Y-axis direction, and a push bracket is provided between the mask frame and the mask frame. Thereby applying a repulsive force acting in the opposite direction of the tension to the mask frame; And freeing the X-axis and Y-axis movement of the chucking and tension applying device by using a free moving table installed under the chucking and tension applying device while tension is applied to the mask sheet. Control method of the device.

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