KR100594696B1 - 플라즈마 발생장치 - Google Patents

플라즈마 발생장치 Download PDF

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Publication number
KR100594696B1
KR100594696B1 KR1020040070506A KR20040070506A KR100594696B1 KR 100594696 B1 KR100594696 B1 KR 100594696B1 KR 1020040070506 A KR1020040070506 A KR 1020040070506A KR 20040070506 A KR20040070506 A KR 20040070506A KR 100594696 B1 KR100594696 B1 KR 100594696B1
Authority
KR
South Korea
Prior art keywords
voltage
rectifying
discharge
switching
terminal
Prior art date
Application number
KR1020040070506A
Other languages
English (en)
Korean (ko)
Other versions
KR20060021673A (ko
Inventor
윤희종
Original Assignee
주식회사 위닉스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 위닉스 filed Critical 주식회사 위닉스
Priority to KR1020040070506A priority Critical patent/KR100594696B1/ko
Priority to PCT/KR2004/002503 priority patent/WO2006025626A1/fr
Publication of KR20060021673A publication Critical patent/KR20060021673A/ko
Application granted granted Critical
Publication of KR100594696B1 publication Critical patent/KR100594696B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/36—Circuit arrangements
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/4697—Generating plasma using glow discharges

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
KR1020040070506A 2004-09-03 2004-09-03 플라즈마 발생장치 KR100594696B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020040070506A KR100594696B1 (ko) 2004-09-03 2004-09-03 플라즈마 발생장치
PCT/KR2004/002503 WO2006025626A1 (fr) 2004-09-03 2004-09-30 Systeme de prodcution de plasma

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020040070506A KR100594696B1 (ko) 2004-09-03 2004-09-03 플라즈마 발생장치

Publications (2)

Publication Number Publication Date
KR20060021673A KR20060021673A (ko) 2006-03-08
KR100594696B1 true KR100594696B1 (ko) 2006-06-30

Family

ID=36000247

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040070506A KR100594696B1 (ko) 2004-09-03 2004-09-03 플라즈마 발생장치

Country Status (2)

Country Link
KR (1) KR100594696B1 (fr)
WO (1) WO2006025626A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9799493B2 (en) * 2012-11-28 2017-10-24 Tibbar Plasma Technologies, Inc. Electrical transformer
JP5729514B1 (ja) * 2014-06-14 2015-06-03 プラスウェア株式会社 プラズマ発生装置、液上溶融方法及び給電装置
US9899933B2 (en) 2015-07-24 2018-02-20 Tibbar Plasma Technologies, Inc. Electrical transformer
US10178749B2 (en) 2016-10-27 2019-01-08 Tibbar Plasma Technologies, Inc. DC-DC electrical transformer
US10172226B2 (en) 2016-10-28 2019-01-01 Tibbar Plasma Technologies, Inc. DC-AC electrical transformer
US10334713B2 (en) 2017-05-22 2019-06-25 Tibbar Plasma Technologies, Inc. DC to DC electrical transformer

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940007300U (ko) * 1992-09-15 1994-04-12 엘지산전주식회사 플라즈마 아크용 전원장치
JPH07155640A (ja) * 1993-12-01 1995-06-20 Takuma Co Ltd ガス処理装置
KR960007076A (ko) * 1994-08-06 1996-03-22 이종수 플라즈마 아크 전원 제어장치
JP2001035693A (ja) 1999-07-23 2001-02-09 Mitsubishi Electric Corp プラズマ発生用電源装置
KR100422163B1 (ko) 1999-10-25 2004-03-10 마츠시다 덴코 가부시키가이샤 플라즈마 처리장치 및 이 장치를 이용한 플라즈마 생성방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63121471A (ja) * 1986-11-11 1988-05-25 Ricoh Co Ltd 定電流高圧電源
SE462253B (sv) * 1988-10-14 1990-05-21 Philips Norden Ab Matningsanordning i en mikrovaagsugn samt anvaendning av anordningen
US5321235A (en) * 1991-06-04 1994-06-14 Sanyo Electric Co., Ltd. Half-bridge converter switching power supply for magnetron
KR930010551B1 (ko) * 1991-12-11 1993-10-28 오화영 음이온 발생장치
JP3159000B2 (ja) * 1995-10-17 2001-04-23 松下電器産業株式会社 マグネトロン駆動用電源装置
EP1214520A1 (fr) * 1999-09-15 2002-06-19 Knite, Inc. Circuits electroniques pour dispositifs de production de plasma

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR940007300U (ko) * 1992-09-15 1994-04-12 엘지산전주식회사 플라즈마 아크용 전원장치
JPH07155640A (ja) * 1993-12-01 1995-06-20 Takuma Co Ltd ガス処理装置
KR960007076A (ko) * 1994-08-06 1996-03-22 이종수 플라즈마 아크 전원 제어장치
JP2001035693A (ja) 1999-07-23 2001-02-09 Mitsubishi Electric Corp プラズマ発生用電源装置
KR100422163B1 (ko) 1999-10-25 2004-03-10 마츠시다 덴코 가부시키가이샤 플라즈마 처리장치 및 이 장치를 이용한 플라즈마 생성방법

Also Published As

Publication number Publication date
KR20060021673A (ko) 2006-03-08
WO2006025626A1 (fr) 2006-03-09

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