KR100673758B1 - Donor film with out-gas trapping layer and the manufacturing method thereof - Google Patents

Abstract

A donor film with an out-gas trapping layer and a method for manufacturing the same are provided to reduce a defective proportion of products and to manufacture a high quality transferring layer by trapping an out-gas generated by heat in a transferring process and to prevent the out-gas from being transmitted to a transferring layer. A donor film(3) with an out-gas trapping layer includes a base material layer(31), a photo-thermal converting layer(33) provided on the base material layer(31), an out-gas trapping layer(34) provided on the photo-thermal converting layer(33), and a transferring layer(35) provided on the out-gas trapping layer(34). The out-gas trapping layer(34) includes a porous out-gas trapping unit. The out-gas trapping layer(34) is made of porous material. The out-gas trapping layer(34) has a plurality of vent holes(P) of 1 to 50 nm, and has a thickness less than 1 micrometer. The out-gap trapping layer(34) is made of a ceramic or a metal.

Description

Donor film with degas collection and its manufacturing method

1 is a cross-sectional view of a donor film for laser transfer for forming an organic film layer according to the prior art,

2 is a cross-sectional view of the donor film having a degassing collecting unit according to a preferred embodiment of the present invention,

3 is a cross-sectional view of a donor film provided with a degassing collecting unit according to another embodiment of the present invention.

<Description of Symbols for Main Parts of Drawings>

1, 3, 5 ... donor film, 11, 31, 51 ... substrate layer,

13, 33, 53 ... light-to-heat conversion layer, 34 ... degassing layer,

15, 35, 55 ... warrior layer, P ... pore.

The present invention relates to a donor film provided with a degassing collecting unit and a method of manufacturing the same, and more particularly, desorption which is trapped by degassing generated during the transfer process by itself to prevent the influence of the degassing on the transfer layer. The present invention relates to a donor film provided with a gas collecting part and a method of manufacturing the same.

In general, in the organic light emitting display device, an anode electrode, which is a lower electrode, is formed on an insulating substrate, an organic thin film layer is formed on an anode electrode, and a cathode electrode, which is an upper electrode, is formed on an organic thin film layer. The organic thin film layer includes at least one of a hole injection layer, a hole transport layer, a light emitting layer, a hole suppression layer, an electron transport layer, an electron injection layer.

As a method of forming the organic thin film layer, there are a vapor deposition method and a lithography method. The vapor deposition method is a method of forming an organic film layer by vacuum deposition of an organic light emitting material using a shadow mask, it is difficult to form a high-definition fine pattern by deformation of the mask, it is difficult to apply to a large-area display device. The lithography method is a method of forming an organic layer by depositing an organic light emitting material and then patterning the photoresist using a photoresist, but it is possible to form a high-definition fine pattern, but it is a developer or an etching solution of an organic light emitting material to form a photoresist pattern. There is a problem that the characteristics of the organic film layer are deteriorated due to the above.

In order to solve the problems of the deposition method and the lithography method, an inkjet method of directly patterning the organic film layer has been proposed. The inkjet method is a method in which an organic film layer is formed by dissolving or dispersing a light emitting material in a solvent and discharging it from a head of an inkjet printing apparatus as a discharge liquid. The inkjet method has a relatively simple process, but has a problem of low yield and nonuniformity in film thickness, which is difficult to apply to a large-area display device.

On the other hand, a method of forming an organic film layer using a laser transfer method has been proposed, but there is an advantage that it is not affected by the solubility characteristics of the transfer layer because it is a dry process. Therefore, an organic processible hole transfer layer such as an underlayer may be introduced to improve performance of the organic light emitting display device. The laser transfer method converts light from a light source into thermal energy, and transfers an image forming material to a substrate of an organic light emitting display device by using the converted thermal energy to form R, G, and B organic film layers. Laser transfer is a laser-induced imaging process with inherent advantages such as high resolution pattern formation, film thickness uniformity, multilayer lamination capability, and scalability to large mother glass.

Such a laser transfer method may be used to manufacture color filters for liquid crystal display devices, and may also be used to form patterns of light emitting materials. (US Patent No. 5,998,085)

Hereinafter, with reference to the drawings a conventional donor film for laser transfer will be described in detail.

1 is a cross-sectional view of a donor film for laser transfer for forming an organic film layer according to the prior art.

Referring to FIG. 1, a conventional laser transfer donor film 1 is formed on a base layer 11, a light-to-heat conversion layer 13 and a light-to-heat conversion layer 13 formed on the base layer 11. The formed transfer layer 15 is formed.

In the conventional donor film 1, when heat is generated by the laser in the light-to-heat conversion layer 13 during the transfer process of the transfer layer 15, the heat is generated out-gassing due to the heat in itself. Is generated. The degassing generated by this heat is transferred to the transfer layer 15, which causes defects and the like to be formed in the transfer layer 15, which is transferred to the organic film layer as it is during the transfer process, thereby increasing the defective rate of the product. There has been a problem that the quality of the final product is degraded.

The present invention has been made to solve the conventional problems as described above, it is provided with a degassing trap to capture the degassing generated by the heat during the transfer process to prevent the transfer of the degassing to the transfer layer. The purpose is to provide a donor film and a method for producing the same.

In order to achieve the above object, the donor film having a degassing collecting unit according to the present invention is a base layer; A light-to-heat conversion layer disposed on the base layer; A degassing layer disposed on the light-to-heat conversion layer; And a transfer layer disposed on the degas collection layer.

Here, the degas collection layer is preferably made of porous having a plurality of pores having a diameter of 1 ~ 50nm with a thickness of 1 ㎛ or less, when the transfer layer is transferred by a transfer process, is not simultaneously transferred Does not consist of material.

In addition, the degas collection layer is made of a ceramic, in particular an oxide-based ceramic or metal, the oxide-based ceramic may be made of alumina (Al ₂ O ₃ ) or may be made of silica gel (silica gel).

A donor film provided with a degassing collecting unit according to the present invention is a base layer; A light-to-heat conversion layer disposed on the substrate layer and provided with a degassing collecting region; And a transfer layer disposed on the light-to-heat conversion layer.

Here, the degas collection region is preferably made of porous having a plurality of pores having a diameter of 1 ~ 50nm with a thickness of 1 ㎛ or less, is arranged closely to the transfer layer.

In addition, the degas collection region is preferably made of a material that is not simultaneously transferred when the transfer layer is transferred by a transfer process.

The method for producing a donor film provided with a degassing collecting unit according to the present invention comprises the steps of forming a base layer; Forming a light-to-heat conversion layer on the substrate layer; Forming a degassing collector on the light-to-heat conversion layer; And forming a transfer layer on the light-to-heat conversion layer.

Here, the degas collection unit is made of porous.

In addition, the degas collection unit may be formed as a degas collection layer between the light-to-heat conversion layer and the transfer layer, the degas collection layer may be formed of metal or ceramics, in particular oxide-based ceramics.

Here, the degassing layer formed of the oxide-based ceramic is made of an atmospheric pressure film forming method such as sol-gel method, spin coating method, dipping method, a water-based solvent (doctor blade) method, The degassing trap layer formed of the metal is formed by foam metal forming method.

The degassing collecting unit may be formed as a degassing collecting region in a region in contact with the transfer layer of the light-to-heat conversion layer.

In addition, the porous degassing collecting portion is made up of a plurality of pores having a diameter of 1 ~ 50nm, the thickness is made of 1 ㎛ or less.

Hereinafter, with reference to the accompanying drawings a preferred embodiment of the donor film having a degassing collecting unit according to the present invention will be described in detail.

2 is a cross-sectional view of a donor film provided with a degassing collecting unit according to a preferred embodiment of the present invention.

The donor film 3 in which the degassing collecting portion according to the present invention is obtained is formed on the base layer 31, the light-to-heat conversion layer 33 disposed on the base layer 31, and on the light-to-heat conversion layer 33. And a transfer layer 35 disposed on the degas collection layer 34 disposed on the degas collection layer 34.

The light-to-heat conversion layer 33 disposed on the base layer 31 converts light energy by the laser as thermal energy during laser transfer. At this time, degassing due to thermal energy is generated. In order to prevent diffusion into the transfer layer 35, before the transfer layer 35 is disposed on the light-heat conversion layer 33, that is, light-to-heat conversion is performed. A degas collection layer 34 is disposed between the layer 33 and the transfer layer 35.

The degassing layer 34 has a thickness of 1 μm or less, and is made of porous having a plurality of pores P having a diameter of 1 to 50 nm. Due to the distribution of pores P forming the porosity, degassing due to thermal energy is trapped in the pores P of the degassing trap layer 34 without being diffused to the transfer layer 35.

The thickness of the degassing layer 34 is set to 1 μm or less for efficient heat energy transfer from the light-to-heat conversion layer 33 to the transfer layer 35. When formed to a thicker thickness than this, the trapping ability of the degassing may be better, but the heat transfer efficiency to the transfer layer 35 may be further reduced.

In addition, the diameter of the pores (P) is set to 1 ~ 50nm for efficient degassing collection and manufacturing convenience. Smaller diameter pores P deteriorate degassing capacity, and larger diameter pores P impede uniform heat transfer across the transfer layer 35. That is, in the heat transfer path through the pores P, heat transfer is caused by radiation and convection instead of heat transfer when conducting through the pores P, so that the heat transfer path passes through the pores P having a large diameter. Since the heat transfer efficiency is significantly reduced compared to the heat transfer path in other parts, as a result, uniform heat transfer to the transfer layer 35 cannot be achieved.

In addition, the degas collection layer 34 is made of a material that is not simultaneously transferred when the transfer layer 35 is transferred by a transfer process. If a part of the degassing layer 34 is simultaneously transferred at the time of transfer of the transfer layer 35, this may cause product defects and may result in a result contrary to the spirit of the present invention, which is proposed to produce high quality products. Cause. Therefore, it is preferable that the degassing collection layer 34 is made of a material which is not simultaneously transferred at the time of transferring the transfer layer 35.

In addition, the degas collection layer 34 is made of ceramic or metal. Here, the ceramic may be an oxide-based ceramic. The oxide-based ceramics may be alumina (Al ₂ O ₃ ) or silica gel, but may be other oxide-based ceramics capable of known and / or porous fabrication. In general, since the oxide-based ceramic materials are applicable to the atmospheric pressure film forming method, it is very preferable to form the porous degas collection layer 34 required in the present invention.

However, in addition to the above-described oxide-based ceramic material, a metal material is also applicable. In the common knowledge, since the metallic material is significantly superior in heat transfer ability than the oxide-based ceramics, in order to more efficiently transfer the thermal energy converted from the light-to-heat conversion layer 33 to the transfer layer 35, the degassing collection layer ( 34) may be formed of a metal. At this time, the degassing layer 34 is a porous metal and as an example of such a form is a foam metal (form metal).

Hereinafter, another embodiment of the donor film provided with a degassing collecting unit according to the present invention will be described in detail.

3 is a cross-sectional view of a donor film provided with a degassing collecting unit according to another embodiment of the present invention.

The donor film 5 in which the degassing collecting portion according to the present invention is obtained is disposed on the base layer 51, the base layer 51, and the light-to-heat conversion layer 53 having the degassing collecting region and the light. A transfer layer 55 disposed on the heat conversion layer 53.

The light-to-heat conversion layer 53 disposed on the base layer 51 converts light energy by the laser as thermal energy during laser transfer. At this time, degassing due to thermal energy is generated. In order to prevent diffusion into the transfer layer 55, a light-to-heat conversion layer 53 having a degassing collecting region is disposed. More specifically, the light-to-heat conversion layer 53 in which the degassing collection region is provided closely to the transfer layer 55 is disposed.

This degassing area | region is 1 micrometer or less in thickness, Comprising: The pore P which has a diameter of 1-50 nm consists of porosity in which many pieces were distributed. Due to the distribution of pores P forming the porosity, degassing due to thermal energy is trapped in the pores P of the degassing collection region without being diffused to the transfer layer 55.

For efficient heat energy transfer from the light-to-heat conversion layer 53 to the transfer layer 55, the thickness of the degassing area of the light-to-heat conversion layer 53 is set to 1 μm or less. When formed to a thicker thickness than this, the trapping ability of the degassing may be better, but the heat transfer efficiency to the transfer layer 55 may be further reduced.

In addition, the diameter of the pores (P) is set to 1 ~ 50nm for efficient degassing collection and manufacturing convenience. Smaller diameter pores P deteriorate degassing capacity, and larger diameter pores P impede uniform heat transfer across the transfer layer 55. That is, in the heat transfer path through the pores P, heat transfer is caused by radiation and convection instead of heat transfer when conducting through the pores P, so that the heat transfer path passes through the pores P having a large diameter. Since the heat transfer efficiency is significantly reduced compared to the heat transfer path in other parts, as a result, uniform heat transfer to the transfer layer 55 cannot be achieved.

In addition, the degas collection region is made of a material which is not simultaneously transferred when the transfer layer 55 is transferred by a transfer process. If a part of the degassing collection region is simultaneously transferred at the time of transfer of the transfer layer 55, this causes a defect in the product and results in contrary to the spirit of the present invention proposed to mass produce a high quality product. Therefore, the degassing collecting region is preferably made of a material which is not simultaneously transferred at the time of transferring the transfer layer 55.

Hereinafter, a preferred embodiment of the donor film manufacturing method provided with a degassing collecting unit according to the present invention will be described in detail.

According to the present invention, there is provided a method of manufacturing a donor film having a degassing collecting part, forming a base layer, forming a light-heat conversion layer on the base layer, and forming a degassing collecting part on the light-heat conversion layer. And forming a transfer layer on the light-to-heat conversion layer.

First, a base layer is formed in a conventional manner, and then a light-to-heat conversion layer is formed on the base layer. Thereafter, a degassing trap is formed on the light-to-heat conversion layer before the transfer layer is formed. This degas collection part is made porous. Thereafter, a transfer layer is formed on the degassing collecting portion to complete the donor film provided with the degassing collecting portion.

The degas collection unit may be formed by further stacking the degas collection layer between the light-to-heat conversion layer and the transfer layer. At this time, the degas collection layer may be formed of a metal or a ceramic.

Here, the ceramic is an oxide-based ceramic, the oxide-based ceramic may be alumina (Al ₂ O ₃ ) or silica gel (silica gel), other known and / or porous fabrication is possible and It may be another oxide-based ceramic that can be matched.

In general, such oxide-based ceramic materials are applicable to atmospheric pressure film formation methods such as sol-gel, spin coating, dipping, and doctor blade methods. In addition, the atmospheric pressure film forming method listed as the above example is applied.

In addition, the degassing collecting portion formed of a metal is made of a foamed metal molding method, and also a conventional foamed metal molding method is applied.

In addition to the method of forming the degas collection unit by the above method, the degas collection unit may be formed as a degas collection region in a region in contact with the transfer layer of the light-to-heat conversion layer.

The degassing collecting portion has a thickness of 1 μm or less, and is made of porous having a plurality of pores having a diameter of 1 to 50 nm. Due to the distribution of pores constituting the porosity, degassing due to thermal energy is not diffused to the transfer layer, but is collected in the pores of the degassing unit.

The thickness of the degassing unit is set to 1 μm or less for efficient heat energy transfer from the light-to-heat conversion layer to the transfer layer. When formed to a thicker thickness than this, the degassing capacity may be better, but the heat transfer efficiency to the transfer layer may be further reduced.

In addition, the pore diameter is set to 1 ~ 50nm for efficient degassing collection and manufacturing convenience. Smaller diameter pores degrade degassing capacity, and larger diameter pores interfere with uniform heat transfer across the transfer layer. In other words, in the heat transfer path through the pores, heat transfer is caused by radiation and convection rather than conduction when conducting through the pores, so that the heat transfer path through the pores having a large diameter is larger than the heat transfer path in other parts. Since the heat transfer efficiency is significantly reduced, as a result, uniform heat transfer to the transfer layer cannot be achieved.

The foregoing is merely illustrative of the preferred embodiments of the present invention and those skilled in the art to which the present invention pertains recognize that modifications and variations can be made to the present invention without departing from the spirit and gist of the invention as set forth in the appended claims. shall.

As described above, according to the donor film provided with the surface degassing collecting unit according to the present invention and a method for manufacturing the same, by collecting the degassing gas generated by heat during the transfer process to prevent the transfer of the degassing gas to the transfer layer, It is possible to reduce product defect rate and manufacture high quality transfer film.

Claims (24)

Base layer; A light-to-heat conversion layer disposed on the base layer; A degassing layer disposed on the light-to-heat conversion layer; And A transfer layer disposed on the degas collection layer; Donor film provided with a degassing collecting portion comprising a. The method of claim 1, The degas collection layer is a donor film having a degas collection portion made of porous. The method of claim 2, The degas collection layer is a donor film having a degassing trap is formed by a plurality of pores having a diameter of 1 ~ 50nm is distributed. The method of claim 2, The degas collection layer is a donor film provided with a degas collection portion made of a thickness of 1 ㎛ or less. The method of claim 2, The degas collection layer is a donor film having a degas collection portion made of a material that is not transferred simultaneously when the transfer layer is transferred by a transfer process. The method of claim 5, The degas collection layer is a donor film provided with a degas collection portion made of ceramic or metal. The method of claim 6, The ceramic is a donor film having a degassing collecting portion is an oxide-based ceramic. The method of claim 7, wherein The oxide ceramic is a donor film having a degassing collecting portion made of alumina (Al ₂ O ₃ ) or silica gel (silica gel). Base layer; A light-to-heat conversion layer disposed on the substrate layer and provided with a degassing collecting region; And A transfer layer disposed on the light-to-heat conversion layer; Donor film provided with a degassing collecting portion comprising a. The method of claim 9, The degas collection region is a donor film having a degassing collecting portion made of porous. The method of claim 10, The degas collection region is a donor film having a degassing trap is formed by a plurality of pores having a diameter of 1 ~ 50nm. The method of claim 10, The degas collection region is a donor film provided with a degas collection portion made of a thickness of 1 ㎛ or less. The method according to any one of claims 9 to 12, The degas collection region is a donor film having a degassing collecting portion is disposed in close proximity to the transfer layer. Forming a base layer; Forming a light-to-heat conversion layer on the substrate layer; Forming a degassing collector on the light-to-heat conversion layer; And Forming a transfer layer on the light-to-heat conversion layer; A donor film manufacturing method provided with a degassing collecting portion comprising a. The method of claim 14, The degas collection unit is a donor film manufacturing method provided with a degas collection unit made of porous. The method of claim 15, The degas collection unit is a donor film manufacturing method having a degas collection unit formed of a degas collection layer between the light-heat conversion layer and the transfer layer. The method of claim 16, The degas collection layer is a donor film manufacturing method having a degas collection unit formed of a metal or ceramic. The method of claim 17, The ceramic is a donor film manufacturing method provided with a degassing collector is an oxide-based ceramic. The method of claim 18, The degas collection layer formed of the oxide-based ceramic is a donor film manufacturing method provided with a degas collection unit made of an atmospheric pressure film forming method. The method of claim 19, The atmospheric pressure film forming method is a sol-gel method, a spin coating method, a dipping method, a method of manufacturing a donor film having a degassing collecting portion of any one of the aqueous solvent (doctor blade) method. The method of claim 17, The degas collection layer formed of the metal is a donor film manufacturing method provided with a degas collection unit made of a foam metal forming method. The method of claim 15, And a degassing collecting part formed as a degassing collecting area in a region in contact with the transfer layer of the light-to-heat conversion layer. The method of claim 16 or 22, The porous gas degassing unit is a donor film manufacturing method provided with a degassing unit is formed by the distribution of a plurality of pores having a diameter of 1 ~ 50nm. The method of claim 16 or 22, The porous gas degassing unit is a donor film manufacturing method having a degassing unit made of a thickness of less than 1 ㎛.

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