KR100666348B1 - Wet station - Google Patents

Abstract

The present invention relates to a wet station capable of effectively evacuating fume (FUME) generated from a treatment chemical used to clean / etch a substrate. The wet station of the present invention is a base having an upper surface open and filled with a processing liquid so that the substrate can be contained, a transfer robot for transferring the substrate between the baths, and a substrate disposed between the baths and the baths. It has a drip module for receiving the treatment liquid dropped in the process. The drip module has a suction part for sucking and evacuating the fume generated by evaporation from the treatment liquid, and the fume is sucked and removed from the suction part of the drip module installed on both sides of the bath, so that the fume can be quickly and smoothly removed. Corrosion of peripheral devices can be prevented.

Description

Wet Station {WET STATION}

1 is a perspective view showing a cleaning process of the wet station according to a preferred embodiment of the present invention;

Figure 2 is a plan view showing a cleaning process of the wet station of the present invention;

3 is a perspective view of the drip tray module;

4A is a cross-sectional view of the drip tray module;

4b is a cross-sectional view of a modified drip tray module with one suction duct;

5 is a cross-sectional view of the cleaning treatment unit showing the exhaust of the fume.

Explanation of symbols on the main parts of the drawings

110: treatment bath

120: transfer robot

130: main exhaust duct

140: drip module

142: drain

150: suction part

152: suction duct

154: suction port

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor processing apparatus using a chemical liquid for cleaning / etching a substrate, and more particularly, to a wet station capable of stably exhausting fume (FUME) generated from a processing chemical liquid.

In general, the process of manufacturing a semiconductor device is a repeating manufacturing process such as diffusion, photography, etching, thin film, etc. on the surface of the silicon substrate, and deionized water, or each time the next step between each of these processes, or There is a need for a washing step of washing with a treatment liquid such as a chemical solution.

The wet station, which is a cleaning device used in this cleaning process, is equipped with vessels having an upper surface open to be filled with substrates and filled with a treatment liquid (cleaning liquid, etchant), and a transfer robot for transferring substrates between the vessels. Have In operating the wet station, some of the treatment chemicals in the bath are evaporated in the form of fumes. Since the fumes generated by the evaporation of the cleaning liquids are toxic, they must be evacuated to a safe place through an exhaust device such as a ventilation hole. do. In particular, the fume not only causes corrosion of peripheral devices (e.g., transfer robots, frames, steel parts), but also causes particles and can have a fatal effect on the substrate.

However, the existing wet station does not completely exhaust the fume present in the upper part of the bath because the exhaust port is located behind the bath.

The present invention has been made to solve such a conventional problem, and an object thereof is to provide a new type of substrate processing apparatus capable of effectively inhaling and evacuating fumes generated by evaporation of the treatment chemicals filled in the bath.

Wet station of the present invention for achieving the above object is that the top surface is open so that the substrate can be contained and filled with the treatment liquid; A transfer robot for transferring the substrate between the baths; A drip module installed between the bath and the bath to receive a treatment liquid dropped during the substrate transfer process between the baths; The drip module has a suction part for sucking and exhausting fumes generated by evaporation from the treatment liquid.

According to an embodiment of the present invention, the drip tray module includes a drain having an inclined surface for collecting and treating a treatment chemical falling from the substrate or the transfer robot, and a drain hole formed at the bottom of the inclined surface and connected to an external drain line. do.

According to an embodiment of the present invention, the drip tray module further includes an ultrapure water supply line installed on an edge of the inclined surface so that ultrapure water flows to the inclined surface.

According to an embodiment of the present invention, the suction part includes a suction duct having a plurality of suction ports,

According to an embodiment of the present invention, the wet station further includes a main exhaust duct having a plurality of exhaust ports for sucking and exhausting the fume at the rear side of the bath.

Wet station of the present invention for achieving the above object is that the top surface is open so that the substrate can be contained and filled with the treatment liquid; A transfer robot for transferring the substrate between the baths; A main exhaust duct having a plurality of exhaust ports for sucking and exhausting fumes generated by evaporation from the treatment chemical on the rear side of the bath from the rear of the bath; And a suction duct disposed between the bath and the bath and having a plurality of suction ports for sucking and evacuating the fume from both sides of the bath.

According to an embodiment of the present invention, the suction duct has an inclined surface for receiving and collecting the treatment chemicals falling from the substrate or the transfer robot, and a drain having a drain hole formed at the bottom of the inclined surface and connected to an external drain line. Includes more wealth.

According to an embodiment of the present invention, the suction duct further includes an ultrapure water supply line installed above the edge of the inclined surface such that ultrapure water flows to the inclined surface.

According to an embodiment of the present invention, the main exhaust duct and the suction duct are connected through a connection line.

For example, the embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be construed as being limited by the embodiments described below. These examples are provided to more fully explain the present invention to those skilled in the art. Accordingly, the shape of the elements in the drawings and the like are exaggerated to emphasize a clearer description.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to FIGS. 1 to 5. In addition, in the drawings, the same reference numerals are denoted together for components that perform the same function.

1 and 2 are views illustrating a cleaning processing unit of a wet station in which a cleaning process for washing substrates with deionized water or a chemical solution such as a chemical solution is performed. 3 and 4b are views showing the drip tray module. 5 is a cross-sectional view of the cleaning treatment unit showing the exhaust of the fume.

1 and 2, the cleaning processing unit 100 of the wet station of the present invention, the upper surface is open and the processing bath 110 is filled with the processing liquid and the substrate transfer between the processing bath (110) It includes a transport robot 120 for. A main exhaust duct 130 having a plurality of exhaust ports 132 for sucking fumes generated by evaporation from the treatment liquid into the rear of the treatment bath is installed at the rear side of the treatment bath 110. The main exhaust duct 130 is connected to the exhaust line 134.

For example, in the treatment baths 110, a drying process, a rinse process, a chemical liquid treatment process, and the like may be performed. Each of the treatment baths 110 may be provided with a substrate guide (holding member) (not shown) supporting the substrates, and a cover (not shown) covering the open upper portion of the bath. Since the substrate guide is fixed in the bath, both the chuck 122 of the transfer robot 120 moves into the bath and chucks and the lift type lifted from the bath can be applied. In addition, the transfer robot 120 is a robot for transferring the substrates loaded into the cleaning processing unit 100 of the wet station to the processing baths in the order of process progress.

1, 3, and 4A, a drip module 140 is installed between the treatment baths 110. The drip tray module 140 includes a drain 142 and a suction unit 150. The drain 142 is for receiving and treating the treatment chemicals falling from the chucks of the substrates and the transfer robot in the process of transferring the substrates between the treatment baths 110. The drain portion 142 has an inclined surface 144 for receiving and collecting the treatment liquid and a drain hole 146 formed at the bottom of the inclined surface. The drain 146 is connected to an external drain line 147.

An ultrapure water supply line 148 is provided at an upper edge of the inclined surface 144 to supply ultrapure water to flow ultrapure water to the inclined surface. Ultrapure water flowing from the ultrapure water supply line 148 flows along the inclined surface and is drained to the drain 146. The treatment chemicals falling on the inclined surface 144 are quickly drained together with the ultrapure water through the drain port 146, and the treatment chemicals on the inclined surface are also washed and drained by the ultrapure water. Therefore, the inclined surface 144 may maintain a clean state without being contaminated by the treatment liquid. Lines for supplying ultrapure water to the ultrapure water supply line are omitted in the drawings.

On the other hand, the suction unit 150 is for sucking and exhausting the fumes generated by evaporation from the treatment liquid, and includes a suction duct 152 having a plurality of suction ports 154.

As shown in FIG. 4A, the suction part 150 is provided with suction ducts 152 having a plurality of suction ports 154 formed on one side thereof to correspond to each other at the lower ends of both sides of the drain 142. The suction duct 152 sucks fume from both sides of the treatment bath and exhausts the fume to the main exhaust duct 130. To this end, the suction duct 152 is connected to the main exhaust duct 130 through a connection line 158 installed on the rear surface (surface close to the main exhaust duct). The suction duct 152 communicates with the main exhaust duct 130 to suck the fume by the suction force of the main exhaust duct 130.

FIG. 4B is a cross-sectional view of the modified drip tray module 140 'having one suction duct 152. The suction unit 150 has one suction port having a plurality of suction ports 154 formed on both sides thereof, as shown in FIG. 4B. Of course, it may also be made of a duct (152).

As shown in FIG. 1 and FIG. 5, in the cleaning processing unit 100 having the above-described configuration, the main wetting duct 130 in which the fume formed on the processing bath 110 is disposed behind the processing bath. 2 through the exhaust ports 132 and the suction ports 154 of the drip module 140 disposed on both sides of the treatment bath, so that the air flow in the shape of a shield (inter-shield) is formed on the treatment bath. (Shown by an arrow at 5) is formed to have a special effect that the removal of the fume is made more quickly and smoothly.

Here, the substrate refers to a substrate for a photo reticle, a display panel substrate such as a substrate for a liquid crystal display panel or a substrate for a plasma display panel, a substrate for a hard disk, a wafer for an electronic device such as a semiconductor device, and the like. do.

In the above, the configuration and operation of the wet station for cleaning the substrate according to the present invention is shown in accordance with the above description and drawings, but this is only an example and various changes and modifications within the scope without departing from the technical spirit of the present invention. Of course this is possible.

According to the present invention, the drip tray module receives and drains the treatment chemicals falling from the chucks of the substrates and the transfer robot in the process of transferring the substrates between the treatment baths, thereby preventing contamination of the peripheral device by the treatment chemicals. In addition, by sucking and removing the fume from the suction portion of the drip tray module provided on both sides of the treatment bath, it is possible to quickly and smoothly remove the fume to prevent corrosion of the peripheral device.

Claims (9)

In a wet station using a treatment liquid to clean / etch the substrate: Baths whose top surface is open and filled with the treatment liquid so that the substrate can be contained therein; A transfer robot for transferring the substrate between the baths; A drip module installed between the bath and the bath to receive a treatment liquid dropped during the substrate transfer process between the baths; And the drip module has a suction part for sucking and exhausting fume generated by evaporation from the treatment liquid, and the suction part includes a suction duct having a plurality of suction ports for suctioning the fume. The method of claim 1, The drip module And a drain having an inclined surface for collecting and treating the treatment chemicals falling from the substrate or the transfer robot, and a drain formed at the bottom of the inclined surface and connected to an external drain line. The method of claim 2, The drip module Wet station characterized in that it further comprises an ultrapure water supply line is installed on the top of the edge of the inclined surface so that ultra pure water flows. delete The method of claim 1, The wet station And a main exhaust duct having a plurality of exhaust ports for sucking and evacuating the fume at the rear side of the bath. For the wet station: Baths whose top surface is open and filled with the treatment liquid so that the substrate can be contained; A transfer robot for transferring the substrate between the baths; A main exhaust duct having a plurality of exhaust ports for sucking and exhausting fumes generated by evaporation from the treatment chemical on the rear side of the bath from the rear of the bath; And And a suction duct provided between the bath and the bath and having a plurality of suction inlets for sucking and evacuating the fume from both sides of the bath. The method of claim 6, The suction duct is And a drain having an inclined surface for collecting and treating the treatment chemicals falling from the substrate or the transfer robot, and a drain formed at the bottom of the inclined surface and connected to an external drain line. The method of claim 7, wherein The suction duct is Wet station characterized in that it further comprises an ultrapure water supply line is installed on the top of the edge of the inclined surface so that ultra pure water flows. The method of claim 6, And the main exhaust duct and the suction duct are connected through an exhaust line.

Images