KR100685838B1 - 증발장치 - Google Patents
증발장치 Download PDFInfo
- Publication number
- KR100685838B1 KR100685838B1 KR1020050113119A KR20050113119A KR100685838B1 KR 100685838 B1 KR100685838 B1 KR 100685838B1 KR 1020050113119 A KR1020050113119 A KR 1020050113119A KR 20050113119 A KR20050113119 A KR 20050113119A KR 100685838 B1 KR100685838 B1 KR 100685838B1
- Authority
- KR
- South Korea
- Prior art keywords
- crucible
- cap member
- deposition
- deposition material
- gasket
- Prior art date
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (3)
- 상부가 개구되어 있으며 상단부의 내주면 측에 돌출부가 형성되어 있고 내부에 증착물질이 수용되는 도가니;상기 도가니와 결합되는 캡부재;상기 도가니의 내측에 삽입되고 증발된 증착물질이 통과하는 적어도 하나의 개구부가 형성되어 있는 인너플레이트;상기 도가니의 돌출부와 캡부재의 사이에 삽입되어 있는 개스킷; 및상기 도가니의 외주면에 고정 부착되어 열을 공급하는 열선;을 포함하는 것을 특징으로 하는 증발원.
- 제 1항에 있어서,상기 개스킷은 환형으로 형성되어 있는 것을 특징으로 하는 증발원.
- 제 1항에 있어서,상기 개스킷은 구리(Cu)로 되어 있는 것을 특징으로 하는 증발원.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050113119A KR100685838B1 (ko) | 2005-11-24 | 2005-11-24 | 증발장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050113119A KR100685838B1 (ko) | 2005-11-24 | 2005-11-24 | 증발장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100685838B1 true KR100685838B1 (ko) | 2007-02-22 |
Family
ID=38104368
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050113119A KR100685838B1 (ko) | 2005-11-24 | 2005-11-24 | 증발장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100685838B1 (ko) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100962967B1 (ko) | 2007-11-08 | 2010-06-10 | 삼성모바일디스플레이주식회사 | 증발원 |
CN114059021A (zh) * | 2021-12-29 | 2022-02-18 | 唐山斯腾光电科技有限公司 | 一种蒸发镀膜装置 |
KR20220026503A (ko) * | 2020-08-25 | 2022-03-04 | 캐논 톡키 가부시키가이샤 | 도가니, 증발원 및 증착 장치 |
KR102713030B1 (ko) | 2020-08-25 | 2024-10-02 | 캐논 톡키 가부시키가이샤 | 도가니, 증발원 및 증착 장치 |
-
2005
- 2005-11-24 KR KR1020050113119A patent/KR100685838B1/ko active IP Right Grant
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100962967B1 (ko) | 2007-11-08 | 2010-06-10 | 삼성모바일디스플레이주식회사 | 증발원 |
KR20220026503A (ko) * | 2020-08-25 | 2022-03-04 | 캐논 톡키 가부시키가이샤 | 도가니, 증발원 및 증착 장치 |
KR102692246B1 (ko) | 2020-08-25 | 2024-08-05 | 캐논 톡키 가부시키가이샤 | 도가니, 증발원 및 증착 장치 |
KR102713030B1 (ko) | 2020-08-25 | 2024-10-02 | 캐논 톡키 가부시키가이샤 | 도가니, 증발원 및 증착 장치 |
CN114059021A (zh) * | 2021-12-29 | 2022-02-18 | 唐山斯腾光电科技有限公司 | 一种蒸发镀膜装置 |
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