KR100650152B1 - Radiation curable antistatic hard coating composition and antistatic sheet and antistatic tray using it - Google Patents

Abstract

Provided is a photocurable antistatic hard coating composition, which shows excellent film hardness, transparency and conductivity even after bending a coating film formed by the composition. The photocurable antistatic hard coating composition comprises: 10-40 wt% of a photocurable hard coating composition comprising an acrylic monomer, colloidal inorganic oxide, silane compound, alkyl-alkoxy acrylate monomer or oligomer and a colloid stabilizer; 3-30 wt% of a water dispersible conductive polymer; 0.1-5 wt% of a photoinitiator; 40-80 wt% of an organic solvent; and 0.1-5 wt% at least one additive selected from the group consisting of a slip agent, a wetting agent, an anti-scratching agent, an anti-fouling agent and a UV stabilizer.

Description

Photocurable antistatic hard coating composition and antistatic sheet and antistatic tray using the same

1 is a perspective view of an antistatic tray for an electronic component using an antistatic sheet of the present invention according to an embodiment of the present invention.

Figure 2 is a perspective view of an antistatic tray for an electronic component using an antistatic sheet of the present invention according to another embodiment of the present invention.

The present invention relates to a photocurable antistatic hard coating composition, an antistatic sheet and an antistatic tray using the same, and more particularly, to a photocurable antistatic hard coating composition having excellent physical properties when bent and an antistatic sheet using the same. And an antistatic tray for an electronic component.

With the high integration of electronic components and semiconductors, the problem of product defects caused by static electricity is on the rise, and many efforts are being made to minimize the damage caused by static electricity. Static electricity affecting parts in assembling or using electronic parts is generated from the human body of the worker, the work space, the parts themselves, the worker or the packaging materials during the assembly and packaging, and the transportation process. Occupies. Therefore, a material such as a case for storing and transporting the completed electronic component should have an antistatic function.

The manufacture of an antistatic electronic component case or a tray uses an antistatic sheet obtained by coating an antistatic composition on a base plastic surface, which is an insulator, and then drying it by heat curing or light curing.

The thermosetting coating method manufactures an antistatic film and sheet using various coating methods such as gravure coating, roll coating, bar coating, and spray coating on the base plastic, so that the productivity is excellent and the properties of the antistatic coating liquid are controlled according to the control. Surface resistance (10 ² ~ ^{10 10} Ω / cm ² ) can be freely adjusted, there is an advantage that the liquid stability is excellent. However, there are disadvantages in that the adhesion, solvent resistance and film hardness are poor for some base plastics. On the contrary, the photocurable coating method has the advantages of being able to be cured at a low temperature and having a fast curing speed, and have excellent properties such as film hardness, solvent resistance, abrasion resistance, and adhesive strength, compared to the thermosetting coating method.

In general, thermosetting antistatic coating compositions and sheet manufacturing methods using conductive polymer compositions are already known. U.S. Pat.Nos. 5,372,924 and 5,792,558 disclose antistatic compositions based on conductive polythiophenes, and Bayer Technical Information (HC Starck, Germany, 1996) discloses a variety of configurations. The composition is introduced to make it easier to use.

Method for producing a photocurable antistatic coating composition using a conductive polymer is known in the United States Patent Nos. 5,732,924 and 6,004,483 and the Republic of Korea Patent Nos. 2001-69253 and 2001-58446. The photocurable antistatic hard coating agent provides a method of manufacturing an antistatic sheet by coating a plastic as a composition containing a conductive polymer, a binder containing an acrylic monomer and an oligomer, a photoinitiator and a solvent. However, the antistatic sheet coated with an acrylic binder has a problem in that the coating layer of the substrate plastic is broken when bending, thereby greatly increasing the surface resistance, thereby significantly reducing the charging function, and greatly reducing the film hardness and wear resistance. In addition, there is a problem that the plastic is blurred during bending work due to bending, that is, a haze phenomenon occurs and transparency is lost, thereby degrading its value as a product.

The present invention is to solve the above problems, an object of the present invention is to provide a photocurable antistatic hard coating composition having a film hardness, transparency and excellent conductivity without a haze phenomenon even after bending.

Another object of the present invention is to provide an antistatic sheet and an antistatic case for an electronic component using the photocurable antistatic hard coating composition.

In order to achieve the above object, the present invention is 10 to 40% by weight of a photocurable hard coating composition comprising an acrylic monomer, a colloidal inorganic oxide, a silane compound, an alkyl-alkoxy acrylate monomer or oligomer and a colloidal stabilizer; 3 to 30% by weight of the water dispersion conductive polymer; 0.1-5% by weight of photoinitiator; 40 to 80% by weight of an organic solvent; And it provides a photocurable antistatic hard coating composition comprising 0.1 to 5% by weight of at least one additive selected from slip agents, wetting agents, scratch resistant agents, stain resistant agents, UV stabilizers.

The present invention also provides an antistatic sheet coated with the photocurable antistatic hard coating composition on at least one side of the base plastic sheet.

The present invention also provides an antistatic tray for an electronic component manufactured by bending or vacuum forming the antistatic sheet.

Hereinafter, the present invention will be described in more detail.

The photocurable antistatic hard coating composition according to the present invention comprises 10 to 40% by weight of a photocurable hard coating composition comprising an acrylic monomer, a colloidal inorganic oxide, a silane compound, an alkyl-alkoxy acrylate monomer or an oligomer, and a colloidal stabilizer; 3 to 30% by weight of the water dispersion conductive polymer; 0.1-5% by weight of photoinitiator; 40 to 80% by weight of an organic solvent; And 0.1 to 5% by weight of at least one additive selected from slip agents, wetting agents, scratch resistant agents, stain resistant agents, and ultraviolet stabilizers.

When the content of the photocurable hard coating composition is less than 5% by weight, wear resistance and scratch resistance are decreased, and when the content of the photocurable hard coating composition is greater than 40% by weight, basic physical properties are increased but surface resistance is decreased. When the content of the water-dispersible conductive polymer is less than 3% by weight, the surface resistance is decreased, and when the content of the water-dispersible conductive polymer is greater than 30% by weight, the surface resistance is excellent but the permeability, abrasion resistance, and scratch resistance may be degraded. In the case of the organic solvent, if the content is less than 40% by weight, it may cause difficulty in permeability and workability, and in the case of more than 80% by weight, physical properties may be reduced in wear resistance and scratch resistance.

The photocurable hard coating composition is used to reinforce the high elongation function with the film hardness, 10 to 60% by weight acrylic monomer, 20 to 50% by weight colloidal inorganic oxide, 5 to 20% by weight silane compound, alkyl- 5 to 15% by weight of an alkoxy acrylate monomer or oligomer and 5 to 20% by weight of a colloidal stabilizer.

In addition, the photocurable hard coating composition may further include an additive such as an ultraviolet stabilizer or ultraviolet absorbent, if necessary.

When the content of the acrylic monomer in the photocurable hard coating composition is less than 10% by weight, the viscosity increases during the preparation of the sol-gel, and the synthesis is not easy, and when it exceeds 60% by weight, the synthesis by the viscosity during the manufacture of the photocurable hard coating composition This is easy but scratch resistance can be reduced. If the content of the colloidal inorganic oxide is less than 20% by weight may reduce the wear resistance and scratch resistance. If the content of the colloidal inorganic oxide exceeds 50% by weight, the physical properties are increased, but the viscosity is increased, the synthesis is not easy. In the case of the colloidal stabilizer is less than 5% by weight of the sol-gel state may cause aggregation and precipitation, and if it exceeds 20% by weight sol-gel state can be stabilized but may affect the physical properties.

The alkyl-alkoxy acrylate monomer or oligomer imparts elongation to the photocurable antistatic hard coating composition according to the present invention. Although the alkyl-alkoxy acrylate monomer or oligomer may be various kinds of photopolymerizable resins. Alkyl-alkoxy acrylate-based photocurable prepolymers prepared by introducing a (meth) acrylate group which is a functional group having a double bond are suitable. Prepolymers used in the present invention include polyester alkyl-alkoxy acrylates, epoxy alkyl-alkoxy acrylates, urethane alkyl-alkoxy acrylates, spiran resin alkyl-alkoxy acrylates, silicone resin alkyl-alkoxy acrylates, and the like. It can be mixed and used. Of these, urethane alkyl-alkoxy acrylates using a urethane polymer resin are preferred.

Alkyl-althoxy acrylate monomers or oligomers include dialkylerythritolalkylalkoxyacrylates (alkyl and alkoxy having C1-C10 carbon atoms) or dialkylerythritolalkylacrylates (alkyl and alkoxy carbons have C1-C10); There are oligomers synthesized by the reaction of isocyanates. Examples thereof include monomers such as dipentaerythritol hexaethoxy acrylate and dipentaerythritol pentaethoxy acrylate, and urethane dipentaerythritol acrylate oligomers synthesized by reacting dipentaerythritol pentaacrylate with isocyanate.

Urethane alkyl alkoxy acrylates are prepared by addition polymerization by adding catalysts to polyols and polyisocyanates. Dibutyltin dilaurate, tin octoate, 1,4-diazabicyclo (2,2,2) octane, etc. can be used as a catalyst. The amount of catalyst used can be used within the general range. Examples of the polyol that can be used include dihydric alcohols such as ethylene glycol, diethylene glycol, propylene glycol, butylene glycol, and hexamethylene glycol, trihydric alcohols such as trimethylolpropane and glycerin, and tetrahydric alcohols such as pentaerythritol. Can be. Further, polyether polyols obtained by addition polymerization of ethylene oxide, propylene oxide, tetrahydrofuran or the like, or the dihydric alcohols, dipropylene glycol, 1,4-butanol, 1,6-hexanediol, neopentyl glycol and the like Polyester polyols, acrylic polyols, carbonate polyols, polyester polyols and the like which are made of polycondensates of alcohols with divalent basic acids such as adipic acid, azelaic acid and sebacic acid can be used. Of these, polyether polyols and polyester polyols are preferable. Polyetherpolyols are generally inexpensive and have good water resistance, and polyesterpolyols have high strength. In the present invention, the type and amount of the polyol can be freely selected according to the use and the purpose. In addition, the type, molecular weight, and amount of polyol can be appropriately selected from the viewpoints of urethane reactivity and compatibility with existing general-purpose acrylics.

Examples of the polyisocyanate include aromatic, aliphatic and alicyclic diisocyanates, dimers and trimers of these diisocyanates. Aromatic, aliphatic and cycloaliphatic diisocyanates include triylene diisocyanate, diphenylmethane diisocyanate, hexamethylene diisocyanate, xylylene diisocyanate, hydrogenated xylylene diisocyanate, isophorone diisocyanate, hydrogenated diphenylmethane Diisocyanate, 1,5-naphthylene diisocyanate, 1,3-phenylene diisocyanate, 1,4-phenylene diisocyanate, butane-1,4-diisocyanate, 2,2,4-trimethylhexamethylene diisocyanate, 2 , 4,4-trimethylhexamethylene diisocyanate, cyclohexane-1,4-diisocyanate, dicyclohexyl methane-4,4-diisocyanate, 1,3-bis (isocyanatemethyl) cyclohexane, methylcyclohexanediisocyanate and m-tetramethyl xylylene diisocyanate. In addition, dimers, trimers and polyphenylmethanepolyisocyanates thereof are used. An isocyanurate type, a biuret type, an allophanate type, etc. are mentioned as a trimer, It can select suitably and can use. These polyisocyanates can be used individually or in mixture.

The said acrylate monomer uses many acrylate groups and methacrylate groups. In the present invention, single tubes such as hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, hydroxypentyl (meth) acrylate, and hydroxyhexyl (meth) acrylate Functional monomers with 1,6-hexanediol di (meth) acrylate, triphenylglycol diacrylate, butanediol diacrylate, 1,3-butylene glycol dimethacrylate, neopentylglycol diacrylate, ethylene glycol diacrylate 2 such as methacrylate, diethylene glycol di (meth) acrylate, triethylene glycol diacrylate, polyethylene glycol di (meth) acrylate, dipropylene glycol diacrylate, methoxylated neopentylglycol diacrylate Functional monomers and trimethylolpropane tri (meth) acrylate, pentaerythritol triacrylate, ethoxylay Detrimethylolpropane triacrylate, propylated trimethylolpropane triacrylate, glycerylpropylated triacrylate, tris (2-hydroxyethyl) isocyanurate triacrylate, dipentaerythritol hydroxy pentaacryl One or more polyfunctional monomers, such as a rate, a trimethylol propane methoxylated triacrylate, and a trimethylol propane ethoxylated triacrylate, can be used.

Silica may be used as the colloidal inorganic oxide, and may be mixed with the colloidal metal oxide. The colloidal inorganic oxide may be in the form of powder, gel or sol, but the sol form is most preferred. In the sol state colloidal inorganic oxide particles are dispersed in the liquid medium. Sols useful for carrying out the invention may be prepared by conventional methods well known in the art, and suitable sols may use commercially available products. For example, colloidal silica dispersed as a sol in an aqueous solution is preferable.

The crosslinkable silane compound contains a hydrolyzable silane moiety and a polymerizable moiety other than the silane moiety, and may be methyltrimethoxysilane, dimethylmethoxysilane, 3-aminopropyltriethoxysilane, or 3-aminopropyl diethoxymethyl. Silane, 3-aminopropyltrimethoxysilane, vinyltris (β-methoxy) silane, vinyltris (2-methoxyethoxy) silane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane And silicon substituted with an alkoxy functional group.

Examples of the conductive polymer include water-soluble polyaniline, water-soluble polypyrrole, water-soluble polythiophene, water-soluble poly (3,4-ethylenethiophene), derivatives and copolymers thereof, and π-conjugated electric soluble in water-soluble and organic solvents. Conductive polymers.

Examples of the photopolymerization initiator include benzoin ethers such as benzoin methyl ether and benzoin isopropyl ether, and substituted benzoin ethers such as anisole methyl ether, 2,2-diethoxy acetophenone, and 2,2-dimethoxy-2-. Aromatic sulfonyls such as substituted acetophenones such as phenylacetophenone, substituted α-ketols such as 1-hydroxycyclohexyl-phenyl-ketone, and 2-methyl-2-hydroxypropiophenone, and 2-naphthalenesulfonyl chloride Photoactive oximes such as chloride, 1-phenyl-1,1-propanedione-2- (o-ethoxycarbonyl) -oxime, and the like can be used.

As the colloidal stabilizer, acrylloyl mrpholine, acrylamide-based dimethyl (meth) acrylamide (N, N'-dimethyl (meta) acrylamide: DMA) may be used, and the surface slip property of the hard coating layer may be used. By adding a little more wear resistance and scratch resistance can be improved.

UV stabilizers or ultraviolet absorbers to improve the weather resistance of the photocurable hard coating composition and to reduce the yellowing caused by ultraviolet light over time, can be used alone or in combination, if necessary in the photocurable hard coating composition 0.1 to 5 weight percent.

The additives added to the photocurable antistatic hard coating composition of the present invention include slip agents, wetting agents, scratch resistant agents, stain resistant agents, ultraviolet stabilizers and the like, and may be used alone or in combination.

As the slip agent, a silicon-based material may be generally used, and a siloxane copolymer, a modified polysiloxane, or the like may be used.

Organic solvents include dimethyl sulfoxide (DMSO), dimethylformamide (DMF), N-methyl-2-pyrrolidinone (NMP), ethylene glycol (EG), propylene glycol methyl ether, 2-butanone, 4-methyl -2-pentanone, ethyl cellosolve, methyl cellosolve, methyl alcohol, ethyl alcohol, isopropyl alcohol, isobutyl alcohol, t-butyl alcohol, benzyl alcohol, di-acetone alcohol, ethylene glycol, etc. May be used alone or in combination. Among these, dimethyl sulfoxide (DMSO), N-methyl-2-pyrrolidinone (NMP), ethylene glycol, isopropyl alcohol, methyl cellosolve, etc. are preferable.

60-90 ℃ temperature range after the photocurable antistatic hard coating composition according to the present invention coated in a variety of base plastics in the manner of gravure coating, comma coating, roll coating, bar coating, dip coating, flow coating, spray coating, etc. After heat curing and drying for 1 to 10 minutes in order to completely remove the organic solvent in the coating composition, the antistatic sheet may be prepared by irradiating and curing ultraviolet light of 250 to 600 mJ / cm 3 light amount.

The base plastic usable in the present invention means a polymer synthetic resin, for example, polyester (triple of PET A, PET G, PET G-PET A-PET G), styrene-butadiene copolymer, polystyrene, polyimide, poly Amides, polysulfonates, polycarbonates, polyacrylates, polyvinyl chloride, polyethylene, polypropylene, modified polyphenylene oxides [MPPO (Modified-Polyphenylene Oxide)] or polymer blends or copolymers thereof and phenolic resins, epoxy The resin, urethane resin, ABS resin, and the like formed of one or two or more multilayers belong to this.

1 and 2 are perspective views of an antistatic tray for an electronic component using an antistatic sheet according to the present invention.

The antistatic trays 10 and 20 for electronic components may be manufactured by bending or vacuum forming an antistatic sheet coated with the photocurable antistatic hard coating composition of the present invention. Vacuum molding is a method in which an antistatic sheet is heated and softened to make a vacuum between a mold and a sheet, and the sheet is brought into close contact with a mold and molded. The antistatic trays 10 and 20 for electronic components are mainly for accommodating an electronic component for conveyance and a test | inspection. The shape of the antistatic trays 10 and 20 for electronic components is not particularly limited in the present invention and may be manufactured in a shape generally used, and may be appropriately designed and used in consideration of the type, size, etc. of the electronic components.

The present invention will be described in more detail with reference to the following Examples. However, the following examples are only preferred examples of the present invention, and the present invention is not limited to the following examples.

<Example 1>

Acrylic monomer (20% by weight of dipentaerythritol hexaacrylate, 30% by weight of Pentaerythritol triacrylate, 50% by weight of Unwon Corporation), 25% by weight of water-dispersed silica sol (Nalco 2327, NALCO Co.) as an inorganic oxide, silane compound (3-methacrylocxa propyl trimethoxy silane , Shin-etsu chemical Co.) 5 wt%, colloidal stabilizer (acryloyl morpholine, SATOMER Co.) 10 wt%, alkyl-alkoxy acrylic monomer (Dipentaerythritol hexaetoxyacrylate: DPHEA, SATOMER Co.) 9.4 wt%, UV stabilizer (BYK-307, BYK Co.) 0.5 wt%, UV absorber (Tinubin 3270, Ciba Geigy Co.) 0.1 wt% vacuum reduced pressure at 55 ℃ to complete the reaction while removing the water and ethanol photocurable hard coating composition Prepared. 20 wt% of the photocurable hard coating composition, 10 wt% of poly (3,4-ethylenedioxythiophene) (Baytron PH, Bayer Co.), which is an aqueous dispersion, and 1 wt% of a photocuring agent (Igacure 184, Ciba Geigy Co.) , 0.3 wt% slip agent (Tego glide 450, Tego Co.), organic solvent (25 wt% isopropyl alcohol, 20 wt% methyl cellosolve, 20 wt% propylene glycol methyl ether, 3.7 wt% ethylene glycol) 68.7 wt% % Was added to prepare a photocurable antistatic hard coating composition.

The photocurable antistatic hard coating composition was coated on a polyester (PET) base plastic by a gravure coating method and then thermally cured and dried at 50 ° C. for 4 minutes to remove the solvent in the coating composition, followed by 400 mJ / cm 3 UV light. Irradiation produced an antistatic sheet.

The surface resistance of the antistatic sheet prepared according to the present example was 3 x 10 ⁶ Ω / sq when measured under the conditions of 55% RH, 23 ° C, and applied voltage 500V according to ASTM D257 measuring method, and the film hardness was pencil By hardness measurement method (ASTM D3502) 6H, transparency was measured by 95% transmission in the visible light (550nm) region using a UV photometer (Simazu Co.).

In addition, the antistatic sheet was stretched 200% to manufacture an electronic component transport tray. The surface resistance of the manufactured electronic component transport tray showed 1 x 10 ⁷ Ω / sq in ASTM D257 measuring method, the film hardness was measured by pencil hardness method (ASTM D3502) 5H, and the transparency was UV photometer (Simazu Co.) It was measured by 91% transmission in the visible light (550nm) region using, and no haze phenomenon could be observed.

<Example 2>

Instead of 9.4% by weight of alkyl-alkoxy acrylic monomer (Dipentaerythritol hexaetoxyacrylate: DPHEA, SATOMER Co.), 9.4% by weight of urethane alkyl-alkoxy acrylic oligomer (Oligo U-15HA: Shin-Nakamura (Japan)) was used to prepare a photocurable hard coating composition. Except for manufacturing, it was carried out in the same manner as in Example 1.

<Example 3>

In the same manner as in Example 1 except that a photocurable hard coating composition was prepared using 9.4% by weight of the urethane-based alkyl-alkoxy acrylic oligomer instead of 9.4% by weight of the alkyl-alkoxy acrylic monomer (Dipentaerythritol hexaetoxyacrylate: DPHEA, SATOMER Co.). Was carried out.

The urethane-based alkyl-alkoxy acrylate is 45% by weight of polypropylene glycol (PPG-4,000, Korean polyol), 30% by weight polypropylene glycol (PPG-2,000, Korean polyol), 1,4-butanediol molecular extender (chain extender) 5% by weight and 20% by weight of toluene diisocyanate (TDI) were prepared by reaction mixing.

Comparative Example 1

Except for DPHEA (dipentaerythritol hexaethoxy acrylate), which is an alkyl-alkoxy acrylic monomer, that is, an acrylic monomer (29.4% by weight Dipentaerythritol hexaacrylate, 30% by weight Pentaerythritol triacrylate, 59.4% by weight of U.S.A.), water-dispersed silica which is an inorganic oxide 25 wt% sol (Nalco 2327, NALCO Co.), 5 wt% silane compound (3-methacrylocxa propyl trimethoxy silane, Shin-etsu chemical Co.), 10 wt% colloidal stabilizer (acryloyl morpholine, SATOMER Co.), UV stabilizer (BYK-307, BYK Co.) 0.5 wt%, UV absorber (Tinubin 3270, Ciba Geigy Co.) 0.1 wt% vacuum reduced pressure at 55 ℃ to complete the reaction while removing the water and ethanol photocurable hard coating composition Prepared. Then it was carried out in the same manner as in Example 1.

Physical property test results of the antistatic sheets and trays prepared in Examples 1 to 3 and Comparative Example 1 are shown in Table 1 below.

Example 1 Example 2 Example 3 Comparative Example 1 Before stretching After stretching (200%) Before stretching After stretching (200%) Before stretching After stretching (200%) Before stretching After stretching (200%) Surface resistance (Ω / sq) 3 x 10 ⁶ 1 x 10 ⁷ 1 x 10 ⁶ 9 x 10 ⁶ 2 x 10 ⁶ 8 x 10 ⁶ 3 x 10 ⁶ 8 x 10 ¹¹ transparency(%) 95 91 95 93 94 93 95 70 Haze phenomenon none none none none none none none has exist Film hardness (H) 6 5 6 5 5 5 6 One

As described above, the present invention may provide a photocurable antistatic hard coating composition having an excellent film hardness and conductivity while having no haze phenomenon, and an antistatic sheet and an antistatic tray using the same.

Although the present invention has been described with reference to the above embodiments, it is merely illustrative, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom. . Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

Claims (7)

10 to 40% by weight of a photocurable hard coating composition comprising an acrylic monomer, a colloidal inorganic oxide, a silane compound, an alkyl-alkoxy acrylate monomer or an oligomer and a colloidal stabilizer; 3 to 30% by weight of the water dispersion conductive polymer; 0.1-5% by weight of photoinitiator; 40 to 80% by weight of an organic solvent; And A photocurable antistatic hard coating composition comprising 0.1 to 5% by weight of at least one additive selected from slip agents, wetting agents, scratch resistant agents, stain resistant agents, and ultraviolet stabilizers. According to claim 1, wherein the photocurable hard coating composition is an acrylic monomer 10 to 60% by weight, colloidal inorganic oxide 20 to 50% by weight, silane compound 5 to 20% by weight, alkyl-alkoxy acrylate monomer or oligomer 5 to 15 Photocurable antistatic hard coating composition comprising a weight% and 5 to 20% by weight of the colloidal stabilizer. The method of claim 2, wherein the alkyl-alkoxy acrylate monomer or oligomer is polyester alkyl-alkoxy acrylate, epoxy alkyl-alkoxy acrylate, urethane alkyl-alkoxy acrylate, spiran resin alkyl-alkoxy acrylate and silicone. Photocurable antistatic hard coating composition, characterized in that at least one prepolymer selected from resin alkyl-alkoxy acrylate is used. The π-conjugate of claim 1 wherein the conductive polymer is soluble in water-soluble polyaniline, water-soluble polypyrrole, water-soluble polythiophene, water-soluble poly (3,4-ethylenethiophene), derivatives or copolymers thereof, water-soluble and organic solvents. Photocurable antistatic hard coating composition, characterized in that at least one selected from the group of electrically conductive polymers. An antistatic sheet coated with the photocurable antistatic hard coating composition according to any one of claims 1 to 4 on at least one surface of the base plastic sheet. The method of claim 5 wherein the base plastic sheet is polyester, styrene-butadiene copolymer, polystyrene, polyimide, polyamide, polysulfonate, polycarbonate, polyacrylate, polyvinyl chloride, polyethylene, polypropylene, modified poly An antistatic sheet formed of one or two or more multilayers selected from phenylene oxide, polymer blends thereof, copolymers thereof, phenol resins, epoxy resins, and ABS resins. An antistatic tray for electronic parts produced by bending or vacuum forming the antistatic sheet according to claim 5.

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