KR100687337B1 - Liquid crystal display and method for fabricating the liquid crystal display using structure for protecting an etchant penetrating - Google Patents

Abstract

The liquid crystal display of the present invention has an etching solution penetration preventing structure that is applied during manufacturing, and the etching solution penetration preventing structure includes an upper and lower substrates and a liquid crystal injected therebetween, wherein A main seal region formed at an edge region; And an etching solution penetrating defense structure formed to surround a unit cell formed on one substrate and positioned at an edge region of the substrate, wherein the liquid crystal display device using the etching solution penetrating prevention structure according to the present invention includes: Claims [1] A method of manufacturing a liquid crystal display device comprising a substrate and a liquid crystal injected therebetween, comprising: preparing an upper and lower substrates; Forming a main seal region at an edge region within the unit cell; Forming an etching solution penetration defense structure positioned at an edge region of the substrate to surround a unit cell formed on one substrate; And injecting a liquid crystal between the upper and lower substrates after bonding the upper and lower substrates.

Description

Liquid crystal display device manufacturing method using liquid crystal display device and etching solution penetration prevention structure

1 is a schematic flowchart of an in-process cell process sequence for manufacturing a liquid crystal display device;

2 is a schematic flowchart of a cell process sequence for performing an etching process of a substrate for explaining a method of manufacturing a liquid crystal display device according to the present invention;

3 is a view showing a schematic arrangement of a cell, a main seal region, an etching solution penetration prevention structure on a substrate for performing an etching process of the substrate according to the present invention;

4 is a view showing an etching solution penetration prevention structure of a liquid crystal display according to an embodiment of the present invention;

5 is a view showing an etching solution intrusion prevention structure of a liquid crystal display according to another embodiment of the present invention;

6 is a view showing an etching solution intrusion prevention structure of a liquid crystal display according to another embodiment of the present invention;

7 is a view showing an etching solution intrusion prevention structure of a liquid crystal display according to another embodiment of the present invention.

[Description of Drawing Reference]

21: substrate 23a, 23b: etching solution penetration prevention structure (silant)

25 TFT area 19 Main seal area

The present invention relates to a liquid crystal display device and a method for manufacturing the same, and more particularly, an etching solution applied in manufacturing a liquid crystal display device which can effectively control the penetration of the etching solution when the etching solution is used for the substrate etching for the flat panel display device The present invention relates to a penetration preventing structure and a method of manufacturing a liquid crystal display using the same.

In general, a liquid crystal display device places a transparent conductive film for controlling the driving of the liquid crystal and the liquid crystal and a transparent conductive film for adjusting the orientation between the two transparent substrates, and adjusts the light passing state according to the movement of the liquid crystal voltage. In order to control the amount of light finally transmitted through the polarizer is attached to the outside of the two transparent substrates.

In the conventional liquid crystal display device, as shown in FIG. 1, the array panel and the color filter panel fabricated in the array process and the color filter process are bonded to each other in the cell process, and the alignment layer, the liquid crystal, and the polarizing plate are additionally bonded thereto. . That is, the alignment layer is applied to the upper substrate and the lower substrate, respectively, and a rubbing process is performed to have a predetermined orientation. A sealant, which is a substrate adhesive, is applied to bond the upper and lower substrates, and a spacer is sprayed on the opposite substrate so that the upper and lower substrates are bonded at regular intervals.

The liquid crystal display device in the final step of the cell process has a thickness that is equal to the thickness of the substrate used in the array process and the color filter process plus the thickness of the polarizing plate attached in the cell process.

However, recently, as the portable information display terminal has attracted attention as an application field of the liquid crystal display device, interest in the thickness and weight of the liquid crystal display device is increasing, and accordingly, the demand for the light weight and thinness of the material of the liquid crystal display device has been generalized. .

The most lightweight method of thinning a liquid crystal display device is to thin the thickness of a substrate used in the liquid crystal display device. This method has the largest weight and thickness specific gravity of the substrate in the liquid crystal display device, and since it is the most accessible in the fabrication thereof, it shows a lot of attention and remarkable progress.

In fact, the substrate for the liquid crystal display device having a thin thickness or low density has been manufactured and applied. However, the market demands for thinner and lighter liquid crystal display devices, and there is a movement to apply thinner substrates. In addition, in order to overcome the difficulties in the process proceeding when the application of the thinner substrate is engaged with the enlargement of the substrate, a method of thinning by melting the substrate with a solution after bonding the upper and lower substrates.

However, when the substrate is dissolved in the solution, the damage caused by the solution should not occur between the substrates. For this purpose, an additional etching solution defense structure is required to prevent the penetration of the solution around the substrate.

Indeed, a domestic patent application (10-2001-0044375) using the above method is disclosed, but the method of the disclosed patent is difficult to form a gas ejection space in a limited space, and is sealed by the gas ejection pressure during bonding. This damage increases the probability of failure.

Accordingly, the present invention has been made to solve the above problems of the prior art, manufacturing a liquid crystal display device that can effectively delay the penetration time of the etching solution at the time of etching the substrate while effectively discharging the gas inside the upper and lower substrate bonding. It is an object of the present invention to provide an etching solution penetration preventing structure applied to the liquid crystal and a liquid crystal display device manufacturing method using the same.

In the liquid crystal display device, which is applied to the liquid crystal display device manufacturing method according to the present invention for achieving the above object, in the liquid crystal display device comprising an upper and lower substrate and a liquid crystal injected therebetween,

A main seal region formed in an edge region of the unit cell; And

It is characterized in that it comprises a etch solution penetration protection structure formed to surround the unit cell formed in the edge region of the substrate formed on one substrate.

In addition, the liquid crystal display device using the etching solution penetration prevention structure according to the present invention, in the liquid crystal display device manufacturing method comprising the upper and lower substrates and the liquid crystal injected therebetween,

Preparing a lower and upper substrate;

Forming a main seal region at an edge region within the unit cell;

Forming an etching solution penetration defense structure positioned at an edge region of the substrate to surround a unit cell formed on one substrate; And

And injecting a liquid crystal between the upper and lower substrates after bonding the upper and lower substrates.

(Example)

Hereinafter, an etching solution penetration preventing structure and a method of manufacturing a liquid crystal display device using the same, which are applied in manufacturing the liquid crystal display device according to the present invention, will be described in detail with reference to the accompanying drawings.

2 is a schematic flowchart of a cell process sequence for performing an etching process of a substrate according to the present invention.

Briefly describing the manufacturing process of the liquid crystal display according to the present invention, as shown in Figure 2, after the alignment layer coating and rubbing process is performed on the upper substrate and the lower substrate in the same manner as the conventional method, the spacer spread and sealant coating Perform At this time, when the sealant is applied, the etching solution penetration defense structure is applied together.

Next, after performing the assembly and bonding process, the etching process is performed, and then the cutting process is performed to inject the liquid crystal and attach the polarizer to manufacture the liquid crystal display device.

Referring to FIGS. 3 to 7, embodiments of the etching solution penetration preventing structure used in manufacturing the liquid crystal display device according to the present invention manufactured in such a process order will be described below.

3 is a view showing a schematic arrangement of the cell, the main seal area, the etching solution penetration prevention structure on the substrate for performing the etching process of the substrate according to the present invention.

4 is a view showing an etching solution intrusion prevention structure of the liquid crystal display according to an embodiment of the present invention.

FIG. 5 is a view illustrating an etching solution intrusion preventing structure of a liquid crystal display according to another exemplary embodiment of the present invention.

6 is a view showing an etching solution intrusion prevention structure of a liquid crystal display according to another embodiment of the present invention.

FIG. 7 is a view illustrating an etching solution intrusion preventing structure of a liquid crystal display according to another exemplary embodiment of the present invention.

First, FIG. 3 is a plan view illustrating an etching solution intrusion preventing structure applied when a liquid crystal display device is manufactured according to the present invention. As shown in FIG. 3, a main seal region 19 has an edge inside a unit cell. It is formed in the region, the etching solution penetration preventing structure is positioned in the edge region of the substrate to surround a plurality of unit cells formed on one substrate (11). Here, the main seal region 19 has a hole 19a formed in a predetermined portion for the injection of liquid crystal after cell blocking, and the etching solution penetration preventing structure has a plurality of holes for the release of the gas in the space of the upper and lower substrates during bonding. A passage is formed. Here, reference numeral 13 denotes an etching solution penetration preventing structure, 13a is a gas discharge passage, 15 is a TFT region, and 17 is a color filter region.

Meanwhile, as another embodiment of the present invention, as shown in FIG. 4, in the etching solution penetration preventing structure, two sealant patterns 23a and 23b are arranged in a shape in which a female screw and a male screw are engaged with each other. The gas discharge passage is bent in the form of a screw so as to sufficiently delay the penetration time of the etching solution even in a narrow area. In FIG. 4, reference numeral 25 denotes a TFT region.

In addition, as another embodiment of the present invention, as shown in Figure 5, the etching solution intrusion prevention structure (33a, 33b) is a narrow hole at both ends of a wide bag-shaped region formed of a dummy seal (dummy seal) Is formed. In FIG. 5, reference numeral 35 denotes a TFT region, and 39 denotes a main seal region.

Here, the etchant penetrated into the narrow hole is collected in a wide area of the bag shape by the surface tension of the etchant to delay the internal penetration of the etchant until the bag-shaped area is filled with the etchant to some extent.

Meanwhile, as still another exemplary embodiment of the present invention, as shown in FIGS. 6 and 7, the etching solution penetration preventing structures 43a, 43b and 53a, 53b have the same structure as that of FIG. The diagonal or cramped structure is added to the wide area of the bag shape so that the large area is divided into small rooms so that the etchant fills each room and then moves to the next room, thereby further delaying the penetration of the etchant. In FIGS. 6 and 7, 45 and 55 are TFT regions, and 49 and 59 are main seal regions.

As described above, according to the etching solution penetration preventing structure applied in the manufacturing of the liquid crystal display device according to the present invention, it is possible to form more internal gas ejection passages in the limited region and to sufficiently infiltrate the etching solution during substrate etching. Can be delayed. As a result, it is possible to prevent damage to the seal structure of the liquid crystal display device due to the gas ejection pressure when the etching solution and the bonding, or a decrease in adhesion to the substrate.

In addition, when the etching solution prevention structure is formed by the etching solution penetration prevention method, the increase in the operation time required as the number of independent patterns increases can be reduced as much as possible.

On the other hand, the present invention is not limited to the above-described specific preferred embodiments, and various changes can be made by those skilled in the art without departing from the gist of the invention claimed in the claims. will be.

Claims (12)

In the liquid crystal display device comprising the upper and lower substrates and the liquid crystal injected between them, A main seal region formed in an edge region of the unit cell; And The liquid crystal display device comprising an etching solution penetration defense structure in which two patterns are arranged in a form in which female and male threads are engaged with each other, and are formed at an edge region of a substrate to surround a unit cell formed on one substrate. . The liquid crystal display device according to claim 1, wherein a liquid crystal hole for liquid crystal injection is formed in the main seal region. The liquid crystal display of claim 1, wherein the etching solution penetration preventing structure has a plurality of gas passages for gas discharge. delete The liquid crystal display of claim 1, wherein the etching solution penetration preventing structure has holes formed at both ends of a bag-shaped region formed of a dummy chamber. The liquid crystal display of claim 1, wherein the etching solution penetration preventing structure further includes a diagonal or cramped structure in a bag-shaped region. In the liquid crystal display device manufacturing method comprising the upper and lower substrates and the liquid crystal injected between them, Preparing a lower and upper substrate; Forming a main seal region at an edge region within the unit cell; Forming an etching solution penetration defense structure in which two patterns are disposed in a form in which female and male threads are engaged with each other, and are positioned at edge regions of the substrate to surround unit cells formed in one substrate; And And injecting a liquid crystal between the upper and lower substrates after the upper and lower substrates are bonded to the upper and lower substrates. 8. The method of claim 7, wherein a liquid crystal hole for liquid crystal injection is formed in the main seal region. The method of claim 7, wherein a plurality of gas passages for discharging gas are formed in the etching solution penetration preventing structure. delete The method of claim 7, wherein the etching solution penetration preventing structure has holes formed at both ends of a bag-shaped region formed as a dummy chamber. 8. The method of claim 7, wherein the etching solution penetration preventing structure further includes a diagonal or cramped structure in a bag-shaped region. 9.

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