KR100640986B1 - Method for fabricating liquid crystal display - Google Patents

Abstract

The present invention is to provide a liquid crystal display device manufacturing method capable of electrodeposition of pigment by applying a voltage only to the data line without driving the TFT, the liquid crystal display device manufacturing method of the present invention is a scanning line and data line, and a TFT arranged cross A manufacturing method of a liquid crystal display device comprising: a first step of forming a pixel electrode after bypassing and connecting source and drain electrodes of the TFT; and applying a voltage to the data line and depositing a pigment for a color filter. And a third step of electrically cutting the source and drain electrodes.

Color filter, connection pattern

Description

Liquid crystal display manufacturing method {Method for fabricating liquid crystal display}

1A to 1D are layout process diagrams for explaining a method of manufacturing a liquid crystal display device according to the related art.

2A to 2H are layout process diagrams for explaining a method of manufacturing a liquid crystal display device according to a first embodiment of the present invention.

3A to 3G are layout process diagrams for explaining a method of manufacturing a liquid crystal display device according to a second embodiment of the present invention.

Explanation of symbols for main parts of the drawings

41 substrate 43 scanning line

43a: gate electrode 45: active pattern

47: data line 47a, 47b: source, drain electrode

47c: connection pattern 49: pixel electrode

51: light blocking layer 53: color filter

The present invention relates to a display device, and more particularly to a method for manufacturing a liquid crystal display device.

One of the display devices, Cathode Ray Tube (CRT) has been used mainly for monitors such as TVs, measuring devices, information terminal devices, etc., but the size and weight of CRT itself make it necessary to reduce the size and weight of electronic products. Couldn't respond positively.

In order to replace the CRT, Liquid Crystal Display (LCD), which has the advantages of light and thin, has been actively developed, and recently, the liquid crystal display (LCD) has been developed enough to perform a role as a flat panel display device. Demand is on the rise.

The color display of the TFT-LCD is performed through the operation of the TFT and the liquid crystal cell for controlling the transmittance of white light emitted from the backlight (B / L) and the additive mixing of three primary colors passing through the color filters of R, G, and B.

The color filter has a dye method and a pigment method according to the material of the organic filter used in the production, and may be classified into a dyeing method, a dispersion method, an electrodeposition method, a printing method, and the like according to the production method.

The color filter substrate is a light blocking layer (black matrix) that serves to distinguish between R, G, and B color filter patterns and R, G, and B patterns that implement color, and block light, and to apply voltage to the liquid crystal cell. It is composed of a common electrode (ITO).

In general, a liquid crystal display device may be classified into the above-described color filter substrate, a thin film transistor (TFT), a TFT substrate on which a pixel electrode is formed, and a liquid crystal encapsulated between two substrates, which are formed on the color filter substrate. A structure for forming a color filter pattern and a black matrix on a TFT substrate has been proposed.

The so-called color filter on TFT substrate has a structure in which a black matrix and a color filter pattern are formed on a TFT substrate, and only a common electrode is formed on an opposing substrate, and a liquid crystal is enclosed therebetween. Have

The related art and the present invention described below relate to a liquid crystal display device having a structure in which the color filter and the black matrix are formed on a TFT substrate.

Hereinafter, a liquid crystal display device manufacturing method according to the related art will be described with reference to the accompanying drawings.

1A to 1D are process drawings for explaining a method of manufacturing a liquid crystal display device according to the prior art.

As shown in FIG. 1A, after the scan line 13 including the gate electrode 13a is formed on the substrate 11, the active pattern crossing the scan line 13 and passing over the gate electrode 13a is formed. (15) is formed.

As shown in FIG. 1B, a metal layer is formed on the active pattern 15, and then patterned to form a data line 17 intersecting the scan line 13, and an upper portion of the gate electrode 13a. The source electrode 17a and the drain electrode 17b which are separated on the active pattern 15 of are formed.

After forming the TFT on the substrate through such a process, as shown in FIG. 1C, an ITO layer is formed on the entire surface, and then selectively removed to be electrically connected to the drain electrode 17b through a connection hole. The pixel electrode 19 is formed.

Subsequently, as shown in FIG. 1D, after the light blocking layer 20 is formed in the region where the pixel electrode 19 is not formed, the TFT is driven to electrodeposit the pigment of the color filter. A voltage is applied to the pixel electrode 19 through the color pigment electrodeposited on the pixel electrode 19 to form the color filter layer 21.

That is, in the related art, a voltage must be applied to the pixel electrode in order to deposit the pigment for forming the color filter. Therefore, a voltage must be applied to the TFT to open the channel, and at the same time, the pigment is electrodeposited while applying a voltage to the data line.

However, according to the manufacturing method of the conventional liquid crystal display device as described above, in order to pigment electrode for forming the color filter, the TFT must be driven inevitably, and a voltage must be applied to the data line. In the case of the pigment electrodeposition, the defect which may be prevented by the scanning line cannot be prevented and there is a problem of lowering the yield.

SUMMARY OF THE INVENTION The present invention has been made to solve the above problems of the prior art, and an object thereof is to provide a method for manufacturing a liquid crystal display device capable of electrodeposition of a pigment by applying a voltage only to a data line without driving a TFT.

In the manufacturing method of the liquid crystal display device of the present invention for achieving the above object, in the manufacture of a liquid crystal display device having a scan line and a data line, and a TFT intersected, the source and drain electrodes of the TFT are bypassed and connected. A first step of forming a post pixel electrode, a second step of applying a voltage to the data line and electrodelizing a pigment for a color filter, and a third step of electrically cutting the source and drain electrodes. It is done.

Hereinafter, a method of manufacturing a liquid crystal display of the present invention will be described with reference to the accompanying drawings.

2A to 2H are layout process diagrams for explaining a method of manufacturing a liquid crystal display device according to a first embodiment of the present invention.

As shown in Fig. 2A, after forming a conductive material layer such as Al, Cr, Ta, etc. on the substrate 41, patterning is performed to scan signals from the gate electrode 43a of the TFT and the gate driving circuit (not shown). Pattern the scan line 43 to which is applied.

Thereafter, a gate insulating layer (not shown) is formed on the entire surface of the substrate 41 including the scan line 43 and the gate electrode 43a. Then, as shown in FIG. 2B, a semiconductor layer such as amorphous silicon is formed. After forming, the active pattern 45 is patterned to intersect the scan line 43 and a portion of the active pattern 45 passes over the gate electrode 43a. A metal layer (not shown) is formed on the entire surface including the active pattern 45.

As shown in FIG. 2C, the metal layer is selectively removed to form a data line 47 in a direction crossing the scan line 43, and separated on the active pattern 45 on the gate electrode 43a. The source electrode 47a and the drain electrode 47b are formed.

In addition, a connection pattern 47c for bypassing the source and drain electrodes 47a and 47b to be electrically connected to each other is formed. In this case, the connection pattern 47c may be simultaneously formed or separately formed when patterning the metal layers for forming the data line 47, the source and drain electrodes 47a and 47b. In the case of forming simultaneously, the source and drain electrodes 47a and 47b are formed integrally with the source and drain electrodes 47a and 47 by patterning of the same metal as the source and drain electrodes 47a and 47b, and are formed by bypassing the scan line 43.

In this manner, source and drain electrodes 47a and 47b that are separated from each other but are connected to each other in the channel region of the TFT are formed, and then a passivation layer (not shown) is formed on the entire surface.

Thereafter, as illustrated in FIG. 2D, a passivation layer (not shown) is selectively removed to expose a predetermined portion of the drain electrode 47b to form a connection hole, and the ITO layer for the pixel electrode is formed on the entire surface including the connection hole. After forming, the pixel electrode 49 is patterned to form a pixel electrode 49 electrically connected to the drain electrode 47b through the connection hole.

Subsequently, as illustrated in FIG. 2E, the light blocking layer 51 for blocking light transmission is patterned in the remaining regions except for the region where the pixel electrode 49 is formed.

The light blocking layer 51 may be formed of a metal thin film such as chromium (Cr) or a carbon-based organic material, or for the purpose of low reflection, between the chromium compound layer and the chromium compound double layer or between the chromium compound layer and the chromium layer. It can also be formed into a triple film with another chromium compound layer interposed therebetween.

Then, as shown in FIG. 2F, color pigments 53 of R, G, and B are selectively electrodeposited regardless of the order to form the color filter 53. FIG. In this case, a voltage is applied to the data line 47 to transfer the voltage to the drain electrode 47b through the connection pattern 47c, and finally, the voltage is transferred to the pixel electrode 49 to form an upper portion of the pixel electrode 49. The color pigment is electrodeposited.

As described above, after the color filter 53 is formed, the light blocking layer 51 is selectively removed so that the connection pattern 47c is exposed, as shown in FIG. 2G, and as shown in FIG. 2H. When the exposed connection pattern 47c is removed, the manufacturing process of the liquid crystal display according to the first embodiment of the present invention is completed.

Next, a method of manufacturing a liquid crystal display device according to a second embodiment of the present invention will be described.

First, the liquid crystal display according to the second embodiment of the present invention is characterized by exposing a connection pattern at the same time when patterning the light blocking layer.

3A to 3G are layout process diagrams for explaining a method of manufacturing a liquid crystal display device according to a second embodiment of the present invention.

The process of FIGS. 3A to 3E is the same as that of FIGS. 2A to 2E which is the first embodiment of the present invention.

That is, as shown in FIG. 3D, after forming the pixel electrode 49 to be connected to the drain electrode 47b, as shown in FIG. 3E, the source and drain electrodes 47a and 47b are indirectly connected. The light blocking layer 51 is formed on a portion where the pixel electrode 49 is not formed while the connection pattern 47c is exposed.

Thereafter, as shown in FIG. 3F, color pigments of R, G, and B are selectively electrodeposited regardless of the order to form the color filter 53. In this case, a voltage is applied to the data line 47 to transfer the voltage to the drain electrode 47b and the pixel electrode 49 through the connection pattern 47c, and thus, a color pigment is formed on the pixel electrode 49. Electrodeposited. Since the connection pattern 47c is exposed to the color pigment, the color pigment is electrodeposited in the state where voltage is applied to the data line 47, and the pigment is also electrodeposited on the connection pattern 47c.

Therefore, in the process of electrodepositing the color pigment and removing the color pigment electrodeposited on the unnecessary portion, the pigment electrodeposited on the upper portion of the connection pattern 47c is also removed at the same time, or the connection pattern 47c exposed in a subsequent process without being separately removed. You can also remove them at the same time.

As such, after the color filter 53 is formed, as illustrated in FIG. 3G, the exposed connection pattern 47c is removed to complete the manufacturing process of the liquid crystal display according to the second exemplary embodiment.

As described above, the liquid crystal display device manufacturing method of the present invention has the following effects.

First, color pigments can be electrodeposited by applying a voltage only to the data lines without driving the TFTs, thereby improving the uniformity according to the characteristics of the TFTs.

Second, in the case of pigment electrodeposition, defects that may be caused by the scanning line may be minimized, thereby improving reliability and yield of the device.

Claims (11)

In the manufacture of a liquid crystal display device in which a color filter is formed on a TFT substrate, Forming a connection pattern for bypassing the TFT and the source and drain electrodes of the TFT; Forming a pixel electrode connected to the drain electrode; Forming a light blocking layer in a region other than the pixel electrode; Forming a color filter on the pixel electrode; And removing the connection pattern. The method of claim 1, wherein the forming of the connection pattern is performed. Forming a metal layer for a data line on the substrate on which the gate electrode, the scan line, and the active pattern are formed; And selectively removing the metal layer to form a source and drain electrode separated on the active pattern on the gate electrode, and a connection pattern to indirectly connect the source and drain electrodes. . The method of claim 2, wherein the connection pattern is integrally formed with the source and drain electrodes. The method of claim 1, further comprising exposing the connection pattern after the color filter is formed. The method of claim 1, wherein the light blocking layer is formed to expose the connection pattern. The method of claim 2, wherein the connection pattern is formed to bypass the upper portion of the scan line. Forming a gate electrode and a scan line on the substrate; Forming an active pattern crossing the scan line and partially passing over the gate electrode; Forming a metal layer on the entire surface including the active pattern; Selectively removing the metal layer to form a connection pattern which bypasses the source and drain electrodes separated on the active pattern on the data line and the gate electrode and the source and drain electrodes; Forming a pixel electrode electrically connected to the drain electrode; Forming a light blocking layer in a region where the pixel electrode is not formed; Applying a voltage to the data line and electrodepositing a pigment for a color filter to form a color filter; And a step of electrically cutting the connection pattern. The method of claim 7, further comprising exposing the connection pattern after the color filter is formed. The method of claim 7, wherein the light blocking layer is formed to expose the connection pattern. The method of claim 7, wherein the connection pattern is integrally formed with the source and drain electrodes. The method of claim 7, wherein the connection pattern is formed to bypass the upper portion of the scan line.

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