KR100683272B1 - Device for preventing treatment liquid from leaking - Google Patents

Abstract

An apparatus for preventing the leak of a processing solution is provided to prevent the generation of failure in a substrate by blocking the mist of the processing solution using a shielding member. An apparatus for preventing the leak of a processing solution includes a frame, a shielding member, and a collecting member. The frame(10) is used for supporting a plurality of spraying members(N), wherein the plurality of spraying members are installed in a chamber. The shielding member(20) encloses completely the spraying member to prevent the mist of a processing solution from being leaked out. The shielding member is installed on the frame. The shielding member is made of a transparent material. The collecting member is used for collecting the processing solution supplied from the spraying members. The collecting member includes a drain capable of exhausting the collected processing solution.

Description

Device for preventing treatment liquid from leaking

1 is a schematic view showing a structure of a general substrate processing system, a part of which is shown in dashed lines.

2 is a side view of FIG. 1;

Figure 3 is an exploded perspective view showing a first embodiment of the treatment solution leakage preventing apparatus according to the present invention.

Figure 4 is an enlarged cross-sectional view showing a leak prevention state of the treatment solution by the treatment solution leak prevention apparatus of FIG.

5 is an exploded perspective view showing a second embodiment of the treatment solution leakage preventing apparatus according to the present invention.

FIG. 6 is a perspective view of the treatment solution leakage preventing device of FIG. 5 assembled; FIG.

7 is a partially enlarged cross-sectional view showing a treatment solution leakage preventing state in the treatment solution leakage preventing apparatus.

Explanation of symbols on the main parts of the drawings

10, 100: frame 20: shielding member

200: housing 300: discharge member

302: baffle 304: filter

N: injection member M: mist

The present invention relates to a treatment solution leak prevention apparatus, and more particularly, a treatment solution such as chemical liquid, hydrogen water, and mist and air formed by ultra-fine water injected into a substrate through a nozzle in a chamber leaks to the outside. The present invention relates to a treatment solution leak prevention apparatus capable of preventing contamination of the surroundings, causing corrosion of peripheral components, or deforming after cleaning of the substrate to leave stains on the substrate.

Recently, information processing devices have been rapidly developed to have various types of functions and faster information processing speeds. This information processing apparatus has a display device for displaying the operated information. Until now, a cathode ray tube monitor has been mainly used as a display device, but recently, with the rapid development of semiconductor technology, the use of a flat display device that is light and occupies a small space is rapidly increasing. There are various types of flat panel displays. Among them, liquid crystal displays, which are small in power consumption and small in volume, and low voltage driven, are widely used.

Substrates used in such flat panel displays (FPDs), semiconductor wafers, LCDs, and photomask glasses are processed through a series of process lines. That is, photo resist coating (P / R), exposure, development, etching, stripping, cleaning, and drying are performed. Such a series of substrate processing processes are typically associated with a transfer means for transferring a substrate in a substrate processing system, so that the process of supplying, processing, and discharging the substrate forms a single circulation cycle. The substrate is processed using a liquid or the like, and each process is interconnected.

1 and 2, the substrate processing system includes a chemical chamber for spraying and treating the chemical liquid on the substrate 1, a washing chamber for cleaning or washing the chemical liquid processed substrate, and drying and cleaning the substrate. It is provided with a plurality of chambers (2) for performing various processes, such as a drying chamber for making. Each of these chambers 2 is, of course, provided with an injection member 3 for injecting a chemical liquid or a cleaning liquid onto the substrate 1 in the form of a mist M, and each of the injection members 3 is provided with a nozzle as well. Doing. In addition, a transfer shaft 4 for transferring or conveying the substrate 1 is provided inside each chamber 2, and each of the transfer shafts 4 stably supports the substrate 1. A plurality of rollers 5 for conveying are provided in such a manner that both sides are fixed by the support. Of course, the main body of the substrate processing system, i.e., the outside of each chamber 2, is provided with various components such as an actuator 6 for operating and driving the respective injection member 3, the transfer shaft 4, and the like. . In addition, some chambers 2 may be provided with a door 7 for shielding the inside of the chamber.

According to this concept, the substrate 1 transferred to the substrate processing system is continuously passed through various chambers 2 by the transfer shaft 4, and the chemical liquid treatment, cleaning treatment, drying treatment, etc. are performed by the injection member 3 and the like. To be handled in various ways.

However, this conventional substrate transfer method and the docking device appeared to cause some problems. That is, actuators or magnetics installed in the outside of the main body of the substrate processing system by scattering or leaking treatment solution mists or air bodies such as chemical liquids or cleaning liquids sprayed from the injection member during chemical processing or cleaning processes in each chamber. There is a problem of corroding components such as bearings, bearings, etc., or polluting the atmosphere.

In addition, when the door is installed, it is for the safety of the inspector when the door is opened to visually inspect the processing state of the substrate, whereas in the case of spraying the chemical or cleaning liquid with the door closed, more air is used than the chemical. There is a problem in that the adhering fluid is not discharged to the outside to adhere back to the substrate and leave stains, thereby degrading productability.

Accordingly, the present invention has been invented to solve the above-described problems, the object of the present invention is that the treatment solution, such as mist and aerosols formed by chemical liquid, ultra-fine water, hydrogen water sprayed to the substrate is scattered or leaked to the outside To prevent corrosion of surrounding components, to prevent contamination of the atmosphere, to safely check and inspect the substrate processing process in the chamber, and to prevent substrate defects caused by poor mist. To provide.

According to a preferred embodiment of the present invention, there is provided a treatment solution leak prevention apparatus comprising: a frame rotatably fixed by a hinge to a support for supporting a plurality of spray members installed in a chamber of a substrate processing system; And a shielding member which is formed of a transparent material to surround the spraying member and check the processing state of the substrate so as to block leakage of the processing solution mist and the airflow sprayed from each spraying member to the outside.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

Figure 3 is an exploded perspective view showing a first embodiment of the treatment solution leakage preventing apparatus according to the present invention, Figure 4 is an enlarged cross-sectional view showing a leakage preventing state of the treatment solution by the treatment solution leakage prevention device of FIG.

3 and 4, the substrate cleaning apparatus to which the treatment solution leakage preventing device according to the present invention is applied includes a chamber C having a working space for cleaning the substrate S. One side of the chamber C is provided with an inlet I through which the substrate S is introduced, and an outlet O through which the substrate S is discharged is provided on the other side. Of course, a plurality of shafts (SH) provided with a roller (R) is installed inside the chamber (S) to transfer the substrate (S). In addition, inside the chamber C, a plurality of injection members N for injecting the processing solution into the upper, upper, and lower portions of the transfer path carried by the substrate S are fixed and supported by the support SP. It is installed in such a way.

According to the first embodiment of the present invention, the treatment solution leakage preventing device for preventing the treatment solution injected from the injection member (N) from leaking to the outside is installed in the chamber (C).

The treatment solution leakage preventing device includes a frame 10 that is rotatably supported by the hinge 12 on one of the two support stands SP supporting the injection member N. The frame 10 is formed in such a size that the body, which will be described later, can completely surround or shield all the injection members N in the chamber C. In addition, the frame 10 is preferably formed of a material that is not corroded or deteriorated by the treatment solution.

The frame 10 is actually provided with a shielding member 20 that surrounds or shields all of the respective injection members N. The shielding member 20 is formed of a transparent material so as to check and inspect the processing process of the substrate, for example, it is preferable that the shielding member 20 is formed of a transparent polycarbonate that can ensure condensation of dew and prevent condensation.

Optionally, the collection member 30 corresponding to the shielding member 20 is installed on the support SP to further prevent leakage of the treatment solution. The collecting member 30 serves to collect the used treatment solution sprayed from the injection member N, as well as to prevent the treatment solution from being scattered or sprayed downward.

The collecting member 30 is provided with a drain 32, and is preferably formed to be inclined toward the drain 32 so that the processing solution can flow toward the drain 32.

5 is an exploded perspective view showing a second embodiment of the treatment solution leakage preventing apparatus according to the present invention, FIG. 6 is a perspective view of the treatment solution leakage preventing apparatus of FIG. 5 assembled, and FIG. Partial enlarged cross-sectional view showing the treatment solution leakage prevention state in the treatment solution leakage preventing device.

The treatment solution leakage preventing apparatus according to the second exemplary embodiment of the present invention includes a frame 100 formed to have the same size and shape as the opening of the chamber C. The frame 100 is formed with a groove 102 through the whole, it is preferable that the packing 104 is inserted into the groove (102).

Of course, hinges 106 are provided at both rear sides of the frame 100 so that the frame 100 is rotatable with respect to the chamber C. In addition, a handle 108 is provided at the front center of the frame 100 so as to grip the frame 100 to open and close the mist leakage preventing device as a whole.

The frame 100 is actually provided with a housing 200 for shielding the inside of the chamber (C). The housing 200 is formed of a transparent material so as to check and inspect the treatment process in the chamber. For example, the housing 200 is preferably made of a transparent polycarbonate that can ensure strength and transparency and prevent condensation of dew.

In particular, the housing 200 is integrally provided with a discharge member 300 for discharging the mist (M) and the air flow (M ') injected from the nozzle of the injection member (N) in the chamber (C) to the outside. desirable.

The discharge member 300 is integrally formed with a plurality of baffles 302 for separating the chemical or cleaning liquid that may be included in the mist (M) or the air (M). Each of the baffles 302 is preferably formed to be inclined downward at a predetermined angle as well as opposed to each other in a zigzag manner to improve the efficiency of gas-liquid separation.

Optionally, the filter 304 may be provided to discharge only the air of the mist M or the air M 'passing through the discharge member 300 to the atmosphere.

Hereinafter, the installation method and the operation mode of the treatment solution leakage preventing apparatus configured as described above will be described in detail.

First, the worker installs the treatment solution leakage preventing device by fixing the frame 10 to the support SP using the hinge 12 and also fixing the collecting member 30 to the lower part of the support SP ( First embodiment), a packing 104 formed of, for example, rubber or synthetic resin is inserted into a groove 102 formed in the entire central portion of the frame 100, and the housing 200 is fixed to the frame 100 to treat the treatment solution. After the leak prevention device is completed, the frame 100 is fixed to the edge or the main body of the opening of the chamber C by using the hinge 106, and the treatment solution leakage prevention device is installed in a cover type.

In the installation state of such a treatment solution leakage preventing device, for example, the substrate S is transferred into the chamber C, and the chemical liquid or the cleaning liquid is injected from the nozzles of the respective injection members N toward the substrate S. At this time, the treatment solution such as chemical liquid, ultra-fine water, hydrogen water, or cleaning liquid sprayed from the nozzle is sprayed onto the substrate S in the form of a mist or a two-fluid to process the substrate S.

At this time, in the case where the treatment solution leakage preventing device according to the first embodiment of the present invention is installed, the treatment solution mist M and the treatment solution leakage preventing device surrounding or spraying the respective injection members N as a whole. The airflow M 'is blocked by the body 20 and consequently does not leave the inner region of the chamber C. In particular, the treatment solution sprayed downward is collected by the collecting member 30 and discharged to the designated drain 32, thereby preventing external leakage of the treatment solution.

In addition, the body 20 is formed transparent to safely and clearly observe the treatment fixation and state of the substrate (S), and also to repair or repair components such as the nozzle member (N), shaft (SH), etc. Can be opened and closed.

On the other hand, when the treatment solution leakage preventing apparatus according to the second embodiment of the present invention is installed, the mist (M) and the air (M ') sprayed from the nozzle of the injection member (N) is mostly normal to the substrate (S) Although applied or sprayed at speed, some mists M and air M 'are floated or flowed into the air and eventually discharged to the outside.

The mist M and the discharge body M 'discharged to the outside are integrally provided in the housing 200 and discharged through the discharge member 300 communicating with the inside of the chamber C. At this time, the pure chemical liquid or the washing liquid contained in the mist M and the air liquid M 'is separated by the plurality of baffles 302 and recovered into the chamber C, and subsequently purified completely by the filter 304. As a result, only pure air is discharged.

In addition, since the housing 200 is formed of a transparent material, an operator can stably inspect or confirm a working state in the chamber C through the housing 200 in a state where the housing 200 is not exposed to mist and air current.

Therefore, among the mists sprayed toward the substrate, the air or mist that does not contain sufficient chemical or cleaning liquid is separated and purified from the chemical or cleaning liquid, so that only pure air is released into the atmosphere.

As a result, according to the treatment solution leak prevention apparatus according to the present invention, it is possible to completely prevent leakage of the treatment solution mist or airflow that does not reach the substrate or repels from the substrate, and pure water treatment from the mist or airflow. By completely separating the solution and discharging only air to the atmosphere, it is possible to prevent corrosion of surrounding parts and contamination of the atmosphere, and also to improve the reliability and safety by allowing the operator to stably check and monitor the process in the chamber. There is.

Claims (7)

A frame rotatably fixed by a hinge to a support for supporting a plurality of spray members installed in the chamber of the substrate processing system; It is formed of a transparent material which surrounds the injection member to check the processing state of the substrate and prevents dew formation, so as to block the leakage of the processing solution mist and the aerosol sprayed from the respective injection members to the outside. Being shielded member; And Collecting the treatment solution sprayed and used from the injection member to prevent the treatment solution is scattered or sprayed to the bottom, and provided with a drain for discharging the collected treatment solution, the treatment comprising a collecting member fixed to the support Solution leak prevention device.  The method of claim 1, The shield member is a treatment solution leakage prevention device, characterized in that formed of polycarbonate. A frame formed corresponding to the opening of the chamber of the substrate processing system; A housing fixed to the frame to shield and open and close the inside of the chamber, the housing being formed of a transparent material; A discharge member integrally formed in the housing and configured to discharge only air in a state in which the chemical liquid or the cleaning liquid is separated from the chemical liquid or the cleaning liquid mist; And And a discharge member formed integrally with the housing and including a discharge member for discharging only air in a state in which the chemical liquid or the cleaning liquid is separated from the chemical liquid or the cleaning liquid mist. The method of claim 3, Grooves are formed along the entirety of the center lower portion of the frame, the processing solution leakage prevention device, characterized in that the packing is inserted. The method of claim 3, The rear side of the frame is rotatably fixed to the chamber by a hinge, the front center is provided with a handle, the housing solution preventing leakage, characterized in that formed of transparent polycarbonate. The method of claim 3, The baffle is to separate the chemical liquid or cleaning liquid contained in the mist and inclined downward at a predetermined angle and protruding from each other zigzag, characterized in that the treatment solution leakage prevention device. The method according to claim 3 or 6, wherein Treatment solution leakage preventing device, characterized in that the discharge member is further installed.

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